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Эффективная генерация спина в графене на магнитной подложке при поглощении света в дальнем ИК диапазоне 磁性底座上石墨后有效振荡,远红外波段吸收光
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.03.55631.4756
Константин Сергеевич Денисов, К.Ю. Голеницкий
The magnetic proximity effect is significant for atomically thin layers of two-dimensional materials. In this paper, we study the mechanisms of photogeneration spin-polarized charges in graphene on a magnetic insulator. The magnetic proximity effect and lowered symmetry at the interface enhance the spin response of graphene in the alternating electric field of the incident light. The first leads to spin splitting of the linear spectrum of Dirac electrons. The second increases the role of the spin-orbit interaction. The main mechanisms of photogenerated spin polarization have been considered, including spin flip intersubband and interband transitions, and their contribution to the absorption coefficient of graphene.
磁邻近效应对于二维材料的原子薄层是显著的。在本文中,我们研究了磁绝缘体上石墨烯光产生自旋极化电荷的机制。磁邻近效应和界面处对称性的降低增强了石墨烯在入射光交变电场中的自旋响应。第一个导致狄拉克电子线性谱的自旋分裂。第二种是增加自旋轨道相互作用的作用。讨论了光致自旋极化的主要机制,包括自旋翻转和带间跃迁,以及它们对石墨烯吸收系数的影响。
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引用次数: 0
Измерения удельного сопротивления легированных азотом монокристаллов алмаза типа Ib методом Ван дер Пау с контактами Ti-Pt в интервале температур 573-1000 K 范·德·帕(Ib)用Ti-Pt (573-1000 K)的接触测量合金固态钻石的单位电阻
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.05.56206.4748
С. Г. Буга, Геннадий Михайлович Квашнин, Михаил Сергеевич Кузнецов, Н. В. Корнилов, Н. В. Лупарев, М. Яо
The electrical resistivity values of square diamond plates doped with nitrogen in the form of C-centers with concentrations of 5; 55; 140 ppm are measured by the Van der Pauw method in the temperature range of 573-1000 K. Based on the results of the analysis of the primary measurement data, the resistivity values are calculated in the approximation of point ohmic Ti-Pt contacts, as well as taking into account the actual dimensions of triangular angular contacts. It was found that up to the temperature limit of 93050 K the differences in the resistivity values obtained by three different methods of the experimental data analysis do not exceed 3-7%. Ti-Pt contacts may be used in microelectronic and quantum optoelectronic devices based on nitrogen-doped diamonds.
掺杂浓度为5的c -中心形式氮的方形金刚石片的电阻率值;55;在573-1000 K的温度范围内,用范德泡法测量了140 ppm。在对原始测量数据分析的基础上,在考虑三角形角触点实际尺寸的情况下,对点欧姆Ti-Pt触点进行近似计算,计算出电阻率值。结果表明,在93050 K的极限温度下,三种不同的实验数据分析方法得到的电阻率值的差异不超过3-7%。Ti-Pt触点可用于基于氮掺杂金刚石的微电子和量子光电器件。
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引用次数: 0
ГКР-активные подложки на основе внедренных наночастиц Ag в объем c-Si: моделирование, технология, применение 在c-Si体积中引入的纳米粒子Ag活性支架:模拟、技术、应用
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.04.55893.07k
А.А. Ермина, Н.С. Солодовченко, К.В. Пригода, В. С. Левицкий, С. И. Павлов, Ю.А. Жарова
A simple method for obtaining SiO2 : Ag : Si and Ag : Si hybrid nanostructures is presented. High-temperature treatment of an island film of Ag on the surface of c-Si makes it possible to preserve the plasmonic properties of Ag nanoparticles and protect them from external influences by coating them with a thermally grown layer of SiO2. The calculation of the electric field strength distribution in the structure with embedded Ag nanoparticles in c-Si demonstrates the presence of intrinsic “hot spots” at the corners of the nanoparticles, which leads to a maximum enhancement factor (~10^6) of Raman scattering. scattering. A numerical calculation of the dependence of the spectral position of a localized plasmon resonance on the geometry of structures can serve as a basis for their design in the future. Surface-enhanced Raman scattering spectroscopy showed reliable detection of the methyl orange from an aqueous solution at a concentration of 10^-5 M.
提出了一种制备SiO2: Ag: Si和Ag: Si杂化纳米结构的简单方法。对c-Si表面的银岛膜进行高温处理,可以保留银纳米粒子的等离子体特性,并通过在其表面涂上一层热生长的SiO2来保护它们免受外部影响。在c-Si中嵌入银纳米粒子结构的电场强度分布计算表明,纳米粒子的角部存在本征“热点”,导致拉曼散射的增强因子达到最大(~10^6)。散射。局部等离子体共振的光谱位置与结构几何关系的数值计算可以作为未来设计等离子体共振的基础。表面增强拉曼散射光谱显示在浓度为10^-5 M的水溶液中可以可靠地检测到甲基橙。
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引用次数: 0
Разработка одномодового РОС-гетеролазера с выводом излучения под углом к поверхности структуры 单模异质激光器开发,从结构表面辐射输出
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.05.56204.41k
В.Р. Барышев, Е.Д. Егорова, Н. С. Гинзбург, Е.Р. Кочаровская, А. М. Малкин, В. Ю. Заславский, С. В. Морозов, А.C. Сергеев
We study a possibility of implementing a single-mode DFB heterolaser with inclined (with respect to the surface of the structure) output of the generated radiation. We find the periodic dielectric structure shape that makes it possible to realize the distributed feedback for wavebeams propagating along the structure and, at the same time, to ensure the output of up to 70% of the generated radiation power in the inclined direction. Within the framework of the semiclassical quasi-optical model, the possibility of stationary lasing regimes is shown for finite lateral dimensions of the Bragg structure.
我们研究了一种实现单模DFB异质激光器的可能性,该激光器产生的辐射输出是倾斜的(相对于结构表面)。我们发现周期性的介电结构形状可以实现沿结构传播的波束的分布反馈,同时保证在倾斜方向输出高达70%的辐射功率。在半经典准光学模型的框架内,证明了在有限的Bragg结构的横向维数下,稳态激光状态的可能性。
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引用次数: 0
Слабая антилокализация в сильно разупорядоченном двумерном полуметалле в квантовой яме HgTe HgTe量子坑中高度有序的二维半金属中的弱抗原
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.05.56208.5395
Е. Б. Ольшанецкий, З. Д. Квон, Николай Николаевич Михайлов
Weak localization in a highly disordered quantum well CdxHg1−xTe/HgTe/CdxHg1−xTe with a thickness of d = 20 nm is experimentally investigated. An analysis is made of the anomalous positive magnetoresistance (APM) caused by the suppression of the interference correction to the conductivity by a magnetic field on both sides of the charge neutrality point: for a two-dimensional semimetal and for a two-dimensional electronic metal. For the same values of resistivity, the APM peak in a 2D semimetal has a much wider width than in a 2D electron gas. A quantitative comparison of the obtained results with the theory allows, in particular, to conclude that the intensity of carrier transitions between subsystems in the 2D semimetal binary system is maximum near the charge neutrality point, where the concentrations of electrons and holes are close, and decreases as the difference in concentrations increases.
实验研究了厚度为d = 20 nm的高度无序量子阱CdxHg1−xTe/HgTe/CdxHg1−xTe中的弱局域化。分析了二维半金属和二维电子金属在电荷中性点两侧磁场抑制对电导率的干扰校正所引起的异常正磁阻。对于相同的电阻率值,二维半金属中的APM峰的宽度比二维电子气体中的要宽得多。将得到的结果与理论进行定量比较,可以特别得出这样的结论:二维半金属二元体系中子系统之间的载流子跃迁强度在电荷中性点附近最大,电子和空穴的浓度接近,并且随着浓度差的增加而降低。
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引用次数: 0
Состояния кремниевых нано-кластеров, содержащих примеси углерода 含碳的硅纳米集群状态
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.02.55330.3335
М. Ю. Ташметов, Ш. Махкамов, Ф.Т. Умарова, А Б Нормуродов, Н.Т. Сулайманов, А.В. Хугаев, Х.М. Холмедов
Abstract The structural and electronic states of defective complexes in the Si29 cluster with the participation of carbon and hydrogen atoms were determined by the method of non-conventional strong binding (MNSB) in combination with the method of molecular dynamics. It is shown that carbon atoms in silicon clusters form a bridge bond with two silicon atoms and localized in a hexagonal position at the center of the cell, forming a defect of the Si29:Ci type. The introduction of hydrogen into a silicon cluster results in the formation of a defective Ci-H-Si complex and a decrease of binding energy of the Si29:Ci defect. Based on the calculations, it was found that presence of leads to carbon gives shallow levels in the band gap of nano-silicon, and the defective carbon-hydrogen complex in a hydrogenated cluster, depending on the charge state of the defective complex. Moreover this exhibits both deep and shallow levels.
摘要采用非常规强结合(MNSB)方法结合分子动力学方法测定了碳、氢原子参与的Si29簇中缺陷配合物的结构态和电子态。结果表明,硅簇中的碳原子与两个硅原子形成桥键,并定位于电池中心的六边形位置,形成Si29:Ci型缺陷。在硅簇中引入氢会形成缺陷的Ci- h - si配合物,降低Si29:Ci缺陷的结合能。基于计算,发现碳的存在在纳米硅的带隙中产生较浅的水平,并且在氢化簇中产生缺陷的碳氢配合物,这取决于缺陷配合物的电荷状态。此外,这表现为深层和浅层。
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引用次数: 0
Плазмохимическое осаждение гидрогенизованных пленок DLC с различным содержанием водорода и sp-=SUP=-3-=/SUP=--гибридного углерода 氢和sp-=SUP=-3-=/SUP=-混合碳的等离子化学沉积
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.05.56195.09k
А. И. Охапкин, М. Н. Дроздов, П.А. Юнин, С.А. Краев, Д.Б. Радищев
The influence of methane plasma parameters on the deposition rate and on the content of the hydrogen and the sp3-carbon fraction in hydrogenated diamond-like carbon films (DLC) was investigated. It was shown that the proportion of the sp3-carbon fraction mainly depends on the inductive power and the argon addition to the plasma; the latter also contributes to a decrease of hydrogen in the films.
研究了甲烷等离子体参数对氢化类金刚石膜(DLC)沉积速率、氢含量和sp3-碳分数的影响。结果表明,sp3-碳分数的比例主要取决于感应功率和等离子体中加入的氩气;后者也有助于薄膜中氢的减少。
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引用次数: 0
Повышение радиационной стойкости интегральных схем на основе биполярных транзисторов обработкой в водородной электронно циклотронно резонансной плазме и геттерированием Si-пластин 双极电子回旋质共振等离子体中的双极晶体管辐射强度提高
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.03.55633.4467
Е. А. Полушкин, С.В. Нефедьев, О.А. Солтанович, Анастасия Викторовна Ковальчук, С. Ю. Шаповал
We demonstrate significant improvement of the radiation immunity of the integrated circuits based on silicon bipolar transistors. Strong decrease of the current gain degradation and significant yield improvement after high-energy gamma irradiation are both shown. This was achieved by development of efficient hydrogenation process for the silicon bulk and the surface dielectric layer using electron cyclotron resonance (ECR) plasma, as well as implementation of effective Si-plate gettering option.
我们证明了基于硅双极晶体管的集成电路的抗辐射能力有了显著的提高。高能γ辐照后,电流增益衰减明显减小,产率显著提高。这是通过开发利用电子回旋共振(ECR)等离子体对硅本体和表面介电层进行高效加氢的工艺,以及实施有效的硅板吸光选项来实现的。
{"title":"Повышение радиационной стойкости интегральных схем на основе биполярных транзисторов обработкой в водородной электронно циклотронно резонансной плазме и геттерированием Si-пластин","authors":"Е. А. Полушкин, С.В. Нефедьев, О.А. Солтанович, Анастасия Викторовна Ковальчук, С. Ю. Шаповал","doi":"10.21883/ftp.2023.03.55633.4467","DOIUrl":"https://doi.org/10.21883/ftp.2023.03.55633.4467","url":null,"abstract":"We demonstrate significant improvement of the radiation immunity of the integrated circuits based on silicon bipolar transistors. Strong decrease of the current gain degradation and significant yield improvement after high-energy gamma irradiation are both shown. This was achieved by development of efficient hydrogenation process for the silicon bulk and the surface dielectric layer using electron cyclotron resonance (ECR) plasma, as well as implementation of effective Si-plate gettering option.","PeriodicalId":24054,"journal":{"name":"Физика и техника полупроводников","volume":"8 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82397400","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Однофотонное излучение InGaAs-квантовой точки, выращенной на подложке (111)B GaAs 单光子InGaAs-量子点辐射,生长在底座(111)B GaAs上
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.04.55897.12k
И.А. Деребезов, В.А. Гайслер, А.В. Гайслер, Д. В. Дмитриев, А.И. Торопов, S. Rodt, M. von Helversen, S. Reitzenstein
The results of a study of the optical characteristics of non-classical light sources based on single In(Ga)As quantum dot grown on a (111)B GaAs substrate are presented. The single-photon nature of the radiation is confirmed by measuring and analyzing the second-order correlation function g(2)(τ), g(2)(0)=0.033 ± 0.027, and the degree of indistinguishability of sequentially emitted single photons is (41 ± 10 )%.
本文给出了在(111)B GaAs衬底上生长单个In(Ga)As量子点的非经典光源光学特性的研究结果。通过测量和分析二阶相关函数g(2)(τ)证实了该辐射的单光子性质,g(2)(0)=0.033±0.027,顺序发射的单光子不可分辨度为(41±10)%。
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引用次数: 0
Разыгрывание полярного угла рассеяния электронов на ионах примеси при моделировании процессов переноса заряда в полупроводниках методом Монте-Карло 用蒙特卡洛半导体半导体模拟电子散射过程中电子散射的极角
Pub Date : 2023-01-01 DOI: 10.21883/ftp.2023.01.54925.4425
В. М. Борздов, А. В. Борздов, Ю.Г. Василевский
Procedures of polar scattering angle simulation for electron scattering on ionized impurities are examined for Brooks-Herring, Conwell-Weisskopf and Ridley models as the most frequently used in Monte Carlo simulation of charge carrier transport in semiconductors. A more correct procedure for polar scattering angle simulation is proposed for Ridley model. Peculiarities of scattering angle distribution densities calculated in the framework of regarded models are analyzed taking silicon as an example. Comparison of electron mobility calculated by ensemble Monte Carlo method using considered models has been done for doped silicon at 300 K and for constant electric field strength F = 7∙104 V/m
本文研究了在半导体载流子输运蒙特卡罗模拟中最常用的Brooks-Herring、Conwell-Weisskopf和Ridley模型中电子在电离杂质上散射的极散射角模拟过程。对Ridley模型提出了一种更准确的极散射角模拟方法。以硅为例,分析了在已知模型框架内计算散射角分布密度的特殊性。在300 K和恒定电场强度F = 7∙104 V/m条件下,用综合蒙特卡罗方法计算了掺杂硅的电子迁移率
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引用次数: 0
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Физика и техника полупроводников
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