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2007 8th International Conference on Electronic Packaging Technology最新文献

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The Application of a Type of Electric Pastern in the Bonding Technique of the Microcircuit Board 一种电粘接技术在微电路板粘接技术中的应用
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441463
Zhiping Zhao, L. Cao
The authors have performed experiments in the felting of electric pasterns upon the samples of aluminum alloy boards, gold-plating boards and glass strips, the method of which is to first felt 2 microcircuit boards with electric pastern and fix them with some mechanical devices, then keep them in the drying blast oven for 4 hours with a constant temperature of 150plusmn2degC and finally, cool them naturally to the ambient temperature. The series of experiments made include the testing of the extension and cutting intensity of the electric pastern, the testing of the volume resistivity of the electric pastern and the experiment of the concussion given to the electric pastern at relatively high or low temperatures, the purpose of which is to test the reliability of its felting quality and further to study the application of the electric pastern in the bonding technique of the microcircuit board. Obtained from the testing of extension intensity carried out with the relevant testing machine according to GB7124- 86, the testing value of aluminum alloy board is between 5.5M Pa and 6.99 M pa, the testing value of the gold-plating board is from 2.45M Pa to 3.07M Pa, which clearly mean that the joining intensity of electric pastern to aluminum alloy board is better than that to the gold-plating board. However, both intensities have met our demands and are acceptable. We also have tested the volume resistivity of the glass strips connected to it. Since for the bonding technique of the microcircuit board, it is usually acceptable if the resistivity of the electric pastern is less than 9.0 X10"4 Q.cm, our testing data have shown that the quality of this type of electric pastern is satisfactory. Having fulfilled the concussion test for the microcircuit board at relatively high or low temperatures, we have tested the reliability of the bonding points. The finding shows that the change of the resistivity of the microcircuit board is within very small scale, and if assigned to every felting point, the change can simply be ignored, thus cannot affect the felting quality at all. To sum up, the series of experiments have given the proof that this type of electric pastern meets the requirements of the bonding technique of the microcircuit board connected by gold threads or gold bands.
本文对铝合金板、金箔板和玻璃条样品进行了电贴毡的实验,方法是先用电贴毡毡2块微电路板,用机械装置固定,然后在恒温150℃的烘箱中烘干4小时,最后自然冷却至环境温度。所做的一系列实验包括电胶的拉伸强度和切割强度的测试,电胶的体积电阻率的测试,以及在较高或较低温度下对电胶的冲击实验,目的是为了测试其触感质量的可靠性,并进一步研究电胶在微电路板粘接技术中的应用。根据GB7124- 86用相关试验机进行拉伸强度测试得出,铝合金板的测试值在5.5M Pa ~ 6.99 M Pa之间,镀金板的测试值在2.45M Pa ~ 3.07M Pa之间,这显然意味着电粘贴对铝合金板的连接强度要优于对镀金板的连接强度。然而,这两种强度都达到了我们的要求,是可以接受的。我们还测试了与其相连的玻璃条的体积电阻率。由于对于微电路板的粘接技术,通常电胶的电阻率小于9.0 X10“4 Q.cm是可以接受的,我们的测试数据表明这种电胶的质量是令人满意的。在完成了微电路板在相对较高或较低温度下的震荡测试后,我们测试了键合点的可靠性。研究结果表明,微线路板电阻率的变化在很小的范围内,如果分配到每个感觉点,这种变化可以简单地忽略,因此根本不会影响感觉质量。综上所述,一系列的实验证明,这种电粘接方式满足了金线或金带连接微电路板的粘接技术要求。
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引用次数: 0
Oxidation Behavior and Intermetallic Compounds Growth of Sn-Ag-Bi-Cr Lead-free Solder Sn-Ag-Bi-Cr无铅钎料的氧化行为和金属间化合物生长
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441468
Huang Wang, A. Hu, Cheng Li, D. Mao
Concentrations of 0.1. 0.3. and 0.5 wt.% of Cr were added to Sn-3Ag-3Bi alloy to produce Sn-Ag-Bi-Cr alloys. The microstmcture is refined with Cr additions, while significantly improves the oxidation resistance. There is no change in the wettability and liquidus temperature after Cr additions. In addition, the effect of Cr addition on the intermetallic compounds was discussed.
浓度为0.1。0.3. 在Sn-3Ag-3Bi合金中加入0.5 wt.%的Cr,制得Sn-Ag-Bi-Cr合金。Cr的加入细化了微观组织,同时显著提高了抗氧化性能。Cr的加入对润湿性和液相温度没有影响。此外,还讨论了Cr的加入对金属间化合物的影响。
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引用次数: 5
Sagging Phenomenon of Micro-Solder Joints Fabricated by Laser Reflow Process 激光回流焊微焊点的下垂现象
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441450
Wei Liu, Chunqing Wang, Yanhong Tian, Lingchao Kong
Au surface finish is very common used as a protection layer on pad. In the traditional reflow process, Au is dissolved into solder, and AuSn4 intermetallic components (IMCs) forms. However, for the solder joints fabricated by laser soldering, the morphology and distribution of the AuSnx IMC are quite different from that in solder joints fabricated by traditional reflow methods. This paper reports a 'sagging phenomenon' that has been observed from a study in the right-angled solder interconnections fabricated by laser reflow process. The solder was Sn-3.5Ag-0.7Cu and Sn-2.0Ag-0.75Cu-3Bi alloys (120 mum in diameter). On the laser reflowed solder joint, sink steps were found near the interface of solder and the edge of pad, which was made up of Cu plated with 3 mum thickness of Au, and this phenomenon was called as sagging. However, no sagging phenomenon was observed at the interface of solder and the edge of another pad finished with 0.01 mumTa/0.1 mumNi/4.0 mumAu, the material beneath the pad was thick Al2O3. In addition, Sn-Pb eutectic solder was also introduced in this study as a comparison, the sagging phenomenon in Sn-Pb eutectic solder joint was not as seriously as that in the two kinds of lead-free solder. The study results indicate that sagging phenomenon happened after the laser reflow process is related to the following factors: different cooling speed at the interfaces of solder and the pads, the Melting temperature difference between solder and IMCs, shrinkage of solder when it solidifies, and wetting performance of solder on solidified IMCs.
金表面处理是非常常用的作为保护层的垫。在传统的回流工艺中,Au溶解在焊料中,形成AuSn4金属间成分(IMCs)。然而,对于激光焊接的焊点,AuSnx IMC的形貌和分布与传统回流焊的焊点有很大的不同。本文报道了在激光回流工艺制作直角焊料互连过程中观察到的“下垂现象”。焊料为Sn-3.5Ag-0.7Cu和Sn-2.0Ag-0.75Cu-3Bi合金(直径120 μ m)。在激光回流焊点上,在焊料界面和焊盘边缘附近发现了下沉的台阶,焊盘由镀有3 μ m厚Au的铜构成,这种现象称为下垂。然而,在焊料界面和另一个以0.01 mumTa/0.1 mumNi/4.0 mumAu处理的焊盘边缘未观察到下垂现象,焊盘下方的材料为厚Al2O3。此外,本研究还介绍了Sn-Pb共晶焊点作为比较,Sn-Pb共晶焊点的下垂现象没有两种无铅焊点严重。研究结果表明,激光回流过程中出现的下垂现象与焊料与焊盘界面冷却速度不同、焊料与imc的熔化温差、焊料凝固时的收缩率以及焊料在凝固imc上的润湿性能等因素有关。
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引用次数: 2
University Education Curriculum and Lab Construction On Microelectronics Packaging and Assembly 微电子封装与组装大学教育课程与实验室建设
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441572
Xiaosong Ma, Daoguo Yang, G.Q. Zhang
China's electronics industry has seen a significant development in the last decades. The electronics manufacturing industry has become the country's largest industry. Many well-qualified researchers and engineers are needed to meet the demands of the microelectronics industry and research. The fast developing electronics industry challenges the conventional university education. How to innovate the education curriculum to provide qualified engineers for the electronics industry is a challenging task for universities. Education program on microelectronic packaging and assembly has been established at GUET. In this paper, the experiences of establishing the multi-level education program for the microelectronics manufacturing are briefly summarized. A focus is put on the new bachelor's degree program of Microelectronic Manufacturing Engineering. The objective, scope and curriculum structure of the education program are proposed, which is with an emphasis on the sectors of electronic packaging, assembly and test. This proposal is supported by the fact of the existing huge demands for the qualified engineers in these sectors. To achieve the goal, the core courses for the educational curriculum and educational means are proposed and discussed. Further effort to enhance the educational ability is needed.
在过去的几十年里,中国的电子工业有了显著的发展。电子制造业已成为全国第一大产业。许多高素质的研究人员和工程师需要满足微电子工业和研究的需求。快速发展的电子工业对传统的大学教育提出了挑战。如何创新教育课程,为电子行业培养合格的工程师,是摆在高校面前的一项具有挑战性的任务。我校建立了微电子封装与组装教育项目。本文简要总结了微电子制造专业建立多层次教育体系的经验。重点介绍了新的微电子制造工程学士学位课程。提出了以电子封装、组装和测试领域为重点的教育目标、范围和课程结构。这些部门对合格工程师的巨大需求支持了这一建议。为实现这一目标,提出并探讨了教育课程的核心课程和教育手段。需要进一步努力提高教育能力。
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引用次数: 0
Effect of Under Bump Metallization (UBM) Quality on Long Term Reliability 碰撞下金属化(UBM)质量对长期可靠性的影响
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441571
R. Rao, M. Seabock, T. Fang, R. Carew
Ti/Cu/Ni Under Bump Metallization (UBM) structure is used for eutectic. i.e.. 63Sn37Pb. solder bump with Ti for adhesion and seal. Cu as current earning layer, and electroplated Ni as diffusion barrier. In this study, the effect of the integrity of UBM structure within a passivation via, particularly the integrity of Ni barrier layer, on the product long-term reliability has been investigated. The defective Ni plating within a passivation via is mainly due to the bumping pattern, the difficulty in monitoring Ni thickness and a non-appropriate Ni thickness specification. The reliability testing results indicate that the defective Ni plating has no effect on bump shear strength, temperature cycling and high temperature storage tests. But. it does cause a failure when an elevated temperature and current are applied such as temperature humidity with Bias Current test in tins study. Failure analysis was performed to understand the failure modes and failure mechanisms were also analyzed. The analysis results indicate that the Ni thickness, particularly at the corner of via is most critical to the reliability. In order to guarantee the long-term reliability, it is recommended that an appropriate Ni thickness specification be established based on quantitative analysis results by considering six major factors discussed in section eight.
共晶采用Ti/Cu/Ni凹凸下金属化(UBM)结构。即. .63 sn37pb。焊锡凹凸与Ti粘合和密封。铜作为吸流层,镀镍作为扩散屏障。在本研究中,研究了钝化孔内UBM结构的完整性,特别是Ni势垒层的完整性对产品长期可靠性的影响。钝化孔内镀镍缺陷主要是由于凹凸模式、镍厚度监测困难和镍厚度规格不合适。可靠性试验结果表明,镀镍缺陷对冲击抗剪强度、温度循环和高温贮存试验没有影响。但是。当施加较高的温度和电流时,例如锡研究中的偏置电流测试中的温度湿度,它确实会导致故障。进行了失效分析,了解了失效模式,分析了失效机理。分析结果表明,镍的厚度,尤其是通孔拐角的厚度对可靠性的影响最为关键。为了保证长期的可靠性,建议在定量分析结果的基础上,综合考虑第8节讨论的六个主要因素,确定合适的Ni厚度规格。
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引用次数: 2
Mixed Mode Fracture Toughness Test of Bimaterial Interface in Different Humidity Conditions 不同湿度条件下双材料界面混合模断裂韧性试验
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441531
Anlin Ye, L. Qin
The strength of an interface is subjected to temperature, humidity and different global mixed mode loading conditions. This paper describes the measurement of the interface fracture toughness as a function of relative humidity using a compact mixed mode (CMM) specimen in Instron 5567 testing system machine. In the test, The conditions of specimen are parting dry condition and moisture preconditioning (85degC /85% RH/168h and 85degC /60 %RH/168h), measuring fracture critical value of specimen with different global mixed mode loading conditions, the fracture critical value of specimen is the average failure value of 2 specimens at each loading angle of global mixed mode, the fracture critical value shows that the interface fracture toughness is decreased when relative humidity increased. Then, finite element analysis modeling for an interface crack in the CMM specimen provides the necessary stress intensity factor calculation. The results show that the mode II fracture toughness generally display a larger value than the mode I toughness in the same humidity condition. Moreover, fracture toughness is decreased when humidity increased at the same mixed mode loading. The Failure criterion based on a failure analysis diagram or effective critical stress intensity factors are proposed for interface cracks loaded under different mixed-mode and humidity fracture conditions. This method of the test for data and the finite element simulation for evaluation of interfacial fracture toughness.
界面强度受温度、湿度和不同整体混合模态加载条件的影响。本文介绍了在Instron 5567试验机上,采用紧凑混合模(CMM)试样测量界面断裂韧性与相对湿度的关系。试验中,试样分别采用分型干燥条件和水分预处理条件(85℃/85% RH/168h和85℃/ 60% RH/168h),测量不同整体混合模式加载条件下试样的断裂临界值,试样的断裂临界值为2个试样在整体混合模式各加载角度下的平均破坏值,断裂临界值表明相对湿度增大,界面断裂韧性降低。然后,对三坐标测量机试件中的界面裂纹进行有限元分析建模,提供必要的应力强度因子计算。结果表明:在相同湿度条件下,II型断裂韧性普遍大于I型断裂韧性;在相同的混合模式加载下,随着湿度的增加,断裂韧性降低。提出了基于破坏分析图或有效临界应力强度因子的界面裂纹在不同混合模式和湿度条件下的破坏准则。该方法采用试验数据和有限元模拟来评价界面断裂韧性。
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引用次数: 1
Effect of Post-Mold Curing of Epoxy Molding Compound on Wirebond Reliability in a MOSFET 模后固化环氧树脂对MOSFET中线键可靠性的影响
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441432
R.T. Nayak, T. Ahmed, A. Krishna, K. Hollis
Automotive microelectronic packages experience severe thermal stresses that occasionally cause components and electrical interconnection damage. In tins field of application high reliability is of decisive importance, especially for aluminum wire bonds with diameters of the order of 125 mum, connecting the silicon device with the output pins. Silica filled epoxy resins as encapsulation in chip packages play a major influence on reliability and functionality of microelectronic devices. The paper intends to help understand the reliability of Aluminum wirebonds inside a leaded electronic package like Power MOSFET (metal oxide silicon field effect transistor) under the influence of post-mold curing (PMC) on thermo-mechanical properties of the mold material, like glass transition temperature (Tg), coefficients of thermal expansion (CTE) and flexural moduli. Experimental validation indicates an electrical open gate in the specimen caused due to delamination of gate bond wire (SAT and SEM images) near the leadframe bonding post under power thermal cycling from -40C to 125C. Finite element modeling is used to simulate the stresses the package goes through during reliability tests. The FE model consists of the entire MOSFET package including the lead frame, over mold, chip, substrate. Al wire loops and corresponding bond pads. The simulation considering thermal mismatch predicts high in-plane shear forces at the heel of the wire bond supported by the empirical test results. Optimum values of thermo-mechanical properties having a combination of low CTE and high E value at a higher Tg (obtained by increased PMC duration), recommended to ensure reliability of wire bond. Further, results show evidence of higher variation of in-plane shear force on the wire bond with change in CTE as compared to E. Results derived from numerical simulation and experimental data is used to serve as a guideline in the selection of suitable molding compound.
汽车微电子封装经历严重的热应力,偶尔会导致组件和电气互连损坏。在锡应用领域,高可靠性是至关重要的,特别是直径为125微米的铝线键,连接硅器件和输出引脚。二氧化硅填充环氧树脂作为芯片封装的封装对微电子器件的可靠性和功能有着重要的影响。本文旨在帮助了解在模后固化(PMC)对模具材料的热机械性能(如玻璃化转变温度(Tg)、热膨胀系数(CTE)和弯曲模量)的影响下,电源MOSFET(金属氧化物硅场效应晶体管)等含铅电子封装内铝线键的可靠性。实验验证表明,在-40℃至125℃的功率热循环下,由于引线框架键合柱附近的栅极键合线(SAT和SEM图像)分层而导致样品中的电气开闸。在可靠性试验中,采用有限元模型来模拟包装所经受的应力。FE模型由整个MOSFET封装组成,包括引线框架、上模、芯片、衬底。铝丝环及相应的焊盘。考虑热失配的模拟预测,在经验试验结果的支持下,金属丝粘结后跟处存在较大的面内剪切力。在较高的Tg(通过增加PMC持续时间获得)下,推荐具有低CTE和高E值的热机械性能的最佳值,以确保线接的可靠性。此外,结果表明,与e相比,随着CTE的变化,线键面内剪切力的变化更大。数值模拟和实验数据的结果可作为选择合适成型化合物的指导。
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引用次数: 3
The Determinations of Pb, Cd, Hg, Cr6+, PBBs/PBDEs to Comply with RoHS Directive 符合RoHS指令的铅、镉、汞、Cr6+、多溴联苯/多溴二苯醚的测定
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441478
L. Hua, Y.P. Wu, B. An, Y. Chan, B.Y. Wu, F.S. Wu
For RoHS compliance, a method coupled inductively coupled plasma-optical emission spectrometry (ICP-OES), gas chromatography-mass spectrometry (GC-MS), and UV-visible spectrophotometry with microwave technology was developed to determine trace Cd, Hg, Pb, Cr6+, PBBs/PBDEs in electronic and electrical products (EEP). Elements were screened by Energy dispersion X-ray fluorescence spectrometry (EDXRF). In order to achieve good performance, other methods such as colorific test, inter-element correction (IEC) and standard addition techniques etc. were performed. By this study, it showed that analyses of Hg, Cd, Pb by ICP-OES and Cr6+ by UV-visible spectrophotometry had a RSD <5%, and a RSD <1% for PBBs/PBDEs by GC-MS analyzer. UV-visible spectrophotometry offered a good alternative for Cr6+ determination with alkali digestion, the inferences from Fe3+, Pb2+ etc. were eliminated by K2HPO4 buffer. The ramifications from monoBB/BDE to DecaBB/BDE were distinctly separated and successfully determined in the optimized condition. Furthermore, microwave system did an excellent job of consistently putting solid samples into solutions and had a moderate compatibility with spectrometric analyzer due to good recoveries. Though RSD of XRF screening was larger than 10%, it proved to be an easier, cheaper, faster technique. Because of the combination of multiple methodologies, the restricted substances can be determined with good precision and high reliability. It provides a prominent project for EE industries to comply with RoHS compliance.
为符合RoHS要求,建立了电感耦合等离子体发射光谱法(ICP-OES)、气相色谱-质谱法(GC-MS)和微波紫外可见分光光度法(uv -可见分光光度法)耦合测定电子电气产品(EEP)中痕量Cd、Hg、Pb、Cr6+、PBBs/PBDEs的方法。用能量色散x射线荧光光谱法(EDXRF)筛选元素。为了获得良好的性能,还采用了显色试验、元素间校正(IEC)和标准加法等方法。结果表明,ICP-OES法和Cr6+紫外可见分光光度法测定Hg、Cd、Pb的RSD <5%, GC-MS法测定PBBs/PBDEs的RSD <1%。紫外可见分光光度法可替代碱消解法测定Cr6+, K2HPO4缓冲液可消除Fe3+、Pb2+等的影响。在优化的条件下,从monoBB/BDE到DecaBB/BDE的分支明显分离并成功测定。此外,微波系统在稳定地将固体样品放入溶液中表现出色,并且由于回收率好,与光谱分析仪具有适度的兼容性。虽然XRF筛选的RSD大于10%,但它被证明是一种更简单、更便宜、更快速的技术。由于多种方法的结合,限制物质的测定精度好,可靠性高。为电子电气行业的RoHS合规提供了一个突出的项目。
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引用次数: 0
Properties and Reliability of Sn-Pb and Lead-free Mixed Soldering Sn-Pb和无铅混合焊接的性能和可靠性
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441544
Huang Wang, A. Hu, Lihong Wang, P. Zhu, Chengkang Chang, Ming Li
During the transition from Sn-Pb solder to lead-free solder, it is inevitable to encounter the reliability difficulties when lead-free and Sn-Pb materials were used within the same mounting process. To solve the problem in the mixed soldering, two methods were adopted that is improving the soldering temperature and electroplating Sn-Pb on the surface of the devices then soldering in a lower temperature. Mechanical strength of the solder joint, fracture morphology and the intermetallic compound (IMC) at the interface between solder and board materials were investigated. The experimental results showed the inclination of pores evolving when improving the solder temperature reduces the reliability. However, symmetrical solder joint with high reliability was obtained in the second method.
在锡铅焊料向无铅焊料过渡的过程中,不可避免地会遇到无铅材料和锡铅材料在同一安装工艺中同时使用的可靠性难题。为了解决混合焊接中的问题,采用了提高焊接温度和在器件表面电镀Sn-Pb然后在较低温度下焊接的两种方法。研究了焊点的机械强度、断口形貌和焊料与板材料界面处的金属间化合物(IMC)含量。实验结果表明,随着焊料温度的升高,气孔的倾斜度会降低焊接的可靠性。而第二种方法得到了对称的、高可靠性的焊点。
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引用次数: 2
Effect of Solder Volume on Shear Strength between Sn-3.0Ag-0.5Cu Solder and Cu Metallization 钎料体积对Sn-3.0Ag-0.5Cu钎料抗剪强度及Cu金属化的影响
Pub Date : 2007-08-01 DOI: 10.1109/ICEPT.2007.4441532
Yang Shihua, Lin Pengrong, Tian Yanhong, Wang Chunqing, Liang Le, W. Qian
Shear behavior of Sn-3.0Ag-0.5Cu solder joints on ball grid array substrates was investigated with different solder volumes and shear speeds to study the solder volume effect on shear properties. Both solder volume and shear speed were found to have strong effect on the shear strength. The shear force decreases obviously with the decrease of the solder volume due to the significant decrease of loaded area, while the shear strength has reverse trend. The shear strength increases sharply with the decrease of solder volume as a result of the discrepancy of interfacial reaction and microstructure. And the shear strength increases rapidly with the increase in shear speed due to the limited grain boundaries or interphase boundaries sliding and dislocation movement. After the shear test, fracture surfaces were investigated by canning electron microscopy equipped with energy dispersed x ray and it was found that the fracture mode of as-reflowed solder joints was primary ball cut within the bulk solder near the interface with a ductile rupture. The results suggest that even if the solder shear tests showed the same fracture mechanism, solder volume still has great effect on the shear properties at different shear speeds.
研究了不同钎料体积和剪切速度下Sn-3.0Ag-0.5Cu钎料在球栅阵列基板上的剪切行为,研究了钎料体积对剪切性能的影响。发现焊料体积和剪切速度对剪切强度有较大影响。剪切力随焊料体积的减小而明显减小,这是由于加载面积的显著减小,而剪切强度则有相反的趋势。由于界面反应和微观结构的差异,抗剪强度随着焊料体积的减小而急剧增加。随着剪切速度的增加,受晶界或相界滑移和位错运动的限制,剪切强度迅速增大。剪切试验结束后,利用能量分散x射线扫描电镜观察了焊点的断口形貌,发现回流状态下焊点的断裂模式为靠近界面的块状焊点内的一次球切,并发生延性断裂。结果表明,即使剪切试验显示相同的断裂机制,在不同剪切速度下,焊料体积对剪切性能仍有很大影响。
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引用次数: 5
期刊
2007 8th International Conference on Electronic Packaging Technology
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