O. Seitz, J. Geddes, Mukti Aryal, Joseph Perez, Jonathan K. Wassei, I. Mcmackin, B. Kobrin
A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. “Rolling Mask Lithography” (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by “texturing” it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth’s eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.
{"title":"Antireflective surface patterned by rolling mask lithography","authors":"O. Seitz, J. Geddes, Mukti Aryal, Joseph Perez, Jonathan K. Wassei, I. Mcmackin, B. Kobrin","doi":"10.1117/12.2037415","DOIUrl":"https://doi.org/10.1117/12.2037415","url":null,"abstract":"A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. “Rolling Mask Lithography” (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by “texturing” it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth’s eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128864562","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We report realisation of structural colour in dielectrics using direct laser write technique. 3D porous dielectric structures with woodpile photonic crystal architecture were fabricated by femtosecond direct laser write lithography in photoresist and characterised structurally and optically. The fabricated samples were found to exhibit resonant high-reflectance bands at visible wavelengths depending on the lattice parameters, and correspondingly, led to coloration of the structure without light absorption or emission. Structural colour was found to originate from slow-light spectral regions occurring in some higher photonic bands at visible wavelengths. Visible coloration in samples with relatively large lattice period, a > 1μm can be achieved due to this peculiarity, which helps alleviate the requirement for high resolution of the fabrication, shortened the fabrication time. In the future, similar structures may be useful for preparation of photonic crystal-based environmental and imaging sensors.
{"title":"Structural colour of porous dielectrics processed by direct laser write technique","authors":"V. Mizeikis, V. Purlys, R. Buividas, S. Juodkazis","doi":"10.1117/12.2038666","DOIUrl":"https://doi.org/10.1117/12.2038666","url":null,"abstract":"We report realisation of structural colour in dielectrics using direct laser write technique. 3D porous dielectric structures with woodpile photonic crystal architecture were fabricated by femtosecond direct laser write lithography in photoresist and characterised structurally and optically. The fabricated samples were found to exhibit resonant high-reflectance bands at visible wavelengths depending on the lattice parameters, and correspondingly, led to coloration of the structure without light absorption or emission. Structural colour was found to originate from slow-light spectral regions occurring in some higher photonic bands at visible wavelengths. Visible coloration in samples with relatively large lattice period, a > 1μm can be achieved due to this peculiarity, which helps alleviate the requirement for high resolution of the fabrication, shortened the fabrication time. In the future, similar structures may be useful for preparation of photonic crystal-based environmental and imaging sensors.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"8974 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128935187","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Negative stiffness can provide a method of altering the stiffness of a device without changing its geometry. The silicon/ silicon dioxide (Si/SiO2) membrane presented in this research utilizes buckling resulting from compressive residual stress. A transversely actuated buckled membrane displays properties similar to a linear regressive spring, which include a positive and negative stiffness region. Cantilever beams were used to restrict the outward displacement of the membrane and force it to actuate only in its negative stiffness region. Analytical equations were utilized to estimate the amount of outward deflection by the membrane and to estimate the amount of reduced deflection required for the device to display only negative stiffness characteristics. Devices were tested using a force sensor actuated by a piezo controller. Interferometric imaging confirmed the cantilevers ability to reduce the buckling displacement in the membrane up to 30%.
{"title":"Isolating the negative stiffness region of a buckled Si/SiO2 membrane","authors":"Kyle K. Ziegler, R. Lake, R. Coutu","doi":"10.1117/12.2037383","DOIUrl":"https://doi.org/10.1117/12.2037383","url":null,"abstract":"Negative stiffness can provide a method of altering the stiffness of a device without changing its geometry. The silicon/ silicon dioxide (Si/SiO2) membrane presented in this research utilizes buckling resulting from compressive residual stress. A transversely actuated buckled membrane displays properties similar to a linear regressive spring, which include a positive and negative stiffness region. Cantilever beams were used to restrict the outward displacement of the membrane and force it to actuate only in its negative stiffness region. Analytical equations were utilized to estimate the amount of outward deflection by the membrane and to estimate the amount of reduced deflection required for the device to display only negative stiffness characteristics. Devices were tested using a force sensor actuated by a piezo controller. Interferometric imaging confirmed the cantilevers ability to reduce the buckling displacement in the membrane up to 30%.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130040453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
U. Hofmann, F. Senger, J. Janes, C. Mallas, V. Stenchly, T. von Wantoch, H. Quenzer, M. Weiss
Hermetic wafer level packaging of optical MEMS scanning mirrors is essential for mass-market applications. It is the key to enable reliable low-cost mass producible scanning solutions. Vacuum packaging of resonant MEMS scanning mirrors widens the parameter range specifically with respect to scan angle and scan frequency. It also allows extending the utilizable range of mirror aperture size based on the fact that the energy of the high-Q oscillator can be effectively conserved and accumulated. But there are also some drawbacks associated with vacuum packaging. This paper discusses the different advantageous and disadvantageous aspects of vacuum packaging of MEMS scanning mirrors with respect to laser projection displays. Improved MEMS scanning mirror designs are being presented which focus on overcoming previous limitations. Finally an outlook is presented on the suitability of this technology for very large aperture scanning mirrors to be used in high power laser applications.
{"title":"Wafer-level vacuum-packaged two-axis MEMS scanning mirror for pico-projector application","authors":"U. Hofmann, F. Senger, J. Janes, C. Mallas, V. Stenchly, T. von Wantoch, H. Quenzer, M. Weiss","doi":"10.1117/12.2038249","DOIUrl":"https://doi.org/10.1117/12.2038249","url":null,"abstract":"Hermetic wafer level packaging of optical MEMS scanning mirrors is essential for mass-market applications. It is the key to enable reliable low-cost mass producible scanning solutions. Vacuum packaging of resonant MEMS scanning mirrors widens the parameter range specifically with respect to scan angle and scan frequency. It also allows extending the utilizable range of mirror aperture size based on the fact that the energy of the high-Q oscillator can be effectively conserved and accumulated. But there are also some drawbacks associated with vacuum packaging. This paper discusses the different advantageous and disadvantageous aspects of vacuum packaging of MEMS scanning mirrors with respect to laser projection displays. Improved MEMS scanning mirror designs are being presented which focus on overcoming previous limitations. Finally an outlook is presented on the suitability of this technology for very large aperture scanning mirrors to be used in high power laser applications.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124469941","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We report fabrication and characterization of MEMS-based tactile display that can display users various tactile information, such as Braille codes and surface textures. The display consists of 9 micro-actuators that are equipped with hydraulic displacement amplification mechanism (HDAM) to achieve large enough displacement to stimulate the human tactile receptors. HDAM encapsulates incompressible liquids. We developed a liquid encapsulation process, which we termed as Bonding-in-Liquid Technique, where bonding with a UV-curable resin in glycerin is conducted in the liquid, which prevented interfusion of air bubbles and deformation of the membrane during the bonding. HDAM successfully amplified the displacement generated by piezoelectric actuators by a factor of 6. The display could virtually produce “rough” and “smooth” surfaces, by controlling the vibration frequency, displacement, and the actuation periods of an actuator until the adjacent actuator was driven. We introduced a sample comparison method to characterize the surfaces, which involves human tactile sensation. First, we prepared samples whose mechanical properties are known. We displayed a surface texture to the user by controlling the parameters and then, the user selects a sample that has the most similar surface texture. By doing so, we can correlate the parameters with the mechanical properties of the sample as well as find the sets of the parameters that can provide similar tactile information to many users. The preliminary results with respect to roughness and hardness is presented.
{"title":"MEMS tactile display: from fabrication to characterization","authors":"N. Miki, Yumi Kosemura, J. Watanabe, H. Ishikawa","doi":"10.1117/12.2044127","DOIUrl":"https://doi.org/10.1117/12.2044127","url":null,"abstract":"We report fabrication and characterization of MEMS-based tactile display that can display users various tactile information, such as Braille codes and surface textures. The display consists of 9 micro-actuators that are equipped with hydraulic displacement amplification mechanism (HDAM) to achieve large enough displacement to stimulate the human tactile receptors. HDAM encapsulates incompressible liquids. We developed a liquid encapsulation process, which we termed as Bonding-in-Liquid Technique, where bonding with a UV-curable resin in glycerin is conducted in the liquid, which prevented interfusion of air bubbles and deformation of the membrane during the bonding. HDAM successfully amplified the displacement generated by piezoelectric actuators by a factor of 6. The display could virtually produce “rough” and “smooth” surfaces, by controlling the vibration frequency, displacement, and the actuation periods of an actuator until the adjacent actuator was driven. We introduced a sample comparison method to characterize the surfaces, which involves human tactile sensation. First, we prepared samples whose mechanical properties are known. We displayed a surface texture to the user by controlling the parameters and then, the user selects a sample that has the most similar surface texture. By doing so, we can correlate the parameters with the mechanical properties of the sample as well as find the sets of the parameters that can provide similar tactile information to many users. The preliminary results with respect to roughness and hardness is presented.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121316576","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We studied how a surface-micromachined Fabry-Perot interferometer, realized with Si / air-gap distributed Bragg reflectors, would perform at the middle-infrared wavelengths. Compared with traditional solid-film pairs, this Si-FPI technology features better index contrast, which enables wider stop band and potentially higher resolution. Four different designs of interferometers were prepared and compared. Two designs apply the solid-film reflectors of Si/SiO2 structure. Their data is exploited as a reference of a middle-infrared interferometer and, as a template for mapping the performance from the simulation results to the measured data. The third design operates at the thermal infrared and it was our first embodiment with the Si/air-gap mirrors. The performance, reported earlier, is here referred to for estimating the technology scalability down to shorter wavelengths. Finally, we realized a non-tunable proof-of-concept version of the Si/air-gap technology for middle infrared. The measured data is mapped into an estimate of the achievable performance of a tunable version. We present the transmission and resolution data and argument the simulation models that reproduce the data. The prediction for the tunable middle-infrared Si-FPI is then presented. The results indicate that such a device is expected to have two-fold better resolution and a clearly wider stop band, compared with the prior art.
{"title":"MEMS Fabry-Perot interferometer with Si-air mirrors for mid- and thermal infrared","authors":"M. Tuohiniemi, A. Näsilä, A. Akujärvi","doi":"10.1117/12.2037915","DOIUrl":"https://doi.org/10.1117/12.2037915","url":null,"abstract":"We studied how a surface-micromachined Fabry-Perot interferometer, realized with Si / air-gap distributed Bragg reflectors, would perform at the middle-infrared wavelengths. Compared with traditional solid-film pairs, this Si-FPI technology features better index contrast, which enables wider stop band and potentially higher resolution. Four different designs of interferometers were prepared and compared. Two designs apply the solid-film reflectors of Si/SiO2 structure. Their data is exploited as a reference of a middle-infrared interferometer and, as a template for mapping the performance from the simulation results to the measured data. The third design operates at the thermal infrared and it was our first embodiment with the Si/air-gap mirrors. The performance, reported earlier, is here referred to for estimating the technology scalability down to shorter wavelengths. Finally, we realized a non-tunable proof-of-concept version of the Si/air-gap technology for middle infrared. The measured data is mapped into an estimate of the achievable performance of a tunable version. We present the transmission and resolution data and argument the simulation models that reproduce the data. The prediction for the tunable middle-infrared Si-FPI is then presented. The results indicate that such a device is expected to have two-fold better resolution and a clearly wider stop band, compared with the prior art.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116739482","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The field of application of industrial projectors is growing day by day. New Digital Micromirror Device (DMD) - based applications like 3D printing, 3D scanning, Printed Circuit Board (PCB) board printing and others are getting more and more sophisticated. The technical demands for the projection system are rising as new and more stringent requirements appear. The specification for industrial projection systems differ substantially from the ones of business and home beamers. Beamers are designed to please the human eye. Bright colors and image enhancement are far more important than uniformity of the illumination or image distortion. The human eye, followed by the processing of the brain can live with quite high intensity variations on the screen and image distortion. On the other hand, a projector designed for use in a specialized field has to be tailored regarding its unique requirements in order to make no quality compromises. For instance, when the image is projected onto a light sensitive resin, a good uniformity of the illumination is crucial for good material hardening (curing) results. The demands on the hardware and software are often very challenging. In the following we will review some parameters that have to be considered carefully for the design of industrial projectors in order to get the optimum result without compromises.
{"title":"Use of high-radiant flux, high-resolution DMD light engines in industrial applications","authors":"A. Müller, S. Ram","doi":"10.1117/12.2037565","DOIUrl":"https://doi.org/10.1117/12.2037565","url":null,"abstract":"The field of application of industrial projectors is growing day by day. New Digital Micromirror Device (DMD) - based applications like 3D printing, 3D scanning, Printed Circuit Board (PCB) board printing and others are getting more and more sophisticated. The technical demands for the projection system are rising as new and more stringent requirements appear. The specification for industrial projection systems differ substantially from the ones of business and home beamers. Beamers are designed to please the human eye. Bright colors and image enhancement are far more important than uniformity of the illumination or image distortion. The human eye, followed by the processing of the brain can live with quite high intensity variations on the screen and image distortion. On the other hand, a projector designed for use in a specialized field has to be tailored regarding its unique requirements in order to make no quality compromises. For instance, when the image is projected onto a light sensitive resin, a good uniformity of the illumination is crucial for good material hardening (curing) results. The demands on the hardware and software are often very challenging. In the following we will review some parameters that have to be considered carefully for the design of industrial projectors in order to get the optimum result without compromises.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"106 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121121669","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We have developed the Pixel-level Visible Light Communication (PVLC) projector based on the DLP (Digital Light Processing) system. The projector can embed invisible data pixel by pixel into a visible image to realize augmented reality applications. However, it cannot update either invisible or visible contents in real time. In order to solve the problem, we improve the projector so that a PC can dynamically control the system and enable us to achieve a high-frame-rate feature by resolution conversion. This paper proposes the system framework and the design method for the dynamically reconfigurable PVLC projector.
{"title":"Dynamically reconfigurable framework for pixel-level visible light communication projector","authors":"Leijie Zhou, S. Fukushima, T. Naemura","doi":"10.1117/12.2041936","DOIUrl":"https://doi.org/10.1117/12.2041936","url":null,"abstract":"We have developed the Pixel-level Visible Light Communication (PVLC) projector based on the DLP (Digital Light Processing) system. The projector can embed invisible data pixel by pixel into a visible image to realize augmented reality applications. However, it cannot update either invisible or visible contents in real time. In order to solve the problem, we improve the projector so that a PC can dynamically control the system and enable us to achieve a high-frame-rate feature by resolution conversion. This paper proposes the system framework and the design method for the dynamically reconfigurable PVLC projector.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115748775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Dogan Sinar, G. Knopf, S. Nikumb, A. Andrushchenko
Non-conductive graphene-oxide (GO) inks can be synthesized from inexpensive graphite powders and deposited on functionalized flexible substrates using inkjet printing technology. Once deposited, the electrical conductivity of the GO film can be restored through laser assisted thermal reduction. Unfortunately, the inkjet nozzle diameter (~40μm) places a limit on the printed feature size. In contrast, a tightly focused femtosecond pulsed laser can create precise micro features with dimensions in the order of 2 to 3 μm. The smallest feature size produced by laser microfabrication is a function of the laser beam diameter, power level, feed rate, material characteristics and spatial resolution of the micropositioning system. Laser micromachining can also remove excess GO film material adjacent to the electrode traces and passive electronic components. Excess material removal is essential for creating stable oxygen-reduced graphene-oxide (rGO) printed circuits because electron buildup along the feature edges will alter the conductivity of the non-functional film. A study on the impact of laser ablation on the GO film and the substrate are performed using a 775nm, 120fs pulsed laser. The average laser power was 25mW at a spot size of ~ 5μm, and the feed rate was 1000-1500mm/min. Several simple microtraces were fabricated and characterized in terms of electrical resistance and surface topology.
{"title":"Laser micromachining of oxygen reduced graphene-oxide films","authors":"Dogan Sinar, G. Knopf, S. Nikumb, A. Andrushchenko","doi":"10.1117/12.2038423","DOIUrl":"https://doi.org/10.1117/12.2038423","url":null,"abstract":"Non-conductive graphene-oxide (GO) inks can be synthesized from inexpensive graphite powders and deposited on functionalized flexible substrates using inkjet printing technology. Once deposited, the electrical conductivity of the GO film can be restored through laser assisted thermal reduction. Unfortunately, the inkjet nozzle diameter (~40μm) places a limit on the printed feature size. In contrast, a tightly focused femtosecond pulsed laser can create precise micro features with dimensions in the order of 2 to 3 μm. The smallest feature size produced by laser microfabrication is a function of the laser beam diameter, power level, feed rate, material characteristics and spatial resolution of the micropositioning system. Laser micromachining can also remove excess GO film material adjacent to the electrode traces and passive electronic components. Excess material removal is essential for creating stable oxygen-reduced graphene-oxide (rGO) printed circuits because electron buildup along the feature edges will alter the conductivity of the non-functional film. A study on the impact of laser ablation on the GO film and the substrate are performed using a 775nm, 120fs pulsed laser. The average laser power was 25mW at a spot size of ~ 5μm, and the feed rate was 1000-1500mm/min. Several simple microtraces were fabricated and characterized in terms of electrical resistance and surface topology.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126635804","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
P. Blanche, A. Miles, B. Lynn, J. Wissinger, D. Carothers, R. Norwood, N. Peyghambarian
We present here the use the DMD as a diffraction-based optical switch, where Fourier diffraction patterns are used to steer the incoming beams to any output configuration. We have implemented a single-mode fiber coupled N X N switch and demonstrated its ability to operate over the entire telecommunication C-band centered at 1550 nm. The all-optical switch was built primarily with off-the-shelf components and a Texas Instruments DLP7000™with an array of 1024 X 768 micromirrors. This DMD is capable of switching 100 times faster than currently available technology (3D MOEMS). The switch is robust to typical failure modes, protocol and bit-rate agnostic, and permits full reconfigurable optical add drop multiplexing (ROADM). The switch demonstrator was inserted into a networking testbed for the majority of the measurements. The testbed assembled under the Center for Integrated Access Networks (ClAN), a National Science Foundation (NSF) Engineering Research Center (ERC), provided an environment in which to simulate and test the data routing functionality of the switch. A Fujitsu Flashwave 9500 PS was used to provide the data signal, which was sent through the switch and received by a second Flashwave node. We successfully transmitted an HD video stream through a switched channel without any measurable data loss.
我们在这里提出了使用DMD作为一个基于衍射的光开关，其中使用傅立叶衍射模式来引导入射光束到任何输出配置。我们已经实现了一个单模光纤耦合N X N交换机，并证明了其在整个电信c波段以1550nm为中心运行的能力。全光开关主要由现成的组件和德州仪器DLP7000™构建，该DLP7000™具有1024 X 768微镜阵列。这种DMD的切换速度比目前可用的技术(3D MOEMS)快100倍。该交换机对典型故障模式、协议和比特率不确定具有鲁棒性，并允许完全可重构的光加丢多路复用(ROADM)。开关演示器被插入到网络测试平台中进行大多数测量。在综合接入网中心(ClAN)，国家科学基金会(NSF)工程研究中心(ERC)下组装的试验台提供了一个模拟和测试交换机数据路由功能的环境。使用富士通Flashwave 9500 PS提供数据信号，该信号通过交换机发送并由第二个Flashwave节点接收。我们成功地通过交换信道传输了高清视频流，没有任何可测量的数据丢失。
{"title":"Microsecond reconfigurable NxN data-communication switch using DMD","authors":"P. Blanche, A. Miles, B. Lynn, J. Wissinger, D. Carothers, R. Norwood, N. Peyghambarian","doi":"10.1117/12.2036780","DOIUrl":"https://doi.org/10.1117/12.2036780","url":null,"abstract":"We present here the use the DMD as a diffraction-based optical switch, where Fourier diffraction patterns are used to steer the incoming beams to any output configuration. We have implemented a single-mode fiber coupled N X N switch and demonstrated its ability to operate over the entire telecommunication C-band centered at 1550 nm. The all-optical switch was built primarily with off-the-shelf components and a Texas Instruments DLP7000™with an array of 1024 X 768 micromirrors. This DMD is capable of switching 100 times faster than currently available technology (3D MOEMS). The switch is robust to typical failure modes, protocol and bit-rate agnostic, and permits full reconfigurable optical add drop multiplexing (ROADM). The switch demonstrator was inserted into a networking testbed for the majority of the measurements. The testbed assembled under the Center for Integrated Access Networks (ClAN), a National Science Foundation (NSF) Engineering Research Center (ERC), provided an environment in which to simulate and test the data routing functionality of the switch. A Fujitsu Flashwave 9500 PS was used to provide the data signal, which was sent through the switch and received by a second Flashwave node. We successfully transmitted an HD video stream through a switched channel without any measurable data loss.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127475751","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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