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Structure Design Optimization of a Differential Capacitive MEMS Accelerometer Based on a Multi-Objective Elitist Genetic Algorithm. 基于多目标精英遗传算法的差分电容式MEMS加速度计结构优化设计。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-19 DOI: 10.3390/mi17010129
Dongda Yang, Yao Chu, Ruitao Liu, Xiwen Zhang, Saifei Yuan, Fan Zhang, Shengjie Xuan, Yunzhang Chi, Jiahui Liu, Zetong Lei, Rui You

This article describes a global structure optimization methodology for microelectromechanical system devices based on a multi-objective elitist genetic algorithm. By integrating a parameterized model with a multi-objective evolutionary framework, the approach can efficiently explore design space and concurrently optimize multiple metrics. A differential capacitive MEMS accelerometer is presented to demonstrate the method. Four key objectives, including resonant frequency, static capacitance, dynamic capacitance, and feedback force, are simultaneously optimized to enhance sensitivity, bandwidth, and closed-loop driving capability. After 25 generations, the algorithm converged to a uniformly distributed Pareto front. The experimental results indicate that, compared with the initial design, the sensitivity-oriented design achieves a 56.1% reduction in static capacitance and an 85.5% improvement in sensitivity. The global multi-objective optimization achieves a normalized hypervolume of 35.8%, notably higher than the local structure optimization, demonstrating its superior design space coverage and trade-off capability. Compared to single-objective optimization, the multi-objective approach offers a superior strategy by avoiding the limitation of overemphasizing resonant frequency at the expense of other metrics, thereby enabling a comprehensive exploration of the design space.

提出了一种基于多目标精英遗传算法的微机电系统器件整体结构优化方法。该方法将参数化模型与多目标演化框架相结合,可以有效地探索设计空间并同时优化多个指标。给出了一种差分电容式MEMS加速度计来演示该方法。同时优化谐振频率、静态电容、动态电容和反馈力四个关键目标,以增强灵敏度、带宽和闭环驱动能力。经过25代后,算法收敛到均匀分布的帕累托前沿。实验结果表明,与初始设计相比,以灵敏度为导向的设计使静态电容降低56.1%,灵敏度提高85.5%。全局多目标优化实现了35.8%的归一化超体积,显著高于局部结构优化,显示了其优越的设计空间覆盖和权衡能力。与单目标优化相比,多目标方法提供了一种优越的策略,避免了以牺牲其他指标为代价过度强调谐振频率的限制,从而能够全面探索设计空间。
{"title":"Structure Design Optimization of a Differential Capacitive MEMS Accelerometer Based on a Multi-Objective Elitist Genetic Algorithm.","authors":"Dongda Yang, Yao Chu, Ruitao Liu, Xiwen Zhang, Saifei Yuan, Fan Zhang, Shengjie Xuan, Yunzhang Chi, Jiahui Liu, Zetong Lei, Rui You","doi":"10.3390/mi17010129","DOIUrl":"10.3390/mi17010129","url":null,"abstract":"<p><p>This article describes a global structure optimization methodology for microelectromechanical system devices based on a multi-objective elitist genetic algorithm. By integrating a parameterized model with a multi-objective evolutionary framework, the approach can efficiently explore design space and concurrently optimize multiple metrics. A differential capacitive MEMS accelerometer is presented to demonstrate the method. Four key objectives, including resonant frequency, static capacitance, dynamic capacitance, and feedback force, are simultaneously optimized to enhance sensitivity, bandwidth, and closed-loop driving capability. After 25 generations, the algorithm converged to a uniformly distributed Pareto front. The experimental results indicate that, compared with the initial design, the sensitivity-oriented design achieves a 56.1% reduction in static capacitance and an 85.5% improvement in sensitivity. The global multi-objective optimization achieves a normalized hypervolume of 35.8%, notably higher than the local structure optimization, demonstrating its superior design space coverage and trade-off capability. Compared to single-objective optimization, the multi-objective approach offers a superior strategy by avoiding the limitation of overemphasizing resonant frequency at the expense of other metrics, thereby enabling a comprehensive exploration of the design space.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844434/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064738","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Spaceborne Integrated S/Ka Dual-Band Dual-Reflector Antenna. 星载集成S/Ka双频双反射面天线。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-18 DOI: 10.3390/mi17010124
Zenan Yang, Weiqiang Han, Liang Tang, Haihua Wang, Yilin Wang, Yongchang Jiao

To address the diverse requirements of satellite communication applications involving medium-/low-rate reliable links and high-rate high-capacity services, an integrated S/Ka dual-band dual-reflector antenna is proposed as an effective solution. Owing to the stringent spatial constraints of satellite platforms, the longer operating wavelengths in the S-band lead to oversized feed horns in the integrated antenna design, which induces severe secondary aperture blockage, thus degrading aperture efficiency and impeding practical mechanical layout implementation. To alleviate this critical drawback, the proposed antenna achieves multi-band aperture reuse by deploying an array with four miniaturized S-band radiating elements around a broadband Ka-band feed horn. A frequency-selective surface (FSS)-based sub-reflector is further designed to effectively enhance the effective aperture size for the S-band operation, while ensuring unobstructed electromagnetic propagation in the Ka-band, thus enabling simultaneous dual-band high-gain radiation. After comprehensive electromagnetic simulation and parametric optimization for the antenna feed and the FSS sub-reflector, experimental measurements verify that the S-band left-hand and right-hand circularly polarized (LHCP/RHCP) channels achieve more than 20.2 dBic gains with more than 6° half-power beamwidths (HPBWs), and the Ka-band channel yields gains exceeding 41.2 dBic, with HPBWs greater than 0.8°.

针对卫星通信应用中涉及中/低速率可靠链路和高速率大容量业务的多样化需求,提出了一种集成S/Ka双频双反射面天线的有效解决方案。由于卫星平台严格的空间约束,s波段较长的工作波长导致集成天线设计中的馈源角过大,造成严重的二次孔径堵塞,从而降低了孔径效率,阻碍了实际机械布局的实现。为了缓解这一关键缺陷,该天线通过在宽带ka波段馈电喇叭周围部署四个小型化s波段辐射元件阵列来实现多波段孔径复用。进一步设计了基于频率选择表面(FSS)的副反射器,以有效提高s波段工作的有效孔径尺寸,同时确保ka波段的电磁传播畅通,从而实现双频高增益辐射。经过对天线馈电和FSS副反射器的全面电磁仿真和参数优化,实验测量验证了s波段左圆极化和右圆极化(LHCP/RHCP)通道在6°半功率波束宽度(hpbw)以上时的增益超过20.2 dBic, ka波段通道的增益超过41.2 dBic, hpbw大于0.8°。
{"title":"A Spaceborne Integrated S/Ka Dual-Band Dual-Reflector Antenna.","authors":"Zenan Yang, Weiqiang Han, Liang Tang, Haihua Wang, Yilin Wang, Yongchang Jiao","doi":"10.3390/mi17010124","DOIUrl":"10.3390/mi17010124","url":null,"abstract":"<p><p>To address the diverse requirements of satellite communication applications involving medium-/low-rate reliable links and high-rate high-capacity services, an integrated S/Ka dual-band dual-reflector antenna is proposed as an effective solution. Owing to the stringent spatial constraints of satellite platforms, the longer operating wavelengths in the S-band lead to oversized feed horns in the integrated antenna design, which induces severe secondary aperture blockage, thus degrading aperture efficiency and impeding practical mechanical layout implementation. To alleviate this critical drawback, the proposed antenna achieves multi-band aperture reuse by deploying an array with four miniaturized S-band radiating elements around a broadband Ka-band feed horn. A frequency-selective surface (FSS)-based sub-reflector is further designed to effectively enhance the effective aperture size for the S-band operation, while ensuring unobstructed electromagnetic propagation in the Ka-band, thus enabling simultaneous dual-band high-gain radiation. After comprehensive electromagnetic simulation and parametric optimization for the antenna feed and the FSS sub-reflector, experimental measurements verify that the S-band left-hand and right-hand circularly polarized (LHCP/RHCP) channels achieve more than 20.2 dBic gains with more than 6° half-power beamwidths (HPBWs), and the Ka-band channel yields gains exceeding 41.2 dBic, with HPBWs greater than 0.8°.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12843968/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064749","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design, Fabrication and Characterization of Multi-Frequency MEMS Transducer for Photoacoustic Imaging. 光声成像多频MEMS换能器的设计、制造与表征。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-17 DOI: 10.3390/mi17010122
Alberto Prud'homme, Frederic Nabki

This work presents the design, fabrication, and experimental characterization of microelectromechanical system (MEMS) ultrasonic transducers engineered for multi-frequency operation in photoacoustic imaging (PAI). The proposed devices integrate multiple resonant geometries, including circular diaphragms, floated crosses, anchored cross membranes, and cantilever arrays, within compact footprints to overcome the inherently narrow frequency response of conventional MEMS transducers. All devices were fabricated using the PiezoMUMPs commercial microfabrication process, with finite element simulations guiding modal optimization and laser Doppler vibrometry used for experimental validation in air. The circular diaphragm exhibited a narrowband response with a dominant resonance at 1.69 MHz and a quality factor (Q) of 268, confirming the bandwidth limitations of traditional geometries. In contrast, complex designs such as the floated cross and cantilever arrays achieved significantly broader spectral responses, with resonances spanning from 275 kHz to beyond 7.5 MHz. The cantilever array, with systematically varied arm lengths, achieved the highest modal density through asynchronous activation across the spectrum. Results demonstrate that structurally diverse MEMS devices can overcome the bandwidth constraints of traditional piezoelectric transducers. The integration of heterogeneous MEMS geometries offers a viable approach for broadband sensitivity in PAI, enabling improved spatial resolution and depth selectivity without compromising miniaturization or manufacturability.

本文介绍了用于光声成像(PAI)多频工作的微机电系统(MEMS)超声换能器的设计、制造和实验表征。所提出的器件集成了多种谐振几何形状,包括圆形隔膜、浮动交叉、锚定交叉膜和悬臂阵列,在紧凑的足迹内克服了传统MEMS换能器固有的狭窄频率响应。所有器件均采用PiezoMUMPs商业微加工工艺制造,有限元模拟指导模态优化,激光多普勒振动仪用于空气中的实验验证。圆形膜片表现出窄带响应,主要共振频率为1.69 MHz,质量因子(Q)为268,证实了传统几何形状的带宽限制。相比之下,诸如浮动交叉和悬臂阵列等复杂设计实现了更宽的光谱响应,共振范围从275 kHz到7.5 MHz以上。悬臂阵列系统地改变了臂长,通过跨频谱的异步激活实现了最高的模态密度。结果表明,结构多样化的MEMS器件可以克服传统压电换能器的带宽限制。异构MEMS几何形状的集成为PAI的宽带灵敏度提供了一种可行的方法,在不影响小型化或可制造性的情况下,提高了空间分辨率和深度选择性。
{"title":"Design, Fabrication and Characterization of Multi-Frequency MEMS Transducer for Photoacoustic Imaging.","authors":"Alberto Prud'homme, Frederic Nabki","doi":"10.3390/mi17010122","DOIUrl":"10.3390/mi17010122","url":null,"abstract":"<p><p>This work presents the design, fabrication, and experimental characterization of microelectromechanical system (MEMS) ultrasonic transducers engineered for multi-frequency operation in photoacoustic imaging (PAI). The proposed devices integrate multiple resonant geometries, including circular diaphragms, floated crosses, anchored cross membranes, and cantilever arrays, within compact footprints to overcome the inherently narrow frequency response of conventional MEMS transducers. All devices were fabricated using the PiezoMUMPs commercial microfabrication process, with finite element simulations guiding modal optimization and laser Doppler vibrometry used for experimental validation in air. The circular diaphragm exhibited a narrowband response with a dominant resonance at 1.69 MHz and a quality factor (Q) of 268, confirming the bandwidth limitations of traditional geometries. In contrast, complex designs such as the floated cross and cantilever arrays achieved significantly broader spectral responses, with resonances spanning from 275 kHz to beyond 7.5 MHz. The cantilever array, with systematically varied arm lengths, achieved the highest modal density through asynchronous activation across the spectrum. Results demonstrate that structurally diverse MEMS devices can overcome the bandwidth constraints of traditional piezoelectric transducers. The integration of heterogeneous MEMS geometries offers a viable approach for broadband sensitivity in PAI, enabling improved spatial resolution and depth selectivity without compromising miniaturization or manufacturability.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844338/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064829","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Diamond Sensor Technologies: From Multi Stimulus to Quantum. 钻石传感器技术:从多刺激到量子。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-16 DOI: 10.3390/mi17010118
Pak San Yip, Tiqing Zhao, Kefan Guo, Wenjun Liang, Ruihan Xu, Yi Zhang, Yang Lu

This review explores the variety of diamond-based sensing applications, emphasizing their material properties, such as high Young's modulus, thermal conductivity, wide bandgap, chemical stability, and radiation hardness. These diamond properties give excellent performance in mechanical, pressure, thermal, magnetic, optoelectronic, radiation, biosensing, quantum, and other applications. In vibration sensing, nano/poly/single-crystal diamond resonators operate from MHz to GHz frequencies, with high quality factor via CVD growth, diamond-on-insulator techniques, and ICP etching. Pressure sensing uses boron-doped piezoresistive, as well as capacitive and Fabry-Pérot readouts. Thermal sensing merges NV nanothermometry, single-crystal resonant thermometers, and resistive/diode sensors. Magnetic detection offers FeGa/Ti/diamond heterostructures, complementing NV. Optoelectronic applications utilize DUV photodiodes and color centers. Radiation detectors benefit from diamond's neutron conversion capability. Biosensing leverages boron-doped diamond and hydrogen-terminated SGFETs, as well as gas targets such as NO2/NH3/H2 via surface transfer doping and Pd Schottky/MIS. Imaging uses AFM/NV probes and boron-doped diamond tips. Persistent challenges, such as grain boundary losses in nanocrystalline diamond, limited diamond-on-insulator bonding yield, high temperature interface degradation, humidity-dependent gas transduction, stabilization of hydrogen termination, near-surface nitrogen-vacancy noise, and the cost of high-quality single-crystal diamond, are being addressed through interface and surface chemistry control, catalytic/dielectric stack engineering, photonic integration, and scalable chemical vapor deposition routes. These advances are enabling integrated, high-reliability diamond sensors for extreme and quantum-enhanced applications.

本文综述了金刚石传感的各种应用,强调了其材料特性,如高杨氏模量、导热性、宽带隙、化学稳定性和辐射硬度。金刚石的这些特性在机械、压力、热、磁、光电、辐射、生物传感、量子等应用中具有优异的性能。在振动传感中,纳米/多/单晶金刚石谐振器工作在MHz到GHz频率范围内,通过CVD生长、绝缘体上金刚石技术和ICP蚀刻具有高质量因数。压力传感使用硼掺杂压阻,以及电容和法布里-帕姆罗读数。热感测融合了NV纳米测温仪、单晶谐振温度计和电阻/二极管传感器。磁检测提供FeGa/Ti/金刚石异质结构,补充了NV光电应用,利用DUV光电二极管和色心。辐射探测器得益于金刚石的中子转换能力。生物传感利用掺杂硼的金刚石和端氢的sgfet,以及通过表面转移掺杂和Pd Schottky/MIS的NO2/NH3/H2等气体靶标。成像使用AFM/NV探针和掺硼金刚石尖端。持续存在的挑战,如纳米晶金刚石的晶界损失,有限的绝缘体上金刚石键合收率,高温界面降解,湿度依赖的气体转导,氢终止的稳定,近表面氮空位噪声,以及高质量单晶金刚石的成本,正在通过界面和表面化学控制,催化/介电堆工程,光子集成,以及可扩展的化学气相沉积路线。这些进步使集成的高可靠性钻石传感器能够用于极端和量子增强应用。
{"title":"Diamond Sensor Technologies: From Multi Stimulus to Quantum.","authors":"Pak San Yip, Tiqing Zhao, Kefan Guo, Wenjun Liang, Ruihan Xu, Yi Zhang, Yang Lu","doi":"10.3390/mi17010118","DOIUrl":"10.3390/mi17010118","url":null,"abstract":"<p><p>This review explores the variety of diamond-based sensing applications, emphasizing their material properties, such as high Young's modulus, thermal conductivity, wide bandgap, chemical stability, and radiation hardness. These diamond properties give excellent performance in mechanical, pressure, thermal, magnetic, optoelectronic, radiation, biosensing, quantum, and other applications. In vibration sensing, nano/poly/single-crystal diamond resonators operate from MHz to GHz frequencies, with high quality factor via CVD growth, diamond-on-insulator techniques, and ICP etching. Pressure sensing uses boron-doped piezoresistive, as well as capacitive and Fabry-Pérot readouts. Thermal sensing merges NV nanothermometry, single-crystal resonant thermometers, and resistive/diode sensors. Magnetic detection offers FeGa/Ti/diamond heterostructures, complementing NV. Optoelectronic applications utilize DUV photodiodes and color centers. Radiation detectors benefit from diamond's neutron conversion capability. Biosensing leverages boron-doped diamond and hydrogen-terminated SGFETs, as well as gas targets such as NO<sub>2</sub>/NH<sub>3</sub>/H<sub>2</sub> via surface transfer doping and Pd Schottky/MIS. Imaging uses AFM/NV probes and boron-doped diamond tips. Persistent challenges, such as grain boundary losses in nanocrystalline diamond, limited diamond-on-insulator bonding yield, high temperature interface degradation, humidity-dependent gas transduction, stabilization of hydrogen termination, near-surface nitrogen-vacancy noise, and the cost of high-quality single-crystal diamond, are being addressed through interface and surface chemistry control, catalytic/dielectric stack engineering, photonic integration, and scalable chemical vapor deposition routes. These advances are enabling integrated, high-reliability diamond sensors for extreme and quantum-enhanced applications.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844166/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064815","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Mechanical Properties of Additively Manufactured Composite Resin vs. Subtractively Manufactured Hybrid Ceramic Implant-Supported Permanent Crowns Before and After Thermal Aging. 增材制造复合树脂与减材制造杂化陶瓷种植支撑永冠热老化前后的力学性能比较。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-16 DOI: 10.3390/mi17010116
Nilufer Ipek Sahin, Emre Tokar

This study aims to compare the surface roughness and fracture resistance of implant-supported permanent crowns additively manufactured using composite resins (Crowntec, VarseoSmile) versus subtractively manufactured polymer-infiltrated hybrid ceramic (VITA Enamic) at various wall thicknesses using an experimental setup as close to clinical as possible. 180 crowns were fabricated in three thicknesses (1.0, 1.5, and 2.0 mm) and cemented onto titanium abutments. Experimental groups underwent thermal aging (10,000 cycles) to simulate one year of clinical service. Surface roughness was measured via profilometry, and fracture resistance was assessed using a universal testing machine. Composite resin crowns exhibited lower surface roughness and lower fracture resistance than subtractively manufactured crowns. No significant difference in fracture resistance was found between materials at 1.0 mm (p > 0.05). However, at 1.5 and 2.0 mm, hybrid ceramic network crowns showed significantly higher resistance (p < 0.01). It was concluded that, within the limitations of this 1-year simulated study, both material-method combinations met the biological threshold for surface roughness. Regarding fracture resistance, composite resins and hybrid ceramics satisfied clinical requirements for molar bite forces only at thicknesses of 1.5 mm and above. 1.0 mm thickness may pose a risk under high occlusal loads.

本研究旨在通过尽可能接近临床的实验装置,比较复合树脂(Crowntec, VarseoSmile)和减法聚合物渗透混合陶瓷(VITA Enamic)在不同壁厚下的表面粗糙度和抗断裂性。制作三种厚度(1.0,1.5和2.0 mm)的180个冠,并将其粘接在钛基牙上。实验组进行热老化(10,000次循环),模拟一年的临床服务。通过轮廓测量法测量表面粗糙度,并使用通用试验机评估抗断裂性。复合树脂冠具有较低的表面粗糙度和较低的抗断裂能力。在1.0 mm处,两种材料的抗断裂性无显著差异(p < 0.05)。而在1.5 mm和2.0 mm处,杂化陶瓷网络冠的抗性显著提高(p < 0.01)。结论是,在为期1年的模拟研究的限制下,两种材料-方法组合都满足表面粗糙度的生物学阈值。在抗断裂方面,复合树脂和杂化陶瓷仅在厚度为1.5 mm及以上时满足临床对磨牙咬合力的要求。1.0 mm的厚度在高咬合负荷下可能会造成危险。
{"title":"Mechanical Properties of Additively Manufactured Composite Resin vs. Subtractively Manufactured Hybrid Ceramic Implant-Supported Permanent Crowns Before and After Thermal Aging.","authors":"Nilufer Ipek Sahin, Emre Tokar","doi":"10.3390/mi17010116","DOIUrl":"10.3390/mi17010116","url":null,"abstract":"<p><p>This study aims to compare the surface roughness and fracture resistance of implant-supported permanent crowns additively manufactured using composite resins (Crowntec, VarseoSmile) versus subtractively manufactured polymer-infiltrated hybrid ceramic (VITA Enamic) at various wall thicknesses using an experimental setup as close to clinical as possible. 180 crowns were fabricated in three thicknesses (1.0, 1.5, and 2.0 mm) and cemented onto titanium abutments. Experimental groups underwent thermal aging (10,000 cycles) to simulate one year of clinical service. Surface roughness was measured via profilometry, and fracture resistance was assessed using a universal testing machine. Composite resin crowns exhibited lower surface roughness and lower fracture resistance than subtractively manufactured crowns. No significant difference in fracture resistance was found between materials at 1.0 mm (<i>p</i> > 0.05). However, at 1.5 and 2.0 mm, hybrid ceramic network crowns showed significantly higher resistance (<i>p</i> < 0.01). It was concluded that, within the limitations of this 1-year simulated study, both material-method combinations met the biological threshold for surface roughness. Regarding fracture resistance, composite resins and hybrid ceramics satisfied clinical requirements for molar bite forces only at thicknesses of 1.5 mm and above. 1.0 mm thickness may pose a risk under high occlusal loads.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844450/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064813","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Inverse Lithography Technology (ILT) Under Chip Manufacture Context. 芯片制造背景下的逆光刻技术(ILT)
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-16 DOI: 10.3390/mi17010117
Xiaodong Meng, Cai Chen, Jie Ni

As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub-wavelength lithography limits. Inverse lithography technology (ILT), a key part of computational lithography, has become a critical solution for these issues. From an EDA industry perspective, this review provides an original and systematic summary of ILT's development and applications, which helps integrate the scattered research into a clear framework for both academic and industrial use. Compared with traditional OPC, the latest ILT has three main advantages: (1) better patterning accuracy, as a result of the precise optical models that fix complex optical issues (like diffraction and interference) in advanced lithography systems; (2) a wider process window, as it optimizes mask designs by working backwards from the target wafer patterns, making lithography more stable against process changes; and (3) stronger adaptability to new lithography scenarios, such as High-NA EUV and extended DUV nodes. This review first explains ILT's working principles (the basic concepts, mathematical formulae, and main methods like level-set and pixelated approaches) and its development history, highlighting key events that boosted its progress. It then analyzes ILT's current application status in the industry (such as hotspot fixing, full-chip trials, and EUV-era use) and its main bottlenecks: a high computational complexity leading to long runtime, difficulties in mask manufacturing, challenges in model calibration, and a conservative market that slows large-scale adoption. Finally, it discusses promising future directions, including hybrid ILT-OPC-SMO strategies, improving model accuracy, AI/ML-driven design, GPU acceleration, multi-beam mask writer improvements, and open-source data to solve data shortage problems. By combining the latest research and industry practices, this review fills the gap of comprehensive ILT summaries that cover the principles, progress, applications, and prospects. It helps readers fully understand ILT's technical landscape and offers practical insights for solving the key challenges, thus promoting ILT's industrial use in advanced chip manufacturing.

随着半导体制程节点缩小到3nm及以上,由于亚波长光刻技术的限制,传统的光学邻近校正(OPC)和分辨率增强技术(ret)已不能满足先进芯片制造的高图像化精度需求。逆光刻技术(ILT)作为计算光刻技术的关键组成部分,已成为解决这些问题的关键。本文从EDA行业的角度,对ILT的发展和应用进行了系统的总结,有助于将零散的研究整合成一个清晰的框架,为学术和工业应用提供参考。与传统的OPC相比,最新的ILT具有三个主要优势:(1)由于精确的光学模型可以解决先进光刻系统中复杂的光学问题(如衍射和干涉),因此具有更好的图像化精度;(2)更宽的工艺窗口,因为它通过从目标晶圆图案向后工作来优化掩模设计,使光刻在工艺变化时更加稳定;(3)对新型光刻场景的适应性更强,如高na EUV和扩展DUV节点。本文首先阐述了ILT的工作原理(基本概念、数学公式和主要方法,如水平集和像素化方法)及其发展历史,重点介绍了推动其发展的关键事件。然后分析了ILT目前在行业中的应用现状(如热点固定,全芯片试验和euv时代的使用)及其主要瓶颈:高计算复杂性导致长时间运行,掩模制造困难,模型校准挑战,以及保守的市场减缓了大规模采用。最后,讨论了有希望的未来方向,包括混合ILT-OPC-SMO策略,提高模型精度,AI/ ml驱动设计,GPU加速,多波束掩模写入器改进以及开源数据以解决数据短缺问题。本文结合最新的研究成果和行业实践,填补了对ILT原理、进展、应用和前景的综合综述的空白。它可以帮助读者充分了解ILT的技术景观,并为解决关键挑战提供实用的见解,从而促进ILT在先进芯片制造中的工业应用。
{"title":"Inverse Lithography Technology (ILT) Under Chip Manufacture Context.","authors":"Xiaodong Meng, Cai Chen, Jie Ni","doi":"10.3390/mi17010117","DOIUrl":"10.3390/mi17010117","url":null,"abstract":"<p><p>As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub-wavelength lithography limits. Inverse lithography technology (ILT), a key part of computational lithography, has become a critical solution for these issues. From an EDA industry perspective, this review provides an original and systematic summary of ILT's development and applications, which helps integrate the scattered research into a clear framework for both academic and industrial use. Compared with traditional OPC, the latest ILT has three main advantages: (1) better patterning accuracy, as a result of the precise optical models that fix complex optical issues (like diffraction and interference) in advanced lithography systems; (2) a wider process window, as it optimizes mask designs by working backwards from the target wafer patterns, making lithography more stable against process changes; and (3) stronger adaptability to new lithography scenarios, such as High-NA EUV and extended DUV nodes. This review first explains ILT's working principles (the basic concepts, mathematical formulae, and main methods like level-set and pixelated approaches) and its development history, highlighting key events that boosted its progress. It then analyzes ILT's current application status in the industry (such as hotspot fixing, full-chip trials, and EUV-era use) and its main bottlenecks: a high computational complexity leading to long runtime, difficulties in mask manufacturing, challenges in model calibration, and a conservative market that slows large-scale adoption. Finally, it discusses promising future directions, including hybrid ILT-OPC-SMO strategies, improving model accuracy, AI/ML-driven design, GPU acceleration, multi-beam mask writer improvements, and open-source data to solve data shortage problems. By combining the latest research and industry practices, this review fills the gap of comprehensive ILT summaries that cover the principles, progress, applications, and prospects. It helps readers fully understand ILT's technical landscape and offers practical insights for solving the key challenges, thus promoting ILT's industrial use in advanced chip manufacturing.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12843865/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064709","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasmonics Meets Metasurfaces: A Vision for Next Generation Planar Optical Systems. 等离子体与超表面:下一代平面光学系统的展望。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-16 DOI: 10.3390/mi17010119
Muhammad A Butt

Plasmonics and metasurfaces (MSs) have emerged as two of the most influential platforms for manipulating light at the nanoscale, each offering complementary strengths that challenge the limits of conventional optical design. Plasmonics enables extreme subwavelength field confinement, ultrafast light-matter interaction, and strong optical nonlinearities, while MSs provide versatile and compact control over phase, amplitude, polarization, and dispersion through planar, nanostructured interfaces. Recent advances in materials, nanofabrication, and device engineering are increasingly enabling these technologies to be combined within unified planar and hybrid optical platforms. This review surveys the physical principles, material strategies, and device architectures that underpin plasmonic, MS, and hybrid plasmonic-dielectric systems, with an emphasis on interface-mediated optical functionality rather than long-range guided-wave propagation. Key developments in modulators, detectors, nanolasers, metalenses, beam steering devices, and programmable optical surfaces are discussed, highlighting how hybrid designs can leverage strong field localization alongside low-loss wavefront control. System-level challenges including optical loss, thermal management, dispersion engineering, and large-area fabrication are critically examined. Looking forward, plasmonic and MS technologies are poised to define a new generation of flat, multifunctional, and programmable optical systems. Applications spanning imaging, sensing, communications, augmented and virtual reality, and optical information processing illustrate the transformative potential of these platforms. By consolidating recent progress and outlining future directions, this review provides a coherent perspective on how plasmonics and MSs are reshaping the design space of next-generation planar optical hardware.

等离子体和超表面(MSs)已经成为在纳米尺度上操纵光的两个最有影响力的平台,它们各自提供了互补的优势,挑战了传统光学设计的局限性。等离子体能够实现极端亚波长场约束、超快光-物质相互作用和强光学非线性,而MSs通过平面纳米结构界面提供对相位、振幅、极化和色散的通用和紧凑控制。材料、纳米制造和器件工程方面的最新进展使这些技术能够在统一的平面和混合光学平台中结合起来。本文综述了支撑等离子体、质谱和等离子体-介质混合系统的物理原理、材料策略和器件架构,重点是界面介导的光学功能,而不是远程导波传播。讨论了调制器、探测器、纳米激光器、超透镜、光束导向装置和可编程光学表面的关键发展,强调了混合设计如何利用强场定位和低损耗波前控制。系统级的挑战,包括光损耗,热管理,色散工程,和大面积制造严格审查。展望未来,等离子体和质谱技术将定义新一代的平面、多功能和可编程光学系统。跨越成像、传感、通信、增强和虚拟现实以及光学信息处理的应用说明了这些平台的变革潜力。通过整合最近的进展和概述未来的方向,本综述提供了一个连贯的观点,等离子体和MSs如何重塑下一代平面光学硬件的设计空间。
{"title":"Plasmonics Meets Metasurfaces: A Vision for Next Generation Planar Optical Systems.","authors":"Muhammad A Butt","doi":"10.3390/mi17010119","DOIUrl":"10.3390/mi17010119","url":null,"abstract":"<p><p>Plasmonics and metasurfaces (MSs) have emerged as two of the most influential platforms for manipulating light at the nanoscale, each offering complementary strengths that challenge the limits of conventional optical design. Plasmonics enables extreme subwavelength field confinement, ultrafast light-matter interaction, and strong optical nonlinearities, while MSs provide versatile and compact control over phase, amplitude, polarization, and dispersion through planar, nanostructured interfaces. Recent advances in materials, nanofabrication, and device engineering are increasingly enabling these technologies to be combined within unified planar and hybrid optical platforms. This review surveys the physical principles, material strategies, and device architectures that underpin plasmonic, MS, and hybrid plasmonic-dielectric systems, with an emphasis on interface-mediated optical functionality rather than long-range guided-wave propagation. Key developments in modulators, detectors, nanolasers, metalenses, beam steering devices, and programmable optical surfaces are discussed, highlighting how hybrid designs can leverage strong field localization alongside low-loss wavefront control. System-level challenges including optical loss, thermal management, dispersion engineering, and large-area fabrication are critically examined. Looking forward, plasmonic and MS technologies are poised to define a new generation of flat, multifunctional, and programmable optical systems. Applications spanning imaging, sensing, communications, augmented and virtual reality, and optical information processing illustrate the transformative potential of these platforms. By consolidating recent progress and outlining future directions, this review provides a coherent perspective on how plasmonics and MSs are reshaping the design space of next-generation planar optical hardware.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844466/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064771","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Broadband Flexible Quantum Dots/Graphene Photodetectors. 宽带柔性量子点/石墨烯光电探测器。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-16 DOI: 10.3390/mi17010121
Judy Z Wu, Andrew Shultz

Nanohybrids consisting of quantum dots and graphene (QD/graphene) provides a unique scheme to design quantum sensors. The quantum confinement in QDs enables spectral tunability, while that in graphene provides superior photocarrier mobility. The combination of them allows for broadband light absorption and high photoconduction gain that in turn leads to high photoresponsivity in QD/Gr nanohybrid photodetectors. Since the first QD/graphene photodetector was reported in 2012, intensive research has been conducted on this topic. In this paper, a review of the recent progress made on QD/Gr nanohybrid photodetectors will be provided. Among many applications, there will be a particular focus on broadband and flexible photodetectors, which make use of the inherent advantages of the QD/Gr nanohybrids. The remaining challenges and future perspectives will be discussed in this emerging topic area.

由量子点和石墨烯组成的纳米杂化体(QD/石墨烯)为设计量子传感器提供了一种独特的方案。量子点中的量子限制使光谱可调谐,而石墨烯中的量子限制提供了优越的光载流子迁移率。它们的结合允许宽带光吸收和高光导增益,从而导致QD/Gr纳米混合光电探测器的高光响应性。自2012年第一个量子点/石墨烯光电探测器被报道以来,人们对这一主题进行了深入的研究。本文综述了近年来QD/Gr纳米杂化光电探测器的研究进展。在众多应用中,将特别关注宽带和柔性光电探测器,它们利用了QD/Gr纳米杂化材料的固有优势。剩下的挑战和未来的前景将在这个新兴的主题领域进行讨论。
{"title":"Broadband Flexible Quantum Dots/Graphene Photodetectors.","authors":"Judy Z Wu, Andrew Shultz","doi":"10.3390/mi17010121","DOIUrl":"10.3390/mi17010121","url":null,"abstract":"<p><p>Nanohybrids consisting of quantum dots and graphene (QD/graphene) provides a unique scheme to design quantum sensors. The quantum confinement in QDs enables spectral tunability, while that in graphene provides superior photocarrier mobility. The combination of them allows for broadband light absorption and high photoconduction gain that in turn leads to high photoresponsivity in QD/Gr nanohybrid photodetectors. Since the first QD/graphene photodetector was reported in 2012, intensive research has been conducted on this topic. In this paper, a review of the recent progress made on QD/Gr nanohybrid photodetectors will be provided. Among many applications, there will be a particular focus on broadband and flexible photodetectors, which make use of the inherent advantages of the QD/Gr nanohybrids. The remaining challenges and future perspectives will be discussed in this emerging topic area.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12843737/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064798","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Novelty Temperature Compensation Model for Dual-Mass Vibration MEMS Gyroscope Based on Machine Learning and TTAO-VMD Algorithm. 基于机器学习和TTAO-VMD算法的双质量振动MEMS陀螺仪温度补偿新模型。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-16 DOI: 10.3390/mi17010120
Wenbo Tan, Yan Wang, Xinwang Wang

The output of MEMS gyroscopes is highly vulnerable to ambient temperature variations, which induce temperature drift errors and degrade navigation precision. Consequently, temperature compensation for MEMS gyroscope outputs is of critical importance. To address this issue, this study proposes a novel temperature compensation model for the dual-mass vibration MEMS gyroscope (DMVMG), which integrates the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. The implementation process of the proposed model is as follows: firstly, the structural configuration and fundamental operating principle of the DMVMG are elaborated. Secondly, the temperature error compensation model is constructed based on the fusion of the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. Thirdly, the raw output signal of the DMVMG is preprocessed using the TTAO-VMD algorithm, which decomposes the signal into four distinct components, namely high-frequency noise, white noise, mixed noise, and temperature-induced noise. Subsequently, the high-frequency and white noise components are eliminated, while the mixed noise component is filtered via the SHAKF algorithm. On this basis, the 1D-CNN-Bi-GRU-Attention algorithm is adopted to establish the temperature error compensation model, with the temperature, temperature change rate, time, and temperature-induced noise as input variables. Finally, the optimized signal components are reconstructed to yield the temperature-compensated output of the DMVMG. The experimental results based on the Allan variance method demonstrate that the angle random walk (N) is reduced from 18.56 °/h to 0.17 °/h, and the bias instability (B) is decreased from 32.76 °/h to 0.82 °/h, verifying the effectiveness of the proposed method.

MEMS陀螺仪的输出极易受到环境温度变化的影响,从而导致温度漂移误差,降低导航精度。因此,MEMS陀螺仪输出的温度补偿是至关重要的。为了解决这一问题,本研究提出了一种新的双质量振动MEMS陀螺仪(DMVMG)温度补偿模型,该模型集成了TTAO-VMD, 1D-CNN-Bi-GRU-Attention和SHAKF算法。模型的实现过程如下:首先,阐述了DMVMG的结构配置和基本工作原理。其次,在融合TTAO-VMD、1D-CNN-Bi-GRU-Attention和SHAKF算法的基础上,构建温度误差补偿模型;第三,采用TTAO-VMD算法对DMVMG的原始输出信号进行预处理,将信号分解为高频噪声、白噪声、混合噪声和温度诱导噪声四个不同的分量。然后,去除高频和白噪声分量,同时通过SHAKF算法对混合噪声分量进行滤波。在此基础上,采用1D-CNN-Bi-GRU-Attention算法,以温度、温度变化率、时间、温度噪声为输入变量,建立温度误差补偿模型。最后,对优化后的信号分量进行重构,得到DMVMG的温度补偿输出。基于Allan方差法的实验结果表明,角度随机游走(N)从18.56°/h减小到0.17°/h,偏置不稳定性(B)从32.76°/h减小到0.82°/h,验证了所提出方法的有效性。
{"title":"A Novelty Temperature Compensation Model for Dual-Mass Vibration MEMS Gyroscope Based on Machine Learning and TTAO-VMD Algorithm.","authors":"Wenbo Tan, Yan Wang, Xinwang Wang","doi":"10.3390/mi17010120","DOIUrl":"10.3390/mi17010120","url":null,"abstract":"<p><p>The output of MEMS gyroscopes is highly vulnerable to ambient temperature variations, which induce temperature drift errors and degrade navigation precision. Consequently, temperature compensation for MEMS gyroscope outputs is of critical importance. To address this issue, this study proposes a novel temperature compensation model for the dual-mass vibration MEMS gyroscope (DMVMG), which integrates the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. The implementation process of the proposed model is as follows: firstly, the structural configuration and fundamental operating principle of the DMVMG are elaborated. Secondly, the temperature error compensation model is constructed based on the fusion of the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. Thirdly, the raw output signal of the DMVMG is preprocessed using the TTAO-VMD algorithm, which decomposes the signal into four distinct components, namely high-frequency noise, white noise, mixed noise, and temperature-induced noise. Subsequently, the high-frequency and white noise components are eliminated, while the mixed noise component is filtered via the SHAKF algorithm. On this basis, the 1D-CNN-Bi-GRU-Attention algorithm is adopted to establish the temperature error compensation model, with the temperature, temperature change rate, time, and temperature-induced noise as input variables. Finally, the optimized signal components are reconstructed to yield the temperature-compensated output of the DMVMG. The experimental results based on the Allan variance method demonstrate that the angle random walk (N) is reduced from 18.56 °/h to 0.17 °/h, and the bias instability (B) is decreased from 32.76 °/h to 0.82 °/h, verifying the effectiveness of the proposed method.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844188/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064811","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Micromanufacturing Process of Complex 3D FeCo Core Microwindings for Magnetic Flux Modulation in Micromotors. 用于微电机磁通调制的复杂三维FeCo铁芯微绕组的微制造工艺。
IF 3 3区 工程技术 Q2 CHEMISTRY, ANALYTICAL Pub Date : 2026-01-15 DOI: 10.3390/mi17010115
Efren Diez-Jimenez, Diego Lopez-Pascual, Gabriel Villalba-Alumbreros, Ignacio Valiente-Blanco, Miguel Fernandez-Munoz, Jesús Del Olmo-Anguix, Oscar Manzano-Narro, Alexander Kanitz, Jan Hoppius, Jan Philipp

This work presents the design, fabrication, and characterization of a three-dimensional FeCo-based flux-modulator microwinding intended for integration into high-torque axial-flux Vernier micromotors. The proposed micromotor architecture modulates the stator magnetic flux using 12 magnetically isolated FeCo teeth interacting with an 11-pole permanent-magnet rotor. The design requires the manufacturing of complex three-dimensional micrometric parts, including three teeth and a cylindrical core. Such a complex design cannot be manufactured using conventional micromanufacturing lithography or 2D planar methods. The flux-modulator envelope dimensions are 250 μm outer diameter and 355 μm height. It is manufactured using a femtosecond laser-machining process that preserves factory-finished surfaces and minimizes heat-affected zones. In addition, this micrometric part has been wound using 20 μm diameter enamelled copper wire. A dedicated magnetic clamping fixture is developed to enable multilayer microwinding of the integrated core, producing a 17-turn inductor with a 60.6% fill factor-the highest reported for a manually wound ferromagnetic-core microcoil of this scale. Geometric and magnetic characterization validates the simulation model and demonstrates the field distribution inside the isolated core. The results establish a viable micromanufacturing workflow for complex 3D FeCo microwindings, supporting the development of next-generation high-performance MEMS micromotors.

本研究提出了一种基于feco的三维磁通调制器微绕组的设计、制造和特性,用于集成到高转矩轴向磁通游标微电机中。所提出的微电机结构通过12个磁隔离的FeCo齿与一个11极永磁转子相互作用来调节定子磁通。该设计需要制造复杂的三维微米部件,包括三个齿和一个圆柱形芯。这种复杂的设计不能用传统的微制造光刻或二维平面方法来制造。磁通调制器包线尺寸为外径250 μm,高355 μm。它使用飞秒激光加工工艺制造,可以保留工厂成品表面并最大限度地减少热影响区域。此外,该微细部件采用直径20 μm的漆包铜线缠绕。开发了专用磁夹夹具,以实现集成磁芯的多层微绕组,产生17匝电感器,填充系数为60.6%,这是该规模手动绕线铁磁磁芯微线圈的最高报告。几何和磁性表征验证了仿真模型,并展示了孤立岩心内部的磁场分布。研究结果为复杂3D FeCo微绕组建立了可行的微制造工作流程,支持下一代高性能MEMS微电机的开发。
{"title":"Micromanufacturing Process of Complex 3D FeCo Core Microwindings for Magnetic Flux Modulation in Micromotors.","authors":"Efren Diez-Jimenez, Diego Lopez-Pascual, Gabriel Villalba-Alumbreros, Ignacio Valiente-Blanco, Miguel Fernandez-Munoz, Jesús Del Olmo-Anguix, Oscar Manzano-Narro, Alexander Kanitz, Jan Hoppius, Jan Philipp","doi":"10.3390/mi17010115","DOIUrl":"10.3390/mi17010115","url":null,"abstract":"<p><p>This work presents the design, fabrication, and characterization of a three-dimensional FeCo-based flux-modulator microwinding intended for integration into high-torque axial-flux Vernier micromotors. The proposed micromotor architecture modulates the stator magnetic flux using 12 magnetically isolated FeCo teeth interacting with an 11-pole permanent-magnet rotor. The design requires the manufacturing of complex three-dimensional micrometric parts, including three teeth and a cylindrical core. Such a complex design cannot be manufactured using conventional micromanufacturing lithography or 2D planar methods. The flux-modulator envelope dimensions are 250 μm outer diameter and 355 μm height. It is manufactured using a femtosecond laser-machining process that preserves factory-finished surfaces and minimizes heat-affected zones. In addition, this micrometric part has been wound using 20 μm diameter enamelled copper wire. A dedicated magnetic clamping fixture is developed to enable multilayer microwinding of the integrated core, producing a 17-turn inductor with a 60.6% fill factor-the highest reported for a manually wound ferromagnetic-core microcoil of this scale. Geometric and magnetic characterization validates the simulation model and demonstrates the field distribution inside the isolated core. The results establish a viable micromanufacturing workflow for complex 3D FeCo microwindings, supporting the development of next-generation high-performance MEMS micromotors.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844182/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064801","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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