Dongda Yang, Yao Chu, Ruitao Liu, Xiwen Zhang, Saifei Yuan, Fan Zhang, Shengjie Xuan, Yunzhang Chi, Jiahui Liu, Zetong Lei, Rui You
This article describes a global structure optimization methodology for microelectromechanical system devices based on a multi-objective elitist genetic algorithm. By integrating a parameterized model with a multi-objective evolutionary framework, the approach can efficiently explore design space and concurrently optimize multiple metrics. A differential capacitive MEMS accelerometer is presented to demonstrate the method. Four key objectives, including resonant frequency, static capacitance, dynamic capacitance, and feedback force, are simultaneously optimized to enhance sensitivity, bandwidth, and closed-loop driving capability. After 25 generations, the algorithm converged to a uniformly distributed Pareto front. The experimental results indicate that, compared with the initial design, the sensitivity-oriented design achieves a 56.1% reduction in static capacitance and an 85.5% improvement in sensitivity. The global multi-objective optimization achieves a normalized hypervolume of 35.8%, notably higher than the local structure optimization, demonstrating its superior design space coverage and trade-off capability. Compared to single-objective optimization, the multi-objective approach offers a superior strategy by avoiding the limitation of overemphasizing resonant frequency at the expense of other metrics, thereby enabling a comprehensive exploration of the design space.
{"title":"Structure Design Optimization of a Differential Capacitive MEMS Accelerometer Based on a Multi-Objective Elitist Genetic Algorithm.","authors":"Dongda Yang, Yao Chu, Ruitao Liu, Xiwen Zhang, Saifei Yuan, Fan Zhang, Shengjie Xuan, Yunzhang Chi, Jiahui Liu, Zetong Lei, Rui You","doi":"10.3390/mi17010129","DOIUrl":"10.3390/mi17010129","url":null,"abstract":"<p><p>This article describes a global structure optimization methodology for microelectromechanical system devices based on a multi-objective elitist genetic algorithm. By integrating a parameterized model with a multi-objective evolutionary framework, the approach can efficiently explore design space and concurrently optimize multiple metrics. A differential capacitive MEMS accelerometer is presented to demonstrate the method. Four key objectives, including resonant frequency, static capacitance, dynamic capacitance, and feedback force, are simultaneously optimized to enhance sensitivity, bandwidth, and closed-loop driving capability. After 25 generations, the algorithm converged to a uniformly distributed Pareto front. The experimental results indicate that, compared with the initial design, the sensitivity-oriented design achieves a 56.1% reduction in static capacitance and an 85.5% improvement in sensitivity. The global multi-objective optimization achieves a normalized hypervolume of 35.8%, notably higher than the local structure optimization, demonstrating its superior design space coverage and trade-off capability. Compared to single-objective optimization, the multi-objective approach offers a superior strategy by avoiding the limitation of overemphasizing resonant frequency at the expense of other metrics, thereby enabling a comprehensive exploration of the design space.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844434/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064738","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
To address the diverse requirements of satellite communication applications involving medium-/low-rate reliable links and high-rate high-capacity services, an integrated S/Ka dual-band dual-reflector antenna is proposed as an effective solution. Owing to the stringent spatial constraints of satellite platforms, the longer operating wavelengths in the S-band lead to oversized feed horns in the integrated antenna design, which induces severe secondary aperture blockage, thus degrading aperture efficiency and impeding practical mechanical layout implementation. To alleviate this critical drawback, the proposed antenna achieves multi-band aperture reuse by deploying an array with four miniaturized S-band radiating elements around a broadband Ka-band feed horn. A frequency-selective surface (FSS)-based sub-reflector is further designed to effectively enhance the effective aperture size for the S-band operation, while ensuring unobstructed electromagnetic propagation in the Ka-band, thus enabling simultaneous dual-band high-gain radiation. After comprehensive electromagnetic simulation and parametric optimization for the antenna feed and the FSS sub-reflector, experimental measurements verify that the S-band left-hand and right-hand circularly polarized (LHCP/RHCP) channels achieve more than 20.2 dBic gains with more than 6° half-power beamwidths (HPBWs), and the Ka-band channel yields gains exceeding 41.2 dBic, with HPBWs greater than 0.8°.
{"title":"A Spaceborne Integrated S/Ka Dual-Band Dual-Reflector Antenna.","authors":"Zenan Yang, Weiqiang Han, Liang Tang, Haihua Wang, Yilin Wang, Yongchang Jiao","doi":"10.3390/mi17010124","DOIUrl":"10.3390/mi17010124","url":null,"abstract":"<p><p>To address the diverse requirements of satellite communication applications involving medium-/low-rate reliable links and high-rate high-capacity services, an integrated S/Ka dual-band dual-reflector antenna is proposed as an effective solution. Owing to the stringent spatial constraints of satellite platforms, the longer operating wavelengths in the S-band lead to oversized feed horns in the integrated antenna design, which induces severe secondary aperture blockage, thus degrading aperture efficiency and impeding practical mechanical layout implementation. To alleviate this critical drawback, the proposed antenna achieves multi-band aperture reuse by deploying an array with four miniaturized S-band radiating elements around a broadband Ka-band feed horn. A frequency-selective surface (FSS)-based sub-reflector is further designed to effectively enhance the effective aperture size for the S-band operation, while ensuring unobstructed electromagnetic propagation in the Ka-band, thus enabling simultaneous dual-band high-gain radiation. After comprehensive electromagnetic simulation and parametric optimization for the antenna feed and the FSS sub-reflector, experimental measurements verify that the S-band left-hand and right-hand circularly polarized (LHCP/RHCP) channels achieve more than 20.2 dBic gains with more than 6° half-power beamwidths (HPBWs), and the Ka-band channel yields gains exceeding 41.2 dBic, with HPBWs greater than 0.8°.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12843968/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064749","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This work presents the design, fabrication, and experimental characterization of microelectromechanical system (MEMS) ultrasonic transducers engineered for multi-frequency operation in photoacoustic imaging (PAI). The proposed devices integrate multiple resonant geometries, including circular diaphragms, floated crosses, anchored cross membranes, and cantilever arrays, within compact footprints to overcome the inherently narrow frequency response of conventional MEMS transducers. All devices were fabricated using the PiezoMUMPs commercial microfabrication process, with finite element simulations guiding modal optimization and laser Doppler vibrometry used for experimental validation in air. The circular diaphragm exhibited a narrowband response with a dominant resonance at 1.69 MHz and a quality factor (Q) of 268, confirming the bandwidth limitations of traditional geometries. In contrast, complex designs such as the floated cross and cantilever arrays achieved significantly broader spectral responses, with resonances spanning from 275 kHz to beyond 7.5 MHz. The cantilever array, with systematically varied arm lengths, achieved the highest modal density through asynchronous activation across the spectrum. Results demonstrate that structurally diverse MEMS devices can overcome the bandwidth constraints of traditional piezoelectric transducers. The integration of heterogeneous MEMS geometries offers a viable approach for broadband sensitivity in PAI, enabling improved spatial resolution and depth selectivity without compromising miniaturization or manufacturability.
{"title":"Design, Fabrication and Characterization of Multi-Frequency MEMS Transducer for Photoacoustic Imaging.","authors":"Alberto Prud'homme, Frederic Nabki","doi":"10.3390/mi17010122","DOIUrl":"10.3390/mi17010122","url":null,"abstract":"<p><p>This work presents the design, fabrication, and experimental characterization of microelectromechanical system (MEMS) ultrasonic transducers engineered for multi-frequency operation in photoacoustic imaging (PAI). The proposed devices integrate multiple resonant geometries, including circular diaphragms, floated crosses, anchored cross membranes, and cantilever arrays, within compact footprints to overcome the inherently narrow frequency response of conventional MEMS transducers. All devices were fabricated using the PiezoMUMPs commercial microfabrication process, with finite element simulations guiding modal optimization and laser Doppler vibrometry used for experimental validation in air. The circular diaphragm exhibited a narrowband response with a dominant resonance at 1.69 MHz and a quality factor (Q) of 268, confirming the bandwidth limitations of traditional geometries. In contrast, complex designs such as the floated cross and cantilever arrays achieved significantly broader spectral responses, with resonances spanning from 275 kHz to beyond 7.5 MHz. The cantilever array, with systematically varied arm lengths, achieved the highest modal density through asynchronous activation across the spectrum. Results demonstrate that structurally diverse MEMS devices can overcome the bandwidth constraints of traditional piezoelectric transducers. The integration of heterogeneous MEMS geometries offers a viable approach for broadband sensitivity in PAI, enabling improved spatial resolution and depth selectivity without compromising miniaturization or manufacturability.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844338/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064829","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pak San Yip, Tiqing Zhao, Kefan Guo, Wenjun Liang, Ruihan Xu, Yi Zhang, Yang Lu
This review explores the variety of diamond-based sensing applications, emphasizing their material properties, such as high Young's modulus, thermal conductivity, wide bandgap, chemical stability, and radiation hardness. These diamond properties give excellent performance in mechanical, pressure, thermal, magnetic, optoelectronic, radiation, biosensing, quantum, and other applications. In vibration sensing, nano/poly/single-crystal diamond resonators operate from MHz to GHz frequencies, with high quality factor via CVD growth, diamond-on-insulator techniques, and ICP etching. Pressure sensing uses boron-doped piezoresistive, as well as capacitive and Fabry-Pérot readouts. Thermal sensing merges NV nanothermometry, single-crystal resonant thermometers, and resistive/diode sensors. Magnetic detection offers FeGa/Ti/diamond heterostructures, complementing NV. Optoelectronic applications utilize DUV photodiodes and color centers. Radiation detectors benefit from diamond's neutron conversion capability. Biosensing leverages boron-doped diamond and hydrogen-terminated SGFETs, as well as gas targets such as NO2/NH3/H2 via surface transfer doping and Pd Schottky/MIS. Imaging uses AFM/NV probes and boron-doped diamond tips. Persistent challenges, such as grain boundary losses in nanocrystalline diamond, limited diamond-on-insulator bonding yield, high temperature interface degradation, humidity-dependent gas transduction, stabilization of hydrogen termination, near-surface nitrogen-vacancy noise, and the cost of high-quality single-crystal diamond, are being addressed through interface and surface chemistry control, catalytic/dielectric stack engineering, photonic integration, and scalable chemical vapor deposition routes. These advances are enabling integrated, high-reliability diamond sensors for extreme and quantum-enhanced applications.
{"title":"Diamond Sensor Technologies: From Multi Stimulus to Quantum.","authors":"Pak San Yip, Tiqing Zhao, Kefan Guo, Wenjun Liang, Ruihan Xu, Yi Zhang, Yang Lu","doi":"10.3390/mi17010118","DOIUrl":"10.3390/mi17010118","url":null,"abstract":"<p><p>This review explores the variety of diamond-based sensing applications, emphasizing their material properties, such as high Young's modulus, thermal conductivity, wide bandgap, chemical stability, and radiation hardness. These diamond properties give excellent performance in mechanical, pressure, thermal, magnetic, optoelectronic, radiation, biosensing, quantum, and other applications. In vibration sensing, nano/poly/single-crystal diamond resonators operate from MHz to GHz frequencies, with high quality factor via CVD growth, diamond-on-insulator techniques, and ICP etching. Pressure sensing uses boron-doped piezoresistive, as well as capacitive and Fabry-Pérot readouts. Thermal sensing merges NV nanothermometry, single-crystal resonant thermometers, and resistive/diode sensors. Magnetic detection offers FeGa/Ti/diamond heterostructures, complementing NV. Optoelectronic applications utilize DUV photodiodes and color centers. Radiation detectors benefit from diamond's neutron conversion capability. Biosensing leverages boron-doped diamond and hydrogen-terminated SGFETs, as well as gas targets such as NO<sub>2</sub>/NH<sub>3</sub>/H<sub>2</sub> via surface transfer doping and Pd Schottky/MIS. Imaging uses AFM/NV probes and boron-doped diamond tips. Persistent challenges, such as grain boundary losses in nanocrystalline diamond, limited diamond-on-insulator bonding yield, high temperature interface degradation, humidity-dependent gas transduction, stabilization of hydrogen termination, near-surface nitrogen-vacancy noise, and the cost of high-quality single-crystal diamond, are being addressed through interface and surface chemistry control, catalytic/dielectric stack engineering, photonic integration, and scalable chemical vapor deposition routes. These advances are enabling integrated, high-reliability diamond sensors for extreme and quantum-enhanced applications.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844166/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064815","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This study aims to compare the surface roughness and fracture resistance of implant-supported permanent crowns additively manufactured using composite resins (Crowntec, VarseoSmile) versus subtractively manufactured polymer-infiltrated hybrid ceramic (VITA Enamic) at various wall thicknesses using an experimental setup as close to clinical as possible. 180 crowns were fabricated in three thicknesses (1.0, 1.5, and 2.0 mm) and cemented onto titanium abutments. Experimental groups underwent thermal aging (10,000 cycles) to simulate one year of clinical service. Surface roughness was measured via profilometry, and fracture resistance was assessed using a universal testing machine. Composite resin crowns exhibited lower surface roughness and lower fracture resistance than subtractively manufactured crowns. No significant difference in fracture resistance was found between materials at 1.0 mm (p > 0.05). However, at 1.5 and 2.0 mm, hybrid ceramic network crowns showed significantly higher resistance (p < 0.01). It was concluded that, within the limitations of this 1-year simulated study, both material-method combinations met the biological threshold for surface roughness. Regarding fracture resistance, composite resins and hybrid ceramics satisfied clinical requirements for molar bite forces only at thicknesses of 1.5 mm and above. 1.0 mm thickness may pose a risk under high occlusal loads.
{"title":"Mechanical Properties of Additively Manufactured Composite Resin vs. Subtractively Manufactured Hybrid Ceramic Implant-Supported Permanent Crowns Before and After Thermal Aging.","authors":"Nilufer Ipek Sahin, Emre Tokar","doi":"10.3390/mi17010116","DOIUrl":"10.3390/mi17010116","url":null,"abstract":"<p><p>This study aims to compare the surface roughness and fracture resistance of implant-supported permanent crowns additively manufactured using composite resins (Crowntec, VarseoSmile) versus subtractively manufactured polymer-infiltrated hybrid ceramic (VITA Enamic) at various wall thicknesses using an experimental setup as close to clinical as possible. 180 crowns were fabricated in three thicknesses (1.0, 1.5, and 2.0 mm) and cemented onto titanium abutments. Experimental groups underwent thermal aging (10,000 cycles) to simulate one year of clinical service. Surface roughness was measured via profilometry, and fracture resistance was assessed using a universal testing machine. Composite resin crowns exhibited lower surface roughness and lower fracture resistance than subtractively manufactured crowns. No significant difference in fracture resistance was found between materials at 1.0 mm (<i>p</i> > 0.05). However, at 1.5 and 2.0 mm, hybrid ceramic network crowns showed significantly higher resistance (<i>p</i> < 0.01). It was concluded that, within the limitations of this 1-year simulated study, both material-method combinations met the biological threshold for surface roughness. Regarding fracture resistance, composite resins and hybrid ceramics satisfied clinical requirements for molar bite forces only at thicknesses of 1.5 mm and above. 1.0 mm thickness may pose a risk under high occlusal loads.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844450/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064813","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub-wavelength lithography limits. Inverse lithography technology (ILT), a key part of computational lithography, has become a critical solution for these issues. From an EDA industry perspective, this review provides an original and systematic summary of ILT's development and applications, which helps integrate the scattered research into a clear framework for both academic and industrial use. Compared with traditional OPC, the latest ILT has three main advantages: (1) better patterning accuracy, as a result of the precise optical models that fix complex optical issues (like diffraction and interference) in advanced lithography systems; (2) a wider process window, as it optimizes mask designs by working backwards from the target wafer patterns, making lithography more stable against process changes; and (3) stronger adaptability to new lithography scenarios, such as High-NA EUV and extended DUV nodes. This review first explains ILT's working principles (the basic concepts, mathematical formulae, and main methods like level-set and pixelated approaches) and its development history, highlighting key events that boosted its progress. It then analyzes ILT's current application status in the industry (such as hotspot fixing, full-chip trials, and EUV-era use) and its main bottlenecks: a high computational complexity leading to long runtime, difficulties in mask manufacturing, challenges in model calibration, and a conservative market that slows large-scale adoption. Finally, it discusses promising future directions, including hybrid ILT-OPC-SMO strategies, improving model accuracy, AI/ML-driven design, GPU acceleration, multi-beam mask writer improvements, and open-source data to solve data shortage problems. By combining the latest research and industry practices, this review fills the gap of comprehensive ILT summaries that cover the principles, progress, applications, and prospects. It helps readers fully understand ILT's technical landscape and offers practical insights for solving the key challenges, thus promoting ILT's industrial use in advanced chip manufacturing.
{"title":"Inverse Lithography Technology (ILT) Under Chip Manufacture Context.","authors":"Xiaodong Meng, Cai Chen, Jie Ni","doi":"10.3390/mi17010117","DOIUrl":"10.3390/mi17010117","url":null,"abstract":"<p><p>As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub-wavelength lithography limits. Inverse lithography technology (ILT), a key part of computational lithography, has become a critical solution for these issues. From an EDA industry perspective, this review provides an original and systematic summary of ILT's development and applications, which helps integrate the scattered research into a clear framework for both academic and industrial use. Compared with traditional OPC, the latest ILT has three main advantages: (1) better patterning accuracy, as a result of the precise optical models that fix complex optical issues (like diffraction and interference) in advanced lithography systems; (2) a wider process window, as it optimizes mask designs by working backwards from the target wafer patterns, making lithography more stable against process changes; and (3) stronger adaptability to new lithography scenarios, such as High-NA EUV and extended DUV nodes. This review first explains ILT's working principles (the basic concepts, mathematical formulae, and main methods like level-set and pixelated approaches) and its development history, highlighting key events that boosted its progress. It then analyzes ILT's current application status in the industry (such as hotspot fixing, full-chip trials, and EUV-era use) and its main bottlenecks: a high computational complexity leading to long runtime, difficulties in mask manufacturing, challenges in model calibration, and a conservative market that slows large-scale adoption. Finally, it discusses promising future directions, including hybrid ILT-OPC-SMO strategies, improving model accuracy, AI/ML-driven design, GPU acceleration, multi-beam mask writer improvements, and open-source data to solve data shortage problems. By combining the latest research and industry practices, this review fills the gap of comprehensive ILT summaries that cover the principles, progress, applications, and prospects. It helps readers fully understand ILT's technical landscape and offers practical insights for solving the key challenges, thus promoting ILT's industrial use in advanced chip manufacturing.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12843865/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064709","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Plasmonics and metasurfaces (MSs) have emerged as two of the most influential platforms for manipulating light at the nanoscale, each offering complementary strengths that challenge the limits of conventional optical design. Plasmonics enables extreme subwavelength field confinement, ultrafast light-matter interaction, and strong optical nonlinearities, while MSs provide versatile and compact control over phase, amplitude, polarization, and dispersion through planar, nanostructured interfaces. Recent advances in materials, nanofabrication, and device engineering are increasingly enabling these technologies to be combined within unified planar and hybrid optical platforms. This review surveys the physical principles, material strategies, and device architectures that underpin plasmonic, MS, and hybrid plasmonic-dielectric systems, with an emphasis on interface-mediated optical functionality rather than long-range guided-wave propagation. Key developments in modulators, detectors, nanolasers, metalenses, beam steering devices, and programmable optical surfaces are discussed, highlighting how hybrid designs can leverage strong field localization alongside low-loss wavefront control. System-level challenges including optical loss, thermal management, dispersion engineering, and large-area fabrication are critically examined. Looking forward, plasmonic and MS technologies are poised to define a new generation of flat, multifunctional, and programmable optical systems. Applications spanning imaging, sensing, communications, augmented and virtual reality, and optical information processing illustrate the transformative potential of these platforms. By consolidating recent progress and outlining future directions, this review provides a coherent perspective on how plasmonics and MSs are reshaping the design space of next-generation planar optical hardware.
{"title":"Plasmonics Meets Metasurfaces: A Vision for Next Generation Planar Optical Systems.","authors":"Muhammad A Butt","doi":"10.3390/mi17010119","DOIUrl":"10.3390/mi17010119","url":null,"abstract":"<p><p>Plasmonics and metasurfaces (MSs) have emerged as two of the most influential platforms for manipulating light at the nanoscale, each offering complementary strengths that challenge the limits of conventional optical design. Plasmonics enables extreme subwavelength field confinement, ultrafast light-matter interaction, and strong optical nonlinearities, while MSs provide versatile and compact control over phase, amplitude, polarization, and dispersion through planar, nanostructured interfaces. Recent advances in materials, nanofabrication, and device engineering are increasingly enabling these technologies to be combined within unified planar and hybrid optical platforms. This review surveys the physical principles, material strategies, and device architectures that underpin plasmonic, MS, and hybrid plasmonic-dielectric systems, with an emphasis on interface-mediated optical functionality rather than long-range guided-wave propagation. Key developments in modulators, detectors, nanolasers, metalenses, beam steering devices, and programmable optical surfaces are discussed, highlighting how hybrid designs can leverage strong field localization alongside low-loss wavefront control. System-level challenges including optical loss, thermal management, dispersion engineering, and large-area fabrication are critically examined. Looking forward, plasmonic and MS technologies are poised to define a new generation of flat, multifunctional, and programmable optical systems. Applications spanning imaging, sensing, communications, augmented and virtual reality, and optical information processing illustrate the transformative potential of these platforms. By consolidating recent progress and outlining future directions, this review provides a coherent perspective on how plasmonics and MSs are reshaping the design space of next-generation planar optical hardware.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844466/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064771","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Nanohybrids consisting of quantum dots and graphene (QD/graphene) provides a unique scheme to design quantum sensors. The quantum confinement in QDs enables spectral tunability, while that in graphene provides superior photocarrier mobility. The combination of them allows for broadband light absorption and high photoconduction gain that in turn leads to high photoresponsivity in QD/Gr nanohybrid photodetectors. Since the first QD/graphene photodetector was reported in 2012, intensive research has been conducted on this topic. In this paper, a review of the recent progress made on QD/Gr nanohybrid photodetectors will be provided. Among many applications, there will be a particular focus on broadband and flexible photodetectors, which make use of the inherent advantages of the QD/Gr nanohybrids. The remaining challenges and future perspectives will be discussed in this emerging topic area.
{"title":"Broadband Flexible Quantum Dots/Graphene Photodetectors.","authors":"Judy Z Wu, Andrew Shultz","doi":"10.3390/mi17010121","DOIUrl":"10.3390/mi17010121","url":null,"abstract":"<p><p>Nanohybrids consisting of quantum dots and graphene (QD/graphene) provides a unique scheme to design quantum sensors. The quantum confinement in QDs enables spectral tunability, while that in graphene provides superior photocarrier mobility. The combination of them allows for broadband light absorption and high photoconduction gain that in turn leads to high photoresponsivity in QD/Gr nanohybrid photodetectors. Since the first QD/graphene photodetector was reported in 2012, intensive research has been conducted on this topic. In this paper, a review of the recent progress made on QD/Gr nanohybrid photodetectors will be provided. Among many applications, there will be a particular focus on broadband and flexible photodetectors, which make use of the inherent advantages of the QD/Gr nanohybrids. The remaining challenges and future perspectives will be discussed in this emerging topic area.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12843737/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064798","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The output of MEMS gyroscopes is highly vulnerable to ambient temperature variations, which induce temperature drift errors and degrade navigation precision. Consequently, temperature compensation for MEMS gyroscope outputs is of critical importance. To address this issue, this study proposes a novel temperature compensation model for the dual-mass vibration MEMS gyroscope (DMVMG), which integrates the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. The implementation process of the proposed model is as follows: firstly, the structural configuration and fundamental operating principle of the DMVMG are elaborated. Secondly, the temperature error compensation model is constructed based on the fusion of the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. Thirdly, the raw output signal of the DMVMG is preprocessed using the TTAO-VMD algorithm, which decomposes the signal into four distinct components, namely high-frequency noise, white noise, mixed noise, and temperature-induced noise. Subsequently, the high-frequency and white noise components are eliminated, while the mixed noise component is filtered via the SHAKF algorithm. On this basis, the 1D-CNN-Bi-GRU-Attention algorithm is adopted to establish the temperature error compensation model, with the temperature, temperature change rate, time, and temperature-induced noise as input variables. Finally, the optimized signal components are reconstructed to yield the temperature-compensated output of the DMVMG. The experimental results based on the Allan variance method demonstrate that the angle random walk (N) is reduced from 18.56 °/h to 0.17 °/h, and the bias instability (B) is decreased from 32.76 °/h to 0.82 °/h, verifying the effectiveness of the proposed method.
{"title":"A Novelty Temperature Compensation Model for Dual-Mass Vibration MEMS Gyroscope Based on Machine Learning and TTAO-VMD Algorithm.","authors":"Wenbo Tan, Yan Wang, Xinwang Wang","doi":"10.3390/mi17010120","DOIUrl":"10.3390/mi17010120","url":null,"abstract":"<p><p>The output of MEMS gyroscopes is highly vulnerable to ambient temperature variations, which induce temperature drift errors and degrade navigation precision. Consequently, temperature compensation for MEMS gyroscope outputs is of critical importance. To address this issue, this study proposes a novel temperature compensation model for the dual-mass vibration MEMS gyroscope (DMVMG), which integrates the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. The implementation process of the proposed model is as follows: firstly, the structural configuration and fundamental operating principle of the DMVMG are elaborated. Secondly, the temperature error compensation model is constructed based on the fusion of the TTAO-VMD, 1D-CNN-Bi-GRU-Attention, and SHAKF algorithms. Thirdly, the raw output signal of the DMVMG is preprocessed using the TTAO-VMD algorithm, which decomposes the signal into four distinct components, namely high-frequency noise, white noise, mixed noise, and temperature-induced noise. Subsequently, the high-frequency and white noise components are eliminated, while the mixed noise component is filtered via the SHAKF algorithm. On this basis, the 1D-CNN-Bi-GRU-Attention algorithm is adopted to establish the temperature error compensation model, with the temperature, temperature change rate, time, and temperature-induced noise as input variables. Finally, the optimized signal components are reconstructed to yield the temperature-compensated output of the DMVMG. The experimental results based on the Allan variance method demonstrate that the angle random walk (N) is reduced from 18.56 °/h to 0.17 °/h, and the bias instability (B) is decreased from 32.76 °/h to 0.82 °/h, verifying the effectiveness of the proposed method.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844188/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064811","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Efren Diez-Jimenez, Diego Lopez-Pascual, Gabriel Villalba-Alumbreros, Ignacio Valiente-Blanco, Miguel Fernandez-Munoz, Jesús Del Olmo-Anguix, Oscar Manzano-Narro, Alexander Kanitz, Jan Hoppius, Jan Philipp
This work presents the design, fabrication, and characterization of a three-dimensional FeCo-based flux-modulator microwinding intended for integration into high-torque axial-flux Vernier micromotors. The proposed micromotor architecture modulates the stator magnetic flux using 12 magnetically isolated FeCo teeth interacting with an 11-pole permanent-magnet rotor. The design requires the manufacturing of complex three-dimensional micrometric parts, including three teeth and a cylindrical core. Such a complex design cannot be manufactured using conventional micromanufacturing lithography or 2D planar methods. The flux-modulator envelope dimensions are 250 μm outer diameter and 355 μm height. It is manufactured using a femtosecond laser-machining process that preserves factory-finished surfaces and minimizes heat-affected zones. In addition, this micrometric part has been wound using 20 μm diameter enamelled copper wire. A dedicated magnetic clamping fixture is developed to enable multilayer microwinding of the integrated core, producing a 17-turn inductor with a 60.6% fill factor-the highest reported for a manually wound ferromagnetic-core microcoil of this scale. Geometric and magnetic characterization validates the simulation model and demonstrates the field distribution inside the isolated core. The results establish a viable micromanufacturing workflow for complex 3D FeCo microwindings, supporting the development of next-generation high-performance MEMS micromotors.
{"title":"Micromanufacturing Process of Complex 3D FeCo Core Microwindings for Magnetic Flux Modulation in Micromotors.","authors":"Efren Diez-Jimenez, Diego Lopez-Pascual, Gabriel Villalba-Alumbreros, Ignacio Valiente-Blanco, Miguel Fernandez-Munoz, Jesús Del Olmo-Anguix, Oscar Manzano-Narro, Alexander Kanitz, Jan Hoppius, Jan Philipp","doi":"10.3390/mi17010115","DOIUrl":"10.3390/mi17010115","url":null,"abstract":"<p><p>This work presents the design, fabrication, and characterization of a three-dimensional FeCo-based flux-modulator microwinding intended for integration into high-torque axial-flux Vernier micromotors. The proposed micromotor architecture modulates the stator magnetic flux using 12 magnetically isolated FeCo teeth interacting with an 11-pole permanent-magnet rotor. The design requires the manufacturing of complex three-dimensional micrometric parts, including three teeth and a cylindrical core. Such a complex design cannot be manufactured using conventional micromanufacturing lithography or 2D planar methods. The flux-modulator envelope dimensions are 250 μm outer diameter and 355 μm height. It is manufactured using a femtosecond laser-machining process that preserves factory-finished surfaces and minimizes heat-affected zones. In addition, this micrometric part has been wound using 20 μm diameter enamelled copper wire. A dedicated magnetic clamping fixture is developed to enable multilayer microwinding of the integrated core, producing a 17-turn inductor with a 60.6% fill factor-the highest reported for a manually wound ferromagnetic-core microcoil of this scale. Geometric and magnetic characterization validates the simulation model and demonstrates the field distribution inside the isolated core. The results establish a viable micromanufacturing workflow for complex 3D FeCo microwindings, supporting the development of next-generation high-performance MEMS micromotors.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"17 1","pages":""},"PeriodicalIF":3.0,"publicationDate":"2026-01-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12844182/pdf/","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146064801","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}