首页 > 最新文献

Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)最新文献

英文 中文
Design for testability in nanometer technologies; searching for quality 纳米技术可测试性设计;寻找质量
T. Williams, R. Kapur
Today's technology allows for the creation of designs that are stressing methodologies from a time to market point of view. The industry is in a transition period where the methodologies and tools are changing to allow for reusing designs as cores. With a promise of large capacity, the miniaturization of the devices brings along new problems and changes the focus of Design for Testability (DFT) and for all the tools used in the successful manufacturing of the design. In this paper, the impact of nanometer technology on the issues associated with testing of system-on-chip (SOC) designs is discussed.
今天的技术允许从时间到市场的角度来强调方法论的设计。该行业正处于一个过渡时期,方法和工具正在发生变化,以允许将设计作为核心进行重用。随着大容量的发展,器件的小型化带来了新的问题,并改变了可测试性设计(DFT)和成功制造设计所使用的所有工具的重点。本文讨论了纳米技术对片上系统(SOC)设计测试相关问题的影响。
{"title":"Design for testability in nanometer technologies; searching for quality","authors":"T. Williams, R. Kapur","doi":"10.1109/ISQED.2000.838870","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838870","url":null,"abstract":"Today's technology allows for the creation of designs that are stressing methodologies from a time to market point of view. The industry is in a transition period where the methodologies and tools are changing to allow for reusing designs as cores. With a promise of large capacity, the miniaturization of the devices brings along new problems and changes the focus of Design for Testability (DFT) and for all the tools used in the successful manufacturing of the design. In this paper, the impact of nanometer technology on the issues associated with testing of system-on-chip (SOC) designs is discussed.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123288627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Probabilistic bottom-up RTL power estimation 概率自底向上RTL功率估计
R. Ferreira, Anne-Marie Trullemans-Anckaert, José C. Costa, J. Monteiro
We address the problem of power estimation at the register-transfer level (RTL). At this level, the circuit is described in terms of a set of interconnected memory elements and combinational modules of different degrees of complexity. We propose a bottom-up approach to create a simplified high-level model of the block behavior for power estimation, which is described by a symbolic local polynomial. We use an efficient gate-level modeling based on the polynomial simulation method and ZBDDs. We present a set of experimental results that show a large improvement in performance and robustness when compared to previous approaches.
我们解决了在寄存器-传输级(RTL)的功率估计问题。在这个层次上,电路被描述为一组相互连接的存储元件和不同复杂程度的组合模块。我们提出了一种自底向上的方法来创建一个简化的用于功率估计的块行为高级模型,该模型由符号局部多项式描述。我们使用基于多项式仿真方法和zbdd的高效门级建模。我们提出了一组实验结果,表明与以前的方法相比,性能和鲁棒性有了很大的提高。
{"title":"Probabilistic bottom-up RTL power estimation","authors":"R. Ferreira, Anne-Marie Trullemans-Anckaert, José C. Costa, J. Monteiro","doi":"10.1109/ISQED.2000.838916","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838916","url":null,"abstract":"We address the problem of power estimation at the register-transfer level (RTL). At this level, the circuit is described in terms of a set of interconnected memory elements and combinational modules of different degrees of complexity. We propose a bottom-up approach to create a simplified high-level model of the block behavior for power estimation, which is described by a symbolic local polynomial. We use an efficient gate-level modeling based on the polynomial simulation method and ZBDDs. We present a set of experimental results that show a large improvement in performance and robustness when compared to previous approaches.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128606352","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Full chip thermal simulation 全芯片热模拟
Zhiping Yu, D. Yergeau, R. Dutton, O. S. Nakagawa, N. Chang, Shen Lin, Weize Xie
A multilayer, full chip thermal analysis is presented. The design of the chip at functional-block level is directly captured by the simulator, allowing the assessment of the chip layout impact on the system performance due to the elevated operational temperature. The heat generation for each block is obtained by running the circuit-level electrical simulation separately on individual functional units. The thermal diffusion equation is then solved based on the actual structure of the chip including substrate and interconnect/insulating layers. Different thermal conductivity can be specified for each material layer. The effect of package on chip temperature distribution is modeled using thermally resistive layers as the boundary between the simulated structure and surrounding environment. Proper adjustment of the boundary thermal resistance results in the correct range of simulated temperature distribution as compared to the measured data. Both physics and implementation for the thermal simulation are described. The code is applied to the analysis of a realistic design of a CPU chip made of SOI technology with up to six metal interconnect layers. A comprehensive review of the simulation results is presented.
提出了一种多层全芯片热分析方法。芯片在功能模块级的设计由模拟器直接捕获,允许评估芯片布局对系统性能的影响,因为工作温度升高。通过在单个功能单元上分别运行电路级电气仿真,可以获得每个块的发热量。然后根据芯片的实际结构(包括衬底和互连层/绝缘层)求解热扩散方程。每个材料层可指定不同的导热系数。采用热阻层作为模拟结构与周围环境的边界,模拟了封装对芯片温度分布的影响。对边界热阻进行适当的调整,可以使模拟温度分布的范围与实测数据相一致。描述了热模拟的物理和实现。该代码应用于分析一个由SOI技术制成的具有多达六层金属互连层的CPU芯片的实际设计。对模拟结果进行了全面的回顾。
{"title":"Full chip thermal simulation","authors":"Zhiping Yu, D. Yergeau, R. Dutton, O. S. Nakagawa, N. Chang, Shen Lin, Weize Xie","doi":"10.1109/ISQED.2000.838867","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838867","url":null,"abstract":"A multilayer, full chip thermal analysis is presented. The design of the chip at functional-block level is directly captured by the simulator, allowing the assessment of the chip layout impact on the system performance due to the elevated operational temperature. The heat generation for each block is obtained by running the circuit-level electrical simulation separately on individual functional units. The thermal diffusion equation is then solved based on the actual structure of the chip including substrate and interconnect/insulating layers. Different thermal conductivity can be specified for each material layer. The effect of package on chip temperature distribution is modeled using thermally resistive layers as the boundary between the simulated structure and surrounding environment. Proper adjustment of the boundary thermal resistance results in the correct range of simulated temperature distribution as compared to the measured data. Both physics and implementation for the thermal simulation are described. The code is applied to the analysis of a realistic design of a CPU chip made of SOI technology with up to six metal interconnect layers. A comprehensive review of the simulation results is presented.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130046092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 29
On effective I/sub DDQ/ testing of low voltage CMOS circuits using leakage control techniques 利用漏电控制技术对低压CMOS电路进行有效I/sub DDQ/测试
Zhanping Chen, Liqiong Wei, K. Roy
The use of low threshold devices in low voltage CMOS circuits leads to an exponential increase in the intrinsic leakage current. This threatens the effectiveness of I/sub DDQ/ testing for such low voltage circuits because it is difficult to differentiate a defect-free circuit from defective circuits. Recently, several leakage control techniques have been proposed to reduce intrinsic leakage current, which may benefit I/sub DDQ/ testing. In this paper we investigate the possibilities of applying different leakage control techniques to improve the fault coverage of I/sub DDQ/ testing. Results on a large number of benchmarks indicate that dual threshold and vector control techniques are very effective in improving fault coverage for I/sub DDQ/ testing.
在低压CMOS电路中使用低阈值器件会导致本征漏电流呈指数增长。这威胁到这种低电压电路的I/sub DDQ/测试的有效性,因为很难区分无缺陷电路和有缺陷电路。近年来,人们提出了几种泄漏控制技术来降低本构泄漏电流,从而有利于I/sub DDQ/测试。在本文中,我们研究了应用不同的泄漏控制技术来提高I/sub DDQ/测试故障覆盖率的可能性。大量的基准测试结果表明,双阈值和矢量控制技术在提高I/sub DDQ/测试的故障覆盖率方面非常有效。
{"title":"On effective I/sub DDQ/ testing of low voltage CMOS circuits using leakage control techniques","authors":"Zhanping Chen, Liqiong Wei, K. Roy","doi":"10.1109/ISQED.2000.838872","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838872","url":null,"abstract":"The use of low threshold devices in low voltage CMOS circuits leads to an exponential increase in the intrinsic leakage current. This threatens the effectiveness of I/sub DDQ/ testing for such low voltage circuits because it is difficult to differentiate a defect-free circuit from defective circuits. Recently, several leakage control techniques have been proposed to reduce intrinsic leakage current, which may benefit I/sub DDQ/ testing. In this paper we investigate the possibilities of applying different leakage control techniques to improve the fault coverage of I/sub DDQ/ testing. Results on a large number of benchmarks indicate that dual threshold and vector control techniques are very effective in improving fault coverage for I/sub DDQ/ testing.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"2014 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129258691","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Project management for system-on-chip using multi-chip modules 使用多芯片模块的片上系统项目管理
D. Dent
Multi-Chip Module (MCM) projects are complex, in terms of the technology used, and are expensive, typically in excess of $50,000. MCM technology is very unforgiving in that mistakes cannot be easily rectified or the device easily re-worked. The Mosaic Earth Sensor Mutli-Chip Module (MESMCM) project, which was the subject of a case study, was a high speed, first-of-a-kind development that ran into some difficulties in spite of rigorous project management. It is intended to compare the project management structure used for a technology demonstrator with the new structure used on subsequent MCM designs. One of the outcomes of this case study was that the management of an MCM project is just as crucial as the technical aspects and resulted in several guidelines about the nature and composition of the design team. The lessons learned from the MESMCM project were applied very effectively to further MCM designs.
就所使用的技术而言,多芯片模块(MCM)项目非常复杂,而且价格昂贵,通常超过5万美元。MCM技术是非常不可原谅的,因为错误不容易纠正,设备也不容易重新加工。马赛克地球传感器多芯片模块(MESMCM)项目是一个案例研究的主题,它是一个高速的、首创的开发项目,尽管有严格的项目管理,但还是遇到了一些困难。它旨在比较用于技术演示的项目管理结构与随后MCM设计中使用的新结构。这个案例研究的结果之一是,MCM项目的管理与技术方面一样重要,并产生了一些关于设计团队的性质和组成的指导方针。从MESMCM项目中吸取的经验教训非常有效地应用于进一步的MCM设计。
{"title":"Project management for system-on-chip using multi-chip modules","authors":"D. Dent","doi":"10.1109/ISQED.2000.838884","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838884","url":null,"abstract":"Multi-Chip Module (MCM) projects are complex, in terms of the technology used, and are expensive, typically in excess of $50,000. MCM technology is very unforgiving in that mistakes cannot be easily rectified or the device easily re-worked. The Mosaic Earth Sensor Mutli-Chip Module (MESMCM) project, which was the subject of a case study, was a high speed, first-of-a-kind development that ran into some difficulties in spite of rigorous project management. It is intended to compare the project management structure used for a technology demonstrator with the new structure used on subsequent MCM designs. One of the outcomes of this case study was that the management of an MCM project is just as crucial as the technical aspects and resulted in several guidelines about the nature and composition of the design team. The lessons learned from the MESMCM project were applied very effectively to further MCM designs.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124372789","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Deep sub-micron static timing analysis in presence of crosstalk 存在串扰的深亚微米静态定时分析
P. Tehrani, S. Chyou, U. Ekambaram
A complete and accurate method for static timing analysis of deep sub-micron devices in presence of crosstalk is introduced. This scheme provides an efficient platform for fast and accurate static timing verification of large scale transistor and cell level netlists, with coupled interconnects and high switching speeds. This paper presents the solution to the crosstalk problem implemented in the static timing tool PathMill as its crosstalk extension (CTX). A comparison of simulation results between this approach and SPICE is also provided.
介绍了一种完整、准确的深亚微米器件串扰静态时序分析方法。该方案具有耦合互连和高切换速度,为大规模晶体管和小区级网络的快速准确静态定时验证提供了一个有效的平台。本文提出了一种解决静态定时工具PathMill串扰问题的方法,作为其串扰扩展(CTX)。并将该方法与SPICE的仿真结果进行了比较。
{"title":"Deep sub-micron static timing analysis in presence of crosstalk","authors":"P. Tehrani, S. Chyou, U. Ekambaram","doi":"10.1109/ISQED.2000.838937","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838937","url":null,"abstract":"A complete and accurate method for static timing analysis of deep sub-micron devices in presence of crosstalk is introduced. This scheme provides an efficient platform for fast and accurate static timing verification of large scale transistor and cell level netlists, with coupled interconnects and high switching speeds. This paper presents the solution to the crosstalk problem implemented in the static timing tool PathMill as its crosstalk extension (CTX). A comparison of simulation results between this approach and SPICE is also provided.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116627673","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 44
A reconfigurable low-power high-performance matrix multiplier design 一种可重构的低功耗高性能矩阵乘法器设计
R. Lin
A novel reconfigurable low-power high-performance matrix multiplier architecture and its component circuits are presented. The processor can be easily reconfigured to compute the product of matrices X/sub nK/ and Y/sub km/ for any integers n, k, m and any item precision b (ranging from 4 to 64 bits) thus maximizing the utilization of the hardware available. As a typical example, the hardware equivalent to one 64/spl times/64 bit high precision multiplier in the system can be directly reconfigured to produce the product of two matrices X/sub 8/spl times/8/ and Y/sub 8/spl times/8/ of 8-bit items in 9 pipeline cycles, which would require 512 multiplications (done by large multipliers) in a non-reconfigurable high precision system. Given an input stream of h/spl times/h matrix pairs with b-bit items, the processor, called matrix multiplier of size s (note s=hb), may consist of an array of (s/m)/sup 2/ of m/spl times/m small multipliers (m=4 case is illustrated), a few arrays of adders each adding three numbers, an array of accumulators and corresponding simple reconfiguration switches. To compute the product of X/sub nK/ and Y/sub km/, of item precision b on the proposed processor of size s we only need to partition X/sub nK/ and Y/sub km/ into s/b X s/b sub-matrices, reconfigure the processor according to the values of s (fixed) and b (input parameter), compute the products of submatrices, and accumulate them for the desired result in pipelined fashion. A recently proposed shift switch logic, a nonbinary logic for arithmetic circuits, is utilized in the design. The novel logic operates 4-bit state signals where no more than half of the signal bits are subject to value-change at any logic stage, which, verified by SPICE simulation, significantly reduces the large circuit power dissipation while keeping high performance in speed and small VLSI area.
提出了一种新的可重构低功耗高性能矩阵乘法器结构及其组成电路。处理器可以很容易地重新配置,以计算矩阵X/sub nK/和Y/sub km/对任何整数n, k, m和任何项目精度b(从4到64位)的乘积,从而最大限度地利用可用的硬件。作为一个典型的例子,系统中相当于一个64/spl倍/64位高精度乘法器的硬件可以直接重新配置,以在9个管道周期中产生两个矩阵X/sub 8/spl倍/8/和Y/sub 8/spl倍/8/的乘积,这将需要512次乘法(由大型乘法器完成)在不可重构的高精度系统中。给定一个带有b位项的h/spl次/h矩阵对的输入流,称为大小为s的矩阵乘法器(注s=hb),可以由一个(s/m)/sup 2/个m/spl次/m个小乘法器(说明m=4的情况)、几个加法器数组(每个加3个数字)、一个累加器数组和相应的简单重构开关组成。为了计算项目精度为b的X/sub nK/和Y/sub km/在大小为s的处理器上的乘积,我们只需要将X/sub nK/和Y/sub km/划分为s/b X s/b子矩阵,根据s(固定)和b(输入参数)的值重新配置处理器,计算子矩阵的乘积,并以流水线方式累积它们以获得期望的结果。在设计中采用了一种最近提出的移位开关逻辑,一种用于算术电路的非二进制逻辑。该新型逻辑处理4位状态信号,在任何逻辑阶段都不超过一半的信号位受到值变化的影响,SPICE仿真验证了这一点,在保持高性能速度和小VLSI面积的同时,显着降低了电路的大功耗。
{"title":"A reconfigurable low-power high-performance matrix multiplier design","authors":"R. Lin","doi":"10.1109/ISQED.2000.838891","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838891","url":null,"abstract":"A novel reconfigurable low-power high-performance matrix multiplier architecture and its component circuits are presented. The processor can be easily reconfigured to compute the product of matrices X/sub nK/ and Y/sub km/ for any integers n, k, m and any item precision b (ranging from 4 to 64 bits) thus maximizing the utilization of the hardware available. As a typical example, the hardware equivalent to one 64/spl times/64 bit high precision multiplier in the system can be directly reconfigured to produce the product of two matrices X/sub 8/spl times/8/ and Y/sub 8/spl times/8/ of 8-bit items in 9 pipeline cycles, which would require 512 multiplications (done by large multipliers) in a non-reconfigurable high precision system. Given an input stream of h/spl times/h matrix pairs with b-bit items, the processor, called matrix multiplier of size s (note s=hb), may consist of an array of (s/m)/sup 2/ of m/spl times/m small multipliers (m=4 case is illustrated), a few arrays of adders each adding three numbers, an array of accumulators and corresponding simple reconfiguration switches. To compute the product of X/sub nK/ and Y/sub km/, of item precision b on the proposed processor of size s we only need to partition X/sub nK/ and Y/sub km/ into s/b X s/b sub-matrices, reconfigure the processor according to the values of s (fixed) and b (input parameter), compute the products of submatrices, and accumulate them for the desired result in pipelined fashion. A recently proposed shift switch logic, a nonbinary logic for arithmetic circuits, is utilized in the design. The novel logic operates 4-bit state signals where no more than half of the signal bits are subject to value-change at any logic stage, which, verified by SPICE simulation, significantly reduces the large circuit power dissipation while keeping high performance in speed and small VLSI area.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123119613","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 16
Extending Moore's Law through advances in semiconductor manufacturing equipment 通过半导体制造设备的进步扩展摩尔定律
A. Sinha
Summary form only given, as follows. After more than thirty years of effectiveness, associated benefits to the electronics industry and several false alarms, it appears that Moore's Law is again threatened with derailment. These threats are in the form of a convergence of three waves which requires major necessary changes relating to: a) lithography below 0.13 /spl mu/m, which involves printing and aligning at submicron wavelength dimensions with new unproven lasers/lens systems; b) Cu/low-/spl kappa/ interconnect technology, which is facing major challenges in achieving commercially viable yields; and c) 300 mm wafer size conversion, which requires an extensive retooling of the entire industry. These enabling changes are overlaid on increasingly aggressive cost/quality requirements on the semiconductor fabs as the electronics industry evolves into the post-PC, Internet era. The author reviews some of the cutting edge work being done in the semiconductor manufacturing equipment area, including extendability/reuse of existing installed base for multiple generations, improved BKM's (Best Known Methodologies) and integrated process modules.
仅给出摘要形式,如下。经过三十多年的有效性,对电子工业的相关利益和几次假警报,摩尔定律似乎再次受到脱轨的威胁。这些威胁以三波汇聚的形式出现,需要对以下方面进行重大必要的改变:a)低于0.13 /spl mu/m的光刻,这涉及到使用未经验证的新型激光器/透镜系统在亚微米波长尺寸上进行印刷和对准;b) Cu/low-/spl kappa/互连技术,该技术在实现商业上可行的产量方面面临重大挑战;c) 300毫米晶圆尺寸转换,这需要对整个行业进行广泛的重组。随着电子行业进入后pc、互联网时代,这些有利的变化叠加在半导体晶圆厂日益激进的成本/质量要求上。作者回顾了半导体制造设备领域正在进行的一些前沿工作,包括多代现有安装基础的可扩展性/重用性,改进的BKM(最知名的方法)和集成过程模块。
{"title":"Extending Moore's Law through advances in semiconductor manufacturing equipment","authors":"A. Sinha","doi":"10.1109/ISQED.2000.838878","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838878","url":null,"abstract":"Summary form only given, as follows. After more than thirty years of effectiveness, associated benefits to the electronics industry and several false alarms, it appears that Moore's Law is again threatened with derailment. These threats are in the form of a convergence of three waves which requires major necessary changes relating to: a) lithography below 0.13 /spl mu/m, which involves printing and aligning at submicron wavelength dimensions with new unproven lasers/lens systems; b) Cu/low-/spl kappa/ interconnect technology, which is facing major challenges in achieving commercially viable yields; and c) 300 mm wafer size conversion, which requires an extensive retooling of the entire industry. These enabling changes are overlaid on increasingly aggressive cost/quality requirements on the semiconductor fabs as the electronics industry evolves into the post-PC, Internet era. The author reviews some of the cutting edge work being done in the semiconductor manufacturing equipment area, including extendability/reuse of existing installed base for multiple generations, improved BKM's (Best Known Methodologies) and integrated process modules.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134110175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electronic process limited yield 电子工艺产量有限
G. Maier, Shawn Smith
Today's industry is expanding the high performance microprocessor market into the consumer market place. This market requires very low cost, high reliability, stricter SPQL levels, and very high yields. A New Diagnostic Methodology is required to meet these new demands. This paper addresses a broad scope of issues from Product Design and Manufacturing Test, to Diagnostic and Data Analysis Tools. It describes a beta test case currently in operation on IBM's latest PowerPC products in their copper and SOI technologies.
今天的工业正在将高性能微处理器市场扩展到消费市场。这个市场需要非常低的成本、高可靠性、更严格的SPQL标准和非常高的产量。需要一种新的诊断方法来满足这些新的需求。本文讨论了从产品设计和制造测试到诊断和数据分析工具的广泛问题。它描述了当前在IBM最新的采用铜和SOI技术的PowerPC产品上运行的一个beta测试用例。
{"title":"Electronic process limited yield","authors":"G. Maier, Shawn Smith","doi":"10.1109/ISQED.2000.838924","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838924","url":null,"abstract":"Today's industry is expanding the high performance microprocessor market into the consumer market place. This market requires very low cost, high reliability, stricter SPQL levels, and very high yields. A New Diagnostic Methodology is required to meet these new demands. This paper addresses a broad scope of issues from Product Design and Manufacturing Test, to Diagnostic and Data Analysis Tools. It describes a beta test case currently in operation on IBM's latest PowerPC products in their copper and SOI technologies.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123848199","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
A statistical model for electromigration failures 电迁移失效的统计模型
Gilbert Yoh, F. Najm
The lognormal has been traditionally used to model the failure time distribution of electromigration failures. However, when used to estimate the failure of large metal layers, it leads to a clear disagreement with established empirical data. To resolve this problem, we propose to use a shifted lognormal (SLN) as a better model of the failure time of individual wires. We will show that the SLN is well justified because it matches other more detailed and more physical models, such as the multilognormal. We will also show that the SLN exhibits the right behavior for long wires. Finally, we will provide an estimation methodology by which the parameters of the SLN can be estimated from failure data. Finally, the analysis will be extended to large metal layers where the advantages of using SLN over LN will be clearly demonstrated.
传统上使用对数正态来模拟电迁移故障的失效时间分布。然而,当用于估计大型金属层的破坏时,它与已建立的经验数据明显不一致。为了解决这个问题,我们建议使用移位对数正态(SLN)作为单个电线故障时间的更好模型。我们将证明SLN是合理的,因为它与其他更详细和更物理的模型相匹配,例如多重正态。我们还将证明SLN在长导线中表现出正确的行为。最后,我们将提供一种估计方法,通过该方法可以从故障数据中估计SLN的参数。最后,分析将扩展到大型金属层,在那里使用SLN比LN的优势将被清楚地展示出来。
{"title":"A statistical model for electromigration failures","authors":"Gilbert Yoh, F. Najm","doi":"10.1109/ISQED.2000.838852","DOIUrl":"https://doi.org/10.1109/ISQED.2000.838852","url":null,"abstract":"The lognormal has been traditionally used to model the failure time distribution of electromigration failures. However, when used to estimate the failure of large metal layers, it leads to a clear disagreement with established empirical data. To resolve this problem, we propose to use a shifted lognormal (SLN) as a better model of the failure time of individual wires. We will show that the SLN is well justified because it matches other more detailed and more physical models, such as the multilognormal. We will also show that the SLN exhibits the right behavior for long wires. Finally, we will provide an estimation methodology by which the parameters of the SLN can be estimated from failure data. Finally, the analysis will be extended to large metal layers where the advantages of using SLN over LN will be clearly demonstrated.","PeriodicalId":113766,"journal":{"name":"Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123012708","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
期刊
Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1