Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879665
B. Guldimann, P. Clerc, N. D. de Rooij
A single mask, shutter modulated fiber-optic accelerometer with integrated squeeze film damping structures has been fabricated and characterized. Its mass suspended by four beams and containing the structures for squeeze film damping is displaced laterally under acceleration. Vertical shutters at both ends of the mass can move horizontally in the optical path between two self-aligned multimode optical fibers.
{"title":"Fiber-optic accelerometer with micro-optical shutter modulation and integrated damping","authors":"B. Guldimann, P. Clerc, N. D. de Rooij","doi":"10.1109/OMEMS.2000.879665","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879665","url":null,"abstract":"A single mask, shutter modulated fiber-optic accelerometer with integrated squeeze film damping structures has been fabricated and characterized. Its mass suspended by four beams and containing the structures for squeeze film damping is displaced laterally under acceleration. Vertical shutters at both ends of the mass can move horizontally in the optical path between two self-aligned multimode optical fibers.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130339313","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879654
A. Heuer
A new technique is presented for producing polysilicon films with predetermined stress profiles. Polysilicon films deposited by LPCVD exhibit tensile or compressive residual stresses, depending on the deposition temperature. Polysilicon films comprised of alternating tensile and compressive layers can display any overall value of stress and stress gradient. We call the multilayer material MultiPoly/sup TM/ and the process the MultiPoly/sup TM/ process. Structures made from these films can be designed to display deliberate curvatures as-fabricated resulting in novel optical devices, such as focusing mirrors. Electrostatic actuation can be used to modify the shapes of these polysilicon structures, creating optical switches.
{"title":"LPCVD polysilicon films with controlled curvature for optical MEMS: the MultiPoly/sup TM/ process","authors":"A. Heuer","doi":"10.1109/OMEMS.2000.879654","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879654","url":null,"abstract":"A new technique is presented for producing polysilicon films with predetermined stress profiles. Polysilicon films deposited by LPCVD exhibit tensile or compressive residual stresses, depending on the deposition temperature. Polysilicon films comprised of alternating tensile and compressive layers can display any overall value of stress and stress gradient. We call the multilayer material MultiPoly/sup TM/ and the process the MultiPoly/sup TM/ process. Structures made from these films can be designed to display deliberate curvatures as-fabricated resulting in novel optical devices, such as focusing mirrors. Electrostatic actuation can be used to modify the shapes of these polysilicon structures, creating optical switches.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130040364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879659
M. Sasaki, K. Tanaka, K. Hane
The integrated probe is advantageous for reducing the system size and the alignment labor and for improving the reliability of the SNOM. Even when a multi-functional probe is used, the SNOM system requires to set additional bulky elements. The further integration of the SNOM system is still a great challenge. In this study, a highly integrated cantilever for SNOM is described. All components necessary for the SNOM system (LED light source, waveguide, nanometer size aperture tip, and photodiode) are integrated on the cantilever.
{"title":"Scanning near-field optical microscope using cantilever integrated with light emitting diode, waveguide, aperture, and photodiode","authors":"M. Sasaki, K. Tanaka, K. Hane","doi":"10.1109/OMEMS.2000.879659","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879659","url":null,"abstract":"The integrated probe is advantageous for reducing the system size and the alignment labor and for improving the reliability of the SNOM. Even when a multi-functional probe is used, the SNOM system requires to set additional bulky elements. The further integration of the SNOM system is still a great challenge. In this study, a highly integrated cantilever for SNOM is described. All components necessary for the SNOM system (LED light source, waveguide, nanometer size aperture tip, and photodiode) are integrated on the cantilever.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117087175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879653
T. Ericson, G. Palmskog, P. Eriksen, P. Lundstrom, M. Granberg, L. Backlin, K. Frojd, C. Vieider
A combination of microstructure technologies for silicon and polymers has been used to fabricate BCB waveguide FTTH array components with a MT interface. Passive alignment structures have been used for both the laser array and the optical interface.
{"title":"Precision passive alignment technologies for low cost array FTTH component","authors":"T. Ericson, G. Palmskog, P. Eriksen, P. Lundstrom, M. Granberg, L. Backlin, K. Frojd, C. Vieider","doi":"10.1109/OMEMS.2000.879653","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879653","url":null,"abstract":"A combination of microstructure technologies for silicon and polymers has been used to fabricate BCB waveguide FTTH array components with a MT interface. Passive alignment structures have been used for both the laser array and the optical interface.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"27 12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114164606","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879619
J. Gilbert, A. S. Morris
As MOEMS transition from the laboratory to production products, a complete design flow is necessary for rapid product development. This paper presents a MOEMS design flow that provides efficient top-down design and accurate bottom-up verification.
{"title":"CAD tools for optical MEMS","authors":"J. Gilbert, A. S. Morris","doi":"10.1109/OMEMS.2000.879619","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879619","url":null,"abstract":"As MOEMS transition from the laboratory to production products, a complete design flow is necessary for rapid product development. This paper presents a MOEMS design flow that provides efficient top-down design and accurate bottom-up verification.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116883456","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879605
K. Cornett, J. Heritage
The rapid scanning optical delay (RSOD), which is based on femtosecond pulse shaping technology, was developed to overcome the speed limitations of traditional approaches. In an RSOD the traditional translating mirror is replaced by a scanning mirror with a rotation angle of a few degrees. We present the integration of a scanning silicon micromirror into a compact RSOD geometry only about 5 cm in length. We demonstrate a 40 ps rapid scanning optical delay of 100 fs time scale optical pulses. Our RSOD is based on a surface micromachined tilt-up mirror. The polysilicon mirror is connected to a supporting frame with torsional polysilicon beams and is dynamically driven by an electrostatic comb-drive actuator. The rectangular mirror face is 760 /spl mu/m by 500 /spl mu/m, with a resonant frequency of 1060 Hz and a measured range of deflection of 16 degrees optical. The residual stress gradients give the micromirror a measured convex radius of curvature of 34 cm. The RSOD is characterized using a Michelson interferometer. The frequency and deflection characteristics of the micromirror are presented.
{"title":"Compact optical delay line based on scanning surface micromachined polysilicon mirrors","authors":"K. Cornett, J. Heritage","doi":"10.1109/OMEMS.2000.879605","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879605","url":null,"abstract":"The rapid scanning optical delay (RSOD), which is based on femtosecond pulse shaping technology, was developed to overcome the speed limitations of traditional approaches. In an RSOD the traditional translating mirror is replaced by a scanning mirror with a rotation angle of a few degrees. We present the integration of a scanning silicon micromirror into a compact RSOD geometry only about 5 cm in length. We demonstrate a 40 ps rapid scanning optical delay of 100 fs time scale optical pulses. Our RSOD is based on a surface micromachined tilt-up mirror. The polysilicon mirror is connected to a supporting frame with torsional polysilicon beams and is dynamically driven by an electrostatic comb-drive actuator. The rectangular mirror face is 760 /spl mu/m by 500 /spl mu/m, with a resonant frequency of 1060 Hz and a measured range of deflection of 16 degrees optical. The residual stress gradients give the micromirror a measured convex radius of curvature of 34 cm. The RSOD is characterized using a Michelson interferometer. The frequency and deflection characteristics of the micromirror are presented.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116323126","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879616
E. Oilier, C. Chabrol, T. Enot, P. Brunet-Manquat, J. Margail, P. Mottier
The feasibility of 1/spl times/N switches based on moving waveguides has been demonstrated. Solutions have been developed to overcome the technological hurdles encountered. The elementary 1/spl times/2 switch performances have been strongly improved: very low crosstalk (<-42 dB), low optical losses (1.5 dB), insensitivity to wavelength (<0.2 dB, 1250-1650 nm wavelength range) and polarisation (<0.3 dB), low driving voltage (<70 V), low switching time (<5 ms). Due to the results associated with a size reduction and a very accurate and reproducible control of residual deflection, we have demonstrated that the fabrication of larger 1/spl times/N switches is possible by cascading 1/spl times/2 switches. 1/spl times/8 switches have been fabricated. Moreover an 8/spl times/8 switching matrix has been demonstrated using arrays of 1/spl times/8 switches. These demonstrations show that this technology can address the different switching applications.
{"title":"1/spl times/8 micro-mechanical switches based on moving waveguides for optical fiber network switching","authors":"E. Oilier, C. Chabrol, T. Enot, P. Brunet-Manquat, J. Margail, P. Mottier","doi":"10.1109/OMEMS.2000.879616","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879616","url":null,"abstract":"The feasibility of 1/spl times/N switches based on moving waveguides has been demonstrated. Solutions have been developed to overcome the technological hurdles encountered. The elementary 1/spl times/2 switch performances have been strongly improved: very low crosstalk (<-42 dB), low optical losses (1.5 dB), insensitivity to wavelength (<0.2 dB, 1250-1650 nm wavelength range) and polarisation (<0.3 dB), low driving voltage (<70 V), low switching time (<5 ms). Due to the results associated with a size reduction and a very accurate and reproducible control of residual deflection, we have demonstrated that the fabrication of larger 1/spl times/N switches is possible by cascading 1/spl times/2 switches. 1/spl times/8 switches have been fabricated. Moreover an 8/spl times/8 switching matrix has been demonstrated using arrays of 1/spl times/8 switches. These demonstrations show that this technology can address the different switching applications.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131977421","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879617
O. Spahn, C. Sullivan, J. Burkhart, C. Tigges, E. Garcia
We describe a 1/spl times/2 waveguide switch which is also a cantilever, fabricated in GaAs-based materials. This switch can be cascaded into 1/spl times/N structure. The layout and layer cross section of the waveguide are shown schematically. Actuation is accomplished by electrostatic means, by application of bias between the movable waveguide and static electrodes. This results in 4 /spl mu/m motion of the cantilevered waveguide in the plane of the wafer. The waveguide consists of 4 /spl mu/m thick GaAs/AlGaAs layer, while the release layer is composed of 2 /spl mu/m of Al/sub 0.7/Ga/sub 0.3/As. Metal contacts are deposited on a planar substrate prior to waveguide definition. Then 3 /spl mu/m wide waveguide is defined by RIBE. Photoresist is defined on the areas to be protected against release and sacrificial layer is removed by a HF-based wet etch. After photoresist removal, devices are sublimation dried. Fabrication issues, such as choice of materials, release chemistries and their implications are further discussed. Also, further details of device performance are given.
{"title":"GaAs-based microelectromechanical waveguide switch","authors":"O. Spahn, C. Sullivan, J. Burkhart, C. Tigges, E. Garcia","doi":"10.1109/OMEMS.2000.879617","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879617","url":null,"abstract":"We describe a 1/spl times/2 waveguide switch which is also a cantilever, fabricated in GaAs-based materials. This switch can be cascaded into 1/spl times/N structure. The layout and layer cross section of the waveguide are shown schematically. Actuation is accomplished by electrostatic means, by application of bias between the movable waveguide and static electrodes. This results in 4 /spl mu/m motion of the cantilevered waveguide in the plane of the wafer. The waveguide consists of 4 /spl mu/m thick GaAs/AlGaAs layer, while the release layer is composed of 2 /spl mu/m of Al/sub 0.7/Ga/sub 0.3/As. Metal contacts are deposited on a planar substrate prior to waveguide definition. Then 3 /spl mu/m wide waveguide is defined by RIBE. Photoresist is defined on the areas to be protected against release and sacrificial layer is removed by a HF-based wet etch. After photoresist removal, devices are sublimation dried. Fabrication issues, such as choice of materials, release chemistries and their implications are further discussed. Also, further details of device performance are given.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130951049","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879662
J. Brugger, Beomjoon Kim, Niek Van Huist
We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications.
{"title":"Photoplastic SU-8 probes for near-field optical applications","authors":"J. Brugger, Beomjoon Kim, Niek Van Huist","doi":"10.1109/OMEMS.2000.879662","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879662","url":null,"abstract":"We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131095732","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-08-21DOI: 10.1109/OMEMS.2000.879668
J. Mohr
Due to its characteristics, LIGA technology is well suited to build up free space optical components with hybrid integration of optical elements by passive alignment. This is demonstrated by passive optical components and electro-opto-mechanical devices for telecommunication and sensor application.
{"title":"Free space optical components and systems based on LIGA technology","authors":"J. Mohr","doi":"10.1109/OMEMS.2000.879668","DOIUrl":"https://doi.org/10.1109/OMEMS.2000.879668","url":null,"abstract":"Due to its characteristics, LIGA technology is well suited to build up free space optical components with hybrid integration of optical elements by passive alignment. This is demonstrated by passive optical components and electro-opto-mechanical devices for telecommunication and sensor application.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"48 8","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114027684","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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