The point spread function (PSF) of an optical system is a function of both the amplitude and phase of the electric field in the exit pupil. Interferometric testing of optics yields information regarding variations in phase, but not in amplitude. Typically the PSF, encircled energy function (EEF) and Strehl ratio are calculated from the phase information alone, implicitly assuming that the amplitude is uniform across the pupil. For incoherent, unvignetted imaging systems this assumption is generally valid. Coherent optical systems are a different case due to the Gaussian irradiance profile of lasers. The optics in such systems are non-uniformly illuminated, the amplitude function in the pupil being characterized by a Gaussian or truncated Gaussian profile. This effect of apodization is examined for aberrated and unaberrated beams. Analytic forms and numerical results are presented, as are measurements of laser diode based optical systems. In general, little effect from apodization is seen on parameters which are typically of interest (e.g., Strehl, FWHM of PSF, 80% encircled energy) except for cases of pupil irradiance decrease of greater than half from center to edge.
{"title":"Calculation of Diffraction Image Quality Using Apodized Wavefront Data","authors":"L. Selberg","doi":"10.1364/oft.1988.thb8","DOIUrl":"https://doi.org/10.1364/oft.1988.thb8","url":null,"abstract":"The point spread function (PSF) of an optical system is a function of both the amplitude and phase of the electric field in the exit pupil. Interferometric testing of optics yields information regarding variations in phase, but not in amplitude. Typically the PSF, encircled energy function (EEF) and Strehl ratio are calculated from the phase information alone, implicitly assuming that the amplitude is uniform across the pupil. For incoherent, unvignetted imaging systems this assumption is generally valid. Coherent optical systems are a different case due to the Gaussian irradiance profile of lasers. The optics in such systems are non-uniformly illuminated, the amplitude function in the pupil being characterized by a Gaussian or truncated Gaussian profile. This effect of apodization is examined for aberrated and unaberrated beams. Analytic forms and numerical results are presented, as are measurements of laser diode based optical systems. In general, little effect from apodization is seen on parameters which are typically of interest (e.g., Strehl, FWHM of PSF, 80% encircled energy) except for cases of pupil irradiance decrease of greater than half from center to edge.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116811953","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A technique is discussed that allows a surface metrology system to perform data analysis on surfaces that are scratched, pitted, or even discontiguous.
讨论了一种允许表面测量系统对划痕、点蚀甚至不连续的表面进行数据分析的技术。
{"title":"Goober and Kaboodle","authors":"Charlie Krajewski","doi":"10.1364/oft.1990.owa4","DOIUrl":"https://doi.org/10.1364/oft.1990.owa4","url":null,"abstract":"A technique is discussed that allows a surface metrology system to perform data analysis on surfaces that are scratched, pitted, or even discontiguous.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116856935","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1007/978-1-4615-6379-2_25
Hwa-Young Kim, H. Ohmori
{"title":"Development of Mirror Surface Slicing Machine Installed with Grinding System using Metallic Bond Diamond Blades and Electrolytic In-Process Dressing (ELID)","authors":"Hwa-Young Kim, H. Ohmori","doi":"10.1007/978-1-4615-6379-2_25","DOIUrl":"https://doi.org/10.1007/978-1-4615-6379-2_25","url":null,"abstract":"","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"68 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125755965","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The requirements are growing daily for large polished flat surfaces made to optical quality figure. The obvious and most reliable way of testing these surfaces is in a collimated space Fizeau cavity. Such a cavity, however, requires 2 or more optics the same diameter as the optical surface under test made to figure accuracies better than the part being tested. This makes for an expensive test. Another approach is to use the Ritchey-Common test where the single test optic is only slightly larger than the optics under test and its radius does not have to be tightly controlled. This less costly solution is traded against the increased computation of the Ritchey-Common test.
{"title":"Implementation of the Ritchey-Common Test for 300 mm Wafers","authors":"Robert E. Parks, C. Evans, Lianzhen Shao","doi":"10.1364/oft.1998.otuc.9","DOIUrl":"https://doi.org/10.1364/oft.1998.otuc.9","url":null,"abstract":"The requirements are growing daily for large polished flat surfaces made to optical quality figure. The obvious and most reliable way of testing these surfaces is in a collimated space Fizeau cavity. Such a cavity, however, requires 2 or more optics the same diameter as the optical surface under test made to figure accuracies better than the part being tested. This makes for an expensive test. Another approach is to use the Ritchey-Common test where the single test optic is only slightly larger than the optics under test and its radius does not have to be tightly controlled. This less costly solution is traded against the increased computation of the Ritchey-Common test.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127219385","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The glass and technical ceramic market has been using the same manufacturing process to finish their components for the past 50 years. The presumption is that all glasses fall within the medium to low range of MOR values and can be readily ground with metal bonded diamond wheels, and that all grinding operations cause microfracturing that must be corrected by subsequent operations, like lapping and polishing.
{"title":"Development of grinding wheels for optics","authors":"J. Picone","doi":"10.1364/oft.1996.ofa.7","DOIUrl":"https://doi.org/10.1364/oft.1996.ofa.7","url":null,"abstract":"The glass and technical ceramic market has been using the same manufacturing process to finish their components for the past 50 years. The presumption is that all glasses fall within the medium to low range of MOR values and can be readily ground with metal bonded diamond wheels, and that all grinding operations cause microfracturing that must be corrected by subsequent operations, like lapping and polishing.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129098231","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
X-ray optics is advancing rapidly and being applied to numerous fields. X-ray mirrors may serve as one of the most important devices giving tremendous influence on the performance of a whole system. X-ray mirrors require for higher precision than any other parts. But the technique which produces such mirrors has yet to be established. In this paper the applications of the ELID grinding technique1),2), which is known widely as a method for producing high precision ground surfaces in a short period of time, are described for X-ray mirrors.
{"title":"Aspherical ELID Grinding Technique for X-ray Mirrors","authors":"S. Moriyasu, Y. Yamagata, H. Ohmori","doi":"10.1364/FTA.1999.GA4","DOIUrl":"https://doi.org/10.1364/FTA.1999.GA4","url":null,"abstract":"X-ray optics is advancing rapidly and being applied to numerous fields. X-ray mirrors may serve as one of the most important devices giving tremendous influence on the performance of a whole system. X-ray mirrors require for higher precision than any other parts. But the technique which produces such mirrors has yet to be established. In this paper the applications of the ELID grinding technique1),2), which is known widely as a method for producing high precision ground surfaces in a short period of time, are described for X-ray mirrors.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132257908","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Astronomers use telescopes to study the universe in the different spectrum regions. The dimensions of telescopes, to research in the millimeter region, are too big. Thus, fabrication of such instruments is a challenge work. The “Gran Telescopio Milimétrico (Large Millimeter Telescope, which will be called LMT) is a Cassegrain Telescope, which diameter of the primary reflector is 50 meters and the subreflector is a hyperbolic surface which diameter is 2.57 meters, and it is been developed to observe in the millimeter region. The subrelector surface must be fabricated with an accuracy of 13 µm (rms). Furthermore, the subreflector must achieve the so-called wobbling, meaning that the subreflector cannot be so heavy, but enough stiff to be wobbled. In this work, we describe the fabrication technique for the subreflector.
天文学家使用望远镜在不同的光谱区域研究宇宙。在毫米范围内进行研究，望远镜的尺寸太大了。因此，制造这样的仪器是一项具有挑战性的工作。“大毫米望远镜”(Large Millimeter Telescope，简称LMT)是一种卡塞格林望远镜，主反射面直径为50米，副反射面为直径为2.57米的双曲曲面，是为毫米范围内的观测而研制的。副反射器表面的制作精度必须为13 μ m (rms)。此外，副反射器必须达到所谓的摆动，这意味着副反射器不能太重，但要足够坚硬才能摆动。在本工作中，我们描述了副反射器的制造技术。
{"title":"Fabrication of the SubReflector for the Large Millimeter Telescope (Gran Telescopio Milimétrico)","authors":"Francisco-J Renero-C, Octavio Cardona-N., Roberto Cardona-N., Sergio Vázquez-M., Alejandro Cornejo-R., Carlos Islas-G., Jorge Romero-A.","doi":"10.1364/oft.1998.otuc.5","DOIUrl":"https://doi.org/10.1364/oft.1998.otuc.5","url":null,"abstract":"Astronomers use telescopes to study the universe in the different spectrum regions. The dimensions of telescopes, to research in the millimeter region, are too big. Thus, fabrication of such instruments is a challenge work. The “Gran Telescopio Milimétrico (Large Millimeter Telescope, which will be called LMT) is a Cassegrain Telescope, which diameter of the primary reflector is 50 meters and the subreflector is a hyperbolic surface which diameter is 2.57 meters, and it is been developed to observe in the millimeter region. The subrelector surface must be fabricated with an accuracy of 13 µm (rms). Furthermore, the subreflector must achieve the so-called wobbling, meaning that the subreflector cannot be so heavy, but enough stiff to be wobbled. In this work, we describe the fabrication technique for the subreflector.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129042591","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
John S. Taylor, G. Sommargren, D. Sweeney, R. Hudyma, E. Gullikson
Extreme UltraViolet Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the “0.1 µm generation” of microelectronic circuits. EUVL is an optical printing technique qualitatively similar to Deep UV Lithography (DUVL), except that 11-13nm wavelength light is used instead of 193-248nm. The feasibility of creating 0.1µm features has been well-established using small-field EUVL printing tools, and development efforts are currently underway to demonstrate that cost-effective production equipment can be engineered to perform full-width ring-field imaging consistent with high wafer throughput rates. Ensuring that an industrial supplier base will be available for key components and subsystems is crucial to the success of EUVL. In particular, the projection optics are the heart of the EUVL imaging system, yet they have figure and finish specifications that are beyond the state-of-the-art in optics manufacturing. Thus it is important to demonstrate that industry will be able to fabricate and certify these optics commensurate with EUVL requirements.
{"title":"The Fabrication and Testing of Optics for EUV Projection Lithography1,2","authors":"John S. Taylor, G. Sommargren, D. Sweeney, R. Hudyma, E. Gullikson","doi":"10.1364/oft.1998.otud.1","DOIUrl":"https://doi.org/10.1364/oft.1998.otud.1","url":null,"abstract":"Extreme UltraViolet Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the “0.1 µm generation” of microelectronic circuits. EUVL is an optical printing technique qualitatively similar to Deep UV Lithography (DUVL), except that 11-13nm wavelength light is used instead of 193-248nm. The feasibility of creating 0.1µm features has been well-established using small-field EUVL printing tools, and development efforts are currently underway to demonstrate that cost-effective production equipment can be engineered to perform full-width ring-field imaging consistent with high wafer throughput rates. Ensuring that an industrial supplier base will be available for key components and subsystems is crucial to the success of EUVL. In particular, the projection optics are the heart of the EUVL imaging system, yet they have figure and finish specifications that are beyond the state-of-the-art in optics manufacturing. Thus it is important to demonstrate that industry will be able to fabricate and certify these optics commensurate with EUVL requirements.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126353411","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The polarization properties of multiple exposure speckle patterns recorded in a photorefractive crystal (Bi12SiO20) are exploited to improve the signal-to-noise ratio in real-time speckle metrology and velocimetry. Previous work1 demonstrates the feasibility of real-time photorefractive recording and optical processing of multiple-exposure speckle patterns for metrology and velocimetry applications. The speckle patterns are produced by a coherent imaging system, a scattering object, and a Q-switched Nd:YAG laser. The multiple-exposure is immediately interrogated with a CW laser and processed optically. The resulting fringe pattern contains two-dimensional displacement or velocity information in real-time. The effects of speckle recording on the polarization properties of the photorefractive crystal shows that polarization filtering separates a portion of the signal from the background noise in the optical processor. This produces an increase in the contrast of the fringe pattern in the output plane of the optical processor. Polarization filtering may also reduce the energy density incident on the crystal necessary to produce a signal of given strength. Experimental results demonstrating the improved signal in real-time speckle velocimetry are shown.
{"title":"Polarization Filtering in Real-Time Speckle Metrology","authors":"S. Collicott, L. Hesselink","doi":"10.1364/oft.1988.thb9","DOIUrl":"https://doi.org/10.1364/oft.1988.thb9","url":null,"abstract":"The polarization properties of multiple exposure speckle patterns recorded in a photorefractive crystal (Bi12SiO20) are exploited to improve the signal-to-noise ratio in real-time speckle metrology and velocimetry. Previous work1 demonstrates the feasibility of real-time photorefractive recording and optical processing of multiple-exposure speckle patterns for metrology and velocimetry applications. The speckle patterns are produced by a coherent imaging system, a scattering object, and a Q-switched Nd:YAG laser. The multiple-exposure is immediately interrogated with a CW laser and processed optically. The resulting fringe pattern contains two-dimensional displacement or velocity information in real-time. The effects of speckle recording on the polarization properties of the photorefractive crystal shows that polarization filtering separates a portion of the signal from the background noise in the optical processor. This produces an increase in the contrast of the fringe pattern in the output plane of the optical processor. Polarization filtering may also reduce the energy density incident on the crystal necessary to produce a signal of given strength. Experimental results demonstrating the improved signal in real-time speckle velocimetry are shown.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116663845","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In optical fabrication shops many times the polishing and lapping slurries are thrown together without much thought or concern about the complex system that exists in that slurry. Many times the way the slurry is prepared can make the difference between mediocrity and perfection in the finished parts.
{"title":"Permanent Suspensions in Optical Lapping and Polishing","authors":"Paul J. Yancey","doi":"10.1364/oft.1988.wc4","DOIUrl":"https://doi.org/10.1364/oft.1988.wc4","url":null,"abstract":"In optical fabrication shops many times the polishing and lapping slurries are thrown together without much thought or concern about the complex system that exists in that slurry. Many times the way the slurry is prepared can make the difference between mediocrity and perfection in the finished parts.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122836084","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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