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Adaptable Low-Temperature Resistor Standard Composed of ITO thin Film 可适应低温电阻标准由ITO薄膜组成
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-02-11 DOI: 10.1007/s13391-025-00548-w
Sebastian Złotnik, Małgorzata Nyga, Przemysław Morawiak, Witold Rzodkiewicz, Patryk Bruszewski, Marek A. Kojdecki, Jerzy Wróbel, Jarosław Wróbel

Herein, we present indium tin oxide (ITO) as a promising candidate for developing adaptable standard resistors. The ITO thin-film device structures exhibit an average resistivity of approx. 1.5 × 10–4 Ω ⋅ cm, demonstrating remarkable stability in resistance values over time and showcasing temperature-independent magnetoresistance, making them reliable for various applications. ITO resistor structures were found to be optimal with an area ≥10–7 cm2, without observed additional series resistance. The temperature dependence of resistance values changes by approx. 10% within a broad temperature range of 5–310 K in a predictable and repeatable way. Unlike traditional 2D materials, ITO can be processed without the necessity of a protective layer, facilitating easier integration into electronic circuits. Moreover, ITO demonstrates single-type electron characteristics, without hole-like contributions, being particularly suitable as a charge carrier transport control. Our experimental findings indicate that resistors made of ITO-coated glass thin films present a viable alternative to standard chip-type passive components, which are commonly used in electronic devices. This work highlights the potential of ITO as a durable and flexible material for advanced electronics, enabling the design of next-generation resistive elements that can adapt to varying operational conditions.

Graphical Abstract

在此,我们提出氧化铟锡(ITO)作为开发自适应标准电阻器的有希望的候选人。ITO薄膜器件结构的平均电阻率约为。1.5 × 10-4 Ω⋅cm,随着时间的推移,其电阻值具有显著的稳定性,并且具有与温度无关的磁电阻,可用于各种应用。ITO电阻器结构在面积≥10-7 cm2时最优,没有观察到额外的串联电阻。电阻值的温度依赖性变化约为。以可预测和可重复的方式在5-310 K的宽温度范围内测量10%。与传统的2D材料不同,ITO可以在不需要保护层的情况下进行加工,从而更容易集成到电子电路中。此外,ITO表现出单型电子特性,没有空穴样贡献,特别适合作为电荷载流子输运控制。我们的实验结果表明,ito涂层玻璃薄膜制成的电阻器是标准芯片型无源元件的可行替代方案,通常用于电子设备。这项工作突出了ITO作为先进电子产品耐用和柔性材料的潜力,使设计能够适应不同操作条件的下一代电阻元件成为可能。图形抽象
{"title":"Adaptable Low-Temperature Resistor Standard Composed of ITO thin Film","authors":"Sebastian Złotnik,&nbsp;Małgorzata Nyga,&nbsp;Przemysław Morawiak,&nbsp;Witold Rzodkiewicz,&nbsp;Patryk Bruszewski,&nbsp;Marek A. Kojdecki,&nbsp;Jerzy Wróbel,&nbsp;Jarosław Wróbel","doi":"10.1007/s13391-025-00548-w","DOIUrl":"10.1007/s13391-025-00548-w","url":null,"abstract":"<div><p>Herein, we present indium tin oxide (ITO) as a promising candidate for developing adaptable standard resistors. The ITO thin-film device structures exhibit an average resistivity of approx. 1.5 × 10<sup>–4</sup> Ω ⋅ cm, demonstrating remarkable stability in resistance values over time and showcasing temperature-independent magnetoresistance, making them reliable for various applications. ITO resistor structures were found to be optimal with an area ≥10<sup>–7</sup> cm<sup>2</sup>, without observed additional series resistance. The temperature dependence of resistance values changes by approx. 10% within a broad temperature range of 5–310 K in a predictable and repeatable way. Unlike traditional 2D materials, ITO can be processed without the necessity of a protective layer, facilitating easier integration into electronic circuits. Moreover, ITO demonstrates single-type electron characteristics, without hole-like contributions, being particularly suitable as a charge carrier transport control. Our experimental findings indicate that resistors made of ITO-coated glass thin films present a viable alternative to standard chip-type passive components, which are commonly used in electronic devices. This work highlights the potential of ITO as a durable and flexible material for advanced electronics, enabling the design of next-generation resistive elements that can adapt to varying operational conditions.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"193 - 199"},"PeriodicalIF":2.1,"publicationDate":"2025-02-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s13391-025-00548-w.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Dielectric Bonding Method for 3D Integration Packaging Using Self-Assembled Monolayer 自组装单层三维集成封装的介电键合方法
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-02-08 DOI: 10.1007/s13391-025-00547-x
Wonbin Kim, Sungjae Choi, Seongi Lee, Young-Chang Joo, Byoung-Joon Kim

The emergence of big data and artificial intelligence has promoted the semiconductor industry to increasingly adopt advanced three-dimensional stacking packaging technologies due to the limitations of device scaling. Traditional packaging methods, which rely on micro bumps and adhesives, struggle to meet the growing demands for sub-micrometer fine pitches. To address these challenges, bump-less direct bonding techniques, such as Cu/SiO₂ hybrid bonding, have gained attention, along with surface-activated bonding (SAB) using plasma treatment. However, plasma treatment poses risks, including Cu oxidation and potential short circuits from Cu particle transfer in fine-pitch applications. This study presents a novel plasma-free method that utilizes self-assembled monolayers (SAMs), thin molecular layers that spontaneously create ordered structures on surfaces, for dielectric surface activation. We deposited 3-aminopropyltriethoxysilane (APTES) on silicon dioxide (SiO₂), resulting in a hydrophilic layer that enhances bonding. Notably, a heat treatment significantly improved interfacial adhesion strength through the formation of an amorphous silicon (Si) layer. This SAM-based bonding technique, which enables dielectric surface without the need for plasma, holds promise for future fine-pitch hybrid bonding applications in 3D integrated packaging.

Graphical abstract

大数据和人工智能的出现,促使半导体行业由于器件规模的限制,越来越多地采用先进的三维堆叠封装技术。传统的包装方法依赖于微凸点和粘合剂,难以满足对亚微米细间距日益增长的需求。为了解决这些挑战,无碰撞直接键合技术,如Cu/ sio2杂化键合,以及使用等离子体处理的表面活化键合(SAB)受到了关注。然而,等离子体处理存在风险,包括Cu氧化和在细间距应用中Cu颗粒转移引起的潜在短路。本研究提出了一种新的无等离子体方法,该方法利用自组装单层(SAMs),薄分子层在表面上自发地产生有序结构,用于介质表面激活。我们将3-氨基丙基三乙氧基硅烷(APTES)沉积在二氧化硅(SiO₂)上,形成了一层增强键合的亲水性层。值得注意的是,通过形成非晶硅(Si)层,热处理显著提高了界面粘附强度。这种基于sam的键合技术可以在不需要等离子体的情况下实现介电表面,为未来3D集成封装中的细间距混合键合应用带来了希望。图形抽象
{"title":"Dielectric Bonding Method for 3D Integration Packaging Using Self-Assembled Monolayer","authors":"Wonbin Kim,&nbsp;Sungjae Choi,&nbsp;Seongi Lee,&nbsp;Young-Chang Joo,&nbsp;Byoung-Joon Kim","doi":"10.1007/s13391-025-00547-x","DOIUrl":"10.1007/s13391-025-00547-x","url":null,"abstract":"<div><p>The emergence of big data and artificial intelligence has promoted the semiconductor industry to increasingly adopt advanced three-dimensional stacking packaging technologies due to the limitations of device scaling. Traditional packaging methods, which rely on micro bumps and adhesives, struggle to meet the growing demands for sub-micrometer fine pitches. To address these challenges, bump-less direct bonding techniques, such as Cu/SiO₂ hybrid bonding, have gained attention, along with surface-activated bonding (SAB) using plasma treatment. However, plasma treatment poses risks, including Cu oxidation and potential short circuits from Cu particle transfer in fine-pitch applications. This study presents a novel plasma-free method that utilizes self-assembled monolayers (SAMs), thin molecular layers that spontaneously create ordered structures on surfaces, for dielectric surface activation. We deposited 3-aminopropyltriethoxysilane (APTES) on silicon dioxide (SiO₂), resulting in a hydrophilic layer that enhances bonding. Notably, a heat treatment significantly improved interfacial adhesion strength through the formation of an amorphous silicon (Si) layer. This SAM-based bonding technique, which enables dielectric surface without the need for plasma, holds promise for future fine-pitch hybrid bonding applications in 3D integrated packaging.</p><h3>Graphical abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"184 - 192"},"PeriodicalIF":2.1,"publicationDate":"2025-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhanced Light-Scattering Properties of Aqueous Chemical Bath Deposited ZnO Nanowires: Influence of Zinc Source Concentration 化学浴沉积ZnO纳米线增强光散射性能:锌源浓度的影响
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-18 DOI: 10.1007/s13391-025-00545-z
Vinaya Kumar Arepalli, Eunyeong Yang, Choong-Heui Chung

This study investigates the light-diffusing capabilities of ZnO nanowires synthesized using the aqueous chemical bath deposition method on PET substrates. By systematically varying Zn source concentrations, the morphology and optical performance of ZnO nanowires were tuned. Scanning electron microscopy revealed that nanowires grown at optimal Zn sources (0.75 g and 1.2 g) exhibited sharp tip morphologies, while higher or lower Zn sources led to flatter tips due to isotropic growth or insufficient precursor availability. Optical characterization demonstrated that ZnO nanowires grown at 1.2 g of the Zn source achieved a maximum total transmittance of ~ 58% and a scattering angle of 53°, outperforming commercial optical diffusers. The transmission haze values peaked at 98.5% for nanowires grown at 1.2 g of the Zn source, attributed to the enhanced refractive index boundaries and optimized structural properties. These findings highlight the potential of ZnO nanowires as high-performance optical diffusers for advanced optoelectronic applications.

Graphical Abstract

本文研究了用化学浴沉积法制备的ZnO纳米线在PET衬底上的光扩散性能。通过系统地改变锌源浓度,可以调整ZnO纳米线的形貌和光学性能。扫描电镜显示,在最佳Zn源(0.75 g和1.2 g)下生长的纳米线表现出尖锐的尖端形貌,而较高或较低Zn源由于各向同性生长或前驱体可用性不足而导致尖端较平坦。光学表征表明,在1.2 g Zn源下生长的ZnO纳米线的最大总透射率为~ 58%,散射角为53°,优于商用光学扩散器。在1.2 g Zn源下生长的纳米线,由于增强的折射率边界和优化的结构特性,透射雾度值达到98.5%。这些发现突出了ZnO纳米线作为先进光电应用的高性能光扩散器的潜力。图形抽象
{"title":"Enhanced Light-Scattering Properties of Aqueous Chemical Bath Deposited ZnO Nanowires: Influence of Zinc Source Concentration","authors":"Vinaya Kumar Arepalli,&nbsp;Eunyeong Yang,&nbsp;Choong-Heui Chung","doi":"10.1007/s13391-025-00545-z","DOIUrl":"10.1007/s13391-025-00545-z","url":null,"abstract":"<div><p>This study investigates the light-diffusing capabilities of ZnO nanowires synthesized using the aqueous chemical bath deposition method on PET substrates. By systematically varying Zn source concentrations, the morphology and optical performance of ZnO nanowires were tuned. Scanning electron microscopy revealed that nanowires grown at optimal Zn sources (0.75 g and 1.2 g) exhibited sharp tip morphologies, while higher or lower Zn sources led to flatter tips due to isotropic growth or insufficient precursor availability. Optical characterization demonstrated that ZnO nanowires grown at 1.2 g of the Zn source achieved a maximum total transmittance of ~ 58% and a scattering angle of 53°, outperforming commercial optical diffusers. The transmission haze values peaked at 98.5% for nanowires grown at 1.2 g of the Zn source, attributed to the enhanced refractive index boundaries and optimized structural properties. These findings highlight the potential of ZnO nanowires as high-performance optical diffusers for advanced optoelectronic applications.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"177 - 183"},"PeriodicalIF":2.1,"publicationDate":"2025-01-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571119","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thickness-Dependent Electrical and Optoelectrical Properties of SnSe2 Field-Effect Transistors SnSe2场效应晶体管的厚度相关电学和光电学特性
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-16 DOI: 10.1007/s13391-025-00544-0
Han-Woong Choi, Dong Hyun Seo, Ji Won Heo, Sang-Il Kim, TaeWan Kim

Two-dimensional semiconductors such as SnSe2 hold great promise for electronic and optoelectronic applications. Factors such as the intrinsic carrier concentration and interfacial scattering strongly influence device performance. In this study, SnSe2-based field-effect transistors were fabricated with precise thickness control by reactive ion etching. Electrical measurements revealed that reducing the thickness from 300 to 21 nm led to an increase in carrier mobility from 3.76 to 26.6 cm² V− 1 s− 1 and an improvement in conductivity from 0.31 to 7.72 S/cm. This enhancement is attributed to a rise in carrier concentration, from 1.48 × 1018 to 1.66 × 1019 cm⁻³, along with better screening of interfacial Coulomb potential. Furthermore, the photoresponsivity varied with thickness, with thinner devices exhibiting a peak of 484 A/W under a 700-nm laser, compared to 260 A/W under a 900-nm laser for thicker devices. These findings highlight the critical role of thickness optimization in fine-tuning the electrical and optoelectronic properties of SnSe2-based devices.

二维半导体如SnSe2在电子和光电子应用中具有很大的前景。固有载流子浓度和界面散射等因素对器件性能影响很大。在本研究中,采用反应离子蚀刻技术精确控制了snse2基场效应晶体管的厚度。电学测量表明,将载流子迁移率从3.76 cm²V−1 s−1增加到26.6 cm²V−1 s−1,电导率从0.31 s /cm提高到7.72 s /cm。这种增强归因于载流子浓度的增加,从1.48 × 1018增加到1.66 × 1019 cm(⁻³),同时更好地筛选界面库仑势。此外,光响应率随厚度变化,较薄的器件在700 nm激光下的峰值为484 a /W,而较厚的器件在900 nm激光下的峰值为260 a /W。这些发现强调了厚度优化在微调基于snse2的器件的电学和光电子特性中的关键作用。
{"title":"Thickness-Dependent Electrical and Optoelectrical Properties of SnSe2 Field-Effect Transistors","authors":"Han-Woong Choi,&nbsp;Dong Hyun Seo,&nbsp;Ji Won Heo,&nbsp;Sang-Il Kim,&nbsp;TaeWan Kim","doi":"10.1007/s13391-025-00544-0","DOIUrl":"10.1007/s13391-025-00544-0","url":null,"abstract":"<div><p>Two-dimensional semiconductors such as SnSe<sub>2</sub> hold great promise for electronic and optoelectronic applications. Factors such as the intrinsic carrier concentration and interfacial scattering strongly influence device performance. In this study, SnSe<sub>2</sub>-based field-effect transistors were fabricated with precise thickness control by reactive ion etching. Electrical measurements revealed that reducing the thickness from 300 to 21 nm led to an increase in carrier mobility from 3.76 to 26.6 cm² V<sup>− 1</sup> s<sup>− 1</sup> and an improvement in conductivity from 0.31 to 7.72 S/cm. This enhancement is attributed to a rise in carrier concentration, from 1.48 × 10<sup>18</sup> to 1.66 × 10<sup>19</sup> cm⁻³, along with better screening of interfacial Coulomb potential. Furthermore, the photoresponsivity varied with thickness, with thinner devices exhibiting a peak of 484 A/W under a 700-nm laser, compared to 260 A/W under a 900-nm laser for thicker devices. These findings highlight the critical role of thickness optimization in fine-tuning the electrical and optoelectronic properties of SnSe<sub>2</sub>-based devices.</p></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"154 - 161"},"PeriodicalIF":2.1,"publicationDate":"2025-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Phase Transition and Thermoelectric Performance of NixCu12−xSb4Se13 NixCu12−xSb4Se13的相变与热电性能
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-07 DOI: 10.1007/s13391-024-00543-7
Sang Jun Park, Il-Ho Kim

Ternary compounds of the Cu–X–Q system (where X = Fe, Sb, Sn and Q = S, Se), such as Cu5FeS4, Cu3SbS4, and Cu2SnSe3, have garnered considerable attention for their potential applications in electronics, optics, and energy technologies. These compounds are noted for their low thermal conductivity and narrow band gaps, making them promising candidates for thermoelectric materials. However, detailed experimental investigations into the phase transitions and thermoelectric properties of synthetic hakite, particularly with Ni substitution, have been limited. This study focused on synthesizing Ni-substituted hakite (NixCu12−xSb4Se13; x = 0.5–2) through mechanical alloying and hot pressing techniques, while also exploring the phase transitions and thermoelectric characteristics as a function of Ni content. Despite the charge compensation effect of Ni, a pure hakite phase could not be achieved. Instead, the resultant phases comprised mixtures of secondary phases including bytizite, pribramite, and permingeatite, or their composites. This indicates that the introduction of Ni into the system did not promote the formation of a single-phase hakite but rather stabilized a multi-phase system. The introduction of Ni resulted in a decrease in electrical conductivity across all specimens. Notably, the materials exhibited non-degenerate semiconductor behavior. The measured Seebeck coefficients were significantly high and positive, confirming p-type behavior. However, these coefficients decreased with increasing temperature. The thermal conductivity of the materials displayed minimal temperature dependence, consistently remaining below 0.65 Wm−1 K−1. This low thermal conductivity is advantageous for thermoelectric efficiency, as it minimizes heat loss while maintaining charge transport. For the composition Ni0.5Cu11.5Sb4Se13, we achieved a maximum power factor of 0.09 mWm−1 K−2 and a peak dimensionless figure of merit (ZT) of 0.18 at 623 K.

Graphical Abstract

Cu-X-Q体系的三元化合物(其中X = Fe, Sb, Sn和Q = S, Se),如Cu5FeS4, Cu3SbS4和Cu2SnSe3,因其在电子,光学和能源技术中的潜在应用而引起了相当大的关注。这些化合物以其低导热性和窄带隙而闻名,使它们成为热电材料的有希望的候选者。然而,对合成哈基特的相变和热电性能的详细实验研究,特别是对Ni取代的研究,是有限的。本文主要研究了ni取代哈基特(NixCu12−xSb4Se13;x = 0.5-2)通过机械合金化和热压技术,同时也探索相变和热电特性作为Ni含量的函数。尽管有Ni的电荷补偿作用,但不能得到纯哈基特相。相反,生成的相由次生相的混合物组成,包括长石、绢云母和透辉岩,或它们的复合物。这表明Ni的引入并没有促进单相hakite的形成,而是稳定了多相体系。Ni的引入导致所有样品的导电性降低。值得注意的是,材料表现出非简并半导体行为。测得的塞贝克系数显著高且为正,证实了p型行为。随着温度的升高,这些系数逐渐减小。材料的热导率表现出最小的温度依赖性,始终保持在0.65 Wm−1 K−1以下。这种低导热系数有利于热电效率,因为它在保持电荷传输的同时最大限度地减少了热损失。对于Ni0.5Cu11.5Sb4Se13,我们在623 K时获得了0.09 mWm−1 K−2的最大功率因数和0.18的峰值无量纲品质系数(ZT)。图形抽象
{"title":"Phase Transition and Thermoelectric Performance of NixCu12−xSb4Se13","authors":"Sang Jun Park,&nbsp;Il-Ho Kim","doi":"10.1007/s13391-024-00543-7","DOIUrl":"10.1007/s13391-024-00543-7","url":null,"abstract":"<div><p>Ternary compounds of the Cu–X–Q system (where X = Fe, Sb, Sn and Q = S, Se), such as Cu<sub>5</sub>FeS<sub>4</sub>, Cu<sub>3</sub>SbS<sub>4</sub>, and Cu<sub>2</sub>SnSe<sub>3</sub>, have garnered considerable attention for their potential applications in electronics, optics, and energy technologies. These compounds are noted for their low thermal conductivity and narrow band gaps, making them promising candidates for thermoelectric materials. However, detailed experimental investigations into the phase transitions and thermoelectric properties of synthetic hakite, particularly with Ni substitution, have been limited. This study focused on synthesizing Ni-substituted hakite (Ni<sub>x</sub>Cu<sub>12−x</sub>Sb<sub>4</sub>Se<sub>13</sub>; x = 0.5–2) through mechanical alloying and hot pressing techniques, while also exploring the phase transitions and thermoelectric characteristics as a function of Ni content. Despite the charge compensation effect of Ni, a pure hakite phase could not be achieved. Instead, the resultant phases comprised mixtures of secondary phases including bytizite, pribramite, and permingeatite, or their composites. This indicates that the introduction of Ni into the system did not promote the formation of a single-phase hakite but rather stabilized a multi-phase system. The introduction of Ni resulted in a decrease in electrical conductivity across all specimens. Notably, the materials exhibited non-degenerate semiconductor behavior. The measured Seebeck coefficients were significantly high and positive, confirming p-type behavior. However, these coefficients decreased with increasing temperature. The thermal conductivity of the materials displayed minimal temperature dependence, consistently remaining below 0.65 Wm<sup>−1</sup> K<sup>−1</sup>. This low thermal conductivity is advantageous for thermoelectric efficiency, as it minimizes heat loss while maintaining charge transport. For the composition Ni<sub>0.5</sub>Cu<sub>11.5</sub>Sb<sub>4</sub>Se<sub>13</sub>, we achieved a maximum power factor of 0.09 mWm<sup>−1</sup> K<sup>−2</sup> and a peak dimensionless figure of merit (ZT) of 0.18 at 623 K.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"235 - 244"},"PeriodicalIF":2.1,"publicationDate":"2025-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ultra-Effective Methylene Blue Detection by Nanoporous Gold for Surface-Enhanced Raman Spectroscopy 纳米孔金表面增强拉曼光谱超有效检测亚甲基蓝
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-04 DOI: 10.1007/s13391-024-00541-9
Yoonseo Huh, Sangwoo Ryu

This study presents the fabrication and optimization of nanoporous gold (Au) substrates for Surface-Enhanced Raman Spectroscopy (SERS). These substrates were obtained by the high-pressure thermal evaporation method, which utilizes a relatively high pressure of a few Torr to form highly porous structures. These nanoporous structures were induced by homogeneous nucleation and growth of the evaporated metal atoms that occurred through repeated collisions during the deposition process. By controlling deposition pressure and film thickness, optimal conditions to achieve enhanced SERS activity were established. The Au nanoporous structures consisted of randomly connected Au nanoparticles and demonstrated numerous nanogaps between these nanoparticles. These nanogaps act as hot spots of localized surface plasmon resonance, enabling significant amplification of Raman signals. The optimized nanoporous Au substrate, deposited at 2.0 Torr with a thickness of 1.65 μm, achieved a limit of detection (LOD) of 10− 8 M for Rhodamine 6G (R6G). Furthermore, the substrate’s applicability was extended to the detection of methylene blue (MB), an organic dye with known environmental impacts. MB could be detected up to 10− 6 M by using these nanoporous Au substrates for SERS. This work successfully demonstrated the potential of nanoporous Au for SERS as an effective analytical platform for trace-level detection of MB, paving the way for advancements in environmental monitoring and biological sensing applications.

Graphical Abstract

本研究介绍了用于表面增强拉曼光谱(SERS)的纳米多孔金(Au)基底的制造和优化。这些基底是通过高压热蒸发法获得的,该方法利用几托的相对高压形成高多孔结构。这些纳米多孔结构是由蒸发的金属原子在沉积过程中通过反复碰撞产生的均匀成核和生长所诱导的。通过控制沉积压力和薄膜厚度,建立了实现增强 SERS 活性的最佳条件。金纳米多孔结构由随机连接的金纳米颗粒组成,这些纳米颗粒之间有许多纳米间隙。这些纳米间隙是局部表面等离子体共振的热点,可显著放大拉曼信号。经过优化的纳米多孔金基底在 2.0 托的条件下沉积,厚度为 1.65 μm,罗丹明 6G (R6G) 的检测限 (LOD) 为 10- 8 M。此外,该基底的适用性还扩展到了亚甲基蓝(MB)的检测,亚甲基蓝是一种已知对环境有影响的有机染料。通过使用这些用于 SERS 的纳米多孔金基底,可以检测到高达 10- 6 M 的亚甲基蓝。这项工作成功证明了纳米多孔金 SERS 作为痕量甲基溴检测的有效分析平台的潜力,为环境监测和生物传感应用的进步铺平了道路。
{"title":"Ultra-Effective Methylene Blue Detection by Nanoporous Gold for Surface-Enhanced Raman Spectroscopy","authors":"Yoonseo Huh,&nbsp;Sangwoo Ryu","doi":"10.1007/s13391-024-00541-9","DOIUrl":"10.1007/s13391-024-00541-9","url":null,"abstract":"<div><p>This study presents the fabrication and optimization of nanoporous gold (Au) substrates for Surface-Enhanced Raman Spectroscopy (SERS). These substrates were obtained by the high-pressure thermal evaporation method, which utilizes a relatively high pressure of a few Torr to form highly porous structures. These nanoporous structures were induced by homogeneous nucleation and growth of the evaporated metal atoms that occurred through repeated collisions during the deposition process. By controlling deposition pressure and film thickness, optimal conditions to achieve enhanced SERS activity were established. The Au nanoporous structures consisted of randomly connected Au nanoparticles and demonstrated numerous nanogaps between these nanoparticles. These nanogaps act as hot spots of localized surface plasmon resonance, enabling significant amplification of Raman signals. The optimized nanoporous Au substrate, deposited at 2.0 Torr with a thickness of 1.65 μm, achieved a limit of detection (LOD) of 10<sup>− 8</sup> M for Rhodamine 6G (R6G). Furthermore, the substrate’s applicability was extended to the detection of methylene blue (MB), an organic dye with known environmental impacts. MB could be detected up to 10<sup>− 6</sup> M by using these nanoporous Au substrates for SERS. This work successfully demonstrated the potential of nanoporous Au for SERS as an effective analytical platform for trace-level detection of MB, paving the way for advancements in environmental monitoring and biological sensing applications.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><img></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"260 - 267"},"PeriodicalIF":2.1,"publicationDate":"2025-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143570931","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pribramite CuSbSe2: Solid-State Synthesis and Thermoelectric Properties Pribramite CuSbSe2:固态合成及热电性质
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-03 DOI: 10.1007/s13391-024-00542-8
Min Ji Choi, Sang Jun Park, Il-Ho Kim

Pribramite (CuSbSe2) is gaining attention as a potential thermoelectric material due to its high thermopower and low thermal conductivity, although it remains relatively underexplored compared to more widely studied thermoelectric compounds. This study focused on optimizing the synthesis and sintering processes of CuSbSe2 using mechanical alloying (MA) and hot pressing (HP) methods to enhance its thermoelectric performance. The desired pribramite phase was successfully synthesized in both mechanically alloyed powders and hot-pressed specimens, though secondary phases such as bytizite (Cu3SbSe3) and permingeatite (Cu3SbSe4) were identified. Thermogravimetric and differential scanning calorimetry analyses indicated a melting point for CuSbSe2 between 723 and 728 K. Densely sintered samples achieved high relative densities of 98.6–99.4% through the MA–HP process. Electrical characterization revealed non-degenerate semiconductor behavior with temperature-dependent conductivity. Seebeck coefficient measurements confirmed p-type semiconductor characteristics, with holes as the major charge carriers. An intrinsic transition in the Seebeck coefficient was observed, with the transition temperature decreasing as the HP temperature increased. A maximum power factor of 0.23 mWm−1 K−2 was achieved at 623 K, while thermal conductivity steadily decreased across the measured temperature range of 323 K to 623 K. The highest dimensionless figure of merit (ZT) reached 0.28 at 623 K, indicating promising thermoelectric potential for CuSbSe2.

Graphical Abstract

Pribramite (CuSbSe2)作为一种潜在的热电材料,因其热功率高、热导率低而日益受到关注,但与研究更广泛的热电化合物相比,它的研究仍相对不足。本研究的重点是利用机械合金化(MA)和热压(HP)方法优化 CuSbSe2 的合成和烧结过程,以提高其热电性能。在机械合金粉末和热压试样中都成功合成了所需的普氏相,但也发现了副沸石(Cu3SbSe3)和孔雀石(Cu3SbSe4)等次生相。热重分析和差示扫描量热分析表明,CuSbSe2 的熔点在 723 至 728 K 之间。通过 MA-HP 工艺,致密烧结样品达到了 98.6-99.4% 的高相对密度。电学特性分析表明,这种非退化半导体具有随温度变化的导电性。塞贝克系数测量证实了以空穴为主要电荷载流子的 p 型半导体特性。观察到塞贝克系数的内在转变,转变温度随着 HP 温度的升高而降低。在 623 K 时,功率因数达到最大值 0.23 mWm-1 K-2,而热导率在 323 K 至 623 K 的测量温度范围内稳步下降。
{"title":"Pribramite CuSbSe2: Solid-State Synthesis and Thermoelectric Properties","authors":"Min Ji Choi,&nbsp;Sang Jun Park,&nbsp;Il-Ho Kim","doi":"10.1007/s13391-024-00542-8","DOIUrl":"10.1007/s13391-024-00542-8","url":null,"abstract":"<div><p>Pribramite (CuSbSe<sub>2</sub>) is gaining attention as a potential thermoelectric material due to its high thermopower and low thermal conductivity, although it remains relatively underexplored compared to more widely studied thermoelectric compounds. This study focused on optimizing the synthesis and sintering processes of CuSbSe<sub>2</sub> using mechanical alloying (MA) and hot pressing (HP) methods to enhance its thermoelectric performance. The desired pribramite phase was successfully synthesized in both mechanically alloyed powders and hot-pressed specimens, though secondary phases such as bytizite (Cu<sub>3</sub>SbSe<sub>3</sub>) and permingeatite (Cu<sub>3</sub>SbSe<sub>4</sub>) were identified. Thermogravimetric and differential scanning calorimetry analyses indicated a melting point for CuSbSe<sub>2</sub> between 723 and 728 K. Densely sintered samples achieved high relative densities of 98.6–99.4% through the MA–HP process. Electrical characterization revealed non-degenerate semiconductor behavior with temperature-dependent conductivity. Seebeck coefficient measurements confirmed p-type semiconductor characteristics, with holes as the major charge carriers. An intrinsic transition in the Seebeck coefficient was observed, with the transition temperature decreasing as the HP temperature increased. A maximum power factor of 0.23 mWm<sup>−1</sup> K<sup>−2</sup> was achieved at 623 K, while thermal conductivity steadily decreased across the measured temperature range of 323 K to 623 K. The highest dimensionless figure of merit (ZT) reached 0.28 at 623 K, indicating promising thermoelectric potential for CuSbSe<sub>2</sub>.</p><h3>Graphical Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"216 - 227"},"PeriodicalIF":2.1,"publicationDate":"2025-01-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143570927","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correction: Rapid Thermal Annealing Under O2 Ambient to Recover the Deterioration by Gamma-Ray Irradiation in a-IGZO TFTs 修正:在O2环境下快速热退火以恢复伽玛射线辐照下a-IGZO tft的劣化
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-02 DOI: 10.1007/s13391-024-00536-6
Minah Park, Jaewook Yoo, Hongseung Lee, Hyeonjun Song, Soyeon Kim, Seongbin Lim, Seohyeon Park, Jo Hak Jeong, Bongjoong Kim, Kiyoung Lee, Yoon Kyeung Lee, Keun Heo, Jiseok Kwon, Hagyoul Bae
{"title":"Correction: Rapid Thermal Annealing Under O2 Ambient to Recover the Deterioration by Gamma-Ray Irradiation in a-IGZO TFTs","authors":"Minah Park,&nbsp;Jaewook Yoo,&nbsp;Hongseung Lee,&nbsp;Hyeonjun Song,&nbsp;Soyeon Kim,&nbsp;Seongbin Lim,&nbsp;Seohyeon Park,&nbsp;Jo Hak Jeong,&nbsp;Bongjoong Kim,&nbsp;Kiyoung Lee,&nbsp;Yoon Kyeung Lee,&nbsp;Keun Heo,&nbsp;Jiseok Kwon,&nbsp;Hagyoul Bae","doi":"10.1007/s13391-024-00536-6","DOIUrl":"10.1007/s13391-024-00536-6","url":null,"abstract":"","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"289 - 289"},"PeriodicalIF":2.1,"publicationDate":"2025-01-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143570924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties 溶剂热法制备掺钐铈纳米球及其化学机械抛光性能
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-12-31 DOI: 10.1007/s13391-024-00537-5
Zhenyang Wang, Tongqing Wang, Xinchun Lu

As a crucial abrasive in chemical mechanical polishing (CMP), ceria has garnered significant attention regarding its preparation method and surface modification methods. This research investigates the properties for samarium-doped ceria nanospheres prepared via the solvothermal method and their CMP performance on dielectric materials. Ceria nanospheres with various Sm doping concentrations were synthesized using a surfactant-assisted solvothermal method. Doping increased the ratio of Ce3+ to Ce4+ and oxygen vacancy in ceria. While, Sm doping reduced the overall amount of Ce, resulting in a decrease in the material removal rate (MRR) of silicon oxide, and an initial decrease followed by an increase in the MRR of silicon nitride. The Ce0.95Sm0.05O2 suspension exhibited better material removal selectivity than pristine ceria nanospheres, with an increase in the selection ratio from 7:1 to 25:1.

Graphical Abstract

作为化学机械抛光(CMP)中重要的磨料,二氧化铈的制备方法和表面改性方法受到了广泛的关注。研究了溶剂热法制备的掺钐铈纳米球的性能及其在介电材料上的CMP性能。采用表面活性剂辅助溶剂热法合成了不同Sm掺杂浓度的氧化铈纳米球。掺杂提高了Ce3+与Ce4+的比值,增加了氧化铈中的氧空位。而Sm掺杂降低了Ce的总量,导致氧化硅的材料去除率(MRR)下降,氮化硅的MRR先下降后上升。Ce0.95Sm0.05O2悬浮液的材料去除选择性优于原始氧化铈纳米球,选择比由7:1提高到25:1。图形抽象
{"title":"Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties","authors":"Zhenyang Wang,&nbsp;Tongqing Wang,&nbsp;Xinchun Lu","doi":"10.1007/s13391-024-00537-5","DOIUrl":"10.1007/s13391-024-00537-5","url":null,"abstract":"<div><p>As a crucial abrasive in chemical mechanical polishing (CMP), ceria has garnered significant attention regarding its preparation method and surface modification methods. This research investigates the properties for samarium-doped ceria nanospheres prepared via the solvothermal method and their CMP performance on dielectric materials. Ceria nanospheres with various Sm doping concentrations were synthesized using a surfactant-assisted solvothermal method. Doping increased the ratio of Ce<sup>3+</sup> to Ce<sup>4+</sup> and oxygen vacancy in ceria. While, Sm doping reduced the overall amount of Ce, resulting in a decrease in the material removal rate (MRR) of silicon oxide, and an initial decrease followed by an increase in the MRR of silicon nitride. The Ce<sub>0.95</sub>Sm<sub>0.05</sub>O<sub>2</sub> suspension exhibited better material removal selectivity than pristine ceria nanospheres, with an increase in the selection ratio from 7:1 to 25:1.</p><h3>Graphical Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"252 - 259"},"PeriodicalIF":2.1,"publicationDate":"2024-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571184","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
First-Principles Study of CO, NH3, HCN, CNCl, and Cl2 Gas Adsorption Behaviors of Metal and Cyclic C–Metal B- and N-Site-Doped h-BNs 金属和循环c -金属B-和n -掺杂h- bn吸附CO, NH3, HCN, CNCl和Cl2气体的第一性原理研究
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-12-23 DOI: 10.1007/s13391-024-00540-w
Jiaming Zhao, Mingcong Zhang, Chunyang Wang, Weiyao Yu, Yongliang Zhu, Pengcheng Zhu

Effective detection of toxic gases such as carbon monoxide (CO), ammonia (NH3), hydrogen cyanide (HCN), cyanogen chloride (CNCl), and chlorine (Cl2) is highly important. Herein, the potential applications of metal and cyclic carbon (C)–metal doping at the boron (B) and nitrogen (N) sites of hexagonal boron nitride (h-BN) as CO, NH3, HCN, CNCl, and Cl2 gas detection materials, and the performance characteristics of those systems, were investigated based on first principles. The calculated parameters for systems containing each gas along with different metal and cyclic C–metal B- and N-site-doped h-BN substrates include adsorption energy, energy band structure, charge transfer, density of states, differential charge density, and recovery time. Among the systems studied, h-BN@B-zinc (Zn)/CO, h-BN@B-Zn/HCN, h-BN@B-Zn/CNCl, h-BN@B-Zn/Cl2, and h-BN@B-3C-tin(Sn)/Cl2 were characterized by strong adsorption, high electrosensitivity, and strong orbital hybridization, and were unaffected by N2 and O2 in the air environment. In addition, the desorption performance of these systems could be improved by varying degrees by modulating the adsorption energy using an applied electric field, which further facilitated thermoelectrolytic adsorption. These results imply that metal and cyclic C–metal B- and N-site-doped h-BN can be used to realize gas-sensing devices with good gas-sensing and adsorption properties.

Graphical Abstract

The doping of N-site of h-BN can significantly increase the conductivity. h-BN@B-Zn can effectively detect CO, HCN, CNCl and Cl2, h-BN@B-3C-Sn can effectively detect Cl2.h-BN@B-Zn and h-BN@B-3C-Sn. The substrate is not affected by air during detection. CO, HCN and CNCl can be desorbed effectively at h-BN@B-Zn at temperatures up to 334 K. Electric field can improve the desorption effect and further achieve thermoelectric desorption.

有效检测一氧化碳(CO)、氨(NH3)、氰化氢(HCN)、氯化氰(CNCl)、氯(Cl2)等有毒气体非常重要。本文基于第一性原理,研究了六方氮化硼(h-BN)的硼(B)和氮(N)位点上金属和环碳(C) -金属掺杂作为CO、NH3、HCN、CNCl和Cl2气体检测材料的潜在应用,以及这些体系的性能特征。计算了含有每种气体以及不同金属和循环c -金属B和n位掺杂h-BN衬底的体系的参数,包括吸附能、能带结构、电荷转移、态密度、差分电荷密度和恢复时间。所研究的体系中,h-BN@B-zinc (Zn)/CO、h-BN@B-Zn/HCN、h-BN@B-Zn/CNCl、h-BN@B-Zn/Cl2和h-BN@B-3C-tin(Sn)/Cl2具有强吸附、高电敏和强轨道杂化的特点,且不受空气环境中N2和O2的影响。此外,外加电场调节吸附能可以不同程度地提高系统的解吸性能,进一步促进热电解吸附。这些结果表明,金属和环c -金属B和n位掺杂的h-BN可以实现具有良好气敏和吸附性能的气敏器件。摘要掺杂氢氮化硼的n位可以显著提高电导率。h-BN@B-Zn能有效检测CO、HCN、CNCl、Cl2, h-BN@B-3C-Sn能有效检测Cl2.h-BN@B-Zn、h-BN@B-3C-Sn。基材在检测过程中不受空气的影响。CO、HCN和CNCl在h-BN@B-Zn温度下可有效解吸,温度可达334 K。电场可以提高解吸效果,进一步实现热电解吸。
{"title":"First-Principles Study of CO, NH3, HCN, CNCl, and Cl2 Gas Adsorption Behaviors of Metal and Cyclic C–Metal B- and N-Site-Doped h-BNs","authors":"Jiaming Zhao,&nbsp;Mingcong Zhang,&nbsp;Chunyang Wang,&nbsp;Weiyao Yu,&nbsp;Yongliang Zhu,&nbsp;Pengcheng Zhu","doi":"10.1007/s13391-024-00540-w","DOIUrl":"10.1007/s13391-024-00540-w","url":null,"abstract":"<div><p>Effective detection of toxic gases such as carbon monoxide (CO), ammonia (NH<sub>3</sub>), hydrogen cyanide (HCN), cyanogen chloride (CNCl), and chlorine (Cl<sub>2</sub>) is highly important. Herein, the potential applications of metal and cyclic carbon (C)–metal doping at the boron (B) and nitrogen (N) sites of hexagonal boron nitride (h-BN) as CO, NH<sub>3</sub>, HCN, CNCl, and Cl<sub>2</sub> gas detection materials, and the performance characteristics of those systems, were investigated based on first principles. The calculated parameters for systems containing each gas along with different metal and cyclic C–metal B- and N-site-doped h-BN substrates include adsorption energy, energy band structure, charge transfer, density of states, differential charge density, and recovery time. Among the systems studied, h-BN@B-zinc (Zn)/CO, h-BN@B-Zn/HCN, h-BN@B-Zn/CNCl, h-BN@B-Zn/Cl<sub>2</sub>, and h-BN@B-3C-tin(Sn)/Cl<sub>2</sub> were characterized by strong adsorption, high electrosensitivity, and strong orbital hybridization, and were unaffected by N<sub>2</sub> and O<sub>2</sub> in the air environment. In addition, the desorption performance of these systems could be improved by varying degrees by modulating the adsorption energy using an applied electric field, which further facilitated thermoelectrolytic adsorption. These results imply that metal and cyclic C–metal B- and N-site-doped h-BN can be used to realize gas-sensing devices with good gas-sensing and adsorption properties.</p><h3>Graphical Abstract</h3><p>The doping of N-site of h-BN can significantly increase the conductivity. h-BN@B-Zn can effectively detect CO, HCN, CNCl and Cl<sub>2</sub>, h-BN@B-3C-Sn can effectively detect Cl<sub>2</sub>.h-BN@B-Zn and h-BN@B-3C-Sn. The substrate is not affected by air during detection. CO, HCN and CNCl can be desorbed effectively at h-BN@B-Zn at temperatures up to 334 K. Electric field can improve the desorption effect and further achieve thermoelectric desorption.</p>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"268 - 288"},"PeriodicalIF":2.1,"publicationDate":"2024-12-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143570968","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Electronic Materials Letters
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