首页 > 最新文献

2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)最新文献

英文 中文
STT-MRAM Endurance Characterization For Enterprise Systems 企业系统的STT-MRAM耐久性特性
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312911
Trinadhachari Kosuru, Janani Swaminathan, G. Tressler, Preetham Raghavendra, Krishna Thangaraj, Steve Wilson, Tom Kroetsch, A. Lingambudi, Navya Chaitanya Gogula
Spin Torque Transfer Magneto-resistive Random-Access Memory (STT-MRAM) is a type of non-volatile memory that stores data in magnetic domains. It is a very interesting market space that STT-MRAM will support, trying to take the best of both worlds, the ever fast paced DRAM with scaling challenges and the non-volatile world of Flash with latency challenges. Initial setup, bring-up and endurance characterization of the STT-MRAM device are summarized. An overview of the tester-board design, along with the endurance characterization methodology and test results are discussed. Learning shared to introduce and educate about STT-MRAM bring-up and help future system designs using STT-MRAM. STT-MRAM is not as scalable as DRAM or Flash but has high potential based on its performance and persistence characteristics.
自旋转矩传递磁阻随机存取存储器(STT-MRAM)是一种将数据存储在磁域中的非易失性存储器。STT-MRAM将支持的是一个非常有趣的市场空间,它试图兼得两个世界的优点,即具有扩展挑战的快节奏DRAM和具有延迟挑战的非易失性Flash。总结了STT-MRAM器件的初始设置、启动和耐久性特性。概述了测试板的设计,以及耐久性表征方法和测试结果进行了讨论。分享学习心得,对STT-MRAM的培养进行介绍和教育,并为将来使用STT-MRAM进行系统设计提供帮助。STT-MRAM的可扩展性不如DRAM或Flash,但基于其性能和持久性特征,它具有很高的潜力。
{"title":"STT-MRAM Endurance Characterization For Enterprise Systems","authors":"Trinadhachari Kosuru, Janani Swaminathan, G. Tressler, Preetham Raghavendra, Krishna Thangaraj, Steve Wilson, Tom Kroetsch, A. Lingambudi, Navya Chaitanya Gogula","doi":"10.1109/EDAPS50281.2020.9312911","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312911","url":null,"abstract":"Spin Torque Transfer Magneto-resistive Random-Access Memory (STT-MRAM) is a type of non-volatile memory that stores data in magnetic domains. It is a very interesting market space that STT-MRAM will support, trying to take the best of both worlds, the ever fast paced DRAM with scaling challenges and the non-volatile world of Flash with latency challenges. Initial setup, bring-up and endurance characterization of the STT-MRAM device are summarized. An overview of the tester-board design, along with the endurance characterization methodology and test results are discussed. Learning shared to introduce and educate about STT-MRAM bring-up and help future system designs using STT-MRAM. STT-MRAM is not as scalable as DRAM or Flash but has high potential based on its performance and persistence characteristics.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133839536","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Signal Integrity Challenges and Solutions for USB4 and TBT3 Protocols USB4和TBT3协议的信号完整性挑战和解决方案
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312883
Aruna Bathini, Manjunath Jayasimha, Deepak Nagaraj
Signal Integrity analysis for an I/O forms an integral part of high-speed design. Complex routing on the package, board and passive components degrade the signal quality. End to End simulation using highly corelated IBIS AMI models including S parameter models are the need for the day for validating the link simulation. USB4 & TBT3 are the next-generation USB data specification that increases the bandwidth of the interface and allows other protocols to share the physical interface. Doubling the data rate for every generation 5Gbps - 10Gbps – 20Gbps also doubles the Nyquist frequency making frequency dependent insertion losses worse. In addition, increased capacitive coupling at higher frequencies adds more interference or noise to the signal, making the crosstalk worse than it was in USB3.0/1/2 channels. This paper provides the challenges & solutions for on-die & platform to meet the electrical compliance requirements of I/O and talks on generating IBIS-AMI (Algorithmic Modeling Interface) models for 20Gbps PHY with the system.
I/O信号完整性分析是高速设计的重要组成部分。封装、电路板和无源元件上复杂的布线会降低信号质量。使用高度相关的IBIS AMI模型(包括S参数模型)进行端到端仿真是验证链路仿真的必要条件。USB4和TBT3是下一代USB数据规范,增加了接口的带宽,并允许其他协议共享物理接口。每一代数据速率翻倍(5Gbps - 10Gbps - 20Gbps)也使奈奎斯特频率翻倍,使频率相关的插入损失更严重。此外,在更高频率下增加的电容耦合会给信号增加更多的干扰或噪声,使串扰比在USB3.0/1/2通道中更糟糕。本文提出了满足I/O电气遵从性要求所面临的挑战和平台的解决方案,并讨论了用该系统生成20Gbps PHY的IBIS-AMI(算法建模接口)模型。
{"title":"Signal Integrity Challenges and Solutions for USB4 and TBT3 Protocols","authors":"Aruna Bathini, Manjunath Jayasimha, Deepak Nagaraj","doi":"10.1109/EDAPS50281.2020.9312883","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312883","url":null,"abstract":"Signal Integrity analysis for an I/O forms an integral part of high-speed design. Complex routing on the package, board and passive components degrade the signal quality. End to End simulation using highly corelated IBIS AMI models including S parameter models are the need for the day for validating the link simulation. USB4 & TBT3 are the next-generation USB data specification that increases the bandwidth of the interface and allows other protocols to share the physical interface. Doubling the data rate for every generation 5Gbps - 10Gbps – 20Gbps also doubles the Nyquist frequency making frequency dependent insertion losses worse. In addition, increased capacitive coupling at higher frequencies adds more interference or noise to the signal, making the crosstalk worse than it was in USB3.0/1/2 channels. This paper provides the challenges & solutions for on-die & platform to meet the electrical compliance requirements of I/O and talks on generating IBIS-AMI (Algorithmic Modeling Interface) models for 20Gbps PHY with the system.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132290551","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Deep Reinforcement Learning-based Interconnection Design for 3D X-Point Array Structure Considering Signal Integrity 考虑信号完整性的三维x点阵列结构深度强化学习互连设计
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312891
Kyungjune Son, Minsu Kim, Hyunwook Park, Shinyoung Park, Gapyeol Park, Daewhan Lho, Seoungguk Kim, Taein Shin, Keeyoung Son, Keunwoo Kim, Joungho Kim
In this paper, we, for the first time, proposed the Reinforcement Learning (RL) based interconnection design for 3D X-Point array structure considering crosstalk and IR drop. We applied the Markov Decision Process (MDP) to correspond to finding the optimal interconnection design problem to RL problem. We defined interconnection state to the vector, design to the action and the number of bits, crosstalk and IR drop are considered as the reward. The Proximal Policy Optimization (PPO) and Long Short-Term Memory (LSTM) are used to RL algorithms. The proposed interconnection design model is well trained and shows convergence of reward score in 16×16, 32×32 and 64×64 cases. We verified that the trained model finds out optimal interconnection design considering both memory size and signal integrity issues.
在本文中,我们首次提出了基于强化学习(RL)的三维x点阵列结构互连设计,考虑了串扰和红外下降。我们将马尔可夫决策过程(MDP)应用于寻找最优互连设计问题和强化学习问题。我们将互连状态定义为矢量,设计为动作和比特数,并考虑串扰和红外下降作为奖励。在RL算法中引入了近端策略优化(PPO)和长短期记忆(LSTM)。本文提出的互联设计模型训练良好,在16×16、32×32和64×64三种情况下均表现出奖励分数的收敛性。我们验证了训练模型在考虑内存大小和信号完整性问题的情况下找到了最佳互连设计。
{"title":"Deep Reinforcement Learning-based Interconnection Design for 3D X-Point Array Structure Considering Signal Integrity","authors":"Kyungjune Son, Minsu Kim, Hyunwook Park, Shinyoung Park, Gapyeol Park, Daewhan Lho, Seoungguk Kim, Taein Shin, Keeyoung Son, Keunwoo Kim, Joungho Kim","doi":"10.1109/EDAPS50281.2020.9312891","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312891","url":null,"abstract":"In this paper, we, for the first time, proposed the Reinforcement Learning (RL) based interconnection design for 3D X-Point array structure considering crosstalk and IR drop. We applied the Markov Decision Process (MDP) to correspond to finding the optimal interconnection design problem to RL problem. We defined interconnection state to the vector, design to the action and the number of bits, crosstalk and IR drop are considered as the reward. The Proximal Policy Optimization (PPO) and Long Short-Term Memory (LSTM) are used to RL algorithms. The proposed interconnection design model is well trained and shows convergence of reward score in 16×16, 32×32 and 64×64 cases. We verified that the trained model finds out optimal interconnection design considering both memory size and signal integrity issues.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127553028","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deep Neural Network-based Lumped Circuit Modeling using Impedance Curve 基于深度神经网络的阻抗曲线集总电路建模
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312895
Daehwan Lho, Hyunwook Park, Seongguk Kim, Taein Shin, Keunwoo Kim, Kyungjune Son, Hyungmin Kang, Boogyo Sim, Keeyoung Son, Minsu Kim, Joungho Kim
Usually, modeling takes a long time because it depends on the engineer's experience and is done through repetitive tuning. In this paper, we propose a deep neural network (DNN)-based lumped circuit modeling method using an impedance curve. The proposed method provides a fast and accurate electrical circuit model of inductance (L), capacitance (C), and conductance (G) using a DNN. Since the LCG parameters are predicted by the impedance curve, it is flexible for various applications. For accurately predicting lumped circuit parameters, the DNN model is designed and trained through various case studies. As a result, the proposed method predicts 100% accuracy in inductance and conductance, and 92% accuracy in capacitance. In other words, the proposed method successfully models the electrical characteristics of various applications.
通常,建模需要很长时间,因为它取决于工程师的经验,并且是通过反复调整来完成的。在本文中,我们提出了一种基于深度神经网络(DNN)的阻抗曲线集总电路建模方法。该方法利用深度神经网络提供了电感(L)、电容(C)和电导(G)的快速、准确的电路模型。由于LCG参数是通过阻抗曲线来预测的,因此可以灵活地适用于各种应用。为了准确地预测集总电路参数,DNN模型通过各种案例研究进行设计和训练。结果表明,该方法对电感和电导的预测精度为100%,对电容的预测精度为92%。换句话说,所提出的方法成功地模拟了各种应用的电特性。
{"title":"Deep Neural Network-based Lumped Circuit Modeling using Impedance Curve","authors":"Daehwan Lho, Hyunwook Park, Seongguk Kim, Taein Shin, Keunwoo Kim, Kyungjune Son, Hyungmin Kang, Boogyo Sim, Keeyoung Son, Minsu Kim, Joungho Kim","doi":"10.1109/EDAPS50281.2020.9312895","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312895","url":null,"abstract":"Usually, modeling takes a long time because it depends on the engineer's experience and is done through repetitive tuning. In this paper, we propose a deep neural network (DNN)-based lumped circuit modeling method using an impedance curve. The proposed method provides a fast and accurate electrical circuit model of inductance (L), capacitance (C), and conductance (G) using a DNN. Since the LCG parameters are predicted by the impedance curve, it is flexible for various applications. For accurately predicting lumped circuit parameters, the DNN model is designed and trained through various case studies. As a result, the proposed method predicts 100% accuracy in inductance and conductance, and 92% accuracy in capacitance. In other words, the proposed method successfully models the electrical characteristics of various applications.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116524697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Link Performance Comparison based on Insertion Loss: NRZ, PAM3, PAM4, and ENRZ 基于插入损耗的链路性能比较:NRZ、PAM3、PAM4、ENRZ
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312903
S. Chen, A. Tajalli
This work presents a comparative study, analyzing performance of NRZ (Non-Return-to-Zero), PAM4 (Pulse Amplitude Modulation of 4-level), PAM3, and ENRZ (Ensemble NRZ) in terms of sensitivity to channel loss. The advantageous of each signaling scheme based on residual eye opening are being discussed.
这项工作提出了一项比较研究,分析了NRZ(不归零)、PAM4(4级脉冲幅度调制)、PAM3和ENRZ(集成NRZ)在通道损耗敏感性方面的性能。讨论了基于残馀睁眼的各种信号方案的优点。
{"title":"Link Performance Comparison based on Insertion Loss: NRZ, PAM3, PAM4, and ENRZ","authors":"S. Chen, A. Tajalli","doi":"10.1109/EDAPS50281.2020.9312903","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312903","url":null,"abstract":"This work presents a comparative study, analyzing performance of NRZ (Non-Return-to-Zero), PAM4 (Pulse Amplitude Modulation of 4-level), PAM3, and ENRZ (Ensemble NRZ) in terms of sensitivity to channel loss. The advantageous of each signaling scheme based on residual eye opening are being discussed.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126590442","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Is There a need for 3D modelling for a Power Delivery Network on Package? 包装上的电力输送网络是否需要三维建模?
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312921
Siddhesh Arote, Manjunath Jayasimha
Power supply noise budget is scaled for High speed I/O Interfaces like PCIE-Gen5/6. The specification for power supply noise has become tighter and even variation of few mV is considered crucial for high speed I/O interfaces. Presently a 2.5D extraction tool is used for modelling Power delivery network interconnects for Package/Mother board. With data rates increasing, 2.5D tool lacks accuracy & there is a definite need for 3D modelling for improving the quality of the output to meet the ever-growing High speed I/Os (input output). Relying on 2.5D models can lead to pessimistic decoupling solution. The work in this paper mainly focuses on accurate interconnect modelling of Package/Motherboard using a 3-D field solver tool & also provides the impact on HSIO power supply noise and summarizes the need for this methodology upgrade. Also, paper discusses on how 3D PDN models helps design resources (SOC, PKG, BRD) to be optimized only to the most sensitive areas, thereby reducing the overall PDN resource cost.
电源噪声预算适用于高速I/O接口,如PCIE-Gen5/6。电源噪声的规范越来越严格,即使是几毫伏的变化也被认为是高速I/O接口的关键。目前使用2.5D提取工具对封装/母板的供电网络互连进行建模。随着数据速率的增加,2.5D工具缺乏准确性,并且明确需要3D建模来提高输出质量,以满足不断增长的高速I/ o(输入输出)。依赖2.5D模型会导致悲观的解耦方案。本文的工作主要集中在使用3d现场求解工具对封装/主板进行精确互连建模,并提供对HSIO电源噪声的影响,并总结了该方法升级的必要性。此外,本文还讨论了3D PDN模型如何帮助设计资源(SOC, PKG, BRD)仅针对最敏感的区域进行优化,从而降低整体PDN资源成本。
{"title":"Is There a need for 3D modelling for a Power Delivery Network on Package?","authors":"Siddhesh Arote, Manjunath Jayasimha","doi":"10.1109/EDAPS50281.2020.9312921","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312921","url":null,"abstract":"Power supply noise budget is scaled for High speed I/O Interfaces like PCIE-Gen5/6. The specification for power supply noise has become tighter and even variation of few mV is considered crucial for high speed I/O interfaces. Presently a 2.5D extraction tool is used for modelling Power delivery network interconnects for Package/Mother board. With data rates increasing, 2.5D tool lacks accuracy & there is a definite need for 3D modelling for improving the quality of the output to meet the ever-growing High speed I/Os (input output). Relying on 2.5D models can lead to pessimistic decoupling solution. The work in this paper mainly focuses on accurate interconnect modelling of Package/Motherboard using a 3-D field solver tool & also provides the impact on HSIO power supply noise and summarizes the need for this methodology upgrade. Also, paper discusses on how 3D PDN models helps design resources (SOC, PKG, BRD) to be optimized only to the most sensitive areas, thereby reducing the overall PDN resource cost.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131620662","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Iterative Loewner Matrix Passivity Correction Technique 迭代低矩阵无源校正技术
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312904
Mohamed Sahouli, A. Dounavis
This paper presents a passive correction technique using the Loewner matrix (LM) algorithm for modeling distributed circuits characterized by frequency-domain data. A methodology is described based on a frequency point selection technique, which increases the likelihood that the reduced Loewner matrices form a passive system. This process of adding data points to correct passivity is repeated until the LM model is passive. A numerical example is provided to illustrate the validity of the proposed work.
本文提出了一种利用洛厄纳矩阵(LM)算法对频域数据特征的分布式电路建模的无源校正技术。描述了一种基于频率点选择技术的方法,该方法增加了减少的洛厄纳矩阵形成被动系统的可能性。重复添加数据点以纠正被动的过程,直到LM模型是被动的。最后通过数值算例说明了所提工作的有效性。
{"title":"Iterative Loewner Matrix Passivity Correction Technique","authors":"Mohamed Sahouli, A. Dounavis","doi":"10.1109/EDAPS50281.2020.9312904","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312904","url":null,"abstract":"This paper presents a passive correction technique using the Loewner matrix (LM) algorithm for modeling distributed circuits characterized by frequency-domain data. A methodology is described based on a frequency point selection technique, which increases the likelihood that the reduced Loewner matrices form a passive system. This process of adding data points to correct passivity is repeated until the LM model is passive. A numerical example is provided to illustrate the validity of the proposed work.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132771669","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Temperature and Dielectric Surface Roughness dependent Performance Analysis of Cu-Graphene Hybrid Interconnects 温度和介电表面粗糙度对cu -石墨烯混合互连性能的影响分析
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312905
Rahul Kumar, B. Kumari, Somesh Kumar, Manodipan Sahoo, Rohit Sharma
To exploit the superior performance of copper and graphene interconnects, hybrid interconnects are seen as a promising interconnect technology for future technology nodes. Dielectric surface roughness is a process induced phenomenon that affects the performance of the interconnects. This paper presents an in-depth investigation on the impact of temperature and dielectric surface roughness on performance parameters of Cu-Graphene hybrid interconnects.
为了利用铜和石墨烯互连的优越性能,混合互连被视为未来技术节点的一种有前途的互连技术。介电表面粗糙度是一种影响互连性能的过程诱发现象。本文深入研究了温度和介质表面粗糙度对cu -石墨烯杂化互连性能参数的影响。
{"title":"Temperature and Dielectric Surface Roughness dependent Performance Analysis of Cu-Graphene Hybrid Interconnects","authors":"Rahul Kumar, B. Kumari, Somesh Kumar, Manodipan Sahoo, Rohit Sharma","doi":"10.1109/EDAPS50281.2020.9312905","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312905","url":null,"abstract":"To exploit the superior performance of copper and graphene interconnects, hybrid interconnects are seen as a promising interconnect technology for future technology nodes. Dielectric surface roughness is a process induced phenomenon that affects the performance of the interconnects. This paper presents an in-depth investigation on the impact of temperature and dielectric surface roughness on performance parameters of Cu-Graphene hybrid interconnects.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"52 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134022316","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Fast Power Integrity Analysis of PDNs with Arbitrarily Shaped Power-Ground Plane Pairs 任意形状电源-地平面对pdn的快速功率完整性分析
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312920
I. Erdin, R. Achar
A Newton-Raphson (N-R) based method is developed for performance evaluation of power delivery networks (PDN) with arbitrarily shaped parallel-plate power/ground plane pairs. The proposed method allows for PI assessment in a few iteration steps while providing significant computational efficiency compared to alternative methods. The proposed method is tested on a practical example and the results are observed in good agreement with those obtained from a numerical electromagnetic (EM) simulator.
提出了一种基于牛顿-拉夫森(N-R)的任意形状并联板电源/地平面对输电网络(PDN)性能评估方法。与其他方法相比,所提出的方法允许在几个迭代步骤中进行PI评估,同时提供显著的计算效率。在一个实例上对所提出的方法进行了验证,结果与数值电磁模拟器的结果吻合较好。
{"title":"Fast Power Integrity Analysis of PDNs with Arbitrarily Shaped Power-Ground Plane Pairs","authors":"I. Erdin, R. Achar","doi":"10.1109/EDAPS50281.2020.9312920","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312920","url":null,"abstract":"A Newton-Raphson (N-R) based method is developed for performance evaluation of power delivery networks (PDN) with arbitrarily shaped parallel-plate power/ground plane pairs. The proposed method allows for PI assessment in a few iteration steps while providing significant computational efficiency compared to alternative methods. The proposed method is tested on a practical example and the results are observed in good agreement with those obtained from a numerical electromagnetic (EM) simulator.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132349562","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Deep Reinforcement Learning-based Through Silicon Via (TSV) Array Design Optimization Method considering Crosstalk 考虑串扰的基于深度强化学习的TSV阵列设计优化方法
Pub Date : 2020-12-14 DOI: 10.1109/EDAPS50281.2020.9312906
Keunwoo Kim, Hyunwook Park, Daehwan Lho, Minsu Kim, Keeyoung Son, Kyungjune Son, Seongguk Kim, Taein Shin, Seonguk Choi, Joungho Kim
In this paper, we propose the through silicon via (TSV) array design optimization method using deep reinforcement learning (DRL) framework. The agent trained through the proposed method can provide an optimal TSV array that minimizes far-end crosstalk (FEXT) in one single step. We define the state, action, and reward that are elements of the Markov Decision Process (MDP) for optimizing the TSV array considering FEXT and train a deep q network (DQN) agent. For verification, we applied the proposed method to a 3 by 3 through silicon via array at stacked DRAM of High Bandwidth Memory (HBM). The network converged well, and as the result, the proposed method provided the optimal design that satisfies the target FEXT in which 3 dB lower than the initial design.
本文提出了基于深度强化学习(DRL)框架的通硅孔(TSV)阵列设计优化方法。通过该方法训练的智能体可以提供最优的TSV阵列,使远端串扰(text)在单步内最小化。我们定义了状态、动作和奖励作为马尔可夫决策过程(MDP)的要素,用于优化考虑ext的TSV阵列,并训练了一个深度q网络(DQN)代理。为了验证,我们将所提出的方法应用于高带宽存储器(HBM)堆叠DRAM的3 × 3通硅通孔阵列。结果表明,该方法能够提供比初始设计低3db的满足目标FEXT的优化设计。
{"title":"Deep Reinforcement Learning-based Through Silicon Via (TSV) Array Design Optimization Method considering Crosstalk","authors":"Keunwoo Kim, Hyunwook Park, Daehwan Lho, Minsu Kim, Keeyoung Son, Kyungjune Son, Seongguk Kim, Taein Shin, Seonguk Choi, Joungho Kim","doi":"10.1109/EDAPS50281.2020.9312906","DOIUrl":"https://doi.org/10.1109/EDAPS50281.2020.9312906","url":null,"abstract":"In this paper, we propose the through silicon via (TSV) array design optimization method using deep reinforcement learning (DRL) framework. The agent trained through the proposed method can provide an optimal TSV array that minimizes far-end crosstalk (FEXT) in one single step. We define the state, action, and reward that are elements of the Markov Decision Process (MDP) for optimizing the TSV array considering FEXT and train a deep q network (DQN) agent. For verification, we applied the proposed method to a 3 by 3 through silicon via array at stacked DRAM of High Bandwidth Memory (HBM). The network converged well, and as the result, the proposed method provided the optimal design that satisfies the target FEXT in which 3 dB lower than the initial design.","PeriodicalId":137699,"journal":{"name":"2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133218195","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
期刊
2020 IEEE Electrical Design of Advanced Packaging and Systems (EDAPS)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1