Optimizing the properties of CrN coatings is critical for their performance in demanding industrial applications. However, achieving this optimization remains challenging due to the complex plasma characteristic and plasma-surface interactions under pulsed plasma conditions. This study investigates the effect of substrate bias pulse duty cycle at a fixed frequency of 50 kHz on the microstructure and tribological performance of CrN coatings deposited via magnetron sputtering, integrating experiments and multi-scale simulations. Experimentally, decreasing the duty cycle from 100% (DC bias) to 25% increased the bias current from 0.1 A to 0.7 A, yet coatings grown at higher duty cycles displayed enhanced (200) texture, finer columnar grains, and smoother surfaces, resulting in superior mechanical and tribological properties. The simulation results reveal that at low duty cycles, numerous electrons are attracted to the substrate during extended pulse-off stage, generating electron current compensation and thus a higher total bias current. However, the shortened pulse-on stage and insufficient energy of ions acquired from plasma sheath at low duty cycles lead to reduced ion-to-atom energy (Eion). Molecular dynamics simulations further support a shift from layer-by-layer to island-like growth with decreasing duty cycles, leading to rougher surfaces and deteriorated properties. This work establishes a direct connection between transient plasma energetics and atomic-scale growth under pulsed conditions, offering a physically grounded understanding of energy transfer across multiple scales. The insights gained provide a theoretical basis for optimizing pulsed plasma-assisted deposition of advanced coatings with tailored structural and functional properties.
扫码关注我们
求助内容:
应助结果提醒方式:
