Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838540
A. Chavan, K. Wise
This paper presents an integrated multitransducer capacitive barometric pressure sensor that is vacuum-sealed at wafer level. The interface circuitry is integrated directly within the sealed reference cavity, making the device immune to parasitic environmental effects. The overall device process merges BiCMOS circuitry with a dissolved wafer transducer process, is compatible with bulk- and surface-micromachining, and employs chemical mechanical polishing (CMP), anodic bonding, and hermetic lead transfers. The sensor achieves 15b resolution and is suitable for low-cost packaging. The device is composed of a programmable switched capacitor readout circuit, five segmented-range pressure transducers, and a reference capacitor, all integrated on a 7.5/spl times/6.5 mm/sup 2/ die using 3 /spl mu/m features.
{"title":"A monolithic fully-integrated vacuum-sealed CMOS pressure sensor","authors":"A. Chavan, K. Wise","doi":"10.1109/MEMSYS.2000.838540","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838540","url":null,"abstract":"This paper presents an integrated multitransducer capacitive barometric pressure sensor that is vacuum-sealed at wafer level. The interface circuitry is integrated directly within the sealed reference cavity, making the device immune to parasitic environmental effects. The overall device process merges BiCMOS circuitry with a dissolved wafer transducer process, is compatible with bulk- and surface-micromachining, and employs chemical mechanical polishing (CMP), anodic bonding, and hermetic lead transfers. The sensor achieves 15b resolution and is suitable for low-cost packaging. The device is composed of a programmable switched capacitor readout circuit, five segmented-range pressure transducers, and a reference capacitor, all integrated on a 7.5/spl times/6.5 mm/sup 2/ die using 3 /spl mu/m features.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116296245","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838508
N. Miki, I. Shimoyama
A flight mechanism with 2 mm long micro-rotational wings has been designed and fabricated. The rotational wings are made of cobalt-nickel alloy and rotate in an alternating magnetic field. The flight mechanism is composed of the rotational wings, non-rotational body and disk. The wings and the disk are attached to glass rod and rotate together. As the rotating frequency increases, the wings and the disk move up and the disk pushes the body upwards, and then the whole structures take off. The characteristics of the rotational wings are investigated. A scale effect is found; the characteristics of the rotational wings get better as the wing length decreases. It is considered to be caused by the wing-longitudinal flow, which is often ignored in high Reynolds number flow. The non-rotational body has soft magnetic films. Due to the magnetic anisotropic torque exerted on the films, the body can maintain its attitude stability passively. The flight mechanism that weighs 1.6 mg succeeded in taking-off at 438 Hz keeping the attitude of the body stable. The magnetic torque between the external magnetic field and the wings must be larger than the torque from the air and the friction in order to keep the wings rotating. The relationship between the required magnetic field and the rotating frequency is investigated.
{"title":"A micro-flight mechanism with rotational wings","authors":"N. Miki, I. Shimoyama","doi":"10.1109/MEMSYS.2000.838508","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838508","url":null,"abstract":"A flight mechanism with 2 mm long micro-rotational wings has been designed and fabricated. The rotational wings are made of cobalt-nickel alloy and rotate in an alternating magnetic field. The flight mechanism is composed of the rotational wings, non-rotational body and disk. The wings and the disk are attached to glass rod and rotate together. As the rotating frequency increases, the wings and the disk move up and the disk pushes the body upwards, and then the whole structures take off. The characteristics of the rotational wings are investigated. A scale effect is found; the characteristics of the rotational wings get better as the wing length decreases. It is considered to be caused by the wing-longitudinal flow, which is often ignored in high Reynolds number flow. The non-rotational body has soft magnetic films. Due to the magnetic anisotropic torque exerted on the films, the body can maintain its attitude stability passively. The flight mechanism that weighs 1.6 mg succeeded in taking-off at 438 Hz keeping the attitude of the body stable. The magnetic torque between the external magnetic field and the wings must be larger than the torque from the air and the friction in order to keep the wings rotating. The relationship between the required magnetic field and the rotating frequency is investigated.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125838906","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838585
H. Ueno, N. Nishi, S. Sugiyama
In this paper, we present the fabrication of sub-micron structures with high aspect ratio for practical and high performance microelectromechanical systems (MEMS) using deep X-ray lithography. It is necessary for practical and high performance MEMS to be fabricated microstructures with sub-micron widths and gaps (lines and spaces). In order to fabricate the sub-micron microstructures, sub-micron deep X-ray lithography has been investigated. As a result, a sub-micron PMMA structure with 0.2 /spl mu/m minimum width, 6 /spl mu/m length and 17 /spl mu/m height was fabricated by deep X-ray lithography using an X-ray mask with thick X-ray absorbers having sub-micron width.
{"title":"Fabrication of sub-micron structures with high aspect ratio for MEMS using deep X-ray lithography","authors":"H. Ueno, N. Nishi, S. Sugiyama","doi":"10.1109/MEMSYS.2000.838585","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838585","url":null,"abstract":"In this paper, we present the fabrication of sub-micron structures with high aspect ratio for practical and high performance microelectromechanical systems (MEMS) using deep X-ray lithography. It is necessary for practical and high performance MEMS to be fabricated microstructures with sub-micron widths and gaps (lines and spaces). In order to fabricate the sub-micron microstructures, sub-micron deep X-ray lithography has been investigated. As a result, a sub-micron PMMA structure with 0.2 /spl mu/m minimum width, 6 /spl mu/m length and 17 /spl mu/m height was fabricated by deep X-ray lithography using an X-ray mask with thick X-ray absorbers having sub-micron width.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130647913","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838557
Y. Yee, H. Nam, See‐Hyung Lee, J. Bu, Y. Jeon, Seong-Moon Cho
A micromirror actuated by piezoelectric cantilevers is proposed as a fine-tracking device for high-density optical data storage. Metal/PZT/metal thin film actuators translate an integrated micromirror along the out-of-plane vertical direction. The parallel motion of the micromirror steers linearly the optical path of the reflected laser beam. Numerical analysis shows that the actuated micromirror can satisfy the tracking speed imposed by the requirement on the access time for the high-density optical data storage up to few tens Gbit/in/sup 2/. In this paper, preliminary characteristics of the micromachined PZT actuated micromirror (PAM) are reported. The design and the fabrication process of the PZT actuated micromirror are described. Only a 3600 /spl Aring/-thick PZT film deposited by sol-gel process shows both good electrical and mechanical characteristics for the actuators. The micromirror can be easily actuated up to several micrometers under low voltage operation condition.
{"title":"PZT actuated micromirror for nano-tracking of laser beam for high-density optical data storage","authors":"Y. Yee, H. Nam, See‐Hyung Lee, J. Bu, Y. Jeon, Seong-Moon Cho","doi":"10.1109/MEMSYS.2000.838557","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838557","url":null,"abstract":"A micromirror actuated by piezoelectric cantilevers is proposed as a fine-tracking device for high-density optical data storage. Metal/PZT/metal thin film actuators translate an integrated micromirror along the out-of-plane vertical direction. The parallel motion of the micromirror steers linearly the optical path of the reflected laser beam. Numerical analysis shows that the actuated micromirror can satisfy the tracking speed imposed by the requirement on the access time for the high-density optical data storage up to few tens Gbit/in/sup 2/. In this paper, preliminary characteristics of the micromachined PZT actuated micromirror (PAM) are reported. The design and the fabrication process of the PZT actuated micromirror are described. Only a 3600 /spl Aring/-thick PZT film deposited by sol-gel process shows both good electrical and mechanical characteristics for the actuators. The micromirror can be easily actuated up to several micrometers under low voltage operation condition.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129579402","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838487
V. Kaajakari, S. Rodgers, A. Lal
The first-ever all-surface micromachined ultrasonic micro-rotor is presented. The rotor is actuated by electrically driving a piezoelectric PZT plate mounted at the back of the silicon die eliminating the need for interconnects and space consuming surface actuators. The rotor operates with a single phase sub-five volt peak-to-peak excitation in atmospheric pressure. The piezoelectric plate is adhesively mounted making the method suitable for actuating micromachines from any surface micromachine process. Two different modes of operation are demonstrated: pulsed and resonant. The pulse actuation results in low rotation rate (0.5-3 RPM) while resonant actuation results in a fast rotation (10-100 RPM). The ability to drive a geared down rotor (50:7), much smaller than the driving rotor indicates high torque output capability.
{"title":"Ultrasonically driven surface micromachined motor","authors":"V. Kaajakari, S. Rodgers, A. Lal","doi":"10.1109/MEMSYS.2000.838487","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838487","url":null,"abstract":"The first-ever all-surface micromachined ultrasonic micro-rotor is presented. The rotor is actuated by electrically driving a piezoelectric PZT plate mounted at the back of the silicon die eliminating the need for interconnects and space consuming surface actuators. The rotor operates with a single phase sub-five volt peak-to-peak excitation in atmospheric pressure. The piezoelectric plate is adhesively mounted making the method suitable for actuating micromachines from any surface micromachine process. Two different modes of operation are demonstrated: pulsed and resonant. The pulse actuation results in low rotation rate (0.5-3 RPM) while resonant actuation results in a fast rotation (10-100 RPM). The ability to drive a geared down rotor (50:7), much smaller than the driving rotor indicates high torque output capability.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129811140","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838507
C. Chung, M. Allen
Electrical isolation of bulk micromachined single crystal silicon MEMS devices is demonstrated using through-wafer junction isolation. Through-wafer npn junctions are fabricated using "temperature gradient zone melting" or "thermomigration" of aluminum in n-type silicon. The npn structures isolate various regions of the single crystal silicon from one another by acting as back-to-back diodes. Thermomigration is a potentially high-throughput process that is consistent with batch fabrication principles, avoids the necessity of a handle wafer, and retains the mechanical integrity of single crystal silicon. By use of this process, electrically isolated sensors and actuators can be fabricated from a single wafer of silicon. Breakdown voltages of multiple thermomigrated npn junctions in excess of 1500 V are demonstrated. The utility of this technique is shown by fabricating a comb-drive electrostatic actuator from a single silicon wafer and driving it at 162 Vpp.
{"title":"Electrical isolation of bulk silicon MEMS devices via thermomigration","authors":"C. Chung, M. Allen","doi":"10.1109/MEMSYS.2000.838507","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838507","url":null,"abstract":"Electrical isolation of bulk micromachined single crystal silicon MEMS devices is demonstrated using through-wafer junction isolation. Through-wafer npn junctions are fabricated using \"temperature gradient zone melting\" or \"thermomigration\" of aluminum in n-type silicon. The npn structures isolate various regions of the single crystal silicon from one another by acting as back-to-back diodes. Thermomigration is a potentially high-throughput process that is consistent with batch fabrication principles, avoids the necessity of a handle wafer, and retains the mechanical integrity of single crystal silicon. By use of this process, electrically isolated sensors and actuators can be fabricated from a single wafer of silicon. Breakdown voltages of multiple thermomigrated npn junctions in excess of 1500 V are demonstrated. The utility of this technique is shown by fabricating a comb-drive electrostatic actuator from a single silicon wafer and driving it at 162 Vpp.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"110 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132453574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838605
B. Guldimann, P. Thiebaud, N. D. de Rooij, R. A. Turpin
A highly sensitive shutter modulated fiber-optic accelerometer has been fabricated and characterized. Its structure is based on a mass suspended by two side-by-side cantilever beams. A vertical shutter at the free end of the mass can move vertically in the optical path between two multimode optical fibers. Cantilever beams, mass, shutter and optical fiber grooves are fabricated by advanced deep reactive ion etching. The accelerometer is characterized using a supra luminescent diode. A resonance frequency above 1 kHz and a measurement range of /spl plusmn/5 g are measured. To demonstrate the potential of using an economic light emitting diode, an experiment with 2 /spl mu/W input power was performed. It resulted in a noise equivalent acceleration of 2 mg.
{"title":"Micromachined, fiber-optic based accelerometer with shutter modulation","authors":"B. Guldimann, P. Thiebaud, N. D. de Rooij, R. A. Turpin","doi":"10.1109/MEMSYS.2000.838605","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838605","url":null,"abstract":"A highly sensitive shutter modulated fiber-optic accelerometer has been fabricated and characterized. Its structure is based on a mass suspended by two side-by-side cantilever beams. A vertical shutter at the free end of the mass can move vertically in the optical path between two multimode optical fibers. Cantilever beams, mass, shutter and optical fiber grooves are fabricated by advanced deep reactive ion etching. The accelerometer is characterized using a supra luminescent diode. A resonance frequency above 1 kHz and a measurement range of /spl plusmn/5 g are measured. To demonstrate the potential of using an economic light emitting diode, an experiment with 2 /spl mu/W input power was performed. It resulted in a noise equivalent acceleration of 2 mg.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128988348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838620
T. Pornsin-Sirirak, S. W. Lee, H. Nassef, J. Grasmeyer, Y. Tai, Chih-Ming Ho, M. Keennon
The objective of this project is to develop a battery-powered ornithopter (flapping-wing) Micro Aerial Vehicle (MAV) with MEMS wings. In this paper, we present a novel MEMS-based wing technology that we developed using titanium-alloy metal as wingframe and parylene C as wing membrane. MEMS technology enables systematic research in terms of repeatability, size control, and weight minimization. We constructed a high quality low-speed wind tunnel with velocity uniformity of 0.5% and speeds from 1 m/s to 10 m/s. We have tested and have studied the unsteady-state aerodynamics of various types of MEMS wings. Finally, we built lightweight ornithopters with electric-powered transmission system and have demonstrated successful free flights of with flight duration ranges from 5 to 18 seconds.
{"title":"MEMS wing technology for a battery-powered ornithopter","authors":"T. Pornsin-Sirirak, S. W. Lee, H. Nassef, J. Grasmeyer, Y. Tai, Chih-Ming Ho, M. Keennon","doi":"10.1109/MEMSYS.2000.838620","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838620","url":null,"abstract":"The objective of this project is to develop a battery-powered ornithopter (flapping-wing) Micro Aerial Vehicle (MAV) with MEMS wings. In this paper, we present a novel MEMS-based wing technology that we developed using titanium-alloy metal as wingframe and parylene C as wing membrane. MEMS technology enables systematic research in terms of repeatability, size control, and weight minimization. We constructed a high quality low-speed wind tunnel with velocity uniformity of 0.5% and speeds from 1 m/s to 10 m/s. We have tested and have studied the unsteady-state aerodynamics of various types of MEMS wings. Finally, we built lightweight ornithopters with electric-powered transmission system and have demonstrated successful free flights of with flight duration ranges from 5 to 18 seconds.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122884809","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838562
P. Hélin, M. Mita, H. Fujita
This paper reports a new and low cost method of fabrication for M*N matrix switch using wet etching of silicon: a self-aligned batch process allowing the fabrication of vertical mirrors and V-grooves is performed in one-level of mask in [100] silicon wafer. The feasibility of a self-latching system with electromagnetic force is shown for the actuation of switch. Promising performances such as insertion loss lower than 0.5 dB, submillisecond switching time (0.4 ms) and reliable operation (20 > million cycles) are achieved.
{"title":"Self aligned vertical mirrors and V-grooves applied to a self-latching matrix switch for optical networks","authors":"P. Hélin, M. Mita, H. Fujita","doi":"10.1109/MEMSYS.2000.838562","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838562","url":null,"abstract":"This paper reports a new and low cost method of fabrication for M*N matrix switch using wet etching of silicon: a self-aligned batch process allowing the fabrication of vertical mirrors and V-grooves is performed in one-level of mask in [100] silicon wafer. The feasibility of a self-latching system with electromagnetic force is shown for the actuation of switch. Promising performances such as insertion loss lower than 0.5 dB, submillisecond switching time (0.4 ms) and reliable operation (20 > million cycles) are achieved.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"91 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123309721","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2000-01-23DOI: 10.1109/MEMSYS.2000.838546
T. Mineta, T. Mitsui, Y. Watanabe, S. Kobayashi, Y. Haga, M. Esashi
Batch fabrication process of a shape memory alloy (SMA) sheet based on electrochemical pulsed etching with a sacrificial dummy metal layer has been studied and flat winding S-shape SMA actuators have been developed. The actuators are 38 /spl mu/m in thickness and generated forces from 40 to 95 mN were obtained according to the width from 410 to 170 /spl mu/m. The flat winding SMA actuator could realize active catheter with small outer diameter and wide inner working channel. The batch fabrication process was also applied to micromachining of NiTi super elastic alloy (SEA) for biasing spring of the catheter.
{"title":"Batch fabricated flat winding shape memory alloy actuator for active catheter","authors":"T. Mineta, T. Mitsui, Y. Watanabe, S. Kobayashi, Y. Haga, M. Esashi","doi":"10.1109/MEMSYS.2000.838546","DOIUrl":"https://doi.org/10.1109/MEMSYS.2000.838546","url":null,"abstract":"Batch fabrication process of a shape memory alloy (SMA) sheet based on electrochemical pulsed etching with a sacrificial dummy metal layer has been studied and flat winding S-shape SMA actuators have been developed. The actuators are 38 /spl mu/m in thickness and generated forces from 40 to 95 mN were obtained according to the width from 410 to 170 /spl mu/m. The flat winding SMA actuator could realize active catheter with small outer diameter and wide inner working channel. The batch fabrication process was also applied to micromachining of NiTi super elastic alloy (SEA) for biasing spring of the catheter.","PeriodicalId":251857,"journal":{"name":"Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308)","volume":"121 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114639142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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