首页 > 最新文献

Transactions of The Institute of Metal Finishing最新文献

英文 中文
A study on the effect of bath composition on the internal stress of a palladium electrodeposit 镀液成分对钯电镀层内应力影响的研究
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871233
Fang-Zu Yang, Shukai Xu, Ling Huang, Xueyuan Zhang, Sm Zhou
SummaryThe effects of bath composition on the internal stress of palladium electrodeposits are studied in neutral media with Pd(NH3)2Cl2, K3C6H5O7, (NH4)2C2O4 and the additives of the mixture of the synthesized products of nicotinic acid and nicotiamide (NANA), pyridine-3-sulfonic acid(PSA), α-furane formic acid(FF) and cetyl trimethyl ammonium bromide(CTMAB). The results show that the internal stress of electrodeposits is quite changeable at the beginning of electrodeposition later becoming stable gradually. Deposits obtained from pulse electrodeposition have lower stress than that from direct current. After electrodeposition, all the deposits keep in tensile stress which increases with time.
摘要在中性介质中,以Pd(NH3)2Cl2、K3C6H5O7、(NH4)2C2O4以及烟酸和烟酰胺(NANA)、吡啶-3-磺酸(PSA)、α-呋喃甲酸(FF)和十六烷基三甲基溴化铵(CTMAB)等合成产物的混合物为添加剂,研究了镀液组成对钯电镀层内应力的影响。结果表明:在电沉积初期,沉积层的内应力变化较大,随后逐渐趋于稳定。脉冲电沉积得到的镀层比直流电沉积得到的镀层应力小。电沉积后,所有镀层都保持拉应力,并随时间增大。
{"title":"A study on the effect of bath composition on the internal stress of a palladium electrodeposit","authors":"Fang-Zu Yang, Shukai Xu, Ling Huang, Xueyuan Zhang, Sm Zhou","doi":"10.1080/00202967.1998.11871233","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871233","url":null,"abstract":"SummaryThe effects of bath composition on the internal stress of palladium electrodeposits are studied in neutral media with Pd(NH3)2Cl2, K3C6H5O7, (NH4)2C2O4 and the additives of the mixture of the synthesized products of nicotinic acid and nicotiamide (NANA), pyridine-3-sulfonic acid(PSA), α-furane formic acid(FF) and cetyl trimethyl ammonium bromide(CTMAB). The results show that the internal stress of electrodeposits is quite changeable at the beginning of electrodeposition later becoming stable gradually. Deposits obtained from pulse electrodeposition have lower stress than that from direct current. After electrodeposition, all the deposits keep in tensile stress which increases with time.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"238-240"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871233","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58741814","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Preventing Environmental Contamination by Nonionic Surfactants and Nickel 防止非离子表面活性剂和镍对环境的污染
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871227
J. Snukiškis, D. Kaušpėdienė, A. Gefenienė
Protecting the environment from contamination by heavy metals and nonionic surfactants, the sorption of oxyethylated alcohols OS-20, alkylmonoethers ALM-10 and nickel has been investigated, on the hydrogen form of Purolite C 106 cation exchanger. The problem is that nonionic , surfactant is not removed by conventional ion exchange. Sorption isotherms were measured, coefficients for intraparticle diffusion were calculated. The sorption of nonionic surfactant from the solution, containing 10 mmol/l, amounts to 400 mg/g for OS-20 and 500 mg/g for ALM-10. The presence of nickel has no appreciable effect on the rate of intraparticle diffusion and the equilibrium sorption of surfactant. The sorption of nickel takes place in the form of both free cations and cations bonded with surfactant. The sorption of nonionic surfactant and nickel in Purolite C 106 cation exchanger was found to be suitable for the simultaneous removal of both contaminants in order to reuse the water, recovered from nickel plating rinsewater, preventing the contamination of environment.
为了保护环境免受重金属和非离子表面活性剂的污染,研究了氧乙基化醇OS-20、烷基单醚ALM-10和镍在Purolite c106阳离子交换剂氢形态上的吸附。问题是传统的离子交换不能去除非离子表面活性剂。测量了吸附等温线,计算了颗粒内扩散系数。溶液中非离子表面活性剂的吸附量为10mmol /l, OS-20为400mg /g, ALM-10为500mg /g。镍的存在对颗粒内扩散速率和表面活性剂的平衡吸附没有明显的影响。镍的吸附既有自由阳离子的形式,也有与表面活性剂结合的阳离子的形式。发现非离子表面活性剂和镍在Purolite c106阳离子交换剂中的吸附适合同时去除这两种污染物,从而使镀镍冲洗水中回收的水回用,防止对环境的污染。
{"title":"Preventing Environmental Contamination by Nonionic Surfactants and Nickel","authors":"J. Snukiškis, D. Kaušpėdienė, A. Gefenienė","doi":"10.1080/00202967.1998.11871227","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871227","url":null,"abstract":"Protecting the environment from contamination by heavy metals and nonionic surfactants, the sorption of oxyethylated alcohols OS-20, alkylmonoethers ALM-10 and nickel has been investigated, on the hydrogen form of Purolite C 106 cation exchanger. The problem is that nonionic , surfactant is not removed by conventional ion exchange. Sorption isotherms were measured, coefficients for intraparticle diffusion were calculated. The sorption of nonionic surfactant from the solution, containing 10 mmol/l, amounts to 400 mg/g for OS-20 and 500 mg/g for ALM-10. The presence of nickel has no appreciable effect on the rate of intraparticle diffusion and the equilibrium sorption of surfactant. The sorption of nickel takes place in the form of both free cations and cations bonded with surfactant. The sorption of nonionic surfactant and nickel in Purolite C 106 cation exchanger was found to be suitable for the simultaneous removal of both contaminants in order to reuse the water, recovered from nickel plating rinsewater, preventing the contamination of environment.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"217-218"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871227","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58742028","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Study on Chemical Polishing for Stainless Steel 不锈钢化学抛光的研究
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871186
Han Keping, Fang Jingli
SummaryInfluences of the solution components and operating conditions on the chemical polishing of stainless steel were studied quantitatively with reflective and gravimetrical methods. An optimum polishing technology for stainless steel was obtained, giving a near mirror bright surface.
用反射法和重量法定量研究了溶液成分和操作条件对不锈钢化学抛光的影响。获得了一种最佳的不锈钢抛光工艺,获得了接近镜面的光亮表面。
{"title":"Study on Chemical Polishing for Stainless Steel","authors":"Han Keping, Fang Jingli","doi":"10.1080/00202967.1998.11871186","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871186","url":null,"abstract":"SummaryInfluences of the solution components and operating conditions on the chemical polishing of stainless steel were studied quantitatively with reflective and gravimetrical methods. An optimum polishing technology for stainless steel was obtained, giving a near mirror bright surface.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"24-25"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871186","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58740388","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Structure and properties of cobalt films obtained by pulsed current 脉冲电流制备钴膜的结构和性能
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871205
E. F. Shtapenko, V. A. Zabludovsky
The results of studying structure, texture, phase composition and properties of cobalt films obtained by pulsed current are presented. A mechanism of formation of the film structure by pulsed current is proposed. The influence of isothermal annealing on the structure of cobalt films has been revealed.
介绍了脉冲电流制备的钴膜的结构、织构、相组成和性能的研究结果。提出了脉冲电流形成薄膜结构的机理。揭示了等温退火对钴膜结构的影响。
{"title":"Structure and properties of cobalt films obtained by pulsed current","authors":"E. F. Shtapenko, V. A. Zabludovsky","doi":"10.1080/00202967.1998.11871205","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871205","url":null,"abstract":"The results of studying structure, texture, phase composition and properties of cobalt films obtained by pulsed current are presented. A mechanism of formation of the film structure by pulsed current is proposed. The influence of isothermal annealing on the structure of cobalt films has been revealed.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"39 1","pages":"105-107"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871205","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58740775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The Electrochemical Behaviour of AISI 304 Stainless Steel Following Surface Modification by Ion Implantation 离子注入表面改性后AISI 304不锈钢的电化学行为
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871208
A. Hannani, E. Kermiche
An austenitic stainless steel (AISI 304) has been surface implanted with nitrogen at room temperature. Ion implantation is an effective surface modification to improve the corrosion performance of metal materials. Using Electrochemical Impedance Spectroscopy (EIS), the electrochemical parameters which characterised the stability of passive films were calculated from the simple data of the response curves. The experimental results indicated that the stability of passive films and the pitting resistance of AISI 304 stainless steel are improved by nitrogen ion implantation.
在室温下对奥氏体不锈钢(AISI 304)表面注入氮气。离子注入是提高金属材料腐蚀性能的有效表面改性方法。利用电化学阻抗谱(EIS)从响应曲线的简单数据计算表征钝化膜稳定性的电化学参数。实验结果表明,氮离子注入提高了AISI 304不锈钢钝化膜的稳定性和抗点蚀性能。
{"title":"The Electrochemical Behaviour of AISI 304 Stainless Steel Following Surface Modification by Ion Implantation","authors":"A. Hannani, E. Kermiche","doi":"10.1080/00202967.1998.11871208","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871208","url":null,"abstract":"An austenitic stainless steel (AISI 304) has been surface implanted with nitrogen at room temperature. Ion implantation is an effective surface modification to improve the corrosion performance of metal materials. Using Electrochemical Impedance Spectroscopy (EIS), the electrochemical parameters which characterised the stability of passive films were calculated from the simple data of the response curves. The experimental results indicated that the stability of passive films and the pitting resistance of AISI 304 stainless steel are improved by nitrogen ion implantation.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"114-116"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871208","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58740909","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Transparent Water-repellent Films Containing Fluoro-alkyl Functions by RF Plasma-enhanced CVD 用射频等离子体增强CVD制备含氟烷基的透明拒水膜
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871194
A. Hozumi, H. Sekoguchi, N. Sugimoto, O. Takai
SummaryTransparent water-repellent films containing fluoro-alkyl functions were prepared on polycarbonate, glass and Si substrates by rf plasma-enhanced CVD. The vapours of the fluoro-alkyl silanes were used as raw materials. The substrate temperature during deposition was around 50°C. The films obtained had good water repellency. The maximum contact angle for a water drop was 107 degrees. The contact angles obtained depended on the number of—(CF2)—in FAS molecules. FTIR and XPS were used to investigate the film properties. The existence of the fluoro-alkyl functions CP3—,—CF2—and >CF—was confirmed at the film surfaces. The transmittance of the PC substrate was improved by the coating. These films also have a function as anti-reflective coatings.
摘要采用射频等离子体增强CVD技术在聚碳酸酯、玻璃和硅基体上制备了含氟烷基基的透明拒水膜。以氟烷基硅烷的蒸汽为原料。沉积过程中衬底温度约为50℃。所得薄膜具有良好的防水性。水滴的最大接触角为107度。所得到的接触角取决于- (CF2) - in - FAS分子的数量。用FTIR和XPS对膜的性能进行了表征。证实了膜表面存在CP3 -、- cf2 -和> cf -三个氟烷基官能团。该涂层提高了PC基板的透光率。这些薄膜还具有抗反射涂层的功能。
{"title":"Transparent Water-repellent Films Containing Fluoro-alkyl Functions by RF Plasma-enhanced CVD","authors":"A. Hozumi, H. Sekoguchi, N. Sugimoto, O. Takai","doi":"10.1080/00202967.1998.11871194","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871194","url":null,"abstract":"SummaryTransparent water-repellent films containing fluoro-alkyl functions were prepared on polycarbonate, glass and Si substrates by rf plasma-enhanced CVD. The vapours of the fluoro-alkyl silanes were used as raw materials. The substrate temperature during deposition was around 50°C. The films obtained had good water repellency. The maximum contact angle for a water drop was 107 degrees. The contact angles obtained depended on the number of—(CF2)—in FAS molecules. FTIR and XPS were used to investigate the film properties. The existence of the fluoro-alkyl functions CP3—,—CF2—and >CF—was confirmed at the film surfaces. The transmittance of the PC substrate was improved by the coating. These films also have a function as anti-reflective coatings.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"51-53"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871194","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58740994","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Cleaning metal components after the Montreal Protocol : Introductory review 《蒙特利尔议定书》后金属部件的清洁:介绍性审查
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871200
A. Averill, J. Ingram, P. Nolan
Until recently, the manufacturing and finishing industries have placed heavy reliance on the use of pure methyl chloroform or chlorofluorocarbon solvents to achieve acceptable levels of cleaning or precleaning of metal components. Much effort has been devoted since the signing of the Montreal Protocol to finding replacement cleaning agents for these and other banned or controlled substances and it is now clear that a variety of different cleaning processes must be developed. In the long term it is likely that the vast majority of industrial cleaning will be carried out in aqueous solutions making it necessary to investigate the special problems involved in cleaning difficult components. A review, which summarises the issues and current problems being encountered in the search for replacement cleaning processes, is presented. Also considered are the relevant techniques and experimental procedures which can be used to investigate surface cleanliness and related phenomena.
直到最近,制造业和精加工工业一直严重依赖使用纯甲基氯仿或氯氟化碳溶剂来达到可接受的金属部件清洁或预清洁水平。自签署《蒙特利尔议定书》以来,为寻找这些和其他被禁止或受管制物质的替代清洁剂作出了很大努力,现在很明显,必须开发各种不同的清洁工艺。从长远来看,绝大多数工业清洗很可能将在水溶液中进行,因此有必要研究清洗困难部件所涉及的特殊问题。提出了一项审查,其中概述了在寻找替代清洁过程中遇到的问题和当前问题。还考虑了可用于调查表面清洁度和相关现象的相关技术和实验程序。
{"title":"Cleaning metal components after the Montreal Protocol : Introductory review","authors":"A. Averill, J. Ingram, P. Nolan","doi":"10.1080/00202967.1998.11871200","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871200","url":null,"abstract":"Until recently, the manufacturing and finishing industries have placed heavy reliance on the use of pure methyl chloroform or chlorofluorocarbon solvents to achieve acceptable levels of cleaning or precleaning of metal components. Much effort has been devoted since the signing of the Montreal Protocol to finding replacement cleaning agents for these and other banned or controlled substances and it is now clear that a variety of different cleaning processes must be developed. In the long term it is likely that the vast majority of industrial cleaning will be carried out in aqueous solutions making it necessary to investigate the special problems involved in cleaning difficult components. A review, which summarises the issues and current problems being encountered in the search for replacement cleaning processes, is presented. Also considered are the relevant techniques and experimental procedures which can be used to investigate surface cleanliness and related phenomena.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"81-89"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871200","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58741151","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
The effect of molybdate ions on A.C. sulphuric acid anodized 6063 aluminium alloys 钼酸盐离子对6063铝合金交流硫酸阳极氧化的影响
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871219
F. Sertçelik, A. Cakir, M. Ürgen, D. H. Ross, D. Gabe
6063 aluminium alloys were AC anodized in molybdate containing and molybdate free sulphuric acid solutions. The total impedance of the oxides produced in molybdate containing solutions decreased faster in 0.01 N HCl and after 8 days, following the dissolution of oxide film in 0.01 N HCl, the pits produced on the aluminium substrate surfaces were shallower and larger.
在含钼酸盐和无钼酸盐硫酸溶液中对6063铝合金进行了交流阳极氧化。在含钼酸盐溶液中生成的氧化物的总阻抗在0.01 N HCl中下降得更快,在0.01 N HCl中氧化膜溶解8天后,铝基表面产生的凹坑更浅、更大。
{"title":"The effect of molybdate ions on A.C. sulphuric acid anodized 6063 aluminium alloys","authors":"F. Sertçelik, A. Cakir, M. Ürgen, D. H. Ross, D. Gabe","doi":"10.1080/00202967.1998.11871219","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871219","url":null,"abstract":"6063 aluminium alloys were AC anodized in molybdate containing and molybdate free sulphuric acid solutions. The total impedance of the oxides produced in molybdate containing solutions decreased faster in 0.01 N HCl and after 8 days, following the dissolution of oxide film in 0.01 N HCl, the pits produced on the aluminium substrate surfaces were shallower and larger.","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"179-182"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871219","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58741528","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Microstructure of Electrodeposited Ni-Mn Coatings 电沉积Ni-Mn涂层的微观结构
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871207
A. Stephen, M. Ilango, T. Nagarajan, M. Ananth
SummaryNi-Mn alloys were electrodeposited on stainless steel substrates from simple sulphate baths with ammonium sulphate as the additive. The influence of Ni/Mn metal ratio (in the bath) on micros...
摘要以硫酸铵为添加剂,在简单硫酸浴中在不锈钢基体上电沉积镍锰合金。Ni/Mn金属比(在镀液中)对显微硬度的影响。
{"title":"Microstructure of Electrodeposited Ni-Mn Coatings","authors":"A. Stephen, M. Ilango, T. Nagarajan, M. Ananth","doi":"10.1080/00202967.1998.11871207","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871207","url":null,"abstract":"SummaryNi-Mn alloys were electrodeposited on stainless steel substrates from simple sulphate baths with ammonium sulphate as the additive. The influence of Ni/Mn metal ratio (in the bath) on micros...","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"111-113"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871207","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58740847","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Corrosion Resistant Nb Coatings Grown by Combined Steered Arc/Unbalanced Magnetron Deposition 定向电弧/非平衡磁控管复合沉积制备耐腐蚀Nb涂层
IF 1.9 4区 材料科学 Q4 ELECTROCHEMISTRY Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871214
H. Paritong, I. Wadsworth, L. Donohue, W. Münz
SummaryNiobium is well known for its chemical stability and excellent corrosion resistance which is based on the formation of a stable oxide layer of Nb205 in aqueous media It therefore finds wide application in areas where chemical stability is important, such as in chemical engineering equipment. Disadvantages of Nb are its high material costs and the fact that it is not possible to deposit Nb by the rather economic technique of aqueous electrodeposition. However, other deposition techniques such as physical vapour deposition may be used to produce niobium coatings. Due to its high melting point, sputtering is the preferred PV D deposition technology.Improved corrosion resistance approaching that of bulk Nb was found for lμm thick Nb coatings on 304 stainless steel substrates The corrosion performance very much depends on the method of ion etching prior to deposition. Microstructure, texture and microhardness as well are strongly influenced by the type of ion etching pre-treatment and by the temperature...
摘要铌的化学稳定性和优异的耐腐蚀性是众所周知的,这是建立在Nb205在水介质中形成稳定的氧化层的基础上的,因此在化学稳定性很重要的领域得到了广泛的应用,例如在化学工程设备中。铌的缺点是材料成本高,而且不可能通过相当经济的水电沉积技术来沉积铌。然而,其他沉积技术如物理气相沉积可用于生产铌涂层。由于其高熔点,溅射是首选的PV - D沉积技术。在304不锈钢基体上制备了厚度为lμm的铌涂层,其耐蚀性能提高到接近大块铌的水平,其腐蚀性能在很大程度上取决于沉积前离子腐蚀的方法。显微组织、织构和显微硬度受离子蚀刻预处理类型和温度的强烈影响。
{"title":"Corrosion Resistant Nb Coatings Grown by Combined Steered Arc/Unbalanced Magnetron Deposition","authors":"H. Paritong, I. Wadsworth, L. Donohue, W. Münz","doi":"10.1080/00202967.1998.11871214","DOIUrl":"https://doi.org/10.1080/00202967.1998.11871214","url":null,"abstract":"SummaryNiobium is well known for its chemical stability and excellent corrosion resistance which is based on the formation of a stable oxide layer of Nb205 in aqueous media It therefore finds wide application in areas where chemical stability is important, such as in chemical engineering equipment. Disadvantages of Nb are its high material costs and the fact that it is not possible to deposit Nb by the rather economic technique of aqueous electrodeposition. However, other deposition techniques such as physical vapour deposition may be used to produce niobium coatings. Due to its high melting point, sputtering is the preferred PV D deposition technology.Improved corrosion resistance approaching that of bulk Nb was found for lμm thick Nb coatings on 304 stainless steel substrates The corrosion performance very much depends on the method of ion etching prior to deposition. Microstructure, texture and microhardness as well are strongly influenced by the type of ion etching pre-treatment and by the temperature...","PeriodicalId":23268,"journal":{"name":"Transactions of The Institute of Metal Finishing","volume":"76 1","pages":"144-148"},"PeriodicalIF":1.9,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/00202967.1998.11871214","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"58741608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
期刊
Transactions of The Institute of Metal Finishing
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1