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2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)最新文献

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Approaches for wafer level packaging and heterogeneous system integration for CMOS and MEMS sensors CMOS和MEMS传感器的晶圆级封装和异构系统集成方法
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947409
S. Dempwolf, L. Hofmann, Christopher Bowers, D. Guenther, R. Knechtel, S. Schulz, R. Gerbach
This paper describes approaches for 3D integration of CMOS and MEMS sensors. It implies methods for wafer level packaging, Through-Silicon-Vias (TSV) and novel methods for heterogeneous system integration like micro-transfer-printing. These technologies are described on sensor devices.
本文介绍了CMOS和MEMS传感器的三维集成方法。它意味着晶圆级封装,硅通孔(TSV)和异质系统集成的新方法,如微转移印刷。这些技术在传感器设备上进行了描述。
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引用次数: 0
A low-temperature solid-state bonding method using Ag-modified Cu microcones and Ag buffer 银修饰铜微锥与银缓冲液的低温固相键合方法
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947432
Menglong Sun, Fengtian Hu, Longlong Ju, A. Hu, Ming Li, Huiqin Ling, T. Hang
A novel low-temperature solid-state bonding method that Cu microcones coated with Ag and Ag buffer has been proposed. Thin Ag layer was used to prevent the oxidation of Cu microcones and Ag layer of several micrometers was used as a buffer layer between Cu microcones and Cu bumps. No brittle IMCs formed in the interfaces.
提出了一种低温固相键合铜微锥镀银和银缓冲液的新方法。采用薄的Ag层防止Cu微锥的氧化,并采用几微米的Ag层作为Cu微锥与Cu凸块之间的缓冲层。界面未形成脆性imc。
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引用次数: 0
Integration of 200 mm Si-CMOS and III-V materials through wafer bonding 通过晶圆键合集成200mm Si-CMOS和III-V材料
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947426
K. Lee, Shuyu Bao, K. Lee, E. Fitzgerald, C. S. Tan
A method to integrate III-V compound semiconductors (GaN HEMT, InGaN LED, InGaAs HEMT or InGaP LED) with Si-CMOS on a common Si substrate is demonstrated. The Si-CMOS layer is temporarily held on a Si handle wafer. Another III-V/Si substrate is then bonded to the Si-CMOS containing handle wafer. Finally, the handle wafer is released to realize the Si-CMOS on III-V/Si substrate. Through this method, a new generation of system with more functionality, better energy efficiency, and smaller form factor can be realized.
介绍了在普通Si衬底上集成III-V化合物半导体(GaN HEMT、InGaN LED、InGaAs HEMT或InGaP LED)和Si- cmos的方法。硅- cmos层暂时固定在硅柄晶圆上。然后将另一个III-V/Si衬底粘合到含有Si- cmos的手柄晶圆上。最后,释放手柄晶片,在III-V/Si衬底上实现Si- cmos。通过这种方法,可以实现功能更强、能效更高、外形更小的新一代系统。
{"title":"Integration of 200 mm Si-CMOS and III-V materials through wafer bonding","authors":"K. Lee, Shuyu Bao, K. Lee, E. Fitzgerald, C. S. Tan","doi":"10.23919/LTB-3D.2017.7947426","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947426","url":null,"abstract":"A method to integrate III-V compound semiconductors (GaN HEMT, InGaN LED, InGaAs HEMT or InGaP LED) with Si-CMOS on a common Si substrate is demonstrated. The Si-CMOS layer is temporarily held on a Si handle wafer. Another III-V/Si substrate is then bonded to the Si-CMOS containing handle wafer. Finally, the handle wafer is released to realize the Si-CMOS on III-V/Si substrate. Through this method, a new generation of system with more functionality, better energy efficiency, and smaller form factor can be realized.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"104 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127652133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Grating design for packaged wavelength selective infrared emitter using surface plasmon polariton 采用表面等离子激元的封装波长选择性红外发射器的光栅设计
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947479
S. Yahagi, H. Ishihara, M. Ishii, S. Kumagai, M. Sasaki
Plasmonic thermal emitter is promising for improving the efficiency of the gas sensor generating the infrared matched with the gas absorption band. The combination with the microheater in the vacuum packaged setup will further reduce the thermal loss. Here, considering CO2 gas sensing, the grating design robust against the dimension error is examined.
等离子体热发射极有望提高气体传感器产生与气体吸收波段相匹配的红外的效率。与真空封装装置中的微加热器相结合将进一步减少热损失。考虑到CO2气体传感,检验了光栅设计对尺寸误差的鲁棒性。
{"title":"Grating design for packaged wavelength selective infrared emitter using surface plasmon polariton","authors":"S. Yahagi, H. Ishihara, M. Ishii, S. Kumagai, M. Sasaki","doi":"10.23919/LTB-3D.2017.7947479","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947479","url":null,"abstract":"Plasmonic thermal emitter is promising for improving the efficiency of the gas sensor generating the infrared matched with the gas absorption band. The combination with the microheater in the vacuum packaged setup will further reduce the thermal loss. Here, considering CO2 gas sensing, the grating design robust against the dimension error is examined.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125570789","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low temperature direct bonding comparison 低温直接键合比较
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947416
F. Fournel, V. Larrey, C. Morales, C. Bridoux, H. Moriceau, F. Rieutord
Low temperature direct bonding technologies are now widely used for many applications. Mechanisms of some of these technics will be presented. The different way to obtain low temperature direct bonding will then be compared with their respective advantages and drawbacks.
低温直接键合技术目前已广泛应用于许多领域。本文将介绍其中一些技术的机理。然后比较获得低温直接键合的不同方法各自的优缺点。
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引用次数: 0
Atomic structure of Ti-doped alumina grain boundaries fabricated in air and reducing atmosphere 在空气和还原气氛中制备ti掺杂氧化铝晶界的原子结构
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947475
S. Ishihara, E. Tochigi, N. Shibata, Y. Ikuhara
Two a-alumina bicrystals doped with titanium were fabricated in different atmospheres: air and Ar-H2 mixed gas. The grain boundaries (GBs) of the bicrystals were investigated by transmission electron microscopy (TEM) and scanning TEM (STEM). Their atomic structures are reported in detail.
在空气和Ar-H2混合气体中制备了两种掺杂钛的a-氧化铝双晶。采用透射电子显微镜(TEM)和扫描电子显微镜(STEM)研究了双晶的晶界。详细报道了它们的原子结构。
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引用次数: 0
Graphene-mediated wafer bonding to prepare monolayer-cored double heterostructures for high-performance nanooptoelectronics 石墨烯介导晶片键合制备高性能纳米光电子用单层芯双异质结构
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947474
T. Naito, K. Tanabe
We have fabricated for the first time a monolayer-cored double heterostructure, towards the realization of high-efficiency nanooptoelectronic devices. We prepared a Si/graphene/Si stack by means of graphene-mediated wafer bonding and verified the interfacial mechanical stability and interlayer electrical connection, demonstrating a new application of wafer bonding.
我们首次制备了一种单层芯双异质结构,为实现高效率的纳米光电器件奠定了基础。我们通过石墨烯介导的晶圆键合制备了Si/石墨烯/Si堆叠,并验证了界面的机械稳定性和层间的电气连接,展示了晶圆键合的新应用。
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引用次数: 1
Analysis of the influence of interface charges on the electrical characteristics of GaAs/GaN junctions 界面电荷对GaAs/GaN结电特性的影响分析
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947473
S. Yamajo, J. Liang, N. Shigekawa
Electrical properties of p+-GaAs/n-GaN and n+-GaAs/n-GaN, heterojunctions fabricated by using surface-activated bonding (SAB) are investigated. The measured C-V characteristics of p+-GaAs/n-GaN and n+-GaAs/n-GaN junctions are in quantitative agreement with modeled ones obtained for the interface states density and the conduction-band discontinuity of 1.5×1014 cm−2 eV−1 and 0.63 eV, respectively.
研究了表面活化键合制备的p+-GaAs/n- gan和n+-GaAs/n- gan异质结的电学性能。测得的p+-GaAs/n- gan和n+-GaAs/n- gan结的C-V特性与模拟得到的界面态密度和导带不连续度分别为1.5×1014 cm−2 eV−1和0.63 eV的C-V特性定量一致。
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引用次数: 1
Ab-initio local-energy analysis of Fe/TiC interfaces Fe/TiC界面的Ab-initio局域能分析
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947398
M. Kohyama, Vikas Sharma, Shingo Tanaka, Y. Shiihara
Local-energy scheme based on energy density within the PAW-GGA method has been applied to Fe(001)/TiC(001) coherent interfaces. Via Bader integration of the energy density, local energies of atomic regions are decided without the gauge dependent problem. By comparing the surface and interface supercells, we can clarify the contribution of each surface atom to the interface adhesion. The interface with Fe atoms located on C atoms shows quite different features from those of the interface with Fe atoms located on Ti atoms.
将基于能量密度的局域能量方案应用于Fe(001)/TiC(001)相干界面。通过能量密度的贝德积分,确定了原子区域的局域能量,而不存在规范依赖问题。通过对表面和界面超级细胞的比较,我们可以明确每个表面原子对界面粘附的贡献。Fe原子位于C原子上的界面与Fe原子位于Ti原子上的界面表现出完全不同的特征。
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引用次数: 0
Hydrogen radical treatment for indium surface oxide removal and re-oxidation behaviour 氢自由基处理对铟表面氧化去除及再氧化行为的影响
Pub Date : 2017-05-01 DOI: 10.23919/LTB-3D.2017.7947461
K. Furuyama, K. Yamanaka, E. Higurashi, T. Suga
This study investigates the effect of hydrogen radical treatment on indium surface oxide removal, and the observation of re-oxidation post treatment. It was found that hydrogen radical treatment successfully removes indium surface oxide at temperatures as low as 170 °C, and prevents re-oxidation compared to active surfaces obtained by bombardment.
本研究考察了氢自由基处理对铟表面氧化去除的影响,并观察了处理后的再氧化情况。研究发现,在低至170°C的温度下,氢自由基处理成功地去除了铟表面的氧化物,并且与轰击获得的活性表面相比,可以防止再氧化。
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引用次数: 4
期刊
2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)
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