首页 > 最新文献

Nature Electronics最新文献

英文 中文
Spintronic digital compute-in-memory macro for efficient artificial intelligence 用于高效人工智能的自旋电子数字内存计算宏
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-28 DOI: 10.1038/s41928-025-01480-5
Conventional analogue compute-in-memory suffers from limited accuracy and reliability. Now, a spintronic digital compute-in-memory macro integrates in-bitcell multiplication and digitization, and flexible-precision accumulation, to deliver software-equivalent artificial intelligence accuracy. The macro achieves computation latencies of 7.4–29.6 ns and energy efficiencies of 7.02–112.3 tera-operations per second per watt.
传统的内存模拟计算精度和可靠性有限。现在,一个自旋电子数字内存计算宏集成了位元倍增和数字化,以及灵活的精度积累,以提供相当于软件的人工智能精度。该宏实现了7.4-29.6 ns的计算延迟和7.02-112.3 tb / s / w的能量效率。
{"title":"Spintronic digital compute-in-memory macro for efficient artificial intelligence","authors":"","doi":"10.1038/s41928-025-01480-5","DOIUrl":"10.1038/s41928-025-01480-5","url":null,"abstract":"Conventional analogue compute-in-memory suffers from limited accuracy and reliability. Now, a spintronic digital compute-in-memory macro integrates in-bitcell multiplication and digitization, and flexible-precision accumulation, to deliver software-equivalent artificial intelligence accuracy. The macro achieves computation latencies of 7.4–29.6 ns and energy efficiencies of 7.02–112.3 tera-operations per second per watt.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 11","pages":"1012-1013"},"PeriodicalIF":40.9,"publicationDate":"2025-10-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145381812","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An implantable CMOS deep-brain fluorescence imager with single-neuron resolution 具有单神经元分辨率的可植入CMOS深脑荧光成像仪
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01487-y
Sinan Yilmaz, Jaebin Choi, Ilke Uguz, Jongwoon Kim, Alejandro Akrouh, Adriaan J. Taal, Victoria Andino-Pavlovsky, Heyu Yin, Jason D. Fabbri, Laurent Moreaux, Michael Roukes, Kenneth L. Shepard
Optical imaging offers a number of advantages over electrophysiology including cell-type specificity. However, its application has been limited to the investigation of shallow brain regions (less than 2 mm) because of the light scattering property of brain tissue. Passive optical conduits, such as graded-index lenses and waveguides, have permitted access to deeper locales but with restricted resolution and field of view, while creating massive lesions along the inserted path. Here we report an implantable complementary metal–oxide–semiconductor fluorescence imager with single-neuron resolution. The imager has a 512-pixel silicon image sensor post-processed into a 4.1-mm-long, 120-μm-wide shank with a collinear fibre for illumination. It can record transient fluorescent signals in deep brain regions at 400 frames per second. We show that the system can offer single-neuron resolution in functional imaging of GCaMP6s-expressing neurons at a frame rate of 400 frames per second. A complementary metal–oxide–semiconductor (CMOS) imager that has a 512-pixel silicon image sensor post-processed into a 4.1-mm-long, 120-μm-wide shank with a collinear fibre for illumination can be used to record transient fluorescent signals in deep brain regions at 400 frames per second.
光学成像提供了许多优于电生理学的优势,包括细胞类型特异性。然而,由于脑组织的光散射特性,它的应用仅限于对大脑浅区(小于2mm)的研究。无源光学导管,如分级折射率透镜和波导,可以进入更深的区域,但分辨率和视野有限,同时在插入路径上产生大量病变。在这里,我们报告了一种可植入的互补金属氧化物半导体荧光成像仪,具有单神经元分辨率。成像仪具有512像素的硅图像传感器,后处理成4.1 mm长,120 μm宽的柄,带有共线光纤用于照明。它可以以每秒400帧的速度记录大脑深部区域的瞬时荧光信号。我们表明,该系统可以以每秒400帧的帧速率提供表达gcamp6s的神经元的单神经元功能成像分辨率。互补金属氧化物半导体(CMOS)成像仪将512像素的硅图像传感器后处理成4.1 mm长、120 μm宽的柄,并用共线光纤照明,可用于以每秒400帧的速度记录大脑深部区域的瞬态荧光信号。
{"title":"An implantable CMOS deep-brain fluorescence imager with single-neuron resolution","authors":"Sinan Yilmaz, Jaebin Choi, Ilke Uguz, Jongwoon Kim, Alejandro Akrouh, Adriaan J. Taal, Victoria Andino-Pavlovsky, Heyu Yin, Jason D. Fabbri, Laurent Moreaux, Michael Roukes, Kenneth L. Shepard","doi":"10.1038/s41928-025-01487-y","DOIUrl":"10.1038/s41928-025-01487-y","url":null,"abstract":"Optical imaging offers a number of advantages over electrophysiology including cell-type specificity. However, its application has been limited to the investigation of shallow brain regions (less than 2 mm) because of the light scattering property of brain tissue. Passive optical conduits, such as graded-index lenses and waveguides, have permitted access to deeper locales but with restricted resolution and field of view, while creating massive lesions along the inserted path. Here we report an implantable complementary metal–oxide–semiconductor fluorescence imager with single-neuron resolution. The imager has a 512-pixel silicon image sensor post-processed into a 4.1-mm-long, 120-μm-wide shank with a collinear fibre for illumination. It can record transient fluorescent signals in deep brain regions at 400 frames per second. We show that the system can offer single-neuron resolution in functional imaging of GCaMP6s-expressing neurons at a frame rate of 400 frames per second. A complementary metal–oxide–semiconductor (CMOS) imager that has a 512-pixel silicon image sensor post-processed into a 4.1-mm-long, 120-μm-wide shank with a collinear fibre for illumination can be used to record transient fluorescent signals in deep brain regions at 400 frames per second.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 12","pages":"1247-1258"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145381817","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Breaking the submicrometre barrier of printed electronics 打破印刷电子产品的亚微米障碍
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01486-z
Jun-Chan Choi, Seungjun Chung
A capillary flow printing technique can create printed carbon nanotube transistors with channel lengths below 500 nm.
毛细管流动印刷技术可以制造出通道长度小于500纳米的印刷碳纳米管晶体管。
{"title":"Breaking the submicrometre barrier of printed electronics","authors":"Jun-Chan Choi, Seungjun Chung","doi":"10.1038/s41928-025-01486-z","DOIUrl":"10.1038/s41928-025-01486-z","url":null,"abstract":"A capillary flow printing technique can create printed carbon nanotube transistors with channel lengths below 500 nm.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 11","pages":"1002-1003"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145382424","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Direct bonding and debonding of two-dimensional semiconductors 二维半导体的直接键合与脱键
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01474-3
Jieying Liu, Jiaojiao Zhao, Tong Li, Depeng Ji, Liyan Dai, Lu Li, Zheng Wei, JiaWei Li, Qinqin Wang, Hua Yu, Lanying Zhou, Yutong Chen, Fanfan Wu, Mingtong Zhu, Huacong Sun, Yun Li, Songge Zhang, Jinpeng Tian, Xingchao Zhang, Nianpeng Lu, Xuedong Bai, Zexian Cao, Shenghuang Lin, Shuopei Wang, Dongxia Shi, Na Li, Luojun Du, Wei Yang, LeDe Xian, Guangyu Zhang
Two-dimensional (2D) semiconductors are promising building blocks for advanced electronic devices. However, the fabrication of high-quality 2D semiconductor wafers with engineered layers remains a challenge. Here we describe a direct wafer bonding and debonding method that can be applied to semiconductor monolayers that have been grown epitaxially on high-adhesion substrates such as sapphire. The process operates in both vacuum and a glovebox environment and requires no intermediate-layer assistance. It produces stacked 2D semiconductors with clean interfaces and wafer-scale uniformity and allows precise control of layer numbers and the interlayer twist angle. We use the approach to create different homostructures and heterostructures with 2D monolayers, including molybdenum disulfide (MoS2) and molybdenum diselenide (MoSe2). We also show that the approach can directly bond monolayer MoS2 onto high-κ dielectric substrates (HfO2 and Al2O3) while preserving its intrinsic electronic properties. A bonding and debonding strategy is used to stack epitaxially grown semiconductor monolayers into various structures with precise control of the layer number and interlayer twist angle.
二维(2D)半导体是先进电子设备的重要组成部分。然而,制造高质量的具有工程层的二维半导体晶圆仍然是一个挑战。在这里,我们描述了一种直接晶圆键合和脱键的方法,这种方法可以应用于在高附着力衬底(如蓝宝石)上外延生长的半导体单层。该过程在真空和手套箱环境中操作,不需要中间层的协助。它生产的堆叠2D半导体具有干净的界面和晶圆级均匀性,并允许精确控制层数和层间扭转角。我们使用该方法在二维单层上创建了不同的同质结构和异质结构,包括二硫化钼(MoS2)和二硒化钼(MoSe2)。我们还表明,该方法可以直接将单层MoS2键合到高κ介电衬底(HfO2和Al2O3)上,同时保持其固有的电子特性。在精确控制层数和层间扭角的情况下,采用键合和脱键策略将外延生长的半导体单层堆叠成各种结构。
{"title":"Direct bonding and debonding of two-dimensional semiconductors","authors":"Jieying Liu, Jiaojiao Zhao, Tong Li, Depeng Ji, Liyan Dai, Lu Li, Zheng Wei, JiaWei Li, Qinqin Wang, Hua Yu, Lanying Zhou, Yutong Chen, Fanfan Wu, Mingtong Zhu, Huacong Sun, Yun Li, Songge Zhang, Jinpeng Tian, Xingchao Zhang, Nianpeng Lu, Xuedong Bai, Zexian Cao, Shenghuang Lin, Shuopei Wang, Dongxia Shi, Na Li, Luojun Du, Wei Yang, LeDe Xian, Guangyu Zhang","doi":"10.1038/s41928-025-01474-3","DOIUrl":"10.1038/s41928-025-01474-3","url":null,"abstract":"Two-dimensional (2D) semiconductors are promising building blocks for advanced electronic devices. However, the fabrication of high-quality 2D semiconductor wafers with engineered layers remains a challenge. Here we describe a direct wafer bonding and debonding method that can be applied to semiconductor monolayers that have been grown epitaxially on high-adhesion substrates such as sapphire. The process operates in both vacuum and a glovebox environment and requires no intermediate-layer assistance. It produces stacked 2D semiconductors with clean interfaces and wafer-scale uniformity and allows precise control of layer numbers and the interlayer twist angle. We use the approach to create different homostructures and heterostructures with 2D monolayers, including molybdenum disulfide (MoS2) and molybdenum diselenide (MoSe2). We also show that the approach can directly bond monolayer MoS2 onto high-κ dielectric substrates (HfO2 and Al2O3) while preserving its intrinsic electronic properties. A bonding and debonding strategy is used to stack epitaxially grown semiconductor monolayers into various structures with precise control of the layer number and interlayer twist angle.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 11","pages":"1038-1045"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145381815","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The development of carbon-neutral data centres in space 发展空间碳中和数据中心
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01476-1
Ablimit Aili, Jihwan Choi, Yew Soon Ong, Yonggang Wen
The increasing occupation of space orbits by fleets of satellites has led to increasing generation of data in space. At the same time, the expansion of technologies such as artificial intelligence (AI) has led to an increasing number of energy-intensive data centres, which have large carbon footprints, back on Earth. The former calls for space-based computing solutions, whereas the latter calls for carbon-neutral computing solutions. Here we explore the potential of developing carbon-neutral data centres in space. Such an approach would be enabled by the sustainability features of space: abundant solar energy that can be captured with high-efficiency solar cells and a giant cold heat sink (deep space itself) that can spontaneously take in large amounts of waste heat released from computing. We outline a framework for orbital edge data centres, which would be equipped with data sensors and AI accelerators, for carbon-neutral data processing at source in space. We then outline a framework for orbital cloud data centres in the form of a constellation of computational satellites equipped with servers and broadband connectivity, for both in-space and ground-outsourced computing applications. We also provide a method to evaluate the lifecycle carbon usage effectiveness of these cloud data centres. This Perspective explores the potential of developing carbon-neutral data centres in space, providing frameworks for orbital edge data centres, which would be equipped with data sensors and AI accelerators, and orbital cloud data centres, which would be based on constellations of computational satellites equipped with servers and broadband connectivity.
由于卫星编队越来越多地占用空间轨道,导致在空间产生越来越多的数据。与此同时,人工智能(AI)等技术的发展导致地球上能源密集型数据中心的数量不断增加,这些数据中心的碳足迹很大。前者需要基于空间的计算解决方案,而后者需要碳中性的计算解决方案。在这里,我们探讨在太空中发展碳中和数据中心的潜力。这种方法可以通过太空的可持续性特性实现:可以利用高效太阳能电池捕获丰富的太阳能,以及一个巨大的冷散热器(深空本身),可以自发地吸收从计算中释放的大量废热。我们概述了轨道边缘数据中心的框架,该数据中心将配备数据传感器和人工智能加速器,用于在空间源头进行碳中性数据处理。然后,我们概述了轨道云数据中心的框架,其形式是配备服务器和宽带连接的计算卫星星座,用于空间和地面外包计算应用。我们还提供了一种方法来评估这些云数据中心的生命周期碳使用效率。本展望探讨了在空间发展碳中性数据中心的潜力,为轨道边缘数据中心和轨道云数据中心提供了框架,前者将配备数据传感器和人工智能加速器,后者将基于配备服务器和宽带连接的计算卫星群。
{"title":"The development of carbon-neutral data centres in space","authors":"Ablimit Aili, Jihwan Choi, Yew Soon Ong, Yonggang Wen","doi":"10.1038/s41928-025-01476-1","DOIUrl":"10.1038/s41928-025-01476-1","url":null,"abstract":"The increasing occupation of space orbits by fleets of satellites has led to increasing generation of data in space. At the same time, the expansion of technologies such as artificial intelligence (AI) has led to an increasing number of energy-intensive data centres, which have large carbon footprints, back on Earth. The former calls for space-based computing solutions, whereas the latter calls for carbon-neutral computing solutions. Here we explore the potential of developing carbon-neutral data centres in space. Such an approach would be enabled by the sustainability features of space: abundant solar energy that can be captured with high-efficiency solar cells and a giant cold heat sink (deep space itself) that can spontaneously take in large amounts of waste heat released from computing. We outline a framework for orbital edge data centres, which would be equipped with data sensors and AI accelerators, for carbon-neutral data processing at source in space. We then outline a framework for orbital cloud data centres in the form of a constellation of computational satellites equipped with servers and broadband connectivity, for both in-space and ground-outsourced computing applications. We also provide a method to evaluate the lifecycle carbon usage effectiveness of these cloud data centres. This Perspective explores the potential of developing carbon-neutral data centres in space, providing frameworks for orbital edge data centres, which would be equipped with data sensors and AI accelerators, and orbital cloud data centres, which would be based on constellations of computational satellites equipped with servers and broadband connectivity.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 11","pages":"1016-1026"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145381814","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
100 years of field-effect transistors 100年的场效应晶体管
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01498-9
Transistors are central to modern technology, a role that has been made possible by continuous advances in silicon devices. But how exactly further advances will be achieved is less clear.
晶体管是现代技术的核心,硅器件的不断进步使其成为可能。但究竟如何取得进一步进展尚不清楚。
{"title":"100 years of field-effect transistors","authors":"","doi":"10.1038/s41928-025-01498-9","DOIUrl":"10.1038/s41928-025-01498-9","url":null,"abstract":"Transistors are central to modern technology, a role that has been made possible by continuous advances in silicon devices. But how exactly further advances will be achieved is less clear.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 10","pages":"871-871"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.nature.comhttps://www.nature.com/articles/s41928-025-01498-9.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145371976","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A spiking artificial neuron based on one diffusive memristor, one transistor and one resistor 基于一个扩散性忆阻器、一个晶体管和一个电阻器的尖峰人工神经元
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01488-x
Ruoyu Zhao, Tong Wang, Taehwan Moon, Yichun Xu, Jian Zhao, Piyush Sud, Seung Ju Kim, Han-Ting Liao, Ye Zhuo, Rivu Midya, Shiva Asapu, Dawei Gao, Zixuan Rong, Qinru Qiu, Cynthia Bowers, Krishnamurthy Mahalingam, S. Ganguli, A. K. Roy, Qing Wu, Jin-Woo Han, R. Stanley Williams, Yong Chen, J. Joshua Yang
Neuromorphic computing could be used to create artificial intelligence with high compactness and efficiency. However, complementary metal–oxide–semiconductor (CMOS) circuits are inherently different to biological neurons, and intricate CMOS circuits are needed to realize neuromorphic behaviours. Diffusive memristors are based on ion dynamics and have similarities with biological neurons. They could, thus, be used to create energy- and area-efficient neuromorphic systems. Here we describe a spiking artificial neuron comprising one diffusive memristor, one transistor and one resistor (1M1T1R), which occupies the footprint of a single transistor when vertically integrated. Our neuron exhibits six key neuronal characteristics: leaky integration, threshold firing, cascaded connection, intrinsic plasticity, refractory period and stochasticity. The energy consumption of our 1M1T1R neuron reaches the picojoule per spike level and could reach attojoule per spike levels with further scaling. We simulate a recurrent spiking neural network based on our artificial neuron model and show the impact of the key neuronal characteristics on system performance. An artificial neuron that is based on one diffusive memristor, one transistor and one resistor can exhibit six key biological neuronal characteristics—leaky integration, threshold firing, cascaded connection, intrinsic plasticity, refractory period and stochasticity—with the footprint of a single transistor when vertically integrated.
神经形态计算可以用来创造高度紧凑和高效的人工智能。然而,互补金属氧化物半导体(CMOS)电路本质上不同于生物神经元,需要复杂的CMOS电路来实现神经形态行为。扩散性忆阻器基于离子动力学原理,与生物神经元有相似之处。因此,它们可以用来创造能量和面积效率高的神经形态系统。在这里,我们描述了一个由一个扩散忆阻器、一个晶体管和一个电阻(1M1T1R)组成的尖峰人工神经元,当垂直集成时,它占用单个晶体管的占地面积。我们的神经元表现出六个关键的神经元特征:泄漏整合、阈值放电、级联连接、内在可塑性、不应期和随机性。我们的1M1T1R神经元的能量消耗达到了每尖峰皮焦耳的水平,如果进一步扩展,可以达到每尖峰1焦耳的水平。我们在人工神经元模型的基础上模拟了一个循环尖峰神经网络,并展示了关键神经元特征对系统性能的影响。一个人造神经元基于一个扩散性忆阻器、一个晶体管和一个电阻器,可以展示六个关键的生物神经元特征——漏集成、阈值激发、级联连接、内在可塑性、不应期和随机性——而当垂直集成时,它的覆盖面积只有一个晶体管。
{"title":"A spiking artificial neuron based on one diffusive memristor, one transistor and one resistor","authors":"Ruoyu Zhao, Tong Wang, Taehwan Moon, Yichun Xu, Jian Zhao, Piyush Sud, Seung Ju Kim, Han-Ting Liao, Ye Zhuo, Rivu Midya, Shiva Asapu, Dawei Gao, Zixuan Rong, Qinru Qiu, Cynthia Bowers, Krishnamurthy Mahalingam, S. Ganguli, A. K. Roy, Qing Wu, Jin-Woo Han, R. Stanley Williams, Yong Chen, J. Joshua Yang","doi":"10.1038/s41928-025-01488-x","DOIUrl":"10.1038/s41928-025-01488-x","url":null,"abstract":"Neuromorphic computing could be used to create artificial intelligence with high compactness and efficiency. However, complementary metal–oxide–semiconductor (CMOS) circuits are inherently different to biological neurons, and intricate CMOS circuits are needed to realize neuromorphic behaviours. Diffusive memristors are based on ion dynamics and have similarities with biological neurons. They could, thus, be used to create energy- and area-efficient neuromorphic systems. Here we describe a spiking artificial neuron comprising one diffusive memristor, one transistor and one resistor (1M1T1R), which occupies the footprint of a single transistor when vertically integrated. Our neuron exhibits six key neuronal characteristics: leaky integration, threshold firing, cascaded connection, intrinsic plasticity, refractory period and stochasticity. The energy consumption of our 1M1T1R neuron reaches the picojoule per spike level and could reach attojoule per spike levels with further scaling. We simulate a recurrent spiking neural network based on our artificial neuron model and show the impact of the key neuronal characteristics on system performance. An artificial neuron that is based on one diffusive memristor, one transistor and one resistor can exhibit six key biological neuronal characteristics—leaky integration, threshold firing, cascaded connection, intrinsic plasticity, refractory period and stochasticity—with the footprint of a single transistor when vertically integrated.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 12","pages":"1211-1221"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145381962","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Emerging characterization challenges 新出现的表征挑战
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1038/s41928-025-01497-w
Characterizing the performance and assessing the technological potential of devices based on emerging semiconductors such as perovskites is challenging. Third-party certification processes, as well as more standardized approaches to device testing, could help.
表征性能和评估基于新兴半导体(如钙钛矿)的设备的技术潜力是具有挑战性的。第三方认证流程以及更标准化的设备测试方法可能会有所帮助。
{"title":"Emerging characterization challenges","authors":"","doi":"10.1038/s41928-025-01497-w","DOIUrl":"10.1038/s41928-025-01497-w","url":null,"abstract":"Characterizing the performance and assessing the technological potential of devices based on emerging semiconductors such as perovskites is challenging. Third-party certification processes, as well as more standardized approaches to device testing, could help.","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 10","pages":"872-872"},"PeriodicalIF":40.9,"publicationDate":"2025-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.nature.comhttps://www.nature.com/articles/s41928-025-01497-w.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145371973","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Implantable fibres made of rolled-up electronics 由卷起的电子产品制成的可植入纤维
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-20 DOI: 10.1038/s41928-025-01492-1
Yan Huang
{"title":"Implantable fibres made of rolled-up electronics","authors":"Yan Huang","doi":"10.1038/s41928-025-01492-1","DOIUrl":"10.1038/s41928-025-01492-1","url":null,"abstract":"","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 10","pages":"877-877"},"PeriodicalIF":40.9,"publicationDate":"2025-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145371974","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A thin hydrogel that won’t dry out 一种不会变干的薄水凝胶
IF 40.9 1区 工程技术 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-20 DOI: 10.1038/s41928-025-01493-0
Matthew Parker
{"title":"A thin hydrogel that won’t dry out","authors":"Matthew Parker","doi":"10.1038/s41928-025-01493-0","DOIUrl":"10.1038/s41928-025-01493-0","url":null,"abstract":"","PeriodicalId":19064,"journal":{"name":"Nature Electronics","volume":"8 10","pages":"878-878"},"PeriodicalIF":40.9,"publicationDate":"2025-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145371952","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Nature Electronics
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1