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2011 IEEE International Conference of Electron Devices and Solid-State Circuits最新文献

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A novel parallel random number generator for wireless medical security applications 一种新型的无线医疗安全并行随机数发生器
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117706
Weiyang Liu, N. Wu
A novel parallel random number generator (RNG) based on two dimensions feedback shift register (2-DFSR), genetic algorithm (GA) and cellular automaton (CA) algorithms is proposed for wireless medical security applications. The measurement results demonstrated that the RNG can successfully pass the NIST 800-22 statistical test suite. The highest bit rate is 16 Mbps. The typical power consumption is 61.81 µW. Its energy efficiency is 3.86 pJ/bit.
提出了一种基于二维反馈移位寄存器(2-DFSR)、遗传算法(GA)和元胞自动机(CA)算法的无线医疗安全并行随机数发生器(RNG)。测试结果表明,该RNG能够顺利通过NIST 800-22统计测试套件。最高比特率为16mbps。典型功耗为61.81µW。其能源效率为3.86 pJ/bit。
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引用次数: 0
A 17.5dBm IIP3 high linear fully differential RF CMOS amplifier 17.5dBm IIP3高线性全差分射频CMOS放大器
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117697
T. Yan, X. Shen, P. Jiang, J. J. Zhou
A high linear fully differential RF CMOS amplifier covering UHF band is presented in this paper. A novel structure with both NMOS and PMOS differential pairs is proposed to cancel IM3 induced by 1st order derivative of transconductance (gm') and 2nd order derivative of transconductance (gm"). With appropriate DC operating points and aspect ratios, the RF CMOS amplifier achieves 12.5dB noise figure (NF), 10.5dB voltage gain and 17.5dBm input third order intercept point (IIP3) with total current consumption of 2mA from 1.8V voltage supply. The proposed amplifier is designed in TSMC 0.18µm CMOS process.
介绍了一种覆盖UHF波段的高线性全差分射频CMOS放大器。提出了一种具有NMOS和PMOS差分对的新型结构,以抵消由一阶跨导导数(gm')和二阶跨导导数(gm')引起的IM3。在适当的直流工作点和宽高比下,RF CMOS放大器在1.8V电压电源的总电流消耗为2mA的情况下,实现了12.5dB噪声系数(NF)、10.5dB电压增益和17.5dBm输入三阶截距点(IIP3)。该放大器采用台积电0.18µm CMOS工艺设计。
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引用次数: 0
Noise analysis of the CG-CS low noise transconductance amplifier CG-CS低噪声跨导放大器的噪声分析
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117630
Jiangtao Xu, C. Saavedra, Guican Chen
In this paper, noise analysis for a low noise transconductance amplifier (LNTA) is performed. LNTA becomes popular and necessary as the high linearity requirement and low supply voltage trend make the RF front-end design go into current domain. Common-gate common-source (CG-CS) topology is examined for noise analysis. Via theoretical analysis and specific equations derived, this paper not only studies how to arrange the topology and how to choose the design parameters, but also discusses the tradeoffs existing in LNTA design between noise figure, input matching and linearity.
本文对低噪声跨导放大器(LNTA)进行了噪声分析。随着高线性度要求和低电源电压趋势使射频前端设计进入电流域,LNTA变得越来越流行和必要。对共门共源(CG-CS)拓扑进行了噪声分析。本文通过理论分析和推导具体方程,不仅研究了如何布置拓扑结构和如何选择设计参数,还讨论了LNTA设计中存在的噪声系数、输入匹配和线性度之间的权衡问题。
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引用次数: 1
A high-linearity fully-differential mixer 一个高线性全差分混频器
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117633
X. B. Li, M. Zhao, Z. H. Wu, B. Li
Mixer is an essential component for a communication system. Kinds of resolutions aiming at the improvement of mixer performance have been studied so far. In this paper, a fully differential structure is introduced and used in the design of a mixer with high linearity in a 0.18 µm CMOS RF process. Simulation results show that the input referred PldB (IPldB)of the mixer is 2.9 dBm, the input referred IP3 (IIP3) is 16 dBm and the power gain is 0.4 dB with a power consumption of 7.2 mW.
混频器是通信系统的重要组成部分。为了提高混合器的性能,人们研究了各种各样的解决方案。本文介绍了一种全差分结构,并将其应用于0.18µm CMOS RF工艺的高线性混频器设计中。仿真结果表明,混频器的输入参考PldB (IPldB)为2.9 dBm,输入参考IP3 (IIP3)为16 dBm,功率增益为0.4 dB,功耗为7.2 mW。
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引用次数: 8
Effects of fluorine incorporation on the electrical properties of silicon MOS capacitor with La2O3 gate dielectric 掺氟对La2O3栅极介质硅MOS电容器电性能的影响
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117657
L. Qian, X. Huang, P. Lai
In this work, the effects of fluorine incorporation by using plasma on the electrical properties of Si MOS capacitor with La2O3 gate dielectric are investigated. From the capacitance-voltage (C-V) curve and gate leakage current, it is demonstrated that the F-plasma treatment can effectively suppress the growth of interfacial layer, and thus improve the electrical properties of the device in terms of accumulation capacitance, interface-state density and breakdown voltage.
本文研究了等离子体掺入氟对La2O3栅极介质Si MOS电容器电性能的影响。从电容-电压(C-V)曲线和栅漏电流可知,f等离子体处理可以有效抑制界面层的生长,从而提高器件在积累电容、界面态密度和击穿电压方面的电学性能。
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引用次数: 1
New upper bound of target array for reconfigurable VLSI arrays 可重构VLSI阵列目标阵列的新上界
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117702
W. Jigang, Xiaogang Han
Reconfiguring a VLSI array with faults is to construct a maximum logical sub-array (target array). A large target array implies a good harvest of the corresponding reconfiguration algorithm. Thus, a tight upper bound of the harvest can be directly used to evaluate the performance of the reconfiguration algorithm. This paper presents a new approach to calculate the upper bound of the harvest for the VLSI arrays with clustered faults. Simulation results show that the upper bound is reduced up to 20% on 256 × 256 array with clustered faults.
对存在故障的超大规模集成电路阵列进行重构,就是构造一个最大逻辑子阵列(目标阵列)。一个大的目标阵列意味着相应的重构算法的良好收获。因此,可以直接使用收获的紧上界来评估重构算法的性能。本文提出了一种计算具有聚类故障的超大规模集成电路阵列的增益上界的新方法。仿真结果表明,在256 × 256的故障集群阵列上,该算法的上界降低了20%。
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引用次数: 0
A novel flash memory cell and design optimization for high density and low power application 一种新颖的闪存单元和设计优化,用于高密度和低功耗应用
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117733
Huiwei Wu, Shiqiang Qin, Yimao Cai, Poren Tang, Zhan Zhan, Qianqian Huang, Ru Huang
A novel flash memory cell based on Tunneling Field Effect Transistor (TFET) is investigated via 2-D device simulation in this paper. The proposed flash memory cell shows improved program/erase speed, increased programming efficiency and super punch-through immunity as the cell gate length scaled from 180nm to 45nm, which indicates that this new structure is with strong scalability. Furthermore, cell design consideration i.e. ambipolar suppression for the TFET-based flash cell are also investigated and discussed.
本文通过二维器件仿真研究了一种基于隧道场效应晶体管(TFET)的新型快闪存储单元。当单元栅长度从180nm扩展到45nm时,该闪存单元的编程/擦除速度加快,编程效率提高,抗穿孔能力增强,具有较强的可扩展性。此外,还研究和讨论了基于tfet的闪速电池的双极性抑制问题。
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引用次数: 4
Novel single-loop sigma-delta modulator with extended dynamic range 具有扩展动态范围的新型单环σ - δ调制器
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117738
Hongyi Li, Y. Wang, S. Jia, Xing Zhang
Using an auxiliary quantizer before unity-STF SDM, a novel 3rd-order dual-quantizer SDM with extended dynamic range is presented. With hybrid distributed feedback & feedforward paths and an internal feedforward path, a novel low-distortion 3rd-order SDM with simple adder before quantizer is proposed as the unity-STF SDM. Simulations show their perfect immunity to non-idealities.
在单位stf SDM前引入辅助量化器,提出了一种扩展动态范围的三阶双量化SDM。采用混合分布反馈与前馈路径和内前馈路径,提出了一种简单加法器后量化的低失真三阶SDM,即统一stf SDM。仿真结果表明,它们对非理想情况具有完全的免疫力。
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引用次数: 1
A curvature-compensation bandgap voltage reference with programmable trimming technique 具有可编程修整技术的曲率补偿带隙电压基准
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117744
Luncai Liu, Xiaozong Huang, Jing Zhang, Wengang Huang
A curvature-compensation bandgap voltage reference employing current proportional to absolute temperature (PTAT) is presented in this paper. In-package trim for the initial accuracy and temperature coefficient is used to get better performance without extra cost. And the principles and realization of the programmable electrical fuse are discussed in detail, which can be widely used. With the curvature compensation method, simulation temperature coefficient of 15ppm/°C over a wide range of •55°C to +125°C and high initial accuracy of better than 0.1% are achieved. Additionally, this bandgap reference has been embedded in a 16-bit ADC implementation.
本文提出了一种曲率补偿带隙基准电压,采用与绝对温度成比例的电流(PTAT)。为了在不增加成本的情况下获得更好的性能,采用了初始精度和温度系数的包装内装饰。详细论述了可编程保险丝的原理和实现,具有广泛的应用前景。采用曲率补偿方法,在•55°C至+125°C的宽范围内,模拟温度系数为15ppm/°C,初始精度优于0.1%。此外,这个带隙参考已经嵌入到一个16位ADC实现中。
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引用次数: 0
A 3.1–10.6 GHz ultra-wideband 0.18-µm CMOS low-noise amplifier with micromachined inductors 一种3.1-10.6 GHz超宽带0.18µm CMOS低噪声放大器,带有微机械电感
Pub Date : 2011-12-29 DOI: 10.1109/EDSSC.2011.6117619
To-Po Wang, Shih-Hua Chiang
A 3.1–10.6 GHz ultra-wideband (UWB) 0.18-µm CMOS low-noise amplifier using micromachined inductors is proposed in this paper. This LNA consists of two stages, the first stage is the cascode topology with shunt-series feedback for bandwidth enhancement, and the second stage is the common-source topology with shunt-series feedback for further bandwidth extended. To improve LNA performance in terms of gain and NF, the CMOS compatible micromachined inductors are adopted in this work. By using these techniques, this LNA achieves the 3-dB bandwidth from 3.1–10.6 GHz, and the peak gain is 19 dB. The dc power consumption and lowest noise figure of this LNA is 14.3 mW and 2.4 dB, respectively.
提出了一种基于微机械电感的3.1-10.6 GHz超宽带(UWB) 0.18µm CMOS低噪声放大器。该LNA由两级组成,第一级是具有并联串联反馈的级联码拓扑,用于增强带宽;第二级是具有并联串联反馈的共源拓扑,用于进一步扩展带宽。为了提高LNA在增益和NF方面的性能,本文采用了兼容CMOS的微机械电感。通过这些技术,该LNA在3.1 ~ 10.6 GHz范围内实现了3db带宽,峰值增益为19db。该LNA的直流功耗为14.3 mW,最低噪声系数为2.4 dB。
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引用次数: 1
期刊
2011 IEEE International Conference of Electron Devices and Solid-State Circuits
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