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MEFET-Based CAM/TCAM for Memory-Augmented Neural Networks 基于 MEFET 的内存增强型神经网络 CAM/TCAM
IF 2 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2024-06-06 DOI: 10.1109/JXCDC.2024.3410681
Sai Sanjeet;Jonathan Bird;Bibhu Datta Sahoo
Memory-augmented neural networks (MANNs) require large external memories to enable long-term memory storage and retrieval. Content-addressable memory (CAM) is a type of memory used for high-speed searching applications and is well-suited for MANNs. Recent advances in exploratory nonvolatile devices have spurred the development of nonvolatile CAMs. However, these devices suffer from poor ON-OFF ratio, large write voltages, and long write times. This work proposes a nonvolatile ternary CAM (TCAM) using magnetoelectric field effect transistors (MEFETs). The energy and delay of various operations are simulated using the ASAP 7-nm predictive technology for the transistors and a Verilog-A model of the MEFET. The proposed structure achieves orders of magnitude improvement in search energy and $gt 45times $ improvement in search energy-delay product compared with prior works. The write energy and delay are also improved by $8times $ and $12times $ , respectively, compared with CAMs designed with other nonvolatile devices. A variability analysis is performed to study the effect of process variations on the CAM. The proposed CAM is then used to build a one-shot learning MANN and is benchmarked with the Modified National Institute of Standards and Technology (MNIST), extended MNIST (EMNIST), and labeled faces in the wild (LFW) datasets with binary embeddings, giving >99% accuracy on MNIST, a top-3 accuracy of 97.11% on the EMNIST dataset, and >97% accuracy on the LFW dataset, with embedding sizes of 16, 64, and 512, respectively. The proposed CAM is shown to be fast, energy-efficient, and scalable, making it suitable for MANNs.
记忆增强型神经网络(MANN)需要大型外部存储器来实现长期记忆存储和检索。内容可寻址存储器(CAM)是一种用于高速搜索应用的存储器,非常适合 MANN。最近在探索非易失性器件方面取得的进展推动了非易失性 CAM 的发展。然而,这些器件存在导通-关断比差、写入电压大和写入时间长等问题。本研究提出了一种使用磁电场效应晶体管(MEFET)的非易失三元 CAM(TCAM)。使用 ASAP 7 纳米晶体管预测技术和 MEFET 的 Verilog-A 模型模拟了各种操作的能量和延迟。与之前的研究相比,所提出的结构在搜索能量方面实现了数量级的改进,在搜索能量-延迟乘积方面实现了 45 倍的改进。与使用其他非易失性器件设计的 CAM 相比,写入能量和延迟也分别提高了 8 和 12 倍。为了研究工艺变化对 CAM 的影响,我们进行了变异性分析。提议的 CAM 随后被用于构建单次学习的 MANN,并使用二进制嵌入对修改后的美国国家标准与技术研究院 (MNIST)、扩展 MNIST (EMNIST) 和野外标记人脸 (LFW) 数据集进行了基准测试,结果表明,在嵌入大小分别为 16、64 和 512 的情况下,MNIST 的准确率大于 99%,EMNIST 数据集的前三名准确率为 97.11%,LFW 数据集的准确率大于 97%。研究表明,所提出的 CAM 速度快、能效高、可扩展,因此适用于城域网。
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引用次数: 0
Energy-Accuracy Trade-Offs for Resistive In-Memory Computing Architectures 电阻式内存计算架构的能耗与精度权衡
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2024-03-25 DOI: 10.1109/JXCDC.2024.3381888
Saion K. Roy;Naresh R. Shanbhag
Resistive in-memory computing (IMC) architectures currently lag behind SRAM IMCs and digital accelerators in both energy efficiency and compute density due to their low compute accuracy. This article proposes the use of signal-to-noise-plus-distortion ratio (SNDR) to quantify the compute accuracy of IMCs and identify the device, circuit, and architectural parameters that affect it. We further analyze the fundamental limits on the SNDR of magnetoresistive random access memory (MRAM-), resistive random access memory (ReRAM-), and ferroelectric field effect transistor (FeFET)-based IMCs employing parameter variation and noise models that were validated against measured results from a recent MRAM-based IMC prototype in a 22 nm process. At high-output signal magnitude, we can find that the maximum achievable SNDR is limited by the pre-analog-to-digital-converter (ADC) array nonidealities, such as the conductance variations (CVs), parasitic resistances, and current mirror mismatch (MM), whereas the ADC thermal (AT) noise limits the SNDR at small signal magnitudes. Furthermore, for large dot-product (DP) dimensions ( $N > 50$ ), the maximum achievable SNDR is highest for FeFET, followed by ReRAM and then MRAM. Finally, the increase in conductance contrast ( ${g_ {text {ON}} }/ {g_ {text {OFF}} }$ ) enhances the maximum achievable SNDR only until it reaches a value of approximately 12. ReRAMs and FeFETs demonstrate high energy efficiencies while achieving high SNDR, as their low conductance values lead to lower currents and lower noise due to wire parasitics. In all cases, across all three device types, DP dimension, ADC precision, and conductance contrast, the maximum achievable SNDR is found to be in the range of 18–22 dB, barely meeting the minimum needed for achieving an inference accuracy close to an equivalent fixed-point digital architecture. Finally, we demonstrate a network-level accuracy of 84.5% when mapping an ResNet-20 (CIFAR-10) by ReRAM-based architecture at a SNDR of 22 dB, in which MRAM- and FeFET-based architectures cannot realize. This result clearly implies the need for other approaches, e.g., algorithmic- and learning-based methods, to improve the inference accuracy of resistive IMC architectures.
电阻式内存计算(IMC)架构由于计算精度低,目前在能效和计算密度方面都落后于 SRAM IMC 和数字加速器。本文提出使用信号噪声加失真比 (SNDR) 来量化 IMC 的计算精度,并确定影响精度的器件、电路和架构参数。我们进一步分析了磁阻式随机存取存储器 (MRAM-)、电阻式随机存取存储器 (ReRAM-) 和基于铁电场效应晶体管 (FeFET) 的 IMC 的 SNDR 基本限制,并采用了参数变化和噪声模型,这些模型与最近在 22 纳米工艺中基于 MRAM 的 IMC 原型的测量结果进行了验证。我们发现,在高输出信号幅度下,可实现的最大 SNDR 受限于前模数转换器 (ADC) 阵列的非理想性,如电导变化 (CV)、寄生电阻和电流镜失配 (MM),而 ADC 热噪声 (AT) 则限制了小信号幅度下的 SNDR。此外,对于大点积(DP)尺寸($N > 50$),FeFET 可实现的最大 SNDR 最高,其次是 ReRAM,再次是 MRAM。最后,电导对比度(${g_ {text {ON}} }/ {g_ {text {OFF}} }$)的增加只会提高最大可实现 SNDR,直到达到约 12 的值。ReRAM 和 FeFET 在实现高 SNDR 的同时,还具有较高的能效,因为它们的低电导值导致了较低的电流和由导线寄生导致的较低噪声。在所有情况下,在所有三种器件类型、DP 尺寸、ADC 精度和电导对比中,我们发现可实现的最大 SNDR 在 18-22 dB 之间,勉强达到实现接近等效定点数字架构推理精度所需的最低值。最后,我们展示了基于 ReRAM 的架构在 SNDR 为 22 dB 时映射 ResNet-20 (CIFAR-10) 所达到的 84.5% 的网络级精度,而基于 MRAM 和 FeFET 的架构无法实现这一精度。这一结果清楚地表明,需要采用其他方法(如基于算法和学习的方法)来提高电阻式 IMC 架构的推理精度。
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引用次数: 0
Impact of Technology Scaling and Back-End-of-the-Line Technology Solutions on Magnetic Random-Access Memories 技术扩展和后端技术解决方案对磁随机存取存储器的影响
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2024-01-23 DOI: 10.1109/JXCDC.2024.3357625
Piyush Kumar;Da Eun Shim;Siri Narla;Azad Naeemi
While magnetic random-access memories (MRAMs) are promising because of their nonvolatility, relatively fast speeds, and high endurance, there are major challenges in adopting them for the advanced technology nodes. One of the major challenges in scaling MRAM devices is caused by the ever-increasing resistances of interconnects. In this article, we first study the impact of shrunk interconnect dimensions on MRAM performance at various technology nodes. Then, we investigate the impact of various potential back-end-of-the-line (BEOL) technology solutions at the 7 nm node. Based on interconnect resistance values from technology computer-aided design (TCAD) simulations and MRAM device characteristics from experimentally validated/calibrated physical models, we quantify the potential array-level performance of MRAM using SPICE simulations. We project that some potential BEOL technology solutions can reduce the write energy by up to 34.6% with spin–orbit torque (SOT) MRAM and 29.0% with spin-transfer torque (STT) MRAM. We also observe up to 21.4% reduction in the read energy of the SOT-MRAM arrays.
虽然磁性随机存取存储器(MRAM)因其非挥发性、相对较快的速度和较高的耐用性而前景广阔,但在先进技术节点上采用它们却面临着重大挑战。扩展 MRAM 器件的主要挑战之一是互连电阻的不断增加。在本文中,我们首先研究了在不同技术节点上缩小互连尺寸对 MRAM 性能的影响。然后,我们研究了 7 纳米节点上各种潜在的后端 (BEOL) 技术解决方案的影响。根据技术计算机辅助设计 (TCAD) 仿真得出的互连电阻值和实验验证/校准物理模型得出的 MRAM 器件特性,我们利用 SPICE 仿真量化了 MRAM 的潜在阵列级性能。我们预测,一些潜在的 BEOL 技术解决方案可以将自旋轨道力矩 (SOT) MRAM 的写入能量最多降低 34.6%,将自旋转移力矩 (STT) MRAM 的写入能量最多降低 29.0%。我们还发现,SOT-MRAM 阵列的读取能量最多可降低 21.4%。
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引用次数: 0
Source Design of Vertical III–V Nanowire Tunnel Field-Effect Transistors 垂直 III-V 纳米线隧道场效应晶体管的源设计
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2024-01-19 DOI: 10.1109/JXCDC.2024.3355949
Gautham Rangasamy;Zhongyunshen Zhu;Lars-Erik Wernersson
We systematically fabricate devices and analyze data for vertical InAs/(In)GaAsSb nanowire tunnel field-effect transistors (TFETs), to study the influence of source dopant position and level on their device performance. The results show that delaying the introduction of dopants further in the GaAsSb source segments improved the transistor metrics (subthreshold swing (SS) and the on-current performance), due to the formation of a nid-InAsSb segment. The devices display a minimum SS of 26 mV/dec and on-current of $10.2 ~mu text{A}/mu text{m}$ at $V_{text {DS}}$ of 300 mV. The performance of devices were improved further by optimizing the doping levels which led to record subthermal current of $1.2 ~mu text{A}/mu text{m}$ and transconductance of $205 ~mu text{S}/mu text{m}$ at $V_{text {DS}}$ of 500 mV.
我们系统地制造了垂直 InAs/(In)GaAsSb 纳米线隧道场效应晶体管 (TFET) 器件并分析了相关数据,以研究源掺杂剂位置和水平对其器件性能的影响。结果表明,由于形成了 nid-InAsSb 段,在 GaAsSb 源段中进一步延迟引入掺杂剂可改善晶体管的指标(亚阈值摆幅(SS)和导通电流性能)。在 300 mV 的 $V_{text {DS}}$条件下,器件的最小 SS 值为 26 mV/dec,导通电流为 10.2 ~mu text{A}/mu text{m}$。通过优化掺杂水平,器件的性能得到了进一步提高,在 500 mV 时,器件的过热电流达到了创纪录的 1.2 ~mu text{A}/mutext{m}$,电导率达到了 205 ~mu text{S}/mu text{m}$。
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引用次数: 0
IEEE Journal on Exploratory Solid-State Computational Devices and Circuits—Volume 9, No. 2 电气和电子工程师学会探索性固态计算器件和电路期刊》第 9 卷第 2 期
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2023-12-01 DOI: 10.1109/JXCDC.2023.3349088
Azad Naeemi
Welcome to the seventh volume, second semiannual issue of IEEE Journal on Exploratory Solid-State Computational Devices and Circuits (JXCDC), a multidisciplinary, open-access IEEE journal that is focused on publishing seminal research in the exploration of energy-efficient computing based on physics and materials to enable new devices, circuits, and architecture that will be of great interest to integrated circuit researchers and those working in the IT industry. The articles in the journal are selectively chosen to provide insight into the architectural, circuit, and device implications of emerging quantum nanoelectronic and nanomagnetic device technologies. The discovery of new materials, devices, and circuits for energy-efficient computational circuits will be needed to enable Moore’s law to continue for computing beyond the end of the roadmap for CMOS technologies, with significant improvement in energy efficiency and cost per function.
欢迎阅读《IEEE 固态计算器件与电路探索期刊》(JXCDC)第七卷,这是第二期半月刊,该期刊是一份多学科、开放获取的 IEEE 期刊,主要刊登基于物理和材料探索高能效计算的开创性研究,以实现集成电路研究人员和 IT 行业从业人员非常感兴趣的新器件、电路和架构。期刊中的文章都是经过精挑细选的,旨在让读者深入了解新兴量子纳米电子和纳米磁性器件技术对架构、电路和设备的影响。要使摩尔定律在 CMOS 技术路线图结束后继续适用于计算领域,并显著提高能效和单位功能成本,就需要发现用于高能效计算电路的新材料、器件和电路。
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引用次数: 0
IEEE Journal on Exploratory Solid-State Computational Devices and Circuits publication information 电气和电子工程师学会固态计算器件和电路探索期刊》出版信息
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2023-12-01 DOI: 10.1109/JXCDC.2023.3333712
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引用次数: 0
Special Topic on Physics-Based Modeling and Simulation of Materials, Devices, and Circuits of Beyond-CMOS Logic and Memory Technologies for Energy-Efficient Computing 面向高能效计算的 Beyond-CMOS 逻辑和存储器技术的材料、器件和电路的物理建模与仿真专题
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2023-12-01 DOI: 10.1109/JXCDC.2023.3340557
Sumeet Kumar Gupta
Standard complementary metal–oxide–semiconductor (CMOS) technology and its advanced flavors in the form of FinFETs have propelled the electronic industry to its extraordinary success. While the CMOS technology may continue to deliver its remarkably powerful performance to next-generation computing platforms, it is quite clear that in the longer term, it has major challenges in scaling, suffers from power consumption and power density limitations, and may not be amenable to the new demands of the emerging applications. This will require beyond-CMOS technologies to step in and augment CMOS. Whether it is the design of energy-efficient scalable switches for logic design, or nonvolatile memory, or the integration of memory and logic functionalities for general-purpose computers and application-specific accelerators, the need for the application of quantum materials to realize these new microelectronic devices has surged.
标准互补金属氧化物半导体(CMOS)技术及其以 FinFET 为代表的先进技术推动电子行业取得了非凡的成就。虽然 CMOS 技术可能会继续为下一代计算平台提供强大的性能,但很明显,从长远来看,它在扩展方面面临重大挑战,受到功耗和功率密度的限制,可能无法满足新兴应用的新要求。这就需要超越 CMOS 的技术介入并增强 CMOS。无论是设计用于逻辑设计的高能效可扩展开关,还是非易失性存储器,抑或是为通用计算机和特定应用加速器集成存储器和逻辑功能,都急需应用量子材料来实现这些新型微电子器件。
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引用次数: 0
2023 Index IEEE Journal on Exploratory Solid-State Computational Devices and Circuits Vol. 9 2023 索引 《IEEE 固态计算器件与电路探索期刊》第 9 卷
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2023-12-01 DOI: 10.1109/JXCDC.2024.3361278
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引用次数: 0
INFORMATION FOR AUTHORS 作者须知
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2023-12-01 DOI: 10.1109/JXCDC.2023.3340380
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引用次数: 0
INFORMATION FOR AUTHORS 作者须知
IF 2.4 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2023-12-01 DOI: 10.1109/JXCDC.2023.3333716
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引用次数: 0
期刊
IEEE Journal on Exploratory Solid-State Computational Devices and Circuits
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