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1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers最新文献

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A 100 PS bipolar logic 一个100ps双极逻辑
Pub Date : 1900-01-01 DOI: 10.1109/ISSCC.1977.1155640
T. Sakai, Y. Sunohara, H. Nakamura, T. Sudo
AN ULTRA HIGH-SPEED bipolar integrated circuit has been developed with a propagation delay time of less than 100 ps. The process technologies involved are Elevated Electrode IC, an advanced version of SET’. The integrated transistor structure is shown in Figure 1. Arsenic doped polycrystalline silicon is used for the diffusion source as well as the elevated electrodes, emitter and collector, and also interconnection between devices. The polycrystalline silicon is processed to form an overhanging edge. In the subsequent metal evaporation process, the shadowed area under the overhanging edge functions to separate the polycrystalline silicon from the lower level, consequently the evaporated metals are isolated from another by the overhanging edge and the formation of all electrodes and interconnections is completed without the use of fine photolithography and etching processes. After the evaporation of metal on the entire surface of the circuit, the unnecessary portions are etched out by the conventional process, without precise mask alignment. The second metalization step can be made in the conventional way.
超高速双极集成电路已被开发,其传播延迟时间小于100 ps。所涉及的工艺技术是一种高级版本的高电极集成电路。集成晶体管结构如图1所示。砷掺杂多晶硅不仅用作扩散源,还用作高架电极、发射极和集电极,以及器件之间的互连。多晶硅被加工成形成悬边。在随后的金属蒸发过程中,悬垂边下的阴影区域将多晶硅与下层分离,因此蒸发的金属被悬垂边隔离开来,所有电极和互连的形成都无需使用精细的光刻和蚀刻工艺。在整个电路表面的金属蒸发后,不需要的部分通过传统工艺蚀刻出来,没有精确的掩模对准。第二步金属化可按常规方法进行。
{"title":"A 100 PS bipolar logic","authors":"T. Sakai, Y. Sunohara, H. Nakamura, T. Sudo","doi":"10.1109/ISSCC.1977.1155640","DOIUrl":"https://doi.org/10.1109/ISSCC.1977.1155640","url":null,"abstract":"AN ULTRA HIGH-SPEED bipolar integrated circuit has been developed with a propagation delay time of less than 100 ps. The process technologies involved are Elevated Electrode IC, an advanced version of SET’. The integrated transistor structure is shown in Figure 1. Arsenic doped polycrystalline silicon is used for the diffusion source as well as the elevated electrodes, emitter and collector, and also interconnection between devices. The polycrystalline silicon is processed to form an overhanging edge. In the subsequent metal evaporation process, the shadowed area under the overhanging edge functions to separate the polycrystalline silicon from the lower level, consequently the evaporated metals are isolated from another by the overhanging edge and the formation of all electrodes and interconnections is completed without the use of fine photolithography and etching processes. After the evaporation of metal on the entire surface of the circuit, the unnecessary portions are etched out by the conventional process, without precise mask alignment. The second metalization step can be made in the conventional way.","PeriodicalId":416313,"journal":{"name":"1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131567708","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
A charge transfer recursive filter 电荷传递递归滤波器
Pub Date : 1900-01-01 DOI: 10.1109/ISSCC.1977.1155722
W. Engeler, J. Tiemann, R. Baertsch, H. Goldberg
As all the weighting coefficients of the filter are positive, a weighted charge quantity is collected by a line beneath one of the elementary electrodes of each weighting electrode. A charge reading device is coupled to the line and supplies an electrical signal which is transmitted to the negative input of a differential amplifier, which receives the sampled input voltage of the filter at its positive input. The electrical output signal of the filter is taken, under low impedance, at the output of the differential amplifier, said signal being reinjected at the input of the filter by the injecting means.
由于滤波器的所有加权系数都是正的,因此每个加权电极的一个基本电极下面的一条线收集加权电荷量。电荷读取装置与线路耦合并提供电信号,该电信号被传输到差分放大器的负输入端,后者在其正输入端接收滤波器的采样输入电压。滤波器的电输出信号,在低阻抗下,在差分放大器的输出端,所述信号通过注入方式在滤波器的输入端被重新注入。
{"title":"A charge transfer recursive filter","authors":"W. Engeler, J. Tiemann, R. Baertsch, H. Goldberg","doi":"10.1109/ISSCC.1977.1155722","DOIUrl":"https://doi.org/10.1109/ISSCC.1977.1155722","url":null,"abstract":"As all the weighting coefficients of the filter are positive, a weighted charge quantity is collected by a line beneath one of the elementary electrodes of each weighting electrode. A charge reading device is coupled to the line and supplies an electrical signal which is transmitted to the negative input of a differential amplifier, which receives the sampled input voltage of the filter at its positive input. The electrical output signal of the filter is taken, under low impedance, at the output of the differential amplifier, said signal being reinjected at the input of the filter by the injecting means.","PeriodicalId":416313,"journal":{"name":"1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123731770","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 13
Bootstrap-pumped control circuitry for an MNOS EAROM MNOS EAROM的自举泵浦控制电路
Pub Date : 1900-01-01 DOI: 10.1109/ISSCC.1977.1155657
W. Dodson, J. Heightley, V. Alfisi, R. Lodi
{"title":"Bootstrap-pumped control circuitry for an MNOS EAROM","authors":"W. Dodson, J. Heightley, V. Alfisi, R. Lodi","doi":"10.1109/ISSCC.1977.1155657","DOIUrl":"https://doi.org/10.1109/ISSCC.1977.1155657","url":null,"abstract":"","PeriodicalId":416313,"journal":{"name":"1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126225742","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A 1024-bit, fused link CMOS PROM 一个1024位,融合链路CMOS PROM
Pub Date : 1900-01-01 DOI: 10.1109/ISSCC.1977.1155652
J. Schroeder, R. Goslin
PROGRAMMABLE read-only memories (PRO%) have been available for several years. Previous fused-link PROMS‘ 3‘ have used bipolar technology with its accompanying high power dissipation. MOS PROMS have used charge storaxe in dualdielectric3 or floating-gate structures. The operating range of these memories is limited by charge loss at elevated temperature^^'^. This paper will describe a fused-link CMOS PROhI which overcomes these earlicr limitations. The basic features are summarized in Table I.
可编程只读存储器(PRO%)已经可用好几年了。以前的熔接PROMS ' 3 '采用双极技术,其伴随的高功耗。MOS prom在双介电或浮栅结构中使用电荷存储。这些存储器的工作范围受到高温下电荷损失的限制^^'^。本文将介绍一种克服这些早期限制的融合链路CMOS PROhI。表1总结了其基本特征。
{"title":"A 1024-bit, fused link CMOS PROM","authors":"J. Schroeder, R. Goslin","doi":"10.1109/ISSCC.1977.1155652","DOIUrl":"https://doi.org/10.1109/ISSCC.1977.1155652","url":null,"abstract":"PROGRAMMABLE read-only memories (PRO%) have been available for several years. Previous fused-link PROMS‘ 3‘ have used bipolar technology with its accompanying high power dissipation. MOS PROMS have used charge storaxe in dualdielectric3 or floating-gate structures. The operating range of these memories is limited by charge loss at elevated temperature^^'^. This paper will describe a fused-link CMOS PROhI which overcomes these earlicr limitations. The basic features are summarized in Table I.","PeriodicalId":416313,"journal":{"name":"1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"85 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127196240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
The future of data acquisition and control 数据采集和控制的未来
Pub Date : 1900-01-01 DOI: 10.1109/ISSCC.1977.1155624
A. Brokaw, J. Schoeff
Large scale integration has in the past been dominated by digital circuits, largely because digital systems demand a much narrower range of circuit types and device performance for a given task. The resulting density and case of design and use makes them lower in cost. Many system problems remain, however, which cannot be solved entirely by digital means. The need for low cost, high performance measurement, data conversion, signal processing, communication, and control devices is growing with the pervasiveness of digital systems. The dollar volume of these devices may even exceed that of the digital LSI circuits as the central controllers mature and systems become more I/O intensive.
在过去,大规模集成一直由数字电路主导,主要是因为数字系统对给定任务的电路类型和器件性能的要求要窄得多。由此产生的密度以及设计和使用的情况使它们的成本更低。然而,仍然存在许多系统问题,这些问题不能完全通过数字手段解决。随着数字系统的普及,对低成本、高性能测量、数据转换、信号处理、通信和控制设备的需求正在增长。随着中央控制器的成熟和系统变得更加I/O密集,这些设备的美元体积甚至可能超过数字LSI电路。
{"title":"The future of data acquisition and control","authors":"A. Brokaw, J. Schoeff","doi":"10.1109/ISSCC.1977.1155624","DOIUrl":"https://doi.org/10.1109/ISSCC.1977.1155624","url":null,"abstract":"Large scale integration has in the past been dominated by digital circuits, largely because digital systems demand a much narrower range of circuit types and device performance for a given task. The resulting density and case of design and use makes them lower in cost. Many system problems remain, however, which cannot be solved entirely by digital means. The need for low cost, high performance measurement, data conversion, signal processing, communication, and control devices is growing with the pervasiveness of digital systems. The dollar volume of these devices may even exceed that of the digital LSI circuits as the central controllers mature and systems become more I/O intensive.","PeriodicalId":416313,"journal":{"name":"1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"94 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115240695","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The pretuned module: An integrated millimeter wave oscillator 预调谐模块:集成毫米波振荡器
Pub Date : 1900-01-01 DOI: 10.1109/ISSCC.1977.1155631
G. Cachier, J. Espaignol
{"title":"The pretuned module: An integrated millimeter wave oscillator","authors":"G. Cachier, J. Espaignol","doi":"10.1109/ISSCC.1977.1155631","DOIUrl":"https://doi.org/10.1109/ISSCC.1977.1155631","url":null,"abstract":"","PeriodicalId":416313,"journal":{"name":"1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"41 8","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114022720","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
期刊
1977 IEEE International Solid-State Circuits Conference. Digest of Technical Papers
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