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Robust and Energy-Efficient Fault-Tolerant n x n Vedic Multiplier Design using quantum-dot cellular automata (QCA) 基于量子点元胞自动机(QCA)的稳健节能容错n × n Vedic乘法器设计
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-05 DOI: 10.1007/s10825-025-02478-0
R. Saranya, B. Paulchamy

Quantum cellular automata (QCAs) are a promising alternative to traditional CMOS technology due to their lower power consumption and ability to function at the nanoscale. However, challenges such as fault tolerance and energy efficiency remain, especially for arithmetic circuits like multipliers. The Vedic multiplier, known for its reduced computational complexity, presents a valuable opportunity to address these issues. By implementing fault-tolerant mechanisms within the QCA architecture, we aim to improve the reliability and performance of n x n multipliers in critical applications, such as cryptography, signal processing, and neural network accelerators. The proposed Vedic multiplier is designed using a hybrid of Urdhva Tiryakbhyam Sutra (vertical and crosswise technique) and error-correcting QCA gates to ensure fault tolerance. The design is implemented in a hierarchical manner, utilizing optimized QCA logic gates to form the partial product generation and summation stages. Error detection and correction techniques, such as cellular redundancy and parity-based correction, are embedded within the architecture to ensure resilience against cell misalignment and tunneling errors. Power consumption is minimized by optimizing the layout to reduce wire crossings and cell interactions. The energy efficiency and fault tolerance of the design are evaluated using QCADesigner. Simulation results demonstrate that the proposed Vedic multiplier achieves a 30% reduction in power consumption compared to conventional QCA multiplier designs. Fault tolerance is improved, with the system being able to detect and correct up to 95% of single-cell faults during operation. The delay is minimized by 20%, ensuring high-speed performance. Additionally, the energy dissipation per computation is found to be 8.5 aJ (attojoules), making the design highly energy efficient for nanoscale applications. The proposed Robust and Energy-Efficient Fault-Tolerant n x n Vedic Multiplier offers significant improvements in power efficiency and fault tolerance, making it ideal for next-generation QCA-based systems. The Vedic multiplier's inherent simplicity, combined with advanced error correction mechanisms, enables reliable and high-performance multiplication operations at the nanoscale. These results highlight the potential of QCA for applications requiring energy-efficient and fault-resilient computing systems, such as cryptography, machine learning, and low-power IoT devices.

量子元胞自动机(QCAs)具有较低的功耗和在纳米尺度上运行的能力,是传统CMOS技术的一个有前途的替代品。然而,诸如容错和能源效率等挑战仍然存在,特别是对于像乘法器这样的算术电路。吠陀乘数以其降低的计算复杂性而闻名,为解决这些问题提供了一个宝贵的机会。通过在QCA架构中实现容错机制,我们的目标是提高关键应用(如密码学、信号处理和神经网络加速器)中n × n乘法器的可靠性和性能。所提出的吠陀乘数是使用《乌达法》(纵向和横向技术)和纠错QCA门的混合设计的,以确保容错性。该设计以分层方式实现,利用优化的QCA逻辑门形成部分产品生成和求和阶段。错误检测和纠正技术,如蜂窝冗余和基于奇偶校验的纠正,被嵌入到体系结构中,以确保对蜂窝不对齐和隧道错误的弹性。通过优化布局以减少导线交叉和单元相互作用,将功耗降至最低。利用qcaddesigner对设计的能效和容错性进行了评价。仿真结果表明,与传统的QCA乘法器设计相比,所提出的吠陀乘法器的功耗降低了30%。容错性得到了提高,系统能够在运行过程中检测并纠正高达95%的单细胞故障。延迟减少20%,确保高速性能。此外,每次计算的能量耗散为8.5 aJ(阿焦耳),使得该设计在纳米级应用中具有很高的能效。所提出的稳健节能的n × n Vedic乘法器在功率效率和容错性方面有显着改进,使其成为下一代基于qca的系统的理想选择。吠陀乘数固有的简单性,加上先进的纠错机制,使可靠和高性能的纳米级乘法运算成为可能。这些结果突出了QCA在需要节能和故障弹性计算系统的应用中的潜力,例如密码学,机器学习和低功耗物联网设备。
{"title":"Robust and Energy-Efficient Fault-Tolerant n x n Vedic Multiplier Design using quantum-dot cellular automata (QCA)","authors":"R. Saranya,&nbsp;B. Paulchamy","doi":"10.1007/s10825-025-02478-0","DOIUrl":"10.1007/s10825-025-02478-0","url":null,"abstract":"<div><p>Quantum cellular automata (QCAs) are a promising alternative to traditional CMOS technology due to their lower power consumption and ability to function at the nanoscale. However, challenges such as fault tolerance and energy efficiency remain, especially for arithmetic circuits like multipliers. The Vedic multiplier, known for its reduced computational complexity, presents a valuable opportunity to address these issues. By implementing fault-tolerant mechanisms within the QCA architecture, we aim to improve the reliability and performance of n x n multipliers in critical applications, such as cryptography, signal processing, and neural network accelerators. The proposed Vedic multiplier is designed using a hybrid of Urdhva Tiryakbhyam Sutra (vertical and crosswise technique) and error-correcting QCA gates to ensure fault tolerance. The design is implemented in a hierarchical manner, utilizing optimized QCA logic gates to form the partial product generation and summation stages. Error detection and correction techniques, such as cellular redundancy and parity-based correction, are embedded within the architecture to ensure resilience against cell misalignment and tunneling errors. Power consumption is minimized by optimizing the layout to reduce wire crossings and cell interactions. The energy efficiency and fault tolerance of the design are evaluated using QCADesigner. Simulation results demonstrate that the proposed Vedic multiplier achieves a 30% reduction in power consumption compared to conventional QCA multiplier designs. Fault tolerance is improved, with the system being able to detect and correct up to 95% of single-cell faults during operation. The delay is minimized by 20%, ensuring high-speed performance. Additionally, the energy dissipation per computation is found to be 8.5 aJ (attojoules), making the design highly energy efficient for nanoscale applications. The proposed Robust and Energy-Efficient Fault-Tolerant n x n Vedic Multiplier offers significant improvements in power efficiency and fault tolerance, making it ideal for next-generation QCA-based systems. The Vedic multiplier's inherent simplicity, combined with advanced error correction mechanisms, enables reliable and high-performance multiplication operations at the nanoscale. These results highlight the potential of QCA for applications requiring energy-efficient and fault-resilient computing systems, such as cryptography, machine learning, and low-power IoT devices.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-01-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145930114","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Broadband high-temperature metamaterial absorber and thermal emitter composed of fractal geometry 由分形几何结构组成的宽带高温超材料吸收体和热辐射体
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-04 DOI: 10.1007/s10825-025-02480-6
Khaled Aliqab, Ammar Armghan, Spyridon Nektatios Daskalakis, Meshari Alsharari

Fractal structures are natural patterns that repeat themselves. They have several unique features that make them ideal for solar energy absorption and sensing applications. In this study, we present a high-performance, polarization insensitive solar absorber comprises of a nickel (Ni)-made hash-shaped fractal geometry develop over a thin layer of gallium-doped zinc oxide (GZO) features a high absorption rate that covers the visible and near-infrared wavelengths of the spectrum. The results show that broadband aggregative absorptivity of 92% is attained between 380 nm and 3850 nm attributed to remarkable localized surface plasmon resonance (LSPR) induced by the periodic array of Ni nano-resonators and surface plasmon resonance (SPR) at the interface of GZO-SiO2 layers. Further, the absorptivity remains above 90% from 670 nm to 3850 nm over a bandwidth of 3180 nm. With the utility of high-temperature resilient materials in the developed metamaterial structure, it shows potential for the thermal applications; as the results indicate the maximum heat radiation efficiency is 92.88% at 1600 K. Aside from that, we provide insight into the broadband high solar light capturing characteristics of the proposed device with the support of surface current density and electric field distribution study at the selective wavelengths. Furthermore, the device’s parametric study revealed a minor impact on its absorptivity/emissivity characteristics while also suggesting its robustness, which could be useful in device manufacture process. The overall benefits of the proposed device show its potential for high-temperature solar energy harvesting applications and solar thermophotovoltaic (STPV) cells.

分形结构是自我重复的自然模式。它们有几个独特的特点,使它们成为太阳能吸收和传感应用的理想选择。在本研究中,我们提出了一种高性能、偏振不敏感的太阳能吸收器,该吸收器由镍(Ni)制成的散列形分形几何结构组成,覆盖在掺镓氧化锌(GZO)的薄层上,具有高吸收率,覆盖光谱的可见光和近红外波长。结果表明,在380 ~ 3850 nm之间,由于Ni纳米谐振器的周期性阵列和表面等离子体共振(SPR)在GZO-SiO2层的界面处引起了显著的局域表面等离子体共振(LSPR),使得GZO-SiO2层的宽带聚集吸收率达到92%。此外,在3180 nm的带宽范围内,从670 nm到3850 nm的吸收率保持在90%以上。随着高温弹性材料在发达的超材料结构中的应用,它显示出热应用的潜力;结果表明,在1600 K时,热辐射效率最高,达到92.88%。除此之外,我们还在选择波长的表面电流密度和电场分布研究的支持下,深入了解了所提出器件的宽带高太阳光捕获特性。此外,该器件的参数研究显示其吸收/发射率特性的影响较小,同时也表明其稳健性,这可能在器件制造过程中有用。该装置的整体优势显示了其在高温太阳能收集应用和太阳能热光伏(STPV)电池方面的潜力。
{"title":"Broadband high-temperature metamaterial absorber and thermal emitter composed of fractal geometry","authors":"Khaled Aliqab,&nbsp;Ammar Armghan,&nbsp;Spyridon Nektatios Daskalakis,&nbsp;Meshari Alsharari","doi":"10.1007/s10825-025-02480-6","DOIUrl":"10.1007/s10825-025-02480-6","url":null,"abstract":"<div><p>Fractal structures are natural patterns that repeat themselves. They have several unique features that make them ideal for solar energy absorption and sensing applications. In this study, we present a high-performance, polarization insensitive solar absorber comprises of a nickel (Ni)-made hash-shaped fractal geometry develop over a thin layer of gallium-doped zinc oxide (GZO) features a high absorption rate that covers the visible and near-infrared wavelengths of the spectrum. The results show that broadband aggregative absorptivity of 92% is attained between 380 nm and 3850 nm attributed to remarkable localized surface plasmon resonance (LSPR) induced by the periodic array of Ni nano-resonators and surface plasmon resonance (SPR) at the interface of GZO-SiO<sub>2</sub> layers. Further, the absorptivity remains above 90% from 670 nm to 3850 nm over a bandwidth of 3180 nm. With the utility of high-temperature resilient materials in the developed metamaterial structure, it shows potential for the thermal applications; as the results indicate the maximum heat radiation efficiency is 92.88% at 1600 K. Aside from that, we provide insight into the broadband high solar light capturing characteristics of the proposed device with the support of surface current density and electric field distribution study at the selective wavelengths. Furthermore, the device’s parametric study revealed a minor impact on its absorptivity/emissivity characteristics while also suggesting its robustness, which could be useful in device manufacture process. The overall benefits of the proposed device show its potential for high-temperature solar energy harvesting applications and solar thermophotovoltaic (STPV) cells.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145929727","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimum design and finite element method simulation for a high-g in-plane silicon MEMS accelerometer 高加速度面内硅MEMS加速度计的优化设计与有限元仿真
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-27 DOI: 10.1007/s10825-025-02464-6
Zhanshe Guo, Zhipeng Song, Zhaojun Guo

An in-plane high-g microelectromechanical systems (MEMS) accelerometer is designed for ultra-large acceleration measurements. The proposed device is a piezoresistive MEMS accelerometer, in which piezoresistors are employed as signal transduction elements. Unlike conventional cantilever-beam-supported structures, the proof mass is supported by four suspended thin plates to enhance structural stiffness and reliability under high-g shock loading. The sensing structure is bonded to the substrate using bonding technology. The accelerometer adopts an in-plane sensing configuration, where the applied acceleration is perpendicular to the surface of the proof mass. This configuration effectively avoids large shear stresses at the bonding interface under extreme acceleration, thereby improving the mechanical robustness and service life of the device in high-g applications. Four piezoresistors are symmetrically fabricated at the roots of the suspended thin plates to convert structural deformation into resistance variations. The feasibility of the proposed design is validated through theoretical analysis and finite element method (FEM) simulations, and an optimal structural design is obtained. Simulation results indicate that the measurement range of the accelerometer can reach 100,000 g, while the overload resistance can reach 200,000 g. The optimized dimensions include a proof mass side length of 1000(mu m), suspended thin plates with a length of 600(mu m) and a width of 320(mu m), a structural thickness of 80(mu m), and a gap of 5(mu m)between the lower surface of the structure and the substrate. The results demonstrate that the proposed accelerometer is suitable for high-g acceleration measurement applications

设计了一种平面内高加速度微机电系统(MEMS)加速度计,用于超大加速度测量。所提出的器件是一种压阻式MEMS加速度计,其中压阻器被用作信号转导元件。与传统的悬臂梁支撑结构不同,证明质量由四个悬浮薄板支撑,以提高结构刚度和高g冲击载荷下的可靠性。传感结构采用键合技术与衬底键合。加速度计采用平面内传感配置,其中施加的加速度垂直于证明质量的表面。这种结构有效地避免了极端加速度下粘接界面处的大剪切应力,从而提高了器件在高g应用中的机械稳健性和使用寿命。在悬置薄板的根部对称地制作四个压敏电阻,将结构变形转化为电阻变化。通过理论分析和有限元仿真,验证了设计的可行性,得到了最优结构设计方案。仿真结果表明,加速度计的测量范围可达10万g,抗过载能力可达20万g。优化后的尺寸包括证明质量边长为1000 (mu m),悬薄板长度为600 (mu m),宽度为320 (mu m),结构厚度为80 (mu m),结构下表面与基板之间的间隙为5 (mu m)。结果表明,所设计的加速度计适用于高加速度测量应用
{"title":"Optimum design and finite element method simulation for a high-g in-plane silicon MEMS accelerometer","authors":"Zhanshe Guo,&nbsp;Zhipeng Song,&nbsp;Zhaojun Guo","doi":"10.1007/s10825-025-02464-6","DOIUrl":"10.1007/s10825-025-02464-6","url":null,"abstract":"<div><p>An in-plane high-g microelectromechanical systems (MEMS) accelerometer is designed for ultra-large acceleration measurements. The proposed device is a piezoresistive MEMS accelerometer, in which piezoresistors are employed as signal transduction elements. Unlike conventional cantilever-beam-supported structures, the proof mass is supported by four suspended thin plates to enhance structural stiffness and reliability under high-g shock loading. The sensing structure is bonded to the substrate using bonding technology. The accelerometer adopts an in-plane sensing configuration, where the applied acceleration is perpendicular to the surface of the proof mass. This configuration effectively avoids large shear stresses at the bonding interface under extreme acceleration, thereby improving the mechanical robustness and service life of the device in high-g applications. Four piezoresistors are symmetrically fabricated at the roots of the suspended thin plates to convert structural deformation into resistance variations. The feasibility of the proposed design is validated through theoretical analysis and finite element method (FEM) simulations, and an optimal structural design is obtained. Simulation results indicate that the measurement range of the accelerometer can reach 100,000 g, while the overload resistance can reach 200,000 g. The optimized dimensions include a proof mass side length of 1000<span>(mu m)</span>, suspended thin plates with a length of 600<span>(mu m)</span> and a width of 320<span>(mu m)</span>, a structural thickness of 80<span>(mu m)</span>, and a gap of 5<span>(mu m)</span>between the lower surface of the structure and the substrate. The results demonstrate that the proposed accelerometer is suitable for high-g acceleration measurement applications</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145831341","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Mathematical approach to photonic analysis of Ag-doped HfO₂ for antireflective and intermediate reflective applications in planar a-Si solar cells 平面a-Si太阳能电池中掺银HfO 2抗反射和中间反射光子分析的数学方法
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-24 DOI: 10.1007/s10825-025-02474-4
P. Uthayakumar, K. Kathiresan, M. Ismail Fathima, S. K. Logesh

We study (Ag:HfO₂), designed to act simultaneously as an antireflective coating (ARC) and an intermediate reflective layer (IRL) in planar amorphous silicon (a-Si) solar cells. The optical behavior is analyzed using Scilab-based simulations with the Transfer Matrix Method (TMM), enabling precise modeling of light propagation and interference within multilayer structures. Silver incorporation modifies the HfO₂ permittivity via free-carrier effects described by the Drude model, producing epsilon-near-zero (ENZ) conditions and regions with negative permittivity. These properties enhance light trapping and absorption by minimizing front surface reflection and boosting internal reflection at the rear interface. The proposed planar approach improves optical absorption and internal quantum efficiency (IQE) without requiring complex nanostructures, offering a scalable, fabrication-compatible strategy for high-efficiency thin-film solar cells.

我们研究了在平面非晶硅(a-Si)太阳能电池中同时作为抗反射涂层(ARC)和中间反射层(IRL)的(Ag:HfO₂)。利用基于scilab的传输矩阵法(TMM)模拟分析了光学行为,实现了多层结构内光传播和干涉的精确建模。通过Drude模型描述的自由载流子效应,银的掺入改变了HfO₂的介电常数,产生了负介电常数的ENZ条件和区域。这些特性通过减少前表面反射和增强后界面的内部反射来增强光捕获和吸收。提出的平面方法提高了光吸收和内部量子效率(IQE),而不需要复杂的纳米结构,为高效薄膜太阳能电池提供了可扩展的、制造兼容的策略。
{"title":"Mathematical approach to photonic analysis of Ag-doped HfO₂ for antireflective and intermediate reflective applications in planar a-Si solar cells","authors":"P. Uthayakumar,&nbsp;K. Kathiresan,&nbsp;M. Ismail Fathima,&nbsp;S. K. Logesh","doi":"10.1007/s10825-025-02474-4","DOIUrl":"10.1007/s10825-025-02474-4","url":null,"abstract":"<div><p>We study (Ag:HfO₂), designed to act simultaneously as an antireflective coating (ARC) and an intermediate reflective layer (IRL) in planar amorphous silicon (a-Si) solar cells. The optical behavior is analyzed using Scilab-based simulations with the Transfer Matrix Method (TMM), enabling precise modeling of light propagation and interference within multilayer structures. Silver incorporation modifies the HfO₂ permittivity via free-carrier effects described by the Drude model, producing epsilon-near-zero (ENZ) conditions and regions with negative permittivity. These properties enhance light trapping and absorption by minimizing front surface reflection and boosting internal reflection at the rear interface. The proposed planar approach improves optical absorption and internal quantum efficiency (IQE) without requiring complex nanostructures, offering a scalable, fabrication-compatible strategy for high-efficiency thin-film solar cells.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145831455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of photonic crystal fiber-based plasmonic sensor for diabetes detection 用于糖尿病检测的光子晶体光纤等离子体传感器设计
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-23 DOI: 10.1007/s10825-025-02475-3
Vishal Chaudhary, Sonal Singh

This research presents a surface plasmon resonance (SPR) sensor based on photonic crystal fiber (PCF), specifically designed for the detection of diabetes. Gold is used as the plasmonic material in a layered configuration to enhance sensor performance. The proposed design is analyzed using the finite element method (FEM) to assess its capability in identifying diabetes-related variations. The PCF structure features two rings of air holes organized in a hexagonal pattern, with a thin layer of gold plating applied to enable SPR excitation. SPR occurs when the surface plasmon polariton (SPP) mode and the fundamental core mode interact under phase-matching conditions. Diabetes-specific samples, characterized by distinct refractive indices (RI), are filled into the fiber. Variations in RI cause shifts in the SPR resonance wavelength observed through confinement loss analysis. The resonance shift between normal and diabetic samples reflects their differing RI values. The sensor attains a sensitivity of 2400 nm/RIU, based on these spectral shifts. With its straightforward sensing mechanism, the proposed PCF-based SPR sensor offers a practical, economical approach to diabetes diagnosis.

本研究提出了一种基于光子晶体光纤(PCF)的表面等离子体共振(SPR)传感器,专门用于糖尿病的检测。在层状结构中使用金作为等离子体材料来提高传感器的性能。采用有限元法(FEM)对提出的设计进行分析,以评估其识别糖尿病相关变异的能力。PCF结构的特点是有两个六角形的气孔环,并有一层薄薄的镀金层用于SPR激发。当表面等离激元(SPP)模式与基核模式在相位匹配条件下相互作用时,会产生SPR。以不同的折射率(RI)为特征的糖尿病特异性样品被填充到纤维中。通过约束损耗分析观察到,RI的变化引起SPR共振波长的位移。正常和糖尿病样本之间的共振位移反映了它们不同的RI值。基于这些光谱位移,传感器的灵敏度达到2400 nm/RIU。基于pcf的SPR传感器具有直观的传感机制,为糖尿病诊断提供了一种实用、经济的方法。
{"title":"Design of photonic crystal fiber-based plasmonic sensor for diabetes detection","authors":"Vishal Chaudhary,&nbsp;Sonal Singh","doi":"10.1007/s10825-025-02475-3","DOIUrl":"10.1007/s10825-025-02475-3","url":null,"abstract":"<div><p>This research presents a surface plasmon resonance (SPR) sensor based on photonic crystal fiber (PCF), specifically designed for the detection of diabetes. Gold is used as the plasmonic material in a layered configuration to enhance sensor performance. The proposed design is analyzed using the finite element method (FEM) to assess its capability in identifying diabetes-related variations. The PCF structure features two rings of air holes organized in a hexagonal pattern, with a thin layer of gold plating applied to enable SPR excitation. SPR occurs when the surface plasmon polariton (SPP) mode and the fundamental core mode interact under phase-matching conditions. Diabetes-specific samples, characterized by distinct refractive indices (RI), are filled into the fiber. Variations in RI cause shifts in the SPR resonance wavelength observed through confinement loss analysis. The resonance shift between normal and diabetic samples reflects their differing RI values. The sensor attains a sensitivity of 2400 nm/RIU, based on these spectral shifts. With its straightforward sensing mechanism, the proposed PCF-based SPR sensor offers a practical, economical approach to diabetes diagnosis.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145831312","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A novel low barrier Schottky contact super barrier rectifier structure for improving single-event gate rupture tolerance 一种新型低势垒肖特基接触超势垒整流器结构,可提高单事件栅极的抗破裂能力
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-21 DOI: 10.1007/s10825-025-02477-1
Qisheng Yu, Wensuo Chen, Jiaweiwen Huang, Zhigang Shen, Aohang Zhang, Jian Li

A novel structure of Low Barrier Schottky contact Super Barrier Rectifier (LB-SSBR) is proposed by introducing a partial SiGe region in the device’s anode side, creating a low electron-barrier structure. This low-barrier structure ensures that LB-SSBR can appropriately thicken the oxide layer without affecting the forward conduction characteristics, thereby improving the Single Event Gate Rupture (SEGR) tolerance. The TCAD simulation results show that, under the condition of no increase in reverse leakage current, the SEGR tolerance of LB-SSBR is significantly stronger than that of conventional SSBR. When heavy ions are incident from the most sensitive position of the device, the maximum electric field inside the oxide layer of LB-SSBR is 7.22 MV/cm, which is 46.08% lower than that of SSBR. Additionally, there is also a certain degree of improvement in both forward conduction and reverse recovery characteristics. The forward conduction voltage of LB-SSBR has decreased by 13.44%, and the reverse recovery charge of LB-SSBR has reduced by 38.34% compared to SSBR. In addition, the existing molecular-beam epitaxy (MBE) process can achieve the epitaxy of SiGe on Si substrate, making it convenient to prepare LB-SSBR structures.

提出了一种低势垒肖特基接触超级势垒整流器(LB-SSBR)的新结构,通过在器件的阳极侧引入部分SiGe区域,形成低电子势垒结构。这种低势垒结构确保LB-SSBR可以在不影响正向传导特性的情况下适当增厚氧化层,从而提高单事件门破裂(SEGR)耐受性。TCAD仿真结果表明,在不增加反漏电流的情况下,LB-SSBR的SEGR容限明显强于传统SSBR。当重离子从器件最敏感位置入射时,LB-SSBR氧化层内的最大电场为7.22 MV/cm,比SSBR低46.08%。此外,在正向传导和反向恢复特性方面也有一定程度的改善。与SSBR相比,LB-SSBR的正向导通电压降低了13.44%,反向恢复电荷降低了38.34%。此外,现有的分子束外延(MBE)工艺可以实现SiGe在Si衬底上的外延,方便了LB-SSBR结构的制备。
{"title":"A novel low barrier Schottky contact super barrier rectifier structure for improving single-event gate rupture tolerance","authors":"Qisheng Yu,&nbsp;Wensuo Chen,&nbsp;Jiaweiwen Huang,&nbsp;Zhigang Shen,&nbsp;Aohang Zhang,&nbsp;Jian Li","doi":"10.1007/s10825-025-02477-1","DOIUrl":"10.1007/s10825-025-02477-1","url":null,"abstract":"<div><p>A novel structure of Low Barrier Schottky contact Super Barrier Rectifier (LB-SSBR) is proposed by introducing a partial SiGe region in the device’s anode side, creating a low electron-barrier structure. This low-barrier structure ensures that LB-SSBR can appropriately thicken the oxide layer without affecting the forward conduction characteristics, thereby improving the Single Event Gate Rupture (SEGR) tolerance. The TCAD simulation results show that, under the condition of no increase in reverse leakage current, the SEGR tolerance of LB-SSBR is significantly stronger than that of conventional SSBR. When heavy ions are incident from the most sensitive position of the device, the maximum electric field inside the oxide layer of LB-SSBR is 7.22 MV/cm, which is 46.08% lower than that of SSBR. Additionally, there is also a certain degree of improvement in both forward conduction and reverse recovery characteristics. The forward conduction voltage of LB-SSBR has decreased by 13.44%, and the reverse recovery charge of LB-SSBR has reduced by 38.34% compared to SSBR. In addition, the existing molecular-beam epitaxy (MBE) process can achieve the epitaxy of SiGe on Si substrate, making it convenient to prepare LB-SSBR structures.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145831064","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Machine learning-driven predictive modeling of natural frequency and displacement in perforated diaphragms for enhanced structural analysis 机器学习驱动的穿孔隔膜固有频率和位移预测模型,用于增强结构分析
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-20 DOI: 10.1007/s10825-025-02467-3
Fikret Yıldız, Erhan Kavuncuoğlu

Displacement and naturel frequency are the most important design parameters for diaphragms based microelectromechanical system (MEMS) pressure sensors. For nonconventional diaphragm design of MEMS devices, finite element method (FEM)-based analysis to obtain these two parameters requires quite long time and cost as compared to conventional diaphragm design including circular, square, and rectangular shape. Thus, one major disadvantage of FEM is the excessive time required for simulation. Machine learning (ML) algorithms might be an alternative approach to FEM analysis. ML algorithms, which is an easier, functional, and time and cost saving, might provide rapid prediction of essential information comprising displacement and naturel frequency of MEMS diaphragm design with accurate and reliable results. In this study, ML algorithms including XGBoost regressor, LightGBM regressor, CatBoost regressor, and TabNet regressor were used to estimate displacement (µm) and frequency (Hz) of perforated low temperature co-fired ceramic (LTCC) diaphragms using 200 FEM-based numerical results. Predicted results were compared by considering R2, MAE, RMSE, and MAPE metric. According to these results, best performance was obtained by CatBoost regressor with the values of R2 = 0.927 and R2 = 0.995 for the displacement and frequency prediction, respectively. It was realized that CatBoost strikes an exceptional balance between computational efficiency and predictive performance, while LightGBM emerges as a strong alternative for scenarios prioritizing speed and memory efficiency. As a result, it was concluded that ML algorithms might be a useful, cost, and time effective tools for rapid analysis of displacement and naturel frequency of perforated diaphragms without requiring FEM analysis.

位移和固有频率是基于膜片的微机电系统(MEMS)压力传感器最重要的设计参数。对于MEMS器件的非常规膜片设计,与传统的圆形、方形和矩形膜片设计相比,基于有限元法(FEM)的分析获得这两个参数需要相当长的时间和成本。因此,有限元法的一个主要缺点是模拟所需的时间过多。机器学习(ML)算法可能是有限元分析的一种替代方法。ML算法简单、实用、节省时间和成本,可以快速预测MEMS膜片设计的位移和固有频率等基本信息,结果准确可靠。在这项研究中,使用ML算法,包括XGBoost回归器、LightGBM回归器、CatBoost回归器和TabNet回归器,利用200个基于fem的数值结果估计穿孔低温共烧陶瓷(LTCC)隔膜的位移(µm)和频率(Hz)。通过考虑R2、MAE、RMSE和MAPE指标对预测结果进行比较。综上所示,CatBoost回归量对位移和频率的预测效果最好,其R2 = 0.927, R2 = 0.995。CatBoost在计算效率和预测性能之间取得了卓越的平衡,而LightGBM则成为优先考虑速度和内存效率的方案的强大替代方案。因此,我们得出结论,ML算法可能是一种有用的、成本和时间有效的工具,可以快速分析穿孔隔膜的位移和固有频率,而无需FEM分析。
{"title":"Machine learning-driven predictive modeling of natural frequency and displacement in perforated diaphragms for enhanced structural analysis","authors":"Fikret Yıldız,&nbsp;Erhan Kavuncuoğlu","doi":"10.1007/s10825-025-02467-3","DOIUrl":"10.1007/s10825-025-02467-3","url":null,"abstract":"<div><p>Displacement and naturel frequency are the most important design parameters for diaphragms based microelectromechanical system (MEMS) pressure sensors. For nonconventional diaphragm design of MEMS devices, finite element method (FEM)-based analysis to obtain these two parameters requires quite long time and cost as compared to conventional diaphragm design including circular, square, and rectangular shape. Thus, one major disadvantage of FEM is the excessive time required for simulation. Machine learning (ML) algorithms might be an alternative approach to FEM analysis. ML algorithms, which is an easier, functional, and time and cost saving, might provide rapid prediction of essential information comprising displacement and naturel frequency of MEMS diaphragm design with accurate and reliable results. In this study, ML algorithms including XGBoost regressor, LightGBM regressor, CatBoost regressor, and TabNet regressor were used to estimate displacement (µm) and frequency (Hz) of perforated low temperature co-fired ceramic (LTCC) diaphragms using 200 FEM-based numerical results. Predicted results were compared by considering <i>R</i><sup>2</sup>, MAE, RMSE, and MAPE metric. According to these results, best performance was obtained by CatBoost regressor with the values of <i>R</i><sup>2</sup> = 0.927 and <i>R</i><sup>2</sup> = 0.995 for the displacement and frequency prediction, respectively. It was realized that CatBoost strikes an exceptional balance between computational efficiency and predictive performance, while LightGBM emerges as a strong alternative for scenarios prioritizing speed and memory efficiency. As a result, it was concluded that ML algorithms might be a useful, cost, and time effective tools for rapid analysis of displacement and naturel frequency of perforated diaphragms without requiring FEM analysis.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145830961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of an energy-efficient XOR gate in QCA with applications in reversible logic-based one-bit comparator and ALU QCA中节能异或门的设计及其在可逆逻辑位比较器和ALU中的应用
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-19 DOI: 10.1007/s10825-025-02470-8
H. Mangalam, P. Rajasekar, V. Sakthivel

A Quantum Dot Cellular Automata (QCA) is a nanotechnology-driven computing method that leverages quantum mechanical principles. This work demonstrates the efficient use of reversible logic gates in QCA-based systems, a crucial aspect of scalable and energy-efficient computer designs. In this research, we propose an energy-efficient, compact XOR gate and several common reversible logic gates. The paper further illustrates the use of these gates to construct essential components, such as a one-bit comparator and an arithmetic logic unit (ALU). The ALU, designed with Feynman and Toffoli gates, is capable of performing eight arithmetic and logical operations. We conduct a comprehensive evaluation of cell complexity, area efficiency, delay, area-delay product (ADP), and energy dissipation. Additionally, we compare the characteristics of the proposed circuits with prior efforts to highlight advancements and identify areas for further improvement in reversible computing paradigms. The recommended architecture enhances the performance of the XOR gate, reversible logic gates, one-bit comparator, and ALU. The XOR gate achieves a 67.86% reduction in cell complexity, an 85% improvement in area efficiency, and a 50% reduction in quantum cost. Feynman and Toffoli gates demonstrate a 75% reduction in area and an 87.5% reduction in quantum cost. For the one-bit comparator and ALU, the proposed solution reduces area by 87% and latency by 40%, saving both space and time. With a quantum cost that is 90% lower than traditional designs, the proposed architecture optimizes quantum circuits for real-world applications.

量子点元胞自动机(QCA)是一种利用量子力学原理的纳米技术驱动的计算方法。这项工作证明了可逆逻辑门在基于qca的系统中的有效使用,这是可扩展和节能计算机设计的关键方面。在这项研究中,我们提出了一个节能,紧凑的异或门和几个常见的可逆逻辑门。本文进一步说明了使用这些门来构造基本组件,如一位比较器和算术逻辑单元(ALU)。该ALU采用费曼门和托佛利门设计,能够执行8种算术和逻辑运算。我们对单元复杂度、面积效率、延迟、区域延迟积(ADP)和能量耗散进行了全面的评估。此外,我们将所提出的电路的特性与先前的努力进行比较,以突出进展并确定可逆计算范式中进一步改进的领域。推荐的架构增强了异或门、可逆逻辑门、一位比较器和ALU的性能。该异或门降低了67.86%的单元复杂度,提高了85%的面积效率,降低了50%的量子成本。费曼门和托佛利门的面积减少了75%,量子成本减少了87.5%。对于1位比较器和ALU,提出的解决方案减少了87%的面积和40%的延迟,节省了空间和时间。由于量子成本比传统设计低90%,所提出的架构优化了实际应用的量子电路。
{"title":"Design of an energy-efficient XOR gate in QCA with applications in reversible logic-based one-bit comparator and ALU","authors":"H. Mangalam,&nbsp;P. Rajasekar,&nbsp;V. Sakthivel","doi":"10.1007/s10825-025-02470-8","DOIUrl":"10.1007/s10825-025-02470-8","url":null,"abstract":"<div><p>A Quantum Dot Cellular Automata (QCA) is a nanotechnology-driven computing method that leverages quantum mechanical principles. This work demonstrates the efficient use of reversible logic gates in QCA-based systems, a crucial aspect of scalable and energy-efficient computer designs. In this research, we propose an energy-efficient, compact XOR gate and several common reversible logic gates. The paper further illustrates the use of these gates to construct essential components, such as a one-bit comparator and an arithmetic logic unit (ALU). The ALU, designed with Feynman and Toffoli gates, is capable of performing eight arithmetic and logical operations. We conduct a comprehensive evaluation of cell complexity, area efficiency, delay, area-delay product (ADP), and energy dissipation. Additionally, we compare the characteristics of the proposed circuits with prior efforts to highlight advancements and identify areas for further improvement in reversible computing paradigms. The recommended architecture enhances the performance of the XOR gate, reversible logic gates, one-bit comparator, and ALU. The XOR gate achieves a 67.86% reduction in cell complexity, an 85% improvement in area efficiency, and a 50% reduction in quantum cost. Feynman and Toffoli gates demonstrate a 75% reduction in area and an 87.5% reduction in quantum cost. For the one-bit comparator and ALU, the proposed solution reduces area by 87% and latency by 40%, saving both space and time. With a quantum cost that is 90% lower than traditional designs, the proposed architecture optimizes quantum circuits for real-world applications.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145778682","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Scaling impact and performance evaluation of DIB-TreeFET for sub-3 nm digital applications sub- 3nm数字应用中DIB-TreeFET的缩放影响和性能评估
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-19 DOI: 10.1007/s10825-025-02471-7
S. Mounika, Umakanta Nanda

This study investigates the scaling behavior of the Dual Interbridge Tree-shaped Nanosheet FET (DIB-TreeFET) for sub-3 nm digital logic applications. Device-level simulations using Sentaurus TCAD explore the effects of varying interbridge thickness ((IB_{T})) from 10 nm to 30 nm and nanosheet thickness ((N_{T})) from 3 to 9 nm, while keeping other parameters constant. Increasing (IB_{T}) results in a 1.71 times improvement in (I_{ON}), and similarly, increasing (N_{T}) from 3 nm to 5 nm results in an enhancement in (I_{ON}) of about 1.58 times. However, both parameters also contribute to less pronounced threshold voltage roll-off, indicating stronger short-channel effects. Optimal device performance is observed at (IB_{T}) as 20 nm and (N_{T}) as 5 nm. A CMOS inverter built with this configuration is evaluated under varying VDD, load capacitance (10–1000 aF), and input frequency (1–50 GHz). Key metrics, including propagation delay, power-delay product (PDP), and energy-delay product (EDP), are assessed. A tradeoff point at VDD=0.575 V offers balanced performance. At VDD=0.7 V, the inverter achieves noise margins of 0.29 V ((NM_{H})) and 0.32 V ((NM_{L})), with a voltage gain of 9.98, demonstrating its suitability for ultra-scaled low-power logic applications.

本研究研究了用于sub- 3nm数字逻辑应用的双桥树形纳米场效应管(DIB-TreeFET)的缩放行为。使用Sentaurus TCAD进行器件级模拟,探索在保持其他参数不变的情况下,桥间厚度((IB_{T}))从10 nm到30 nm和纳米片厚度((N_{T}))从3到9 nm变化的影响。增加(IB_{T})会使(I_{ON})的性能提高1.71倍,同样地,将(N_{T})从3nm提高到5nm会使(I_{ON})的性能提高约1.58倍。然而,这两个参数也有助于较不明显的阈值电压滚降,表明更强的短通道效应。在(IB_{T})为20 nm和(N_{T})为5 nm时,器件性能最佳。用这种配置构建的CMOS逆变器在不同的VDD、负载电容(10-1000 aF)和输入频率(1-50 GHz)下进行了评估。评估了关键指标,包括传播延迟、功率延迟积(PDP)和能量延迟积(EDP)。VDD=0.575 V的折衷点提供平衡的性能。在VDD=0.7 V时,逆变器实现了0.29 V ((NM_{H}))和0.32 V ((NM_{L}))的噪声裕度,电压增益为9.98,证明了其适用于超大规模低功耗逻辑应用。
{"title":"Scaling impact and performance evaluation of DIB-TreeFET for sub-3 nm digital applications","authors":"S. Mounika,&nbsp;Umakanta Nanda","doi":"10.1007/s10825-025-02471-7","DOIUrl":"10.1007/s10825-025-02471-7","url":null,"abstract":"<div><p>This study investigates the scaling behavior of the Dual Interbridge Tree-shaped Nanosheet FET (DIB-TreeFET) for sub-3 nm digital logic applications. Device-level simulations using Sentaurus TCAD explore the effects of varying interbridge thickness (<span>(IB_{T})</span>) from 10 nm to 30 nm and nanosheet thickness (<span>(N_{T})</span>) from 3 to 9 nm, while keeping other parameters constant. Increasing <span>(IB_{T})</span> results in a 1.71 times improvement in <span>(I_{ON})</span>, and similarly, increasing <span>(N_{T})</span> from 3 nm to 5 nm results in an enhancement in <span>(I_{ON})</span> of about 1.58 times. However, both parameters also contribute to less pronounced threshold voltage roll-off, indicating stronger short-channel effects. Optimal device performance is observed at <span>(IB_{T})</span> as 20 nm and <span>(N_{T})</span> as 5 nm. A CMOS inverter built with this configuration is evaluated under varying V<sub>DD</sub>, load capacitance (10–1000 aF), and input frequency (1–50 GHz). Key metrics, including propagation delay, power-delay product (PDP), and energy-delay product (EDP), are assessed. A tradeoff point at V<sub>DD</sub>=0.575 V offers balanced performance. At V<sub>DD</sub>=0.7 V, the inverter achieves noise margins of 0.29 V (<span>(NM_{H})</span>) and 0.32 V (<span>(NM_{L})</span>), with a voltage gain of 9.98, demonstrating its suitability for ultra-scaled low-power logic applications.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145778683","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A review of MEMS microphone capabilities 回顾MEMS麦克风的功能
IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-16 DOI: 10.1007/s10825-025-02468-2
Rama Kant Sharma, Mahanth Prasad

Acoustic sensing applications are being actively explored across a wide range of fields, including consumer electronics, biomedical devices, industrial applications, space technology, and military-grade equipment. In the past, the electret condenser microphone (ECM) was the primary technology used for sound detection. However, advancements in micro-electro-mechanical systems (MEMS) acoustic sensors have transformed the landscape. With the stabilization of MEMS manufacturing processes, these sensors are now increasingly integrated into mobile phones, wearable devices, Bluetooth headsets, hearing aids, digital cameras, automotive voice control systems, and environmental monitoring equipment. Developing silicon MEMS acoustic sensors may seem straightforward, but it involves addressing a range of complex and inherent challenges. This paper provides a comprehensive overview of the materials and technologies involved in the development of MEMS acoustic sensors. We discuss various sensing mechanisms, including piezoresistive, capacitive, piezoelectric, triboelectric, optical, and Spin-MEMS technologies. Additionally, we outline the design techniques used in sensor development. Furthermore, we explore AI-based methods to improve sensor sensitivity and examine the operational parameters of commercial MEMS microphones.

声传感在消费电子、生物医学设备、工业应用、空间技术和军用级装备等广泛领域的应用正在积极探索。在过去,驻极体电容传声器(ECM)是用于声音探测的主要技术。然而,微机电系统(MEMS)声学传感器的进步已经改变了这一格局。随着MEMS制造工艺的稳定,这些传感器现在越来越多地集成到移动电话、可穿戴设备、蓝牙耳机、助听器、数码相机、汽车语音控制系统和环境监测设备中。开发硅MEMS声学传感器似乎很简单,但它涉及解决一系列复杂和固有的挑战。本文对MEMS声学传感器的材料和技术进行了全面的综述。我们讨论了各种传感机制,包括压阻、电容、压电、摩擦电、光学和自旋mems技术。此外,我们概述了传感器开发中使用的设计技术。此外,我们探索基于人工智能的方法来提高传感器灵敏度,并检查商用MEMS麦克风的工作参数。
{"title":"A review of MEMS microphone capabilities","authors":"Rama Kant Sharma,&nbsp;Mahanth Prasad","doi":"10.1007/s10825-025-02468-2","DOIUrl":"10.1007/s10825-025-02468-2","url":null,"abstract":"<div><p>Acoustic sensing applications are being actively explored across a wide range of fields, including consumer electronics, biomedical devices, industrial applications, space technology, and military-grade equipment. In the past, the electret condenser microphone (ECM) was the primary technology used for sound detection. However, advancements in micro-electro-mechanical systems (MEMS) acoustic sensors have transformed the landscape. With the stabilization of MEMS manufacturing processes, these sensors are now increasingly integrated into mobile phones, wearable devices, Bluetooth headsets, hearing aids, digital cameras, automotive voice control systems, and environmental monitoring equipment. Developing silicon MEMS acoustic sensors may seem straightforward, but it involves addressing a range of complex and inherent challenges. This paper provides a comprehensive overview of the materials and technologies involved in the development of MEMS acoustic sensors. We discuss various sensing mechanisms, including piezoresistive, capacitive, piezoelectric, triboelectric, optical, and Spin-MEMS technologies. Additionally, we outline the design techniques used in sensor development. Furthermore, we explore AI-based methods to improve sensor sensitivity and examine the operational parameters of commercial MEMS microphones.</p></div>","PeriodicalId":620,"journal":{"name":"Journal of Computational Electronics","volume":"25 1","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145778798","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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Journal of Computational Electronics
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