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2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)最新文献

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LNOI photonics fabricated on Si wafer by room temperature bonding 室温键合在硅片上制备LNOI光子学
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598368
Kaname Watanabe, Yuya Yamaguchi, A. Kanno, R. Takigawa
Room temperature bonding is essential for wafer-level heterogeneous integration of LiNbO3-on-insulator (LNOI) photonics to Si. This paper reports first demonstration of thin film LNOI optical modulator arrays fabricated on Si wafer by room-temperature wafer bonding with Si nanoadhesive layer.
室温键合对于LiNbO3-on-insulator (LNOI)光子学与Si的晶圆级非均质集成是必不可少的。本文首次在硅片上用硅纳米胶粘剂层室温键合制备了薄膜LNOI光调制器阵列。
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引用次数: 0
Upconversion Material-Mediated Semiconductor Bonding 上转换材料介导半导体键合
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598362
N. Sano, Kosuke Nishigaya, K. Tanabe
Semiconductor wafer bonding, mediated by upconversion materials, is proposed and demonstrated. Upconversion is a process that converts long wavelength light into short wavelength light, and is expected to be applied to a variety of optoelectronic devices. Bonding with high electrical conductivity and imparting optical properties to the interface is realized by utilizing an adhesive viscous organic matrix with embedded upcinversiion nanoparticles. The application of this method to multijunction solar cells is expected.
提出并论证了上转换材料介导的半导体晶圆键合。上转换是将长波长光转换为短波长的过程,有望应用于各种光电器件。利用嵌入上翻纳米颗粒的粘性有机基质,实现了具有高导电性和赋予界面光学性质的键合。该方法有望应用于多结太阳能电池。
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引用次数: 0
Reproduction Analysis of Fatigue Crack Networks in Sn-Ag-Cu Die Attach Joint by FEA Sn-Ag-Cu模具连接接头疲劳裂纹网络的有限元再现分析
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598392
Hiroki Kanai, Y. Kariya, Yoshiki Abe, Y. Yokoyama, Koki Ochi, Ryuichiro Hanada, S. Izuo
The formation process of fatigue crack networks in Sn-Ag-Cu die attach joint was experimentally observed, and reproduced by the Finite Element method Analysis (FEA) based on a crack initiation rule described by the logistic function and Paris type fatigue crack propagation law.
实验观察了Sn-Ag-Cu模具连接接头疲劳裂纹网络的形成过程,并基于logistic函数描述的裂纹起裂规律和Paris型疲劳裂纹扩展规律进行了有限元分析。
{"title":"Reproduction Analysis of Fatigue Crack Networks in Sn-Ag-Cu Die Attach Joint by FEA","authors":"Hiroki Kanai, Y. Kariya, Yoshiki Abe, Y. Yokoyama, Koki Ochi, Ryuichiro Hanada, S. Izuo","doi":"10.1109/LTB-3D53950.2021.9598392","DOIUrl":"https://doi.org/10.1109/LTB-3D53950.2021.9598392","url":null,"abstract":"The formation process of fatigue crack networks in Sn-Ag-Cu die attach joint was experimentally observed, and reproduced by the Finite Element method Analysis (FEA) based on a crack initiation rule described by the logistic function and Paris type fatigue crack propagation law.","PeriodicalId":198318,"journal":{"name":"2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2021-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131946308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improved Process for Room-temperature Bonding Multiple GaAs Thin Plates to Develop Wavelength-conversion Devices 改进的室温多砷化镓薄板键合工艺以开发波长转换器件
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598399
Yuki Takahashi, Chokutaro Kawai, I. Shoji
Improved fabrication process enables us to reduce the internal scattering loss of a quasi-phase-matching (QPM) stack of multiple GaAs thin plates. This is accomplished by setting GaAs plates on YAG crystals with laser-grade flat surfaces. The loss per interface (at 1.5 μm) of the fabricated 25-plate stacked GaAs QPM device is 1.8 %, which is 70 % smaller than the 11-plate stack fabricated with the previous process.
改进的制备工艺使我们能够降低多个砷化镓薄板的准相位匹配(QPM)堆叠的内部散射损失。这是通过在具有激光级平面的YAG晶体上设置GaAs板来完成的。所制备的25片堆叠GaAs QPM器件的每个界面(1.5 μm处)损耗为1.8%,比用先前工艺制备的11片堆叠器件的损耗小70%。
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引用次数: 0
Towards Hybrid Optical Components via Non-Planar Direct Bonding 基于非平面直接键合的混合光学元件
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598402
P. Birckigt, C. Rothhardt, S. Risse, U. Zeitner
Here, we tackle the paradigm that direct bonding of planar wafers is not suitable on non-planar substrates. In doing so, we also present a new method for measuring the interface surface energy. This yields first guidelines for manufacturing novel optical components which combine different optical properties.
在这里,我们解决了平面晶圆不适合在非平面基板上直接键合的范例。在此过程中,我们还提出了一种测量界面表面能的新方法。这产生了制造结合不同光学特性的新型光学元件的第一个指导方针。
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引用次数: 1
Sputtering Technique to Fabricate Smooth Surface Oxide Film for Room Temperature Bonding 制备表面光滑氧化膜的溅射技术
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598432
T. Saito, T. Hanasaki, T. Moriwaki, T. Goto, A. Takeda, A. Miura, M. Uomoto, T. Shimatsu
200-nm-thick SiO2 films were deposited on Si wafers using a bias sputtering apparatus with dual cathodes controlled by a plasma-balanced-system (PLABAS). Surface roughness Sa of SiO2 deposited films was extremely small: 0.10 nm. Bonding using the smooth surface was demonstrated.
利用等离子体平衡系统(PLABAS)控制的双阴极偏压溅射装置在硅晶片上沉积了200 nm厚的SiO2薄膜。SiO2沉积膜的表面粗糙度Sa极小,仅为0.10 nm。用光滑的表面进行了粘接。
{"title":"Sputtering Technique to Fabricate Smooth Surface Oxide Film for Room Temperature Bonding","authors":"T. Saito, T. Hanasaki, T. Moriwaki, T. Goto, A. Takeda, A. Miura, M. Uomoto, T. Shimatsu","doi":"10.1109/LTB-3D53950.2021.9598432","DOIUrl":"https://doi.org/10.1109/LTB-3D53950.2021.9598432","url":null,"abstract":"200-nm-thick SiO<inf>2</inf> films were deposited on Si wafers using a bias sputtering apparatus with dual cathodes controlled by a plasma-balanced-system (PLABAS). Surface roughness S<inf>a</inf> of SiO<inf>2</inf> deposited films was extremely small: 0.10 nm. Bonding using the smooth surface was demonstrated.","PeriodicalId":198318,"journal":{"name":"2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2021-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121644792","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Luminous Light-Emitting Diodes for Automotive Headlamps Fabricated Using Surface Activated Bonding 用表面活化键合制造汽车前照灯用高亮度发光二极管
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598375
M. Ichikawa, S. Shichijo, H. Sagawa, S. Bando, Y. Nishioka, D. Wakamatsu, M. Sano, I. Nii, T. Mukai
The luminous flux and temperature characteristics of InGaN-based white light-emitting diodes (LEDs) intended for automotive headlamps were greatly enhanced by bonding a yellow phosphor to the LED chip using surface activated bonding. The performance of these LEDs was found to be suitable for use as headlamps.
采用表面激活键合的方法将黄色荧光粉粘接到LED芯片上,大大提高了用于汽车前照灯的ingan基白光发光二极管(LED)的光通量和温度特性。这些led的性能被发现适合用作头灯。
{"title":"High Luminous Light-Emitting Diodes for Automotive Headlamps Fabricated Using Surface Activated Bonding","authors":"M. Ichikawa, S. Shichijo, H. Sagawa, S. Bando, Y. Nishioka, D. Wakamatsu, M. Sano, I. Nii, T. Mukai","doi":"10.1109/LTB-3D53950.2021.9598375","DOIUrl":"https://doi.org/10.1109/LTB-3D53950.2021.9598375","url":null,"abstract":"The luminous flux and temperature characteristics of InGaN-based white light-emitting diodes (LEDs) intended for automotive headlamps were greatly enhanced by bonding a yellow phosphor to the LED chip using surface activated bonding. The performance of these LEDs was found to be suitable for use as headlamps.","PeriodicalId":198318,"journal":{"name":"2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2021-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129731231","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Delamination Analysis of Stacked Via in High-Density Multilayer Printed Wiring Boards by FEA 高密度多层印刷线路板堆叠通孔分层分析
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598404
Moe Nozaki, Y. Kariya, Yoshiyuki Hiroshima, Nobuo Taketomi, K. Ohashi, Kenichi Tomioka, Shunichi Kikuchi, Jack Tan
The effects of structural factors on the delamination of the stacked via in high-density multilayer printed wiring boards were investigated by a statistical approach. Although reducing the height of via or the number of via stacks is effective to prevent the delamination, if these cannot be reduced, the risk of the delamination is eased by increasing the pitch of the stacked via.
采用统计方法研究了结构因素对高密度多层印刷线路板中堆叠通孔分层的影响。虽然降低通孔的高度或通孔堆叠的数量可以有效地防止分层,但如果不能减少这些,则可以通过增加堆叠的通孔的间距来减轻分层的风险。
{"title":"Delamination Analysis of Stacked Via in High-Density Multilayer Printed Wiring Boards by FEA","authors":"Moe Nozaki, Y. Kariya, Yoshiyuki Hiroshima, Nobuo Taketomi, K. Ohashi, Kenichi Tomioka, Shunichi Kikuchi, Jack Tan","doi":"10.1109/LTB-3D53950.2021.9598404","DOIUrl":"https://doi.org/10.1109/LTB-3D53950.2021.9598404","url":null,"abstract":"The effects of structural factors on the delamination of the stacked via in high-density multilayer printed wiring boards were investigated by a statistical approach. Although reducing the height of via or the number of via stacks is effective to prevent the delamination, if these cannot be reduced, the risk of the delamination is eased by increasing the pitch of the stacked via.","PeriodicalId":198318,"journal":{"name":"2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2021-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128470158","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Tailor-made Laser Chip by Bonding for High Energy Laser System 基于键合的高能激光系统定制激光芯片
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598355
A. Kausas, V. Yahia, A. Tsuji, Rui Zhang, Xiangyu Zhou, Y. Honda, M. Yoshida, T. Taira
Multi-stack chips comprised of sapphire and Nd3+:YAG crystals with variable doping concentration were made by surface activated bonding technology. By use of sophisticated amplification setup for end-pumped solid-state laser, >2J operation with nanosecond pulses was obtained under room temperature.
采用表面活化键合技术制备了由蓝宝石和不同掺杂浓度的Nd3+:YAG晶体组成的多层芯片。利用精密的端泵浦固体激光器放大装置,在室温下获得了大于2J的纳秒脉冲输出。
{"title":"Tailor-made Laser Chip by Bonding for High Energy Laser System","authors":"A. Kausas, V. Yahia, A. Tsuji, Rui Zhang, Xiangyu Zhou, Y. Honda, M. Yoshida, T. Taira","doi":"10.1109/LTB-3D53950.2021.9598355","DOIUrl":"https://doi.org/10.1109/LTB-3D53950.2021.9598355","url":null,"abstract":"Multi-stack chips comprised of sapphire and Nd3+:YAG crystals with variable doping concentration were made by surface activated bonding technology. By use of sophisticated amplification setup for end-pumped solid-state laser, >2J operation with nanosecond pulses was obtained under room temperature.","PeriodicalId":198318,"journal":{"name":"2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2021-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127776501","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of GaN/SiC/diamond structure for efficient thermal management of power device 功率器件高效热管理GaN/SiC/金刚石结构的制备
Pub Date : 2021-10-05 DOI: 10.1109/LTB-3D53950.2021.9598453
R. Kagawa, K. Kawamura, Y. Sakaida, Sumito Ouchi, Hiroki Uratani, Y. Shimizu, Y. Ohno, Y. Nagai, N. Shigekawa, Jianbo Liang
The self-heating of GaN-HEMTs is a serious issue in terms of the device performance and reliability. Therefore, diamond is the most promising candidate as a heat spreader material for HEMTs application because of its extremely high thermal conductivity. Therefore, we fabricate GaN-HEMTs on diamond substrate by using surface activated bonding method.
gan - hemt的自热是影响器件性能和可靠性的一个严重问题。因此,金刚石具有极高的导热性,是hemt应用中最有前途的导热材料。因此,我们采用表面活化键合的方法在金刚石衬底上制备gan - hemt。
{"title":"Fabrication of GaN/SiC/diamond structure for efficient thermal management of power device","authors":"R. Kagawa, K. Kawamura, Y. Sakaida, Sumito Ouchi, Hiroki Uratani, Y. Shimizu, Y. Ohno, Y. Nagai, N. Shigekawa, Jianbo Liang","doi":"10.1109/LTB-3D53950.2021.9598453","DOIUrl":"https://doi.org/10.1109/LTB-3D53950.2021.9598453","url":null,"abstract":"The self-heating of GaN-HEMTs is a serious issue in terms of the device performance and reliability. Therefore, diamond is the most promising candidate as a heat spreader material for HEMTs application because of its extremely high thermal conductivity. Therefore, we fabricate GaN-HEMTs on diamond substrate by using surface activated bonding method.","PeriodicalId":198318,"journal":{"name":"2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2021-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121894574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2021 7th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)
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