首页 > 最新文献

2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)最新文献

英文 中文
A 135GHz slotline bandpass filter using silicon/membrane technology 采用硅/膜技术的135GHz槽线带通滤波器
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507056
Rui Li, Cheng Jin, K. Sampath, Min Tang, S. W. Ho, Siong Chiew Ong
This paper presents the design and implementation of a second-order 135GHz bandpass filter (BPF) constructed on a thin suspended membrane structure. The BPF is built by cascading two U-shape slotline resonators formed on the ground plane. The input and output coupling are achieved by the microstrip line to slotline transition on the other side of the substrate. The unloaded quality (Q) factors of both I-shape and U-shape resonator due to the radiation, material and conductor loss are studied. The BPF is fabricated and measured, and it demonstrates a good agreement between the simulation and measurement results.
提出了一种基于薄悬浮膜结构的二阶135GHz带通滤波器的设计与实现。BPF是由两个u型槽线谐振器级联而成的。输入和输出耦合是通过衬底另一侧的微带线到槽线的过渡来实现的。研究了辐射损耗、材料损耗和导体损耗对i型谐振器和u型谐振器空载质量(Q)的影响。制作并测量了该滤波器,仿真结果与测量结果吻合较好。
{"title":"A 135GHz slotline bandpass filter using silicon/membrane technology","authors":"Rui Li, Cheng Jin, K. Sampath, Min Tang, S. W. Ho, Siong Chiew Ong","doi":"10.1109/EPTC.2012.6507056","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507056","url":null,"abstract":"This paper presents the design and implementation of a second-order 135GHz bandpass filter (BPF) constructed on a thin suspended membrane structure. The BPF is built by cascading two U-shape slotline resonators formed on the ground plane. The input and output coupling are achieved by the microstrip line to slotline transition on the other side of the substrate. The unloaded quality (Q) factors of both I-shape and U-shape resonator due to the radiation, material and conductor loss are studied. The BPF is fabricated and measured, and it demonstrates a good agreement between the simulation and measurement results.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"292 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122303844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The effect of TSV design parameters on the manufacturability of TSV interposers TSV设计参数对TSV中间体可制造性的影响
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507062
Y. S. Chan, Hong Yu Li, Xiaowu Zhang
TSV interposer is expected to be the driving vehicle for 2.5-D IC integration. Although a number of studies have been reported on the thermo-mechanical reliability of TSVs, it remains difficult for one to justify whether a TSV design or an interposer design is manufacturable or not because we are still lack of experimental reliability data. This investigation has provided this important experimental data, and also a series of correlation studies by finite element simulations. A 2-D analytical solution was also examined to help understanding the physics of the problem. Regarding the experimental results, wafer cracking was observed for TSV arrays with large diameters and small pitch-to-diameter ratios after annealing at 300 °C. The critical strength to wafer cracking was determined to be 388 MPa from some finite element analyses. Through analytical considerations, the influence of TSV diameter on wafer cracking was found to rely on the contributions from the dielectric layer thickness and also the barrier layer thickness. An empirical model for the design of copper-filled TSV interposers was ultimately generated based on the modification of the 2-D solution.
TSV interposer有望成为2.5维IC集成的驱动工具。虽然已经报道了许多关于TSV热机械可靠性的研究,但由于我们仍然缺乏实验可靠性数据,因此很难证明TSV设计或中间体设计是否可制造。本研究提供了这一重要的实验数据,并通过有限元模拟进行了一系列相关研究。为了帮助理解问题的物理性质,还研究了一个二维解析解。实验结果表明,大直径、小径比的TSV阵列在300℃退火后出现了晶圆开裂现象。通过有限元分析,确定了晶圆开裂的临界强度为388 MPa。通过分析,发现TSV直径对晶圆开裂的影响依赖于介电层厚度和势垒层厚度的贡献。通过对二维解的修正,最终建立了铜填充TSV中介体设计的经验模型。
{"title":"The effect of TSV design parameters on the manufacturability of TSV interposers","authors":"Y. S. Chan, Hong Yu Li, Xiaowu Zhang","doi":"10.1109/EPTC.2012.6507062","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507062","url":null,"abstract":"TSV interposer is expected to be the driving vehicle for 2.5-D IC integration. Although a number of studies have been reported on the thermo-mechanical reliability of TSVs, it remains difficult for one to justify whether a TSV design or an interposer design is manufacturable or not because we are still lack of experimental reliability data. This investigation has provided this important experimental data, and also a series of correlation studies by finite element simulations. A 2-D analytical solution was also examined to help understanding the physics of the problem. Regarding the experimental results, wafer cracking was observed for TSV arrays with large diameters and small pitch-to-diameter ratios after annealing at 300 °C. The critical strength to wafer cracking was determined to be 388 MPa from some finite element analyses. Through analytical considerations, the influence of TSV diameter on wafer cracking was found to rely on the contributions from the dielectric layer thickness and also the barrier layer thickness. An empirical model for the design of copper-filled TSV interposers was ultimately generated based on the modification of the 2-D solution.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116495685","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low cost fillers die attach materials development for powerpad and non powerpad packages with PPF LDF 使用PPF LDF的电源板和非电源板封装的低成本填充物模附材料的开发
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507091
Megan Chang, F. Yu
This paper presents TI development of low cost fillers die attach materials for powerpad and non powerpad packages with PPF LDF. While silver fillers drive conductive die attach applications in semiconductor history, eagerness for a promising alternative filler die attach has been arising to get rid of silver filler die attach price impacted by silver price on the market. Besides the short term cost benefit, how to maintain the long term cost advantage across the rivals is another priority for development. Silver plated copper (SPC) filler die attach materials have attracted a lot of attentions due to the relative higher thermal conductivity and lower cost of metal copper comparing with other metals. Although there has been available silver plated copper die attach materials in semiconductor industry, however the low thermal conductivity constrains the application in powerpad packages especially for the weak adhesion performance of PPF Au/Pd/Ni LDF. In addition to silver plated copper fillers, many opportunities are being engaged and evaluated for promising long term cost advantages die attach materials for electronic packaging. Among of them, copper filler is the most interesting target for the super low cost die attach materials. Quality and reliability of low cost metals die attach materials have been validating via extensive evaluation plan on powerpad and non powerpad packages in recent and confirmed as noteworthy solutions for further development.
本文介绍了TI公司利用PPF - LDF开发的低成本电源板和非电源板封装填充物封装材料。在半导体发展史上,银填料推动了导电晶片的应用,同时,为了摆脱银填料晶片价格受市场银价影响的影响,人们迫切需要一种有前途的替代填料晶片。除了短期的成本效益,如何在竞争中保持长期的成本优势是企业发展的另一个重点。与其他金属相比,金属铜具有较高的导热性和较低的成本,因此镀银铜填充模贴材料受到了广泛的关注。虽然在半导体工业中已经有了镀银铜的贴片材料,但是由于其导热系数低,限制了其在电源板封装中的应用,特别是PPF (Au/Pd/Ni) LDF的粘附性能较弱。除了镀银铜填料外,许多机会正在参与和评估有前景的长期成本优势的电子封装封装材料。其中,铜填料是超低成本模具贴附材料最感兴趣的目标。最近,通过对电源板和非电源板封装的广泛评估计划,低成本金属模具附加材料的质量和可靠性得到了验证,并被确认为进一步发展的重要解决方案。
{"title":"Low cost fillers die attach materials development for powerpad and non powerpad packages with PPF LDF","authors":"Megan Chang, F. Yu","doi":"10.1109/EPTC.2012.6507091","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507091","url":null,"abstract":"This paper presents TI development of low cost fillers die attach materials for powerpad and non powerpad packages with PPF LDF. While silver fillers drive conductive die attach applications in semiconductor history, eagerness for a promising alternative filler die attach has been arising to get rid of silver filler die attach price impacted by silver price on the market. Besides the short term cost benefit, how to maintain the long term cost advantage across the rivals is another priority for development. Silver plated copper (SPC) filler die attach materials have attracted a lot of attentions due to the relative higher thermal conductivity and lower cost of metal copper comparing with other metals. Although there has been available silver plated copper die attach materials in semiconductor industry, however the low thermal conductivity constrains the application in powerpad packages especially for the weak adhesion performance of PPF Au/Pd/Ni LDF. In addition to silver plated copper fillers, many opportunities are being engaged and evaluated for promising long term cost advantages die attach materials for electronic packaging. Among of them, copper filler is the most interesting target for the super low cost die attach materials. Quality and reliability of low cost metals die attach materials have been validating via extensive evaluation plan on powerpad and non powerpad packages in recent and confirmed as noteworthy solutions for further development.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128864345","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Advanced non-destructive fault isolation using computed tomography in flip-chip devices 在倒装芯片中使用计算机断层扫描进行先进的非破坏性故障隔离
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507140
Z. Syahirah, R. Gopmath, M. Tay
As package integration has reached a saturation point in device miniaturization, fault isolation of flip-chip packaging defects using real-time X-ray, even when using high-magnification viewing, is facing more challenges due to the increase in package complexity and shrinking package dimensions. Computed tomography (CT) X-ray is a solution to overcome this problem. This paper compares defect detection between 2D and 3D X-ray images using the CT X-ray platform. We present specific case study discussions of various defects that were challenging for 2D X-ray but effectively isolated by 3D X-ray.
随着封装集成度在器件小型化方面达到饱和点,由于封装复杂性的增加和封装尺寸的缩小,使用实时x射线对倒芯片封装缺陷进行故障隔离,即使使用高倍率观察,也面临着更多的挑战。计算机断层扫描(CT) x射线是克服这一问题的一种解决方案。本文比较了利用CT x射线平台进行二维和三维x射线图像的缺陷检测。我们提出了具体的案例研究讨论的各种缺陷是具有挑战性的二维x射线,但有效地隔离了三维x射线。
{"title":"Advanced non-destructive fault isolation using computed tomography in flip-chip devices","authors":"Z. Syahirah, R. Gopmath, M. Tay","doi":"10.1109/EPTC.2012.6507140","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507140","url":null,"abstract":"As package integration has reached a saturation point in device miniaturization, fault isolation of flip-chip packaging defects using real-time X-ray, even when using high-magnification viewing, is facing more challenges due to the increase in package complexity and shrinking package dimensions. Computed tomography (CT) X-ray is a solution to overcome this problem. This paper compares defect detection between 2D and 3D X-ray images using the CT X-ray platform. We present specific case study discussions of various defects that were challenging for 2D X-ray but effectively isolated by 3D X-ray.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129532408","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Fundamental study of fracture strength of silicon dies in flip-chip lidless packages 倒装无盖封装中硅模断裂强度的基础研究
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507080
Ravi Subramaniyan Sathanantham, F. Foo, Z. Oh
Advancement in deep-sub-micron technology has given the microelectronic industry the opportunity to squeeze more transistors on a smaller die. As a result, thermal management solutions for these high-density circuits that dissipate a large amount of heat become ever-more essential. Compounding the thermal management challenge is the high demand for razor-thin products that are driving lidless packaging solutions. These lidless packages expose the die back-side to harsh environments, making it prone to scratches and chippage during assembly, testing, transportation, and handling. Hence, there is an urgent need to evaluate the strength of silicon die in lidless flip-chip packages and understand the effect of die back-side flaws at a fundamental level to ensure that the mechanical reliability of the flip-chip die is uncompromised. This work investigates the influence of microscopic flaws on the fracture strength of silicon die. This paper uses standard techniques to evaluate the strength of flip-chip die as a function of flaw size using a standard flexure test to determine fracture strength and the minimum flaw size required for fracture to occur in a silicon die. Efforts have been made to understand the origin and propagation of cracking in silicon by implementing fracture analysis techniques that can be adopted as one important step in physical failure analysis of die cracks.
深亚微米技术的进步使微电子工业有机会在更小的芯片上挤进更多的晶体管。因此,为这些高密度电路散热的热管理解决方案变得越来越重要。使热管理挑战复杂化的是对极薄产品的高需求,这推动了无盖包装解决方案。这些无盖封装暴露在恶劣的环境中,使其在组装,测试,运输和处理过程中容易出现划痕和碎片。因此,迫切需要评估无盖倒装芯片封装中硅芯片的强度,并从根本上了解芯片背面缺陷的影响,以确保倒装芯片的机械可靠性不受影响。本文研究了微观缺陷对硅模具断裂强度的影响。本文使用标准技术来评估倒装芯片模具的强度作为缺陷尺寸的函数,使用标准弯曲试验来确定断裂强度和硅模具中发生断裂所需的最小缺陷尺寸。通过实施断裂分析技术,人们已经努力了解硅中裂纹的起源和扩展,这可以作为模具裂纹物理失效分析的一个重要步骤。
{"title":"Fundamental study of fracture strength of silicon dies in flip-chip lidless packages","authors":"Ravi Subramaniyan Sathanantham, F. Foo, Z. Oh","doi":"10.1109/EPTC.2012.6507080","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507080","url":null,"abstract":"Advancement in deep-sub-micron technology has given the microelectronic industry the opportunity to squeeze more transistors on a smaller die. As a result, thermal management solutions for these high-density circuits that dissipate a large amount of heat become ever-more essential. Compounding the thermal management challenge is the high demand for razor-thin products that are driving lidless packaging solutions. These lidless packages expose the die back-side to harsh environments, making it prone to scratches and chippage during assembly, testing, transportation, and handling. Hence, there is an urgent need to evaluate the strength of silicon die in lidless flip-chip packages and understand the effect of die back-side flaws at a fundamental level to ensure that the mechanical reliability of the flip-chip die is uncompromised. This work investigates the influence of microscopic flaws on the fracture strength of silicon die. This paper uses standard techniques to evaluate the strength of flip-chip die as a function of flaw size using a standard flexure test to determine fracture strength and the minimum flaw size required for fracture to occur in a silicon die. Efforts have been made to understand the origin and propagation of cracking in silicon by implementing fracture analysis techniques that can be adopted as one important step in physical failure analysis of die cracks.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114629532","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Formation of solder cap on Cu pillar bump using formic acid reduction 用甲酸还原法在铜柱凸包上形成焊锡帽
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507153
Masaru Monta, K. Okiyama, T. Sakai, N. Imaizumi
In this paper, we report a reflow process that uses formic acid to rem ove the native oxide of a so lder on a Cu pillar instead of using flux. To study the effect of the solder on the Cu pillar, we compare the shape and the crystal structure of a wetted solder on a Cup illar afterareflo w process using formic acid and flux. To conduct the experiment, we also had to confirm the effect of the in termetallic compound layer between a solder and a Cu pillar. Therefore, we prepared the sample with a Ni layer between a so lder and a C u pillar to prevent the formation of an intermetallic compound layer. Both samples with/without Ni layer were investigated simultaneously. The results showed that the solder which was fabricated by a reflow process using formic acid crystalized even at a peak temperature of 228 °C, which is ciò se to the solder melting temperature. There was no difference in the reduction abilities between formic acid an d flux in the wettability test o f the solder. However, it was found that the amount of formic acid are proportional to the reflow temperature. Atmosphere of formic acid is main factor of raising peak temperature of reflow.
在本文中,我们报告了一种用甲酸代替助熔剂使铜柱上的有机氧化物脱除的回流工艺。为了研究焊料对铜柱的影响,我们比较了用甲酸和助焊剂回流后杯柱上湿润焊料的形状和晶体结构。为了进行实验,我们还必须确认焊料和铜柱之间的金属三元化合物层的影响。因此,我们在镍柱和钴柱之间制备了镍层,以防止金属间化合物层的形成。同时研究了带/不带Ni层的两种样品。结果表明,甲酸回流法制备的焊料在峰值温度为228℃时仍有结晶,与焊料熔化温度的关系为ciò。在焊料的润湿性试验中,甲酸和助焊剂的还原能力没有差异。然而,我们发现甲酸的用量与回流温度成正比。甲酸气氛是提高回流峰温度的主要因素。
{"title":"Formation of solder cap on Cu pillar bump using formic acid reduction","authors":"Masaru Monta, K. Okiyama, T. Sakai, N. Imaizumi","doi":"10.1109/EPTC.2012.6507153","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507153","url":null,"abstract":"In this paper, we report a reflow process that uses formic acid to rem ove the native oxide of a so lder on a Cu pillar instead of using flux. To study the effect of the solder on the Cu pillar, we compare the shape and the crystal structure of a wetted solder on a Cup illar afterareflo w process using formic acid and flux. To conduct the experiment, we also had to confirm the effect of the in termetallic compound layer between a solder and a Cu pillar. Therefore, we prepared the sample with a Ni layer between a so lder and a C u pillar to prevent the formation of an intermetallic compound layer. Both samples with/without Ni layer were investigated simultaneously. The results showed that the solder which was fabricated by a reflow process using formic acid crystalized even at a peak temperature of 228 °C, which is ciò se to the solder melting temperature. There was no difference in the reduction abilities between formic acid an d flux in the wettability test o f the solder. However, it was found that the amount of formic acid are proportional to the reflow temperature. Atmosphere of formic acid is main factor of raising peak temperature of reflow.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130299600","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
Study of Ag-alloy wire in thermosonic wire bonding 银合金丝热超声焊合的研究
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507133
Jie Wu, T. Rockey, O. Yauw, Liming Shen, B. Chylak
Lower cost materials, such as copper (Cu) and palladium coated copper (PdCu) are the commonly chosen alternatives of gold (Au) wire in the package industry. However, the high hardness of Cu and PdCu wires brings concerns over the bonding quality and the long-term reliability of the packages. Silver (Ag) has drawn more attention in the package industry since it has similar properties like hardness, elongation and breaking load as Au, while having a comparable price to PdCu. Bondability of Ag-alloy wire, including performance of free air balls (FAB) and bonding capability on aluminum (Al) die pads, was first investigated. Inspection of intermetallic compound (IMC) and unmolded baking of the bonded packages with the Ag-alloy wire were also carried out for further understanding the reliability performance of the wire. Investigations of bonding capability comparison between pure Ag, Ag-alloy, and PdCu wires in processes with stand-off-stitch-bond (SSB) and peel sensitive dies were included in the study as well. Generally, Ag-alloy wire delivers good and stable bonding capability using N2 as the cover gas. For applications with SSB and peel/lift sensitive bond pads which are normally difficult using PdCu wire, Ag-alloy wire also possesses good performance.
较低成本的材料,如铜(Cu)和钯包覆铜(PdCu)是封装行业中常用的金(Au)线的替代品。然而,铜和PdCu线的高硬度给封装的粘接质量和长期可靠性带来了担忧。银(Ag)在封装行业中引起了更多的关注,因为它具有与Au相似的硬度,伸长率和断裂载荷等特性,而价格与PdCu相当。首先研究了银合金丝的结合性能,包括自由空气球(FAB)性能和与铝(Al)模垫的结合性能。为了进一步了解银合金焊丝的可靠性性能,还对焊包进行了金属间化合物(IMC)检测和脱模烘烤。研究还包括纯银、银合金和PdCu线在隔针键合(SSB)和剥离敏感模具工艺中的键合能力比较。一般情况下,用氮气作为覆盖气体时,银合金丝具有良好而稳定的结合性能。对于通常难以使用PdCu线的SSB和剥离/提升敏感键合垫的应用,ag合金线也具有良好的性能。
{"title":"Study of Ag-alloy wire in thermosonic wire bonding","authors":"Jie Wu, T. Rockey, O. Yauw, Liming Shen, B. Chylak","doi":"10.1109/EPTC.2012.6507133","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507133","url":null,"abstract":"Lower cost materials, such as copper (Cu) and palladium coated copper (PdCu) are the commonly chosen alternatives of gold (Au) wire in the package industry. However, the high hardness of Cu and PdCu wires brings concerns over the bonding quality and the long-term reliability of the packages. Silver (Ag) has drawn more attention in the package industry since it has similar properties like hardness, elongation and breaking load as Au, while having a comparable price to PdCu. Bondability of Ag-alloy wire, including performance of free air balls (FAB) and bonding capability on aluminum (Al) die pads, was first investigated. Inspection of intermetallic compound (IMC) and unmolded baking of the bonded packages with the Ag-alloy wire were also carried out for further understanding the reliability performance of the wire. Investigations of bonding capability comparison between pure Ag, Ag-alloy, and PdCu wires in processes with stand-off-stitch-bond (SSB) and peel sensitive dies were included in the study as well. Generally, Ag-alloy wire delivers good and stable bonding capability using N2 as the cover gas. For applications with SSB and peel/lift sensitive bond pads which are normally difficult using PdCu wire, Ag-alloy wire also possesses good performance.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130658434","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
A hybrid panel embedding process for fanout 一种用于扇出的混合面板嵌入工艺
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507096
J. Hunt, Kidd Lee, P. Shih, J. Lin
As die sizes shrink with technology node advances, the area of WLCSP dice is becoming too small to accommodate all of the solder balls required for the dice I/O. One solution to this problem has been Fan Out Wafer Level Packages (FOWLP), which have been in volume production for over three years. However, these are Wafer processes, performed with either 200mm or 300mm reconstituted molded wafers, and are often not cost competitive with other traditional packages. A lower cost solution is needed to use for fanning out the I/O of small die that approximates the structure of the FOWLP. We have developed a panel process that uses a similar simple single Redistribution Layer (RDL) for the fan out function that complements the FOWLP solution.
随着技术节点的进步,芯片尺寸缩小,WLCSP芯片的面积变得太小,无法容纳芯片I/O所需的所有焊接球。解决这个问题的一种方法是扇出晶圆级封装(FOWLP),它已经量产了三年多。然而,这些都是晶圆工艺,使用200毫米或300毫米的重构模制晶圆,并且通常与其他传统封装相比没有成本竞争力。需要一种成本较低的解决方案来分散类似于FOWLP结构的小芯片的I/O。我们已经开发了一个面板流程,它使用类似的简单的单个再分发层(RDL)来完成扇出功能,以补充FOWLP解决方案。
{"title":"A hybrid panel embedding process for fanout","authors":"J. Hunt, Kidd Lee, P. Shih, J. Lin","doi":"10.1109/EPTC.2012.6507096","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507096","url":null,"abstract":"As die sizes shrink with technology node advances, the area of WLCSP dice is becoming too small to accommodate all of the solder balls required for the dice I/O. One solution to this problem has been Fan Out Wafer Level Packages (FOWLP), which have been in volume production for over three years. However, these are Wafer processes, performed with either 200mm or 300mm reconstituted molded wafers, and are often not cost competitive with other traditional packages. A lower cost solution is needed to use for fanning out the I/O of small die that approximates the structure of the FOWLP. We have developed a panel process that uses a similar simple single Redistribution Layer (RDL) for the fan out function that complements the FOWLP solution.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"253 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134347176","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Board-level shear, bend, drop and thermal cycling reliability of lead-free chip scale packages with partial underfill: a low-cost alternative to full underfill 板级剪切,弯曲,下降和热循环可靠性的无铅芯片规模封装部分底填:一个低成本的替代品,以充分的底填
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6522604
Hongbin Shi, Cuihua Tian, M. Pecht, T. Ueda
Full capillary flow underfill (FCFU) has been proven to be effective in improving the board-level mechanical reliability of lead-free (LF) area array packages (AAPs). However, the FCFU may have negative effects on the thermal cycling reliability of AAPs depending on the material properties of underfills, including coefficients of thermal expansion, glass transition temperature, modulus, and adhesion strength. In addition, the increased cost, time-consuming processes, and poor reworkability caused by the application of FCFU have also hindered the widespread use of the board-level underfills. In order to address these challenges, a partial capillary flow underfill (PCFU) or corner-only underfill approach was developed. However, data are scarce for board-level solder joint reliability of LF AAPs with PCFU, especially for portable electronics applications. In this paper, the overall reliability of LF chip scale packages (CSPs) with FCFU and PCFU was comparatively studied using the AAP-to-board interconnection shear test, monotonic 3-point bending test, vertical free drop test, and thermal cycling test. One set of non-underfilled CSP assemblies was tested as the control. The test results indicated that the mechanical performance of underfilled CSPs was significantly enhanced compared to the CSPs without underfill, especially for drop reliability. However, the characteristic life values of CSPs with FCFU and PCFU during the thermal cycling test were reduced by 15% and 8%, respectively. The improvement in overall boardlevel solder joint reliability of LF CSPs provided by the PCFU was comparable to that of the FCFU. Hence, partial underfill can be used as a good alternative to full underfill. Failure analysis demonstrated that the dominant failure mode was PCB pad cratering in shear and bending test, and the brittle fracture at the CSP intermetallic compound/solder interface was dominant for all the test groups under drop loading conditions. In contrast, the failure mechanisms of the underfilled and control boards were different during the thermal cycling test: PCB pad cratering and bulk solder fatigue crack were found in the CSPs with and without underfill, respectively.
全毛细流下填充(FCFU)已被证明可以有效提高无铅(LF)区域阵列封装(aap)的板级机械可靠性。然而,FCFU可能会对aap的热循环可靠性产生负面影响,这取决于下填料的材料特性,包括热膨胀系数、玻璃化转变温度、模量和粘附强度。此外,FCFU的应用所带来的成本增加、耗时、可返工性差等问题也阻碍了板级底填土的广泛应用。为了解决这些问题,研究人员开发了一种局部毛细流动下填(PCFU)或仅拐角下填方法。然而,关于带PCFU的LF aap板级焊点可靠性的数据很少,特别是在便携式电子应用中。本文通过aap -板互连剪切试验、单调三点弯曲试验、垂直自由跌落试验和热循环试验,对比研究了采用FCFU和PCFU的LF芯片级封装(csp)的整体可靠性。一组未充注的CSP组件作为对照进行了测试。试验结果表明,与未充填料的混凝土混凝土相比,未充填料的混凝土混凝土的力学性能有显著提高,特别是在跌落可靠性方面。然而,在热循环试验中,含FCFU和PCFU的csp的特征寿命值分别降低了15%和8%。PCFU提供的LF csp整体板级焊点可靠性的改善与FCFU相当。因此,局部底填可以作为完全底填的一个很好的替代方案。在剪切和弯曲试验中,PCB焊盘的主要破坏模式是击穿;在跌落加载条件下,CSP金属间化合物/焊料界面的脆性断裂在各试验组中都占主导地位。相比之下,在热循环测试中,欠填充板和控制板的失效机制不同:有欠填充和没有欠填充的csp分别出现PCB垫坑和大块焊料疲劳裂纹。
{"title":"Board-level shear, bend, drop and thermal cycling reliability of lead-free chip scale packages with partial underfill: a low-cost alternative to full underfill","authors":"Hongbin Shi, Cuihua Tian, M. Pecht, T. Ueda","doi":"10.1109/EPTC.2012.6522604","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6522604","url":null,"abstract":"Full capillary flow underfill (FCFU) has been proven to be effective in improving the board-level mechanical reliability of lead-free (LF) area array packages (AAPs). However, the FCFU may have negative effects on the thermal cycling reliability of AAPs depending on the material properties of underfills, including coefficients of thermal expansion, glass transition temperature, modulus, and adhesion strength. In addition, the increased cost, time-consuming processes, and poor reworkability caused by the application of FCFU have also hindered the widespread use of the board-level underfills. In order to address these challenges, a partial capillary flow underfill (PCFU) or corner-only underfill approach was developed. However, data are scarce for board-level solder joint reliability of LF AAPs with PCFU, especially for portable electronics applications. In this paper, the overall reliability of LF chip scale packages (CSPs) with FCFU and PCFU was comparatively studied using the AAP-to-board interconnection shear test, monotonic 3-point bending test, vertical free drop test, and thermal cycling test. One set of non-underfilled CSP assemblies was tested as the control. The test results indicated that the mechanical performance of underfilled CSPs was significantly enhanced compared to the CSPs without underfill, especially for drop reliability. However, the characteristic life values of CSPs with FCFU and PCFU during the thermal cycling test were reduced by 15% and 8%, respectively. The improvement in overall boardlevel solder joint reliability of LF CSPs provided by the PCFU was comparable to that of the FCFU. Hence, partial underfill can be used as a good alternative to full underfill. Failure analysis demonstrated that the dominant failure mode was PCB pad cratering in shear and bending test, and the brittle fracture at the CSP intermetallic compound/solder interface was dominant for all the test groups under drop loading conditions. In contrast, the failure mechanisms of the underfilled and control boards were different during the thermal cycling test: PCB pad cratering and bulk solder fatigue crack were found in the CSPs with and without underfill, respectively.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"407 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132206897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The effects of rate-dependent material properties and geometrical characteristics on thermo-mechanical behavior of TQFP package 速率相关材料性能和几何特性对TQFP封装热力学行为的影响
Pub Date : 2012-12-01 DOI: 10.1109/EPTC.2012.6507065
Emad A. Poshtan, S. Rzepka, B. Wunderle, C. Silber, T. von Bargen, B. Michel
In this paper we examine the influence of different characteristics of TQFP (thin quad flat package) components on package behavior by simulation and experiment. The varied parameters are the package dimensions, rate-dependent material properties such as viscoelasticity and cure shrinkage and external boundary conditions.
本文通过仿真和实验研究了薄四平面封装(TQFP)元件的不同特性对封装性能的影响。变化的参数是包装尺寸,速率相关的材料性能,如粘弹性和固化收缩率和外部边界条件。
{"title":"The effects of rate-dependent material properties and geometrical characteristics on thermo-mechanical behavior of TQFP package","authors":"Emad A. Poshtan, S. Rzepka, B. Wunderle, C. Silber, T. von Bargen, B. Michel","doi":"10.1109/EPTC.2012.6507065","DOIUrl":"https://doi.org/10.1109/EPTC.2012.6507065","url":null,"abstract":"In this paper we examine the influence of different characteristics of TQFP (thin quad flat package) components on package behavior by simulation and experiment. The varied parameters are the package dimensions, rate-dependent material properties such as viscoelasticity and cure shrinkage and external boundary conditions.","PeriodicalId":431312,"journal":{"name":"2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130244831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
期刊
2012 IEEE 14th Electronics Packaging Technology Conference (EPTC)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1