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2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics最新文献

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System LSI Embedded Ferroelectric Memory Technology 系统LSI嵌入式铁电存储器技术
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393152
Y. Nagano, E. Fujii
System LSI embedded ferroelectric memory (FeRAM) operating at a very low voltage has been developed. The key technology of the low-voltage operation is the newly developed stacked ferroelectric capacitors completely encapsulated by hydrogen barriers, which enable us to eliminate hydrogen reduction of the ferroelectric thin film during the integration process. This technology is applied for not only the planer stachked ferroelectric capacitors but also the three-dimensional (3-D) capacitors, which is the most promising for mass production of 0.18-mum low-power system LSI-embedded FeRAM and beyond.
开发了工作在极低电压下的系统LSI嵌入式铁电存储器(FeRAM)。低压运行的关键技术是新开发的完全被氢势垒封装的叠层铁电电容器,使我们能够在集成过程中消除铁电薄膜的氢还原。该技术不仅适用于平面堆叠铁电电容器,也适用于三维(3-D)电容器,是大批量生产0.18 μ m低功耗系统lsi嵌入式FeRAM及以后的最有前景的技术。
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引用次数: 1
Bismuth Aluminate BiAlO3: A New Lead-free High-TC Piezo-/ferroelectric 铝酸铋BiAlO3:一种新型无铅高tc压电/铁电材料
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393363
J. Zylberberg, A. Belik, E. Takayama-Muromachi, Z. Ye
Ferroelectric materials have applications in non-volatile random access memory devices and micro electromechanical systems. For such applications, the materials must remain ferroelectric up to high temperatures. The best materials that currently exist for these applications are lead-containing compounds like Pb(Zr1-xTix)O3. Owing to the toxicity of lead, there is a demand for lead-free high-temperature ferroelectrics. Bismuth aluminate has been predicted to be one such material [1]. In this work, BiA1O3 is synthesized using a high-pressure high-temperature technique at 6 GPa and 1000degC. The diffraction experiments show that BiAlO3 crystallizes in a rhombohedral unit cell that is elongated along the c-axis (R3c; Z = 6; a = 5.37546(5) A and c = 13.3933(1) A). The characterization of the dielectric, ferroelectric, and piezoelectric properties of the ceramic BiAlO3 demonstrate that it is indeed a lead-free ferroelectric with a Curie temperature Tc > 520degC, a piezoelectric coefficient d33 = 28 pC/N and a room-temperature remnant polarization Pr = 9.5 muC/cm2. Pr increases with temperature, reaching 26.7 muC/cm2 at 225degC. The dielectric, ferroelectric and piezoelectric properties of BiAlO3 are comparable to those of BiFeO3 (BFO) and SrBi2Ta2O9 (SBT), making it a promising new high-Tc lead-free piezo-and ferroelectric for memory and transducer applications.
铁电材料在非易失性随机存储器和微机电系统中有着广泛的应用。对于这种应用,材料必须在高温下保持铁电性。目前用于这些应用的最佳材料是含铅化合物,如Pb(Zr1-xTix)O3。由于铅的毒性,人们对无铅高温铁电体有很大的需求。有人预测铝酸铋就是这样一种材料[1]。在这项工作中,采用高压高温技术在6 GPa和1000℃下合成了bia103。衍射实验表明,BiAlO3在沿c轴(R3c;Z = 6;a = 5.37546(5) a, c = 13.3933(1) a)。陶瓷BiAlO3的介电、铁电和压电性能的表征表明,它确实是一种无铅铁电材料,居里温度Tc > 520℃,压电系数d33 = 28 pC/N,室温残余极化Pr = 9.5 muC/cm2。Pr随温度升高而增大,在225℃时达到26.7 muC/cm2。BiAlO3的介电、铁电和压电性能与BiFeO3 (BFO)和SrBi2Ta2O9 (SBT)相当,使其成为一种有前途的新型高tc无铅压电和铁电材料,可用于存储器和换能器应用。
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引用次数: 3
Domain Structure in Ferroelectric PbTiO3 Nano-islands 铁电PbTiO3纳米岛的畴结构
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393256
Hee Han, Y. Park, Kilho Lee, S. Baik
Evolution of complex ferroelastic domain structures of PbTiO3 nano-islands grown epitaxially on Pt(001)/MgO(001) single crystal substrate by chemical solution deposition has been investigated by two-dimensional reciprocal space mapping technique using synchrotron X-ray diffraction. With decreasing lateral size and thickness of the nano-islands, the proportion of c-domains increased continuously and fully c-domain dominant structure was emerged. At the same time, some of a-domains in the twinned a/c/a/c type structure turned into the a-domains with defective domain boundaries aligned normal to the substrate plane. The relative proportions of two types of a-domains were also dependent on the lateral size of nano-islands. The smaller islands favored the aligned a-domains with defective domain boundaries, which seem to be due to extensive relaxation of confining strain imposed by the substrate.
利用同步x射线衍射技术研究了化学溶液沉积在Pt(001)/MgO(001)单晶衬底上外延生长的PbTiO3纳米岛复合铁弹性畴结构的演化过程。随着纳米岛横向尺寸和厚度的减小,c结构域的比例不断增加,形成完全的c结构域优势结构。同时,双晶a/c/a/c型结构中的部分a-畴转变为缺陷畴边界垂直于衬底平面的a-畴。两种a结构域的相对比例也取决于纳米岛的横向大小。较小的岛屿倾向于具有缺陷域边界的排列的a域,这似乎是由于底物施加的限制应变的广泛松弛。
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引用次数: 0
Structural and Electrical Properties of Ferroelectric-Gate Field-Effect-Transistors Using Au/(Bi,La)4Ti3O12/SrTa2O6/Si Structures Au/(Bi,La)4Ti3O12/SrTa2O6/Si结构的铁电栅场效应晶体管的结构和电学性能
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393169
Ho-Seung Jeon, Jeong-Hwan Kim, Joonam Kim, Kwang-Hun Park, Byung-Eun Park
We fabricated the ferroelectric-gate field effect transistors (Fe-FETs) using a metal-ferroelectric-insulator-semiconductor (MFIS) structure as a gate configuration using (Bi,La)4Ti3O12 (BLT) and SrTa2O6 (STA) thin films. From the capacitance-voltage (C-V) measurements for MFIS capacitors, a hysteric shift with a clockwise direction was observed and the memory window width was about 1.5 V for the plusmn5 V bias sweep. The leakage current density was as low as 1x10-7 A/cm2 at 5 V. From drain current-gate voltage characteristics of the fabricated Fe-FETs, the obtained threshold voltage shift (memory window) of the device was about 0.5 V due to the ferroelectric nature of BLT film. The drain current-drain voltage characteristics of the fabricated FeFETs showed typical n-channel FETs characteristics.
我们采用金属-铁电-绝缘体-半导体(MFIS)结构作为栅极结构,采用(Bi,La)4Ti3O12 (BLT)和SrTa2O6 (STA)薄膜制备了铁电-栅极场效应晶体管(fe - fet)。从MFIS电容器的电容电压(C-V)测量中,观察到顺时针方向的滞回移位,并且对于+ mn5 V偏置扫描,记忆窗口宽度约为1.5 V。在5 V时,漏电流密度低至1 × 10-7 A/cm2。从所制备的fe - fet的漏极电流门电压特性来看,由于BLT薄膜的铁电性质,器件的阈值电压位移(记忆窗口)约为0.5 V。所制备的场效应管的漏极电流-漏极电压特性表现出典型的n沟道场效应管特性。
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引用次数: 1
Fabrication of Bi4Ti3O12 Thin Films Using Alcohol Related Solutions by Micro Liquid Delivery Systems 微液体输送系统中酒精相关溶液制备Bi4Ti3O12薄膜
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393190
M. Yamaguchi, A. Yamamoto, Y. Masuda
We fabricate the bismut titanate (Bi4Ti3O12) thin films used an alcohol related solutions which dissolved Bi(OtC5H11)3 and Ti[OCH(CH3)2]4 in C2H5OC2H4OH for micro liquid delivery systems such as ink-jet printing method. These films fired at 750 degree Celsius into pure oxygen including 1.2% ozone atmosphere, exhibits plate-like grains, and highly c-axis oriented. Furthermore, its films shows good ferroelectric properties, remanent polarization and coercive field was 2.6 muC/cm2 and 36 kV/cm, respectively, and shows fatigue properties up to 108 times. Additionally, we examined the pattern formation on Pt substrate with hydrophilic treatment by micro liquid delivery systems. Drawn patterns on hydrophilic treated substrate surface shows relatively flat cross sectional structures. Therefore, we think that the micro liquid delivery system and hydrophile treatment of substrate surface is effectively to the thin film formation.
采用酒精相关溶液将Bi(OtC5H11)3和Ti[OCH(CH3)2]4溶解于C2H5OC2H4OH中,制备钛酸铋(Bi4Ti3O12)薄膜,用于喷墨打印等微液体输送系统。这些薄膜在750摄氏度的纯氧(含1.2%的臭氧)气氛中烧制,呈现出片状晶粒,具有高度的c轴取向。薄膜具有良好的铁电性能,残余极化和矫顽力场分别为2.6 μ c /cm2和36 kV/cm,具有高达108倍的疲劳性能。此外,我们研究了微液体输送系统亲水处理后Pt衬底上的图案形成。在亲水性处理的基材表面绘制的图案显示出相对平坦的横截面结构。因此,我们认为微液体输送系统和基材表面的亲水性处理是有效的薄膜形成。
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引用次数: 0
Effects of Barium Substitution on the Properties of Pb(Mg1/3Nb2/3)O3 Thin Film Made by MOCVD Using Ultrasonic Nebulization 钡取代对超声雾化MOCVD法制备Pb(Mg1/3Nb2/3)O3薄膜性能的影响
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393178
Kwang-Pyo Kim, Choon-ho Lee
Lead magnesium niobate Pb(Mg1/3Nb2/3)O3 (abbreviated PMN) films is well known as a relaxor-based ferroelectric materials, which have attracted considerable attention for their applications including ferroelectric nonvolatile memory, capacitors, piezoelectric and pyroelectric devices due to polarization switching, high dielectric constant, excellent piezoelectric and pyroelectric properties. However, the use of this material is not realized, because it is difficult to prepare the perovskite single phase PMN films without pyrochlore phase. The presence of the pyrochlore phase in the films, even in small quantities, decreases the dielectric constant and ferroelectric or piezoelectric performance of the films. It is well known that Ba substitution to Pb site of PMN promotes the perovskite phase stabilization. So we have deposited [BaxPb(1-x)(Mg1/3Nb2/3)O3] films by MOCVD using ultrasonic nebulization and effects of Ba substitution quantity on the structural and electrical Properties of the films were investigated and we could obtained [BaxPb(1-x)(Mg1/3Nb2/3)O3] films with only perovskite structure and they have excellent crystallographic and ferroelectric properties.
铌酸铅镁(Pb(m101 / 3nb2 /3)O3(简称PMN)薄膜是一种基于弛豫剂的铁电材料,由于具有极化开关、高介电常数、优异的压电和热释电性能,在铁电非易失性存储器、电容器、压电和热释电器件等领域得到了广泛的应用。然而,由于难以制备无焦绿石相的钙钛矿单相PMN薄膜,这种材料的使用尚未实现。焦绿石相在薄膜中的存在,即使是少量的,也会降低薄膜的介电常数和铁电或压电性能。众所周知,Ba取代PMN的Pb位促进了钙钛矿的相稳定。因此,我们采用超声雾化的MOCVD方法制备了[BaxPb(1-x)(Mg1/3Nb2/3)O3]薄膜,并研究了Ba取代量对薄膜结构和电学性能的影响,得到了仅具有钙钛矿结构的[BaxPb(1-x)(Mg1/3Nb2/3)O3]薄膜,该薄膜具有优异的晶体学和铁电性能。
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引用次数: 0
Multiferroic Properties of La, Ba Co-Modified BiFeO3-PbTiO3 Crystalline Solutions La, Ba共改性BiFeO3-PbTiO3晶体溶液的多铁性
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393274
Jinrong Cheng, Jianguo Chen, D. Jin, Shengwen Yu, Z. Meng
Solid solutions of La and Ba modified (1-x)BiFeO3-xPbTiO3 were prepared by the mixed oxides method. The 10 at% of La3+ and Ba2+ substituents were utilized to substitute Bi3+ and Pb2+ ions respectively. These cations enter into the crystalline lattice to modify the structure and properties of BiFeO3-PbTiO3. The morphotropic phase boundary of (1-x)(Bi,La)FeO3-x(Pb,Ba)TiO3 (BLF-PBT) appears at x=0.4 accompanying by the rhombohedral-tetragonal phase transition. It is found that (1-x)BLF-xPBT reveals enhanced ferroelectric and magnetic properties in the vicinity of the MPB. The remnant polarization and magnetization achieve of 26 muC/cm and 0.06 emu/g, respectively. Our results indicated that (1-x)Bi(Fe,Ga)O3-xPbTiO3 is of the insulating and switchable multiferroics.
采用混合氧化物法制备了La和Ba改性(1-x)BiFeO3-xPbTiO3的固溶体。用10%的La3+和Ba2+取代离子分别取代Bi3+和Pb2+离子。这些阳离子进入晶格,改变了BiFeO3-PbTiO3的结构和性能。在x=0.4处出现(1-x)(Bi,La)FeO3-x(Pb,Ba)TiO3 (BLF-PBT)的亲晶相界,并伴有菱形-四方相转变。发现(1-x)BLF-xPBT在MPB附近表现出增强的铁电和磁性能。残余极化和磁化强度分别达到26 μ c /cm和0.06 μ u/g。结果表明,(1-x)Bi(Fe,Ga)O3-xPbTiO3是一种绝缘可切换的多铁质材料。
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引用次数: 0
Characteristics of tube-type piezoelectric motor fabricated by aerosol deposition 气溶胶沉积制备管式压电电机的特性研究
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393399
W. Yoon, B. Hahn, J. Ryu, J. Choi, D. Park, H.O. Choi
Tube-type piezoelectric motor having a volume of 2times2times10 mm3 was fabricated by aerosol deposition of PZT powder on the square-shaped titanium alloy tube. With applying two channels driving voltage the stator generates two orthogonal bending vibration modes which makes wobbling motion of the stator at the resonance frequency. At the frequency of 76.4 kHz with 60 Vpp, rotation speed of the stator was about 1900 rpm and the speed of the stator was increased linearly with applying voltage.
将PZT粉末气溶胶沉积在方形钛合金管上,制备了体积为2 × 2 × 10 mm3的管式压电电机。在施加两通道驱动电压的情况下,定子产生两种正交的弯曲振动模式,使定子在谐振频率处进行摆动运动。在76.4 kHz和60 Vpp的频率下,定子的转速约为1900 rpm,定子的转速随电压的增加呈线性增加。
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引用次数: 0
Misted Deposition of [3D] Trenches for Drams and Frams III. PZT Thin Films and PZT Nanotubes [3D]沟槽的雾状沉积[d] ram和Frams III。PZT薄膜和PZT纳米管
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393160
M. Miyake, J. Scott, X. Lou, F. Morrison, S. Motoyama, T. Tatsuta, O. Tsuji
Pb(Zr,Ti)O3 (PZT) thin films and nanotube were prepared on SiO2/Si substrates by liquid source misted chemical deposition (LSMCD) using Samco MD-6060 apparatus. We report the deposition and characterization of transparent ferroelectric thin films and nanotubes. PZT thin films deposited at ambient conditions and annealing at 700degC exhibit good ferroelectric properties with remanent polarisation of ca. 15 muC/cm2. The step coverage was 59% on the side wall and 79% on the bottom wall.
采用Samco MD-6060型液源雾化沉积(LSMCD)技术,在SiO2/Si衬底上制备了Pb(Zr,Ti)O3 (PZT)薄膜和纳米管。我们报道了透明铁电薄膜和纳米管的沉积和表征。在室温条件下沉积并在700℃下退火的PZT薄膜表现出良好的铁电性能,剩余极化约为15 μ c /cm2。侧壁的台阶覆盖率为59%,底壁覆盖率为79%。
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引用次数: 1
Preparation of Ferroelectric NaNbO3 Thin Films on MgO Substrate by Pulsed Laser Deposition 脉冲激光沉积法在MgO衬底上制备NaNbO3铁电薄膜
Pub Date : 2007-05-27 DOI: 10.1109/ISAF.2007.4393182
S. Oda, T. Saito, T. Wada, H. Adachi
We have successfully fabricated good quality NaNbO3 films on MgO substrate by pulsed laser deposition by using K-Ta-O (KTO) buffer layer. SrRuO3 (SRO) lower electrode layer was deposited on KTO/(100)MgO substrate and then the NaNbO3 film was deposited. X-ray diffraction showed that the NaNbO3 film was epitaxially grown on a (100)SRO/KTO/(100)MgO substrate. The P-E hysteresis loop of the NaNbO3 film was characteristic of ferroelectric behavior. The crystallographic and dielectric properties are discussed with a comparison of those of the NaNbO3 films epitaxially grown on (100)SrTiO3 substrate.
利用K-Ta-O (KTO)缓冲层,利用脉冲激光沉积技术在MgO衬底上成功制备了高质量的NaNbO3薄膜。在KTO/(100)MgO衬底上沉积SrRuO3 (SRO)下电极层,再沉积NaNbO3薄膜。x射线衍射结果表明,纳米bo3薄膜在(100)SRO/KTO/(100)MgO衬底上外延生长。纳米bo3薄膜的P-E磁滞回线具有铁电特性。讨论了晶体学和介电性能,并与在(100)SrTiO3衬底上外延生长的NaNbO3薄膜进行了比较。
{"title":"Preparation of Ferroelectric NaNbO3 Thin Films on MgO Substrate by Pulsed Laser Deposition","authors":"S. Oda, T. Saito, T. Wada, H. Adachi","doi":"10.1109/ISAF.2007.4393182","DOIUrl":"https://doi.org/10.1109/ISAF.2007.4393182","url":null,"abstract":"We have successfully fabricated good quality NaNbO<sub>3</sub> films on MgO substrate by pulsed laser deposition by using K-Ta-O (KTO) buffer layer. SrRuO<sub>3</sub> (SRO) lower electrode layer was deposited on KTO/(100)MgO substrate and then the NaNbO<sub>3</sub> film was deposited. X-ray diffraction showed that the NaNbO<sub>3</sub> film was epitaxially grown on a (100)SRO/KTO/(100)MgO substrate. The <i>P-E</i> hysteresis loop of the NaNbO<sub>3</sub> film was characteristic of ferroelectric behavior. The crystallographic and dielectric properties are discussed with a comparison of those of the NaNbO<sub>3</sub> films epitaxially grown on (100)SrTiO<sub>3</sub> substrate.","PeriodicalId":321007,"journal":{"name":"2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114856503","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2007 Sixteenth IEEE International Symposium on the Applications of Ferroelectrics
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