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2019 20th International Conference on Electronic Packaging Technology(ICEPT)最新文献

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Stress optimization study about heterogeneous multi-chip structure in Fan-out Wafer Level Package Young-in, Republic of Korea 扇出晶圆级封装中异质多芯片结构的应力优化研究
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245750
Cheong-Ha Jung, Won Seo, Gu-sung Kim
The IEEE Heterogeneous Integration Roadmap Symposium, held in 2018, emphasized the importance of integrating diverse components into a SiP and presented the challenges for SiP reliability. One of the problems in the reliability is a CTE(Coefficient of Thermal Expansion) mismatch between various CTE of heterogeneous materials. This mismatch issue can easily understand when we analysis a warpage in the package structure. Unlike traditional packages, FOWLP has the advantage that the substrate can be removed to achieve a thinner thickness and the thermal and electrical properties are superior to conventional packages. However, it is vulnerable to warpage due to its thin thickness and there is a problem with reliability due to cracks caused by the stress concentration of the solderball. So, to perform SiP multi-chip package with FOWLP, it is necessary to study stress-induced optimization. And we will study this through computer simulations and present guidelines.In this paper, we present an optimization solution by performing the stress analysis with the package area effect of the multi-chip FOWLP structure. In the analysis, the finite element modeling was performed on a 20X20 mm2 package approximately 200,000 elements and 90,000 nodes, simulating the Post Mold Cure of FOWLP. Because of changing the chip size, height and package / chip area ratio in order to understand the effect of the multi-chip on the package, it was confirmed that the larger the size difference among the multi chips in the package, the larger the warpage occurs. as the size of the chip became larger, the stress distribution became larger at the edge of the chip, and it was also confirmed that the larger the height difference between the multi chips, the larger the warpage occurred.
2018年举行的IEEE异构集成路线图研讨会强调了将不同组件集成到SiP中的重要性,并提出了SiP可靠性面临的挑战。非均质材料的热膨胀系数(CTE)不匹配是影响可靠性的主要问题之一。当我们分析包结构中的翘曲时,可以很容易地理解这种不匹配问题。与传统封装不同,FOWLP的优点是可以去除基板以实现更薄的厚度,并且热学和电学性能优于传统封装。然而,由于其厚度薄,它很容易变形,并且由于焊球的应力集中引起的裂纹,存在可靠性问题。因此,为了实现基于FOWLP的SiP多芯片封装,有必要进行应力诱导优化研究。我们将通过计算机模拟来研究这个问题,并提出指导方针。本文通过对多芯片FOWLP结构的封装面积效应进行应力分析,提出了一种优化方案。在分析中,对一个20 × 20 mm2的约20万个元件和9万个节点的封装进行了有限元建模,模拟了FOWLP的模后固化过程。为了了解多芯片对封装的影响,通过改变芯片尺寸、高度和封装/芯片面积比,证实了封装中多芯片之间的尺寸差异越大,翘曲就越大。随着芯片尺寸的增大,芯片边缘处的应力分布也随之增大,同时也证实了多芯片之间的高度差越大,发生翘曲的程度也越大。
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引用次数: 0
Investigation on thermal stress of bondline based on Cu@Sn preform at high temperature application 基于Cu@Sn预制体的粘结线高温热应力研究
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245109
Hongyan Xu, P. Ning, Libing Zheng, Ju Xu, Shuting Zhang
This paper is devoted to study the thermal stress of a novel bondline based on Cu@Sn preform and analyze the failure mode of solder joint and SiC module. The 2D simplified model of chip-DBC substrate was created, according to the stress evaluating equations, the interfacial peel stress of chip-solder and solder-substrate was numerically calculated, and the stress distribution was imitated by ANSYS software, the results revealed that the peel stress mostly concentrated on the corners of the joint, and decreased with increased joint thickness, the peel stress could be negligible when joint thickness was greater than 50μm. Compared to the high-lead alloy system and sinter nano-silver system, the three-dimensional network structure bondline based on Cu@Sn possessed the minimum tensile stress (3MPa) and compress stress (15MPa). The multi-layer model of SiC module was built to study the influence of bondline layer thickness variation on module reliability, the result indicated that the chip stress was little dependent on the soldering layer thick, and the module stress bonded by the novel bondline was slightly larger than that of high lead system and sintered Ag system. The favorable thick bondline based on Cu@Sn preform was experimentally proved to have better mechanical strength. Shearing strength of the joint at room temperature was up to 49.5MPa, thermal cycling from -70 to 200 for 100cycles, there was no crack available on the joint, due to the pore volume got bigger, shear strength got smaller, the bondline could still function well for mechanical support.
本文研究了一种基于Cu@Sn预成形材料的新型粘结线的热应力,并分析了焊点和SiC模块的失效模式。建立了芯片- dbc衬底的二维简化模型,根据应力评估方程,对芯片-焊料和焊料-衬底的界面剥离应力进行了数值计算,并利用ANSYS软件对应力分布进行了模拟。结果表明,剥离应力主要集中在接头的边角处,且随着接头厚度的增加而减小,当接头厚度大于50μm时,剥离应力可以忽略不计。与高铅合金体系和烧结纳米银体系相比,基于Cu@Sn的三维网状结构键合线具有最小拉应力(3MPa)和压缩应力(15MPa)。建立了SiC模块多层模型,研究了结合线厚度变化对模块可靠性的影响,结果表明,芯片应力与焊接层厚度的关系不大,新型结合线结合的模块应力略大于高铅系统和烧结Ag系统的应力。实验证明,以Cu@Sn预制体为基础的良好厚粘结线具有较好的机械强度。室温下,节理抗剪强度高达49.5MPa,热循环从-70 ~ 200循环100次,节理上未出现裂纹,由于孔隙体积增大,抗剪强度减小,结合线仍能很好地发挥机械支撑作用。
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引用次数: 1
An analysis case on the crack failure of CBGA solder joints CBGA焊点裂纹失效分析案例
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245824
Weiming Li
Ceramic ball grid array (CBGA) solder joints were considered to crack after a series of environmental tests, including thermal cycling, random vibration and high temperature operational life test. In this paper, the failure analysis on the crack of ceramic ball grid array (CBGA) solder joints is revealed with the aid of 3D X-ray inspection, microsection technique, optical microscope (OM) and scanning electron microscope (SEM).The result of 3D X-ray shows that voids were found in the CBGA and no obvious cracks in joints were detected. By employing micro-section technique, micro-cracks were found in several CBGA solder joints with aid of OM and SEM. The result of micro-section of CBGA solder joints also reveals that the solder balls were made of eutectic tin-lead alloys. The OM and SEM images of cross-section of CBGA solder joints demonstrated that significant coarsening of solder structure was found near the cracks. In the CBGA solder joints, Pb-rich phase was well distributed into the Sn-rich. The size of Pb-rich phase in the crack area was larger than that in other area of the solder joints. As the size of microstructure increased, the interfaces between different phases decreased, which would weaken the mechanical structure of the solder joints, leading to crack failure eventually. It can be inferred that the crack of CBGA solder joints was related to thermal-mechanical fatigue. Generally, the thermal expansion of ceramic is much smaller than that of PCB substrate, which led to large thermal mismatch during the thermal cycling test, causing the thermal mechanical fatigue crack in the CBGA solder joints. The intermetallic compound (IMC) at the soldering interface and the shape of solder joints were also observed by SEM. The IMC showed a continuous morphology with proper thickness, and the solder joints kept a normal shape.In this paper, the cross section of plastic ball grid array (PBGA) solder joints on the same printed circuit board (PCB) were also observed by OM and SEM. However, no thermal mechanical fatigue cracks and coarsening of solder structure were found. It was due to that the coefficient of thermal expansion of PBGA substrate is similar to that of PCB substrate, and that the thermal mismatch between the PBGA and PCB was much smaller than that between the CBGA and PCB. Hence, thermal-mechanical fatigue cracks were found in CBGA solder joints, while the PBGA solder joints remained intact. This paper also reveals that the height of solder joint can significantly influent the reliability of the CBGA joints under the thermal cycling load.
对陶瓷球栅阵列(CBGA)焊点进行了热循环、随机振动和高温工作寿命等一系列环境试验,认为其存在裂纹。本文采用三维x射线检测、显微切片技术、光学显微镜和扫描电镜对陶瓷球栅阵列(CBGA)焊点裂纹进行了失效分析。三维x射线结果显示,CBGA中存在空洞,接头未发现明显裂纹。采用显微切片技术,在OM和SEM的辅助下,发现了几个CBGA焊点的微裂纹。对CBGA焊点的显微切片结果也表明,钎料球是由锡铅共晶合金制成的。CBGA焊点断面的OM和SEM图像表明,裂纹附近的焊点结构明显粗化。在CBGA焊点中,富pb相分布在富sn相中。焊点裂纹区富pb相的尺寸大于其他区域。随着微观组织尺寸的增大,不同相之间的界面减少,使焊点的力学结构变弱,最终导致裂纹失效。可以推断CBGA焊点的裂纹与热-机械疲劳有关。一般情况下,陶瓷的热膨胀比PCB基板的热膨胀小得多,导致在热循环测试中出现较大的热失配,导致CBGA焊点出现热机械疲劳裂纹。通过扫描电镜观察了焊接界面的金属间化合物(IMC)和焊点的形状。IMC形貌连续,厚度适中,焊点形状保持正常。本文还利用OM和SEM对同一块印刷电路板(PCB)上的PBGA(塑料球栅阵列)焊点的横截面进行了观察。但未发现热机械疲劳裂纹和焊料组织粗化现象。这是因为PBGA衬底的热膨胀系数与PCB衬底相似,PBGA与PCB之间的热失配要比CBGA与PCB之间的热失配小得多。因此,CBGA焊点存在热机械疲劳裂纹,而PBGA焊点保持完整。研究还表明,焊点高度对热循环载荷作用下CBGA焊点的可靠性有显著影响。
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引用次数: 0
Study on Intermittent Penetration Degradation Life Model of Metal-Glass Sealing Structure 金属-玻璃密封结构间歇性侵彻退化寿命模型研究
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245261
Xingguo Fu, Shaohua Yang, Jun Luo, Si Chen, Yun Huang, Bin Zhou
Moisture is a major environmental factor that causes airtight failure under temperature cycling conditions. Increasing ambient moisture will accelerate metal-glass airtight intermittent penetration degradation. Glass insulators produce fine cracks due to reduced strength under temperature cycling conditions.Based on the molecular flow model, the formula for calculating the relationship between leak rate and crack depth and width is obtained. It is concluded that the leak rate is proportional to the cube of the crack width and inversely proportional to the micropore depth. The theoretical calculation results are less than 10% of the measured leak rate error.The moisture content converted from the liquid water of three monolayers was calculated, and the airtight HIC metal-glass sealing intermittent degradation life model with a certain leak rate was obtained.
在温度循环条件下,湿度是导致气密失效的主要环境因素。环境湿度的增加会加速金属玻璃气密的间歇性穿透降解。玻璃绝缘子在温度循环条件下由于强度降低而产生细裂纹。基于分子流模型,得到了泄漏率与裂缝深度和宽度关系的计算公式。结果表明,泄漏率与裂缝宽度的立方成正比,与微孔深度成反比。理论计算结果小于实测泄漏率误差的10%。计算了三层单层的液态水转化成的含水率,得到了具有一定泄漏率的密闭HIC金属-玻璃密封间歇退化寿命模型。
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引用次数: 0
Effect of Structural Parameters of Substrate Integrated Waveguide on S-parameter Based on HFSS 基于HFSS的衬底集成波导结构参数对s参数的影响
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245793
Yuxiang Fu, Chunyue Huang, Chao Gao, Ying Liang
Substrate integrated waveguides (SIW) are widely used in high-speed interconnection technology and it realize high rate data transmission. In this paper, the software of HFSS is used for modeling and simulation of SIW, and the influence of SIW structure parameters on S-parameter is analyzed. Through orthogonal experimental, the main factors which affect S-parameter are obtained. The results show that S11 increases with the increase of the diameter d of the metal through-hole. S11 increases with the increase of metal through hole spacing; S11 decreases with the increase of width of SIW. Metal through hole spacing has a significant influence on S-parameter (S11), which is the main factor affecting s-parameter (S11).
衬底集成波导(SIW)广泛应用于高速互连技术,实现了高速数据传输。本文利用HFSS软件对SIW进行建模和仿真,分析了SIW结构参数对s参数的影响。通过正交试验,得出了影响s参数的主要因素。结果表明:S11随金属通孔直径d的增大而增大;S11随金属通孔间距的增大而增大;S11随SIW宽度的增加而减小。金属通孔间距对s参数(S11)有显著影响,是影响s参数(S11)的主要因素。
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引用次数: 1
Micro-dimple/pillar array molded by a track-etching mold for improving the optical performance of quantum dot film 为提高量子点薄膜的光学性能,采用轨迹刻蚀模成型微凹窝/柱阵列
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245161
Zongtao Li, Xueting Tang, Muwu Li, Binhai Yu, Yuling Hu, Xinrui Ding
Recently, phosphor films have been widely used in display, illumination and other fields. Methods of fabricating structures on phosphor films to enhance their optical properties have attracted great attention in academia and industry. Current methods to fabricate a structured film are mainly by imprinting techniques. However, crystalline silicon or a patterned sapphire substrate are applied to the transfer substrate, which is cumbersome and expensive. This paper describes a track-etching mold, prepared by bombarding a polycarbonate film (PC) with high-speed particles to form phosphor film with microporous structure, which also has a transfer effect. The process is simple and efficient. Simultaneously, the micro-pillar structure PDMS film (MPS-PDMS film) transferred by the PC film has a discrete distribution of micro-pillar structures. Their optical performance was measured and the haze was improved by 12.06% compared with the unstructured PDMS film (US-PDMS film). Subsequently, the micro-dimples structure quantum dots film (MDS-QDs film) was secondarily fabricated using the MPS-PDMS film to have a dimple structure. The red optical power of MDS-QDs film was improved by 7.7% as compared with the unstructured quantum dot film (US-QDs film). Therefore, the structural QD films shows great potential value in luminance and display.
近年来,荧光粉薄膜已广泛应用于显示、照明等领域。在荧光粉薄膜上制造结构以提高其光学性能的方法已引起学术界和工业界的广泛关注。目前制造结构薄膜的方法主要是通过压印技术。然而,晶体硅或图案蓝宝石衬底应用于转移衬底,这是麻烦和昂贵的。本文介绍了一种用高速粒子轰击聚碳酸酯薄膜(PC)形成具有微孔结构的磷光膜并具有转移效应的轨迹蚀刻模具。这个过程简单而有效。同时,PC膜转移的微柱结构PDMS膜(MPS-PDMS膜)具有离散分布的微柱结构。测量了它们的光学性能,与非结构化PDMS膜(US-PDMS膜)相比,雾度提高了12.06%。随后,利用MPS-PDMS薄膜二次制备了微窝结构量子点薄膜(MDS-QDs薄膜),使其具有窝结构。与非结构量子点薄膜(US-QDs薄膜)相比,MDS-QDs薄膜的红光功率提高了7.7%。因此,结构量子点薄膜在亮度和显示方面显示出巨大的潜在价值。
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引用次数: 0
Identification of essential factors causing solder bridging of right-angle solder interconnects in laser jet solder ball bonding process 激光喷射焊球焊接过程中造成直角焊点互连焊点桥接的主要因素分析
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245822
W. Yue, Jun-Xi Zhang, Chenggong Gong, Min-bo Zhou, Xin-Ping Zhang
Solder bridging is a commonly seen and serious processing defect in electronic packaging, which may lead to short circuit even absolute failure of electronic devices and products. Solder bridging may occur in all types of solder interconnects and in each of soldering processes during manufacturing journey, for example, in ball grid array solder interconnects and three-dimensional (3D) interconnects, as well as in wave soldering and reflow soldering assemblies. With the increasing trend of electronic products towards miniaturization and multifunction, the pitch and size of solder interconnects have been scaling down. The finer pitch and decreased size of solder joints greatly increase the difficulty of soldering process and the solder bridging defect is more likely to appear. Notably, the laser jet solder ball bonding (LJSBB) with the advantages of localized heating and higher energy inputting provides a novel soldering technology for 3D packaging, for instance, the right-angle solder interconnects and temperature-sensitive components. When fabricating the right-angle solder interconnects, the liquid solder ball is blown by the protected N2 flow and hardly stays firmly in place during the LJSBB process, thus the solder bridging occurs more often in the LJSBB process. Under such circumstances, it is necessary to identify the essential factors causing solder bridging of right-angle solder interconnects and seeking the improvement measures for mass production.In this study, the crucial factors causing solder bridging of right-angle Au/Sn-3.0Ag-0.5Cu/Au interconnects during LJSBB process have been investigated and identified. The results demonstrate that the poor wetting and the large displacement are the main reasons causing the solder bridging defect. The composition analysis and surface morphology characterization results manifest that the contamination of Au bonding pads and a thicker oxidation layer on the surface of solder balls significantly prolong the time of the metallurgical reaction between the solder and Au pads, which results in poor wetting of the molten solder and consequently the solder bridging defect. The verification experiments indicate that a large displacement obviously increases the waving probability of the liquid solder ball. Thus, the solder bridging defect occurs more easily. In addition, the impurities attached onto the nozzle can occasionally lead to the solder bridging defect in mass production.
焊接桥接是电子封装中常见且严重的加工缺陷,它可能导致电子器件和产品的短路甚至绝对失效。焊锡桥接可能发生在所有类型的焊锡互连和制造过程中的每个焊接过程中,例如,在球栅阵列焊锡互连和三维(3D)互连中,以及在波峰焊和回流焊组件中。随着电子产品向小型化和多功能化的发展趋势,焊料互连的间距和尺寸也在不断缩小。焊点间距越细,尺寸越小,焊接难度越大,更容易出现焊点桥接缺陷。值得注意的是,激光喷射焊球键合(LJSBB)具有局部加热和更高能量输入的优点,为直角焊点互连和温度敏感元件的3D封装提供了一种新的焊接技术。在制作直角焊料互连时,液态焊料球在LJSBB工艺中受到N2保护流的吹胀,很难牢固地停留在原位,因此在LJSBB工艺中焊料桥接发生的频率更高。在这种情况下,有必要找出造成直角焊料互连焊料桥接的根本因素,并寻求改进措施,以便批量生产。在本研究中,对LJSBB过程中造成直角Au/Sn-3.0Ag-0.5Cu/Au互连焊料桥接的关键因素进行了研究和确定。结果表明,润湿性差和位移大是造成焊料桥接缺陷的主要原因。成分分析和表面形貌表征结果表明,金焊盘的污染和焊球表面较厚的氧化层显著延长了焊料与金焊盘之间的冶金反应时间,导致熔融焊料润湿不良,从而导致焊料桥接缺陷。验证实验表明,较大的位移明显增加了液焊球的波动概率。因此,焊料桥接缺陷更容易发生。此外,在批量生产中,附着在喷嘴上的杂质偶尔会导致焊料桥接缺陷。
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引用次数: 2
Molecular Dynamics Simulation of Stress in AlN Thin Films on Sapphire Substrate 蓝宝石衬底AlN薄膜应力的分子动力学模拟
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245332
Libin Zhang, Ling Li, Yifan Wu, Yalun Suo, Z. Gan
In this article, we study the stress and defects of AlN on sapphire substrate by molecular dynamics. The temperatures and film thickness were varied to investigate the effect. We find that the mixing of film atoms with substrate atoms could be observed. As the temperature increases, the mixing of film atoms with the substrate atoms becomes more obvious. This is due to the increased kinetic energy of atoms as the temperature increases. Moreover, the fluctuation range of the average mean biaxial stress and the average normal stress mainly occur at the interface between AlN film and sapphire substrate. This is understandable because the lattice mismatch exits between AlN film and sapphire substrate, which inevitably leads to atom mismatch and involve defects and stress.
本文用分子动力学方法研究了蓝宝石衬底上AlN的应力和缺陷。通过改变温度和薄膜厚度来考察其效果。我们发现可以观察到薄膜原子与衬底原子的混合。随着温度的升高,薄膜原子与衬底原子的混合更加明显。这是由于原子的动能随着温度的升高而增加。平均双轴应力和平均法向应力的波动范围主要发生在AlN薄膜与蓝宝石衬底界面处。这是可以理解的,因为AlN薄膜与蓝宝石衬底之间存在晶格失配,这不可避免地导致原子失配,并涉及缺陷和应力。
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引用次数: 0
Effect of corrosion on mechanical and biological properties of nano-silver joints 腐蚀对纳米银接头力学和生物性能的影响
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245178
He Gong, Fanfan Zhao, Yao Yao
In order to explore the mechanical and biological properties of nano-silver joints in corrosive environment, two series of experiments were carried out from the mechanical and biological perspectives. For mechanical perspectives, a) Two sandwich-like gold-plated copper (3×5×10 mm)-nano-silver-gold-plated copper (3×5×10 mm) samples were corroded for 24h in 3% NaCl solution at 45.5 ℃ (heating table temperature 50℃). The microstructural evolution of corrosion products of nano-silver sintered joints were analyzed by scanning electron microscopy (SEM). b) Twenty shear specimens were divided into two groups, corroded for 0h and 24h respectively. Besides, the corrosion shear strength of sintered nano-silver joints was measured. In order to explore the effects of nano-silver on organisms after it enters the body due to corrosion, the survival rate and apoptotic morphology of hamster lung cells were measured after incubation in nutrient solution containing 150, 175 and 200 μmol/l nano-silver for 24h. Through the above tests, it is found that the shear strength of joint decreases obviously after corrosion, and the fracture mode changes from interlayer failure to interfacial fracture. Biological experiments showed that the survival rate of hamster lung cells decreased with the increase of nano-silver concentration.
为了探究纳米银接头在腐蚀环境中的力学和生物学特性,从力学和生物学的角度进行了两个系列的实验。从力学角度来看,a)在45.5℃(加热表温度50℃)的3% NaCl溶液中,将两个三明治状镀金铜(3×5×10 mm)-纳米银-镀金铜(3×5×10 mm)试样腐蚀24h。采用扫描电镜(SEM)分析了纳米银烧结接头腐蚀产物的微观组织演变过程。b) 20个剪切试件分为两组,腐蚀时间分别为0h和24h。此外,还测量了烧结纳米银接头的腐蚀抗剪强度。为探讨纳米银经腐蚀进入机体后对机体的影响,在含150、175和200 μmol/l纳米银的营养液中孵育24h后,测定了仓鼠肺细胞的存活率和凋亡形态学。通过上述试验发现,腐蚀后接头抗剪强度明显降低,断裂方式由层间断裂转变为界面断裂。生物学实验表明,随着纳米银浓度的增加,仓鼠肺细胞存活率降低。
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引用次数: 1
A High-resolution Thermoreflectance Imaging Technique based on Visible light 基于可见光的高分辨率热反射成像技术
Pub Date : 2019-08-01 DOI: 10.1109/ICEPT47577.2019.245292
Dazheng Wang, Zhuming Liu, Libing Zheng, Wei Liu
Firstly, we describe the principle and the details of our home-built visible light-based thermoreflectance imaging setup. Based on the prototype, a transient temperature measurement of a micro resistance in operation were undertaken. With this technique, a high-resolution thermal distribution of devices can be achieved in real time. The factors influencing spatial resolution, time resolution and temperature resolution of the temperature measurement were analyzed and discussed further. The analysis and results showed that the prototype, which based on a visible light-based thermoreflectance imaging technique, could achieve a spatial resolution of 663nm, a time resolution of 2μs, and a temperature resolution of 0.1K.
首先,我们描述了我们自制的可见光热反射成像装置的原理和细节。在此基础上,对运行中的微电阻进行了瞬态温度测量。利用这种技术,可以实时实现器件的高分辨率热分布。进一步分析和讨论了影响测温空间分辨率、时间分辨率和温度分辨率的因素。分析和结果表明,基于可见光热反射成像技术的样机可实现663nm的空间分辨率、2μs的时间分辨率和0.1K的温度分辨率。
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引用次数: 3
期刊
2019 20th International Conference on Electronic Packaging Technology(ICEPT)
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