首页 > 最新文献

2007 European Microwave Integrated Circuit Conference最新文献

英文 中文
Design of GaN-based balanced cascode cells for wide-band distributed power amplifier 宽带分布式功率放大器用氮化镓平衡级联电池的设计
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412671
A. Martin, T. Reveyrand, M. Campovecchio, R. Aubry, S. Piotrowicz, D. Floriot, R. Quéré
This paper reports on the design of a cascode GaN HEMT cell dedicated to 4-18 GHz flip-chip distributed power amplifier. The active device is a 8x50 mum AlGaN/GaN HEMT grown on SiC substrate. The GaN-based die which integrates the active cascode cell and its matching elements is flip-chipped via electrical bumps onto an AIN substrate. The matching elements of the balanced cascode cell are composed of series capacitances on the gate of both transistors with additional resistances to insure stability and bias path. The series capacitor on the gate of the 1st transistor is added for the distributed amplifier optimisation while the series capacitor on the gate of the 2 nd transistor is dedicated
本文报道了一种用于4- 18ghz倒装分布式功率放大器的级联GaN HEMT单元的设计。有源器件是生长在SiC衬底上的8x50 mum AlGaN/GaN HEMT。集成有源级联编码单元及其匹配元件的氮化镓基芯片通过电颠簸倒装到氮化镓基板上。平衡级联电池的匹配元件由两个晶体管栅极上的串联电容和附加电阻组成,以确保稳定性和偏置路径。第1晶体管栅极上的串联电容器被添加用于分布式放大器优化,而第2晶体管栅极上的串联电容器是专用的
{"title":"Design of GaN-based balanced cascode cells for wide-band distributed power amplifier","authors":"A. Martin, T. Reveyrand, M. Campovecchio, R. Aubry, S. Piotrowicz, D. Floriot, R. Quéré","doi":"10.1109/EMICC.2007.4412671","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412671","url":null,"abstract":"This paper reports on the design of a cascode GaN HEMT cell dedicated to 4-18 GHz flip-chip distributed power amplifier. The active device is a 8x50 mum AlGaN/GaN HEMT grown on SiC substrate. The GaN-based die which integrates the active cascode cell and its matching elements is flip-chipped via electrical bumps onto an AIN substrate. The matching elements of the balanced cascode cell are composed of series capacitances on the gate of both transistors with additional resistances to insure stability and bias path. The series capacitor on the gate of the 1st transistor is added for the distributed amplifier optimisation while the series capacitor on the gate of the 2 nd transistor is dedicated","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"59 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123395195","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
AlN/GaN MISFET for high frequency applications: Physical simulation and experimental evaluation 用于高频应用的AlN/GaN MISFET:物理模拟和实验评估
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412688
S. Seo, K. Ghose, D. Pavlidis, S. Schmidt
AIN/GaN metal insulator semiconductor field effect transistors (MISFETs) were designed, simulated and fabricated. DC and S-parameter measurements were also performed. Drift-diffusion simulations using DESSIS compared AIN/GaN MISFETs and A32Ga68N/GaN Heterostructure FETs (HFETs) with the same geometries. The simulation results show the advantages of AIN/GaN MISFETs in terms of higher saturation current, lower gate leakage and higher transconductance than AlGaN HFETs. First results from fabricated AIN/GaN devices with 1.1 mum gate length and 200 mum gate width showed a maximum drain current density of ~-470 mA/mm and a peak extrinsic transconductance of 80 mS/mm. S-parameter measurements showed that the current-gain cutoff frequency (fT) and maximum oscillation frequency (fmax) were 2.8 GHz and 10.3 GHz, respectively. To the authors knowledge this is the first report of a systematic study of AIN/GaN MISFETs addressing their physical modeling and experimental high-frequency characteristics.
对AIN/GaN金属绝缘体半导体场效应晶体管(misfet)进行了设计、仿真和制作。还进行了DC和s参数测量。使用DESSIS进行漂移扩散模拟,比较了具有相同几何形状的AIN/GaN misfet和A32Ga68N/GaN异质结构fet (hfet)。仿真结果表明,与AlGaN型hfet相比,AIN/GaN型misfet具有更高的饱和电流、更低的栅漏和更高的跨导性。首先,用1.1 μ m栅极长度和200 μ m栅极宽度制备的AIN/GaN器件的结果表明,最大漏极电流密度为~-470 mA/mm,峰值外部跨导为80 mS/mm。s参数测量结果表明,电流增益截止频率(fT)和最大振荡频率(fmax)分别为2.8 GHz和10.3 GHz。据作者所知,这是对AIN/GaN misfet进行物理建模和实验高频特性系统研究的第一份报告。
{"title":"AlN/GaN MISFET for high frequency applications: Physical simulation and experimental evaluation","authors":"S. Seo, K. Ghose, D. Pavlidis, S. Schmidt","doi":"10.1109/EMICC.2007.4412688","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412688","url":null,"abstract":"AIN/GaN metal insulator semiconductor field effect transistors (MISFETs) were designed, simulated and fabricated. DC and S-parameter measurements were also performed. Drift-diffusion simulations using DESSIS compared AIN/GaN MISFETs and A32Ga68N/GaN Heterostructure FETs (HFETs) with the same geometries. The simulation results show the advantages of AIN/GaN MISFETs in terms of higher saturation current, lower gate leakage and higher transconductance than AlGaN HFETs. First results from fabricated AIN/GaN devices with 1.1 mum gate length and 200 mum gate width showed a maximum drain current density of ~-470 mA/mm and a peak extrinsic transconductance of 80 mS/mm. S-parameter measurements showed that the current-gain cutoff frequency (fT) and maximum oscillation frequency (fmax) were 2.8 GHz and 10.3 GHz, respectively. To the authors knowledge this is the first report of a systematic study of AIN/GaN MISFETs addressing their physical modeling and experimental high-frequency characteristics.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"159 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122826094","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reduction of buffer leakage current in AlGaN/GaN high-electron-mobility-transistor structure on Si substrate by reducing the dislocation density in AlN buffer layer 通过降低AlN缓冲层中的位错密度来降低Si衬底上AlGaN/GaN高电子迁移率晶体管结构中的缓冲漏电流
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412655
Y. Oda, N. Watanabe, M. Hiroki, T. Yagi, T. Kobayashi
We investigated preferable way of decrease of vertical leakage current in GaN-based high-electron-mobility-transistor structure on Si(111) substrate. It is found that the leakage current is much improved as the dislocation density in thin A1N buffer layer decreases. It has been successfully obtained the leakage current less than 10-4 A/cm2 at 200 V although the total epitaxial layer thickness is about only 1 mum.
研究了在Si(111)衬底上氮化镓基高电子迁移率晶体管结构中降低垂直泄漏电流的最佳途径。结果表明,随着薄A1N缓冲层中位错密度的减小,漏电流大大提高。在200 V时,虽然外延层厚度只有1 μ m,但泄漏电流小于10-4 A/cm2。
{"title":"Reduction of buffer leakage current in AlGaN/GaN high-electron-mobility-transistor structure on Si substrate by reducing the dislocation density in AlN buffer layer","authors":"Y. Oda, N. Watanabe, M. Hiroki, T. Yagi, T. Kobayashi","doi":"10.1109/EMICC.2007.4412655","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412655","url":null,"abstract":"We investigated preferable way of decrease of vertical leakage current in GaN-based high-electron-mobility-transistor structure on Si(111) substrate. It is found that the leakage current is much improved as the dislocation density in thin A1N buffer layer decreases. It has been successfully obtained the leakage current less than 10-4 A/cm2 at 200 V although the total epitaxial layer thickness is about only 1 mum.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114439846","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A 20-GSamples/s Track-Hold Amplifier in InP DHBT technology 一种采用InP DHBT技术的20 gsamples /s跟踪保持放大器
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412632
Y. Bouvier, A. Konczykowska, A. Ouslimani, F. Jorge, M. Riet, J. Godin
A fully differential 20 Gsample/s Track and Hold Amplifier with 20 GHz large-input-signal bandwidth is designed and fabricated in 210 GHz-fT-InP-DHBT on a 1.6 x 1.4 mm2 chip. Spectral measurements in track mode give an SNR, a THD, and a SFDR respectively of 65 dB, -38 dB and -38 dB for input frequency up to 9 GHz and input voltage up to 0.5 Vpp. This THD is equivalent to 6 ENOB. Time domain measurements illustrate 20 GHz sampling with 2 and 5 GHz sinusoidal input signals.
在1.6 x 1.4 mm2芯片上,采用210 GHz- ft -inp - dhbt设计并制造了一款具有20 GHz大输入信号带宽的全差分20 g采样/s跟踪和保持放大器。在轨道模式下,当输入频率高达9 GHz,输入电压高达0.5 Vpp时,SNR、THD和SFDR分别为65 dB、-38 dB和-38 dB。这个THD相当于6个ENOB。时域测量说明20 GHz采样与2和5 GHz正弦输入信号。
{"title":"A 20-GSamples/s Track-Hold Amplifier in InP DHBT technology","authors":"Y. Bouvier, A. Konczykowska, A. Ouslimani, F. Jorge, M. Riet, J. Godin","doi":"10.1109/EMICC.2007.4412632","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412632","url":null,"abstract":"A fully differential 20 Gsample/s Track and Hold Amplifier with 20 GHz large-input-signal bandwidth is designed and fabricated in 210 GHz-fT-InP-DHBT on a 1.6 x 1.4 mm2 chip. Spectral measurements in track mode give an SNR, a THD, and a SFDR respectively of 65 dB, -38 dB and -38 dB for input frequency up to 9 GHz and input voltage up to 0.5 Vpp. This THD is equivalent to 6 ENOB. Time domain measurements illustrate 20 GHz sampling with 2 and 5 GHz sinusoidal input signals.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129138218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Large-signal analysis and AC modelling of sub micron resonant tunnelling diodes 亚微米谐振隧穿二极管的大信号分析与交流建模
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412685
A. Matiss, A. Poloczek, W. Brockerhoff, W. Prost, F. Tegude
A large signal measurement set up and analysis technique is developed to characterize and model the dynamic I/V characteristic of a two-terminal double-barrier quantum well structure, the resonant tunnelling diode (RTD). The devices investigated have been realized on InP-substrate using sub-micron process technology in order to minimize power dissipation for high-frequency applications. The process technology applied employs electron beam lithography for precise definition of critical structures and self aligned dry chemical mesa etching. The extraction of device parameters from measurements is presented together with a scaleable large-signal RTD model.
为了描述和模拟双端双势垒量子阱结构谐振隧穿二极管(RTD)的动态I/V特性,建立了一种大信号测量和分析技术。为了减少高频应用的功耗,所研究的器件已在inp衬底上使用亚微米工艺技术实现。所采用的工艺技术采用电子束光刻技术精确定义关键结构和自对准干化学台面蚀刻。从测量数据中提取器件参数,并提出了一个可扩展的大信号RTD模型。
{"title":"Large-signal analysis and AC modelling of sub micron resonant tunnelling diodes","authors":"A. Matiss, A. Poloczek, W. Brockerhoff, W. Prost, F. Tegude","doi":"10.1109/EMICC.2007.4412685","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412685","url":null,"abstract":"A large signal measurement set up and analysis technique is developed to characterize and model the dynamic I/V characteristic of a two-terminal double-barrier quantum well structure, the resonant tunnelling diode (RTD). The devices investigated have been realized on InP-substrate using sub-micron process technology in order to minimize power dissipation for high-frequency applications. The process technology applied employs electron beam lithography for precise definition of critical structures and self aligned dry chemical mesa etching. The extraction of device parameters from measurements is presented together with a scaleable large-signal RTD model.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121695257","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
High quality factor micromachined toroid and solenoid inductors 高品质因数微机械环形和电磁电感器
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412721
I. Zine-El-Abidine, M. Okoniewski
High quality toroid and solenoid inductors, exhibiting quality factors as high as 87 at 14.5 GHz and 35 at 6.4 GHz are presented in this paper. The inductors are fabricated using only two plating steps which reduces the complexity of the fabrication. The process lowers the number of ohmic contacts between the electroplated layers improving the performance of the device. The fabrication process is low-temperature and fully compatible with CMOS technology which makes it suitable for post-IC processing.
本文介绍了高质量的环形和螺线管电感,在14.5 GHz和6.4 GHz时的质量因数分别高达87和35。电感器仅使用两个电镀步骤制造,从而降低了制造的复杂性。该工艺降低了电镀层之间的欧姆接触数,提高了器件的性能。该制造工艺温度低,且完全兼容CMOS技术,适合集成电路后加工。
{"title":"High quality factor micromachined toroid and solenoid inductors","authors":"I. Zine-El-Abidine, M. Okoniewski","doi":"10.1109/EMICC.2007.4412721","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412721","url":null,"abstract":"High quality toroid and solenoid inductors, exhibiting quality factors as high as 87 at 14.5 GHz and 35 at 6.4 GHz are presented in this paper. The inductors are fabricated using only two plating steps which reduces the complexity of the fabrication. The process lowers the number of ohmic contacts between the electroplated layers improving the performance of the device. The fabrication process is low-temperature and fully compatible with CMOS technology which makes it suitable for post-IC processing.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115876194","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
A reconfigurable SiGe HBT for wideband step envelope tracking power amplifiers 用于宽带阶跃包络跟踪功率放大器的可重构SiGe HBT
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412667
A. Cidronali, I. Magrini, R. Fagotti, F. Alimenti, D. Kother, G. Manes
This paper discusses and experimentally demonstrates the use of a reconfigurable class-AB power amplifier in a wideband step envelope tracking architecture. The experimental results are related to a SiGe HBT power device prototype in which we integrated the dynamic biasing switching capability. This paper proves that, in the case of 802.11g signals, the prototype allows for an average efficiency of 16.5%, which represents an increase of 10% if compared with traditional class-AB RFPA. The step envelope tracking architecture and its digital predistortion algorithm are discussed and analyzed by system level simulations, which demonstrate the capability of the SiGe prototype to provide 19 dBm output total power with EVM=3.4%.
本文讨论并实验证明了可重构ab类功率放大器在宽带阶跃包络跟踪体系中的应用。实验结果与SiGe HBT功率器件原型有关,其中我们集成了动态偏置开关能力。本文证明,在802.11g信号的情况下,原型允许平均效率为16.5%,与传统的ab类RFPA相比,提高了10%。通过系统级仿真,对阶进包络跟踪架构及其数字预失真算法进行了讨论和分析,验证了SiGe样机在EVM=3.4%的情况下能够提供19 dBm的输出总功率。
{"title":"A reconfigurable SiGe HBT for wideband step envelope tracking power amplifiers","authors":"A. Cidronali, I. Magrini, R. Fagotti, F. Alimenti, D. Kother, G. Manes","doi":"10.1109/EMICC.2007.4412667","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412667","url":null,"abstract":"This paper discusses and experimentally demonstrates the use of a reconfigurable class-AB power amplifier in a wideband step envelope tracking architecture. The experimental results are related to a SiGe HBT power device prototype in which we integrated the dynamic biasing switching capability. This paper proves that, in the case of 802.11g signals, the prototype allows for an average efficiency of 16.5%, which represents an increase of 10% if compared with traditional class-AB RFPA. The step envelope tracking architecture and its digital predistortion algorithm are discussed and analyzed by system level simulations, which demonstrate the capability of the SiGe prototype to provide 19 dBm output total power with EVM=3.4%.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130221353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Optimising AIGaN/GaN HFET designs for high efficiency 优化AIGaN/GaN HFET设计,提高效率
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412674
C. Roff, A. Sheikh, J. Benedikt, P. Tasker, K. Hilton, J. O. Maclean, D. Hayes, M. Uren, T. Martin
This paper uses measured waveforms to demonstrate how to optimise GaN HFET PA designs in order to achieve high power and high efficiency. Efficiency values of 80% were achieved at a power density of 3 Wmm-4. The design procedure shows how waveform engineering, i.e. a combination of RF current and voltage waveform measurements, bias control and active harmonic load-pull, allow maximum performance to be achieved. The significant role of the device output capacitance in GaN designs that utilise large voltage swings is also explained, and a simple method for limiting the effect of Cds 5 is presented.
本文使用测量波形来演示如何优化GaN HFET PA设计,以实现高功率和高效率。在功率密度为3 Wmm-4时,效率值达到80%。设计程序显示了波形工程,即射频电流和电压波形测量,偏置控制和有源谐波负载-拉力的组合,如何实现最大性能。还解释了器件输出电容在利用大电压波动的GaN设计中的重要作用,并提出了一种限制cd5影响的简单方法。
{"title":"Optimising AIGaN/GaN HFET designs for high efficiency","authors":"C. Roff, A. Sheikh, J. Benedikt, P. Tasker, K. Hilton, J. O. Maclean, D. Hayes, M. Uren, T. Martin","doi":"10.1109/EMICC.2007.4412674","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412674","url":null,"abstract":"This paper uses measured waveforms to demonstrate how to optimise GaN HFET PA designs in order to achieve high power and high efficiency. Efficiency values of 80% were achieved at a power density of 3 Wmm-4. The design procedure shows how waveform engineering, i.e. a combination of RF current and voltage waveform measurements, bias control and active harmonic load-pull, allow maximum performance to be achieved. The significant role of the device output capacitance in GaN designs that utilise large voltage swings is also explained, and a simple method for limiting the effect of Cds 5 is presented.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132811087","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Design method for low-power, low phase noise voltage-controlled oscillators 低功率、低相位噪声压控振荡器的设计方法
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412683
M. Jankovic, A. Brannon, J. Breitbarth, Z. Popovic
This paper presents a design method for voltage controlled oscillators (VCOs) with simultaneous small size, low phase noise, DC power consumption and thermal drift. We show design steps to give good prediction of VCO phase noise and power consumption behavior: (1) measured resonator frequency-dependent parameters; (2) transistor additive phase noise/ noise figure characterization; (3) accurate tuning element model; and (4) bias-dependent model in case of an active load. As an illustration, the design of a 3.4-GHz bipolar transistor VCO with varactor tuning is presented Oscillator measurements demonstrate low phase noise (-40dBc@ 100Hz and better than -lOOdBcfflOkHz) with power consumption on the order of a few milliwatts with a circuit footprint smaller than 0.6cm2. The temperature stability is found to be better than +/-10ppm/degC from -40degC to +30degC. The oscillators are implemented using low-cost off-the-shelf surface-mountable components, including a micro-coaxial resonator. The VCO directly modulates the current of a laser diode and demonstrates a short-term stability 2-10/radictau Bias of clock. when locked to a miniature Rubidium atomic clock.
本文提出了一种同时具有小尺寸、低相位噪声、直流功耗和热漂移的压控振荡器(vco)的设计方法。我们展示了能够很好地预测压控振荡器相位噪声和功耗行为的设计步骤:(1)测量谐振器频率相关参数;(2)晶体管加性相位噪声/噪声系数表征;(3)精确调谐元件模型;(4)主动负荷情况下的偏差依赖模型。振荡器测量结果表明,该振荡器具有低相位噪声(-40dBc@ 100Hz,优于-lOOdBcfflOkHz),功耗仅为几毫瓦,电路占地面积小于0.6cm2。在-40℃至+30℃范围内,温度稳定性优于+/-10ppm/℃。该振荡器采用低成本的现成表面安装组件实现,包括微型同轴谐振器。该压控振荡器可直接调制激光二极管的电流,并具有2-10/根偏压的短期稳定性。当被锁在一个微型铷原子钟上时
{"title":"Design method for low-power, low phase noise voltage-controlled oscillators","authors":"M. Jankovic, A. Brannon, J. Breitbarth, Z. Popovic","doi":"10.1109/EMICC.2007.4412683","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412683","url":null,"abstract":"This paper presents a design method for voltage controlled oscillators (VCOs) with simultaneous small size, low phase noise, DC power consumption and thermal drift. We show design steps to give good prediction of VCO phase noise and power consumption behavior: (1) measured resonator frequency-dependent parameters; (2) transistor additive phase noise/ noise figure characterization; (3) accurate tuning element model; and (4) bias-dependent model in case of an active load. As an illustration, the design of a 3.4-GHz bipolar transistor VCO with varactor tuning is presented Oscillator measurements demonstrate low phase noise (-40dBc@ 100Hz and better than -lOOdBcfflOkHz) with power consumption on the order of a few milliwatts with a circuit footprint smaller than 0.6cm2. The temperature stability is found to be better than +/-10ppm/degC from -40degC to +30degC. The oscillators are implemented using low-cost off-the-shelf surface-mountable components, including a micro-coaxial resonator. The VCO directly modulates the current of a laser diode and demonstrates a short-term stability 2-10/radictau Bias of clock. when locked to a miniature Rubidium atomic clock.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116971145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Design of vertical transition for 40GHz transceiver module using LTCC technology 采用LTCC技术的40GHz收发模块垂直过渡设计
Pub Date : 2007-12-26 DOI: 10.1109/EMICC.2007.4412773
W. Byun, Bong-Su Kim, Kwang-Seon Kim, K. Eun, Myung‐Sun Song, R. Kulke, O. Kersten, G. Mollenbeck, M. Rittweger
In this paper, we present design, implementation and measurement of 3D mm-wave LTCC (low temperature co-fired ceramic) module with vertical transition through FR-4 PCB substrate. A new structure in order to transfer mm-wave signal from transceiver module through an opening in FR-4 PCB substrate to antenna with standard WR-22 waveguide port is proposed. The module features front-end, receiver and transmitter. The opening in FR-4 PCB substrate is of rectangular type, which has the same dimensions as a WR-22 waveguide. The edge of the opening is conductively plated with copper from top side to the bottom to reduce transmission losses. The implemented module is compact in size (32 x 28 x 3.3 mm ). Experimental results show a 1dB compression output power of 15 dBm and noise figure of 9.72 dB at 40.5~41.5 GHz.
在本文中,我们介绍了3D毫米波LTCC(低温共烧陶瓷)模块的设计、实现和测量,该模块具有垂直跃迁通过FR-4 PCB基板。提出了一种将毫米波信号从收发模块通过FR-4 PCB基板上的开口传输到具有标准WR-22波导端口的天线的新结构。该模块包括前端、接收机和发射机。FR-4 PCB基板中的开口为矩形型,其尺寸与WR-22波导相同。开口边缘由上至下导电镀铜,以减少传输损耗。实现的模块尺寸紧凑(32 x 28 x 3.3 mm)。实验结果表明,在40.5~41.5 GHz频段,1dB压缩输出功率为15 dBm,噪声系数为9.72 dB。
{"title":"Design of vertical transition for 40GHz transceiver module using LTCC technology","authors":"W. Byun, Bong-Su Kim, Kwang-Seon Kim, K. Eun, Myung‐Sun Song, R. Kulke, O. Kersten, G. Mollenbeck, M. Rittweger","doi":"10.1109/EMICC.2007.4412773","DOIUrl":"https://doi.org/10.1109/EMICC.2007.4412773","url":null,"abstract":"In this paper, we present design, implementation and measurement of 3D mm-wave LTCC (low temperature co-fired ceramic) module with vertical transition through FR-4 PCB substrate. A new structure in order to transfer mm-wave signal from transceiver module through an opening in FR-4 PCB substrate to antenna with standard WR-22 waveguide port is proposed. The module features front-end, receiver and transmitter. The opening in FR-4 PCB substrate is of rectangular type, which has the same dimensions as a WR-22 waveguide. The edge of the opening is conductively plated with copper from top side to the bottom to reduce transmission losses. The implemented module is compact in size (32 x 28 x 3.3 mm ). Experimental results show a 1dB compression output power of 15 dBm and noise figure of 9.72 dB at 40.5~41.5 GHz.","PeriodicalId":436391,"journal":{"name":"2007 European Microwave Integrated Circuit Conference","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2007-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132431611","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
期刊
2007 European Microwave Integrated Circuit Conference
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1