Pub Date : 2018-01-23DOI: 10.1109/MEMSYS.2018.8346577
Hyogeun Shin, Woongsun Choi, Gun-Wook Yoon, Suyoung Seo, Nakwon Choi, Jun‐Bo Yoon, Il-Joo Cho
This paper reports on a high-resolution lensless fluorescence imaging system using membrane deflection for reducing the gap between fluorescent samples and a CMOS image sensor array. The presented system applied the principle of the total internal reflection of excitation light inside a PDMS chip to minimize the exposure of excitation light to the image sensor. We integrated a very thin (5.5 μm) PDMS membrane as a flexible deflector, which allowed for significant reduction of the gap (∼20 μm) inevitably created during the conventional packaging (i.e., wire bonding) of image sensors. In the fabricated system, we achieved minimum distance of 7.5 μm between fluorescent samples and an image sensor array. This reduced gap almost directly corresponds to a resolution as high as ∼7.5 μm, based on the point spread function (PSF).
{"title":"A high-resolution lensless fluorescence imaging system using membrane deflection for reducing gap between samples and image sensor","authors":"Hyogeun Shin, Woongsun Choi, Gun-Wook Yoon, Suyoung Seo, Nakwon Choi, Jun‐Bo Yoon, Il-Joo Cho","doi":"10.1109/MEMSYS.2018.8346577","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346577","url":null,"abstract":"This paper reports on a high-resolution lensless fluorescence imaging system using membrane deflection for reducing the gap between fluorescent samples and a CMOS image sensor array. The presented system applied the principle of the total internal reflection of excitation light inside a PDMS chip to minimize the exposure of excitation light to the image sensor. We integrated a very thin (5.5 μm) PDMS membrane as a flexible deflector, which allowed for significant reduction of the gap (∼20 μm) inevitably created during the conventional packaging (i.e., wire bonding) of image sensors. In the fabricated system, we achieved minimum distance of 7.5 μm between fluorescent samples and an image sensor array. This reduced gap almost directly corresponds to a resolution as high as ∼7.5 μm, based on the point spread function (PSF).","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"87 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127537946","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-22DOI: 10.1109/MEMSYS.2018.8346489
Geon Kook, Sohyeon Jeong, Mikyung Kim, Sungwoo Lee, Hyojung Kim, Nakwon Choi, Hyunjoon Lee
Development of flexible, biocompatible, biodegradable, and small electronic components is of great interest for implantable medical devices. In this work, we present a highly dense silk-fibroin-based memristor array, fabricated using our newly developed fabrication technique based on UV photolithography. This is the first demonstration of silk-fibroin-based memristors implemented in a cross-bar architecture with a high cell density (single cell of 20 × 20 μm2 and a density of 105 cm−2) which allows individual access to cells. In addition, we implement a fully flexible silk-fibroin-based memristor array fabricated on a Parylene-C film and demonstrate its reliable resistive switching and biodegradability in an enzymatic solution.
{"title":"Wafer-scale fabrication of biodegradable silk-fibroin-based memristors","authors":"Geon Kook, Sohyeon Jeong, Mikyung Kim, Sungwoo Lee, Hyojung Kim, Nakwon Choi, Hyunjoon Lee","doi":"10.1109/MEMSYS.2018.8346489","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346489","url":null,"abstract":"Development of flexible, biocompatible, biodegradable, and small electronic components is of great interest for implantable medical devices. In this work, we present a highly dense silk-fibroin-based memristor array, fabricated using our newly developed fabrication technique based on UV photolithography. This is the first demonstration of silk-fibroin-based memristors implemented in a cross-bar architecture with a high cell density (single cell of 20 × 20 μm2 and a density of 105 cm−2) which allows individual access to cells. In addition, we implement a fully flexible silk-fibroin-based memristor array fabricated on a Parylene-C film and demonstrate its reliable resistive switching and biodegradability in an enzymatic solution.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125643749","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-22DOI: 10.1109/MEMSYS.2018.8346608
C. Hwang, Youngseop Lee, Myeong‐Su Ahn, Taerin Chung, K. Jeong
This paper reports wide-range tuning of localized surface plasmon resonance (LSPR) wavelength using silver (Ag) and gold (Au) alloyed nanoislands for wafer-level fabrication of subtractive plasmonic color filter. The fabrication method includes concurrent thermal evaporation of Ag and Au sources to deposit thin alloy metal film onto quartz wafer, followed by thermal dewetting process to generate Ag-Au alloyed nanoislands. The LSPR wavelength of the alloyed nanoislands can precisely be controlled by adjusting the alloy deposition rate during the evaporation process. The subtractive color filters are fabricated by repeated lift-off processes of different Ag-Au alloy fractions, allowing facile wafer-level fabrication. The application of wide-range LSPR tuning of Ag-Au alloyed nanoislands is not only limited to subtractive plasmonic color filters, but also encompasses numerous possibilities for other engineering fields, such as, surface enhanced Raman spectroscopy and plasmonic enhanced fluorescence.
{"title":"Visible range subtractive plasmonic color filter arrays using AG-AU alloyed nanoislands","authors":"C. Hwang, Youngseop Lee, Myeong‐Su Ahn, Taerin Chung, K. Jeong","doi":"10.1109/MEMSYS.2018.8346608","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346608","url":null,"abstract":"This paper reports wide-range tuning of localized surface plasmon resonance (LSPR) wavelength using silver (Ag) and gold (Au) alloyed nanoislands for wafer-level fabrication of subtractive plasmonic color filter. The fabrication method includes concurrent thermal evaporation of Ag and Au sources to deposit thin alloy metal film onto quartz wafer, followed by thermal dewetting process to generate Ag-Au alloyed nanoislands. The LSPR wavelength of the alloyed nanoislands can precisely be controlled by adjusting the alloy deposition rate during the evaporation process. The subtractive color filters are fabricated by repeated lift-off processes of different Ag-Au alloy fractions, allowing facile wafer-level fabrication. The application of wide-range LSPR tuning of Ag-Au alloyed nanoislands is not only limited to subtractive plasmonic color filters, but also encompasses numerous possibilities for other engineering fields, such as, surface enhanced Raman spectroscopy and plasmonic enhanced fluorescence.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124833285","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1109/MEMSYS.2018.8346689
Y. Zeng, J. Groenesteijn, D. Alveringh, R. Steenwelle, K. Ma, R. Wiegerink, J. Lötters
We have realized a micro Coriolis mass flow sensor that is actuated by integrated lead zirconate titanate (PZT) thin film actuators, allowing low voltage, low power actuation compared to current actuation methods. The integrated PZT thin film actuators are deposited on top of silicon-rich silicon nitride (SiRN) fluidic microchannels by pulsed laser deposition (PLD). In this paper we present the fabrication process and first characterization results, including a mass flow measurement with nitrogen flow using a Polytec MSA-400 laser Doppler vibrometer to detect the Coriolis induced motion of the sensor tube. The measurement results confirm that the sensor output is proportional to mass flow up to 14 mg/min.
{"title":"Micro Coriolis MASS flow sensor driven by integrated PZT thin film actuators","authors":"Y. Zeng, J. Groenesteijn, D. Alveringh, R. Steenwelle, K. Ma, R. Wiegerink, J. Lötters","doi":"10.1109/MEMSYS.2018.8346689","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346689","url":null,"abstract":"We have realized a micro Coriolis mass flow sensor that is actuated by integrated lead zirconate titanate (PZT) thin film actuators, allowing low voltage, low power actuation compared to current actuation methods. The integrated PZT thin film actuators are deposited on top of silicon-rich silicon nitride (SiRN) fluidic microchannels by pulsed laser deposition (PLD). In this paper we present the fabrication process and first characterization results, including a mass flow measurement with nitrogen flow using a Polytec MSA-400 laser Doppler vibrometer to detect the Coriolis induced motion of the sensor tube. The measurement results confirm that the sensor output is proportional to mass flow up to 14 mg/min.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"89 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114767838","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1002/HTTPS://DOI.ORG/10.1109/MEMSYS.2018.8346656
J. Gorman, V. Gokhale
This paper reports on the design and implementation of an analog feedback controller for generating parametric resonance in linear microresonators that do not intrinsically demonstrate this phenomenon. It is shown that the controller produces a fundamental parametric resonance in a piezoelectric microresonator that is qualitatively similar to those found in MEMS resonators with intrinsic parametric resonances. The design of the controller is simple and has the potential to work with most resonators, even in the radio frequency range. As a result, it is possible to make use of parametric resonances in high-frequency, high quality factor resonators for oscillator applications in sensing, timing, and frequency control.
{"title":"Parametric resonance in linear microresonators using analog feedback","authors":"J. Gorman, V. Gokhale","doi":"10.1002/HTTPS://DOI.ORG/10.1109/MEMSYS.2018.8346656","DOIUrl":"https://doi.org/10.1002/HTTPS://DOI.ORG/10.1109/MEMSYS.2018.8346656","url":null,"abstract":"This paper reports on the design and implementation of an analog feedback controller for generating parametric resonance in linear microresonators that do not intrinsically demonstrate this phenomenon. It is shown that the controller produces a fundamental parametric resonance in a piezoelectric microresonator that is qualitatively similar to those found in MEMS resonators with intrinsic parametric resonances. The design of the controller is simple and has the potential to work with most resonators, even in the radio frequency range. As a result, it is possible to make use of parametric resonances in high-frequency, high quality factor resonators for oscillator applications in sensing, timing, and frequency control.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131797772","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1109/MEMSYS.2018.8346668
Hoe-Joon Kim, Soon In Jung, J. Segovia-Fernandez, G. Piazza
This paper presents experimental studies of flicker frequency (1/f) noise of 1 GHz aluminum nitride (AlN) contour mode resonators (CMR) as a function of electrode design. AlN CMRs with various electrode dimensions and different top electrode materials of Al, Au, and Pt are fabricated to give a wide range of thermoelastic damping (TED), which directly impacts the flicker noise of CMRs. We have measured the flicker noise of a total of 64 devices and the results show that flicker noise decreases with increasing Q, with a power law dependence which ranges from 1/Q3.2 to 1/Q3.8. Interestingly, the noise level also depends on the type of electrode materials, where the devices with Pt top electrode demonstrate the best noise performance. Our results indicate that a careful selection of the electrode material and dimensions could further reduce 1/f noise not only in AlN CMRs, but also in various classes of resonators, and thus enable ultra-low noise MEMS resonators for sensing and RF applications.
{"title":"A study on flicker frequency noise of piezoelectric aluminum nitride resonators as a function of electrode design","authors":"Hoe-Joon Kim, Soon In Jung, J. Segovia-Fernandez, G. Piazza","doi":"10.1109/MEMSYS.2018.8346668","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346668","url":null,"abstract":"This paper presents experimental studies of flicker frequency (1/f) noise of 1 GHz aluminum nitride (AlN) contour mode resonators (CMR) as a function of electrode design. AlN CMRs with various electrode dimensions and different top electrode materials of Al, Au, and Pt are fabricated to give a wide range of thermoelastic damping (TED), which directly impacts the flicker noise of CMRs. We have measured the flicker noise of a total of 64 devices and the results show that flicker noise decreases with increasing Q, with a power law dependence which ranges from 1/Q3.2 to 1/Q3.8. Interestingly, the noise level also depends on the type of electrode materials, where the devices with Pt top electrode demonstrate the best noise performance. Our results indicate that a careful selection of the electrode material and dimensions could further reduce 1/f noise not only in AlN CMRs, but also in various classes of resonators, and thus enable ultra-low noise MEMS resonators for sensing and RF applications.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123544506","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1109/MEMSYS.2018.8346471
Youmin Wang, Guangya Zhou, Kyoungsik Yu, Ming C. Wu
We report on a novel two-dimensional (2-D) optical phased arrays with 25,600 addressable phase shifters made of diffraction gratings with in-plane movement. The phase shift is independent of wavelength, and only depends on the displacement of the grating. The large optical aperture 3.2×3.1mm2 produces a narrow beam (0.028°×0.029°) steerable over a field-of-view of 4.4°×4.6° at 1550nm wavelength, with a maximum response time of 4.2μs.
{"title":"Large-scale MEMS-actuated 2-D optical phased arrays","authors":"Youmin Wang, Guangya Zhou, Kyoungsik Yu, Ming C. Wu","doi":"10.1109/MEMSYS.2018.8346471","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346471","url":null,"abstract":"We report on a novel two-dimensional (2-D) optical phased arrays with 25,600 addressable phase shifters made of diffraction gratings with in-plane movement. The phase shift is independent of wavelength, and only depends on the displacement of the grating. The large optical aperture 3.2×3.1mm<sup>2</sup> produces a narrow beam (0.028°×0.029°) steerable over a field-of-view of 4.4°×4.6° at 1550nm wavelength, with a maximum response time of 4.2μs.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114405226","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1109/MEMSYS.2018.8346606
H. Jia, Xu-Qian Zheng, M. Faizan, T. Larsen, L. Villanueva, P. Feng
We report on the first experimental demonstration of vibrating two-dimensional nanoelectromechanical systems (2D NEMS) with on-chip piezoelectric excitation. Combining a wafer-scale aluminum nitride (AlN) thin film technology with an all-dry transfer technique for atomic layer 2D semiconductors, we fabricate and piezoelectrically excite few-atomic-layer molybdenum disulfide (MoS2) NEMS resonators in the high frequency (HF) band. Multimode resonances up to 38MHz are observed, with efficient electromechanical drive from the AlN layer off the vibrating 2D NEMS device region (to avoid compromising the movable 2D device by electrodes needed for on-chip excitation and readout). The piezoelectrically excited 2D NEMS resonators may enable remotely driven, ultrasensitive transducers. Combined with on-chip electrical readout techniques (e.g., mixing), this device platform also holds promise for future radio frequency (RF) electronics and integrated systems.
{"title":"Molybdenum disulfide (MoS2) nanoelectromechanical resonators with on-chip aluminum nitride (AlN) piezoelectric excitation","authors":"H. Jia, Xu-Qian Zheng, M. Faizan, T. Larsen, L. Villanueva, P. Feng","doi":"10.1109/MEMSYS.2018.8346606","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346606","url":null,"abstract":"We report on the first experimental demonstration of vibrating two-dimensional nanoelectromechanical systems (2D NEMS) with on-chip piezoelectric excitation. Combining a wafer-scale aluminum nitride (AlN) thin film technology with an all-dry transfer technique for atomic layer 2D semiconductors, we fabricate and piezoelectrically excite few-atomic-layer molybdenum disulfide (MoS2) NEMS resonators in the high frequency (HF) band. Multimode resonances up to 38MHz are observed, with efficient electromechanical drive from the AlN layer off the vibrating 2D NEMS device region (to avoid compromising the movable 2D device by electrodes needed for on-chip excitation and readout). The piezoelectrically excited 2D NEMS resonators may enable remotely driven, ultrasensitive transducers. Combined with on-chip electrical readout techniques (e.g., mixing), this device platform also holds promise for future radio frequency (RF) electronics and integrated systems.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117049134","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1109/MEMSYS.2018.8346761
D. Kinahan, L. A. Julius, C. Schoen, T. Dreo, J. Ducrée
This work presents a rotational-pulse actuated micro-fluidic cartridge enabling automated detection of plant pathogens on a compact device towards point-of-use monitoring of food safety. This highly integrated “Lab-on-a-Disc” (LoaD) system first runs the sample over a stationary phase of silica beads, followed by ethanol (EtOH) wash and final elution of DNA. The eluate is then homogenized using ‘shake mode’ agitation, accurately metered and then mixed with reagents for loop-mediated isothermal amplification (LAMP). We successfully purify plant DNA and demonstrate on-disc quantitative LAMP amplification.
{"title":"Automated DNA purification and multiplexed lamp assay preparation on a centrifugal microfluidic “Lab-on-a-Disc” platform","authors":"D. Kinahan, L. A. Julius, C. Schoen, T. Dreo, J. Ducrée","doi":"10.1109/MEMSYS.2018.8346761","DOIUrl":"https://doi.org/10.1109/MEMSYS.2018.8346761","url":null,"abstract":"This work presents a rotational-pulse actuated micro-fluidic cartridge enabling automated detection of plant pathogens on a compact device towards point-of-use monitoring of food safety. This highly integrated “Lab-on-a-Disc” (LoaD) system first runs the sample over a stationary phase of silica beads, followed by ethanol (EtOH) wash and final elution of DNA. The eluate is then homogenized using ‘shake mode’ agitation, accurately metered and then mixed with reagents for loop-mediated isothermal amplification (LAMP). We successfully purify plant DNA and demonstrate on-disc quantitative LAMP amplification.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133058755","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2018-01-21DOI: 10.1002/HTTPS://DOI.ORG/10.1109/MEMSYS.2018.8346671
V. Gokhale, J. Gorman
This paper reports the first use of dynamic photoelastic imaging for identifying in-plane vibration modes in high-frequency MEMS resonators. In a set of width-extensional mode resonators (WE-BARs), we map fundamental width-extensional modes ω(01) and unwanted higher-order spurious length-extensional modes ω(i, 0). In addition, we detect unexpected spurious modes ‘ωχ’ for all designs that are potentially detrimental due to their proximity to w(0,1). We show the dependence of both intended modes and spurious modes on aspect ratio and discuss methods of mitigation for the latter. It is shown that the photoelastic technique is broadly applicable to high-resolution mapping and identification of vibration modes in MEMS resonators.
{"title":"Identifying spurious modes in RF-MEMS resonators using photoelastic imaging","authors":"V. Gokhale, J. Gorman","doi":"10.1002/HTTPS://DOI.ORG/10.1109/MEMSYS.2018.8346671","DOIUrl":"https://doi.org/10.1002/HTTPS://DOI.ORG/10.1109/MEMSYS.2018.8346671","url":null,"abstract":"This paper reports the first use of dynamic photoelastic imaging for identifying in-plane vibration modes in high-frequency MEMS resonators. In a set of width-extensional mode resonators (WE-BARs), we map fundamental width-extensional modes ω<inf>(01)</inf> and unwanted higher-order spurious length-extensional modes ω<inf>(i, 0)</inf>. In addition, we detect unexpected spurious modes ‘ω<inf>χ</inf>’ for all designs that are potentially detrimental due to their proximity to w<inf>(0,1)</inf>. We show the dependence of both intended modes and spurious modes on aspect ratio and discuss methods of mitigation for the latter. It is shown that the photoelastic technique is broadly applicable to high-resolution mapping and identification of vibration modes in MEMS resonators.","PeriodicalId":400754,"journal":{"name":"2018 IEEE Micro Electro Mechanical Systems (MEMS)","volume":"550 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116234334","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：