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A Tale of Two Billion 《二十亿人的故事
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871236
S. Watson
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引用次数: 1
New insight into the anomalous codeposition of alloys 对合金异常共沉积的新认识
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871271
Zelin Li, Jiale Cai, Shaomin Zhou
SUMMARYA new modelfor the anomalous codeposition of alloys is based on the kinetic characteristics of metal electrodeposition and the effect of hydrogen evolution accompanying the deposition. The less noble metal has intrinsically faster kinetics and so its deposition rate can be controlled mainly by diffusion mass transfer in a certain range of overpotentials; the convection induced by hydrogen evolution can speed up the relative deposition rate of this less noble metal when it is mainly diffusion-influenced. In contrast with previous models, such as the hydroxide suppression hypothesis, the monohydroxide-discharge-controlled mechanism, and the competitive adsorption effect, our model can explain naturally and completely anomalous codeposition, i.e. the preferential deposition of the less-noble metal, a problem in alloy electrodeposition that has persisted for a century.
基于金属电沉积的动力学特征和伴随沉积的析氢效应,提出了一种新的合金异常共沉积模型。低贵金属本身具有更快的动力学,因此其沉积速率主要通过在一定过电位范围内的扩散传质来控制;当主要受扩散影响时,析氢引起的对流可以加快这种低贵金属的相对沉积速度。与氢氧化物抑制假说、单氢氧化物放电控制机制、竞争吸附效应等模型相比,我们的模型可以自然、完整地解释合金电沉积中存在了一个世纪的反常共沉积现象,即低贵金属的优先沉积现象。
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引用次数: 4
Comparison of the switching behaviour of electrodeposited silver and silver-cadmium alloys contact materials 电沉积银与银镉合金接触材料开关性能的比较
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871262
M. Mateescu, M. Preda, Stefan Ivascan
The quality of contact materials depends on their physical properties, such as density, hardness and conductivity, as well as on their contact characteristics (contact resistance, weldability and erosion). An instrumentation system is described here, which measures the most important attributes of contact materials simultaneously. The measurements are taken under simulated service conditions. The rated electrical current is passed through contacts of reference and test materials in a relay controlled by an electronic module; the contact resistance, weldability and are erosion are monitored. In this system two pairs of contact elements - one pair made of the test material, and the other made of reference material are compared. The relay is an actual electrical device wich would use the test material as its contact elements in normal operation. The test material is silver-cadmium alloy electrodeposited from an iodide bath; and the reference material is electrodeposited silver from a cyanide bath.
接触材料的质量取决于它们的物理性质,如密度、硬度和导电性,以及它们的接触特性(接触电阻、可焊性和侵蚀性)。本文介绍了一种同时测量触点材料最重要属性的仪器系统。这些测量是在模拟的使用条件下进行的。额定电流通过由电子模块控制的继电器中的参考材料和测试材料的触点;对接触电阻、可焊性和腐蚀进行了监测。在该系统中,对两对接触元件进行了比较,一对接触元件由测试材料制成,另一对接触元件由参考材料制成。继电器是一种实际的电气装置,在正常工作时将使用测试材料作为其接触元件。测试材料是由碘化浴电沉积的银镉合金;参考物质是氰化物浴中电沉积的银。
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引用次数: 0
An ellipsometric, XPS and electrochemical study of the passivity of zircaloy-2 锆-2钝化的椭偏、XPS及电化学研究
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871283
S. Phadnis, A. Bose, M. Totlani
The electrochemical behaviour of zircaloy-2 in the annealed and quenched conditions was determined in 0.5 M H 2 SO 4 by the potentiodynamic polarization method. Passive films on zircaloy-2 obtained in air as well as in sulphuric acid under open circuit conditions, were characterised and their refractive index and thickness determined. It was seen that the beta quenched alloy showed a nobler potential (-270 mV against standard Calomel electrode) compared with the annealed alloy (-320 mV). It also showed a passive current density about one order less than the annealed material. Ellipsometry showed that the films formed on the quenched alloy were thinner than those on the annealed alloy. After exposure to 0.5 M H 2 SO 4 zircaloy developed films which were thicker with power refractive index than both the heat treated conditions. XPS analysis of the films has confirmed incorporation of sulphate into the film which probably leads to a defective and hence a thicker film in acid.
用动电位极化法测定了锆-2在0.5 M h2so4中退火和淬火条件下的电化学行为。在开路条件下,在空气和硫酸中制备了锆-2钝化膜,对其进行了表征,并测定了其折射率和厚度。与退火合金(-320 mV)相比,淬火合金表现出更高的电位(对标准甘汞电极为-270 mV)。它的无源电流密度也比退火后的材料小一个数量级。椭偏测量结果表明,淬火合金表面形成的薄膜比退火合金表面薄。暴露于0.5 M h2so4后,锆合金形成的薄膜比两种热处理条件下的薄膜更厚,其功率折射率也更高。薄膜的XPS分析证实了硫酸盐在薄膜中的掺入,这可能导致了缺陷,因此在酸中形成了较厚的薄膜。
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引用次数: 0
Coulometric Techniques for Surface Coatings 表面涂层的库仑技术
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871286
D. Gabe
The technique of Coulometry is based on the fundamental concepts incorporated in Faraday's Laws and is therefore a referee method for coating thickness determinations. The design of coulometric dissolution methods for thickness testing is reviewed. In the competitive field of modern instrumental techniques coulometry offers advantages of averaging thickness over an area typically of ∼1 cm 2 and the ability to measure components in a layered or duplex coating.
库仑法技术基于法拉第定律中的基本概念,因此是测定涂层厚度的一种裁判方法。综述了库仑溶出度测厚方法的设计。在现代仪器技术竞争激烈的领域中,库仑法具有在典型的~ 1 cm 2的面积上平均厚度的优势,并且能够测量层状或双相涂层中的成分。
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引用次数: 12
Preparation and Characterization of Electroless Ni-P and Ni-P-Si3N4 Composite Coatings 化学镀Ni-P和Ni-P- si3n4复合镀层的制备与表征
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871253
J. Balaraju, S. Seshadri
SUMMARYThe present work pertains to the study of electroless Ni-P and Ni-P-Si3N4 composite coatings. The deposits are obtained from a proprietary high phosphorus electroless nickel plating bath, comprising nickel sulphate, sodium hypophosphite, complexing agents and stabilizers. The maximum weight percent of Si3N4 incorporated in the electroless deposit is obtained at a concentration of 10 g/l in the bath. The electroless Ni-P deposits having 0%, 2.01%, 5.81% and 8.10% of Si3N4, respectively, obtained from baths containing 0, 2, 5 and 10 g/l of Si3N4, are characterized by optical microscopy, XRD and TEM. Hardness is found to increase with the incorporation of Si3N4 at all heat treatment temperatures studied. Also hardness increases with an increase in weight percent of Si3N4 incorporated in the deposit. The analyses of the composite coatings by XRD and TEM reveal that the inclusion of Si3N4 particles does not change the amorphous nature of the Ni-P matrix.
本工作是化学镀Ni-P和Ni-P- si3n4复合镀层的研究。该镀层由专有的高磷化学镀镍液获得,该镀液由硫酸镍、次亚磷酸钠、络合剂和稳定剂组成。当液中氮化硅的浓度为10 g/l时,化学镀层中氮化硅的重量百分比最大。采用光学显微镜、XRD和TEM对Si3N4含量分别为0、2、5和10 g/l的镀液中Si3N4含量分别为0%、2.01%、5.81%和8.10%的化学镀Ni-P进行了表征。在研究的所有热处理温度下,硬度都随着氮化硅的加入而增加。硬度随氮化硅含量的增加而增加。通过XRD和TEM对复合镀层的分析表明,Si3N4颗粒的加入并没有改变Ni-P基体的非晶态性质。
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引用次数: 26
Physical properties of Ni-Cu microlayer films obtained by pulse electrolysis 脉冲电解镍铜微层薄膜的物理性质
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1999-01-01 DOI: 10.1080/00202967.1999.11871255
V. A. Zabludovsky, V. S. Gribok
A new electrolytic technology for obtaining Ni-Cu multi-layers by program-controlled pulse current is suggested The mechanical and electrical properties of the coatings were explored and experimental data were compared with theoretical.
提出了一种程控脉冲电流法制备Ni-Cu多层镀层的新工艺,并对镀层的力学性能和电学性能进行了研究,并将实验数据与理论数据进行了比较。
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引用次数: 1
Metal distribution in electroplating of nickel and chromium 电镀镍、铬时的金属分布
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871201
S. Jayakrishnan, K. Dhayanand, R. Krishnan, R. Sekar, S. Sriveeraraghavan
SummaryElectroplating is a surface treatment method widely adopted for corrosion prevention. For obtaining decorative finishes with corrosion resistance on steel surfaces, it is a normal practice to employ decorative nickel—chromium plating consisting of thick nickel layers followed by flash chromium. For functional applications necessitating hardness and wear resistance, thick chromium plating is carried out either directly on steel or over a nickel undercoat. Heavy coatings of nickel and chromium for industrial applications call for thickness uniformity over complicated shaped basis metal surfaces.In the present investigation, a comparative evaluation of nickel and chromium plating is undertaken. Distributions of metal on plain as well as bent cathodes are determined. For a bent cathode with a specified geometry, the improvement in metal distribution brought about by changing the anode configuration is studied and reported.
电镀是一种广泛采用的表面防腐处理方法。为了在钢表面获得具有耐腐蚀性的装饰性饰面,通常采用由厚镍层和闪蒸铬组成的装饰性镍铬镀。对于需要硬度和耐磨性的功能性应用,直接在钢上镀厚铬或在镍底涂层上镀厚铬。工业应用的镍和铬厚镀层要求在复杂形状的基金属表面上厚度均匀。在本研究中,对镀镍和镀铬进行了比较评价。测定了金属在平阴极和弯曲阴极上的分布。对具有特定几何形状的弯曲阴极,研究并报道了改变阳极结构所带来的金属分布的改善。
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引用次数: 5
The Effectiveness of TEA CO2-laser Ablation for the Treatment of Hot Dipped Galvanized Mild Steel Prior to Adhesive Bonding TEA co2激光烧蚀在热镀锌低碳钢粘接前处理的有效性
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871223
G. Critchlow, K. Bedwell, C. Cottam
TEA CO 2 -laser ablation has been studied to establish its effectiveness for the cleaning of hot dipped galvanised (HDG) mild steel. This laser-based process was demonstrated to be more effective than double-degreasing for the removal of organic contamination from a previously oily surface. In addition, the TEA CO 2 -laser was shown to modify both the near surface chemistry and the topography; the precise modifications being dependent upon the degree of treatment used. In bond durability trials, the changes introduced to the laser-treated HDG surface were shown to provide equivalent or better joints compared with degreased adherends. In the same durability trials, a commercially-available phosphate-based, wet chemical treatment was shown to provide bond durability significantly inferior to the TEA CO 2 -laser. In contrast, a chromate-based process gave markedly superior bond durability. Possible explanations for the bond test results have been given.
研究了TEA co2激光烧蚀对热镀锌(HDG)低碳钢的清洗效果。事实证明,在去除先前含油表面的有机污染物方面,这种基于激光的工艺比双重脱脂更有效。此外,TEA co2激光对近表面化学和形貌均有影响;精确的修改取决于所使用的处理程度。在粘合耐久性试验中,与脱脂粘接剂相比,对激光处理的HDG表面进行改变可以提供同等或更好的粘合。在同样的耐久性试验中,一种市售的磷酸盐基湿化学处理的粘结耐久性明显低于TEA co2激光。相比之下,基于染色质的工艺具有明显更好的粘合耐久性。对粘结试验结果给出了可能的解释。
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引用次数: 4
Microwave Plasma-Enhanced CVD for High Rate Coatings of Silicon Oxide 高速率氧化硅涂层的微波等离子体增强CVD
IF 1.9 4区 材料科学 Q2 Materials Science Pub Date : 1998-01-01 DOI: 10.1080/00202967.1998.11871184
O. Takai, T. Honjo
SummaryMicrowave plasma-enhanced CVD has been studied for the high rate coatings of silicon oxide using methyltrimethoxysilane, an organosilicon compound, and oxygen as gas sources. The transparent hard films could be deposited onto substrates at the high rate of about 1 μm/min. The composition of the films prepared at pressures below 100 Pa was similar to silicon dioxide. Analyses of the films were carried out by using XRD, FT-IR, XPS and AES.
摘要以有机硅化合物甲基三甲氧基硅烷为气源,研究了微波等离子体增强CVD制备高速率氧化硅涂层。该透明硬膜可以1 μm/min的高速率沉积在衬底上。在低于100pa的压力下制备的薄膜的组成与二氧化硅相似。采用XRD、FT-IR、XPS和AES对膜进行了分析。
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引用次数: 0
期刊
Transactions of The Institute of Metal Finishing
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