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Instant Test and Repair for TSVs using Differential Signaling 使用差分信号即时测试和修复 TSV
Pub Date : 2024-04-03 DOI: 10.1007/s10836-024-06112-y

Abstract

A faulty Through Silicon Via (TSV) could spoil a 3D IC and cause hefty loss as the potentially expensive known-good-dies bonded together must be discarded. This work presents a Fault-tolerant TSV scheme to avoid such a disastrous situation. Our method uses two differential TSVs for each binary signal to be transmitted. Compared to the previous Fault-tolerant TSV schemes, our test and repair scheme is not only instant and much more simplified, requiring no global test result analysis and complex reconfiguration process, thereby making it especially suitable for some situations when the more involved TSV test and repair schemes cannot be easily supported by some die providers in multi-vendor 3D-IC design environment.

摘要 一个故障硅通孔(TSV)可能会破坏三维集成电路,并造成巨大损失,因为必须丢弃粘合在一起的潜在昂贵的已知好元件。这项研究提出了一种容错 TSV 方案,以避免这种灾难性的情况。我们的方法为每个要传输的二进制信号使用两个差分 TSV。与之前的容错 TSV 方案相比,我们的测试和修复方案不仅即时,而且更加简化,不需要全局测试结果分析和复杂的重新配置过程,因此特别适用于在多供应商 3D-IC 设计环境中,一些芯片供应商无法轻松支持涉及较多 TSV 测试和修复方案的某些情况。
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引用次数: 0
An Analytical Model for Deposited Charge of Single Event Transient (SET) in FinFET FinFET 单事件瞬态 (SET) 沉积电荷的分析模型
Pub Date : 2024-03-28 DOI: 10.1007/s10836-024-06109-7
Baojun Liu, Li Cai, Chuang Li

With feature size scaling down, the effect of single event transient (SET) on the reliability of circuits is necessary to be considered. The bipolar amplification effect plays a key role in the charge collection of SET of nano-meter FinFET devices. It is important taking into account the bipolar amplification to calculate deposited charge, which is always obtained by a linear model dependency on linear energy transfer (LET) and silicon film thickness. Based on radiation-induced generation rate model and genetic arithmetic, an accurate analytical for the deposited charge of SET in FinFET is proposed. The effects of LET, volume of particle hit, characteristic radius and decay time of Gaussian function on the deposited charge are analyzed by the proposed model. The dependence of the device structure on the deposited charge is also discussed by the model. The results indicate that the presented model agrees with TCAD well. Compared with TCAD, the proposed model has an average relative error 0.002% while the linear model has an average relative error 50.5% for LET ranging from 3 to 110 MeV·cm2/mg. Due to large sensitive volume of the particle hit in source and drain areas, the deposited charge has two maxima in source and drain areas and a minimum round the gate-drain junction of fin. The deposited charge increases with the characteristic radius and decay time decrease and the relative error between TCAD and the proposed model represent a reduction trend.

随着特征尺寸的缩小,有必要考虑单事件瞬态(SET)对电路可靠性的影响。双极放大效应在纳米级 FinFET 器件的 SET 电荷收集中起着关键作用。在计算沉积电荷时必须考虑双极放大效应,而沉积电荷通常是通过线性模型获得的,与线性能量传递(LET)和硅膜厚度有关。在辐射诱导生成率模型和遗传算法的基础上,提出了 FinFET 中 SET 沉积电荷的精确分析方法。提出的模型分析了 LET、粒子撞击体积、特性半径和高斯函数衰减时间对沉积电荷的影响。模型还讨论了器件结构对沉积电荷的依赖性。结果表明,所提出的模型与 TCAD 非常吻合。与 TCAD 相比,所提出模型的平均相对误差为 0.002%,而线性模型在 3 到 110 MeV-cm2/mg 的 LET 范围内的平均相对误差为 50.5%。由于源极和漏极区域的粒子撞击敏感体积较大,沉积电荷在源极和漏极区域有两个最大值,而在鳍片的栅-漏交界处有一个最小值。沉积电荷随着特性半径的增加和衰减时间的缩短而增加,TCAD 与所提出模型之间的相对误差呈减小趋势。
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引用次数: 0
A DfT Strategy for Guaranteeing ReRAM’s Quality after Manufacturing 英国交通部保证 ReRAM 制造后质量的战略
Pub Date : 2024-03-23 DOI: 10.1007/s10836-024-06108-8

Abstract

Memristive devices have become promising candidates to complement the CMOS technology, due to their CMOS manufacturing process compatibility, zero standby power consumption, high scalability, as well as their capability to implement high-density memories and new computing paradigms. Despite these advantages, memristive devices are susceptible to manufacturing defects that may cause faulty behaviors not observed in CMOS technology, significantly increasing the challenge of testing these novel devices after manufacturing. This work proposes an optimized Design-for-Testability (DfT) strategy based on the introduction of a DfT circuitry that measures the current consumption of Resistive Random Access Memory (ReRAM) cells to detect not only traditional but also unique faults. The new DfT circuitry was validated using a case study composed of a 3x3 word-based ReRAM with peripheral circuitry implemented based on a 130 nm Predictive Technology Model (PTM) library. The obtained results demonstrate the fault detection capability of the proposed strategy with respect to traditional and unique faults. In addition, this paper evaluates the impact related to the DfT circuitry’s introduced overheads as well as the impact of process variation on the resolution of the proposed DfT circuitry.

摘要 由于具有 CMOS 制造工艺兼容性、零待机功耗、高可扩展性以及实现高密度存储器和新计算模式的能力,忆阻器已成为补充 CMOS 技术的有前途的候选器件。尽管具有这些优势,但存储器件容易受到制造缺陷的影响,可能导致 CMOS 技术中无法观察到的故障行为,从而大大增加了在制造后测试这些新型器件的难度。本研究提出了一种优化的可测试性设计(DfT)策略,其基础是引入一种 DfT 电路,测量电阻式随机存取存储器(ReRAM)单元的电流消耗,不仅能检测传统故障,还能检测独特故障。新的 DfT 电路通过一个案例研究进行了验证,该案例研究由基于 3x3 字的 ReRAM 和基于 130 纳米预测技术模型 (PTM) 库实现的外围电路组成。所获得的结果证明了所提出的策略在传统和独特故障方面的故障检测能力。此外,本文还评估了与 DfT 电路引入的开销有关的影响,以及工艺变化对拟议 DfT 电路分辨率的影响。
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引用次数: 0
Investigating and Reducing the Architectural Impact of Transient Faults in Special Function Units for GPUs 研究和减少 GPU 特殊功能单元中瞬态故障对架构的影响
Pub Date : 2024-03-21 DOI: 10.1007/s10836-024-06107-9
Josie E. Rodriguez Condia, Juan-David Guerrero-Balaguera, Edwar J. Patiño Núñez, Robert Limas, Matteo Sonza Reorda

Ensuring the reliability of GPUs and their internal components is paramount, especially in safety-critical domains like autonomous machines and self-driving cars. These cutting-edge applications heavily rely on GPUs to implement complex algorithms due to their implicit programming flexibility and parallelism, which is crucial for efficient operation. However, as integration technologies advance, there is a growing concern regarding the potential increase in fault sensitivity of the internal components of current GPU generations. In particular, Special Function Unit (SFU) cores inside GPUs are used in multimedia, High-Performance Computing, and neural network training. Despite their frequent usage and critical role in several domains, reliability evaluations on SFUs and the development of effective mitigation solutions have yet to be studied and remain unexplored. This work evaluates the impact of transient faults in the main hardware structures of SFUs in GPUs. In addition, we analyze the main overhead costs and benefits of developing selective-hardening mechanisms for SFUs. We focus on evaluating and analyzing two SFU architectures for GPUs (’fused’ and ’modular’) and their relations to energy, area, and reliability impact on parallel applications. The experiments resort to fine-grain fault injection campaigns on an RTL GPU model (FlexGripPlus) instrumented with both SFUs. The results on both SFU architectures indicate that fused SFUs (in commercial-grade devices) require lower area overhead (about 27%) for their integration in GPUs but are more vulnerable to transient faults (in up to 47% for the analyzed cases) and less power efficient (in up to 36.6%) than modular SFUs. Moreover, the reliability estimation shows that Modular SFUs are structurally more resilient than Fused ones in up to one order of magnitude. Similarly, selective-hardening mechanism based on Triple-Modular Redundancy (TMR) shows that coarse-grain strategies might increase the reliability of the overall SFUs under feasible overhead costs.

确保 GPU 及其内部组件的可靠性至关重要,尤其是在自主机器和自动驾驶汽车等安全关键领域。这些尖端应用严重依赖 GPU 来实现复杂的算法,因为 GPU 具有隐含的编程灵活性和并行性,这对高效运行至关重要。然而,随着集成技术的发展,人们越来越关注当前 GPU 内部组件故障敏感性的潜在增加。尤其是 GPU 内部的特殊功能单元(SFU)内核,被广泛应用于多媒体、高性能计算和神经网络训练等领域。尽管 SFU 在多个领域中被频繁使用并发挥着关键作用,但对其可靠性的评估以及有效缓解解决方案的开发仍有待研究和探索。这项工作评估了 GPU 中 SFU 主要硬件结构中瞬态故障的影响。此外,我们还分析了为 SFU 开发选择性硬化机制的主要开销成本和收益。我们重点评估和分析了用于 GPU 的两种 SFU 架构("融合 "和 "模块化")及其对并行应用的能量、面积和可靠性影响的关系。实验采用了细粒度故障注入方法,在配备了这两种 SFU 的 RTL GPU 模型(FlexGripPlus)上进行。两种 SFU 架构的实验结果表明,融合 SFU(商用级设备)集成到 GPU 中所需的面积开销较低(约 27%),但与模块化 SFU 相比,更容易受到瞬态故障的影响(在分析的情况下,高达 47%),且功耗较低(高达 36.6%)。此外,可靠性评估表明,模块化 SFU 在结构上比融合型 SFU 更有弹性,最多可提高一个数量级。同样,基于三模块冗余(TMR)的选择性硬化机制表明,粗粒度策略可以在可行的开销成本下提高整体 SFU 的可靠性。
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引用次数: 0
2023 JETTA Reviewers 2023 JETTA 评论员
Pub Date : 2024-03-21 DOI: 10.1007/s10836-024-06111-z
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引用次数: 0
Non-Invasive Hardware Trojans Modeling and Insertion: A Formal Verification Approach 非侵入式硬件木马建模与植入:形式化验证方法
Pub Date : 2024-03-20 DOI: 10.1007/s10836-024-06100-2
Hala Ibrahim, Haytham Azmi, M. Watheq El-Kharashi, Mona Safar

In modern chip designs, shared resources are used extensively. Arbiters usage is crucial to settle conflicts when multiple requests compete for these shared resources. Making sure these arbiter circuits work correctly is vital not just for their proper functionality, but also for security reasons. The work in this paper introduces a method based on formal verification to thoroughly assess the proper functional aspects of various arbiter setups. This is achieved through SystemVerilog assertions and model checking. Additionally, we explore a non-invasive method for the modeling and insertion of different types of hardware Trojans. These Trojans, with their unique triggers and payloads, are modeled formally without the need for any alterations to the actual circuit. The results provide a detailed analysis of the cost involved in running the formal verification environment on versions of arbiters that are free from Trojans. This analysis is carried out using Questa PropCheck formal analysis tool, which offers valuable insights into the time and memory resources required. Furthermore, the results highlights how the formally modeled and inserted Trojans interfere with hold criteria of the arbiters’ properties, where at least a single property fires due to the inserted Trojan. This work can be extended to be a generic approach with the potential to validate both the proper operation and security aspects of complex systems.

在现代芯片设计中,共享资源被广泛使用。当多个请求争夺这些共享资源时,仲裁器的使用对于解决冲突至关重要。确保这些仲裁器电路正常工作不仅对其正常功能至关重要,而且也是出于安全考虑。本文介绍了一种基于形式验证的方法,用于彻底评估各种仲裁器设置的正确功能方面。这是通过 SystemVerilog 断言和模型检查实现的。此外,我们还探索了一种用于建模和插入不同类型硬件木马的非侵入式方法。这些特洛伊木马及其独特的触发器和有效载荷都是正式建模的,无需对实际电路进行任何改动。研究结果详细分析了在不含木马的仲裁器版本上运行形式验证环境的成本。该分析是使用 Questa PropCheck 形式分析工具进行的,它为了解所需的时间和内存资源提供了有价值的见解。此外,分析结果还强调了形式化建模和插入的木马如何干扰仲裁器属性的保持标准,其中至少有一个属性因插入木马而失效。这项工作可以扩展为一种通用方法,具有验证复杂系统正常运行和安全方面的潜力。
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引用次数: 0
Reactant and Waste Minimization during Sample Preparation on Micro-Electrode-Dot-Array Digital Microfluidic Biochips using Splitting Trees 利用分裂树在微电极点阵数字微流控生物芯片上制备样品时尽量减少反应物和废物
Pub Date : 2024-03-07 DOI: 10.1007/s10836-024-06103-z

Abstract

Biological assays around “lab-on-a-chip (LoC)” are required in multiple concentration (or dilution) factors, satisfying specific sample concentrations. Unfortunately, most of them suffer from non-locality and are non-protectable, requiring a large footprint and high purchase cost. A digital geometric technique can generate arbitrary gradient profiles for digital microfluidic biochips (DMFBs). A next- generation DMFB has been proposed based on the microelectrode-dot-array (MEDA) architectures are shown to produce and disperse droplets by channel dispensing and lamination mixing. Prior work in this area must address the problem of reactant and waste minimization and concurrent sample preparation for multiple target concentrations. This paper proposes the first splitting-droplet sharing algorithm for reactant and waste minimization of multiple target concentrations on MEDAs. The proposed algorithm not only minimizes the consumption of reagents but also reduces the number of waste droplets by preparing the target concentrations concurrently. Experimental results on a sequence of exponential gradients are presented in support of the proposed method and demonstrate its effectiveness and efficiency. Compared to prior work, the proposed algorithm can achieve up to a 24.8% reduction in sample usage and reach an average of 50% reduction in waste droplets.

摘要 围绕 "片上实验室(LoC)"的生物检测需要多种浓度(或稀释)因子,以满足特定样品浓度的要求。遗憾的是,它们大多具有非定位性和不可保护性,需要占用大量空间,购买成本高昂。数字几何技术可为数字微流控生物芯片(DMFB)生成任意梯度曲线。基于微电极点阵(MEDA)结构的下一代 DMFB 已被提出,该结构可通过通道分配和层叠混合来产生和分散液滴。该领域的前期工作必须解决反应物和废物最小化以及同时制备多目标浓度样品的问题。本文首次提出了在 MEDA 上实现多目标浓度反应物和废物最小化的分裂-液滴共享算法。所提出的算法不仅最大限度地减少了试剂消耗,还通过同时制备目标浓度样品减少了废液滴的数量。为了支持所提出的方法,我们展示了一系列指数梯度的实验结果,证明了该方法的有效性和高效性。与之前的工作相比,所提出的算法最多可减少 24.8% 的样品用量,平均减少 50% 的废液滴。
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引用次数: 0
A High-Performance Quadruple-Node-Upset-Tolerant Latch Design and an Algorithm for Tolerance Verification of Hardened Latches 高性能四节点骤升容错锁存器设计和硬化锁存器容错验证算法
Pub Date : 2024-03-02 DOI: 10.1007/s10836-024-06105-x
Hui Xu, Xuewei Qin, Ruijun Ma, Chaoming Liu, Shuo Zhu, Jun Wang, Huaguo Liang

With the development of semiconductor technology, the shrinking of feature size in integrated circuits has made them more sensitive to multiple-node-upsets (MNUs). Researchers have proposed various circuit-hardened methods, such as hardened latches, to address this issue. Currently, the reliability verification of latches relies on complex EDA tools, such as HSPICE, Cadence Virtuoso, and other tools for error injection. Therefore, this article proposes a high-performance quadruple-node-upset (QNU) tolerant latch design, called the HQNUT latch, based on 32 nm CMOS technology. Additionally, an algorithm-based latch verification process is proposed to enhance the efficiency and reliability of latch verification. This approach enables a fast and accurate assessment of the latch’s fault-tolerant capability. Due to clock gating technology and high-speed path technology, HQNUT’s power consumption and delay are reduced. Simulation results show that the proposed algorithm can certify the soft-error-tolerability of hardened Latches. Compared with existing QNU-tolerable hardened latches, the proposed latch reduced power consumption, area, delay, and power-delay product (PDP) by about 36.9%, 5.6%, 19.8%, and 46.4%, respectively.

随着半导体技术的发展,集成电路特征尺寸的缩小使其对多节点重置(MNU)更加敏感。为解决这一问题,研究人员提出了各种电路加固方法,如加固锁存器。目前,锁存器的可靠性验证依赖于复杂的 EDA 工具,如 HSPICE、Cadence Virtuoso 和其他错误注入工具。因此,本文提出了一种基于 32 纳米 CMOS 技术的高性能四节点上集(QNU)容错锁存器设计,称为 HQNUT 锁存器。此外,还提出了一种基于算法的锁存器验证流程,以提高锁存器验证的效率和可靠性。这种方法能够快速准确地评估锁存器的容错能力。由于采用了时钟门控技术和高速路径技术,HQNUT 的功耗和延迟都有所降低。仿真结果表明,所提出的算法可以证明硬化锁存器的软容错能力。与现有的 QNU 可容忍硬化锁存器相比,所提出的锁存器在功耗、面积、延迟和功率-延迟积(PDP)方面分别降低了约 36.9%、5.6%、19.8% 和 46.4%。
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引用次数: 0
Simulation-based Analysis of RPL Routing Attacks and Their Impact on IoT Network Performance 基于仿真的 RPL 路由攻击及其对物联网网络性能的影响分析
Pub Date : 2024-03-02 DOI: 10.1007/s10836-024-06106-w

Abstract

The recent expansion of the Internet of Things (IoT) owes a lot to the significant contribution of the 6LoWPAN protocol, which has been extensively employed in low-power and lossy networks. To facilitate communication in 6LoWPAN networks, the Internet Engineering Task Force (IETF) has suggested the usage of the Routing Protocol for Low-Power and Lossy Networks (RPL). Despite its usefulness, the open and restricted nature of the RPL protocol renders it susceptible to both internal and external attacks. Since IoT devices connected through the RPL protocol have limited resources like processing power, battery life, memory, and bandwidth, ensuring their security is of the utmost importance. One of the primary obstacles to IoT networks is RPL routing attacks, which disrupt the network's normal routing activities and structure. This study investigates the impact of five RPL routing attacks, namely Blackhole, Sybil, Selective Forwarding (SF), Sinkhole, DIO suppression, and DIS flooding, on the IoT networks’ performance. The study evaluated the network's performance for normal and five routing attack scenarios using numerous performance metrics including Link throughput, No. of packets generated (control and data), Sensor data throughput, Packet Delivery Ratio (PDR), and Delay in packet delivery. This work conducted simulations using the Tetcos NetSim v12.1 IoT network simulator tool and is the first to analyze IoT network performance under multiple routing assault scenarios with various performance measures. The analysis showed that the performance metrics of PDR, Sensor data throughput, and No. of data packets transmitted decreased significantly in attack scenarios compared to the normal scenario, with an average decreased percentage of 70%, 70%, and 39.4%, respectively. In contrast, the metrics Link throughput, Delay, and No. of control packets transmitted increased in attack scenarios compared to the normal scenario, with average values supplemented by a factor of 35, 255, and 36, respectively. Additionally, the Destination-Oriented Directed Acyclic Graph (DODAG) real-time formation under different scenarios was provided.

摘要 近期物联网(IoT)的扩展在很大程度上归功于 6LoWPAN 协议的重大贡献,该协议已被广泛应用于低功耗和有损网络。为促进 6LoWPAN 网络中的通信,互联网工程任务组(IETF)建议使用低功耗和有损网络路由协议(RPL)。尽管 RPL 协议非常有用,但其开放性和限制性使其容易受到内部和外部攻击。由于通过 RPL 协议连接的物联网设备的处理能力、电池寿命、内存和带宽等资源有限,因此确保其安全性至关重要。物联网网络的主要障碍之一是 RPL 路由攻击,它破坏了网络的正常路由活动和结构。本研究调查了五种 RPL 路由攻击(即黑洞、Sybil、选择性转发(SF)、天坑、DIO 抑制和 DIS 泛洪)对物联网网络性能的影响。该研究使用多项性能指标评估了正常情况下和五种路由攻击情况下的网络性能,包括链路吞吐量、生成的数据包数量(控制和数据)、传感器数据吞吐量、数据包交付率(PDR)和数据包交付延迟。这项工作使用 Tetcos NetSim v12.1 物联网网络模拟器工具进行了模拟,首次使用各种性能指标分析了多种路由攻击场景下的物联网网络性能。分析结果表明,与正常场景相比,攻击场景下的PDR、传感器数据吞吐量和数据包传输数量等性能指标明显下降,平均下降比例分别为70%、70%和39.4%。相比之下,在攻击场景中,链路吞吐量、延迟和传输的控制数据包数量等指标比正常场景有所增加,平均值分别增加了 35、255 和 36 倍。此外,还提供了不同场景下以目的地为导向的有向无环图(DODAG)的实时形成情况。
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引用次数: 0
Failure Probability due to Radiation-Induced Effects in FinFET SRAM Cells under Process Variations 工艺变化下 FinFET SRAM 单元中辐射诱发效应导致的故障概率
Pub Date : 2024-02-27 DOI: 10.1007/s10836-024-06102-0
Victor Champac, Hector Villacorta, R. Gomez-Fuentes, Fabian Vargas, Jaume Segura

This work studies radiation-induced effects in FinFET technology, the leading technology in advanced nodes for high-end embedded systems. As the fin height (HFIN) and the number of fins (NFIN) are two critical parameters in the development of newer technologies, the soft-error robustness to radiation-induced effects in FinFET SRAM cells with HFIN and NFIN) is evaluated using Technology Computer-Aided Design (TCAD) tools. The ion strike direction and the process variations are considered. An analytical method to evaluate the failure probability of the memory cell due to radiation-induced effects under process variations is proposed. The amount of critical and collected charges of the memory cell are obtained with TCAD tools. The proposed method can be used to get insight into the robustness behavior of the memory cell with HFIN and NFIN and to guide the obtention of HFIN and NFIN parameters in developing new FinFET technologies.

FinFET 技术是高端嵌入式系统先进节点的领先技术,本研究对 FinFET 技术中的辐射诱导效应进行了研究。由于鳍片高度(HFIN)和鳍片数量(NFIN)是开发新技术的两个关键参数,因此使用技术计算机辅助设计(TCAD)工具评估了具有 HFIN 和 NFIN 的 FinFET SRAM 单元对辐射诱导效应的软误差鲁棒性。考虑了离子撞击方向和工艺变化。提出了一种分析方法,用于评估工艺变化下辐射诱导效应导致的存储单元失效概率。利用 TCAD 工具获得了存储单元的临界电荷量和收集电荷量。所提出的方法可用于深入了解具有 HFIN 和 NFIN 的存储单元的鲁棒性行为,并指导在开发新的 FinFET 技术时获取 HFIN 和 NFIN 参数。
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引用次数: 0
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Journal of Electronic Testing
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