Pub Date : 2024-09-02DOI: 10.1007/s10825-024-02212-2
Mehdi Banihashemi, Alireza Kashani Nia
In this work we studied the effects of negative hydroxyl ions at the SnO2/perovskite layer interface with respect to the performance of perovskite solar cells (PSCs). We considered a layer of 1 nm thickness, containing fixed negative ions, at the SnO2/perovskite layer interface. The density of the ions was set to 7 × 1019 cm−3 in our simulations. To maintain charge neutrality in the SnO2 electron transport layer (ETL), we calculated the number of negative ions in the 1-nm-thick layer and added the same number of positive ions to the remaining part of the ETL. According to our simulation results, the negative ions increased the internal potential drop, reducing the open-circuit voltage of the perovskite solar cell from 0.99 to 0.88 V. On the other hand, the negative non-mobile hydroxyl ions at the interface absorbed some of the mobile positive ions of the perovskite layer, which increased the hysteresis index from 0.177% to 0.707%.
{"title":"Effects of negative hydroxyl ions at the SnO2/perovskite layer interface on the performance of perovskite solar cells","authors":"Mehdi Banihashemi, Alireza Kashani Nia","doi":"10.1007/s10825-024-02212-2","DOIUrl":"10.1007/s10825-024-02212-2","url":null,"abstract":"<div><p>In this work we studied the effects of negative hydroxyl ions at the SnO<sub>2</sub>/perovskite layer interface with respect to the performance of perovskite solar cells (PSCs). We considered a layer of 1 nm thickness, containing fixed negative ions, at the SnO<sub>2</sub>/perovskite layer interface. The density of the ions was set to 7 × 10<sup>19</sup> cm<sup>−3</sup> in our simulations. To maintain charge neutrality in the SnO2 electron transport layer (ETL), we calculated the number of negative ions in the 1-nm-thick layer and added the same number of positive ions to the remaining part of the ETL. According to our simulation results, the negative ions increased the internal potential drop, reducing the open-circuit voltage of the perovskite solar cell from 0.99 to 0.88 V. On the other hand, the negative non-mobile hydroxyl ions at the interface absorbed some of the mobile positive ions of the perovskite layer, which increased the hysteresis index from 0.177% to 0.707%.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1162 - 1169"},"PeriodicalIF":2.2,"publicationDate":"2024-09-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194929","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-30DOI: 10.1007/s10825-024-02220-2
P. B. Alisha, Tripti S. Warrier
Computing in memory (CiM) architecture enables computation within the memory array, reducing power-intensive data transmission between the processor and memory. The primary goal of this work is to enhance the energy efficiency of CiM architectures that use spintronic devices. Experiments show that the thermal stability ((Delta)) in magnetic tunnel junctions (MTJs) can be optimized to reduce write energy by adjusting the oxide layer thickness. Based on this finding, this work explores a novel spin-orbit torque random-access memory (SOT) cell that yields a 30% increase in energy efficiency compared to conventional SOT. However, reducing the oxide layer thickness below 1.5 nm to tune (Delta) leads to a decrease in the tunnel magnetoresistance (TMR) ratio leading to reliability concerns. The second part of the work proposes to improve TMR by replacing the conventional MgO oxide layer with a TiCoSb Heusler alloy-based layer and utilizing (hbox {Co}_{2}hbox {MnSb}) as the electrode in the modified cell called (Delta)M-SOT. Theoretical and experimental studies demonstrate that this alternative MTJ design exhibits TMR ratios comparable to values reported in the literature. The performance of magnetic full adder CiM design using the proposed (Delta)M-SOT is compared with designs implemented using CMOS, spin-transfer torque random-access RAM (STT), and conventional SOT. Evaluations show that the (Delta)M-SOT-CiM has a reduction of 66% and 30% in logic and data transfer energy, respectively, compared to conventional SOT-CiM design. Furthermore, the data storage and computation operations in (Delta)M-SOT-CiM are found to be significantly faster compared to both STT- and SOT-CiM design. Overall, this work presents a promising SOT design that effectively bridges the gap between the processor and memory by enabling logical functions within memory, eliminating the need for additional circuits.
{"title":"TiCoSb Heusler alloy-based magnetic tunnel junction for efficient computing in memory architecture","authors":"P. B. Alisha, Tripti S. Warrier","doi":"10.1007/s10825-024-02220-2","DOIUrl":"10.1007/s10825-024-02220-2","url":null,"abstract":"<div><p>Computing in memory (CiM) architecture enables computation within the memory array, reducing power-intensive data transmission between the processor and memory. The primary goal of this work is to enhance the energy efficiency of CiM architectures that use spintronic devices. Experiments show that the thermal stability (<span>(Delta)</span>) in magnetic tunnel junctions (MTJs) can be optimized to reduce write energy by adjusting the oxide layer thickness. Based on this finding, this work explores a novel spin-orbit torque random-access memory (SOT) cell that yields a 30% increase in energy efficiency compared to conventional SOT. However, reducing the oxide layer thickness below 1.5 nm to tune <span>(Delta)</span> leads to a decrease in the tunnel magnetoresistance (TMR) ratio leading to reliability concerns. The second part of the work proposes to improve TMR by replacing the conventional MgO oxide layer with a TiCoSb Heusler alloy-based layer and utilizing <span>(hbox {Co}_{2}hbox {MnSb})</span> as the electrode in the modified cell called <span>(Delta)</span>M-SOT. Theoretical and experimental studies demonstrate that this alternative MTJ design exhibits TMR ratios comparable to values reported in the literature. The performance of magnetic full adder CiM design using the proposed <span>(Delta)</span>M-SOT is compared with designs implemented using CMOS, spin-transfer torque random-access RAM (STT), and conventional SOT. Evaluations show that the <span>(Delta)</span>M-SOT-CiM has a reduction of 66% and 30% in logic and data transfer energy, respectively, compared to conventional SOT-CiM design. Furthermore, the data storage and computation operations in <span>(Delta)</span>M-SOT-CiM are found to be significantly faster compared to both STT- and SOT-CiM design. Overall, this work presents a promising SOT design that effectively bridges the gap between the processor and memory by enabling logical functions within memory, eliminating the need for additional circuits.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1249 - 1261"},"PeriodicalIF":2.2,"publicationDate":"2024-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194965","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-23DOI: 10.1007/s10825-024-02214-0
Abdulilah M. Mayet, Mohammed Abdul Muqeet, Fadi Kurdahi
The article offers a comprehensive exposition of the theoretical underpinnings and empirical substantiation pertaining to the energy-reversible nanoelectromechanical switch (NEMS) in the context of adiabatic computing and biomedical applications. Adiabatic circuits employ a power clock consisting of four phases and employ astute circuit configurations to circumvent the accumulation of transistor charge during logic operations, thereby mitigating power consumption. NEM switches exhibit minimal leakage current and demonstrate a low static power consumption profile, rendering them highly suitable for deployment in various electronic devices. The utilization of energy-reversible NEMs witches has the potential to mitigate adiabatic circuit power consumption. The rationale behind this phenomenon lies in the switch ability to preserve and regenerate mechanical bending energy throughout successive cycles, both in the present and in subsequent switching events. The present study aims to investigate the advantages associated with the utilization of NEMS, encompassing both three-terminal and energy-reversible variations, as opposed to CMOS (complementary metal–oxide–semiconductor) transistor switch within adiabatic circuits. This study aims to investigate the dissipation of power clock energy per cycle across a range of frequencies through a comprehensive analysis grounded in theoretical principles and substantiated by empirical evidence. Throughout the course of this investigation, it was observed that the pull-in voltage of energy-reversible NEM switches exhibited a consistent decrease of 13% over consecutive switching cycles. The reduced pull-in voltage results in a decrease in the amount of energy required for switching. In the realm of low-frequency activities that operate at frequencies below 100 kHz, it has been observed that the implementation of noise exclusionary mechanisms has the potential to effectively curtail energy consumption. Henceforth, it is imperative to underscore the primary domains wherein biomedical engineering and low-power applications ought to be accorded paramount significance.
文章结合绝热计算和生物医学应用,全面阐述了能量可逆纳米机电开关(NEMS)的理论基础和经验证明。绝热电路采用由四个相位组成的功率时钟,并采用精巧的电路配置来避免逻辑运算过程中晶体管电荷的积累,从而降低功耗。NEM 开关的漏电流极小,静态功耗低,非常适合用于各种电子设备。利用能量可逆 NEM 开关有可能降低绝热电路功耗。这种现象背后的原理在于开关能够在当前和后续开关事件中,在连续循环中保存和再生机械弯曲能量。本研究旨在探讨在绝热电路中使用 NEMS(包括三端和能量可逆变化)与 CMOS(互补金属氧化物半导体)晶体管开关相比的优势。本研究旨在通过以理论原则为基础、以实证为依据的综合分析,研究功率时钟在不同频率下每个周期的能量耗散情况。在整个研究过程中,我们观察到能量可逆 NEM 开关的拉入电压在连续开关周期内持续降低了 13%。拉入电压的降低导致开关所需的能量减少。在工作频率低于 100 kHz 的低频活动领域,据观察,噪声排除机制的实施有可能有效降低能耗。因此,必须强调生物医学工程和低功耗应用的主要领域,在这些领域中,生物医学工程和低功耗应用具有极其重要的意义。
{"title":"A nanoelectromechanical energy-reversible switch: theoretical study and verification by experiment of its applicability to adiabatic computing","authors":"Abdulilah M. Mayet, Mohammed Abdul Muqeet, Fadi Kurdahi","doi":"10.1007/s10825-024-02214-0","DOIUrl":"10.1007/s10825-024-02214-0","url":null,"abstract":"<div><p>The article offers a comprehensive exposition of the theoretical underpinnings and empirical substantiation pertaining to the energy-reversible nanoelectromechanical switch (NEMS) in the context of adiabatic computing and biomedical applications. Adiabatic circuits employ a power clock consisting of four phases and employ astute circuit configurations to circumvent the accumulation of transistor charge during logic operations, thereby mitigating power consumption. NEM switches exhibit minimal leakage current and demonstrate a low static power consumption profile, rendering them highly suitable for deployment in various electronic devices. The utilization of energy-reversible NEMs witches has the potential to mitigate adiabatic circuit power consumption. The rationale behind this phenomenon lies in the switch ability to preserve and regenerate mechanical bending energy throughout successive cycles, both in the present and in subsequent switching events. The present study aims to investigate the advantages associated with the utilization of NEMS, encompassing both three-terminal and energy-reversible variations, as opposed to CMOS (complementary metal–oxide–semiconductor) transistor switch within adiabatic circuits. This study aims to investigate the dissipation of power clock energy per cycle across a range of frequencies through a comprehensive analysis grounded in theoretical principles and substantiated by empirical evidence. Throughout the course of this investigation, it was observed that the pull-in voltage of energy-reversible NEM switches exhibited a consistent decrease of 13% over consecutive switching cycles. The reduced pull-in voltage results in a decrease in the amount of energy required for switching. In the realm of low-frequency activities that operate at frequencies below 100 kHz, it has been observed that the implementation of noise exclusionary mechanisms has the potential to effectively curtail energy consumption. Henceforth, it is imperative to underscore the primary domains wherein biomedical engineering and low-power applications ought to be accorded paramount significance.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1438 - 1447"},"PeriodicalIF":2.2,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194931","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-23DOI: 10.1007/s10825-024-02218-w
Jinping Zhang, Mengxiao Li, Yunxiang Huang, Bing Xiao, Bo Zhang
For the conventional super junction trench insulated gate bipolar transistor (SJ-TIGBT), the higher the N/P column doping concentration (Nc), the better the electrical characteristics can be obtained. However, considering the negative impact of charge imbalance of the N/P column on the breakdown voltage (BV), the value of Nc is limited, which limits the improvement of device performances. In this paper, a novel SJ-TIGBT with narrow mesa (NM) and floating-P (FP) region (NMFP-SJ-TIGBT) is proposed. The electrical characteristics of the proposed SJ-TIGBT are significantly enhanced owing to the dual injection enhancement effect provided by the NM and FP region. Moreover, for the proposed SJ device, the excellent performance obtained in the lower Nc regime alleviates the negative impact of charge imbalance of N/P column on the BV, which greatly improves its fabrication process tolerance. The simulation results show that compared to the conventional SJ-TIGBT (SJ-TIGBT-A), a SJ-TIGBT with an n-injector layer (SJ-TIGBT-B) and a SJ-TIGBT with a floating-P column under the gate (SJ-TIGBT-C), the proposed structure demonstrates a significantly lower and almost constant on-state voltage drop (Vceon). At a collector current density of 100 A/cm2 and Nc of 1 × 1015 cm−3, the Vceon of the proposed SJ-TIGBT is 74.9%, 41.1% and 26.1% lower than that of the SJ-TIGBT-A, SJ-TIGBT-B and SJ-TIGBT-C, respectively. With the same Vceon of 1.05 V and Nc of 1 × 1015 cm−3, the turn-off loss of the proposed SJ-TIGBT is only 6.44 mJ/cm2, which is 73.7% and 35.4% lower than that of SJ-TIGBT-B and SJ-TIGBT-C, respectively.
{"title":"Dual injection enhanced super junction TIGBT with narrow mesa and floating-P region","authors":"Jinping Zhang, Mengxiao Li, Yunxiang Huang, Bing Xiao, Bo Zhang","doi":"10.1007/s10825-024-02218-w","DOIUrl":"10.1007/s10825-024-02218-w","url":null,"abstract":"<div><p>For the conventional super junction trench insulated gate bipolar transistor (SJ-TIGBT), the higher the N/P column doping concentration (<i>N</i><sub>c</sub>), the better the electrical characteristics can be obtained. However, considering the negative impact of charge imbalance of the N/P column on the breakdown voltage (<i>BV</i>), the value of <i>N</i><sub>c</sub> is limited, which limits the improvement of device performances. In this paper, a novel SJ-TIGBT with narrow mesa (NM) and floating-P (FP) region (NMFP-SJ-TIGBT) is proposed. The electrical characteristics of the proposed SJ-TIGBT are significantly enhanced owing to the dual injection enhancement effect provided by the NM and FP region. Moreover, for the proposed SJ device, the excellent performance obtained in the lower <i>N</i><sub>c</sub> regime alleviates the negative impact of charge imbalance of N/P column on the <i>BV</i>, which greatly improves its fabrication process tolerance. The simulation results show that compared to the conventional SJ-TIGBT (SJ-TIGBT-A), a SJ-TIGBT with an n-injector layer (SJ-TIGBT-B) and a SJ-TIGBT with a floating-P column under the gate (SJ-TIGBT-C), the proposed structure demonstrates a significantly lower and almost constant on-state voltage drop (<i>V</i><sub>ceon</sub>). At a collector current density of 100 A/cm<sup>2</sup> and <i>N</i><sub>c</sub> of 1 × 10<sup>15</sup> cm<sup>−3</sup>, the <i>V</i><sub>ceon</sub> of the proposed SJ-TIGBT is 74.9%, 41.1% and 26.1% lower than that of the SJ-TIGBT-A, SJ-TIGBT-B and SJ-TIGBT-C, respectively. With the same <i>V</i><sub>ceon</sub> of 1.05 V and <i>N</i><sub>c</sub> of 1 × 10<sup>15</sup> cm<sup>−3</sup>, the turn-off loss of the proposed SJ-TIGBT is only 6.44 mJ/cm<sup>2</sup>, which is 73.7% and 35.4% lower than that of SJ-TIGBT-B and SJ-TIGBT-C, respectively.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1345 - 1354"},"PeriodicalIF":2.2,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194930","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-20DOI: 10.1007/s10825-024-02219-9
Yanshen Zhao, Lu Yang, Huaidong Liu, Shihang Sun, Xingbin Wei
In this paper, based on the first-principles calculation method of density functional theory, the PtS2/PtSe2 heterostructure with the lowest formation energy is selected from five different stacking modes. At the same time, the phonon spectrum of PtS2/PtSe2 heterostructure has no imaginary frequency, so the structure is stable. After that, the changes of photoelectric properties of heterostructures under tensile and compressive strains were studied. It is concluded that the PtS2/PtSe2 heterostructure is a semiconductor with indirect band gap and type II band arrangement. With the increase of tensile strain, the band gap value decreases from 0.927 to 0.565 eV, and the minimum value of the conduction band is transferred from the high symmetry point M point to the K point by 8% biaxial tensile strain. The biaxial tensile strain can effectively improve the dielectric constant of the PtS2/PtSe2 heterostructure. When the strain reaches 8%, the dielectric constant is nearly twice as high as the intrinsic value and reaches 11.6, which improves the charge retention ability. The light absorption of PtS2/PtSe2 heterostructure reaches 13.7 × 104 cm−1 under compressive strain, and the stability of light absorption is enhanced. The optical reflection ability of PtS2/PtSe2 heterostructure is significantly enhanced under tensile strain, indicating that the biaxial strain has a regulatory effect on the absorption and reflection ability of light. The valley values of all systems near the ultraviolet region show a linear increase trend, which changes the transmittance of the heterostructure. These findings broaden the application of PtS2/PtSe2 heterostructures in optoelectronic engineering.
本文基于密度泛函理论的第一性原理计算方法,从五种不同的堆积模式中选出了形成能最低的 PtS2/PtSe2 异质结构。同时,PtS2/PtSe2 异质结构的声子谱没有虚频,因此结构稳定。随后,研究了异质结构在拉伸和压缩应变下的光电特性变化。结果表明,PtS2/PtSe2 异质结构是一种具有间接带隙和 II 型带排列的半导体。随着拉伸应变的增加,带隙值从 0.927 eV 下降到 0.565 eV,并且在 8%的双轴拉伸应变作用下,导带的最小值从高对称点 M 点转移到 K 点。双轴拉伸应变能有效提高 PtS2/PtSe2 异质结构的介电常数。当应变达到 8%时,介电常数几乎是固有值的两倍,达到 11.6,从而提高了电荷保持能力。在压缩应变作用下,PtS2/PtSe2 异质结构的光吸收率达到 13.7 × 104 cm-1,光吸收率的稳定性得到提高。在拉伸应变下,PtS2/PtSe2 异质结构的光反射能力显著增强,表明双轴应变对光的吸收和反射能力具有调节作用。所有体系在紫外区附近的谷值都呈线性上升趋势,这改变了异质结构的透射率。这些发现拓宽了 PtS2/PtSe2 异质结构在光电工程中的应用。
{"title":"Tuning the optoelectronic properties of PtS2/PtSe2 heterostructure via strain engineering","authors":"Yanshen Zhao, Lu Yang, Huaidong Liu, Shihang Sun, Xingbin Wei","doi":"10.1007/s10825-024-02219-9","DOIUrl":"10.1007/s10825-024-02219-9","url":null,"abstract":"<div><p>In this paper, based on the first-principles calculation method of density functional theory, the PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructure with the lowest formation energy is selected from five different stacking modes. At the same time, the phonon spectrum of PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructure has no imaginary frequency, so the structure is stable. After that, the changes of photoelectric properties of heterostructures under tensile and compressive strains were studied. It is concluded that the PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructure is a semiconductor with indirect band gap and type II band arrangement. With the increase of tensile strain, the band gap value decreases from 0.927 to 0.565 eV, and the minimum value of the conduction band is transferred from the high symmetry point M point to the K point by 8% biaxial tensile strain. The biaxial tensile strain can effectively improve the dielectric constant of the PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructure. When the strain reaches 8%, the dielectric constant is nearly twice as high as the intrinsic value and reaches 11.6, which improves the charge retention ability. The light absorption of PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructure reaches 13.7 × 10<sup>4</sup> cm<sup>−1</sup> under compressive strain, and the stability of light absorption is enhanced. The optical reflection ability of PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructure is significantly enhanced under tensile strain, indicating that the biaxial strain has a regulatory effect on the absorption and reflection ability of light. The valley values of all systems near the ultraviolet region show a linear increase trend, which changes the transmittance of the heterostructure. These findings broaden the application of PtS<sub>2</sub>/PtSe<sub>2</sub> heterostructures in optoelectronic engineering.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1413 - 1422"},"PeriodicalIF":2.2,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-19DOI: 10.1007/s10825-024-02216-y
Chanchal, Vandana Kumari, D. S. Rawal, Manoj Saxena
In this work, the influence of heavy ions on the performance mechanism of recess gate GaN/AlN-based p-channel HEMT has been investigated using extensive TCAD simulation. The effect of the recess gate depth and position along with the technological misalignment issues has also been addressed. Results show that the transient drain current is more sensitive to heavy ions when it is incident in the gate–drain access region. Also, the device exhibited high susceptibility to heavy ions, with increasing energy and recess gate depth. With the increase in linear energy transfer (LET) value, the peak gate and drain current increase linearly. Further to make the device more robust against heavy ions, MIS-type configuration in GaN/AlN architecture is studied with silicon nitride as the dielectric layer. The insulating layer provides an additional degree of protection against the single-event effects caused by heavy ions or other sources of charge injection mechanism.
在这项工作中,利用大量 TCAD 仿真研究了重离子对基于凹栅极 GaN/AlN p 沟道 HEMT 性能机制的影响。此外,还研究了凹栅深度和位置的影响以及技术错位问题。结果表明,当重离子入射到栅漏接入区时,瞬态漏极电流对重离子更为敏感。此外,随着能量和凹栅深度的增加,器件对重离子的敏感性也会增加。随着线性能量转移(LET)值的增加,栅极和漏极电流峰值也呈线性增长。为了进一步提高器件对重离子的稳定性,我们研究了氮化硅作为介电层的氮化镓/氮化铝结构中的 MIS 型配置。绝缘层可提供额外的保护,防止重离子或其他电荷注入机制源引起的单次事件效应。
{"title":"Investigating single-event effects in recess gate GaN/AlN p-channel HEMTs for radiation-hardened application","authors":"Chanchal, Vandana Kumari, D. S. Rawal, Manoj Saxena","doi":"10.1007/s10825-024-02216-y","DOIUrl":"10.1007/s10825-024-02216-y","url":null,"abstract":"<div><p>In this work, the influence of heavy ions on the performance mechanism of recess gate GaN/AlN-based p-channel HEMT has been investigated using extensive TCAD simulation. The effect of the recess gate depth and position along with the technological misalignment issues has also been addressed. Results show that the transient drain current is more sensitive to heavy ions when it is incident in the gate–drain access region. Also, the device exhibited high susceptibility to heavy ions, with increasing energy and recess gate depth. With the increase in linear energy transfer (LET) value, the peak gate and drain current increase linearly. Further to make the device more robust against heavy ions, MIS-type configuration in GaN/AlN architecture is studied with silicon nitride as the dielectric layer. The insulating layer provides an additional degree of protection against the single-event effects caused by heavy ions or other sources of charge injection mechanism.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1337 - 1344"},"PeriodicalIF":2.2,"publicationDate":"2024-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10825-024-02216-y.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194963","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-19DOI: 10.1007/s10825-024-02211-3
Rajaa Diany, Said Kerraj, Abdelkhalk Aboulouard, Asad Syed, Abdellah Zeroual, Ali H. Bahkali, Mohamed El Idrissi, Mohammed Salah, Abdessamad Tounsi
We present the characterization of seven newly developed organic dyes tailored for application in dye-sensitized solar cells (DSSCs). At the core of their structures is 8,10-di(thiophen-2-yl) trithieno[3,4-b:3′,2′-f:2″,3″-h] quinoxaline, serving as the electron-donor group across all dyes. Employing density functional theory (DFT) and time-dependent DFT (TD-DFT) techniques with the CAM-B3LYP level and 6-31G(d,p) basis set, we delved into molecular structures, frontier molecular orbitals (FMOs), and various electronic chemical properties. This investigation is aimed at unraveling their ultraviolet–visible (UV–Vis) absorption properties, electron injection free energy, and global hardness (η), electronegativity (χ), and chemical potential (µ). These insights shed light on the stability and potential utility of these dyes as sensitizers in DSSCs. Furthermore, computation and discussion of the open-circuit voltage (({V}_{OC})) underscored the promising nature of these seven new organic dyes with D-A molecules, positioning them as strong contenders for DSSC applications, all anchored around 8,10-di(thiophen-2-yl) trithieno[3,4-b:3′,2′-f:2',3″-h] quinoxaline as the electron-donor group.
{"title":"Enhancing dye sensitized solar cells performance through quinoxaline based organic dye sensitizers","authors":"Rajaa Diany, Said Kerraj, Abdelkhalk Aboulouard, Asad Syed, Abdellah Zeroual, Ali H. Bahkali, Mohamed El Idrissi, Mohammed Salah, Abdessamad Tounsi","doi":"10.1007/s10825-024-02211-3","DOIUrl":"10.1007/s10825-024-02211-3","url":null,"abstract":"<div><p>We present the characterization of seven newly developed organic dyes tailored for application in dye-sensitized solar cells (DSSCs). At the core of their structures is 8,10-di(thiophen-2-yl) trithieno[3,4-b:3′,2′-f:2″,3″-h] quinoxaline, serving as the electron-donor group across all dyes. Employing density functional theory (DFT) and time-dependent DFT (TD-DFT) techniques with the CAM-B3LYP level and 6-31G(d,p) basis set, we delved into molecular structures, frontier molecular orbitals (FMOs), and various electronic chemical properties. This investigation is aimed at unraveling their ultraviolet–visible (UV–Vis) absorption properties, electron injection free energy, and global hardness (<i>η</i>), electronegativity (<i>χ</i>), and chemical potential (<i>µ</i>). These insights shed light on the stability and potential utility of these dyes as sensitizers in DSSCs. Furthermore, computation and discussion of the open-circuit voltage (<span>({V}_{OC})</span>) underscored the promising nature of these seven new organic dyes with D-A molecules, positioning them as strong contenders for DSSC applications, all anchored around 8,10-di(thiophen-2-yl) trithieno[3,4-b:3′,2′-f:2',3″-h] quinoxaline as the electron-donor group.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1195 - 1208"},"PeriodicalIF":2.2,"publicationDate":"2024-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194962","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-18DOI: 10.1007/s10825-024-02215-z
Vahidreza Darugar, Mohammad Vakili, Somayeh Heydari, Ali Reza Berenji
Here, the electronic conductance characteristics of naphthopyran were studied using non-equilibrium Green’s function density functional theory (NEGF-DFT) and time-dependent density functional theory (TD-DFT) methods. When naphthopyran is exposed to UV or visible light, the specified structure can switch between its open and closed forms. Molecular geometries, surface material types (platinum, gold, and silver), switching ratios, gaps between HOMO and LUMO levels, transmission spectra, and PDOS at different bias voltages were studied. It was found that the conductance of naphthopyran changed from an off-state (high resistance) to an on-state (low resistance) when the molecular optical junction converted from the open to the closed configuration.
{"title":"Conductance characteristics of naphthopyran as a light-sensitive molecular optical junction: a joint NEGF-DFT and TD-DFT study","authors":"Vahidreza Darugar, Mohammad Vakili, Somayeh Heydari, Ali Reza Berenji","doi":"10.1007/s10825-024-02215-z","DOIUrl":"10.1007/s10825-024-02215-z","url":null,"abstract":"<div><p>Here, the electronic conductance characteristics of naphthopyran were studied using non-equilibrium Green’s function density functional theory (NEGF-DFT) and time-dependent density functional theory (TD-DFT) methods. When naphthopyran is exposed to UV or visible light, the specified structure can switch between its open and closed forms. Molecular geometries, surface material types (platinum, gold, and silver), switching ratios, gaps between HOMO and LUMO levels, transmission spectra, and PDOS at different bias voltages were studied. It was found that the conductance of naphthopyran changed from an off-state (high resistance) to an on-state (low resistance) when the molecular optical junction converted from the open to the closed configuration.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1306 - 1314"},"PeriodicalIF":2.2,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10825-024-02215-z.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194964","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-16DOI: 10.1007/s10825-024-02217-x
Huma Shabbir, Muhammad Usman, Jalil Ur Rehman, Douxing Pan, Syed Mansoor Ali, Rajeh Alotaibi
The current study delves into the physical properties and hydrogen storage capabilities of XScH3 (X = K, Na) using the CASTEP code by leveraging the GGA-PBE method. The examined values of the lattice constants for KScH3 and NaScH3, are 4.19 and 4.07 Å, respectively. With a zero band gap revealing the metallic behavior, both compounds are discovered to be mechanically and thermodynamically stable in the cubic phase. Both compounds exhibit substantially enhanced conductivity and absorption in the low-energy range. While comparing NaScH3 to KScH3, the reflectivity and refractive index values for the former are significantly higher. Both the materials possess anisotropic and hard nature represented by anisotropic factor, young’s modulus, bulk modulus and mean shear modulus. Both compounds exhibit the brittle nature which is investigated with the help of poisson ratio and Pugh’s ratio. The values of bulk modulus, young’s modulus and mean shear modulus are higher for KScH3 than NaScH3 showing more hardness in KScH3. The ratio of gravimetric hydrogen storage is found 3.48 and 4.27 wt %, for KScH3 and NaScH3, respectively which shows that both materials can accommodate a good amount of hydrogen, however, NaScH3 can be preferred for hydrogen storage applications due to the higher storage capacity of hydrogen.
{"title":"A DFT investigation of Sc-based perovskite-type hydrides XScH3 (X = K, Na) for hydrogen storage application","authors":"Huma Shabbir, Muhammad Usman, Jalil Ur Rehman, Douxing Pan, Syed Mansoor Ali, Rajeh Alotaibi","doi":"10.1007/s10825-024-02217-x","DOIUrl":"10.1007/s10825-024-02217-x","url":null,"abstract":"<div><p>The current study delves into the physical properties and hydrogen storage capabilities of XScH<sub>3</sub> (X = K, Na) using the CASTEP code by leveraging the GGA-PBE method. The examined values of the lattice constants for KScH<sub>3</sub> and NaScH<sub>3</sub>, are 4.19 and 4.07 Å, respectively. With a zero band gap revealing the metallic behavior, both compounds are discovered to be mechanically and thermodynamically stable in the cubic phase. Both compounds exhibit substantially enhanced conductivity and absorption in the low-energy range. While comparing NaScH<sub>3</sub> to KScH<sub>3</sub>, the reflectivity and refractive index values for the former are significantly higher. Both the materials possess anisotropic and hard nature represented by anisotropic factor, young’s modulus, bulk modulus and mean shear modulus. Both compounds exhibit the brittle nature which is investigated with the help of poisson ratio and Pugh’s ratio. The values of bulk modulus, young’s modulus and mean shear modulus are higher for KScH<sub>3</sub> than NaScH<sub>3</sub> showing more hardness in KScH<sub>3</sub>. The ratio of gravimetric hydrogen storage is found 3.48 and 4.27 wt %, for KScH<sub>3</sub> and NaScH<sub>3</sub>, respectively which shows that both materials can accommodate a good amount of hydrogen, however, NaScH<sub>3</sub> can be preferred for hydrogen storage applications due to the higher storage capacity of hydrogen.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1238 - 1248"},"PeriodicalIF":2.2,"publicationDate":"2024-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142194967","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-12DOI: 10.1007/s10825-024-02207-z
Di Cao, Jiannong Cao
First-principles calculations combined with the Boltzmann transport theory were used to calculate the thermoelectric characteristics of Zr1−xNiSnTax (x = 0, 1/4, 1/8, 1/12, 1/16, 1/24, 1/32, 1/36, 1/48, and 1/64). Ta-doped ZrNiSn can effectively improve the Seebeck coefficient of Zr1−xNiSnTax, and it can also reduce its thermal conductivity. The maximum Seebeck coefficients of p-type and n-type Zr3/4NiSnTa1/4 are 1117.58 μV/K and − 1059.47 μV/K, respectively. The maximum thermoelectric figure of merit of the p-type Zr3/4NiSnTa1/4 thermoelectric material is 0.98, and the maximum thermoelectric figure of merit of the n-type Zr3/4NiSnTa1/4 thermoelectric material is 0.97. The optimum thermoelectric figure of merit of Zr1−xNiSnTax studied in this paper is higher than those of other studies. Our results demonstrate the good potential thermoelectric material of Zr1−xNiSnTax for thermoelectric device applications.
{"title":"Enhanced thermoelectric performance of Zr1−xNiSnTax half-Heusler alloys: a first-principle study","authors":"Di Cao, Jiannong Cao","doi":"10.1007/s10825-024-02207-z","DOIUrl":"10.1007/s10825-024-02207-z","url":null,"abstract":"<div><p>First-principles calculations combined with the Boltzmann transport theory were used to calculate the thermoelectric characteristics of Zr<sub>1−x</sub>NiSnTa<sub>x</sub> (x = 0, 1/4, 1/8, 1/12, 1/16, 1/24, 1/32, 1/36, 1/48, and 1/64). Ta-doped ZrNiSn can effectively improve the Seebeck coefficient of Zr<sub>1−x</sub>NiSnTa<sub>x</sub>, and it can also reduce its thermal conductivity. The maximum Seebeck coefficients of <i>p</i>-type and <i>n</i>-type Zr<sub>3/4</sub>NiSnTa<sub>1/4</sub> are 1117.58 μV/K and − 1059.47 μV/K, respectively. The maximum thermoelectric figure of merit of the <i>p</i>-type Zr<sub>3/4</sub>NiSnTa<sub>1/4</sub> thermoelectric material is 0.98, and the maximum thermoelectric figure of merit of the <i>n</i>-type Zr<sub>3/4</sub>NiSnTa<sub>1/4</sub> thermoelectric material is 0.97. The optimum thermoelectric figure of merit of Zr<sub>1−x</sub>NiSnTa<sub>x</sub> studied in this paper is higher than those of other studies. Our results demonstrate the good potential thermoelectric material of Zr<sub>1−x</sub>NiSnTa<sub>x</sub> for thermoelectric device applications.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"23 6","pages":"1209 - 1216"},"PeriodicalIF":2.2,"publicationDate":"2024-08-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141930636","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}