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Cl2/Ar and Cl2/O2 Inductively Coupled Plasma Etching of (-201) β-Ga2O3 Cl2/Ar和Cl2/O2电感耦合等离子体刻蚀(-201)β-Ga2O3
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-11-06 DOI: 10.1007/s13391-025-00610-7
Byoung Su Choi, Ki Hun Chae, Sungu Hwang, Jin Kon Kim, Byeong Woo Lee, Jeong Ho Ryu, Stephen J. Pearton, Hyun Cho

A comparative study of Cl2/Ar and Cl2/O2 inductively coupled plasma etching of (-201) β-Ga2O3 was performed, and the effect of additive gases on the etch characteristics was studied. In both plasma chemistries, as Cl2 content increased, the etch rate continuously increased and the highest etch rates were obtained at 80% Cl2 content. In the 40Cl2/10Ar and 40Cl2/10O2 ICP discharges, the etch rate initially increased with increasing ICP source power up to 600 W and then decreased above 600 W, while the etch rate showed a strong dependence on the rf chuck power. The Cl2/Ar ICP discharges produced significantly higher etch rates than the Cl2/O2 plasmas and maximum etch rates of ~ 97 nm/min and ~ 40 nm/min were obtained in the 40Cl2/10Ar and 40Cl2/10O2 ICP discharges, respectively. Under all plasma compositions investigated, the surfaces etched in the Cl2/Ar plasmas exhibited a constant normalized O/Ga ratio of ~ 0.85, which was somewhat lower than that of the unetched surface. The original stoichiometry was maintained on the Ga2O3 surfaces etched in the 40Cl2/10O2 ICP discharges while a significant preferential desorption of oxygen atoms was observed for the Ga2O3 surfaces etched in the Cl2/O2 ICP discharges with Cl2 content below 60%. Pattern transfer with better anisotropy was achieved with the Cl2/Ar ICP discharges due to energetic Ar+ ion-assisted nature of the etching.

Graphical abstract

对(-201)β-Ga2O3的Cl2/Ar和Cl2/O2电感耦合等离子体刻蚀进行了对比研究,并研究了添加气体对刻蚀特性的影响。在两种等离子体化学中,随着Cl2含量的增加,蚀刻速率不断增加,在Cl2含量为80%时蚀刻速率最高。在40Cl2/10Ar和40Cl2/10O2 ICP放电中,当ICP源功率达到600w时,腐蚀速率随ICP源功率的增加而先增加,然后在600w以上下降,而腐蚀速率与射频卡盘功率有很强的依赖性。在40Cl2/10Ar和40Cl2/10O2等离子体放电条件下,等离子体的最大刻蚀速率分别为~ 97 nm/min和~ 40 nm/min。在研究的所有等离子体成分中,在Cl2/Ar等离子体中蚀刻的表面表现出恒定的归一化O/Ga比为~ 0.85,略低于未蚀刻的表面。在40Cl2/10O2 ICP放电中,蚀刻的Ga2O3表面保持了原有的化学量,而在Cl2/O2 ICP放电中,当Cl2含量低于60%时,蚀刻的Ga2O3表面有明显的氧原子优先解吸。由于高能Ar离子辅助蚀刻的性质,Cl2/Ar ICP放电实现了具有较好各向异性的图案转移。图形抽象
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引用次数: 0
Comparative Study about Nano-Structured FePO4·2H2O as Precursors for the LiFePO4/C Cathode 纳米结构FePO4·2H2O作为LiFePO4/C阴极前驱体的比较研究
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-11-01 DOI: 10.1007/s13391-025-00606-3
Haneul Hong, Jeongwoo Lim, Subramanian Nithiananth, Jooyoung Lee, Gyu-Seok Choi, Chunjoong Kim

Lithium iron phosphate (LiFePO4) has emerged as a promising cathode material for lithium-ion batteries featured by its inherent safety, long cycle life, and low cost. Recently, iron(III) phosphate dihydrate (FePO4⋅2H2O) is widely used as the precursor for the synthesis of high-performance LiFePO4. The physicochemical properties of FePO4⋅2H2O critically affect the electrochemical performance of the final LiFePO4 product. Herein, we systematically investigate the effect of four different iron sources on the material properties of FePO4⋅2H2O precursors. A comprehensive characterization was performed to analyze the crystal structure, morphology, hydration behavior and surface properties of the FePO4⋅2H2O precursors. Precursors were subsequently converted into LiFePO4/C composites of which phase purity, carbon coating uniformity, and electrochemical properties were studied. The LiFePO4/C composite derived from the metallic iron-based precursor demonstrated superior electrochemical performance. The precursor derived from metallic iron can be readily converted to the olivine structure with facile Li+ diffusion.

Graphical Abstract

磷酸铁锂(LiFePO4)具有安全性好、循环寿命长、成本低等优点,是锂离子电池正极材料的发展方向。近年来,磷酸二水合物铁(III) (FePO4·2H2O)被广泛用作合成高性能LiFePO4的前驱体。FePO4·2H2O的理化性质对LiFePO4最终产物的电化学性能有重要影响。本文系统研究了四种不同铁源对FePO4·2H2O前驱体材料性能的影响。对FePO4·2H2O前驱体的晶体结构、形貌、水化行为和表面性能进行了全面表征。将前驱体转化为LiFePO4/C复合材料,研究了其相纯度、碳包覆均匀性和电化学性能。由金属铁基前驱体制备的LiFePO4/C复合材料表现出优异的电化学性能。由金属铁衍生的前驱体可以很容易地转化为Li+易于扩散的橄榄石结构。图形抽象
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引用次数: 0
Effect of Sodiation Temperature on the Electrochemical and Structural Properties of NaNi0.85Fe0.10Mn0.05O2 Cathodes for Sodium-Ion Batteries 盐化温度对钠离子电池用NaNi0.85Fe0.10Mn0.05O2阴极电化学和结构性能的影响
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-10-30 DOI: 10.1007/s13391-025-00605-4
Dawoon Yoon, Heesang Lee, Subramanian Nithiananth, Ju Yeong Lee, Gyu-Seok Choi, Chunjoong Kim

Due to the depletion and rising cost of lithium resources, sodium-ion batteries (SIBs) have emerged as a promising alternative for large-scale energy storage. However, layered oxide cathodes for SIBs suffer from the structural instability followed by rapid capacity fading. In this study, Ni0.85Fe0.10Mn0.05(OH)2 precursors, synthesized via co-precipitation, were sodiated at various temperature range from 600 °C to 750 °C to fabricate NaNi0.85Fe0.10Mn0.05O2 cathodes. The effects of sodiation temperature on structural stability and electrochemical performance were systematically investigated. The cathode sodiated at 700 °C exhibited uniform and spherical secondary particles with an optimal porous structure, leading to the highest initial discharge capacity of 197 mAh g-1 and excellent rate capability. In contrast, the cathode sodiated at 650 °C delivered superior capacity retention albeit a slightly lower initial capacity, highlighting the importance of a balanced microstructure and crystallinity for the battery performance. Our work underscores that deliberate control of sodiation temperature is required to optimize the phase stability and electrochemical properties of layer-structured cathodes, thereby offering insights for the development of next-generation SIB cathode materials.

Graphical Abstract

由于锂资源的枯竭和成本的上升,钠离子电池(SIBs)已成为一种有前途的大规模储能替代方案。然而,sib层状氧化物阴极存在结构不稳定和容量快速衰减的问题。本研究采用共沉淀法合成Ni0.85Fe0.10Mn0.05(OH)2前驱体,在600 ~ 750℃的不同温度范围内进行固化,制备了NaNi0.85Fe0.10Mn0.05O2阴极。系统地研究了钠化温度对结构稳定性和电化学性能的影响。在700℃的温度下,阴极的二次颗粒均匀且呈球形,具有最佳的多孔结构,具有最高的初始放电容量(197 mAh g-1)和优异的倍率性能。相比之下,在650°C下固化的阴极虽然初始容量略低,但具有优越的容量保持能力,突出了平衡的微观结构和结晶度对电池性能的重要性。我们的工作强调,需要刻意控制钠化温度来优化层状结构阴极的相稳定性和电化学性能,从而为下一代SIB阴极材料的开发提供见解。图形抽象
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引用次数: 0
Enhanced Electrochemical Performance of Silicon Monoxide Negative Electrodes via Electroless Nickel Plating 化学镀镍提高一氧化硅负极电化学性能
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-10-25 DOI: 10.1007/s13391-025-00607-2
Tae Hun Kim, Eunbi Go, Haebeen Kim, Ji Heon Ryu

Silicon monoxide (SiO) is a high-capacity alloy-type negative electrode material for lithium-ion batteries, but it suffers from severe volume expansion and low electrical conductivity. Conventional carbon coating by chemical vapor deposition improves conductivity but requires high temperatures (> 700 °C) that trigger disproportionation reactions, leading to the formation of large Si crystallites and accelerated degradation. Here, electroless nickel (Ni) plating is employed as a low-temperature approach to enhance the conductivity of SiO without structural damage. SiO particles were sensitized with SnCl2, activated with PdCl2, and coated with Ni via sodium hypophosphite reduction at 50 °C and 80 °C. A higher plating temperature resulted in greater Ni loading and significantly improved cycling stability. These results demonstrate that electroless Ni plating is a thermally benign and effective strategy for advancing the performance of SiO-based negative electrodes.

Graphical Abstract

一氧化硅(SiO)是锂离子电池的高容量合金型负极材料,但其体积膨胀严重,电导率低。化学气相沉积的传统碳涂层提高了导电性,但需要高温(> 700°C),这会引发歧化反应,导致大Si晶的形成和加速降解。在这里,化学镀镍(Ni)作为一种低温方法来提高SiO的导电性而不破坏结构。用SnCl2敏化SiO颗粒,用PdCl2活化,并在50℃和80℃下通过次磷酸钠还原涂覆Ni。较高的电镀温度导致更高的Ni负载和显著改善循环稳定性。这些结果表明,化学镀镍是提高硅基负极性能的一种热良性和有效的策略。图形抽象
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引用次数: 0
Neutron Irradiation-Induced Trap States and Electrical Performance Degradation in ReS2 Field-Effect Transistors 中子辐照诱导的ReS2场效应晶体管的阱态和电性能退化
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-10-21 DOI: 10.1007/s13391-025-00604-5
Seung Yong Back, Gyeong Deok Seo, Ji Won Heo, Hagyoul Bae, Bong-ki Jung, TaeWan Kim

Ultrathin ReS2-based field-effect transistors (FETs) are promising candidates for use in extreme radiation environments, such as nuclear facilities and space missions, due to their layered structure and unique electrical properties. In this study, we investigate the degradation in electrical performance of ReS2 FETs subjected to 2.2 MeV neutron irradiation. As neutron fluence increases, the on-current and field-effect mobility decrease significantly, from 84% to 31% and from 88% to 37% of their initial values, respectively, while both subthreshold swing (SS) and hysteresis exhibit notable increases. These degradations are attributed to the formation of oxides and the generation of interface traps induced by irradiation. Additionally, threshold voltage shifts are observed, which are attributed to the varying dominance of oxide-trap- and interface-trap-related mechanisms. These findings enhance the understanding of fast neutron irradiation effects on ReS2-based nanoelectronic devices and support their reliable operation in radiation-rich environments.

Graphical abstract

基于res2的超薄场效应晶体管(fet)由于其层状结构和独特的电性能,在极端辐射环境(如核设施和太空任务)中具有很好的应用前景。在这项研究中,我们研究了2.2 MeV中子辐照下ReS2 fet的电性能下降。随着中子通量的增加,导流率和场效应迁移率显著降低,分别从初始值的84%降至31%和88%降至37%,而阈下摆幅(SS)和磁滞率均显著增加。这些降解是由于氧化物的形成和辐照引起的界面陷阱的产生。此外,观察到阈值电压变化,这是由于氧化陷阱和界面陷阱相关机制的不同优势。这些发现增强了对快中子辐照对基于res2的纳米电子器件的影响的理解,并支持了它们在高辐射环境下的可靠运行。图形抽象
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引用次数: 0
Enhancing Hydrogen Radical Resistance in Graphene-Based EUV Pellicles via Mo and Mo2C Capping Layers 通过Mo和Mo2C封盖层增强石墨烯基EUV薄膜的抗氢自由基能力
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-10-18 DOI: 10.1007/s13391-025-00603-6
Jeong-Uk Nam, Se-Hun Jeon, Young-Geun Choi, Yun Sung Woo

This study explores the use of ultra-thin Mo and Mo2C films as protective capping layers for graphene-based EUV pellicles, which are essential for next-generation lithography. As semiconductor miniaturization progresses, EUV lithography utilizing materials with high transmittance and mechanical strength, such as graphene, becomes increasingly critical. However, graphene’s vulnerability to hydrogen radicals generated in EUV environments presents a significant challenge. In this research, films less than 5 nm thick of Mo and Mo2C were deposited on ozone-treated and untreated graphene films using electron-beam evaporation and flip-sputtering methods, respectively. The results reveal that Mo films deposited by e-beam evaporation are prone to etching and cause severe damage to the underlying graphene due to chemical reactions with hydrogen radicals, although Mo films deposited on ozone-treated graphene exhibited higher resistance. Conversely, for amorphous Mo2C films deposited via sputtering, atomic defects in the graphene increased with prolonged hydrogen exposure, indicating radical penetration through the film. These findings suggest that while Mo offers limited protection, Mo2C has the potential to serve as an effective capping material for graphene EUV pellicles, provided its resistance to hydrogen radicals can be further enhanced through crystallization. Consequently, strategies to improve the stability and adhesion of Mo2C are proposed, aiming to develop high-performance, durable pellicle materials for future EUV lithography applications.

Graphical Abstract

这项研究探索了超薄Mo和Mo2C薄膜作为石墨烯基EUV薄膜的保护封盖层,这是下一代光刻技术必不可少的。随着半导体小型化的发展,利用石墨烯等具有高透光率和机械强度的材料的极紫外光刻技术变得越来越重要。然而,石墨烯对极紫外光环境中产生的氢自由基的脆弱性提出了重大挑战。在本研究中,分别使用电子束蒸发和翻转溅射方法在臭氧处理和未处理的石墨烯薄膜上沉积了厚度小于5 nm的Mo和Mo2C薄膜。结果表明,电子束蒸发沉积的Mo膜容易蚀刻,并且由于与氢自由基的化学反应而对底层石墨烯造成严重损害,而臭氧处理的石墨烯上沉积的Mo膜具有更高的耐蚀性。相反,对于溅射沉积的非晶Mo2C薄膜,石墨烯中的原子缺陷随着氢暴露时间的延长而增加,表明自由基穿透了薄膜。这些发现表明,虽然Mo提供有限的保护,但Mo2C有潜力作为石墨烯EUV薄膜的有效封盖材料,前提是其抗氢自由基的能力可以通过结晶进一步增强。因此,提出了提高Mo2C稳定性和粘附性的策略,旨在为未来的EUV光刻应用开发高性能,耐用的薄膜材料。图形抽象
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引用次数: 0
Niobium-Based Dry Coating Effect on the Battery Performance of the High-Nickel Layer-Structured Cathode 铌基干涂层对高镍层结构阴极电池性能的影响
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-10-11 DOI: 10.1007/s13391-025-00602-7
Yong Min Kwon, Kookhan Kim, Jeongdoo Yi, Hyun-Wook Park, Yang-Su Kim, Jahun Koo, Seongho Jo, Minsang Jeon, Hyuck Jung, Luanna Silveira Parreira, Robson de Souza Monteiro, Rogerio Marques Ribas, Chunjoong Kim, Jongmin Kim

To enhance the battery performance of layer-structured cathode materials, the niobium (Nb) coating was applied using a commercially applicable dry mixing method. The addition of lithium during the coating process induced the in-situ formation of a lithium-niobium-oxide (Li–Nb–O) and uniform distribution on the active material surface, resulting in superior electrochemical performance compared to simple addition of niobium for the dry coating. Furthermore, optimizing the coating temperature facilitated the formation of the Li–Nb–O layer with partial doping of Nb into the bulk structure, thereby simultaneously improving both capacity and cycle-life performance. The electrochemical performance was further enhanced by employing a multi-component coating strategy including aluminum. Moreover, gas generation in pouch-type full cells was evaluated after high-temperature storage in order to assess commercial viability. The Nb-based multi-component coated cathode exhibited less gas generation than its conventional cobalt-coated counterpart, confirming that the Nb-based coating layer effectively suppresses oxygen evolution even at the elevated temperature.

为了提高层状结构正极材料的电池性能,采用商业上适用的干混合方法涂覆铌(Nb)涂层。在涂层过程中加入锂元素,可诱导原位形成锂铌氧化物(Li-Nb-O),并在活性材料表面均匀分布,与简单添加铌的干燥涂层相比,具有更好的电化学性能。此外,优化涂层温度有助于形成Li-Nb-O层,并将部分Nb掺杂到体结构中,从而同时提高容量和循环寿命性能。采用含铝的多组分涂层策略进一步提高了电化学性能。此外,为了评估商业可行性,在高温储存后,对袋式全电池的产气量进行了评估。与传统的钴涂层阴极相比,铌基多组分涂层阴极的产气量更少,这证实了铌基涂层即使在高温下也能有效抑制氧的析出。
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引用次数: 0
Two Dimensional MXenes Drive Multifunctional Resistive Memory, Gas Sensing, and Gasistor Devices: A Perspective 二维MXenes驱动多功能电阻存储器,气体传感,和气敏器件:一个视角
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-10-04 DOI: 10.1007/s13391-025-00599-z
Hyojung Kim

Two-dimensional (2D) transition metal carbides and nitrides, referred to as MXenes, are attracting increasing attention as adaptable components for high-performance electrical and sensing devices. This perspective examines their function across three intersecting platforms: resistive switching memory, gas sensors, and gasistors that integrate both functionalities. Solution-based synthesis, laser patterning, and low-temperature assembly on flexible substrates are emphasized as methods that accelerate the transition from powder to device. Spontaneous oxidation, moisture-driven degradation, and precise termination control remain challenges to overcome, but new solutions, including surface passivation, fluoride-free etching, and data-driven material selection, are being developed rapidly. This article proposes design guidelines that connect atomic-scale chemistry with device-level metrics, facilitating the transition of MXene memories, sensors, and gasistors from proof-of-concept studies to reliable systems for energy storage, neuromorphic computation, and environmental monitoring.

Graphical Abstract

二维(2D)过渡金属碳化物和氮化物,称为MXenes,作为高性能电气和传感设备的适应性组件,正引起越来越多的关注。本文从三个交叉平台的角度分析了它们的功能:电阻开关存储器、气体传感器和集成这两种功能的气阻器。基于溶液的合成、激光图像化和柔性基板上的低温组装被强调为加速从粉末到器件过渡的方法。自发氧化、水分驱动降解和精确终止控制仍然是需要克服的挑战,但新的解决方案,包括表面钝化、无氟蚀刻和数据驱动的材料选择,正在迅速发展。本文提出了将原子尺度化学与设备级指标联系起来的设计指南,促进了MXene存储器、传感器和气瓶从概念验证研究到可靠的能量存储、神经形态计算和环境监测系统的过渡。图形抽象
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引用次数: 0
CVD Synthesis of High-quality Continuous Fe-Doped WSe2 Using a Solution-Based Precursor 用溶液基前驱体CVD合成高质量连续掺铁WSe2
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-09-30 DOI: 10.1007/s13391-025-00596-2
Khalid Mehmood, Ji Hwan Kim, Eun Bee Ko, Ho Min Kang, Jun Young Ma, Young Min Park, Jin Ho Kim, Min Gi Son, Sung Jin An, Hyun Ho Kim

Two-dimensional transition metal dichalcogenides (TMDCs) are promising semiconductors due to their atomic thickness, excellent electrical properties, and tunable bandgaps. While chemical vapor deposition (CVD) enables high-quality TMDC growth, conventional gas-phase methods face limitations in precursor utilization and cost. Here, we demonstrate a scalable solution-based CVD method for monolayer WSe2 synthesis using an aqueous ammonium metatungstate and sodium cholate precursor. Growth temperature and hydrogen partial pressure were optimized to achieve high-crystallinity films, and large-area uniform monolayers were obtained by controlling precursor film thickness. Fe doping was realized by adding FeSO4 to the precursor, inducing a carrier polarity shift from ambipolar to n-type. This approach offers a versatile route for scalable synthesis and doping of TMDCs for electronic and optoelectronic applications.

Graphical Abstract

二维过渡金属二硫族化合物(TMDCs)由于其原子厚度、优异的电学性能和可调谐的带隙而成为很有前途的半导体材料。虽然化学气相沉积(CVD)可以实现高质量的TMDC生长,但传统的气相方法在前驱体利用和成本方面存在局限性。在这里,我们展示了一种可扩展的基于溶液的CVD方法,用于单层WSe2的合成,该方法使用了水态偏钨酸铵和胆酸钠前驱体。优化生长温度和氢分压可获得高结晶度薄膜,通过控制前驱体膜厚度可获得大面积均匀单层膜。通过在前驱体中加入FeSO4实现Fe掺杂,诱导载流子极性从双极性转变为n型。这种方法为可扩展的合成和掺杂TMDCs的电子和光电子应用提供了一种通用的途径。图形抽象
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引用次数: 0
Analysis of Crack Parameters and Electrical Property in Flexible Devices Under Bending State 弯曲状态下柔性器件裂纹参数及电性能分析
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-09-29 DOI: 10.1007/s13391-025-00601-8
Dong-Hyeon Kim, Ji-Youn Kwak, Ju-Young Kim, Eun-chae Jeon

Repeated or sustained bending in flexible displays induces mechanical stress on all components, particularly affecting narrow and thin electronic circuits. There is a lack of research that maintains the bending state during observation of cracks and analyzes electrical properties based on crack parameters. This study aims to observe crack parameters under the bending state and analyze the relationship between crack parameters and electrical properties. The results showed that a smaller bending radius induced greater tensile stress on the specimen surface, which in turn increased both crack density and crack width. Measurement of resistance under bending state also revealed that smaller bending radius resulted in larger crack width and corresponding increases in resistance. We also demonstrated that analyzing cracks in the flat state (after bending state) significantly underestimated the effects of crack width in electrical properties because crack width was almost recovered indicating reversible deformation while crack density remained unchanged, representing irreversible damage after bending state. Therefore, crack analysis under actual bending state is essential for accurately evaluating the mechanical and electrical reliability of flexible electronic components.

Graphical Abstract

在柔性显示器中反复或持续的弯曲会对所有组件产生机械应力,特别是影响窄而薄的电子电路。在裂纹观察过程中保持弯曲状态并基于裂纹参数分析电性能的研究还比较缺乏。本研究旨在观察弯曲状态下的裂纹参数,分析裂纹参数与电性能之间的关系。结果表明:弯曲半径越小,试样表面的拉应力越大,裂纹密度和宽度随之增大;弯曲状态下的阻力测量也表明,弯曲半径越小,裂纹宽度越大,阻力越大。我们还证明,分析平坦状态(弯曲状态后)的裂纹明显低估了裂纹宽度对电性能的影响,因为裂纹宽度几乎恢复,表明可逆变形,而裂纹密度保持不变,代表弯曲状态后的不可逆损伤。因此,在实际弯曲状态下进行裂纹分析是准确评估柔性电子元件机电可靠性的必要条件。图形抽象
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引用次数: 0
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