首页 > 最新文献

Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997最新文献

英文 中文
Effect of crystal defects on minority carrier diffusion lengths in 6H SiC [solar cells] 晶体缺陷对6H SiC[太阳能电池]载流子扩散长度的影响
S. Hubbard, M. Tabib-Azar, S. Bailey, G. Rybicki, P. Neudeck, R. Raffaelle
Minority-carrier diffusion lengths in n-type 6H-SiC solar cells were measured using the planar electron-beam induced current (EBIC) technique. Experimental values of electron beam current, EBIC and beam voltage were obtained for n-type SIC with a carrier concentration of 1.7E17 cm/sup -3/. This data was fit to theoretically calculated diode efficiency curves, and the diffusion length and metal layer thickness extracted. The extracted hole diffusion length ranged from 0.68 /spl mu/m to 1.46 /spl mu/m. The error for these values was /spl plusmn/15%. Additionally, we introduce a novel variation of the planar technique. This "planar mapping" technique measures diffusion length along a linescan creating a map of diffusion length versus position. This map is overlaid onto the EBIC image of the linescan, allowing direct visualization of the effect of crystal defects on minority carrier diffusion length. Diffusion length maps of both n and p-type 6H SiC show that large micropipe defects severely limit the minority carrier diffusion length, reducing it well below 0.1 /spl mu/m inside large defects.
采用平面电子束感应电流(EBIC)技术测量了n型6H-SiC太阳能电池中少数载流子的扩散长度。得到了载流子浓度为1.7E17 cm/sup -3/时n型SIC的电子束电流、EBIC和束流电压的实验值。将所得数据与理论计算的二极管效率曲线拟合,并提取了扩散长度和金属层厚度。提取的孔扩散长度范围为0.68 ~ 1.46 /spl mu/m。这些值的误差为/spl + /15%。此外,我们还介绍了平面技术的一种新变体。这种“平面映射”技术沿着一条线测量扩散长度,可以创建扩散长度与位置的映射。这张图被覆盖在线性扫描的EBIC图像上,允许直接可视化晶体缺陷对少数载流子扩散长度的影响。n型和p型6H SiC的扩散长度图表明,大的微管缺陷严重限制了少数载流子的扩散长度,使其在大缺陷内的扩散长度降至0.1 /spl mu/m以下。
{"title":"Effect of crystal defects on minority carrier diffusion lengths in 6H SiC [solar cells]","authors":"S. Hubbard, M. Tabib-Azar, S. Bailey, G. Rybicki, P. Neudeck, R. Raffaelle","doi":"10.1109/PVSC.1997.654251","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654251","url":null,"abstract":"Minority-carrier diffusion lengths in n-type 6H-SiC solar cells were measured using the planar electron-beam induced current (EBIC) technique. Experimental values of electron beam current, EBIC and beam voltage were obtained for n-type SIC with a carrier concentration of 1.7E17 cm/sup -3/. This data was fit to theoretically calculated diode efficiency curves, and the diffusion length and metal layer thickness extracted. The extracted hole diffusion length ranged from 0.68 /spl mu/m to 1.46 /spl mu/m. The error for these values was /spl plusmn/15%. Additionally, we introduce a novel variation of the planar technique. This \"planar mapping\" technique measures diffusion length along a linescan creating a map of diffusion length versus position. This map is overlaid onto the EBIC image of the linescan, allowing direct visualization of the effect of crystal defects on minority carrier diffusion length. Diffusion length maps of both n and p-type 6H SiC show that large micropipe defects severely limit the minority carrier diffusion length, reducing it well below 0.1 /spl mu/m inside large defects.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127876172","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Large-area Silicon-Film/sup (TM)/ manufacturing under the PVMaT program PVMaT计划下的大面积硅膜/sup (TM)/制造
J. Rand, Y. Bai, J.C. Checchi, J. Culik, D. H. Ford, C. L. Kendall, P. Sims, R. Hall, A. Barnett
AstroPower is developing a manufacturing process for Silicon-Film/sup (TM)/ solar cell production under an NREL-administered PVMaT cost-share program. Progress in improving efficiencies and increasing the size and production volume of Silicon-Film/sup (TM/) solar cells over the past year are discussed. Future concepts and goals for the Silicon-Film/sup (TM)/ process are also discussed.
AstroPower正在nrel管理的PVMaT成本分担计划下开发硅膜/sup (TM)/太阳能电池生产的制造工艺。讨论了过去一年来在提高效率、增加硅膜/sup (TM/)太阳能电池尺寸和产量方面取得的进展。本文还讨论了硅膜/sup (TM)/工艺的未来概念和目标。
{"title":"Large-area Silicon-Film/sup (TM)/ manufacturing under the PVMaT program","authors":"J. Rand, Y. Bai, J.C. Checchi, J. Culik, D. H. Ford, C. L. Kendall, P. Sims, R. Hall, A. Barnett","doi":"10.1109/PVSC.1997.654297","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654297","url":null,"abstract":"AstroPower is developing a manufacturing process for Silicon-Film/sup (TM)/ solar cell production under an NREL-administered PVMaT cost-share program. Progress in improving efficiencies and increasing the size and production volume of Silicon-Film/sup (TM/) solar cells over the past year are discussed. Future concepts and goals for the Silicon-Film/sup (TM)/ process are also discussed.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122278372","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Properties of ZnTe:Cu thin films and CdS/CdTe/ZnTe solar cells ZnTe:Cu薄膜和CdS/CdTe/ZnTe太阳能电池的性能
J. Tang, D. Mao, T. Ohno, V. Kaydanov, J. Trefny
The effects of Cu doping and post-deposition annealing on the properties of ZnTe thin films and CdS/CdTe solar cells with the ZnTe:Cu/Au back contact were investigated. The structural, compositional and electrical properties of ZnTe films were studied systematically using X-ray diffraction (XRD), electron microprobe analysis, atomic force microscopy (AFM), electrical resistivity and Hall effect measurements. ZnTe films with Cu concentrations of 1-6 at. % were used successfully as a back contact layer, providing fill factors over 0.70. The stability of CdTe/ZnTe/Au cells under accelerated temperature stress tests was investigated. I-V and C-V measurements, scanning Auger electron spectroscopy (AES) and X-ray photoemission spectroscopy (XPS) were used to clarify possible degradation mechanisms. Significant Cu and Te diffusion into Au layer and Au diffusion into ZnTe were observed after annealing.
研究了Cu掺杂和沉积后退火对ZnTe薄膜和具有ZnTe:Cu/Au背接触的CdS/CdTe太阳能电池性能的影响。采用x射线衍射(XRD)、电子探针分析、原子力显微镜(AFM)、电阻率和霍尔效应测量等方法对ZnTe薄膜的结构、组成和电学性能进行了系统的研究。Cu浓度为1-6 at的ZnTe薄膜。%成功用作后接触层,填充系数超过0.70。研究了CdTe/ZnTe/Au电池在加速温度应力下的稳定性。利用I-V和C-V测量、扫描俄歇电子能谱(AES)和x射线光发射能谱(XPS)来阐明可能的降解机制。退火后,Cu和Te向Au层扩散,Au向ZnTe层扩散。
{"title":"Properties of ZnTe:Cu thin films and CdS/CdTe/ZnTe solar cells","authors":"J. Tang, D. Mao, T. Ohno, V. Kaydanov, J. Trefny","doi":"10.1109/PVSC.1997.654122","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654122","url":null,"abstract":"The effects of Cu doping and post-deposition annealing on the properties of ZnTe thin films and CdS/CdTe solar cells with the ZnTe:Cu/Au back contact were investigated. The structural, compositional and electrical properties of ZnTe films were studied systematically using X-ray diffraction (XRD), electron microprobe analysis, atomic force microscopy (AFM), electrical resistivity and Hall effect measurements. ZnTe films with Cu concentrations of 1-6 at. % were used successfully as a back contact layer, providing fill factors over 0.70. The stability of CdTe/ZnTe/Au cells under accelerated temperature stress tests was investigated. I-V and C-V measurements, scanning Auger electron spectroscopy (AES) and X-ray photoemission spectroscopy (XPS) were used to clarify possible degradation mechanisms. Significant Cu and Te diffusion into Au layer and Au diffusion into ZnTe were observed after annealing.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"34 9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132132951","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 18
Thermosensoric localization of defects in CIS solar modules CIS太阳能组件缺陷的热感定位
W. Gross, J. Zettner, H. Scheuerpflug, T. Hierl, M. Schulz, F. Karg
Thermal imaging by an infrared camera is proposed to localize material defects in solar cell modules. The method is demonstrated on two CuInSe/sub 2/ minimodules consisting of 5 and 9 solar cells, respectively. Compared to the optical beam induced current (OBIC) method, the new thermosensoric defect localization (TDL) method is highly sensitive in solar modules and suitable for fabrication control. Shunts in the diode junction and series resistance in the semiconductor layer or the top contact may be differentiated.
提出了利用红外热成像技术对太阳能电池组件材料缺陷进行定位的方法。该方法在两个分别由5个和9个太阳能电池组成的CuInSe/ sub2 / mini模块上进行了验证。与光束感应电流(OBIC)方法相比,新的热感缺陷定位(TDL)方法在太阳能组件中具有高灵敏度,适合于制造控制。二极管结中的分流和半导体层或顶部触点中的串联电阻可以区分。
{"title":"Thermosensoric localization of defects in CIS solar modules","authors":"W. Gross, J. Zettner, H. Scheuerpflug, T. Hierl, M. Schulz, F. Karg","doi":"10.1109/PVSC.1997.654150","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654150","url":null,"abstract":"Thermal imaging by an infrared camera is proposed to localize material defects in solar cell modules. The method is demonstrated on two CuInSe/sub 2/ minimodules consisting of 5 and 9 solar cells, respectively. Compared to the optical beam induced current (OBIC) method, the new thermosensoric defect localization (TDL) method is highly sensitive in solar modules and suitable for fabrication control. Shunts in the diode junction and series resistance in the semiconductor layer or the top contact may be differentiated.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132457900","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A new method for the determination of the minority carrier lifetime based on a biased OCVD technique [solar cells] 基于偏置OCVD技术的少数载流子寿命测定新方法[太阳能电池]
C. J. Bruno, M.G. Martinez Bogado, J. Plá, J. C. Durán
A new simple method for the determination of the solar cell minority carrier lifetime (/spl tau/), based on a biased OCVD technique, is analyzed. In this case, the excitation is given by a pulsed light source (time dependent contribution) plus a continuous illumination (continuous forward bias). Under appropriate conditions, this configuration produces an exponential decay with a time constant which depends on the bias. This constant decreases monotonously as a function of bias and allows one to determine an effective /spl tau/ for the base region. Inexpensive test equipment has been developed which basically consists of two sets of high-efficiency GaAs LEDs, which provide both light contributions. Measurements have been performed on crystalline silicon solar cells elaborated in the Argentine Atomic Energy Commission. Experimental results show good agreement with the theoretical model and with numerical PC-1D simulations.
分析了一种基于偏置OCVD技术测定太阳电池少数载流子寿命(/spl tau/)的简便方法。在这种情况下,激发是由脉冲光源(时间相关贡献)加上连续照明(连续正向偏压)。在适当的条件下,这种结构产生一个指数衰减,其时间常数取决于偏置。该常数作为偏置的函数单调减小,并允许确定基区的有效/spl τ /。廉价的测试设备已经开发出来,它基本上由两组高效率的GaAs led组成,它们提供两种光贡献。阿根廷原子能委员会对晶体硅太阳能电池进行了测量。实验结果与理论模型和PC-1D数值模拟结果吻合较好。
{"title":"A new method for the determination of the minority carrier lifetime based on a biased OCVD technique [solar cells]","authors":"C. J. Bruno, M.G. Martinez Bogado, J. Plá, J. C. Durán","doi":"10.1109/PVSC.1997.654061","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654061","url":null,"abstract":"A new simple method for the determination of the solar cell minority carrier lifetime (/spl tau/), based on a biased OCVD technique, is analyzed. In this case, the excitation is given by a pulsed light source (time dependent contribution) plus a continuous illumination (continuous forward bias). Under appropriate conditions, this configuration produces an exponential decay with a time constant which depends on the bias. This constant decreases monotonously as a function of bias and allows one to determine an effective /spl tau/ for the base region. Inexpensive test equipment has been developed which basically consists of two sets of high-efficiency GaAs LEDs, which provide both light contributions. Measurements have been performed on crystalline silicon solar cells elaborated in the Argentine Atomic Energy Commission. Experimental results show good agreement with the theoretical model and with numerical PC-1D simulations.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130285706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electronic and mechanical properties of Ge films grown on glass substrates 玻璃基板上生长的 Ge 薄膜的电子和机械特性
R. Ahrenkiel, S. P. Ahrenkiel, M. Al‐Jassim, R. Venkatasubramanian
As germanium is closed lattice matched to GaAs, it a suitable substrate for epitaxial growth. In the quest for inexpensive substrates, thin-film Ge grown on glass is an attractive candidate if suitable grain growth can be achieved. Here we describe Ge films that are deposited by an e-beam evaporator on glass and are approximately 2000 /spl Aring/ thick. The films were annealed at 500/spl deg/C and 600/spl deg/C to improve the quality of the material. The growth was done in three steps with 1000 /spl Aring/ of Ge, 70 /spl Aring/ of Sb, and followed by another 1000 /spl Aring/ of Ge. Sb is an n-type dopant in Ge and is included to enhance grain growth. The best films contained the Sb layer and hole concentrations between 1.4/spl times/10/sup 15/ to 1.6/spl times/10/sup 17/ cm/sup -3/. The largest hole mobility measured was 30.6 cm/sup 2//Vs in the 1.4/spl times/10/sup 15/ p-type sample. The electron lifetime was measured by ultra-high frequency photoconductive decay and the best lifetimes were in the 30- to 40-ns range. Scanning-electron microscope and transmission-electron microscope studies indicated a polycrystalline grain structure with grain size comparable to the film thickness.
由于锗是与砷化镓相匹配的闭合晶格,它是一种适合外延生长的衬底。在寻找廉价衬底的过程中,如果能够实现合适的晶粒生长,在玻璃上生长的薄膜锗是一个有吸引力的候选者。在这里,我们描述了由电子束蒸发器沉积在玻璃上的锗膜,其厚度约为2000 /spl Aring/厚。为了提高材料的质量,对薄膜进行了500和600℃的退火处理。分别以1000 /spl / Ge、70 /spl / Sb、1000 /spl / Ge为3个阶段进行生长。Sb是锗中的n型掺杂剂,加入Sb是为了促进晶粒生长。最佳膜层含Sb层,空穴浓度在1.4/spl倍/10/sup 15/ ~ 1.6/spl倍/10/sup 17/ cm/sup -3/之间。在1.4/spl次/10/sup 15/ p型样品中,测得的最大孔迁移率为30.6 cm/sup 2//Vs。采用超高频光导衰减法测定了电子寿命,其最佳寿命在30 ~ 40 ns之间。扫描电镜和透射电镜研究表明,其晶粒尺寸与薄膜厚度相当。
{"title":"Electronic and mechanical properties of Ge films grown on glass substrates","authors":"R. Ahrenkiel, S. P. Ahrenkiel, M. Al‐Jassim, R. Venkatasubramanian","doi":"10.1109/PVSC.1997.654144","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654144","url":null,"abstract":"As germanium is closed lattice matched to GaAs, it a suitable substrate for epitaxial growth. In the quest for inexpensive substrates, thin-film Ge grown on glass is an attractive candidate if suitable grain growth can be achieved. Here we describe Ge films that are deposited by an e-beam evaporator on glass and are approximately 2000 /spl Aring/ thick. The films were annealed at 500/spl deg/C and 600/spl deg/C to improve the quality of the material. The growth was done in three steps with 1000 /spl Aring/ of Ge, 70 /spl Aring/ of Sb, and followed by another 1000 /spl Aring/ of Ge. Sb is an n-type dopant in Ge and is included to enhance grain growth. The best films contained the Sb layer and hole concentrations between 1.4/spl times/10/sup 15/ to 1.6/spl times/10/sup 17/ cm/sup -3/. The largest hole mobility measured was 30.6 cm/sup 2//Vs in the 1.4/spl times/10/sup 15/ p-type sample. The electron lifetime was measured by ultra-high frequency photoconductive decay and the best lifetimes were in the 30- to 40-ns range. Scanning-electron microscope and transmission-electron microscope studies indicated a polycrystalline grain structure with grain size comparable to the film thickness.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131151957","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
The morphology of CdS thin films deposited on SnO/sub 2/-coated glass substrates [for solar cells] SnO/ sub2 /-镀膜玻璃基板上沉积CdS薄膜的形貌[用于太阳能电池]
F. Hasoon, M. Al‐Jassim, A. Swartzlander, P. Sheldon, A. Al-Douri, A. Alnajjar
The morphology and microstructure of cadmium sulfide (CdS) thin films are a major concern in the fabrication process of CdTe solar cells. In this work, we investigate the morphology and microstructure of chemical-bath-deposited CdS in order to better understand the growth conditions that give rise to films for optimum device performance. The film morphology was investigated by field-emission, high-resolution scanning electron microscopy (SEM). The film microstructure was studied by transmission electron microscopy (TEM), while the film's chemistry was investigated by Auger electron spectroscopy (AES). All films examined exhibited pinholes and discontinuities varying in size and density. This may have a significant impact on cell performance by providing shunt paths between the CdTe and the SnO/sub 2/. Additionally, the CdS films are heavily faulted, which may partially explain why a high density of planar defects is observed in the CdTe/CdS interface region.
硫化镉(cd)薄膜的形貌和微观结构是CdTe太阳能电池制备过程中的一个重要问题。在这项工作中,我们研究了化学浴沉积CdS的形态和微观结构,以便更好地了解产生最佳器件性能的薄膜的生长条件。采用场发射、高分辨率扫描电镜(SEM)对膜的形貌进行了研究。利用透射电子显微镜(TEM)研究了膜的微观结构,并用俄歇电子能谱(AES)研究了膜的化学性质。所有检查的胶片都显示出针孔和大小和密度不等的不连续。通过在CdTe和SnO/sub /之间提供分流路径,这可能会对电池性能产生重大影响。此外,CdS薄膜有严重的缺陷,这可能部分解释了为什么在CdTe/CdS界面区域观察到高密度的平面缺陷。
{"title":"The morphology of CdS thin films deposited on SnO/sub 2/-coated glass substrates [for solar cells]","authors":"F. Hasoon, M. Al‐Jassim, A. Swartzlander, P. Sheldon, A. Al-Douri, A. Alnajjar","doi":"10.1109/PVSC.1997.654148","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654148","url":null,"abstract":"The morphology and microstructure of cadmium sulfide (CdS) thin films are a major concern in the fabrication process of CdTe solar cells. In this work, we investigate the morphology and microstructure of chemical-bath-deposited CdS in order to better understand the growth conditions that give rise to films for optimum device performance. The film morphology was investigated by field-emission, high-resolution scanning electron microscopy (SEM). The film microstructure was studied by transmission electron microscopy (TEM), while the film's chemistry was investigated by Auger electron spectroscopy (AES). All films examined exhibited pinholes and discontinuities varying in size and density. This may have a significant impact on cell performance by providing shunt paths between the CdTe and the SnO/sub 2/. Additionally, the CdS films are heavily faulted, which may partially explain why a high density of planar defects is observed in the CdTe/CdS interface region.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"92 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130853203","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The dependence of reactively sputtered ZnO electronic properties on growth parameters for use as buffer layers in CuIn/sub x/Ga/sub 1-x/Se/sub 2/ solar cells 在CuIn/sub x/Ga/sub 1-x/Se/sub 2/太阳能电池中作为缓冲层的反应溅射ZnO电子性能对生长参数的依赖性
R. Bhatt, H. Sankaranarayanan, C. Ferekides, D. Morel
High electronic quality undoped ZnO deposited by reactive sputtering has been developed for use as the buffer layer in CuIn/sub x/Ga/sub 1-x/Se/sub 2/ solar cells. Growth mechanisms are shown to differ from those resulting from conventional sputtering with ZnO targets. Film resistivity can be varied from 10/sup -2/ /spl rho/-cm to unmeasurable by variation of the growth parameters. Mobilities of films grown at substrate temperatures of 200/spl deg/C are in the range 25-30 cm/sup 2//V-s. Annealing at 325/spl deg/C increases mobilities to the 35-40 cm/sup 2//V-s range. The resulting resistivity, however, is dominated by the resulting carrier concentration which is controlled by oxygen vacancies. Devices fabricated with reactively sputtered buffer layers have matched the performance of the best literature results.
采用反应溅射法制备了高电子质量的未掺杂ZnO,可作为cu /sub x/Ga/sub 1-x/Se/sub 2/太阳能电池的缓冲层。生长机制与传统的ZnO靶溅射不同。薄膜电阻率的变化范围从10/sup -2/ /spl rho/-cm到生长参数的变化无法测量。衬底温度为200℃时,薄膜的迁移率在25 ~ 30 cm/sup /V-s之间。在325/spl度/C下退火可将迁移率提高到35-40 cm/sup 2/ V-s范围。然而,所得到的电阻率主要是由氧空位控制的载流子浓度决定的。用反应溅射缓冲层制备的器件的性能与最佳文献结果相匹配。
{"title":"The dependence of reactively sputtered ZnO electronic properties on growth parameters for use as buffer layers in CuIn/sub x/Ga/sub 1-x/Se/sub 2/ solar cells","authors":"R. Bhatt, H. Sankaranarayanan, C. Ferekides, D. Morel","doi":"10.1109/PVSC.1997.654108","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654108","url":null,"abstract":"High electronic quality undoped ZnO deposited by reactive sputtering has been developed for use as the buffer layer in CuIn/sub x/Ga/sub 1-x/Se/sub 2/ solar cells. Growth mechanisms are shown to differ from those resulting from conventional sputtering with ZnO targets. Film resistivity can be varied from 10/sup -2/ /spl rho/-cm to unmeasurable by variation of the growth parameters. Mobilities of films grown at substrate temperatures of 200/spl deg/C are in the range 25-30 cm/sup 2//V-s. Annealing at 325/spl deg/C increases mobilities to the 35-40 cm/sup 2//V-s range. The resulting resistivity, however, is dominated by the resulting carrier concentration which is controlled by oxygen vacancies. Devices fabricated with reactively sputtered buffer layers have matched the performance of the best literature results.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"36 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133411892","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
18.3% efficient silicon solar cells for space applications 用于空间应用的18.3%高效硅太阳能电池
G. Crotty, P. Verlinden, M. Cudzinovic, R. M. Swanson, R. Crane
In this paper, the authors report on the development of high-efficiency silicon solar cells designed specifically for space applications. The cells are the 100 /spl mu/m thin N/sup +/-P-P/sup +/ and are 2/spl times/4 cm in size. The front side surface is textured with inverted pyramids and received a double layer anti-reflection coating (ARC). They also have a back surface field (BSF) and a back surface reflector (BSR). Both front and back diffusions are optimized for radiation hardness. The best beginning of life (BOL) efficiencies of these thin (100 /spl mu/m) 2 cm/spl times/4 cm cells have been measured At JPL to be 18.3%. The best end of life (EOL) efficiencies after 1 MeV 1E15 electrons is 12.1%.
在本文中,作者报告了专为空间应用而设计的高效硅太阳能电池的发展。细胞为100 /spl μ /m薄的N/sup +/-P-P/sup +/,大小为2/spl倍/ 4cm。前侧面有倒金字塔纹理,并有双层抗反射涂层(ARC)。它们也有一个后表面场(BSF)和一个后表面反射器(BSR)。前后扩散均针对辐射硬度进行了优化。在JPL测得这些薄细胞(100 /spl mu/m) 2 cm/spl次/4 cm的最佳生命起始效率为18.3%。1mev 1E15电子后的最佳EOL效率为12.1%。
{"title":"18.3% efficient silicon solar cells for space applications","authors":"G. Crotty, P. Verlinden, M. Cudzinovic, R. M. Swanson, R. Crane","doi":"10.1109/PVSC.1997.654266","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654266","url":null,"abstract":"In this paper, the authors report on the development of high-efficiency silicon solar cells designed specifically for space applications. The cells are the 100 /spl mu/m thin N/sup +/-P-P/sup +/ and are 2/spl times/4 cm in size. The front side surface is textured with inverted pyramids and received a double layer anti-reflection coating (ARC). They also have a back surface field (BSF) and a back surface reflector (BSR). Both front and back diffusions are optimized for radiation hardness. The best beginning of life (BOL) efficiencies of these thin (100 /spl mu/m) 2 cm/spl times/4 cm cells have been measured At JPL to be 18.3%. The best end of life (EOL) efficiencies after 1 MeV 1E15 electrons is 12.1%.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133122142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Improved FF of CIGS thin-film mini-modules with Zn(O,S,OH)/sub x/ buffer by post-depostion light soaking 用Zn(O,S,OH)/sub x/缓冲液沉积后光浸泡法改善CIGS薄膜微型模块的FF
K. Kushiya, M. Tachiyuki, T. Kase, Y. Nagoya, T. Miura, D. Okumura, M. Satoh, I. Sugiyama, O. Yamase
In order to explain the observations on the post-deposition light soaking and understand this unique and valuable effect, a model is proposed and confirmed to work well. Based on the model, released H/sub 2/O molecules through the dehydration of Zn(OH)/sub 2/ in the Zn(O,S,OH)/sub x/ buffer during the light soaking is considered as a major player to affect the form factor (FF). The most striking result in this study is the post-deposition light soaking effect can be controlled from reversible to irreversible by adjusting the light soaking conditions. Approach to reduce the Zn(OH)/sub 2/ concentration in the buffer contributes to make a better p-n heterojunction and improve the yield.
为了解释沉积后光浸泡的观测结果,理解这种独特而有价值的效应,提出了一个模型,并证实了它的有效性。基于该模型,认为光浸泡时Zn(O,S,OH)/sub x/缓冲液中Zn(OH)/sub 2/脱水释放的H/sub 2/O分子是影响形状因子(FF)的主要因素。本研究最显著的结果是,通过调整光浸泡条件,可以将沉积后的光浸泡效应由可逆控制为不可逆。降低缓冲液中Zn(OH)/sub 2/浓度的方法有助于形成更好的p-n异质结,提高产率。
{"title":"Improved FF of CIGS thin-film mini-modules with Zn(O,S,OH)/sub x/ buffer by post-depostion light soaking","authors":"K. Kushiya, M. Tachiyuki, T. Kase, Y. Nagoya, T. Miura, D. Okumura, M. Satoh, I. Sugiyama, O. Yamase","doi":"10.1109/PVSC.1997.654094","DOIUrl":"https://doi.org/10.1109/PVSC.1997.654094","url":null,"abstract":"In order to explain the observations on the post-deposition light soaking and understand this unique and valuable effect, a model is proposed and confirmed to work well. Based on the model, released H/sub 2/O molecules through the dehydration of Zn(OH)/sub 2/ in the Zn(O,S,OH)/sub x/ buffer during the light soaking is considered as a major player to affect the form factor (FF). The most striking result in this study is the post-deposition light soaking effect can be controlled from reversible to irreversible by adjusting the light soaking conditions. Approach to reduce the Zn(OH)/sub 2/ concentration in the buffer contributes to make a better p-n heterojunction and improve the yield.","PeriodicalId":251166,"journal":{"name":"Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127393628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
期刊
Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1