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Silicon carbide (SiC): a short history. an analytical approach for SiC power device design 碳化硅(SiC):历史较短。SiC功率器件设计的一种分析方法
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558796
G. Brezeanu
As this year we celebrate a century since the discovery of Silicon Carbide, a short history of semiconductor material is presented in the first part of the paper. Design guidelines, based on simple analytical expressions, for ideal structures of high power SiC Schottky barrier diodes (SBD), are also included
在今年我们庆祝碳化硅发现一百周年之际,本文的第一部分介绍了半导体材料的简短历史。设计指南,基于简单的解析表达式,为高功率SiC肖特基势垒二极管(SBD)的理想结构,还包括
{"title":"Silicon carbide (SiC): a short history. an analytical approach for SiC power device design","authors":"G. Brezeanu","doi":"10.1109/SMICND.2005.1558796","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558796","url":null,"abstract":"As this year we celebrate a century since the discovery of Silicon Carbide, a short history of semiconductor material is presented in the first part of the paper. Design guidelines, based on simple analytical expressions, for ideal structures of high power SiC Schottky barrier diodes (SBD), are also included","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"2013 1","pages":"345-348 vol. 2"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86485387","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
Standard input CMOS gain stages noise analysis 标准输入CMOS增益级噪声分析
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558804
A. Danchiv, M. Bodea, C. Dan
Tins paper presents the systematic first order manual noise analysis for the CMOS active loud standard and folded cascade differential stages and a standard OTA stage. The basic equations for noise performance analysis are developed and the results are checked by SPICE simulation. A standard 0.6 mum CMOS processes is used
本文对CMOS有源噪声标准级、折叠级联差动级和标准OTA级进行了系统的一阶人工噪声分析。建立了噪声性能分析的基本方程,并通过SPICE仿真对分析结果进行了验证。使用标准的0.6 μ m CMOS工艺
{"title":"Standard input CMOS gain stages noise analysis","authors":"A. Danchiv, M. Bodea, C. Dan","doi":"10.1109/SMICND.2005.1558804","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558804","url":null,"abstract":"Tins paper presents the systematic first order manual noise analysis for the CMOS active loud standard and folded cascade differential stages and a standard OTA stage. The basic equations for noise performance analysis are developed and the results are checked by SPICE simulation. A standard 0.6 mum CMOS processes is used","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"1 1","pages":"375-378 vol. 2"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76029383","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The noise-equivalent magnetic induction spectral density of magnetotransistors 磁晶体管的噪声等效磁感应谱密度
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558824
G. Caruntu, M. Drãgulinescu
In this paperwork, based on the model of dual Hall devices, it is analysed the operating conditions, and are established the noise main characteristics for magnetotransistor structures realised in the bipolar and MOS circuits technology. By using the numerical simulation, the values of the noise-equivalent magnetic induction spectral density for different structure devices are compared and it is also emphasized the way in which choosing the geometry and material properties influence on the device performances. There are also presented and described the electrical diagrams of the transducers which contain such sensors
本文在双霍尔器件模型的基础上,分析了双极和MOS电路技术实现的磁晶体管结构的工作条件,建立了磁晶体管结构的噪声主要特性。通过数值模拟,比较了不同结构器件的噪声等效磁感应谱密度值,强调了几何形状和材料性能的选择对器件性能的影响。还提出并描述了包含这种传感器的换能器的电气图
{"title":"The noise-equivalent magnetic induction spectral density of magnetotransistors","authors":"G. Caruntu, M. Drãgulinescu","doi":"10.1109/SMICND.2005.1558824","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558824","url":null,"abstract":"In this paperwork, based on the model of dual Hall devices, it is analysed the operating conditions, and are established the noise main characteristics for magnetotransistor structures realised in the bipolar and MOS circuits technology. By using the numerical simulation, the values of the noise-equivalent magnetic induction spectral density for different structure devices are compared and it is also emphasized the way in which choosing the geometry and material properties influence on the device performances. There are also presented and described the electrical diagrams of the transducers which contain such sensors","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"27 1","pages":"451-454 vol. 2"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74738494","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Growth of titanium oxide nanorods 氧化钛纳米棒的生长
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558707
R. Plugaru, A. Cremades, J. Piqueras
Nanorods of titanium oxide (TiO/sub 2/) were obtained by thermally activated growth process carried out on pellets of nanocrystalline powder with mixed anatase and rutile structures. The nanostructured array consists of nanorods with length between 300 nm and I /spl mu/m and hexagonal cross section of 100-200 nm diameter. Herein it is shown that one can obtain information on the nanostructure growth from cathodoluminescence emission spectra. The growth process of the rods is mainly associated with the presence of the anatase phase. The key role of characteristic defects in semiconductor oxides, namely oxygen vacancies and Ti/sup n+/ ions is discussed.
在锐钛矿和金红石混合结构的纳米晶粉末颗粒上进行热活化生长,得到了氧化钛纳米棒(TiO/sub 2/)。纳米结构阵列由长度在300 nm至1 /spl μ m之间的纳米棒和直径100-200 nm的六边形截面组成。研究表明,从阴极发光发射光谱中可以获得纳米结构生长的信息。棒材的生长过程主要与锐钛矿相的存在有关。讨论了半导体氧化物中特征缺陷的关键作用,即氧空位和Ti/sup n+/离子。
{"title":"Growth of titanium oxide nanorods","authors":"R. Plugaru, A. Cremades, J. Piqueras","doi":"10.1109/SMICND.2005.1558707","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558707","url":null,"abstract":"Nanorods of titanium oxide (TiO/sub 2/) were obtained by thermally activated growth process carried out on pellets of nanocrystalline powder with mixed anatase and rutile structures. The nanostructured array consists of nanorods with length between 300 nm and I /spl mu/m and hexagonal cross section of 100-200 nm diameter. Herein it is shown that one can obtain information on the nanostructure growth from cathodoluminescence emission spectra. The growth process of the rods is mainly associated with the presence of the anatase phase. The key role of characteristic defects in semiconductor oxides, namely oxygen vacancies and Ti/sup n+/ ions is discussed.","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"30 1","pages":"51-54 vol. 1"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80588057","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Quantum confinement in the photoluminescence of nanocrystalline porous silicon 纳米晶多孔硅光致发光中的量子约束
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558708
I. Stavarache, M. Ciurea, V. Iancu
The paper presents the photoluminescence of nanocrystalline porous silicon. Two maxima were observed for rather fresh samples, one located at the infrared edge of the visible range and the other one in red. After ageing, the first maximum vanishes, suggesting its relation with the surface states, while the red one undergoes a significant blue shift. A simple quantum confinement model allows to correlate the photon energy of the red maximum with a transition between two confinement levels and to interpret the blue shift in terms of size reduction by oxidation. These results are in good agreement with previous microstructure measurements.
本文介绍了纳米晶多孔硅的光致发光特性。在相当新鲜的样品中观察到两个最大值,一个位于可见范围的红外边缘,另一个位于红色。老化后,第一个最大值消失,这表明它与表面状态有关,而红色最大值经历了显著的蓝色偏移。一个简单的量子约束模型允许将红色最大值的光子能量与两个约束能级之间的跃迁联系起来,并根据氧化引起的尺寸减小来解释蓝移。这些结果与先前的显微结构测量结果一致。
{"title":"Quantum confinement in the photoluminescence of nanocrystalline porous silicon","authors":"I. Stavarache, M. Ciurea, V. Iancu","doi":"10.1109/SMICND.2005.1558708","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558708","url":null,"abstract":"The paper presents the photoluminescence of nanocrystalline porous silicon. Two maxima were observed for rather fresh samples, one located at the infrared edge of the visible range and the other one in red. After ageing, the first maximum vanishes, suggesting its relation with the surface states, while the red one undergoes a significant blue shift. A simple quantum confinement model allows to correlate the photon energy of the red maximum with a transition between two confinement levels and to interpret the blue shift in terms of size reduction by oxidation. These results are in good agreement with previous microstructure measurements.","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"60 1","pages":"55-58 vol. 1"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90849426","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Modified aromatic polyimides with potential piezoelectric properties 具有潜在压电性能的改性芳族聚酰亚胺
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558785
E. Hamciuc, M. Brumǎ, C. Hamciuc, R. Lungu
Aromatic polyimides containing nitrile polar functional groups with potential piezoelectric properties have been synthesized by solution polycondensation of aromatic diamines having nitrile group with various aromatic dianhydrides. The polymers were easily soluble in polar aprotic solvents such as N-methylpirrolidone, N,N-dimethylformamide and N,N-dimethylacetamide. Thin transparent films having a thickness of tens of micrometers have been prepared from N-methylpyrrolidinone solutions by casting onto glass substrates. The polymers showed high thermal stability with decomposition temperature being above 430 degC and glass transition temperature in the range of 200-280 degC, with a large interval between glass transition and decomposition temperature
采用含腈基芳香二胺与各种芳香二酐溶液缩聚的方法,合成了具有潜在压电性能的含腈极性官能团芳香聚酰亚胺。该聚合物易溶于N-甲基吡咯烷酮、N,N-二甲基甲酰胺和N,N-二甲基乙酰胺等极性非质子溶剂。将n -甲基吡咯烷酮溶液浇铸在玻璃基板上,制备了厚度为几十微米的透明薄膜。聚合物具有较高的热稳定性,分解温度在430℃以上,玻璃化转变温度在200 ~ 280℃之间,玻璃化转变温度与分解温度之间有较大的间隔
{"title":"Modified aromatic polyimides with potential piezoelectric properties","authors":"E. Hamciuc, M. Brumǎ, C. Hamciuc, R. Lungu","doi":"10.1109/SMICND.2005.1558785","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558785","url":null,"abstract":"Aromatic polyimides containing nitrile polar functional groups with potential piezoelectric properties have been synthesized by solution polycondensation of aromatic diamines having nitrile group with various aromatic dianhydrides. The polymers were easily soluble in polar aprotic solvents such as N-methylpirrolidone, N,N-dimethylformamide and N,N-dimethylacetamide. Thin transparent films having a thickness of tens of micrometers have been prepared from N-methylpyrrolidinone solutions by casting onto glass substrates. The polymers showed high thermal stability with decomposition temperature being above 430 degC and glass transition temperature in the range of 200-280 degC, with a large interval between glass transition and decomposition temperature","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"43 1","pages":"305-308 vol. 2"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90492680","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Design of vertically coupled microring resonators 垂直耦合微环谐振器的设计
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558734
M. Kusko, C. Kusko, D. Cristea
In this work we have analyzed from theoretical point of view a new proposed microring resonator structure based on the wafer bonding technique. We focused our attention on obtaining the single-mode operation of the microring resonator. We have found that this requirement can be established by imposing a lateral offset between ring and bus waveguide.
本文从理论上分析了一种基于晶圆键合技术的微环谐振腔结构。重点研究了微环谐振器的单模工作原理。我们发现这个要求可以通过在环形波导和母线波导之间施加横向偏移来实现。
{"title":"Design of vertically coupled microring resonators","authors":"M. Kusko, C. Kusko, D. Cristea","doi":"10.1109/SMICND.2005.1558734","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558734","url":null,"abstract":"In this work we have analyzed from theoretical point of view a new proposed microring resonator structure based on the wafer bonding technique. We focused our attention on obtaining the single-mode operation of the microring resonator. We have found that this requirement can be established by imposing a lateral offset between ring and bus waveguide.","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"77 1","pages":"153-156 vol. 1"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89413784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A study of the thermal oxidation of TaSi/sub 2/ and Ta/sub 2/Si silicides to form dielectric layers for MIS structures on 4H-SiC TaSi/ sub2 /和Ta/ sub2 /Si硅化物在4H-SiC上形成MIS结构介质层的热氧化研究
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558798
A. Pérez‐Tomás, P. Godignon, N. Mestres, J. Montserrat, J. Millán
Some physical and electrical characteristics of the insulator layers produced by the deposition of the Ta2Si and TaSi2 tantalum silicides on 4H-SiC substrates and subsequent oxidation are compared in this paper. The thermal oxidation of both silicides on silicon carbide substrates, produces insulator layers with relatively good interfacial properties. The lower interface traps density and oxide charge and especially, the higher dielectric constant, make the product of the Ta2Si oxidation more suitable than the one from TaSi 2 for gate applications. However, the oxidized TaSi2 layers present improved dielectric strength with reduced leakage current
本文比较了Ta2Si和TaSi2硅化钽在4H-SiC衬底上沉积和氧化后的绝缘层的一些物理和电气特性。两种硅化物在碳化硅衬底上热氧化,产生具有相对良好界面性能的绝缘层。较低的界面陷阱密度和氧化物电荷,特别是较高的介电常数,使Ta2Si氧化产物比TaSi 2氧化产物更适合栅极应用。然而,氧化后的TaSi2层表现出更高的介电强度和更小的泄漏电流
{"title":"A study of the thermal oxidation of TaSi/sub 2/ and Ta/sub 2/Si silicides to form dielectric layers for MIS structures on 4H-SiC","authors":"A. Pérez‐Tomás, P. Godignon, N. Mestres, J. Montserrat, J. Millán","doi":"10.1109/SMICND.2005.1558798","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558798","url":null,"abstract":"Some physical and electrical characteristics of the insulator layers produced by the deposition of the Ta2Si and TaSi2 tantalum silicides on 4H-SiC substrates and subsequent oxidation are compared in this paper. The thermal oxidation of both silicides on silicon carbide substrates, produces insulator layers with relatively good interfacial properties. The lower interface traps density and oxide charge and especially, the higher dielectric constant, make the product of the Ta2Si oxidation more suitable than the one from TaSi 2 for gate applications. However, the oxidized TaSi2 layers present improved dielectric strength with reduced leakage current","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"33 1","pages":"353-356 vol. 2"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85930830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Investigation of thermally activated charging effects in RF-MEMS switches RF-MEMS开关热激活充电效应的研究
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1109/SMICND.2005.1558740
M. Exarchos, V. Theonas, G. Papaioannou, G. Constantinidis, S. Psychias, D. Vasilache, M. Dragoman, A. Muller, D. Neculoiu
The paper presents the investigation of the temperature dependence of the charging mechanism in RF-MEMS switch insulating layer. The accumulated charge kinetics has been monitored through the transient response of the device capacitance. The transient response is shown to follow rather a stretched exponential law than an exponential one. The time scale of the process is found to be thermally activated, with an activation energy that is determined from Arrhenius plot. This allows the determination of the time constant of the contributing mechanism at room temperature.
本文研究了RF-MEMS开关绝缘层充电机理的温度依赖性。通过器件电容的瞬态响应监测了累积电荷动力学。结果表明,瞬态响应遵循的是一种拉伸的指数律,而不是指数律。发现该过程的时间尺度是热激活的,活化能由Arrhenius图确定。这样就可以确定在室温下作用机理的时间常数。
{"title":"Investigation of thermally activated charging effects in RF-MEMS switches","authors":"M. Exarchos, V. Theonas, G. Papaioannou, G. Constantinidis, S. Psychias, D. Vasilache, M. Dragoman, A. Muller, D. Neculoiu","doi":"10.1109/SMICND.2005.1558740","DOIUrl":"https://doi.org/10.1109/SMICND.2005.1558740","url":null,"abstract":"The paper presents the investigation of the temperature dependence of the charging mechanism in RF-MEMS switch insulating layer. The accumulated charge kinetics has been monitored through the transient response of the device capacitance. The transient response is shown to follow rather a stretched exponential law than an exponential one. The time scale of the process is found to be thermally activated, with an activation energy that is determined from Arrhenius plot. This allows the determination of the time constant of the contributing mechanism at room temperature.","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"7 1","pages":"175-178 vol. 1"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84335186","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Current-mode Euclidean distance circuit independent on technological parameters 不依赖于工艺参数的电流型欧氏距离电路
IF 0.1 0 THEATER Pub Date : 2005-12-19 DOI: 10.1080/00207217.2011.601439
C. Popa
A new n inputs current-mode Euclidean distance circuit will be presented. For improving the-circuit frequency response, only MOS transistors working in saturation will be used and a current-mode operation of the circuit will be imposed. The circuit output current, which represents the Euclidean distance function, is not dependent on technological parameters, with the result of an important reducing of the circuit errors. The Euclidean distance circuit is designed to be implemented in 0.35mum CMOS technology for n=16 inputs on a die area of about 45mumtimes60mum
提出一种新的n输入电流型欧氏距离电路。为了提高电路的频率响应,将只使用饱和工作的MOS晶体管,并施加电路的电流模式工作。电路输出电流表示欧几里得距离函数,它不依赖于工艺参数,从而大大减少了电路误差。欧几里得距离电路设计用于在约45mumtimes60mum的芯片面积上实现n=16个输入的0.35mum CMOS技术
{"title":"Current-mode Euclidean distance circuit independent on technological parameters","authors":"C. Popa","doi":"10.1080/00207217.2011.601439","DOIUrl":"https://doi.org/10.1080/00207217.2011.601439","url":null,"abstract":"A new n inputs current-mode Euclidean distance circuit will be presented. For improving the-circuit frequency response, only MOS transistors working in saturation will be used and a current-mode operation of the circuit will be imposed. The circuit output current, which represents the Euclidean distance function, is not dependent on technological parameters, with the result of an important reducing of the circuit errors. The Euclidean distance circuit is designed to be implemented in 0.35mum CMOS technology for n=16 inputs on a die area of about 45mumtimes60mum","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":"41 1","pages":"459-462 vol. 2"},"PeriodicalIF":0.1,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84579075","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
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