首页 > 最新文献

Electronic Materials Letters最新文献

英文 中文
Persistence Luminescence and Mechanoluminescence in Er3+/Eu2+ Co-Doped SrS/SrZnSO Composites Er3+/Eu2+共掺杂SrS/SrZnSO复合材料的持续发光和机械发光
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-04-04 DOI: 10.1007/s13391-025-00566-8
Ligang Zhang, Xiaoming Xu, Lihong Ma, Haosen Wang

A series of Er3+/Eu2+-activated SrS/SrZnSO with different Er3+/Eu2+concentrations were synthesized at 1300℃ for 3 h through high temperature solid-state reaction, and their persistence luminescence and mechanoluminescence properties were studied. Upon 450 nm laser excitation, SrS/SrZnSO:Er3+/Eu2+ emitted orange-red light, which could be observed with the naked eyes. When the laser was removed, it showed long afterglow orange-red luminescence. The brightness and duration of the long afterglow increase with the increase concentration of Er3+/Eu2+ from x:y = 0.5%:1% to 3%:1%. SrS/SrZnSO:Er3+/Eu2+ was confirmed as an excellent persistent luminescence material since it could continuously emit light for nearly 10 min. Moreover, under pressure stimulation SrS/SrZnSO:Er3+/Eu2+showed a novel type of mechanoluminescence (ML) with the emitting bright green light which linearly depended on the force. Under the same force of friction, the sample SrS/SrZnSO:Er3+/Eu2+ with Er3+/Eu3 = 1%:0% emitted the strongest ML among prepared samples. Furthermore, the mechanism of mechanoluminescence was studied in details. This study can expand the family of ML materials while promoting the applications of mechanoluminescence materials in damage diagnosis, human-machine interfaces, and pressure sensing.

Graphical Abstract

通过高温固相反应,在1300℃条件下合成了一系列Er3+/Eu2+浓度不同的SrS/SrZnSO,并对其持续发光和机械发光性能进行了研究。在450nm激光激发下,SrS/SrZnSO:Er3+/Eu2+发出肉眼可见的橙红色光。当激光被移除时,它显示出长余辉橙红色的发光。随着Er3+/Eu2+浓度从x:y = 0.5%:1%增加到3%:1%,长余辉的亮度和持续时间增加。SrS/SrZnSO:Er3+/Eu2+可以连续发光近10 min,是一种优异的持续发光材料。在压力刺激下,SrS/SrZnSO:Er3+/Eu2+表现出一种新型的机械发光(ML),其发出的亮绿光与力呈线性关系。在相同的摩擦力下,Er3+/Eu3 = 1%:0%的SrS/SrZnSO:Er3+/Eu2+样品发出的ML最强。并对机械发光机理进行了详细的研究。本研究可以扩大机械致发光材料的家族,同时促进机械致发光材料在损伤诊断、人机界面、压力传感等方面的应用。图形抽象
{"title":"Persistence Luminescence and Mechanoluminescence in Er3+/Eu2+ Co-Doped SrS/SrZnSO Composites","authors":"Ligang Zhang,&nbsp;Xiaoming Xu,&nbsp;Lihong Ma,&nbsp;Haosen Wang","doi":"10.1007/s13391-025-00566-8","DOIUrl":"10.1007/s13391-025-00566-8","url":null,"abstract":"<div><p>A series of Er<sup>3+</sup>/Eu<sup>2+</sup>-activated SrS/SrZnSO with different Er<sup>3+</sup>/Eu<sup>2+</sup>concentrations were synthesized at 1300℃ for 3 h through high temperature solid-state reaction, and their persistence luminescence and mechanoluminescence properties were studied. Upon 450 nm laser excitation, SrS/SrZnSO:Er<sup>3+</sup>/Eu<sup>2+</sup> emitted orange-red light, which could be observed with the naked eyes. When the laser was removed, it showed long afterglow orange-red luminescence. The brightness and duration of the long afterglow increase with the increase concentration of Er<sup>3+</sup>/Eu<sup>2+</sup> from x:y = 0.5%:1% to 3%:1%. SrS/SrZnSO:Er<sup>3+</sup>/Eu<sup>2+</sup> was confirmed as an excellent persistent luminescence material since it could continuously emit light for nearly 10 min. Moreover, under pressure stimulation SrS/SrZnSO:Er<sup>3+</sup>/Eu<sup>2+</sup>showed a novel type of mechanoluminescence (ML) with the emitting bright green light which linearly depended on the force. Under the same force of friction, the sample SrS/SrZnSO:Er<sup>3+</sup>/Eu<sup>2+</sup> with Er<sup>3+</sup>/Eu<sup>3</sup> = 1%:0% emitted the strongest ML among prepared samples. Furthermore, the mechanism of mechanoluminescence was studied in details. This study can expand the family of ML materials while promoting the applications of mechanoluminescence materials in damage diagnosis, human-machine interfaces, and pressure sensing.</p><h3>Graphical Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"443 - 455"},"PeriodicalIF":2.1,"publicationDate":"2025-04-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892724","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Quantum-Confinement-Driven Advancements of Energy Storage Density in Dielectric Polymers: TiO₂ Nanowires Decorated with Ultra-Small Metal Nanoparticles 介电聚合物中能量存储密度的量子约束进展:超小金属纳米粒子修饰的tio2纳米线
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-04-03 DOI: 10.1007/s13391-025-00568-6
Seung-Wook Kim, Sung-Yub Ji, Han-Bo Jung, Ye-Ji Son, Hyo-Min Kim, Baojin Chu, Dae-Yong Jeong

Introducing high dielectric constant (high-k) ceramic fillers into dielectric polymers is a widely adopted strategy for improving the energy storage density of nanocomposites. However, the mismatch in electrical properties between ceramic fillers and polymer matrix often results in reduced dielectric breakdown strength and increased dielectric loss. This study addresses these challenges by utilizing TiO₂ nanowires (NWs) decorated with ultra-small palladium (Pd) or gold (Au) nanoparticles, leveraging the quantum-confinement effect of nanometals to enhance energy storage performance. The decorated TiO₂ NWs exhibit a core-satellite structure, where the nanometal particles mitigate the interfacial polarization between the ceramic fillers and the polymer matrix, reducing dielectric loss and increasing breakdown strength. Compared to pristine P(VDF-HFP) polymer, the composite with 6 vol% TiO₂@PDA@Pd NWs demonstrated a 535% improvement in discharge energy density. This significant enhancement arises from the synergistic effects of the quantum-confinement properties of the metal nanoparticles and the optimized interface between the fillers and the polymer matrix.

Graphical Abstract

在介电聚合物中引入高介电常数(高k)陶瓷填料是提高纳米复合材料储能密度的一种广泛采用的策略。然而,陶瓷填料和聚合物基体的电性能不匹配往往导致介质击穿强度降低和介质损耗增加。本研究通过利用超小钯(Pd)或金(Au)纳米颗粒装饰的tio2纳米线(NWs)来解决这些挑战,利用纳米金属的量子约束效应来提高能量存储性能。修饰后的tio2 NWs呈现核心-卫星结构,纳米金属颗粒减轻了陶瓷填料与聚合物基体之间的界面极化,降低了介电损耗,提高了击穿强度。与原始P(VDF-HFP)聚合物相比,含有6 vol% TiO 2 @PDA@Pd NWs的复合材料的放电能量密度提高了535%。这种显著的增强来自于金属纳米粒子的量子约束特性和填料与聚合物基体之间优化的界面的协同效应。图形抽象
{"title":"Quantum-Confinement-Driven Advancements of Energy Storage Density in Dielectric Polymers: TiO₂ Nanowires Decorated with Ultra-Small Metal Nanoparticles","authors":"Seung-Wook Kim,&nbsp;Sung-Yub Ji,&nbsp;Han-Bo Jung,&nbsp;Ye-Ji Son,&nbsp;Hyo-Min Kim,&nbsp;Baojin Chu,&nbsp;Dae-Yong Jeong","doi":"10.1007/s13391-025-00568-6","DOIUrl":"10.1007/s13391-025-00568-6","url":null,"abstract":"<div><p>Introducing high dielectric constant (high-<i>k</i>) ceramic fillers into dielectric polymers is a widely adopted strategy for improving the energy storage density of nanocomposites. However, the mismatch in electrical properties between ceramic fillers and polymer matrix often results in reduced dielectric breakdown strength and increased dielectric loss. This study addresses these challenges by utilizing TiO₂ nanowires (NWs) decorated with ultra-small palladium (Pd) or gold (Au) nanoparticles, leveraging the quantum-confinement effect of nanometals to enhance energy storage performance. The decorated TiO₂ NWs exhibit a core-satellite structure, where the nanometal particles mitigate the interfacial polarization between the ceramic fillers and the polymer matrix, reducing dielectric loss and increasing breakdown strength. Compared to pristine P(VDF-HFP) polymer, the composite with 6 vol% TiO₂@PDA@Pd NWs demonstrated a 535% improvement in discharge energy density. This significant enhancement arises from the synergistic effects of the quantum-confinement properties of the metal nanoparticles and the optimized interface between the fillers and the polymer matrix.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 6","pages":"800 - 809"},"PeriodicalIF":2.6,"publicationDate":"2025-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145456234","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Observation of Rashba Effect and Nonreciprocal Transport in Bi2Te3 Bi2Te3中Rashba效应和非互易输运的观察
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-28 DOI: 10.1007/s13391-025-00558-8
Jeong Ung Ahn, Eunsu Lee, Seongbeom Kim, Ki Hyuk Han, Seong Been Kim, OukJae Lee, Gyu-Chul Yi, Hyun Cheol Koo

Topological insulators (TIs) represent a unique state of matter that has attracted significant interest in condensed matter physics due to their surface conduction states with high spin polarization. Despite extensive studies on the properties of TIs, there has been limited exploration of the Rashba parameter and large-scale film growth. In this work, we investigate the Rashba effect in molecular-beam-epitaxy(MBE)-grown Bi2Te3 channels by measuring anisotropic magnetoresistance (AMR). The extracted Rashba parameter is as large as 16.3 eV·Å, significantly exceeding values reported in previous studies. This strong Rashba field is attributed to the minimization of imperfections and crystal defects during film fabrication. Furthermore, nonreciprocal charge transport induced by the Rashba-like effective field is clearly observed up to room temperature through harmonic resistance measurements. The temperature dependence of the nonreciprocal coefficient exhibits a non-monotonic behavior, which is believed to arise from the temperature dependence of the Fermi level position.

Graphic Abstract

Topological insulators (TIs) represent a unique state of matter that has attracted significant interest in condensed matter physics due to their surface conduction states with high spin polarization. In this work, we investigate the Rashba effect in molecular-beam-epitaxy(MBE)-grown Bi2 Te3 channel and temperature dependence of nonreciprocal charge transport.

拓扑绝缘体(TIs)是一种独特的物质状态,由于其具有高自旋极化的表面导态而引起了凝聚态物理学的极大兴趣。尽管对ti的性质进行了广泛的研究,但对Rashba参数和大规模薄膜生长的探索有限。在这项工作中,我们通过测量各向异性磁电阻(AMR)来研究分子束外延(MBE)生长的Bi2Te3通道中的Rashba效应。提取的Rashba参数高达16.3 eV·Å,显著超过了以往研究报道的值。这种强Rashba场归因于在薄膜制造过程中缺陷和晶体缺陷的最小化。此外,通过谐波电阻测量,可以清楚地观察到室温下类拉什巴有效场诱导的非互易电荷输运。非倒易系数的温度依赖性表现出非单调性,这被认为是由费米能级位置的温度依赖性引起的。拓扑绝缘体(TIs)是一种独特的物质状态,由于其具有高自旋极化的表面导电状态,在凝聚态物理学中引起了极大的兴趣。在这项工作中,我们研究了分子束外延(MBE)生长的bi2te3通道中的Rashba效应和非互易电荷输运的温度依赖性。
{"title":"Observation of Rashba Effect and Nonreciprocal Transport in Bi2Te3","authors":"Jeong Ung Ahn,&nbsp;Eunsu Lee,&nbsp;Seongbeom Kim,&nbsp;Ki Hyuk Han,&nbsp;Seong Been Kim,&nbsp;OukJae Lee,&nbsp;Gyu-Chul Yi,&nbsp;Hyun Cheol Koo","doi":"10.1007/s13391-025-00558-8","DOIUrl":"10.1007/s13391-025-00558-8","url":null,"abstract":"<div><p>Topological insulators (TIs) represent a unique state of matter that has attracted significant interest in condensed matter physics due to their surface conduction states with high spin polarization. Despite extensive studies on the properties of TIs, there has been limited exploration of the Rashba parameter and large-scale film growth. In this work, we investigate the Rashba effect in molecular-beam-epitaxy(MBE)-grown Bi<sub>2</sub>Te<sub>3</sub> channels by measuring anisotropic magnetoresistance (AMR). The extracted Rashba parameter is as large as 16.3 eV·Å, significantly exceeding values reported in previous studies. This strong Rashba field is attributed to the minimization of imperfections and crystal defects during film fabrication. Furthermore, nonreciprocal charge transport induced by the Rashba-like effective field is clearly observed up to room temperature through harmonic resistance measurements. The temperature dependence of the nonreciprocal coefficient exhibits a non-monotonic behavior, which is believed to arise from the temperature dependence of the Fermi level position.</p><h3>Graphic Abstract</h3><div><figure><div><div><picture><img></picture></div><div><p>Topological insulators (TIs) represent a unique state of matter that has attracted significant interest in condensed matter physics due to their surface conduction states with high spin polarization. In this work, we investigate the Rashba effect in molecular-beam-epitaxy(MBE)-grown Bi<sub>2</sub> Te<sub>3</sub> channel and temperature dependence of nonreciprocal charge transport.</p></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"420 - 428"},"PeriodicalIF":2.1,"publicationDate":"2025-03-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892599","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Perspective: Atomic Layer Deposition Strategies for Surface Passivation of Metal-Halide Perovskite Absorbers 金属卤化物钙钛矿吸收剂表面钝化的原子层沉积策略
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-22 DOI: 10.1007/s13391-025-00563-x
George Kwesi Asare, Joshua Sraku Adu, Byungha Shin, David J. Fermin, Helen Hejin Park

Recent advancements have been made in perovskite solar cells (PSCs) using atomic layer deposition (ALD) of aluminum oxide (Al2O3) and other suitable metal oxides such as zirconium oxide (ZrO2) as a perovskite surface passivation technique. ALD has demonstrated significant potential for enhancing photovoltaic (PV) performance and the long-term light, thermal, humidity, and ultraviolet (UV) stability of PSCs by addressing surface defects leading to higher charge extraction and mitigating environmental degradation with only a few nanometers of thickness. However, direct ALD deposition on perovskite films can sometimes degrade the perovskite film from ALD precursor reactivity, elevated temperatures, and vacuum-induced instabilities. This perspective discusses recent strategies, challenges, and future directions for surface passivation of the perovskite solar absorber using ALD to improve device performance and long-term stability for commercialization of PSCs.

近年来,在钙钛矿太阳能电池(PSCs)中,利用氧化铝(Al2O3)和其他合适的金属氧化物(如氧化锆(ZrO2))的原子层沉积(ALD)作为钙钛矿表面钝化技术取得了进展。ALD已经证明了其在提高光伏(PV)性能和长期光、热、湿度和紫外线(UV)稳定性方面的巨大潜力,通过解决表面缺陷导致更高的电荷提取和减轻环境退化,只有几纳米的厚度。然而,在钙钛矿薄膜上直接沉积ALD有时会因ALD前驱体反应性、高温和真空诱导的不稳定性而使钙钛矿薄膜降解。本文讨论了钙钛矿太阳能吸收器表面钝化的最新策略、挑战和未来方向,以提高器件性能和PSCs商业化的长期稳定性。
{"title":"Perspective: Atomic Layer Deposition Strategies for Surface Passivation of Metal-Halide Perovskite Absorbers","authors":"George Kwesi Asare,&nbsp;Joshua Sraku Adu,&nbsp;Byungha Shin,&nbsp;David J. Fermin,&nbsp;Helen Hejin Park","doi":"10.1007/s13391-025-00563-x","DOIUrl":"10.1007/s13391-025-00563-x","url":null,"abstract":"<div><p>Recent advancements have been made in perovskite solar cells (PSCs) using atomic layer deposition (ALD) of aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) and other suitable metal oxides such as zirconium oxide (ZrO<sub>2</sub>) as a perovskite surface passivation technique. ALD has demonstrated significant potential for enhancing photovoltaic (PV) performance and the long-term light, thermal, humidity, and ultraviolet (UV) stability of PSCs by addressing surface defects leading to higher charge extraction and mitigating environmental degradation with only a few nanometers of thickness. However, direct ALD deposition on perovskite films can sometimes degrade the perovskite film from ALD precursor reactivity, elevated temperatures, and vacuum-induced instabilities. This perspective discusses recent strategies, challenges, and future directions for surface passivation of the perovskite solar absorber using ALD to improve device performance and long-term stability for commercialization of PSCs.</p></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"331 - 336"},"PeriodicalIF":2.1,"publicationDate":"2025-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s13391-025-00563-x.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892729","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Device Failure Analysis with Epi-Si Wafer Using Raman Shift Matching Method 用拉曼位移匹配法分析外延硅晶圆器件失效
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-18 DOI: 10.1007/s13391-025-00567-7
Tae Min Choi, Eunmi Choi, JinUk Yoo, Eun Su Jung, Hwa Rim Lee, Songhun Yoon, Sung Gyu Pyo

In this study, a multi-wavelengths Raman spectroscopy method was employed to evaluate the quality of epitaxial grown silicon (Epi-Si) wafers by analyzing defects, stress, and crystallinity. Unlike conventional electrical property analysis, which is typically conducted post-process through device failure testing, this study demonstrated the potential for non-destructive and real-time assessment of thin film properties at the wafer stage using Raman spectroscopy. By comparing two 8-inch wafers fabricated under different deposition conditions, Raman shift and Full Width at Half Maximum (FWHM) were established as primary evaluation indicators to analyze the point-specific characteristics of the wafers. We applied multi-wavelength Raman spectroscopy with 532 nm and 405 nm laser to measure stress distribution of wafer - scale Epi-Si layers and compared it with wafer failure maps to demonstrate the validity of stress analysis of thin films using Raman spectroscopy. The residual stress and FWHM of epitaxially grown Si thin films were quantitatively analyzed for 9 points of Epi-Si. The point-by-point residual stress and crystallinity evaluations measured by Raman spectroscopy were in good agreement with the wafer failure map, and the stress variation in the failure region could be evaluated highlighting g potential of Raman spectroscopy enabling precise analysis across a broader range of samples and having the practical utility for non-destructive, early-stage assessment of thin film properties, as well as for the in-situ detection of defects and stress.

Graphical Abstract

本研究采用多波长拉曼光谱方法,通过分析外延生长硅(Epi-Si)晶圆的缺陷、应力和结晶度来评价外延生长硅(Epi-Si)晶圆的质量。与传统的电性能分析不同,传统的电性能分析通常是通过器件故障测试进行的后处理,该研究展示了利用拉曼光谱在晶圆阶段对薄膜性能进行无损和实时评估的潜力。通过对比两种不同沉积条件下制备的8英寸晶圆,建立了拉曼位移和半最大全宽(FWHM)作为主要评价指标,分析了晶圆的点特异性。利用532 nm和405 nm激光的多波长拉曼光谱测量了Epi-Si薄膜的应力分布,并将其与晶圆失效图进行了比较,验证了拉曼光谱对薄膜应力分析的有效性。定量分析了外延生长的Si薄膜在外延生长的9个点上的残余应力和FWHM。通过拉曼光谱测量的逐点残余应力和结晶度评估与晶圆失效图非常吻合,并且可以评估失效区域的应力变化,突出了拉曼光谱的潜力,可以在更大范围的样品中进行精确分析,并具有非破坏性的早期薄膜性能评估以及缺陷和应力的原位检测的实用价值。图形抽象
{"title":"Device Failure Analysis with Epi-Si Wafer Using Raman Shift Matching Method","authors":"Tae Min Choi,&nbsp;Eunmi Choi,&nbsp;JinUk Yoo,&nbsp;Eun Su Jung,&nbsp;Hwa Rim Lee,&nbsp;Songhun Yoon,&nbsp;Sung Gyu Pyo","doi":"10.1007/s13391-025-00567-7","DOIUrl":"10.1007/s13391-025-00567-7","url":null,"abstract":"<div><p>In this study, a multi-wavelengths Raman spectroscopy method was employed to evaluate the quality of epitaxial grown silicon (Epi-Si) wafers by analyzing defects, stress, and crystallinity. Unlike conventional electrical property analysis, which is typically conducted post-process through device failure testing, this study demonstrated the potential for non-destructive and real-time assessment of thin film properties at the wafer stage using Raman spectroscopy. By comparing two 8-inch wafers fabricated under different deposition conditions, Raman shift and Full Width at Half Maximum (FWHM) were established as primary evaluation indicators to analyze the point-specific characteristics of the wafers. We applied multi-wavelength Raman spectroscopy with 532 nm and 405 nm laser to measure stress distribution of wafer - scale Epi-Si layers and compared it with wafer failure maps to demonstrate the validity of stress analysis of thin films using Raman spectroscopy. The residual stress and FWHM of epitaxially grown Si thin films were quantitatively analyzed for 9 points of Epi-Si. The point-by-point residual stress and crystallinity evaluations measured by Raman spectroscopy were in good agreement with the wafer failure map, and the stress variation in the failure region could be evaluated highlighting g potential of Raman spectroscopy enabling precise analysis across a broader range of samples and having the practical utility for non-destructive, early-stage assessment of thin film properties, as well as for the in-situ detection of defects and stress.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"532 - 539"},"PeriodicalIF":2.6,"publicationDate":"2025-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145144076","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Exploring Fe-Doping Effects in K0.5Na0.5NbO3 (KNN) for Enhancing Electrical and Magnetic Properties K0.5Na0.5NbO3 (KNN)中fe掺杂效应的研究
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-18 DOI: 10.1007/s13391-025-00564-w
Pooja Dahiya, Ashima Hooda

K0.5Na0.5NbO3-based ceramics owing to their outstanding properties have compelled the researcher’s attention as an innovative multifunctional material. The structural, dielectric, electrical and magnetic properties of polycrystalline perovskites of K0.5Na0.5FexNb1–xO3 (x = 0.10, 0.15, 0.20) prepared by the conventional solid-state reaction method were investigated systematically. Interestingly, the XRD results revealed the successful formation of pure perovskite orthorhombic crystal structures without any secondary phases. Furthermore, Rietveld refinement analysis indicated a significant variation in the lattice parameters and unit cell volume. The microstructural analysis emphasized unique irregular rectangular grain morphologies with an average size of 0.6–0.9 μm, while EDX spectra affirmed compositional uniformity. Impedance spectroscopy provided a thorough analysis of the contributions from grain and grain boundary effects, elucidating the mechanisms behind the enhanced dielectric constant. The narrowing of the band gap is assessed using diffuse reflectance spectroscopy. The prepared samples can be utilized to improve the performance of materials used in optical data storage devices. The presence of Fe in various oxidation states, including Fe2+and Fe3+ was explored through X-ray photoelectron spectroscopy analysis. The magnetic measurements show that the prepared samples exhibit paramagnetic behavior. This research explores the ultimate functionalities of these samples paving the way for their application in advanced electronic and magnetic technologies.

k0.5 na0.5 nbo3基陶瓷作为一种创新的多功能材料,由于其优异的性能引起了研究人员的关注。系统地研究了传统固相反应法制备的K0.5Na0.5FexNb1-xO3 (x = 0.10, 0.15, 0.20)多晶钙钛矿的结构、介电性能、电性能和磁性能。有趣的是,XRD结果显示成功形成了纯钙钛矿正交晶型结构,没有任何二次相。此外,Rietveld细化分析表明,晶格参数和单位胞体积有显著变化。显微组织分析强调了独特的不规则矩形晶粒形态,平均尺寸为0.6 ~ 0.9 μm, EDX光谱证实了成分均匀性。阻抗谱对晶粒和晶界效应的贡献进行了深入的分析,阐明了介电常数增强的机制。带隙的缩小是用漫反射光谱来评估的。所制备的样品可用于改善用于光数据存储设备的材料的性能。通过x射线光电子能谱分析,探讨了不同氧化态铁的存在,包括Fe2+和Fe3+。磁性测量表明制备的样品具有顺磁性。本研究探索了这些样品的最终功能,为它们在先进电子和磁性技术中的应用铺平了道路。
{"title":"Exploring Fe-Doping Effects in K0.5Na0.5NbO3 (KNN) for Enhancing Electrical and Magnetic Properties","authors":"Pooja Dahiya,&nbsp;Ashima Hooda","doi":"10.1007/s13391-025-00564-w","DOIUrl":"10.1007/s13391-025-00564-w","url":null,"abstract":"<p>K<sub>0.5</sub>Na<sub>0.5</sub>NbO<sub>3</sub>-based ceramics owing to their outstanding properties have compelled the researcher’s attention as an innovative multifunctional material. The structural, dielectric, electrical and magnetic properties of polycrystalline perovskites of K<sub>0.5</sub>Na<sub>0.5</sub>Fe<sub><i>x</i></sub>Nb<sub>1–<i>x</i></sub>O<sub>3</sub> (<i>x</i> = 0.10, 0.15, 0.20) prepared by the conventional solid-state reaction method were investigated systematically. Interestingly, the XRD results revealed the successful formation of pure perovskite orthorhombic crystal structures without any secondary phases. Furthermore, Rietveld refinement analysis indicated a significant variation in the lattice parameters and unit cell volume. The microstructural analysis emphasized unique irregular rectangular grain morphologies with an average size of 0.6–0.9 μm, while EDX spectra affirmed compositional uniformity. Impedance spectroscopy provided a thorough analysis of the contributions from grain and grain boundary effects, elucidating the mechanisms behind the enhanced dielectric constant. The narrowing of the band gap is assessed using diffuse reflectance spectroscopy. The prepared samples can be utilized to improve the performance of materials used in optical data storage devices. The presence of Fe in various oxidation states, including Fe<sup>2+</sup>and Fe<sup>3+</sup> was explored through X-ray photoelectron spectroscopy analysis. The magnetic measurements show that the prepared samples exhibit paramagnetic behavior. This research explores the ultimate functionalities of these samples paving the way for their application in advanced electronic and magnetic technologies.</p>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"375 - 394"},"PeriodicalIF":2.1,"publicationDate":"2025-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892583","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Ar/N2 Two-Step Plasma Treatments on the Interfacial Characteristics of Low-Temperature Cu-Cu Direct Bonding Ar/N2两步等离子体处理对低温Cu-Cu直接键合界面特性的影响
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-17 DOI: 10.1007/s13391-025-00565-9
Gahui Kim, Seonghun Choi, Yongbeom Kwon, Sarah Eunkyung Kim, Hoo-Jeong Lee, Young-Bae Park

The effects of Ar/N2 two-step plasma treatments on the interfacial adhesion energies of low-temperature Cu–Cu bonding interfaces were systematically investigated with four-point bending (4-PB) test. It was confirmed that the Cu surface roughness had increased, and a Cu nitride layer was formed by the Ar/N2 two-step plasma treatment. X-ray photoelectron spectroscopy clearly showed that the Ar/N2 two-step plasma treatment formed less Cu oxide due to the formation of a Cu nitride layer. As a result of the 4-PB test, as the N2 RF power was increased, the interfacial adhesion energy decreased. An analysis of the delaminated surface after the 4-PB test confirmed that a Cu nitride layer was not formed, which was thought to be due to decomposition during the bonding process. As the N2 RF power was increased, the roughness also increased, leading to poor Cu-Cu bonding. The decrease in Cu-N bonding resulted in the progression of Cu oxidation. Additionally, the interfacial adhesion energy decreased due to the formation of a disordered Cu layer on the Cu surface.

Graphical Abstract

采用四点弯曲(4-PB)试验系统研究了Ar/N2两步等离子体处理对低温Cu-Cu键合界面粘附能的影响。经Ar/N2两步等离子体处理后,Cu表面粗糙度增大,形成Cu氮化层。x射线光电子能谱清楚地表明,Ar/N2两步等离子体处理由于Cu氮化层的形成而形成较少的Cu氧化物。4-PB测试结果表明,随着N2 RF功率的增大,界面粘附能减小。在4-PB测试后,对分层表面的分析证实,没有形成氮化铜层,这被认为是由于键合过程中的分解。随着N2 RF功率的增加,粗糙度也增加,导致Cu-Cu键合不良。Cu- n键的减少导致了Cu氧化的进展。此外,由于Cu表面形成无序的Cu层,界面粘附能降低。图形抽象
{"title":"Effect of Ar/N2 Two-Step Plasma Treatments on the Interfacial Characteristics of Low-Temperature Cu-Cu Direct Bonding","authors":"Gahui Kim,&nbsp;Seonghun Choi,&nbsp;Yongbeom Kwon,&nbsp;Sarah Eunkyung Kim,&nbsp;Hoo-Jeong Lee,&nbsp;Young-Bae Park","doi":"10.1007/s13391-025-00565-9","DOIUrl":"10.1007/s13391-025-00565-9","url":null,"abstract":"<div><p>The effects of Ar/N<sub>2</sub> two-step plasma treatments on the interfacial adhesion energies of low-temperature Cu–Cu bonding interfaces were systematically investigated with four-point bending (4-PB) test. It was confirmed that the Cu surface roughness had increased, and a Cu nitride layer was formed by the Ar/N<sub>2</sub> two-step plasma treatment. X-ray photoelectron spectroscopy clearly showed that the Ar/N<sub>2</sub> two-step plasma treatment formed less Cu oxide due to the formation of a Cu nitride layer. As a result of the 4-PB test, as the N<sub>2</sub> RF power was increased, the interfacial adhesion energy decreased. An analysis of the delaminated surface after the 4-PB test confirmed that a Cu nitride layer was not formed, which was thought to be due to decomposition during the bonding process. As the N<sub>2</sub> RF power was increased, the roughness also increased, leading to poor Cu-Cu bonding. The decrease in Cu-N bonding resulted in the progression of Cu oxidation. Additionally, the interfacial adhesion energy decreased due to the formation of a disordered Cu layer on the Cu surface.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"429 - 442"},"PeriodicalIF":2.1,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892723","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Grain Size Effects on Interfacial Reactions in Fe-Co Alloy Barrier Micro-bumps 晶粒尺寸对Fe-Co合金势垒微凸起界面反应的影响
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-11 DOI: 10.1007/s13391-025-00562-y
Chongyang Li, Pengfei Chang, Peixin Chen, Anmin Hu, Ming Li

Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h0.5. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.

Graphical Abstract

微碰撞在实现三维集成电路(3D ic)封装所需的高密度互连方面起着关键作用。然而,由于表面扩散通道的出现,金属间化合物(IMCs)在微凸点中的生长速度随着凸点尺寸的缩小而增加,这对小尺寸微凸点的可靠性提出了重大挑战。在本研究中,引入Fe-Co合金作为创新的扩散阻挡层,有效抑制了钎料凸起中IMC的生长,实现了0.0118 μm/h0.5的极低IMC生长速率。在微凸起处没有观察到侧壁IMCs,证明了Fe-Co合金抑制表面扩散的有效性。值得注意的是,在时效过程中观察到一个有趣的尺寸效应,与12 μm微凸起相比,较大的Cu板焊点的IMC生长速度更快。这种行为归因于Fe-Co界面的晶粒尺寸差异,较大的节理中较小的晶粒尺寸有利于晶界扩散,从而加速了IMC的生长。有限元分析(FEA)进一步表明,电沉积过程中电流密度的变化导致了晶粒尺寸的差异。这些发现为小尺寸微凸起中的高性能势垒材料提供了强有力的候选材料,并为晶粒边界扩散在IMC生长中的作用提供了重要见解,为提高电子封装的可靠性提供了有价值的策略。图形抽象
{"title":"Grain Size Effects on Interfacial Reactions in Fe-Co Alloy Barrier Micro-bumps","authors":"Chongyang Li,&nbsp;Pengfei Chang,&nbsp;Peixin Chen,&nbsp;Anmin Hu,&nbsp;Ming Li","doi":"10.1007/s13391-025-00562-y","DOIUrl":"10.1007/s13391-025-00562-y","url":null,"abstract":"<div><p>Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h<sup>0.5</sup>. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.</p><h3>Graphical Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"473 - 485"},"PeriodicalIF":2.1,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892586","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Flexible Micro-LEDs: Advanced Fabrication Techniques and Applications 柔性微型led:先进的制造技术和应用
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-08 DOI: 10.1007/s13391-025-00559-7
Sung Jin Seo, Sohyeon Park, Ho Won Jang

Flexible micro light-emitting diodes (micro-LEDs) have garnered significant attention due to their exceptional properties, including high luminance, energy efficiency, and mechanical robustness, positioning them as a promising technology for next-generation displays and electronic devices. As the Internet of Things (IoT) paradigm advances, the demand for portable and adaptable devices has led to an acceleration in flexible micro-LED research. This review comprehensively examines advanced fabrication techniques for flexible micro-LEDs, encompassing epitaxial growth, various lift-off processes, and mass transfer strategies. These methods are systematically integrated to optimize device performance and scalability. Furthermore, it explores diverse applications of flexible micro-LEDs, ranging from flexible displays and biomedical sensors to IoT and smart devices. These applications harness the unique properties of flexible micro-LEDs, enabling their integration into various form factors and opening up new possibilities for user interfaces and information displays. This work emphasizes the transformative role of flexible micro-LEDs in driving innovations across multiple fields, paving the way for the next generation of flexible and intelligent technologies.

Graphical Abstract

柔性微发光二极管(micro- led)由于其卓越的性能,包括高亮度,能源效率和机械稳健性,已经引起了极大的关注,将其定位为下一代显示和电子设备的有前途的技术。随着物联网(IoT)范式的发展,对便携式和适应性设备的需求导致了柔性微型led研究的加速。本文综述了柔性微型led的先进制造技术,包括外延生长、各种提升工艺和传质策略。这些方法被系统地集成以优化设备性能和可扩展性。此外,它还探索了柔性微型led的各种应用,从柔性显示器和生物医学传感器到物联网和智能设备。这些应用利用了柔性微型led的独特特性,使其能够集成到各种形状因素中,并为用户界面和信息显示开辟了新的可能性。这项工作强调了柔性微型led在推动多个领域创新方面的变革作用,为下一代柔性和智能技术铺平了道路。图形抽象
{"title":"Flexible Micro-LEDs: Advanced Fabrication Techniques and Applications","authors":"Sung Jin Seo,&nbsp;Sohyeon Park,&nbsp;Ho Won Jang","doi":"10.1007/s13391-025-00559-7","DOIUrl":"10.1007/s13391-025-00559-7","url":null,"abstract":"<div><p>Flexible micro light-emitting diodes (micro-LEDs) have garnered significant attention due to their exceptional properties, including high luminance, energy efficiency, and mechanical robustness, positioning them as a promising technology for next-generation displays and electronic devices. As the Internet of Things (IoT) paradigm advances, the demand for portable and adaptable devices has led to an acceleration in flexible micro-LED research. This review comprehensively examines advanced fabrication techniques for flexible micro-LEDs, encompassing epitaxial growth, various lift-off processes, and mass transfer strategies. These methods are systematically integrated to optimize device performance and scalability. Furthermore, it explores diverse applications of flexible micro-LEDs, ranging from flexible displays and biomedical sensors to IoT and smart devices. These applications harness the unique properties of flexible micro-LEDs, enabling their integration into various form factors and opening up new possibilities for user interfaces and information displays. This work emphasizes the transformative role of flexible micro-LEDs in driving innovations across multiple fields, paving the way for the next generation of flexible and intelligent technologies.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"311 - 330"},"PeriodicalIF":2.1,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s13391-025-00559-7.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892728","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
In-situ Stress Analysis of Nickel Nanoparticle Sintering with Metal Additive in Multi-Layer Ceramic Capacitors 金属添加剂在多层陶瓷电容器中烧结纳米镍的原位应力分析
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-03-08 DOI: 10.1007/s13391-025-00556-w
Youngran Jung, Wonhyo Joo, Kyung Rul Lee, Cheol Kim, Min-Jung Choi, Young-Chang Joo, So-Yeon Lee

In the pursuit of increasing the sintering temperature of multi-layer ceramic capacitors (MLCCs) of the metal electrode layer, this study examines the effect of secondary metal additives on the sintering behavior of nickel (Ni) nanoparticles. Traditionally, the discrepancy in sintering temperatures between metal and dielectric particles poses a challenge in MLCC fabrication, often resulting in uneven layer formation and device shortage. We introduced 0.1 atomic percent of tin (Sn), antimony (Sb), and cobalt (Co) into Ni nanoparticles and investigated their influence on sintering temperatures in the metal layer. Utilizing in-situ stress analysis and field emission scanning electron microscope (FE-SEM) imaging, we found that Sn and Sb effectively hindered the onset of neck formation and coalescence by forming intermetallic phases, whereas Co showed no such effect. These findings suggest that the strategic addition of specific secondary metals can shift the sintering behavior initiation of Ni related to the structural integrity during the MLCC fabrication and the performance of MLCCs. The research highlights the potential of using secondary metal additives to refine the thermal processing steps in electronic component manufacturing, aiming for more reliable and efficient devices.

为了提高金属电极层多层陶瓷电容器(mlcc)的烧结温度,本研究考察了二次金属添加剂对镍纳米颗粒烧结行为的影响。传统上,金属和介电颗粒之间的烧结温度差异给MLCC制造带来了挑战,经常导致层形成不均匀和器件短缺。我们在Ni纳米颗粒中加入0.1%的锡(Sn)、锑(Sb)和钴(Co),并研究了它们对金属层烧结温度的影响。通过地应力分析和场发射扫描电镜(FE-SEM)成像,我们发现Sn和Sb通过形成金属间相有效地阻碍了颈部形成和聚结的发生,而Co则没有这种作用。研究结果表明,选择性添加特定的二次金属可以改变与MLCC制备过程中结构完整性和MLCC性能相关的Ni的烧结行为。该研究强调了使用二次金属添加剂来改进电子元件制造中的热加工步骤的潜力,旨在制造更可靠和高效的设备。
{"title":"In-situ Stress Analysis of Nickel Nanoparticle Sintering with Metal Additive in Multi-Layer Ceramic Capacitors","authors":"Youngran Jung,&nbsp;Wonhyo Joo,&nbsp;Kyung Rul Lee,&nbsp;Cheol Kim,&nbsp;Min-Jung Choi,&nbsp;Young-Chang Joo,&nbsp;So-Yeon Lee","doi":"10.1007/s13391-025-00556-w","DOIUrl":"10.1007/s13391-025-00556-w","url":null,"abstract":"<div><p>In the pursuit of increasing the sintering temperature of multi-layer ceramic capacitors (MLCCs) of the metal electrode layer, this study examines the effect of secondary metal additives on the sintering behavior of nickel (Ni) nanoparticles. Traditionally, the discrepancy in sintering temperatures between metal and dielectric particles poses a challenge in MLCC fabrication, often resulting in uneven layer formation and device shortage. We introduced 0.1 atomic percent of tin (Sn), antimony (Sb), and cobalt (Co) into Ni nanoparticles and investigated their influence on sintering temperatures in the metal layer. Utilizing in-situ stress analysis and field emission scanning electron microscope (FE-SEM) imaging, we found that Sn and Sb effectively hindered the onset of neck formation and coalescence by forming intermetallic phases, whereas Co showed no such effect. These findings suggest that the strategic addition of specific secondary metals can shift the sintering behavior initiation of Ni related to the structural integrity during the MLCC fabrication and the performance of MLCCs. The research highlights the potential of using secondary metal additives to refine the thermal processing steps in electronic component manufacturing, aiming for more reliable and efficient devices.</p></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"464 - 472"},"PeriodicalIF":2.1,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s13391-025-00556-w.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143892584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Electronic Materials Letters
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1