首页 > 最新文献

Ultramicroscopy最新文献

英文 中文
Prediction of primary knock-on damage during electron microscopy characterization of lithium-containing materials 在含锂材料的电子显微镜表征中预测初级撞击损伤
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-11-11 DOI: 10.1016/j.ultramic.2023.113884
Ali Jaberi, Nicolas Brodusch, Jun Song, Raynald Gauvin

To fulfill power and energy demands, lithium-ion battery (LIB) is being considered as a promising energy storage device. For the development of LIBs, high-resolution electron microscopy characterization of battery materials is crucial. During this characterization, the interaction of beam-electrons with Li-containing materials causes damage through several processes, especially knock-on damage. In this study, we investigated this damage by determining the probability of knock-on damage and performing Monte Carlo simulation. For this objective, the threshold displacement energies (TDEs) were computed using sudden approximation technique for three sets of materials, including pure elements, LiX (X = F, Cl, Br), and Li2MSiO4 (M = Fe, Co, Mn). By including the Climbing-Image Nudge Elastic Band (CI-NEB) method into the sudden approximation approach, it was found that the accuracy of the predicted TDEs could be improved. Results also indicated that at moderate electron energies, the knock-on damage for Li in both its elemental and compound forms maximized. In addition, it was shown that the TDE should be the principal parameter for assessing the Li sensitivity to knock-on damage across similar structures. Nonetheless, other parameters, including cross-section, density, weight fraction, atomic weight, and atomic number, were found to impact the knock-on damage.

为了满足电力和能源的需求,锂离子电池(LIB)被认为是一种很有前途的储能设备。对于锂离子电池的发展,电池材料的高分辨率电子显微镜表征至关重要。在此表征过程中,电子束与含锂材料的相互作用通过几个过程导致损伤,特别是撞击损伤。在本研究中,我们通过确定撞击损伤的概率并进行蒙特卡罗模拟来研究这种损伤。为此,使用突然逼近技术计算了三组材料的阈值位移能(TDEs),包括纯元素,LiX (X = F, Cl, Br)和Li2MSiO4 (M = Fe, Co, Mn)。将爬升图像轻推弹性带(CI-NEB)方法加入到突然逼近方法中,可以提高预测tde的精度。结果还表明,在中等电子能量下,单质态和化合物态Li的撞击损伤都最大。此外,研究表明,TDE应该是评估类似结构的Li对撞击损伤敏感性的主要参数。尽管如此,其他参数,包括截面、密度、质量分数、原子量和原子序数,都被发现对撞击损伤有影响。
{"title":"Prediction of primary knock-on damage during electron microscopy characterization of lithium-containing materials","authors":"Ali Jaberi,&nbsp;Nicolas Brodusch,&nbsp;Jun Song,&nbsp;Raynald Gauvin","doi":"10.1016/j.ultramic.2023.113884","DOIUrl":"https://doi.org/10.1016/j.ultramic.2023.113884","url":null,"abstract":"<div><p>To fulfill power and energy demands, lithium-ion battery (LIB) is being considered as a promising energy storage device. For the development of LIBs, high-resolution electron microscopy characterization of battery materials is crucial. During this characterization, the interaction of beam-electrons with Li-containing materials causes damage through several processes, especially knock-on damage. In this study, we investigated this damage by determining the probability of knock-on damage and performing Monte Carlo simulation. For this objective, the threshold displacement energies (TDEs) were computed using sudden approximation technique for three sets of materials, including pure elements, LiX (<em>X</em> = <em>F</em>, Cl, Br), and Li<sub>2</sub>MSiO<sub>4</sub> (M = Fe, Co, Mn). By including the Climbing-Image Nudge Elastic Band (CI-NEB) method into the sudden approximation approach, it was found that the accuracy of the predicted TDEs could be improved. Results also indicated that at moderate electron energies, the knock-on damage for Li in both its elemental and compound forms maximized. In addition, it was shown that the TDE should be the principal parameter for assessing the Li sensitivity to knock-on damage across similar structures. Nonetheless, other parameters, including cross-section, density, weight fraction, atomic weight, and atomic number, were found to impact the knock-on damage.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134656865","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improving the temporal resolution of event-based electron detectors using neural network cluster analysis 利用神经网络聚类分析提高基于事件的电子探测器的时间分辨率
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-11-11 DOI: 10.1016/j.ultramic.2023.113881
Alexander Schröder , Christopher Rathje , Leon van Velzen , Maurits Kelder , Sascha Schäfer

Novel event-based electron detector platforms provide an avenue to extend the temporal resolution of electron microscopy into the ultrafast domain. Here, we characterize the timing accuracy of a detector based on a TimePix3 architecture using femtosecond electron pulse trains as a reference. With a large dataset of event clusters triggered by individual incident electrons, a neural network is trained to predict the electron arrival time. Corrected timings of event clusters show a temporal resolution of 2 ns, a 1.6-fold improvement over cluster-averaged timings. This method is applicable to other fast electron detectors down to sub-nanosecond temporal resolutions, offering a promising solution to enhance the precision of electron timing for various electron microscopy applications.

新的基于事件的电子探测器平台为将电子显微镜的时间分辨率扩展到超快领域提供了一条途径。在这里,我们使用飞秒电子脉冲序列作为参考,表征了基于TimePix3架构的探测器的定时精度。利用由单个入射电子触发的事件簇的大型数据集,训练神经网络来预测电子到达时间。事件簇的校正时间显示出2ns的时间分辨率,比簇平均时间提高了1.6倍。该方法也适用于其他低至亚纳秒时间分辨率的快速电子探测器,为提高各种电子显微镜应用的电子定时精度提供了一个有前途的解决方案。
{"title":"Improving the temporal resolution of event-based electron detectors using neural network cluster analysis","authors":"Alexander Schröder ,&nbsp;Christopher Rathje ,&nbsp;Leon van Velzen ,&nbsp;Maurits Kelder ,&nbsp;Sascha Schäfer","doi":"10.1016/j.ultramic.2023.113881","DOIUrl":"https://doi.org/10.1016/j.ultramic.2023.113881","url":null,"abstract":"<div><p>Novel event-based electron detector platforms provide an avenue to extend the temporal resolution of electron microscopy into the ultrafast domain. Here, we characterize the timing accuracy of a detector based on a TimePix3 architecture using femtosecond electron pulse trains as a reference. With a large dataset of event clusters triggered by individual incident electrons, a neural network is trained to predict the electron arrival time. Corrected timings of event clusters show a temporal resolution of 2 ns, a 1.6-fold improvement over cluster-averaged timings. This method is applicable to other fast electron detectors down to sub-nanosecond temporal resolutions, offering a promising solution to enhance the precision of electron timing for various electron microscopy applications.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134656864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Momentum transfer resolved electron correlation microscopy 动量转移分辨电子相关显微镜
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-11-11 DOI: 10.1016/j.ultramic.2023.113886
Shuoyuan Huang, Paul M Voyles

Electron correlation microscopy (ECM) characterizes local structural relaxation dynamics in fluctuating systems like supercooled liquids with nanometer spatial resolution. We have developed a new type of ECM technique that provides moderate resolution in momentum transfer or k space using five-dimensional scanning transmission electron microscopy. k-resolved ECM on a Pt57.5Cu14.7Ni5.3P22.5 metallic supercooled liquids measures rich spatial and momentum structure in the relaxation time data τ(r,k). Relaxation time maps τ(r) at each azimuthal k are independent samples of the material's underlying relaxation time distribution, and τ of radial k shows more complex behavior than the de Gennes narrowing observed in analogous X-ray experiments. We have determined the requirements for electron counts per k-pixel, number of k-pixels per speckle, and time sampling to obtain reliable k-resolved ECM data.

电子相关显微镜(ECM)以纳米空间分辨率表征了过冷液体等波动系统的局部结构弛豫动力学。我们开发了一种新型的ECM技术,该技术使用五维扫描透射电子显微镜在动量传递或k空间中提供中等分辨率。在Pt57.5Cu14.7Ni5.2P22.5金属过冷液体上的k分辨ECM测量了弛豫时间数据τ(r,k)中丰富的空间和动量结构。每个角k处的弛豫时间图τ(r)是材料潜在弛豫时间分布的独立样本,径向k的τ表现出比类似x射线实验中观察到的de Gennes缩窄更复杂的行为。我们已经确定了每k像素电子计数的要求,每个散斑的k像素数,以及采样时间,以获得可靠的k分辨率ECM数据。
{"title":"Momentum transfer resolved electron correlation microscopy","authors":"Shuoyuan Huang,&nbsp;Paul M Voyles","doi":"10.1016/j.ultramic.2023.113886","DOIUrl":"10.1016/j.ultramic.2023.113886","url":null,"abstract":"<div><p>Electron correlation microscopy (ECM) characterizes local structural relaxation dynamics in fluctuating systems like supercooled liquids with nanometer spatial resolution. We have developed a new type of ECM technique that provides moderate resolution in momentum transfer or <em>k</em> space using five-dimensional scanning transmission electron microscopy. <em>k</em>-resolved ECM on a Pt<sub>57.5</sub>Cu<sub>14.7</sub>Ni<sub>5.</sub><sub>3</sub>P<sub>22.5</sub> metallic supercooled liquids measures rich spatial and momentum structure in the relaxation time data <span><math><mrow><mi>τ</mi><mo>(</mo><mrow><mi>r</mi><mo>,</mo><mi>k</mi></mrow><mo>)</mo></mrow></math></span>. Relaxation time maps <span><math><mrow><mi>τ</mi><mo>(</mo><mi>r</mi><mo>)</mo></mrow></math></span> at each azimuthal <em>k</em> are independent samples of the material's underlying relaxation time distribution, and <span><math><mi>τ</mi></math></span> of radial <em>k</em> shows more complex behavior than the de Gennes narrowing observed in analogous X-ray experiments. We have determined the requirements for electron counts per <em>k</em>-pixel, number of <em>k</em>-pixels per speckle, and time sampling to obtain reliable <em>k-</em>resolved ECM data.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135670131","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Computational models of amorphous ice for accurate simulation of cryo-EM images of biological samples 用于精确模拟生物样品冷冻电镜图像的非晶冰计算模型
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-11-04 DOI: 10.1016/j.ultramic.2023.113882
James M. Parkhurst , Anna Cavalleri , Maud Dumoux , Mark Basham , Daniel Clare , C. Alistair Siebert , Gwyndaf Evans , James H. Naismith , Angus Kirkland , Jonathan W. Essex

Simulations of cryo-electron microscopy (cryo-EM) images of biological samples can be used to produce test datasets to support the development of instrumentation, methods, and software, as well as to assess data acquisition and analysis strategies. To be useful, these simulations need to be based on physically realistic models which include large volumes of amorphous ice. The gold standard model for EM image simulation is a physical atom-based ice model produced using molecular dynamics simulations. Although practical for small sample volumes; for simulation of cryo-EM data from large sample volumes, this can be too computationally expensive. We have evaluated a Gaussian Random Field (GRF) ice model which is shown to be more computationally efficient for large sample volumes. The simulated EM images are compared with the gold standard atom-based ice model approach and shown to be directly comparable. Comparison with experimentally acquired data shows the Gaussian random field ice model produces realistic simulations. The software required has been implemented in the Parakeet software package and the underlying atomic models are available online for use by the wider community.

生物样品的低温电子显微镜(cryo-EM)图像的模拟可用于产生测试数据集,以支持仪器,方法和软件的开发,以及评估数据采集和分析策略。为了有用,这些模拟需要基于物理上真实的模型,其中包括大量的无定形冰。EM图像模拟的金标准模型是使用分子动力学模拟产生的基于物理原子的冰模型。虽然适用于小样本量;对于模拟来自大样本量的低温电镜数据,这可能在计算上过于昂贵。我们已经评估了高斯随机场(GRF)冰模型,它被证明是更有效的计算大样本量。将模拟的EM图像与金标准原子冰模型方法进行了比较,结果表明两者具有直接可比性。与实验数据的比较表明,高斯随机场冰模型具有较好的模拟效果。所需的软件已经在Parakeet软件包中实现,底层原子模型可以在网上获得,供更广泛的社区使用。
{"title":"Computational models of amorphous ice for accurate simulation of cryo-EM images of biological samples","authors":"James M. Parkhurst ,&nbsp;Anna Cavalleri ,&nbsp;Maud Dumoux ,&nbsp;Mark Basham ,&nbsp;Daniel Clare ,&nbsp;C. Alistair Siebert ,&nbsp;Gwyndaf Evans ,&nbsp;James H. Naismith ,&nbsp;Angus Kirkland ,&nbsp;Jonathan W. Essex","doi":"10.1016/j.ultramic.2023.113882","DOIUrl":"https://doi.org/10.1016/j.ultramic.2023.113882","url":null,"abstract":"<div><p>Simulations of cryo-electron microscopy (cryo-EM) images of biological samples can be used to produce test datasets to support the development of instrumentation, methods, and software, as well as to assess data acquisition and analysis strategies. To be useful, these simulations need to be based on physically realistic models which include large volumes of amorphous ice. The gold standard model for EM image simulation is a physical atom-based ice model produced using molecular dynamics simulations. Although practical for small sample volumes; for simulation of cryo-EM data from large sample volumes, this can be too computationally expensive. We have evaluated a Gaussian Random Field (GRF) ice model which is shown to be more computationally efficient for large sample volumes. The simulated EM images are compared with the gold standard atom-based ice model approach and shown to be directly comparable. Comparison with experimentally acquired data shows the Gaussian random field ice model produces realistic simulations. The software required has been implemented in the Parakeet software package and the underlying atomic models are available online for use by the wider community.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-11-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399123001997/pdfft?md5=41f8dc87b7909c3e15715682352759e0&pid=1-s2.0-S0304399123001997-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134656193","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On central focusing for contrast optimization in direct electron ptychography of thick samples 在厚样品的直接电子ptychography中用于对比度优化的中心聚焦。
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-11-03 DOI: 10.1016/j.ultramic.2023.113879
C. Gao, C. Hofer, T.J. Pennycook

Ptychography provides high dose efficiency images that can reveal light elements next to heavy atoms. However, despite ptychography having an otherwise single signed contrast transfer function, contrast reversals can occur when the projected potential becomes strong for both direct and iterative inversion ptychography methods. It has recently been shown that these reversals can often be counteracted in direct ptychography methods by adapting the focus. Here we provide an explanation of why the best contrast is often found with the probe focused to the middle of the sample. The phase contribution due to defocus at each sample slice above and below the central plane in this configuration effectively cancels out, which can prevent contrast reversals when dynamical scattering effects are not overly strong. In addition we show that the convergence angle can be an important consideration for removal of contrast reversals in relatively thin samples.

Ptychography提供了高剂量效率的图像,可以揭示重原子旁边的轻元素。然而,尽管ptychography在其他方面具有单符号对比度传递函数,但当直接和迭代反演ptychographic方法的投影电位变高时,对比度反转可能发生。最近的研究表明,在直接的ptychography方法中,这些逆转通常可以通过调整焦点来抵消。在这里,我们解释了为什么探针聚焦在样本中间时通常会发现最佳对比度。在这种配置中,由于在中心平面上方和下方的每个样本切片处的散焦而导致的相位贡献有效地抵消了,这可以在动态散射效应不太强时防止对比度反转。此外,我们还表明,在相对较薄的样本中,收敛角可以是去除对比度反转的重要考虑因素。
{"title":"On central focusing for contrast optimization in direct electron ptychography of thick samples","authors":"C. Gao,&nbsp;C. Hofer,&nbsp;T.J. Pennycook","doi":"10.1016/j.ultramic.2023.113879","DOIUrl":"10.1016/j.ultramic.2023.113879","url":null,"abstract":"<div><p>Ptychography provides high dose efficiency images that can reveal light elements next to heavy atoms. However, despite ptychography having an otherwise single signed contrast transfer function, contrast reversals can occur when the projected potential becomes strong for both direct and iterative inversion ptychography methods. It has recently been shown that these reversals can often be counteracted in direct ptychography methods by adapting the focus. Here we provide an explanation of why the best contrast is often found with the probe focused to the middle of the sample. The phase contribution due to defocus at each sample slice above and below the central plane in this configuration effectively cancels out, which can prevent contrast reversals when dynamical scattering effects are not overly strong. In addition we show that the convergence angle can be an important consideration for removal of contrast reversals in relatively thin samples.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399123001961/pdfft?md5=b1f1bdb492cf974bc6d7b44dc8d13205&pid=1-s2.0-S0304399123001961-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72015480","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Optical STEM detection for scanning electron microscopy 扫描电子显微镜的光学STEM检测。
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-10-30 DOI: 10.1016/j.ultramic.2023.113877
Arent J. Kievits , B.H. Peter Duinkerken , Job Fermie , Ryan Lane , Ben N.G. Giepmans , Jacob P. Hoogenboom

Recent advances in electron microscopy techniques have led to a significant scale up in volumetric imaging of biological tissue. The throughput of electron microscopes, however, remains a limiting factor for the volume that can be imaged in high resolution within reasonable time. Faster detection methods will improve throughput. Here, we have characterized and benchmarked a novel detection technique for scanning electron microscopy: optical scanning transmission electron microscopy (OSTEM). A qualitative and quantitative comparison was performed between OSTEM, secondary and backscattered electron detection and annular dark field detection in scanning transmission electron microscopy. Our analysis shows that OSTEM produces images similar to backscattered electron detection in terms of contrast, resolution and signal-to-noise ratio. OSTEM can complement large scale imaging with (scanning) transmission electron microscopy and has the potential to speed up imaging in single-beam scanning electron microscope.

电子显微镜技术的最新进展导致了生物组织体积成像的显著扩大。然而,电子显微镜的吞吐量仍然是在合理时间内以高分辨率成像的体积的限制因素。更快的检测方法将提高吞吐量。在这里,我们对一种新的扫描电子显微镜检测技术进行了表征和基准测试:光学扫描透射电子显微镜(OSTEM)。在扫描透射电子显微镜中,对OSTEM、二次和反向散射电子检测以及环形暗场检测进行了定性和定量比较。我们的分析表明,OSTEM在对比度、分辨率和信噪比方面产生的图像类似于反向散射电子检测。OSTEM可以用(扫描)透射电子显微镜补充大规模成像,并有可能加快单束扫描电子显微镜的成像速度。
{"title":"Optical STEM detection for scanning electron microscopy","authors":"Arent J. Kievits ,&nbsp;B.H. Peter Duinkerken ,&nbsp;Job Fermie ,&nbsp;Ryan Lane ,&nbsp;Ben N.G. Giepmans ,&nbsp;Jacob P. Hoogenboom","doi":"10.1016/j.ultramic.2023.113877","DOIUrl":"10.1016/j.ultramic.2023.113877","url":null,"abstract":"<div><p>Recent advances in electron microscopy techniques have led to a significant scale up in volumetric imaging of biological tissue. The throughput of electron microscopes, however, remains a limiting factor for the volume that can be imaged in high resolution within reasonable time. Faster detection methods will improve throughput. Here, we have characterized and benchmarked a novel detection technique for scanning electron microscopy: optical scanning transmission electron microscopy (OSTEM). A qualitative and quantitative comparison was performed between OSTEM, secondary and backscattered electron detection and annular dark field detection in scanning transmission electron microscopy. Our analysis shows that OSTEM produces images similar to backscattered electron detection in terms of contrast, resolution and signal-to-noise ratio. OSTEM can complement large scale imaging with (scanning) transmission electron microscopy and has the potential to speed up imaging in single-beam scanning electron microscope.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"71486570","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Role of slice thickness quantification in the 3D reconstruction of FIB tomography data of nanoporous materials 薄片厚度量化在纳米多孔材料FIB层析成像数据三维重建中的作用
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-10-25 DOI: 10.1016/j.ultramic.2023.113878
Trushal Sardhara , Alexander Shkurmanov , Yong Li , Shan Shi , Christian J. Cyron , Roland C. Aydin , Martin Ritter

In focused ion beam (FIB) tomography, a combination of FIB with a scanning electron microscope (SEM) is used for collecting a series of planar images of the microstructure of nanoporous materials. These planar images serve as the basis for reconstructing the three-dimensional microstructure through segmentation algorithms. However, the assumption of a constant distance between consecutively imaged sections is generally invalid due to random variations in the FIB milling process. This variation complicates the accurate reconstruction of the three-dimensional microstructure. Using synthetic FIB tomography data, we present an algorithm that repositions slices according to their actual thickness and interpolates the results using machine learning-based methods. We applied our algorithm to real datasets, comparing two standard approaches of microstructure reconstruction: on-the-fly via image processing and ruler-based via sample structuring. Our findings indicate that the ruler-based method, combined with our novel slice repositioning and interpolation algorithm, exhibits superior performance in reconstructing the microstructure.

在聚焦离子束(FIB)层析成像中,将FIB与扫描电子显微镜(SEM)相结合,采集了纳米多孔材料微观结构的一系列平面图像。这些平面图像是通过分割算法重建三维微观结构的基础。然而,由于FIB铣削过程中的随机变化,连续成像截面之间的距离恒定的假设通常是无效的。这种变化使三维微观结构的精确重建变得复杂。利用合成FIB层析成像数据,我们提出了一种算法,该算法根据切片的实际厚度重新定位切片,并使用基于机器学习的方法对结果进行插值。我们将该算法应用于实际数据集,比较了两种标准的微观结构重建方法:基于图像处理的实时微观结构重建方法和基于尺子的基于样本结构重建方法。研究结果表明,基于尺子的方法,结合我们的新切片重定位和插值算法,在重建微观结构方面表现出优异的性能。
{"title":"Role of slice thickness quantification in the 3D reconstruction of FIB tomography data of nanoporous materials","authors":"Trushal Sardhara ,&nbsp;Alexander Shkurmanov ,&nbsp;Yong Li ,&nbsp;Shan Shi ,&nbsp;Christian J. Cyron ,&nbsp;Roland C. Aydin ,&nbsp;Martin Ritter","doi":"10.1016/j.ultramic.2023.113878","DOIUrl":"https://doi.org/10.1016/j.ultramic.2023.113878","url":null,"abstract":"<div><p>In focused ion beam (FIB) tomography, a combination of FIB with a scanning electron microscope (SEM) is used for collecting a series of planar images of the microstructure of nanoporous materials. These planar images serve as the basis for reconstructing the three-dimensional microstructure through segmentation algorithms. However, the assumption of a constant distance between consecutively imaged sections is generally invalid due to random variations in the FIB milling process. This variation complicates the accurate reconstruction of the three-dimensional microstructure. Using synthetic FIB tomography data, we present an algorithm that repositions slices according to their actual thickness and interpolates the results using machine learning-based methods. We applied our algorithm to real datasets, comparing two standard approaches of microstructure reconstruction: <em>on-the-fly</em> via image processing and <em>ruler-based</em> via sample structuring. Our findings indicate that the <em>ruler-based</em> method, combined with our novel slice repositioning and interpolation algorithm, exhibits superior performance in reconstructing the microstructure.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S030439912300195X/pdfft?md5=62650ccf6925bd8a723f9835a48daf18&pid=1-s2.0-S030439912300195X-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"92046564","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Experimental evaluation of usable specimen thickness of Si for lattice imaging by transmission electron microscopy at 300 kV 在300kV下通过透射电子显微镜对用于晶格成像的Si的可用样品厚度的实验评估。
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-10-22 DOI: 10.1016/j.ultramic.2023.113876
Keita Kobayashi, Ryosuke Kizu

We evaluated the usable specimen thickness of Si for lattice imaging on a transmission electron microscopy (TEM) instrument operating at 300 kV and equipped with a complementary metal-oxide-semiconductor camera by using an original reference material (RM) and comparing the lattice images obtained from Si patterns of the RM with various thicknesses. Lattice images of the {111} planes of crystalline Si are successfully observed for patterns with thicknesses of up to 508 nm. However, the contrast of these lattice fringes at a thickness of 508 nm is not distinct, even when recorded using a longer exposure time (5.0 s) than that required to obtain lattice images of patterns with thicknesses of 316 nm or less (0.5 s). Based on these results, we conclude that the practical thickness of crystalline Si specimens for accurate structural analysis and TEM magnification calibration via lattice imaging is less than approximately 500 nm under the experimental conditions.

我们通过使用原始参考材料(RM)并比较从具有不同厚度的RM的Si图案获得的晶格图像,评估了在运行于300kV并配备有互补金属氧化物半导体相机的透射电子显微镜(TEM)仪器上用于晶格成像的Si的可用样品厚度。对于厚度高达508nm的图案,成功地观察到晶体Si的{111}平面的晶格图像。然而,即使使用比获得厚度为316nm或更小的图案的晶格图像所需的曝光时间(0.5s)更长的曝光时间进行记录,这些508nm厚度的晶格条纹的对比度也不明显。基于这些结果,我们得出结论,在实验条件下,用于通过晶格成像进行精确结构分析和TEM放大率校准的晶体Si样品的实际厚度小于大约500nm。
{"title":"Experimental evaluation of usable specimen thickness of Si for lattice imaging by transmission electron microscopy at 300 kV","authors":"Keita Kobayashi,&nbsp;Ryosuke Kizu","doi":"10.1016/j.ultramic.2023.113876","DOIUrl":"10.1016/j.ultramic.2023.113876","url":null,"abstract":"<div><p>We evaluated the usable specimen thickness of Si for lattice imaging on a transmission electron microscopy (TEM) instrument operating at 300 kV and equipped with a complementary metal-oxide-semiconductor camera by using an original reference material (RM) and comparing the lattice images obtained from Si patterns of the RM with various thicknesses. Lattice images of the {111} planes of crystalline Si are successfully observed for patterns with thicknesses of up to 508 nm. However, the contrast of these lattice fringes at a thickness of 508 nm is not distinct, even when recorded using a longer exposure time (5.0 s) than that required to obtain lattice images of patterns with thicknesses of 316 nm or less (0.5 s). Based on these results, we conclude that the practical thickness of crystalline Si specimens for accurate structural analysis and TEM magnification calibration via lattice imaging is less than approximately 500 nm under the experimental conditions.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"61565398","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reconstruction of Angstrom resolution exit-waves by the application of drift-corrected phase-shifting off-axis electron holography 用漂移校正相移离轴电子全息法重建埃分辨出口波。
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-10-22 DOI: 10.1016/j.ultramic.2023.113880
J. Lindner , U. Ross , T. Meyer , V. Boureau , M. Seibt , Ch. Jooss

Phase-shifting electron holography is an excellent method to reveal electron wave phase information with very high phase sensitivity over a large range of spatial frequencies. It circumvents the limiting trade-off between fringe spacing and visibility of standard off-axis holography. Previous implementations have been limited by the independent drift of biprism and sample. We demonstrate here an advanced drift correction scheme for the hologram series that exploits the presence of an interface of the TEM specimen to the vacuum area in the hologram. It allows to obtain reliable phase information up to 2π/452 at the 1 Å information limit of the Titan 80–300 kV environmental transmission electron microscope used, by applying a moderate voltage of 250 V to a single biprism for a fringe spacing of 1 Å. The obtained phase and amplitude information is validated at a thin Pt sample by use of multislice image simulation with the frozen lattice approximation and shows excellent agreement. The presented method is applicable in any TEM equipped with at least one electron biprism and thus enables achieving high resolution off-axis holography in various instruments including those for in-situ applications. A software implementation for the acquisition, calibration and reconstruction is provided.

相移电子全息术是一种在很大的空间频率范围内显示电子波相位信息的极好方法,具有很高的相位灵敏度。它规避了条纹间距和标准离轴全息可视性之间的限制权衡。以前的实现受到双棱镜和样本独立漂移的限制。我们在这里展示了一种先进的全息图漂移校正方案,该方案利用了TEM样品与全息图中真空区域的界面。它允许获得可靠的相位信息高达2π/452在1 Å信息限制的Titan 80-300 kV环境透射电子显微镜使用,通过施加250 V的中等电压,以一个条纹间距为1 Å的单双棱镜。利用冻结晶格近似的多层图像模拟,在薄铂样品上验证了所获得的相位和振幅信息,并显示出良好的一致性。所提出的方法适用于任何配备至少一个电子双棱镜的TEM,从而能够在包括原位应用在内的各种仪器中实现高分辨率离轴全息。提供了一种用于采集、校准和重建的软件实现。
{"title":"Reconstruction of Angstrom resolution exit-waves by the application of drift-corrected phase-shifting off-axis electron holography","authors":"J. Lindner ,&nbsp;U. Ross ,&nbsp;T. Meyer ,&nbsp;V. Boureau ,&nbsp;M. Seibt ,&nbsp;Ch. Jooss","doi":"10.1016/j.ultramic.2023.113880","DOIUrl":"10.1016/j.ultramic.2023.113880","url":null,"abstract":"<div><p>Phase-shifting electron holography is an excellent method to reveal electron wave phase information with very high phase sensitivity over a large range of spatial frequencies. It circumvents the limiting trade-off between fringe spacing and visibility of standard off-axis holography. Previous implementations have been limited by the independent drift of biprism and sample. We demonstrate here an advanced drift correction scheme for the hologram series that exploits the presence of an interface of the TEM specimen to the vacuum area in the hologram. It allows to obtain reliable phase information up to 2π/452 at the 1 Å information limit of the Titan 80–300 kV environmental transmission electron microscope used, by applying a moderate voltage of 250 V to a single biprism for a fringe spacing of 1 Å. The obtained phase and amplitude information is validated at a thin Pt sample by use of multislice image simulation with the frozen lattice approximation and shows excellent agreement. The presented method is applicable in any TEM equipped with at least one electron biprism and thus enables achieving high resolution off-axis holography in various instruments including those for in-situ applications. A software implementation for the acquisition, calibration and reconstruction is provided.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399123001973/pdfft?md5=1922ccc380c89e9aebb2472548a431e4&pid=1-s2.0-S0304399123001973-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89719649","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimizing experimental parameters for orbital mapping 优化轨道测绘实验参数。
IF 2.2 3区 工程技术 Q1 Physics and Astronomy Pub Date : 2023-10-18 DOI: 10.1016/j.ultramic.2023.113866
Manuel Ederer, Stefan Löffler

A new material characterization technique is emerging for the transmission electron microscope (TEM). Using electron energy-loss spectroscopy, real space mappings of the underlying electronic transitions in the sample, so called orbital maps, can be produced. Thus, unprecedented insight into the electronic orbitals responsible for most of the electrical, magnetic and optical properties of bulk materials can be gained. However, the incredibly demanding requirements on spatial as well as spectral resolution paired with the low signal-to-noise ratio severely limits the day-to-day use of this new technique. With the use of simulations, we strive to alleviate these challenges as much as possible by identifying optimal experimental parameters. In this manner, we investigate representative examples of a transition metal oxide, a material consisting entirely of light elements, and an interface between two different materials to find and compare acceptable ranges for sample thickness, acceleration voltage and electron dose for a scanning probe as well as for parallel illumination.

一种新的材料表征技术正在出现,用于透射电子显微镜(TEM)。使用电子能量损失谱,可以产生样品中潜在电子跃迁的实空间映射,即所谓的轨道映射。因此,可以对大块材料的大部分电学、磁学和光学性质的电子轨道进行前所未有的深入了解。然而,对空间和光谱分辨率的极高要求,加上低信噪比,严重限制了这项新技术的日常使用。通过使用模拟,我们努力通过确定最佳实验参数来尽可能减轻这些挑战。以这种方式,我们研究了过渡金属氧化物的代表性例子,过渡金属氧化物是一种完全由轻元素组成的材料,以及两种不同材料之间的界面,以找到并比较扫描探针以及平行照明的样品厚度、加速电压和电子剂量的可接受范围。
{"title":"Optimizing experimental parameters for orbital mapping","authors":"Manuel Ederer,&nbsp;Stefan Löffler","doi":"10.1016/j.ultramic.2023.113866","DOIUrl":"10.1016/j.ultramic.2023.113866","url":null,"abstract":"<div><p>A new material characterization technique is emerging for the transmission electron microscope (TEM). Using electron energy-loss spectroscopy, real space mappings of the underlying electronic transitions in the sample, so called orbital maps, can be produced. Thus, unprecedented insight into the electronic orbitals responsible for most of the electrical, magnetic and optical properties of bulk materials can be gained. However, the incredibly demanding requirements on spatial as well as spectral resolution paired with the low signal-to-noise ratio severely limits the day-to-day use of this new technique. With the use of simulations, we strive to alleviate these challenges as much as possible by identifying optimal experimental parameters. In this manner, we investigate representative examples of a transition metal oxide, a material consisting entirely of light elements, and an interface between two different materials to find and compare acceptable ranges for sample thickness, acceleration voltage and electron dose for a scanning probe as well as for parallel illumination.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-10-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49692624","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Ultramicroscopy
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1