Pub Date : 2025-09-10DOI: 10.1007/s10825-025-02409-z
Amit Bhattacharyya, Manash Chanda
This article presents a study of the reliability of miscellaneous biomarker recognition in serum for both healthy and diseased males and females and the relevant sensitivity analysis using a short-gated dual-pocket-doped hetero-gate metal stack with hetero-structure tunnel FET-supported biosensor (SG-DP-HGM Bio-HTFET). The significant biomarkers preferred and modeled in this article comprise prostate-specific antigen (PSA), human epididymis protein 4 (HE4), C-erbB-2, and monokine induced by interferon gamma (MIG). The charge deduction reliant approach has been utilized, and the outcomes align through the theoretical perceptive of the model. Device optimization for superior sensitivity is achieved by using Silvaco ATLAS TCAD device simulator. A maximum 17.94% inaccuracy in sensitivity regarding sub-threshold swing (SSS) has been obtained when we presume steric effect rather repulsive steric effect throughout the concentration deviations. Hence, repulsive steric effect must be addressed during the study of label-free biosensing.
{"title":"Reliability optimization of charge deduction approach employing bio-tunnel FET","authors":"Amit Bhattacharyya, Manash Chanda","doi":"10.1007/s10825-025-02409-z","DOIUrl":"10.1007/s10825-025-02409-z","url":null,"abstract":"<div><p>This article presents a study of the reliability of miscellaneous biomarker recognition in serum for both healthy and diseased males and females and the relevant sensitivity analysis using a short-gated dual-pocket-doped hetero-gate metal stack with hetero-structure tunnel FET-supported biosensor (SG-DP-HGM Bio-HTFET). The significant biomarkers preferred and modeled in this article comprise prostate-specific antigen (PSA), human epididymis protein 4 (HE4), C-erbB-2, and monokine induced by interferon gamma (MIG). The charge deduction reliant approach has been utilized, and the outcomes align through the theoretical perceptive of the model. Device optimization for superior sensitivity is achieved by using Silvaco ATLAS TCAD device simulator. A maximum 17.94% inaccuracy in sensitivity regarding sub-threshold swing (<i>S</i><sub>SS</sub>) has been obtained when we presume steric effect rather repulsive steric effect throughout the concentration deviations. Hence, repulsive steric effect must be addressed during the study of label-free biosensing.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145028107","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We discuss the design and analysys of the performance of a strain modulated Ge/Ge0.98Sn0.02 vertical channel pin-based switch for application in mm-wave frequency. The device's performance in the mm-wave region is assessed using a Nano-mixed Quantum Corrected Strain Modified Drift–Diffusion Nonlinear mathematical (NQCSM-DD) model along with Machine Learning Framework. The study investigates the switching characteristics of the device, considering V-I characteristics, reverse recovery time, power dissipation, Insertion Loss (IL), and Isolation (ISOL).The inherent material attributes of the DUT (Device Under Test) are improved considerably by the addition of 2% of Sn into the intrinsic Ge material. The NQCSM-DD model is calibrated by analyzing the experimental and simulated performance of a flat structure-based Si pin device under similar circumstances. The detailed investigation and analysis proves that the switching performance of the proposed DUT is significantly enhanced. The results, compared with the super-lattice structure-based GaN/AlGaN pin device, show that Ge/Ge0.98Sn0.02 outperforms its GaN/AlGaN counterpart in terms of reverse recovery tim, power dissipation, and, IL and ISOL. The proposed DUT offer low IL (0.121 dB and 0.03671 dB for series-shunt & shunt SPST switches, respectively) and high ISOL (69.72 dB and 80.23 dB for series-shunt & shunt SPST switches, respectively) at 120 GHz . Furthermore, the Random-Forest-Regression (R-F-R) model within a Machine Learning Framework (MLF) is applied to determine the device’s efficiency. The proposed model’s reliability study is reported in this paper in details. Ge/Ge0.98Sn0.02 vertical channel pin-based device for the application in mm-wave frequency.
{"title":"Design and Analysis of the performance of strained Ge-based pin switch through Machine Learning framework for application in mm-wave frequency","authors":"Bias Bhadra, Abhijit Kundu, Jhuma Kundu, Moumita Mukherjee, Radha Tamal Goswami","doi":"10.1007/s10825-025-02411-5","DOIUrl":"10.1007/s10825-025-02411-5","url":null,"abstract":"<div><p>We discuss the design and analysys of the performance of a strain modulated Ge/Ge<sub>0.98</sub>Sn<sub>0.02</sub> vertical channel <i>pin</i>-based switch for application in mm-wave frequency. The device's performance in the mm-wave region is assessed using a Nano-mixed Quantum Corrected Strain Modified Drift–Diffusion Nonlinear mathematical (NQCSM-DD) model along with Machine Learning Framework. The study investigates the switching characteristics of the device, considering V-I characteristics, reverse recovery time, power dissipation, Insertion Loss (IL), and Isolation (ISOL).The inherent material attributes of the DUT (Device Under Test) are improved considerably by the addition of 2% of Sn into the intrinsic Ge material. The NQCSM-DD model is calibrated by analyzing the experimental and simulated performance of a flat structure-based Si <i>pin</i> device under similar circumstances. The detailed investigation and analysis proves that the switching performance of the proposed DUT is significantly enhanced. The results, compared with the super-lattice structure-based GaN/AlGaN <i>pin</i> device, show that Ge/Ge<sub>0.98</sub>Sn<sub>0.02</sub> outperforms its GaN/AlGaN counterpart in terms of reverse recovery tim, power dissipation, and, IL and ISOL. The proposed DUT offer low IL (0.121 dB and 0.03671 dB for series-shunt & shunt SPST switches, respectively) and high ISOL (69.72 dB and 80.23 dB for series-shunt & shunt SPST switches, respectively) at 120 GHz . Furthermore, the Random-Forest-Regression (R-F-R) model within a Machine Learning Framework (MLF) is applied to determine the device’s efficiency. The proposed model’s reliability study is reported in this paper in details. Ge/Ge<sub>0.98</sub>Sn<sub>0.02</sub> vertical channel <i>pin</i>-based device for the application in mm-wave frequency.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145011794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-09-09DOI: 10.1007/s10825-025-02412-4
Tobias Linn, Max Renner, Christoph Jungemann
To this day, the drift-diffusion model remains the most widely applied semiconductor simulation tool. This is due to its unrivaled numerical robustness when it is discretized with the finite volume method and the Scharfetter–Gummel stabilization. Unfortunately, this stabilization is only valid for nondegenerate carrier statistics. Several extensions of the Scharfetter–Gummel scheme to degenerate semiconductors have been proposed; however, they either rely on additional approximations or lack the stability for a full-scale device simulation. In this paper, we address this issue and present a generalization of the Scharfetter–Gummel scheme using no further approximations. Our scheme works for arbitrary band structures and coarse grids and is guaranteed to be thermodynamically consistent. Similar to Scharfetter–Gummel, it leads to a diagonally dominant Jacobian (M-matrix) for the discrete continuity equation preserving its excellent stability properties. An implementation of the algorithm is available online via Zenodo under the MIT license. It has already been used in a 2D device simulation at 4K where it exhibited excellent stability at a negligible runtime penalty.
{"title":"Thermodynamically consistent stabilization of the drift-diffusion model for arbitrary band structures and carrier statistics","authors":"Tobias Linn, Max Renner, Christoph Jungemann","doi":"10.1007/s10825-025-02412-4","DOIUrl":"10.1007/s10825-025-02412-4","url":null,"abstract":"<div><p>To this day, the drift-diffusion model remains the most widely applied semiconductor simulation tool. This is due to its unrivaled numerical robustness when it is discretized with the finite volume method and the Scharfetter–Gummel stabilization. Unfortunately, this stabilization is only valid for nondegenerate carrier statistics. Several extensions of the Scharfetter–Gummel scheme to degenerate semiconductors have been proposed; however, they either rely on additional approximations or lack the stability for a full-scale device simulation. In this paper, we address this issue and present a generalization of the Scharfetter–Gummel scheme using no further approximations. Our scheme works for arbitrary band structures and coarse grids and is guaranteed to be thermodynamically consistent. Similar to Scharfetter–Gummel, it leads to a diagonally dominant Jacobian (M-matrix) for the discrete continuity equation preserving its excellent stability properties. An implementation of the algorithm is available online via Zenodo under the MIT license. It has already been used in a 2D device simulation at 4K where it exhibited excellent stability at a negligible runtime penalty.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10825-025-02412-4.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145021652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Traditional analytical models derived for Si logic devices fail to estimate the threshold voltage (VTH) of vertical junctionless GaN power Fin-channel metal oxide semiconductor field effect transistors (VJ GaN Fin-MOSFETs). Solving two-dimensional Poisson’s equation inside the drift region of VJ GaN Fin- MOSFETs is not a viable option as of now. Thus, we report an alternate methodology to derive the analytical model for estimating the VTH of VJ GaN Fin-MOSFETs. The proposed model uses an available baseline model followed by adding tuning parameters to the baseline model via a standard procedure. The proposed model faithfully predicts the effect of crucial geometrical and bias parameters on VTH; along with estimating the drain induced barrier lowering effect. The proposed methodology is generic in nature; it can be applied to other (ultra)wide bandgap semiconductor based VJ power MOSFETs that are currently under extensive investigation.
传统的Si逻辑器件解析模型无法估计垂直无结GaN功率Fin-channel金属氧化物半导体场效应晶体管(VJ GaN fin - mosfet)的阈值电压(VTH)。在VJ GaN - mosfet的漂移区域内求解二维泊松方程目前还不是一个可行的选择。因此,我们报告了一种替代方法来推导用于估计VJ GaN fin - mosfet的VTH的分析模型。建议的模型使用可用的基线模型,然后通过标准过程向基线模型添加调优参数。该模型忠实地预测了关键几何参数和偏置参数对VTH的影响;同时估计了排水引起的屏障降低效果。建议的方法是通用的;它可以应用于目前正在广泛研究的其他(超)宽带隙半导体的VJ功率mosfet。
{"title":"On estimating the threshold voltage of vertical junctionless GaN power fin-MOSFETs","authors":"Smriti Singh, Ankita Mukherjee, Aasim Ashai, Tanmoy Pramanik, Biplab Sarkar","doi":"10.1007/s10825-025-02406-2","DOIUrl":"10.1007/s10825-025-02406-2","url":null,"abstract":"<div><p>Traditional analytical models derived for Si logic devices fail to estimate the threshold voltage (<i>V</i><sub><i>TH</i></sub>) of vertical junctionless GaN power Fin-channel metal oxide semiconductor field effect transistors (VJ GaN Fin-MOSFETs). Solving two-dimensional Poisson’s equation inside the drift region of VJ GaN Fin- MOSFETs is not a viable option as of now. Thus, we report an alternate methodology to derive the analytical model for estimating the <i>V</i><sub><i>TH</i></sub> of VJ GaN Fin-MOSFETs. The proposed model uses an available baseline model followed by adding tuning parameters to the baseline model via a standard procedure. The proposed model faithfully predicts the effect of crucial geometrical and bias parameters on <i>V</i><sub><i>TH</i></sub>; along with estimating the drain induced barrier lowering effect. The proposed methodology is generic in nature; it can be applied to other (ultra)wide bandgap semiconductor based VJ power MOSFETs that are currently under extensive investigation.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145005500","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-08-31DOI: 10.1007/s10825-025-02413-3
Nigar Berna Teşneli, Fehmi Sandıkçı
We present the design and analysis of a polarization-insensitive, angular stable, conformal, miniaturized stopband frequency selective surface (FSS) for fifth-generation (5G), n258 (26 GHz) band electromagnetic (EM) shielding applications. The unit cell of the FSS comprises a basic square-loop resonator with four stub arms placed on inside of each edge. The optimized FSS resonates at 26.02 GHz, with a bandwidth (BW) of 7.43 GHz (21.96–29.39 GHz), effectively covering the desired 5G n258 band. The presented FSS exhibits a stable frequency response, enabling a well BW stability merit across a wide range of incidence angles, from 0° to 80°, for both transverse electric (TE) and transverse magnetic (TM) polarizations. Due to the thin-profile flexible substrate, FSS provides a high conformity and maintains a stable transmission response up to 180° conformal angle. To validate the simulation results, an equivalent circuit model was determined, and measurements were performed on a manufactured prototype of the FSS. And good agreement is observed between the full wave and equivalent circuit simulations, and measurement results. Finally, the novel FSS is proposed as a potential candidate for n258 band electromagnetic interference (EMI) shielding, owing to its presented advantages.
{"title":"A conformal miniaturized frequency selective surface with high angular stability for EMI shielding in 5G n258 band applications","authors":"Nigar Berna Teşneli, Fehmi Sandıkçı","doi":"10.1007/s10825-025-02413-3","DOIUrl":"10.1007/s10825-025-02413-3","url":null,"abstract":"<div><p>We present the design and analysis of a polarization-insensitive, angular stable, conformal, miniaturized stopband frequency selective surface (FSS) for fifth-generation (5G), n258 (26 GHz) band electromagnetic (EM) shielding applications. The unit cell of the FSS comprises a basic square-loop resonator with four stub arms placed on inside of each edge. The optimized FSS resonates at 26.02 GHz, with a bandwidth (BW) of 7.43 GHz (21.96–29.39 GHz), effectively covering the desired 5G n258 band. The presented FSS exhibits a stable frequency response, enabling a well BW stability merit across a wide range of incidence angles, from 0° to 80°, for both transverse electric (TE) and transverse magnetic (TM) polarizations. Due to the thin-profile flexible substrate, FSS provides a high conformity and maintains a stable transmission response up to 180° conformal angle. To validate the simulation results, an equivalent circuit model was determined, and measurements were performed on a manufactured prototype of the FSS. And good agreement is observed between the full wave and equivalent circuit simulations, and measurement results. Finally, the novel FSS is proposed as a potential candidate for n258 band electromagnetic interference (EMI) shielding, owing to its presented advantages.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 5","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144920539","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-08-28DOI: 10.1007/s10825-025-02398-z
Valmir Ganiu, Dirk Schulz
As interest in advanced nanodevices grows, incorporating interband coupling effects becomes crucial for obtaining accurate and physically meaningful results when analyzing transport phenomena. This study presents a novel approach that combines the multi-band envelope function model with the discontinuous Galerkin method, resulting in an efficient algorithm tailored for simulating interband kinetics. Our method achieves a relative (L^infty) error that is (40;)% lower than traditional finite difference schemes while maintaining comparable runtime. Furthermore, numerical experiments confirm the improved convergence behavior of the proposed algorithm, particularly for simulations of resonant interband tunneling diodes.
随着人们对先进纳米器件的兴趣日益浓厚,在分析输运现象时,考虑带间耦合效应对于获得准确和有物理意义的结果至关重要。本研究提出了一种将多波段包络函数模型与不连续伽辽金方法相结合的新方法,从而产生了一种适合于模拟带间动力学的高效算法。我们的方法实现了相对(L^infty)误差,即 (40;)% lower than traditional finite difference schemes while maintaining comparable runtime. Furthermore, numerical experiments confirm the improved convergence behavior of the proposed algorithm, particularly for simulations of resonant interband tunneling diodes.
{"title":"Efficient quantum transport simulations in nanodevices using multi-band discontinuous Galerkin methods","authors":"Valmir Ganiu, Dirk Schulz","doi":"10.1007/s10825-025-02398-z","DOIUrl":"10.1007/s10825-025-02398-z","url":null,"abstract":"<div><p>As interest in advanced nanodevices grows, incorporating interband coupling effects becomes crucial for obtaining accurate and physically meaningful results when analyzing transport phenomena. This study presents a novel approach that combines the multi-band envelope function model with the discontinuous Galerkin method, resulting in an efficient algorithm tailored for simulating interband kinetics. Our method achieves a relative <span>(L^infty)</span> error that is <span>(40;)</span>% lower than traditional finite difference schemes while maintaining comparable runtime. Furthermore, numerical experiments confirm the improved convergence behavior of the proposed algorithm, particularly for simulations of resonant interband tunneling diodes.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 5","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-08-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10825-025-02398-z.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144914827","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-08-28DOI: 10.1007/s10825-025-02407-1
H. Rahimi
In this paper, according to the Beer–Lambert law, we present a numerical investigation of wave attenuation in one-dimensional photonic crystals composed of SiO2/ZrO2, TiO2/MgF2, Si/Al2O3 and Nb2O5/CYTOP bilayers deposited on polycarbonate. The wave attenuation characteristics are quantitatively evaluated through optical density (OD) measurements. The simulations were performed using the transfer matrix method implemented in MATLAB for both TE and TM polarizations. The results demonstrate a strong correlation between refractive index contrast (Δn) and photonic bandgap characteristics, where higher Δn values yield broader bandgaps and enhanced attenuation. The numerical analysis reveals that both incidence angle and layer thickness significantly influence the photonic bandgap characteristics, where increasing the angle causes a blue-shift in the bandgap position according to Bragg's law, while varying the layer thickness enables precise tuning of the bandgap width. Significantly, the Si/Al2O3 structure achieves the widest bandgap (1200–1950 nm) and highest optical density (OD = 11.5), while the Nb2O5/CYTOP configuration shows good performance (OD = 10) with potential for flexible photonic devices. Polarization-dependent analysis show that TE waves maintain consistent attenuation at oblique incidence, in contrast to TM waves which show pronounced attenuation loss near Brewster's angle. These findings provide fundamental insights into material selection and structural design for optimizing photonic crystal performance.
{"title":"Wave attenuation based on Beer-Lambert law in SiO2/ZrO2, TiO2/MgF2, Si/Al2O3 and Nb2O5/CYTOP one-dimensional photonic crystals","authors":"H. Rahimi","doi":"10.1007/s10825-025-02407-1","DOIUrl":"10.1007/s10825-025-02407-1","url":null,"abstract":"<div><p>In this paper, according to the Beer–Lambert law, we present a numerical investigation of wave attenuation in one-dimensional photonic crystals composed of SiO<sub>2</sub>/ZrO<sub>2</sub>, TiO<sub>2</sub>/MgF<sub>2</sub>, Si/Al<sub>2</sub>O<sub>3</sub> and Nb<sub>2</sub>O<sub>5</sub>/CYTOP bilayers deposited on polycarbonate. The wave attenuation characteristics are quantitatively evaluated through optical density (OD) measurements. The simulations were performed using the transfer matrix method implemented in MATLAB for both TE and TM polarizations. The results demonstrate a strong correlation between refractive index contrast (Δn) and photonic bandgap characteristics, where higher Δn values yield broader bandgaps and enhanced attenuation. The numerical analysis reveals that both incidence angle and layer thickness significantly influence the photonic bandgap characteristics, where increasing the angle causes a blue-shift in the bandgap position according to Bragg's law, while varying the layer thickness enables precise tuning of the bandgap width. Significantly, the Si/Al<sub>2</sub>O<sub>3</sub> structure achieves the widest bandgap (1200–1950 nm) and highest optical density (OD = 11.5), while the Nb<sub>2</sub>O<sub>5</sub>/CYTOP configuration shows good performance (OD = 10) with potential for flexible photonic devices. Polarization-dependent analysis show that TE waves maintain consistent attenuation at oblique incidence, in contrast to TM waves which show pronounced attenuation loss near Brewster's angle. These findings provide fundamental insights into material selection and structural design for optimizing photonic crystal performance.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 5","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-08-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144914828","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-08-25DOI: 10.1007/s10825-025-02408-0
Vineet Sharma, Mayank Anand, Lokendra Singh
This work presents the design and simulation of all-optical logic gates using microring (MR) resonator structures for integrated photonic applications. Ring resonators (RR) offer wavelength-selective filtering through resonance, enabling them to perform logic operations by controlling the coupling and interference of optical signals. The proposed structure consists of an MR coupled to dual straight bus waveguides in an add-drop configuration. Binary logic is implemented by analyzing the output optical intensity under varying input conditions, using specific threshold values to distinguish logic states. For both the logic gates, output intensity equal to or greater than 50% is considered logic ‘1’. Simulation results confirm that the MR structure accurately performs logic functions based on the constructive or destructive interference of the input signals within the resonator. Logical outputs are derived by comparing the transmitted optical power at the drop port against the defined thresholds. The device exhibits a compact footprint, and a fast response time, making it suitable for integration into photonic circuits. The implementation does not require any external tuning mechanisms, such as thermal or electro-optic control; the system still relies on sufficient optical input power to achieve nonlinear behavior. This work emphasizes the feasibility of using RR-based designs for compact, reconfigurable, and high-speed optical computing elements. It provides a foundation for future developments in all-optical integrated logic systems.
{"title":"Threshold-controlled and compact microring resonator-based all-optical logic gates for photonic integration","authors":"Vineet Sharma, Mayank Anand, Lokendra Singh","doi":"10.1007/s10825-025-02408-0","DOIUrl":"10.1007/s10825-025-02408-0","url":null,"abstract":"<div><p>This work presents the design and simulation of all-optical logic gates using microring (MR) resonator structures for integrated photonic applications. Ring resonators (RR) offer wavelength-selective filtering through resonance, enabling them to perform logic operations by controlling the coupling and interference of optical signals. The proposed structure consists of an MR coupled to dual straight bus waveguides in an add-drop configuration. Binary logic is implemented by analyzing the output optical intensity under varying input conditions, using specific threshold values to distinguish logic states. For both the logic gates, output intensity equal to or greater than 50% is considered logic ‘1’. Simulation results confirm that the MR structure accurately performs logic functions based on the constructive or destructive interference of the input signals within the resonator. Logical outputs are derived by comparing the transmitted optical power at the drop port against the defined thresholds. The device exhibits a compact footprint, and a fast response time, making it suitable for integration into photonic circuits. The implementation does not require any external tuning mechanisms, such as thermal or electro-optic control; the system still relies on sufficient optical input power to achieve nonlinear behavior. This work emphasizes the feasibility of using RR-based designs for compact, reconfigurable, and high-speed optical computing elements. It provides a foundation for future developments in all-optical integrated logic systems.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 5","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144897078","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-08-22DOI: 10.1007/s10825-025-02401-7
Abderrahmane Elmelouky, Hairch Youssef, Kholood A. Dahlous, Mohammad Shahidul Islam, Nivedita Acharjee, Mohammed Salah, Ahmed Mohamed Tawfeek
In this study, we present impedance spectroscopy measurements on Zn–Al layered double hydroxides (LDH) with chloride (Cl−) as the interlayer anion and a Zn/Al molar ratio of 2:1. Electrical properties, including conductivity, modulus, and dielectric permittivity, were examined over a temperature range of 298–363 K and a frequency (F) range of 200 Hz to 1 MHz. Our findings indicate that electrode polarization significantly influences the relaxation processes within the material. Peaks observed in the imaginary components of permittivity and modulus suggest the presence of relaxing dipoles, with these peaks shifting to higher frequencies as temperature increases, implying a reduction in relaxation time. The AC conductivity generally adheres to Jonscher’s universal power law, with minor deviations. The distinct activation energies obtained confirm that the transport mechanism in this compound is not governed by simple hopping. To further elucidate the conduction mechanism, we applied the non-overlapping small polaron tunneling model, which provides a quantum mechanical framework for understanding the AC conductivity and its F dependence. These findings contribute to a deeper understanding of the electrical behavior of LDH materials, which can be crucial for optimizing their performance in applications such as energy storage, electronics, and potentially in the development of advanced materials for solar cells.
{"title":"Exploring dielectric relaxation and AC conductivity of layered double hydroxides","authors":"Abderrahmane Elmelouky, Hairch Youssef, Kholood A. Dahlous, Mohammad Shahidul Islam, Nivedita Acharjee, Mohammed Salah, Ahmed Mohamed Tawfeek","doi":"10.1007/s10825-025-02401-7","DOIUrl":"10.1007/s10825-025-02401-7","url":null,"abstract":"<div><p>In this study, we present impedance spectroscopy measurements on Zn–Al layered double hydroxides (LDH) with chloride (Cl<sup>−</sup>) as the interlayer anion and a Zn/Al molar ratio of 2:1. Electrical properties, including conductivity, modulus, and dielectric permittivity, were examined over a temperature range of 298–363 K and a frequency (F) range of 200 Hz to 1 MHz. Our findings indicate that electrode polarization significantly influences the relaxation processes within the material. Peaks observed in the imaginary components of permittivity and modulus suggest the presence of relaxing dipoles, with these peaks shifting to higher frequencies as temperature increases, implying a reduction in relaxation time. The AC conductivity generally adheres to Jonscher’s universal power law, with minor deviations. The distinct activation energies obtained confirm that the transport mechanism in this compound is not governed by simple hopping. To further elucidate the conduction mechanism, we applied the non-overlapping small polaron tunneling model, which provides a quantum mechanical framework for understanding the AC conductivity and its F dependence. These findings contribute to a deeper understanding of the electrical behavior of LDH materials, which can be crucial for optimizing their performance in applications such as energy storage, electronics, and potentially in the development of advanced materials for solar cells.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 5","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144891492","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-08-18DOI: 10.1007/s10825-025-02402-6
Sayani Ghosh, Priyajit Mukherjee, Hafizur Rahaman
In this work, a novel drain-side lateral heterojunction architecture is proposed to effectively suppress ambipolar conduction in tunnel FETs (TFETs). The proposed lateral heterojunction features a large bandgap GaAsP pocket on the drain side, forming a heterojunction at the channel/drain junction of the TFET. Since large bandgap materials exhibit a lower band-to-band tunneling rate, the GaAsP drain pocket efficiently reduces ambipolarity in both Si and non-Si-TFETs. Furthermore, well-calibrated device simulation results show that the proposed GaAsP drain pocket TFET with optimized pocket length provides superior performance in terms of reduced ambipolarity compared to conventional TFETs and TFETs with other possible structural modifications at the channel/drain interface using GaAsP. It is well known that both ambipolar behavior and capacitance values play a critical role for the successful operation of TFET-based high-speed logic circuits. Therefore, the impact of the GaAsP drain pocket on capacitance and intrinsic time delay is also critically evaluated.
{"title":"Suppression of ambipolarity without compromising delay using drain-side lateral heterojunction for future TFETs","authors":"Sayani Ghosh, Priyajit Mukherjee, Hafizur Rahaman","doi":"10.1007/s10825-025-02402-6","DOIUrl":"10.1007/s10825-025-02402-6","url":null,"abstract":"<div><p>In this work, a novel drain-side lateral heterojunction architecture is proposed to effectively suppress ambipolar conduction in tunnel FETs (TFETs). The proposed lateral heterojunction features a large bandgap GaAsP pocket on the drain side, forming a heterojunction at the channel/drain junction of the TFET. Since large bandgap materials exhibit a lower band-to-band tunneling rate, the GaAsP drain pocket efficiently reduces ambipolarity in both Si and non-Si-TFETs. Furthermore, well-calibrated device simulation results show that the proposed GaAsP drain pocket TFET with optimized pocket length provides superior performance in terms of reduced ambipolarity compared to conventional TFETs and TFETs with other possible structural modifications at the channel/drain interface using GaAsP. It is well known that both ambipolar behavior and capacitance values play a critical role for the successful operation of TFET-based high-speed logic circuits. Therefore, the impact of the GaAsP drain pocket on capacitance and intrinsic time delay is also critically evaluated.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"24 5","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144868628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}