This study presents a theoretical framework to calculate the influence of image forces on the strength of Frank-Read (FR) sources near free surfaces. We present a line tension model that explicitly incorporates image stress forces to establish the critical conditions of a FR source operation at various distances from the surface. A quasi-static nested loop (QNL) computational framework is developed to calculate the critical stress of FR source operation, and predictions are validated against discrete dislocation dynamics (DDD) simulations. Our analysis identifies a critical threshold surface proximity below which image stresses dominate, preventing the stable formation of a bowed-out segment regardless of the applied stress. Additionally, we derive a generalized analytical model expressing source strength as a function of both segment length and surface distance, capturing the transition from surface-dominated to bulk-dominated activation regimes. These findings provide insights into the mechanisms behind size-dependent phenomena in confined crystals (e.g., microbeams, thin films), such as enhanced yield strength, stochastic strength variability, and strain avalanche. The proposed approach contributes to the development of more accurate constitutive models and DDD simulations of microscale plasticity in confined crystalline volumes by providing a more accurate assessment of dislocation source strength in the presence of free surfaces.
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