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2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics最新文献

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Sputtering Highly C-axis-oriented AlN films on Langasite Substrate 在Langasite衬底上溅射高c轴取向AlN薄膜
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393197
S. Wu, Maw-Shung Lee, R. Ro, J. Tsai, D. Hwu
Highly c-axis-oriented and fine structural AIN films were successfully prepared on Langasite substrate (LGS, La3Ga5SiO14) by RF magnetron sputtering. The crystalline structure of the films was determined by X-ray diffraction (XRD) and the surface microstructure of films was quantitatively investigated by using scanning electron microscope (SEM) and atomic force microscope (AFM). Different sputtering times (1 hr, 2 hr and 3 hr) were used to deposit the films, and the thickness of films were 0.77 mum, 1.89 mum and 2.86 mum respectively. The result exhibited the films with 0.77 mum were amorphous structures. The films with 1.89 mum were mixed-orientation AIN crystalline structures, including (002) and (103) planes. As the films thickness increased to 2.86 mum, the highly c-axis-oriented AIN crystalline structures were exhibited.
采用射频磁控溅射技术在Langasite衬底(LGS, La3Ga5SiO14)上成功制备了高c轴取向的AIN薄膜。采用x射线衍射(XRD)测定了膜的晶体结构,并采用扫描电镜(SEM)和原子力显微镜(AFM)对膜的表面微观结构进行了定量研究。采用不同的溅射时间(1小时、2小时和3小时)沉积薄膜,薄膜厚度分别为0.77、1.89和2.86 mum。结果表明,含0.77 mum的薄膜为非晶结构。1.89 mum的薄膜是混合取向的AIN晶体结构,包括(002)面和(103)面。当薄膜厚度增加到2.86 mm时,表现出高度c轴取向的AIN晶体结构。
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引用次数: 2
Ferroelectric Thin-Film Devices: Failure Mechanisms and New Prototype Nano-Structures 铁电薄膜器件:失效机制和新型纳米结构原型
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393150
J. Scott, F. Morrison, Y. K. Hoo, A. Milliken, H. Fan, S. Kawasaki, M. Miyake, T. Tatsuta, O. Tsuji
Several fundamental physics problems concerning ferroelectric thin films are discussed with direct application to industry problems. The first is a model of dielectric breakdown under d.c. voltage stressing, extended from single capacitor films to multilayer capacitors (MLCs). The second is an analysis of flash-over (arcing) breakdown in MLCs, including those with base metal electrodes (Ni). The third is the demonstration that any equivalent circuit model for real ferroelectric memories (FRAMs) must include a constant phase element (CPE). We then consider novel new prototype devices with industry potential for commercialization: three-dimensional [3D] DRAM capacitor trenches; piezoelectric nanotubes; and carbon nano-wire arrays with ferroelectric tips.
讨论了有关铁电薄膜的几个基本物理问题,并将其直接应用于工业问题。首先是直流电压应力下的介质击穿模型,从单电容器薄膜扩展到多层电容器(MLCs)。第二部分是mlc中闪过击穿的分析,包括那些带有贱金属电极(Ni)的mlc。第三是证明任何实际铁电存储器(FRAMs)的等效电路模型都必须包含一个恒相元件(CPE)。然后,我们考虑具有商业化行业潜力的新型原型器件:三维[3D] DRAM电容器沟槽;压电纳米管;以及带有铁电尖端的碳纳米线阵列。
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引用次数: 1
Low Temperature Preparation of Bismuth-Related Ferroelectrics by Hydrothermal Synthesis 水热法低温制备铋相关铁电体
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393193
A. Inoue, Tho Truong Nguyen, M. Noda, M. Okuyama
BIT powder is prepared by hydrothermal synthesis. It is found that the formation of BIT powder is affected by KOH concentration because the XRD intensity increases with increasing the KOH concentration less than 2.0 M. The products are yellowish gray and consist of microscopic lamellar platelets of 0.5 -1.5 mum. Treatment tempereatures are 160 -240 deg C and is decreased with increasing the holding time. The BIT thin films are prepared below 350 deg C by the sol-gel method and hydrothermal treatment for 3 h in Bi(OH)3 0.14 M and KOH 0.01 M mixture solution. The BIT thin film prepared under the optimized condition have hysteresis loops with a good squareness. When 5 V is applied to the BIT film, the polarization at zero electric field is 0.9 muC/cm2 and current density is 8.1x10-6 A/cm2.
采用水热合成法制备了BIT粉末。在KOH浓度小于2.0 m时,随着KOH浓度的增加,XRD强度增大,结果表明BIT粉末的形成受KOH浓度的影响,产物呈黄灰色,由0.5 ~ 1.5 μ m的微观片片状片状组成。处理温度为160 -240℃,随保温时间的增加而降低。在Bi(OH)3 0.14 M和KOH 0.01 M的混合溶液中,采用溶胶-凝胶法和水热处理3 h,在350℃以下制备了BIT薄膜。在优化条件下制备的BIT薄膜具有良好的方形磁滞回线。当施加5 V时,零电场下的极化为0.9 μ c /cm2,电流密度为8.1 × 10-6 A/cm2。
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引用次数: 4
Octahedral Tilting and Ferroelectric Order in Tetragonal Tungsten Bronze-Like Dielectrics 四方类钨青铜介电体中的八面体倾斜和铁电有序
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393236
I. Levin, M. Stennett, G. C. Miles, D. I. Woodward, A. West, I. Reaney
The onset of classic ferroelectric behavior in tetragonal tungsten bronze-like dielectrics Ba2LaxNd1-xNb3Ti2O15 was attributed to a strong coupling between local polar displacements and a certain type of octahedral tilting. The ferroelectric phase transition in these systems is associated with a transformation of an incommensurate tilted structure to a distinct commensurate superstructure. The driving force for commensurate tilting increases as the average ionic radius of the rare-earth ion that reside in perovskite type channels decreases. No classical ferroelectric transition is observed (down to 100 K) for compositions with x>0.75, which remain incommensurate and exhibit only relaxor behavior below room temperature.
Ba2LaxNd1-xNb3Ti2O15中经典铁电行为的发生归因于局部极性位移和某种八面体倾斜之间的强耦合。这些体系中的铁电相变与不相称的倾斜结构向明显相称的上层结构的转变有关。随着钙钛矿型通道中稀土离子的平均离子半径的减小,相应倾斜的驱动力增加。对于x>0.75的组合物,没有观察到经典的铁电跃迁(低至100 K),在室温下仍然不相称,只表现出弛豫行为。
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引用次数: 1
Determination of Lumped Element Package Model for Radio Frequency Surface Acoustic Wave Device Using Neural Network Techniques 用神经网络技术确定射频表面声波器件集总元件封装模型
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393395
S.T. Wang, Zhi-Feng Xie, Tzu-Te Liu, R. Hwang
Electronic packaging has a significant influence on RF surface acoustic wave (SAW) device. Hence, how to incorporate packaging effects into SAW simulation is an important issue. In this paper, neural network was employed to determine the lumped element models of bonding pads. As an example, an RF SAW filter used in GPS system was examined. The result showed a good agreement with that obtained from full wave EM simulator.
电子封装对射频表面声波(SAW)器件的性能有重要影响。因此,如何将封装效应纳入声表面波仿真是一个重要的问题。本文采用神经网络方法确定了键合垫的集总单元模型。以射频声波滤波器为例,对其在GPS系统中的应用进行了研究。仿真结果与全波仿真结果吻合较好。
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引用次数: 0
High Frequency Piezoelectric MEMS Devices 高频压电MEMS器件
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393375
I. Mina, G.H. Kim, I. Kim, S. Park, K. Choi, T. Jackson, R. Tutwiler, S. Trolier-McKinstry
High frequency ultrasound array transducers are being explored for high resolution imaging systems. This increase in resolution is made possible by enabling a simultaneous increase in operating frequency (50 MHz to about 1 GHz) and close-coupling of the electrical circuitry. Several different processing methods are being explored to fabricate array transducers. In one implementation, the piezoelectric transducer is prepared by mist deposition of PbZr0.52Ti0.48O3 (PZT) films over Ni posts. In addition, a xylophone bar transducer has also been prototyped, again using thin film PZT as the active piezoelectric layer. Because the drive voltages of these transducers are low, close coupling of the electrical circuitry is possible. A CMOS transceiver for a 9 element-array has been fabricated in 0.35 mum process technology. The first generation CMOS transceiver chip contains beamforming electronics, receiver circuitry, and analog to digital converters with 27 Kbyte on-chip buffer memory.
高频超声阵列换能器正在探索用于高分辨率成像系统。通过同时增加工作频率(50 MHz至约1 GHz)和电路的紧密耦合,分辨率的提高成为可能。正在探索几种不同的加工方法来制造阵列换能器。在一种实现中,压电换能器是通过在Ni柱上雾沉积PbZr0.52Ti0.48O3 (PZT)薄膜来制备的。此外,木琴杆换能器也已原型化,再次使用薄膜PZT作为有源压电层。由于这些换能器的驱动电压很低,电路的紧密耦合是可能的。采用0.35 μ m工艺制备了9元阵列CMOS收发器。第一代CMOS收发芯片包含波束成形电子器件、接收电路和带有27 kb片上缓冲存储器的模数转换器。
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引用次数: 0
Ferroelectric Random Access Memory Using Pb(Zr,Ti,Nb)O3 Films 基于Pb(Zr,Ti,Nb)O3薄膜的铁电随机存储器
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393155
T. Kijima, T. Aoyama, H. Miyazawa, Y. Hamada, K. Ohashi, M. Nakayama, N. Furuya, A. Matsumoto, E. Natori, K. Tanaka, T. Shimoda
We have succeeded in fabricating Pb(Zr,Ti,Nb)O3 (PZTN) thin films with 20-atomic% Nb at B site in ABO3 structure, which was suitable for high density and reliable ferroelectric random access memory (FeRAM). A sol-gel spin-coating method was used to prepare the PZTN thin films. 1 mol% Si co-doping was applied to promote the solid-solution of Nb atom into the original Pb(Zr,Ti)O3 films. We suggested that in our PZTN the oxygen vacancies were well suppressed due to Nb substitution comparing with conventional Pb(Zr,Ti)O3 (PZT). We also succeeded in obtaining excellent electric properties in 1times1 mum2 capacitors with PZTN. In addition, we confirmed the no data degradation and the high reliability of our PZTN material has been demonstrated by 64 k-bits FeRAM chip operation.
我们成功地在ABO3结构中制备了B位Nb原子数为20%的Pb(Zr,Ti,Nb)O3 (PZTN)薄膜,该薄膜适用于高密度、可靠的铁电随机存取存储器(FeRAM)。采用溶胶-凝胶旋涂法制备了PZTN薄膜。采用1mol % Si共掺杂,促进Nb原子固溶到原Pb(Zr,Ti)O3薄膜中。我们认为,与传统的Pb(Zr,Ti)O3 (PZT)相比,在我们的PZTN中,由于Nb取代,氧空位得到了很好的抑制。我们还成功地用PZTN制备了1times1mum2电容器,获得了优异的电性能。此外,我们证实了PZTN材料的无数据退化和高可靠性已被64 k位FeRAM芯片操作证明。
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引用次数: 0
Development of Multilayered SrTiO3 Thin-Film Capacitors For Embedded Passive Applications 嵌入式被动应用多层SrTiO3薄膜电容器的研制
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393306
Shuqiang Wang, A. Hattori, Y. Ozeki, H. Ogawa
Multilayered thin-film capacitors (MLTFC) with SrTiO3 (STO) dielectric and Pt electrode thin layers were fabricated on polycrystalline alumina substrates, in which amorphous STO dielectric thin layers with thicknesses of 100-300 nm were formed using a cost-effective aerosol chemical vapor deposition (ASCVD) method. The MLTFC with up to ten-layer dielectric layers and total thickness of 0.2-0.25 mm, reached capacitance densities of 100-900 nF/cm2. Further increase in capacitance density of the MLTFC was tried by reduction in thickness and crystallization of STO dielectric thin layers. Three forms of MLTFC (chips, sheets and substrates) are being developed for embedded passive applications.
采用高性价比的气溶胶化学气相沉积(ASCVD)方法,在多晶氧化铝衬底上制备了SrTiO3 (STO)介质和Pt电极薄层的多层薄膜电容器(MLTFC)。MLTFC具有多达10层的介电层,总厚度为0.2-0.25 mm,电容密度达到100-900 nF/cm2。通过减小STO介电薄层的厚度和结晶,进一步提高了MLTFC的电容密度。三种形式的MLTFC(芯片,片和基板)正在开发用于嵌入式无源应用。
{"title":"Development of Multilayered SrTiO3 Thin-Film Capacitors For Embedded Passive Applications","authors":"Shuqiang Wang, A. Hattori, Y. Ozeki, H. Ogawa","doi":"10.1109/ISAF.2007.4393306","DOIUrl":"https://doi.org/10.1109/ISAF.2007.4393306","url":null,"abstract":"Multilayered thin-film capacitors (MLTFC) with SrTiO3 (STO) dielectric and Pt electrode thin layers were fabricated on polycrystalline alumina substrates, in which amorphous STO dielectric thin layers with thicknesses of 100-300 nm were formed using a cost-effective aerosol chemical vapor deposition (ASCVD) method. The MLTFC with up to ten-layer dielectric layers and total thickness of 0.2-0.25 mm, reached capacitance densities of 100-900 nF/cm2. Further increase in capacitance density of the MLTFC was tried by reduction in thickness and crystallization of STO dielectric thin layers. Three forms of MLTFC (chips, sheets and substrates) are being developed for embedded passive applications.","PeriodicalId":321007,"journal":{"name":"2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115921481","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
(Na0.475K0.475Li0.05)(Nb0.92Ta0.05Sb0.03)O3 lead-free ceramics with addition of CeO2 添加CeO2的(Na0.475K0.475Li0.05)(Nb0.92Ta0.05Sb0.03)O3无铅陶瓷
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393364
T. Lee, K. Kwok, H. Chan
Lead-free piezoelectric ceramics (Na0.475K0.475Li0.05)(Nb0.92Ta0.05Sb0.03)O3 added with different amounts of CeO2 have been prepared by a conventional mixed-oxide method. After the addition of CeO2, the sintering performance of the ceramics is greatly improved. The ceramics can be well-sintered at a higher temperature, and hence have a higher density and better piezoelectric and dielectric properties. For the ceramic added with 0.4 wt% CeO2, the piezoelectric and dielectric properties become optimum, giving d33=246 pC/N, kp=0.50, epsivr=1300 and tandelta=4%.
采用常规混合氧化法制备了添加不同量CeO2的无铅压电陶瓷(Na0.475K0.475Li0.05)(Nb0.92Ta0.05Sb0.03)O3。添加CeO2后,陶瓷的烧结性能得到了很大的改善。该陶瓷可以在较高的温度下烧结良好,因此具有较高的密度和更好的压电和介电性能。当CeO2添加量为0.4 wt%时,陶瓷的压电和介电性能最佳,d33=246 pC/N, kp=0.50, epsivr=1300,钽δ =4%。
{"title":"(Na0.475K0.475Li0.05)(Nb0.92Ta0.05Sb0.03)O3 lead-free ceramics with addition of CeO2","authors":"T. Lee, K. Kwok, H. Chan","doi":"10.1109/ISAF.2007.4393364","DOIUrl":"https://doi.org/10.1109/ISAF.2007.4393364","url":null,"abstract":"Lead-free piezoelectric ceramics (Na<sub>0.475</sub>K<sub>0.475</sub>Li<sub>0.05</sub>)(Nb<sub>0.92</sub>Ta<sub>0.05</sub>Sb<sub>0.03</sub>)O<sub>3</sub> added with different amounts of CeO<sub>2</sub> have been prepared by a conventional mixed-oxide method. After the addition of CeO<sub>2</sub>, the sintering performance of the ceramics is greatly improved. The ceramics can be well-sintered at a higher temperature, and hence have a higher density and better piezoelectric and dielectric properties. For the ceramic added with 0.4 wt% CeO<sub>2</sub>, the piezoelectric and dielectric properties become optimum, giving d<sub>33</sub>=246 pC/N, k<sub>p</sub>=0.50, epsiv<sub>r</sub>=1300 and tandelta=4%.","PeriodicalId":321007,"journal":{"name":"2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123479630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
First Principles Calculations for Valence States of Mn in SrTiO3 SrTiO3中Mn价态的第一性原理计算
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393230
Y. Iwazaki, T. Suzuki, H. Kishi, S. Tsuneyuki
The valence change mechanism of doped Mn in SrTiO3 has been discussed on the basis of the first-principles calculation results. These results show that the crystal with Mn2+ is stabilized by a peculiar tilting deformation of the MnO6 octahedron, whereas the crystal with Mn4+ does not exhibit such tilting. The valence of Mn is closely related to the lattice deformation, and the experimentally observed change in the valence of Mn in SrTiO3 can be well explained by the thermal excitations of the tilting modes of MnO6.
在第一性原理计算结果的基础上,讨论了掺杂Mn在SrTiO3中的价态变化机理。结果表明,含Mn2+的晶体是通过MnO6八面体的倾斜变形来稳定的,而含Mn4+的晶体则没有这种倾斜变形。Mn的价态与晶格变形密切相关,实验中观察到的Mn在SrTiO3中的价态变化可以用MnO6倾斜模式的热激发来解释。
{"title":"First Principles Calculations for Valence States of Mn in SrTiO3","authors":"Y. Iwazaki, T. Suzuki, H. Kishi, S. Tsuneyuki","doi":"10.1109/ISAF.2007.4393230","DOIUrl":"https://doi.org/10.1109/ISAF.2007.4393230","url":null,"abstract":"The valence change mechanism of doped Mn in SrTiO<sub>3</sub> has been discussed on the basis of the first-principles calculation results. These results show that the crystal with Mn<sup>2+</sup> is stabilized by a peculiar tilting deformation of the MnO<sub>6</sub> octahedron, whereas the crystal with Mn<sup>4+</sup> does not exhibit such tilting. The valence of Mn is closely related to the lattice deformation, and the experimentally observed change in the valence of Mn in SrTiO<sub>3</sub> can be well explained by the thermal excitations of the tilting modes of MnO<sub>6</sub>.","PeriodicalId":321007,"journal":{"name":"2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122050022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics
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