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Elastic, Electronic, Optical, and Thermodynamic Properties of the Half-Heusler LiScSi1−xCx Alloy in α-Phase: A DFT Simulation Study 半休斯勒 LiScSi1-xCx 合金在 α 相中的弹性、电子、光学和热力学性质:DFT 模拟研究
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1007/s11664-024-11330-3
S. Benyettou, S. Ferahtia, S. Saib, N. Bouarissa

The structural, elastic, electronic, and thermodynamic properties of a LiScSi1−xCx alloy in the α-phase were investigated using density functional theory with the plane-wave pseudopotential method and the alchemical mixing approximation in ABINIT code. We computed ground-state properties including lattice constants, bulk modulus, energy gap, refractive index, and optical dielectric constant for the LiScSi1−xCx compounds. Our results align well with existing theoretical data for the parent compounds LiScSi and LiScC. We found that the fundamental bandgap for the α-LiScSi1−xCx alloy varied from 0.865 eV to 1.143 eV using the B3LYP approach, indicating potential applications in optoelectronic devices such as photodetectors and light-emitting diodes (LEDs), where precise control over electronic and optical properties is crucial. Additionally, we calculated the electron and hole effective masses, which showed a decrease with increasing carbon concentration; the electron effective mass ranged from 0.042m* for LiScSi to 0.035m* for LiSiC. The LiScSi1−xCx alloy in the α-phase consistently exhibited direct semiconductor behavior (X → X) across all concentrations. We also predicted the variation in thermodynamic properties, including unit cell volume, bulk modulus, heat capacity, and thermal expansion coefficient, with temperature for various carbon concentrations. These findings contribute to a deeper understanding of the material’s potential applications in electronic and thermoelectric devices.

我们在 ABINIT 代码中采用平面波伪势方法和炼金混合近似的密度泛函理论,研究了α相锂碳硅(LiScSi1-xCx)合金的结构、弹性、电子和热力学性质。我们计算了 LiScSi1-xCx 复合物的基态性质,包括晶格常数、体积模量、能隙、折射率和光介电常数。我们的研究结果与母体化合物 LiScSi 和 LiScC 的现有理论数据非常吻合。利用 B3LYP 方法,我们发现 α-LiScSi1-xCx 合金的基本带隙从 0.865 eV 到 1.143 eV 不等,这表明它在光电设备(如光电探测器和发光二极管 (LED))中具有潜在的应用前景,因为在这些设备中,对电子和光学特性的精确控制至关重要。此外,我们还计算了电子和空穴的有效质量,结果表明电子和空穴的有效质量随着碳浓度的增加而降低;电子有效质量从 LiScSi 的 0.042m* 到 LiSiC 的 0.035m*。在所有浓度下,处于 α 相的 LiScSi1-xCx 合金始终表现出直接半导体行为(X → X)。我们还预测了不同碳浓度下单位晶胞体积、体积模量、热容量和热膨胀系数等热力学性质随温度的变化。这些发现有助于深入了解该材料在电子和热电设备中的潜在应用。
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引用次数: 0
Review of Chalcogenide-Based Materials for Low-, Mid-, and High-Temperature Thermoelectric Applications 用于低、中、高温热电应用的卤化镓基材料综述
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-27 DOI: 10.1007/s11664-024-11310-7
Suchitra Puthran, Ganesh Shridhar Hegde, Ashwatha Narayana Prabhu

Thermoelectric materials possess the capability to convert electricity into heat and vice versa. The utilization of chlorofluorocarbons and hydrochlorofluorocarbons as thermal carrier agents in traditional cooling and air conditioning systems has sparked a surge in exploration toward pioneering refrigeration and spatial conditioning technologies. Chalcogenides, known for their capacity to amplify the thermoelectric efficiency of materials and their adaptability across a broad spectrum of temperatures, stand out as pivotal components in thermoelectric materials. Despite their existing suboptimal performance, these materials hold substantial promise as power generators and as solid-state Peltier coolers, attracting significant attention and positioning them as subjects ripe for further investigation. Categorized into alkali or alkaline earth, transition metal, and main-group chalcogenides, these materials and their respective subclasses are meticulously scrutinized to pinpoint the most suitable thermoelectric materials for specific applications with an optimal operational temperature span. In the quest for energy-efficient technologies characterized by simple designs, absence of moving components, and superior stability, thermoelectric materials play a crucial role. This review highlights the advancements in theoretical parameters as well as the figure of merit (ZT) of chalcogenide materials, emphasizing their device applications. These insights are intended to provide viable future approaches to mainstream thermoelectric materials. This review reveals that Cu2Se achieves a maximum ZT value of 2.66 at 1039 K, marking it as the top performer among transition metal chalcogenides. Conversely, SnSe, a main-group metal monochalcogenide, exhibits a ZT value of 2.8 at 773 K, whereas nanowires of the main group of bismuth chalcogenides exhibit a ZT value of 2.5 at 350 K.

热电材料具有将电能转化为热能的能力,反之亦然。在传统的制冷和空调系统中,氯氟化碳和氢氯氟化碳被用作热载体,这引发了人们对制冷和空间调节技术的探索热潮。卤化物因其能够提高材料的热电效率以及在广泛温度范围内的适应性而闻名,是热电材料中的关键成分。尽管这些材料目前的性能并不理想,但作为发电装置和固态珀尔帖冷却器,它们仍具有广阔的发展前景,因此备受关注,并成为有待进一步研究的课题。这些材料分为碱金属或碱土金属、过渡金属和主族瑀,我们对这些材料及其各自的子类进行了细致的研究,以确定最适合特定应用的热电材料,并实现最佳的工作温度跨度。热电材料具有设计简单、无活动部件、稳定性高的特点,在追求高能效技术的过程中发挥着至关重要的作用。本综述重点介绍了卤化铝材料在理论参数和优点系数(ZT)方面的进展,并强调了其设备应用。这些见解旨在为主流热电材料提供可行的未来方法。这篇综述揭示了 Cu2Se 在 1039 K 时的最大 ZT 值为 2.66,使其成为过渡金属掺杂物中性能最佳的材料。相反,主族金属单质镓硒在 773 K 时的 ZT 值为 2.8,而主族铋镓硒的纳米线在 350 K 时的 ZT 值为 2.5。
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引用次数: 0
X-Ray Computed Tomography (CT) Technology for Detecting Battery Defects and Revealing Failure Mechanisms 用于检测电池缺陷和揭示失效机理的 X 射线计算机断层扫描 (CT) 技术
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-27 DOI: 10.1007/s11664-024-11300-9
Yingjie Jiang, Anqi Tian, Li Yan, Xueqi Du, Lanmei Yang, Li Li, Jie Zhou, Qi Wang, Shuai Ruan, Xinping He, Yongqi Zhang, Xiaoping Yu, Yuanyuan Jiang, Fangfang Tu, Jiayuan Xiang, Wangjun Wan, Chen Wang, Yang Xia, Xinhui Xia, Wenkui Zhang

As the global lithium-ion batteries (LIBs) market continues to expand, the necessity for dependable and secure LIBs has reached an all-time high. However, the use of batteries is associated with a number of significant risks, including the potential for thermal runaway and explosions. The meticulous inspection of LIBs is not only essential for guaranteeing their quality and functionality, but also for ensuring their safety. This underscores the criticality of advanced inspection technologies. In contrast to traditional inspection technologies, industrial x-ray computed tomography (CT) scanning technology affords a non-destructive comprehensive, three-dimensional insight into the interior structure of a battery without the need for disassembly. It can make the inner LIBs structures visible through the housing and even batteries already installed in devices can be examined safely and accurately without being removed or opened. This capability is of critical importance for the identification of defects that could lead to battery failure or safety issues, and guide the optimization of LIBs with better safety and performance. This perspective review briefly summarize the comprehensive application of industrial CT in LIBs including battery materials, cells and modules. Finally, we further discuss the challenges and prospects of industrial CT for energy storage.

随着全球锂离子电池(LIB)市场的不断扩大,对可靠、安全的锂离子电池的需求达到了前所未有的高度。然而,电池的使用存在许多重大风险,包括热失控和爆炸的可能性。对锂电池进行细致检查不仅对保证其质量和功能至关重要,而且对确保其安全也至关重要。这凸显了先进检测技术的重要性。与传统检测技术相比,工业 X 射线计算机断层扫描(CT)技术无需拆卸,就能以非破坏性的方式对电池内部结构进行全面、立体的检查。它可以使 LIBs 的内部结构透过外壳清晰可见,甚至可以安全、准确地检查已安装在设备中的电池,而无需拆卸或打开。这种能力对于识别可能导致电池故障或安全问题的缺陷,以及指导优化具有更好安全性和性能的锂电池至关重要。本视角综述简要总结了工业 CT 在锂电池中的全面应用,包括电池材料、电池和模块。最后,我们进一步讨论了工业 CT 在储能领域的挑战和前景。
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引用次数: 0
Effect of Sn Orientation on Electromigration Failure in CuSn Solders 锡取向对铜锡焊料电迁移失效的影响
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-26 DOI: 10.1007/s11664-024-11301-8
Andrew Minh Pham, Fariha Haq, Subramanya Sadasiva, Guangxu Li, Marisol Koslowski

Sn-Ag-Cu (SAC) has emerged as one of the most widely accepted lead-free solders used as interconnecting material in electronic packaging. However, these systems still have major reliability problems. During manufacturing, the interfacial reaction of Cu with molten Sn-based solder results in the formation of brittle intermetallic compounds (IMC) that accelerate the degradation of these systems. The evolution of IMC follows during operation due to electromigration (EM), which in addition is responsible for Cu depletion. Both mechanisms are strongly affected by the anisotropic diffusion of Sn resulting in large variability of solders life time prediction. We developed a model to study the formation and evolution of IMC and the diffusion of copper due to EM that includes the impact of Sn crystal orientation on solder failure during fabrication and operation. Our findings show that IMC growth is polarized during electromigration, accelerating at the anode and slowing at the cathode. Similarly, copper depletion is more pronounced at the cathode. The anisotropy of Sn strongly affects the rates of IMC growth and copper depletion during electromigration, shaping solder failure during operation.

锡银铜(SAC)已成为电子封装中用作互连材料的最广为接受的无铅焊料之一。然而,这些系统仍然存在严重的可靠性问题。在生产过程中,铜与熔融锡基焊料的界面反应会形成脆性金属间化合物(IMC),从而加速这些系统的降解。在运行过程中,由于电迁移(EM)作用,IMC 也会随之发生变化,这也是造成铜耗竭的原因。这两种机制都受到锡的各向异性扩散的强烈影响,从而导致焊料寿命预测的巨大差异。我们开发了一个模型来研究 IMC 的形成和演变以及 EM 导致的铜扩散,其中包括锡晶体取向对制造和操作过程中焊料失效的影响。我们的研究结果表明,在电迁移过程中,IMC 的生长是两极分化的,阳极的生长速度加快,而阴极的生长速度减慢。同样,阴极的铜耗竭更为明显。在电迁移过程中,锡的各向异性对 IMC 生长和铜耗尽的速率有很大影响,从而形成了操作过程中的焊接故障。
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引用次数: 0
The Tobin Coefficient: A Relevant Photodetector Performance Metric for IR Imaging 托宾系数:红外成像的相关光电探测器性能指标
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-26 DOI: 10.1007/s11664-024-11302-7
Olivier Gravrand, Alexandre Kerlain, Diane Sam-Giao, Maxence Soria, Johan Rothman

The well-known Rule07 is a simple thus efficient way to compare available technologies for IR imaging detectors in terms of dark current. The noise is then often estimated using a shot noise approximation on the dark current. Both II–VI and III–V communities use this rule of thumb as a reference for well-performing IR photodiodes. For HOT applications, a dark current close to this rule07 is considered a necessary condition but not a sufficient one to obtain a high-performance IR imager. Indeed, when limited by shot noise, rule07 describes well the noise behavior of the considered device. However, when considering low-frequency noise, it fails to describe the expected performances. In this paper, we focus on another figure-of-merit, dedicated to detector low-frequency noise rather than dark current. Systemic 1/f noise investigation in an IR detector was first reported by Tobin et al. in 1980. There is today a relative consensus on the fact that measured 1/f noise is proportional to the dark current. The ratio between the amplitude of the 1/f noise and the dark current of the same devices may therefore be used as a figure-of-merit for a given technology. This ratio (called the Tobin factor ({alpha }_{text{T}})) therefore appears adequate to compare different technologies as a figure-of-merit qualifying 1/f noise properties. This dimensionless ratio can also be very useful for optimizing a particular technology or process. However, in order to be relevant, this figure-of-merit must be estimated carefully as it appears, for instance, pixel pitch-dependent. Different examples of Tobin coefficient extraction are presented in this paper. We show that, depending on the technologies, the values of the Tobin coefficient can spread over several orders of magnitude. However, only low values result in high-quality IR imagers. Today, the best results we obtained show that ({alpha }_{text{T}}={10}^{-5}) is a state-of-art value to be compared with.

众所周知的 Rule07 是比较现有红外成像探测器暗电流技术的一种简单而有效的方法。然后,通常使用暗电流的射频噪声近似值来估算噪声。II-VI 和 III-V 界都使用这一经验法则作为性能良好的红外光电二极管的参考。对于 HOT 应用,暗电流接近这一规则07 被认为是获得高性能红外成像器的必要条件,但并非充分条件。事实上,当受到射击噪声的限制时,规则 07 很好地描述了所考虑器件的噪声行为。然而,当考虑到低频噪声时,它却无法描述预期的性能。在本文中,我们将重点放在另一个优点上,即专门针对探测器低频噪声而非暗电流。Tobin 等人于 1980 年首次报道了红外探测器中的系统 1/f 噪声研究。如今,人们对测量到的 1/f 噪声与暗电流成正比这一事实已达成相对共识。因此,同一设备的 1/f 噪声振幅与暗电流之间的比值可用作特定技术的优劣势。因此,这一比率(称为托宾系数 ({alpha}_{text{T}}/))似乎足以用来比较不同技术的 1/f 噪声特性。这一无量纲比率对于优化特定技术或工艺也非常有用。不过,为了使其具有相关性,必须仔细估算这一商数,因为它似乎与像素间距有关。本文介绍了提取托宾系数的不同实例。我们发现,根据技术的不同,托宾系数的数值可以跨越几个数量级。然而,只有低值才能产生高质量的红外成像仪。如今,我们获得的最佳结果表明,{alpha }_{text{T}}={10}^{-5}/)是可以与之相比的最先进值。
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引用次数: 0
Modeling and Numerical Simulation of a Triboelectric Nanogenerator to Achieve Optimal Performance by Considering the Dielectric Constant Effect 三电纳米发电机的建模与数值模拟,通过考虑介电常数效应实现最佳性能
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-25 DOI: 10.1007/s11664-024-11316-1
Sahand Fardadidokht, Javad Yavandhasani

A popular class of efficient energy harvesting technologies is the triboelectric nanogenerator (TENG). There has been considerable research demonstrating the feasibility of converting mechanical motions into electrical energy by using these devices. In the design of TENGs, the power generated and its optimization are the most important aspects. However, not all factors affecting TENG performance are well understood. The main criteria for choosing materials is surface charge density, flexibility, and mechanical resistance. In some types of TENGs that are time-varying capacitors, the dielectric constant of the material can be a significant factor affecting the performance of these nanogenerators. In this research, using simulation, we investigate the effect of increasing the dielectric constant on the performance of the TENG in the contact-separation model (CSTENG). We find that increasing the dielectric constant is very effective in thick structures; it boosts the charge transferred under short-circuit conditions (QSC), current, maximum power, and figure of merit. However, there is little effect of the dielectric constant on thin CSTENG performance. Hence, the high-K material utilization effect is relaxed by thin dielectric layers. We then analyze the conditions of frequency matching and we obtain the optimal condition to achieve maximum power. To achieve optimal power output, thin CSTENGs require materials with a low dielectric constant. In contrast, thick structures can be optimized by utilizing high-K materials. Based on these findings, design rules for TENGs can be derived.

Graphical Abstract

三电纳米发电机(TENG)是一类流行的高效能量收集技术。大量研究表明,利用这些设备将机械运动转化为电能是可行的。在 TENG 的设计中,发电量及其优化是最重要的方面。然而,并非所有影响 TENG 性能的因素都得到了很好的理解。选择材料的主要标准是表面电荷密度、柔韧性和机械阻力。在某些时变电容器类型的 TENG 中,材料的介电常数可能是影响这些纳米发电机性能的重要因素。在这项研究中,我们利用仿真技术研究了增加介电常数对接触分离模型(CSTENG)中 TENG 性能的影响。我们发现,提高介电常数对厚结构非常有效;它能提高短路条件下传输的电荷量(QSC)、电流、最大功率和优点系数。然而,介电常数对薄型 CSTENG 性能的影响很小。因此,薄介质层可以放宽高 K 材料利用率效应。然后,我们分析了频率匹配的条件,并获得了实现最大功率的最佳条件。要实现最佳功率输出,薄型 CSTENG 需要使用低介电常数的材料。相反,利用高介电常数材料可以优化厚结构。基于这些发现,可以得出 TENG 的设计规则。
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引用次数: 0
Structural, Magnetic, and Magnetocaloric Effects of La0.8Sr0.2MnO3 Manganites by Doping with f-Orbital Ions Through First-Principles Calculations 通过第一性原理计算掺入 f 轨道离子的 La0.8Sr0.2MnO3 锰矿的结构、磁性和磁性效应
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-24 DOI: 10.1007/s11664-024-11312-5
Changji Xu, Wenbin He, Zhuojia Xie, Zhengguang Zou

In this study, La0.63Sr0.2Nd0.17MnO3 was synthesized by the sol-gel method, and its structural, morphological, magnetic, and magnetocaloric effects were investigated. The structural properties were analyzed by x-ray diffraction (XRD), and scanning electron microscopy (SEM) was used to characterize the morphology. An integrated magnetic measurement system was used to determine the magnetic properties. La0.63Sr0.2Nd0.17MnO3 crystallized in a hexagonal crystal system with space group R-3c. This was also confirmed by Rietveld refinement of the x-ray data from La0.63Sr0.2Nd0.17MnO3. With the doping of Nd3+, the cell volume decreases, which can be explained by the angles and bond lengths of the bonds between the Mn and O ions and the distortion of the lattice. Near the Curie temperature, La0.63Sr0.2Nd0.17MnO3 exhibits significant magnetocaloric effects. The magnetic study of La0.63Sr0.2Nd0.17MnO3 suggests that the transition from the paramagnetic to ferromagnetic phase can occur near the Curie temperature. The maximum magnetic entropy change and relative cooling power (RCP) of La0.63Sr0.2Nd0.17MnO3 (298 K, 3 T) are 2.70 J/(kg K) and 135 (J/kg), respectively. The effect of f-orbitals on the magnetic properties of La0.8Sr0.2MnO3 was investigated by first-principles calculations in density functional theory. Thus, it can be concluded that the magnetocaloric effects of the material after doping with f-orbital ions (Nd3+) is enhanced compared to La0.8Sr0.2MnO3.

本研究采用溶胶-凝胶法合成了 La0.63Sr0.2Nd0.17MnO3,并研究了其结构、形态、磁性和磁致效应。通过 X 射线衍射(XRD)分析了其结构特性,并使用扫描电子显微镜(SEM)对其形貌进行了表征。综合磁性测量系统用于测定磁性能。La0.63Sr0.2Nd0.17MnO3 结晶为六方晶系,空间群为 R-3c。对 La0.63Sr0.2Nd0.17MnO3 的 X 射线数据进行的里特维尔德精炼也证实了这一点。随着 Nd3+ 的掺入,晶胞体积减小,这可以用 Mn 离子和 O 离子之间的角度和键长以及晶格的畸变来解释。在居里温度附近,La0.63Sr0.2Nd0.17MnO3 表现出显著的磁致效应。对 La0.63Sr0.2Nd0.17MnO3 的磁性研究表明,顺磁相向铁磁相的转变可能发生在居里温度附近。La0.63Sr0.2Nd0.17MnO3 (298 K, 3 T) 的最大磁熵变化和相对冷却功率 (RCP) 分别为 2.70 J/(kg K) 和 135 (J/kg)。通过密度泛函理论的第一原理计算,研究了 f 轨道对 La0.8Sr0.2MnO3 磁性能的影响。因此可以得出结论,与 La0.8Sr0.2MnO3 相比,掺杂 f 轨道离子(Nd3+)后材料的磁致效应增强了。
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引用次数: 0
Effect of Selenium Doping on the Electronic Properties of β-Ga2O3 by First-Principles Calculations 通过第一性原理计算了解硒掺杂对 β-Ga2O3 电子特性的影响
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-24 DOI: 10.1007/s11664-024-11292-6
Hanzhao Song, Zhigao Xie, Yimin Liao, Yan Wang, Chee-Keong Tan

This study is the first to explore the effect of selenium doping on the electronic properties of β-Ga2O3 through first-principles calculations. Selenium doping in β-Ga2O3 is a significant choice, as it has the potential to improve the material’s electronic properties. Previous work on β-Ga2O3 has focused primarily on other dopants, and the effect of selenium doping is not well understood. Therefore, this study fills an important gap in the current understanding of β-Ga2O3 doping. Selenium doping in β-Ga2O3 was studied by first-principles calculations with a hybrid functional, as this functional can offer a more accurate description of electronic properties, resulting in accurate electronic bandgap and defect level calculations. Our first-principles calculations reveal that selenium can be incorporated on both Ga and O sites under specific conditions. Specifically, under O-rich conditions, selenium atoms are more likely to substitute the Ga sites, whereas under Ga-rich conditions, they are more likely to substitute the O sites. With the formation energy analysis, our findings indicate that selenium doping on Ga sites can lead to n-type conductivity, with it acting as shallow donor. On the other hand, Se dopants at the O sites exhibit deep donor characteristics, rendering it ineffective in regulating the conductivity of β-Ga2O3 materials. Our findings suggest that Se can be used as a dopant to tune the β-Ga2O3 conductivity for electronic and photonic applications, provided that the atomic substitution on Ga sites can be effectively controlled. Our results will provide valuable theoretical insights for the refined use of selenium dopants in β-Ga2O3, as well as guidance and theoretical support for subsequent researchers in the selection of Ga2O3 dopants.

本研究首次通过第一原理计算探讨了硒掺杂对β-Ga2O3电子特性的影响。在 β-Ga2O3 中掺硒是一个重要的选择,因为它有可能改善材料的电子特性。以前有关 β-Ga2O3 的研究主要集中在其他掺杂剂上,而对硒掺杂的影响还不甚了解。因此,本研究填补了目前对 β-Ga2O3 掺杂理解的一个重要空白。我们采用混合函数进行第一性原理计算,研究了β-Ga2O3 中的硒掺杂,因为这种函数可以更准确地描述电子特性,从而进行精确的电子带隙和缺陷电平计算。我们的第一性原理计算显示,在特定条件下,硒可以同时掺入到镓和氧的位点上。具体来说,在富含 O 的条件下,硒原子更有可能取代 Ga 位点,而在富含 Ga 的条件下,硒原子更有可能取代 O 位点。通过对形成能的分析,我们的研究结果表明,在镓位点上掺硒可导致 n 型导电性,硒可充当浅供体。另一方面,在 O 位点上的硒掺杂物表现出深供体特性,使其不能有效调节 β-Ga2O3 材料的导电性。我们的研究结果表明,只要能有效控制 Ga 位点上的原子置换,Se 就能作为一种掺杂剂来调节 β-Ga2O3 的电导率,从而应用于电子和光子领域。我们的研究结果将为β-Ga2O3中硒掺杂剂的精细应用提供宝贵的理论见解,并为后续研究人员选择Ga2O3掺杂剂提供指导和理论支持。
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引用次数: 0
Synthesized Polymeric Nanocomposites with Enhanced Optical and Electrical Characteristics Based on SiO2 Nanoparticles for Multifunctional Technological Applications 基于二氧化硅纳米颗粒合成的具有增强光电特性的聚合物纳米复合材料,可用于多功能技术应用
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-23 DOI: 10.1007/s11664-024-11298-0
Majeed Ali Habeeb, Alaa Abass Mohammed, Nawras Karim Al-Sharifi, Idrees Oreibi, Rehab Shather Abdul Hamza

Composites of polyvinyl alcohol and polyvinyl pyrrolidone (PVA/PVP) reinforced with different silicon dioxide (SiO2) loadings (0, 2, 4, and 6) wt.% were obtained via the solution casting method. The electrical and optical properties have been investigated. Fourier-transform infrared ray (FTIR) analysis revealed that the incorporation of SiO2 NPs resulted in an interaction with the polymer matrix. Physical interactions between the (PVA/PVP) polymer matrix and SiO2 NPs have been shown by FTIR analysis. The increase in SiO2 nanoparticle ratio in the PVA/PVP/SiO2 nanocomposite results in a corresponding increase in absorbance and decrease in transmittance. The PVA/PVP/SiO2 nanocomposite exhibited a reduction in energy gap, decreasing from 4.2 eV observed in pure PVA/PVP to 2.6 eV for allowed indirect transition and 4 eV to 2.6 eV for forbidden indirect transition, upon the incorporation of SiO2 nanoparticles at a concentration of 6 wt.%. This result is deemed a key for various optical fields and optoelectronics nanodevices. The weight percentages of SiO2 nanoparticles exhibit a positive correlation with their absorbing coefficient, extinction coefficient, index of refractive, real and imaginary components of dielectric constants, and optical conductivity. The investigation of the nanocomposites has revealed that an increase in the concentration of SiO2 nanoparticles leads to an elevation in both the dielectric constant and dielectric loss, while an increase in the frequency of the applied electric field results in a decrease in these properties. The increase in frequency and weight content of SiO2 NPs results in a corresponding increase in AC electrical conductivity. The results confirm that PVA/PVP/SiO2 films nanocomposites have excellent optical and electrical properties, which could encourage the nanocomposites' application in different electric and optoelectric uses.

通过溶液浇铸法获得了不同二氧化硅(SiO2)含量(0、2、4 和 6)的聚乙烯醇和聚乙烯吡咯烷酮(PVA/PVP)增强复合材料。对其电气和光学特性进行了研究。傅立叶变换红外线(FTIR)分析表明,二氧化硅 NPs 的加入导致了与聚合物基质的相互作用。傅立叶变换红外光谱分析显示了(PVA/PVP)聚合物基质与 SiO2 NPs 之间的物理相互作用。PVA/PVP/SiO2 纳米复合材料中 SiO2 纳米粒子比例的增加导致吸光度相应增加,透射率相应降低。PVA/PVP/SiO2 纳米复合材料的能隙有所减小,当二氧化硅纳米粒子的浓度为 6 wt.% 时,能隙从纯 PVA/PVP 的 4.2 eV 减小到允许间接转换的 2.6 eV,从 4 eV 减小到禁止间接转换的 2.6 eV。这一结果被认为是各种光学领域和光电纳米器件的关键。二氧化硅纳米粒子的重量百分比与其吸收系数、消光系数、折射率、介电常数的实部和虚部以及光导率呈正相关。对纳米复合材料的研究表明,二氧化硅纳米粒子浓度的增加会导致介电常数和介电损耗的增加,而外加电场频率的增加会导致这些特性的降低。频率和 SiO2 纳米粒子重量含量的增加会导致交流导电率的相应增加。研究结果证实,PVA/PVP/SiO2 薄膜纳米复合材料具有优异的光学和电学特性,可促进该纳米复合材料在不同电气和光电领域的应用。
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引用次数: 0
Morphological, Optical, and Electrical Properties of a MOS Capacitor Based on Rare Earth Oxide and p-Porous GaAs 基于稀土氧化物和多孔砷化镓的 MOS 电容器的形态、光学和电学特性
IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-22 DOI: 10.1007/s11664-024-11309-0
Hayet Saghrouni, Lotfi Beji
<p>This paper reports the structural, optical, and electrical properties of dysprosium oxide (Dy<sub>2</sub>O<sub>3</sub>) deposited by electron beam deposition under ultra-vacuum on porous <i>p</i>-type GaAs. A porous GaAs layer was produced by electrochemical anodic etching of a (100)-heavily doped <i>p</i>-type GaAs substrate in hydrofluoric acid (HF) and ethanol C<sub>2</sub>H<sub>5</sub>OH solution. The surface topography of the elaborated Dy<sub>2</sub>O<sub>3</sub> layer was determined based on atomic force microscopy (AFM) images. AFM studies showed that the structure and roughness of the Dy<sub>2</sub>O<sub>3</sub> layer were strongly dependent on the roughness and surface of porous GaAs. Dy<sub>2</sub>O<sub>3</sub> is polycrystalline and exhibits a cubic crystalline structure, as confirmed by x-ray diffraction (XRD) analysis. The optical properties of Dy<sub>2</sub>O<sub>3</sub>/p-porous GaAs were analyzed using various techniques including ellipsometry and photoluminescence (PL) to obtain information on surface and interface quality, bandgap, optical constants, dielectric constant, and thickness. The photoluminescence (PL) spectra revealed an intense peak at 835 nm and additional weak emission peaks at 473 nm and 540 nm, respectively. The observed intense peak can be directly attributed to the interband recombination process of free carriers in the direct bandgap of p-GaAs, while the weak emission peaks at 473 nm and 540 nm correspond to 4F9/2-6H15/2 and 4F9/2-6H13/2 transitions, respectively. In the spectral region of 350 nm to 500 nm, the average thickness of the Dy<sub>2</sub>O<sub>3</sub> layer was determined to be 11 nm. The electrical properties of the (Co/Au)/Dy<sub>2</sub>O<sub>3</sub>/p-porous GaAs metal–oxide–semiconductor (MOS) capacitor were investigated via capacitance–voltage (C–V) and conductance–voltage (G/ω–V) measurements in the temperature range of 100–400 K and frequency range of 50 Hz to 1 MHz, respectively. The experiments demonstrated that both capacitance and conductance were influenced by temperature and frequency. Additionally, the effect of temperature on interface state density (<i>N</i><sub>ss</sub>) was studied, which showed that an increase in temperature led to a decrease in the interface state density (<i>N</i><sub>ss</sub>) of the (Co/Au)/Dy<sub>2</sub>O<sub>3</sub>/p-porous GaAs (MOS) capacitor, as calculated by the Hill–Coleman method. The mean values of <i>N</i><sub>ss</sub> for the (Co/Au)/Dy<sub>2</sub>O<sub>3</sub>/p-porous GaAs (MOS) capacitor were determined to be approximately 10<sup>12</sup> eV<sup>−1</sup> cm<sup>−2</sup>, making it suitable for electronic device applications. The lower values of <i>N</i><sub>ss</sub> can be attributed to a low amount of local defect microstructure at the Dy<sub>2</sub>O<sub>3</sub>/p-porous GaAs interface due to the incorporation of the Dy<sub>2</sub>O<sub>3</sub> layer into the porous GaAs. The electrical conductivity of the (Co/Au)/Dy<sub>2</sub>O<sub>3</
本文报告了在超真空条件下通过电子束沉积在多孔 p 型砷化镓上的氧化镝(Dy2O3)的结构、光学和电学特性。多孔砷化镓层是在氢氟酸(HF)和乙醇 C2H5OH 溶液中通过电化学阳极蚀刻掺杂程度很高的(100)p 型砷化镓衬底而产生的。根据原子力显微镜 (AFM) 图像确定了精心制作的 Dy2O3 层的表面形貌。原子力显微镜研究表明,Dy2O3 层的结构和粗糙度在很大程度上取决于多孔砷化镓的粗糙度和表面。经 X 射线衍射 (XRD) 分析证实,Dy2O3 是多晶体,呈立方晶体结构。利用椭偏仪和光致发光(PL)等多种技术分析了 Dy2O3/p 多孔砷化镓的光学特性,以获得有关表面和界面质量、带隙、光学常数、介电常数和厚度的信息。光致发光(PL)光谱在 835 纳米波长处显示出一个强烈的峰值,在 473 纳米波长和 540 纳米波长处分别显示出其他微弱的发射峰值。观测到的强光峰可直接归因于 p-GaAs 直接带隙中自由载流子的带间重组过程,而 473 nm 和 540 nm 处的弱发射峰则分别对应于 4F9/2-6H15/2 和 4F9/2-6H13/2 转变。在 350 nm 至 500 nm 的光谱区域内,Dy2O3 层的平均厚度被确定为 11 nm。通过电容-电压(C-V)和电导-电压(G/ω-V)测量,研究了(Co/Au)/Dy2O3/p-多孔 GaAs 金属氧化物半导体(MOS)电容器在 100-400 K 温度范围和 50 Hz 至 1 MHz 频率范围内的电学特性。实验表明,电容和电导都受到温度和频率的影响。此外,实验还研究了温度对界面态密度(Nss)的影响,结果表明,根据希尔-科尔曼法计算,温度升高会导致(Co/Au)/Dy2O3/p-多孔砷化镓(MOS)电容器的界面态密度(Nss)降低。经测定,(Co/Au)/Dy2O3/p-多孔砷化镓(MOS)电容器的 Nss 平均值约为 1012 eV-1 cm-2,使其适用于电子设备应用。较低的 Nss 值可归因于 Dy2O3 层融入多孔砷化镓后,Dy2O3/p-多孔砷化镓界面的局部缺陷微结构数量较少。在温度为 80 K 至 450 K、频率范围为 50 Hz 至 1 MHz 的条件下,使用阻抗光谱法研究了(Co/Au)/Dy2O3/多孔砷化镓(MOS)电容器的电导率。在低频条件下,交流电的电导率(σAC)几乎保持不变,而在高频条件下,电导率迅速增加,分别为 σDC 和 σAC。在所选温度范围内,σAC 的阿伦尼乌斯图显示出两个不同的斜率,分别对应于 35 MeV 和 10 MeV 两种活化能。
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引用次数: 0
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Journal of Electronic Materials
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