首页 > 最新文献

Electronic Materials Letters最新文献

英文 中文
Evolution of Microcracks in Epitaxial CeO2 Thin Films on YSZ-Buffered Si YSZ缓冲硅外延CeO2薄膜中微裂纹的演化
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-07-25 DOI: 10.1007/s13391-023-00449-w
Soonjae Jung, Hyung-Jin Choi, Jun Young Lee, Min-Seok Kim, Ruiguang Ning, D. Han, Seong Keun Kim, S. Won, J. Lee, J. Jang, Ho Won Jang, S. Baek
{"title":"Evolution of Microcracks in Epitaxial CeO2 Thin Films on YSZ-Buffered Si","authors":"Soonjae Jung, Hyung-Jin Choi, Jun Young Lee, Min-Seok Kim, Ruiguang Ning, D. Han, Seong Keun Kim, S. Won, J. Lee, J. Jang, Ho Won Jang, S. Baek","doi":"10.1007/s13391-023-00449-w","DOIUrl":"https://doi.org/10.1007/s13391-023-00449-w","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"47955455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Dense, Pinholes-free Pure Cubic Phase CsPbBr3 Nanocrystals Film for High-performance Photodetector 用于高性能光电探测器的致密无针孔纯立方相CsPbBr3纳米晶体薄膜
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-30 DOI: 10.1007/s13391-023-00448-x
T. Duong, P. Tran, T. Van, D. Nguyen, Van-Dang Tran
{"title":"A Dense, Pinholes-free Pure Cubic Phase CsPbBr3 Nanocrystals Film for High-performance Photodetector","authors":"T. Duong, P. Tran, T. Van, D. Nguyen, Van-Dang Tran","doi":"10.1007/s13391-023-00448-x","DOIUrl":"https://doi.org/10.1007/s13391-023-00448-x","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"42909745","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimization of Optical Modulation in Amorphous WO3 Thin Films 非晶WO3薄膜光调制的优化
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-29 DOI: 10.1007/s13391-023-00447-y
Jiangbin Su, Xiumei Zhu, Longlong Chen, Yu Liu, H. Qi, Zuming He, B. Tang
{"title":"Optimization of Optical Modulation in Amorphous WO3 Thin Films","authors":"Jiangbin Su, Xiumei Zhu, Longlong Chen, Yu Liu, H. Qi, Zuming He, B. Tang","doi":"10.1007/s13391-023-00447-y","DOIUrl":"https://doi.org/10.1007/s13391-023-00447-y","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"47548237","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study on Silane Coupling Agent Treated Silica Nanoparticles Filled High Performance Copper Clad Laminate 硅烷偶联剂处理纳米二氧化硅填充高性能覆铜层压板的研究
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-29 DOI: 10.1007/s13391-023-00446-z
S. Yuk, B. Lee, Seulgi Kim, Woo-kyu Kang, Dongju Lee
{"title":"Study on Silane Coupling Agent Treated Silica Nanoparticles Filled High Performance Copper Clad Laminate","authors":"S. Yuk, B. Lee, Seulgi Kim, Woo-kyu Kang, Dongju Lee","doi":"10.1007/s13391-023-00446-z","DOIUrl":"https://doi.org/10.1007/s13391-023-00446-z","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"42986469","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Contact and Interface Engineering of MoS2-Based Photodetectors Using Electron-Beam Irradiation 电子束辐照MoS2基光电探测器的接触与界面工程
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-26 DOI: 10.1007/s13391-023-00445-0
Bong Ho Kim, Dong Wook Kim, Soon Hyeong Kwon, Hongji Yoon, Young Joon Yoon

The effect of electron-beam irradiation (EBI) on MoS2-based photodetectors with various electrode structures was investigated to improve the electrical and photoelectrical properties. The MoS2 films were deposited at room temperature by RF magnetron sputtering and subsequently transformed into a two-dimensional layered structure by EBI treatment with the electron energy of 3 kV for 1 min. The electrical resistance and photoelectrical properties, such as photocurrent and photoresponsivity, of MoS2 films were examined with patterned Au/Ti electrodes as a top contact (TC) and a bottom contact structure. In addition, the interfacial effect of high-k dielectric materials of thin HfO2 film between MoS2 and the SiO2/Si substrate was investigated to enhance the photoelectrical property. The MoS2 photodetectors fabricated by the EBI before TC formation on HfO2 exhibited the highest photoresponsivity of 11.88 mA/W, which was an increase of 6500% from the EBI before TC structure on SiO2. We believe that this work contributes to the improvement of contact and interface properties of MoS2-based photodetectors readily and quickly compared with conventional high-temperature thermal treatment.

研究了电子束辐照对具有不同电极结构的mos2基光电探测器的影响，以改善其电学和光电性能。采用射频磁控溅射法在室温下沉积MoS2薄膜，然后用电子能量为3 kV的EBI处理1 min，将MoS2薄膜转化为二维层状结构。采用图像化Au/Ti电极作为顶部触点(TC)和底部触点结构，研究了MoS2薄膜的电阻和光电流、光响应性等光电性能。此外，还研究了高k介电材料HfO2薄膜与SiO2/Si衬底之间的界面效应，以提高MoS2的光电性能。在HfO2上形成TC之前用EBI制备的MoS2光电探测器的光响应率最高，为11.88 mA/W，比在SiO2上形成TC之前的EBI提高了6500%。我们认为，与传统的高温热处理相比，这项工作有助于方便、快速地改善mos2基光电探测器的接触和界面性能。
{"title":"Contact and Interface Engineering of MoS2-Based Photodetectors Using Electron-Beam Irradiation","authors":"Bong Ho Kim,&nbsp;Dong Wook Kim,&nbsp;Soon Hyeong Kwon,&nbsp;Hongji Yoon,&nbsp;Young Joon Yoon","doi":"10.1007/s13391-023-00445-0","DOIUrl":"10.1007/s13391-023-00445-0","url":null,"abstract":"<p>The effect of electron-beam irradiation (EBI) on MoS<sub>2</sub>-based photodetectors with various electrode structures was investigated to improve the electrical and photoelectrical properties. The MoS<sub>2</sub> films were deposited at room temperature by RF magnetron sputtering and subsequently transformed into a two-dimensional layered structure by EBI treatment with the electron energy of 3 kV for 1 min. The electrical resistance and photoelectrical properties, such as photocurrent and photoresponsivity, of MoS<sub>2</sub> films were examined with patterned Au/Ti electrodes as a top contact (TC) and a bottom contact structure. In addition, the interfacial effect of high-k dielectric materials of thin HfO<sub>2</sub> film between MoS<sub>2</sub> and the SiO<sub>2</sub>/Si substrate was investigated to enhance the photoelectrical property. The MoS<sub>2</sub> photodetectors fabricated by the EBI before TC formation on HfO<sub>2</sub> exhibited the highest photoresponsivity of 11.88 mA/W, which was an increase of 6500% from the EBI before TC structure on SiO<sub>2</sub>. We believe that this work contributes to the improvement of contact and interface properties of MoS<sub>2</sub>-based photodetectors readily and quickly compared with conventional high-temperature thermal treatment.</p>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41271892","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fe/N-Doped Carbon Framework Derived from ZIF-8 on Graphene Oxide for Efficient Oxygen Reduction Reaction 氧化石墨烯上ZIF-8衍生的Fe/N掺杂碳框架用于有效的氧还原反应
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-20 DOI: 10.1007/s13391-023-00441-4
Yating Zhang, Pei-cong He, D. Zhuo, Jianlan Zhang, N. Zhang, Xiaobo Wang, Gang Lin, Zhenghan Kong
{"title":"Fe/N-Doped Carbon Framework Derived from ZIF-8 on Graphene Oxide for Efficient Oxygen Reduction Reaction","authors":"Yating Zhang, Pei-cong He, D. Zhuo, Jianlan Zhang, N. Zhang, Xiaobo Wang, Gang Lin, Zhenghan Kong","doi":"10.1007/s13391-023-00441-4","DOIUrl":"https://doi.org/10.1007/s13391-023-00441-4","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41523603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Vertical Pattern of Interconnects to Bypass High Strain Near a Hard Die on a Flexible Substrate Under Mechanical Bending 机械弯曲下柔性基板上靠近硬模的互连线绕过高应变的垂直模式
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-19 DOI: 10.1007/s13391-023-00444-1
Jong-Sung Lee, Young-Joo Lee, Jaegeun Seol, Young‐Chang Joo, Byoung-Joon Kim
{"title":"Vertical Pattern of Interconnects to Bypass High Strain Near a Hard Die on a Flexible Substrate Under Mechanical Bending","authors":"Jong-Sung Lee, Young-Joo Lee, Jaegeun Seol, Young‐Chang Joo, Byoung-Joon Kim","doi":"10.1007/s13391-023-00444-1","DOIUrl":"https://doi.org/10.1007/s13391-023-00444-1","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49111675","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pt, Ag and Au Nanoparticles on Hollow Carbon Spheres as Cathode ORR 铂、银、金纳米颗粒在空心碳球上作为阴极ORR
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-19 DOI: 10.1007/s13391-023-00443-2
Yuhan Jiang, Linlin Guan, Yangjing Jiao, Chunxin Yu, F. Zhao, Xiaowei Zhou, Zhu Liu
{"title":"Pt, Ag and Au Nanoparticles on Hollow Carbon Spheres as Cathode ORR","authors":"Yuhan Jiang, Linlin Guan, Yangjing Jiao, Chunxin Yu, F. Zhao, Xiaowei Zhou, Zhu Liu","doi":"10.1007/s13391-023-00443-2","DOIUrl":"https://doi.org/10.1007/s13391-023-00443-2","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"43942019","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Bipolar Resistive Switching Characteristics of Ta/TaxMnyOz/Pt Structure for ReRAM Application with Large Resistance Window 大阻窗ReRAM中Ta/TaxMnyOz/Pt结构的双极电阻开关特性
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-07 DOI: 10.1007/s13391-023-00440-5
Yunki Kim, Kyu-jin Jo, Jin-Su Oh, Cheol‐Woong Yang
{"title":"Bipolar Resistive Switching Characteristics of Ta/TaxMnyOz/Pt Structure for ReRAM Application with Large Resistance Window","authors":"Yunki Kim, Kyu-jin Jo, Jin-Su Oh, Cheol‐Woong Yang","doi":"10.1007/s13391-023-00440-5","DOIUrl":"https://doi.org/10.1007/s13391-023-00440-5","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"44636505","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pyridine Vapor Annealing Induced Reversible Switching Emission and Enhanced Electroluminescent Performance of Poly(fluorene-co-dibenzothiophene-S,S-dioxide) 吡啶蒸气退火诱导可逆开关发射及增强聚芴-co-二苯并噻吩- s, s -二氧化硅的电致发光性能
IF 2.4 4区 材料科学 Q2 Materials Science
Electronic Materials Letters
Pub Date : 2023-06-05 DOI: 10.1007/s13391-023-00442-3
Junfei Liang, Tong Wu, Jun-Xiang Chen
{"title":"Pyridine Vapor Annealing Induced Reversible Switching Emission and Enhanced Electroluminescent Performance of Poly(fluorene-co-dibenzothiophene-S,S-dioxide)","authors":"Junfei Liang, Tong Wu, Jun-Xiang Chen","doi":"10.1007/s13391-023-00442-3","DOIUrl":"https://doi.org/10.1007/s13391-023-00442-3","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":null,"pages":null},"PeriodicalIF":2.4,"publicationDate":"2023-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"44276533","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
首页 上一页 下一页 尾页
类型
全部 化学•材料 生命科学 医学 物理 工程技术 环境•农林 材料科学 地球科学 法学 管理学 化学 环境科学与生态学 计算机科学 教育学 经济学 农林科学 人文科学 生物学 数学 物理与天体物理 心理学 综合性期刊 其他 工业工程 理学 历史学 农学 文学 信息工程
数据库
全部 ACS Publications Elsevier ieeexplore Springer The Royal Society of Chemistry Wiley
期刊
Electronic Materials Letters
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
﹀
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整，为了账户安全，请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号：481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们：info@booksci.cn
Book学术提供免费学术资源搜索服务，方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1