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2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics最新文献

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Non-Volatile Memory Concepts Based on Resistive Switching 基于电阻开关的非易失性存储器概念
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393162
R. Waser
A wide spectrum of resistively switching metal-insulator-metal systems has been proposed for future non-volatile memory applications. This paper attempts a classification of the phenomena and the conceivable microscopic mechanism.
广泛的电阻开关金属-绝缘体-金属系统已被提出用于未来的非易失性存储器应用。本文试图对这些现象进行分类,并对可能的微观机理进行探讨。
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引用次数: 2
Effects of Rapid Thermal Annealing on Nucleation and Growth Behavior of Lead Zirconate Titanate Films 快速热处理对锆钛酸铅薄膜成核和生长行为的影响
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393174
Jian Lu, Yi Zhang, T. Ikehara, Takashi Mihara, R. Maeda
This paper investigated the effects of rapid thermal annealing (RTA) on nucleation and growth behavior of sol-gel derived lead zirconate titanate (PZT) films. The effects of RTA on films' surface morphology, residual stress and orientation were also studied. It was found that residual stress of the film can be effectively reduced by extending the RTA time. High heating-rate was preferred for uniform PZT film nucleation and grain-growth, which resulted in dense microstructures and smooth film surface. Low heating-rate lead to strong PZT (100) orientation and low residual stress, but at the risk of film-crack caused by arbitrarily distributed large crystallites of about 300 nm in diameter among those with diameter of ~30 nm.
研究了快速热退火(RTA)对溶胶-凝胶衍生锆钛酸铅(PZT)薄膜成核和生长行为的影响。研究了RTA对薄膜表面形貌、残余应力和取向的影响。结果表明,延长RTA时间可以有效降低薄膜的残余应力。高升温速率有利于PZT薄膜的成核和晶粒的生长,使得薄膜的组织致密,表面光滑。低加热速率使PZT(100)取向强,残余应力小,但在~30 nm的晶粒中,直径约300 nm的大晶粒任意分布,有形成薄膜裂纹的危险。
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引用次数: 1
Electron emission from ferroelectric thin films enhanced by the presence of ferroelectric domains 铁电畴的存在增强了铁电薄膜的电子发射
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393261
G. Suchaneck, V. S. Vidyarthi, G. Milde, G. Gerlach, A. Solnyshkin, I. Kislova, T. Otto, R. Reichenbach, H. Klumbies, O. Mieth, L. Eng
In this work ferroelectric domain enhanced electron emission mechanisms are proposed. The polarization distribution near 90deg domain walls is calculated by solving a set of second order differential equations including the Poisson's one and equations derived from an expansion of the free energy Phi(P) in power series of the polarization according to the Devonshire-Landau-Ginzburg theory. Domain walls intersecting the emitting surface cause sufficient electric fields and lower the potential barrier for electron emission. This induces centers of enhanced electron emission. Relaxing domain walls were found to excitate trapped excess electrons in front of the wall.
本文提出了铁电畴增强电子发射机制。根据Devonshire-Landau-Ginzburg理论,通过求解一组二阶微分方程,包括泊松方程和由极化幂级数中自由能Phi(P)展开的方程,计算了90°畴壁附近的极化分布。与发射面相交的畴壁产生了足够的电场,降低了电子发射的势垒。这就产生了增强的电子发射中心。弛豫畴壁可以激发畴壁前的多余电子。
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引用次数: 5
Key process technology for high density 64M FeRAM and beyond 高密度64M FeRAM及以上的关键工艺技术
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393153
K. Yamakawa, T. Ozaki, H. Kanaya, I. Kunishima, Y. Kumura, Y. Shimojo, S. Shuto, O. Hidaka, Yuki Yamada, S. Yamazaki, S. Shiratake, D. Takashima, T. Miyakawa, S. Ohtsuki, T. Hamamoto
Difficulty to achieve high density FeRAMs with sub-micron ferroelectric capacitors is widely understood due to damage to the capacitors. Key process techniques such as high quality ferroelectric film deposition, electrode preparation, capacitor RIE and hydrogen barrier structure formation are introduced for 64M FeRAMs with sub micron high reliability PZT capacitors.
用亚微米铁电电容器实现高密度feram的困难是众所周知的,因为电容器的损坏。介绍了采用亚微米高可靠性PZT电容器的64M feram的高质量铁电薄膜沉积、电极制备、电容器RIE和氢势垒结构形成等关键工艺技术。
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引用次数: 0
A General Approach to Perturbation Theoretic Calculations of Nonlinear Susceptibility Coefficient Tensors for Ferroelectric Materials 铁电材料非线性磁化系数张量摄动理论计算的一般方法
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393234
J. F. Webb
Perturbation analysis in which the time variation of an electric field is treated as inducing a weakly nonlinear response that is expressed as a Taylor series expansion is a standard technique for deriving the nonlinear susceptibility coefficients that relate the electric field to the polarization. In this paper a generalized method is used to generate the coefficients and Fourier analysis is employed in order to treat any time dependent electric field as a superposition of single frequency waves. It is then shown how this method can be applied to the calculation of nonlinear susceptibility coefficients in bulk ferroelectric materials in such a way that preserves the tensorial nature of the coefficients, appropriate for crystalline materials. An advantage of this general approach is that it is useful for the development of computer modelling packages involving nonlinear calculations.
在微扰分析中,电场的时变被看作是诱导弱非线性响应,这种响应被表示为泰勒级数展开,这是推导电场与极化相关的非线性磁化系数的标准技术。本文采用一种广义的方法来产生系数,并采用傅里叶分析将任何时变电场视为单频波的叠加。然后展示了如何将该方法应用于块状铁电材料的非线性磁化系数的计算,从而保留了系数的张量性质,适用于晶体材料。这种通用方法的一个优点是,它对开发涉及非线性计算的计算机建模包很有用。
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引用次数: 0
Temperature Properties of PZT Actuated High-Speed Metal-Based Optical Resonant Scanners PZT驱动高速金属基光学谐振扫描仪的温度特性
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393379
Jaehyuk Park, Youngkyu Park, J. Akedo
High speed metal-based optical scanning devices were successfully fabricated in combination with piezoelectric thick films directly deposited by the aerosol deposition method (ADM) and specially designed stainless steel frame. A large optical scanning angle (41deg) was achieved at a high resonance frequency (28.24 kHz) in ambient air without vacuum packaging. The well-polished metal-based mirror has good flatness of less than 105 nm, which is lower than omega4. Sepcially, we carried out in the range from -20'C to 80'C at environmental chamber to investigate temperature properties of metal-based optical scanner. The scanning angle is linearly increased with increase of temperature, while the resonant frequency is linearly decreased as temperature increased. Also, we compared with performance of metal-based optical scanner driven by bulk PZT and AD-PZT thick films.
采用气溶胶沉积法(ADM)直接沉积压电厚膜和特殊设计的不锈钢框架,成功制备了高速金属基光学扫描器件。在没有真空封装的环境空气中,以高共振频率(28.24 kHz)实现了大的光学扫描角(41°)。抛光良好的金属基镜面具有良好的平整度,小于105nm,低于omega4。特别地,我们在-20℃到80℃的环境室内进行了金属基光学扫描仪的温度特性研究。扫描角随温度的升高而线性增大,谐振频率随温度的升高而线性减小。此外,我们还比较了大块PZT和AD-PZT厚膜驱动的金属基光学扫描仪的性能。
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引用次数: 1
Electrical and electromechanical characterization of piezoelectric thin films in view of MEMS application 基于MEMS应用的压电薄膜电学和机电特性研究
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393376
S. Tiedke, K. Prume, T. Schmitz-Kempen
The electrical and electromechanical properties of piezoelectric thin films were measured using different measurement procedures including a new method which combines the measurement of both the effective longitudinal and transverse piezoelectric coefficients on the same sample under precisely defined homogeneous mechanical strain utilizing a 4-point bending setup. Stress and corresponding strain distributions in the film were verified by finite element simulations.
采用不同的测量方法测量了压电薄膜的电学和机电性能,其中包括一种利用四点弯曲装置在精确定义的均匀机械应变下测量同一样品上的有效纵向和横向压电系数的新方法。通过有限元模拟验证了膜内的应力和相应的应变分布。
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引用次数: 0
Deposition of piezoelectric AlN thin film on diamond substrate for SHF SAW devices 在SHF SAW器件的金刚石衬底上沉积压电AlN薄膜
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393390
T. Omori, K. Chida, A. Yuki, K. Hashimoto, M. Yamaguchi
The preparation of piezoelectric AIN thin films of high quality onto diamond substrates using DC-TFTS method and its application to SHF SAW devices are discussed. FWHM (=3.4deg) of the rocking curve of XRD suggested that the c-axes of AIN films may well align perpendicular to the film surface. Transversal filters based on Sezawa wave were fabricated to verify whether the prepared AIN/diamond structure can be applied to low loss SAW devices in an SHF range. The propagation loss was experimentally estimated to be 0.08 dB/lambda at the centre frequency of 6.12 GHz. Further reduction in the propagation loss was attempted by using small-grain-diamond substrates.
讨论了用DC-TFTS方法在金刚石衬底上制备高质量的压电AIN薄膜及其在SHF SAW器件中的应用。XRD摇摆曲线的FWHM(=3.4°)表明,AIN薄膜的c轴可以很好地垂直于薄膜表面。制作了基于Sezawa波的横向滤波器,以验证所制备的AIN/金刚石结构是否可以应用于SHF范围内的低损耗SAW器件。实验估计在6.12 GHz的中心频率下,传输损耗为0.08 dB/lambda。通过使用小晶粒金刚石衬底,进一步降低了传播损耗。
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引用次数: 1
Drift of charged defects in local fields as a mechanism of degradation in ferroelectrics 局部电场中带电缺陷漂移作为铁电体退化机制
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393250
Y. Genenko, D. Lupascu
Two-dimensional model of point defect migration in ferroelectrics is advanced. Charge defect drift-diffusion in local depolarization fields is considered as a mechanism for aging in ferroelectrics. Numerical results are given for the coupled problems of point defect transport and electrostatic field relaxation in a 2D domain configuration. Peak values of the clamping pressure at domain walls due to space charge formation are in the range of 1divide10 MPa and the consequent coercive field is in the range of 1 kV/mm in agreement with observed coercive stresses and fields in bulk perovskite ferroelectrics.
提出了铁电体中点缺陷迁移的二维模型。局部去极化场中电荷缺陷漂移扩散被认为是铁电体老化的一种机制。给出了二维结构中点缺陷输运和静电场弛豫耦合问题的数值结果。在畴壁处由于空间电荷形成的夹紧压力峰值在1 / 10mpa范围内,由此产生的矫顽力场在1 kV/mm范围内,这与观察到的大块钙钛矿铁电体的矫顽力和场一致。
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引用次数: 0
Dielectric Characterization of Barium strontium titanate (BST) Films Prepared on Cu Substrate By Aerosol Deposited Method 气溶胶沉积法制备钛酸锶钡薄膜的介电特性
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393215
Se-Woong Oh, Jaehyuk Park, J. Akedo
Polycrystalline barium strontium titanate (BaxSr1-xTiO3, BST) films were directly prepared on copper substrate using aerosol deposition method (ADM) at room-temperature. We investigated the relationships between their properties such as dielectric constant and tunability, and Ba content in BaxSr1-xTiO3 (x=1.0, 0.6, 0.4) films. At the frequency of 100 kHz, the dielectric constant of the as-deposited BST film were 100, 201, and 72 at x = 1.0, 0.6, 0.4, respectively. After annealing in N2 gas ambient at 600degC for 10 min, the dielectric constant and dielectric loss of BST (x=0.6) film were 380 and 2.0 x 10-3 at 100 kHz, respectively. Moreover, BST (x=0.6) film even showed a high tunability of 30 % at an applied electric field of 300 kV cm-1.
采用气溶胶沉积法(ADM)在铜衬底上直接制备了多晶钛酸锶钡(BaxSr1-xTiO3, BST)薄膜。在BaxSr1-xTiO3 (x=1.0, 0.6, 0.4)薄膜中,研究了它们的介电常数、可调性和Ba含量之间的关系。在100 kHz频率下,x = 1.0、0.6、0.4时,沉积的BST膜的介电常数分别为100、201和72。BST (x=0.6)薄膜在600℃氮气环境下退火10 min后,在100 kHz下的介电常数和介电损耗分别为380和2.0 × 10-3。此外,在300 kV cm-1的外加电场下,BST (x=0.6)薄膜甚至表现出30%的高可调性。
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引用次数: 2
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2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics
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