Pub Date : 2024-09-01DOI: 10.1016/j.chip.2024.100098
Reconfigurable field-effect transistors (R-FETs) that can dynamically reconfigure the transistor polarity, from n-type to p-type channel or vice versa, represent a promising new approach to reduce the logic complexity and granularity of programmable electronics. Although R-FETs have been successfully demonstrated upon silicon nanowire (SiNW) channels, a pair of extra program gates is still needed to control the source/drain (S/D) contacts. In this work, we propose a rather simple single gate R-FET structure with an asymmetric S/D electrode contact, where the FET channel polarity can be altered by changing the sign of channel bias Vds. These R-FETs were fabricated upon an orderly array of planar SiNW channels, grown via in-plane solid-liquid-solid mechanism, and contacted by Ti/Al and Pt/Au at the S/D electrodes, respectively. Remarkably, this channel-bias-controlled R-FET strategy has been successfully testified and implemented upon both p-type-doped (with indium dopants) or n-type-doped (phosphorus) SiNW channels, whereas the R-FET prototypes demonstrate an impressive high Ion/off ratio of > 106 and a steep subthreshold swing of 79 mV/dec. These results indicate a rather simple, compact and generic enough R-FET strategy for the construction of a new generation of SiNW-based programmable and low-power electronics.
可重构场效应晶体管(R-FET)能动态重构晶体管极性,从 n 型通道到 p 型通道,反之亦然,是降低逻辑复杂性和可编程电子器件粒度的一种很有前途的新方法。虽然 R 型场效应晶体管已在硅纳米线 (SiNW) 沟道上成功演示,但仍需要一对额外的编程门来控制源极/漏极 (S/D) 触点。在这项工作中,我们提出了一种具有非对称 S/D 电极触点的相当简单的单栅极 R-FET 结构,通过改变沟道偏压 Vds 的符号可以改变 FET 沟道的极性。这些 R-FET 是在平面 SiNW 沟道的有序阵列上制造的,通过平面内固-液-固机制生长,并在 S/D 电极上分别与 Ti/Al 和 Pt/Au 接触。值得注意的是,这种沟道偏压控制的 R-FET 策略已在掺杂 p 型(含铟)或 n 型(磷)的 SiNW 沟道上得到成功验证和实施,而 R-FET 原型则表现出令人印象深刻的 106 的高离子/关断比和 79 mV/dec 的陡峭次阈值摆幅。这些结果表明,对于构建基于 SiNW 的新一代可编程低功耗电子器件而言,R-FET 是一种相当简单、紧凑和通用的策略。
{"title":"Channel-bias-controlled reconfigurable silicon nanowire transistors via an asymmetric electrode contact strategy","authors":"","doi":"10.1016/j.chip.2024.100098","DOIUrl":"10.1016/j.chip.2024.100098","url":null,"abstract":"<div><p>Reconfigurable field-effect transistors (R-FETs) that can dynamically reconfigure the transistor polarity, from n-type to p-type channel or vice versa, represent a promising new approach to reduce the logic complexity and granularity of programmable electronics. Although R-FETs have been successfully demonstrated upon silicon nanowire (SiNW) channels, a pair of extra program gates is still needed to control the source/drain (S/D) contacts. In this work, we propose a rather simple single gate R-FET structure with an asymmetric S/D electrode contact, where the FET channel polarity can be altered by changing the sign of channel bias <em>V</em><sub>ds</sub>. These R-FETs were fabricated upon an orderly array of planar SiNW channels, grown via in-plane solid-liquid-solid mechanism, and contacted by Ti/Al and Pt/Au at the S/D electrodes, respectively. Remarkably, this channel-bias-controlled R-FET strategy has been successfully testified and implemented upon both p-type-doped (with indium dopants) or n-type-doped (phosphorus) SiNW channels, whereas the R-FET prototypes demonstrate an impressive high <em>I</em><sub>on/off</sub> ratio of > 10<sup>6</sup> and a steep subthreshold swing of 79 mV/dec. These results indicate a rather simple, compact and generic enough R-FET strategy for the construction of a new generation of SiNW-based programmable and low-power electronics.</p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 3","pages":"Article 100098"},"PeriodicalIF":0.0,"publicationDate":"2024-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000169/pdfft?md5=e3070abd5dfb82b3bdcb7e25f29beb8d&pid=1-s2.0-S2709472324000169-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141411691","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-01DOI: 10.1016/j.chip.2024.100106
Wenjie Dou , Chaonan Lin , Wei Fan , Xun Yang , Chao Fang , Huaping Zang , Shaoyi Wang , Congxu Zhu , Zhi Zheng , Weimin Zhou , Chongxin Shan
Diamond is a highly suitable material for X-ray detectors that can function effectively in harsh environments due to its unique properties such as ultrawide bandgap, high radiation resistance, excellent carrier mobility as well as remarkable chemical and thermal stability. However, the sensitivity of diamond X-ray detectors needs further improvement due to the relatively low X-ray absorption efficiency of diamond, and the exploration of single-crystal diamond array imaging still remains unexplored. In the current work, a 10 × 10 X-ray photodetector array was constructed from single-crystal diamond. To improve the sensitivity of the diamond X-ray detector, an asymmetric sandwich electrode structure was utilized. Additionally, trenches were created through laser cutting to prevent crosstalk between adjacent pixels. The diamond X-ray detector array exhibits exceptional performance, including a low detection limit of 4.9 nGy s−1, a sensitivity of 14.3 mC Gy−1 cm−2, and a light-dark current ratio of 18,312, which are among the most favorable values ever reported for diamond X-ray detectors. Furthermore, these diamond X-ray detectors can operate at high temperatures up to 450 °C, making them suitable for development in harsh environments.
金刚石具有超宽带隙、高抗辐射性、优异的载流子迁移率以及出色的化学和热稳定性等独特性能,是一种非常适合用于 X 射线探测器的材料,可在恶劣环境中有效发挥作用。然而,由于金刚石对 X 射线的吸收效率相对较低,因此金刚石 X 射线探测器的灵敏度有待进一步提高,而单晶金刚石阵列成像的探索仍处于起步阶段。在此,我们用单晶金刚石构建了一个 10 × 10 的 X 射线光电探测器阵列。为了提高金刚石 X 射线探测器的灵敏度,采用了非对称三明治电极结构。此外,还通过激光切割形成沟槽,以防止相邻像素之间发生串扰。金刚石 X 射线探测器阵列显示出卓越的性能,包括 4.9 nGy s 的低检测限、14.3 mC Gy cm 的灵敏度和 18,312 的明暗电流比,这些都是迄今为止所报道的金刚石 X 射线探测器中最理想的数值。此外,这些金刚石 X 射线探测器可在高达 450 °C 的高温下工作,因此适合在恶劣环境中开发。
{"title":"Highly sensitive diamond X-ray detector array for high-temperature applications","authors":"Wenjie Dou , Chaonan Lin , Wei Fan , Xun Yang , Chao Fang , Huaping Zang , Shaoyi Wang , Congxu Zhu , Zhi Zheng , Weimin Zhou , Chongxin Shan","doi":"10.1016/j.chip.2024.100106","DOIUrl":"10.1016/j.chip.2024.100106","url":null,"abstract":"<div><div>Diamond is a highly suitable material for X-ray detectors that can function effectively in harsh environments due to its unique properties such as ultrawide bandgap, high radiation resistance, excellent carrier mobility as well as remarkable chemical and thermal stability. However, the sensitivity of diamond X-ray detectors needs further improvement due to the relatively low X-ray absorption efficiency of diamond, and the exploration of single-crystal diamond array imaging still remains unexplored. In the current work, a 10 × 10 X-ray photodetector array was constructed from single-crystal diamond. To improve the sensitivity of the diamond X-ray detector, an asymmetric sandwich electrode structure was utilized. Additionally, trenches were created through laser cutting to prevent crosstalk between adjacent pixels. The diamond X-ray detector array exhibits exceptional performance, including a low detection limit of 4.9 nGy s<sup>−1</sup>, a sensitivity of 14.3 mC Gy<sup>−1</sup> cm<sup>−2</sup>, and a light-dark current ratio of 18,312, which are among the most favorable values ever reported for diamond X-ray detectors. Furthermore, these diamond X-ray detectors can operate at high temperatures up to 450 °C, making them suitable for development in harsh environments.</div></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 3","pages":"Article 100106"},"PeriodicalIF":0.0,"publicationDate":"2024-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000248/pdfft?md5=641348a92d64c73eaa83ace8518de946&pid=1-s2.0-S2709472324000248-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206231","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-01DOI: 10.1016/j.chip.2024.100101
The emergence of data-centric applications such as artificial intelligence (AI), machine learning, and the Internet of Things (IoT), has promoted surges in demand for storage memories with high operating speed and nonvolatile characteristics. HfO2-based ferroelectric memory technologies, which emerge as a promising alternative, have attracted considerable attention due to their high performance, energy efficiency, and full compatibility with the standard complementary metal-oxide-semiconductors (CMOS) process. These nonvolatile storage elements, such as ferroelectric random access memory (FeRAM), ferroelectric field-effect transistors (FeFETs), and ferroelectric tunnel junctions (FTJs), possess different data access mechanisms, individual merits, and specific application boundaries in next-generation memories or even beyond von Neumann architecture. This paper provides an overview of ferroelectric HfO2 memory technologies, addresses the current challenges, and offers insights into future research directions and prospects.
{"title":"Challenges and recent advances in HfO2-based ferroelectric films for non-volatile memory applications","authors":"","doi":"10.1016/j.chip.2024.100101","DOIUrl":"10.1016/j.chip.2024.100101","url":null,"abstract":"<div><div>The emergence of data-centric applications such as artificial intelligence (AI), machine learning, and the Internet of Things (IoT), has promoted surges in demand for storage memories with high operating speed and nonvolatile characteristics. HfO<sub>2</sub>-based ferroelectric memory technologies, which emerge as a promising alternative, have attracted considerable attention due to their high performance, energy efficiency, and full compatibility with the standard complementary metal-oxide-semiconductors (CMOS) process. These nonvolatile storage elements, such as ferroelectric random access memory (FeRAM), ferroelectric field-effect transistors (FeFETs), and ferroelectric tunnel junctions (FTJs), possess different data access mechanisms, individual merits, and specific application boundaries in next-generation memories or even beyond von Neumann architecture. This paper provides an overview of ferroelectric HfO<sub>2</sub> memory technologies, addresses the current challenges, and offers insights into future research directions and prospects.</div></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 3","pages":"Article 100101"},"PeriodicalIF":0.0,"publicationDate":"2024-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141394538","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-08DOI: 10.1016/j.chip.2024.100107
Xinyu Wang , Die Wang , Yuchen Tian , Jing Guo , Jinshui Miao , Weida Hu , Hailu Wang , Kang Liu , Lei Shao , Saifei Gou , Xiangqi Dong , Hesheng Su , Chuming Sheng , Yuxuan Zhu , Zhejia Zhang , Jinshu Zhang , Qicheng Sun , Zihan Xu , Peng Zhou , Honglei Chen , Wenzhong Bao
Photodetectors (PDs) are crucial in modern society as they enable the detection of a diverse range of light-based signals. With the exponential increase in their development, materials are being used to create a wide range of PDs that play critical roles in enabling various applications and technologies. Image sensor technology has been hindered due to the lack of a universal system that can integrate all types of PDs with silicon-based readout integrated circuits (ROICs). To address this issue, we conducted experiments adopting two-dimensional materials as an example. High-performance MoS2-/MoTe2-based PDs were fabricated in the current work and the most suitable ROICs were identified to pair with them. This established a solid foundation for further researches in the field of image sensors. We developed and implemented a versatile testing system that uses a printed circuit board to connect the PD and ROIC. After the ROIC generates the sampled signal, it is collected and processed by algorithms, which overcome device uniformity limitations and produce a high-quality image that is visible to the naked eye. This universal system can be used with a wide range of PD and ROIC types made from different materials, making it highly convenient for diverse testing applications and the development of diverse image sensor types. This robust new platform is expected to spur further innovation and advancements in this rapidly developing field.
{"title":"A universal optoelectronic imaging platform with wafer-scale integration of two-dimensional semiconductors","authors":"Xinyu Wang , Die Wang , Yuchen Tian , Jing Guo , Jinshui Miao , Weida Hu , Hailu Wang , Kang Liu , Lei Shao , Saifei Gou , Xiangqi Dong , Hesheng Su , Chuming Sheng , Yuxuan Zhu , Zhejia Zhang , Jinshu Zhang , Qicheng Sun , Zihan Xu , Peng Zhou , Honglei Chen , Wenzhong Bao","doi":"10.1016/j.chip.2024.100107","DOIUrl":"10.1016/j.chip.2024.100107","url":null,"abstract":"<div><div>Photodetectors (PDs) are crucial in modern society as they enable the detection of a diverse range of light-based signals. With the exponential increase in their development, materials are being used to create a wide range of PDs that play critical roles in enabling various applications and technologies. Image sensor technology has been hindered due to the lack of a universal system that can integrate all types of PDs with silicon-based readout integrated circuits (ROICs). To address this issue, we conducted experiments adopting two-dimensional materials as an example. High-performance MoS<sub>2</sub>-/MoTe<sub>2</sub>-based PDs were fabricated in the current work and the most suitable ROICs were identified to pair with them. This established a solid foundation for further researches in the field of image sensors. We developed and implemented a versatile testing system that uses a printed circuit board to connect the PD and ROIC. After the ROIC generates the sampled signal, it is collected and processed by algorithms, which overcome device uniformity limitations and produce a high-quality image that is visible to the naked eye. This universal system can be used with a wide range of PD and ROIC types made from different materials, making it highly convenient for diverse testing applications and the development of diverse image sensor types. This robust new platform is expected to spur further innovation and advancements in this rapidly developing field.</div></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 4","pages":"Article 100107"},"PeriodicalIF":0.0,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206230","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-06-26DOI: 10.1016/j.chip.2024.100099
Richard Soref , Francesco De Leonardis , Oussama Moutanabbir , Gerard Daligou
The commercially available 4000-Watt continuous-wave (CW) Erbium-doped-fiber laser, emitting at the 1567-nm wavelength where the atmosphere has high transmission, provides an opportunity for harvesting electric power at remote “off the grid” locations using a multi-module photovoltaic (PV) “receiver” panel. This paper proposes a 32-element monocrystalline thick-layer Germanium PV panel for efficient harvesting of a collimated 1.13-m-diam beam. The 0.78-m2 PV panel is constructed from commercial Ge wafers. For incident CW laser-beam power in the 4000 to 10,000 W range, our thermal, electrical, and infrared simulations predict 660 to 1510 Watts of electrical output at the panel temperatures of 350 to 423 K.
商用 4000 瓦连续波掺铒光纤激光器的波长为 1567 纳米,在大气层中具有较高的透射率,这为在偏远的 "离网 "地点使用多模块光伏(PV)"接收器 "面板收集电力提供了机会。本文提出了一种 32 元单晶厚层锗光电板,用于高效采集 1.13 米直径的准直光束。0.78 米的光伏板由商用锗晶片制成。对于 4000-10,000 W 范围内的入射 CW 激光束,我们的热学、电学和红外模拟预测在面板温度为 350-423 K 时可输出 660-1510 W 的电力。
{"title":"Remote electric powering by germanium photovoltaic conversion of an Erbium-fiber laser beam","authors":"Richard Soref , Francesco De Leonardis , Oussama Moutanabbir , Gerard Daligou","doi":"10.1016/j.chip.2024.100099","DOIUrl":"10.1016/j.chip.2024.100099","url":null,"abstract":"<div><p>The commercially available 4000-Watt continuous-wave (CW) Erbium-doped-fiber laser, emitting at the 1567-nm wavelength where the atmosphere has high transmission, provides an opportunity for harvesting electric power at remote “off the grid” locations using a multi-module photovoltaic (PV) “receiver” panel. This paper proposes a 32-element monocrystalline thick-layer Germanium PV panel for efficient harvesting of a collimated 1.13-m-diam beam. The 0.78-m<sup>2</sup> PV panel is constructed from commercial Ge wafers. For incident CW laser-beam power in the 4000 to 10,000 W range, our thermal, electrical, and infrared simulations predict 660 to 1510 Watts of electrical output at the panel temperatures of 350 to 423 K.</p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 3","pages":"Article 100099"},"PeriodicalIF":0.0,"publicationDate":"2024-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000170/pdfft?md5=d0ba424633e8badf6dfa158686b16e97&pid=1-s2.0-S2709472324000170-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141722083","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-06-01DOI: 10.1016/j.chip.2024.100096
Chengjun Li, Yubo Luo, Wang Li, Boyu Yang, Chengwei Sun, Wenyuan Ma, Zheng Ma, Yingchao Wei, Xin Li, Junyou Yang
With the development of 5G technology and increasing chip integration, traditional active cooling methods struggle to meet the growing thermal demands of chips. Thermoelectric coolers (TECs) have garnered great attention due to their rapid response, significant cooling differentials, strong compatibility, high stability and controllable device dimensions. In this review, starting from the fundamental principles of thermoelectric cooling and device design, high-performance thermoelectric cooling materials are summarized, and the progress of advanced on-chip TECs is comprehensively reviewed. Finally, the paper outlines the challenges and opportunities in TEC design, performance and applications, laying great emphasis on the critical role of thermoelectric cooling in addressing the evolving thermal management requirements in the era of emerging chip technologies.
{"title":"The on-chip thermoelectric cooler: advances, applications and challenges","authors":"Chengjun Li, Yubo Luo, Wang Li, Boyu Yang, Chengwei Sun, Wenyuan Ma, Zheng Ma, Yingchao Wei, Xin Li, Junyou Yang","doi":"10.1016/j.chip.2024.100096","DOIUrl":"10.1016/j.chip.2024.100096","url":null,"abstract":"<div><p>With the development of 5G technology and increasing chip integration, traditional active cooling methods struggle to meet the growing thermal demands of chips. Thermoelectric coolers (TECs) have garnered great attention due to their rapid response, significant cooling differentials, strong compatibility, high stability and controllable device dimensions. In this review, starting from the fundamental principles of thermoelectric cooling and device design, high-performance thermoelectric cooling materials are summarized, and the progress of advanced on-chip TECs is comprehensively reviewed. Finally, the paper outlines the challenges and opportunities in TEC design, performance and applications, laying great emphasis on the critical role of thermoelectric cooling in addressing the evolving thermal management requirements in the era of emerging chip technologies.</p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 2","pages":"Article 100096"},"PeriodicalIF":0.0,"publicationDate":"2024-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000145/pdfft?md5=5df7bff3a72f84dd9ee90367220d271d&pid=1-s2.0-S2709472324000145-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140792827","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-06-01DOI: 10.1016/j.chip.2024.100088
Yao Deng , Shenghong Liu , Manshi Li , Na Zhang , Yiming Feng , Junbo Han , Yury Kapitonov , Yuan Li , Tianyou Zhai
Two-dimensional metal chalcogenides have garnered significant attention as promising candidates for novel neuromorphic synaptic devices due to their exceptional structural and optoelectronic properties. However, achieving large-scale integration and practical applications of synaptic chips has proven to be challenging due to significant hurdles in materials preparation and the absence of effective nanofabrication techniques. In a recent breakthrough, we introduced a revolutionary allopatric defect-modulated Fe7S8@MoS2 synaptic heterostructure, which demonstrated remarkable optoelectronic synaptic response capabilities. Building upon this achievement, our current study takes a step further by presenting a sulfurization-seeding synergetic growth strategy, enabling the large-scale and arrayed preparation of Fe7S8@MoS2 heterostructures. Moreover, a three-dimensional vertical integration technique was developed for the fabrication of arrayed optoelectronic synaptic chips. Notably, we have successfully simulated the visual persistence function of the human eye with the adoption of the arrayed chip. Our synaptic devices exhibit a remarkable ability to replicate the preprocessing functions of the human visual system, resulting in significantly improved noise reduction and image recognition efficiency. This study might mark an important milestone in advancing the field of optoelectronic synaptic devices, which significantly prompts the development of mature integrated visual perception chips.
{"title":"Large-area growth of synaptic heterostructure arrays for integrated neuromorphic visual perception chips","authors":"Yao Deng , Shenghong Liu , Manshi Li , Na Zhang , Yiming Feng , Junbo Han , Yury Kapitonov , Yuan Li , Tianyou Zhai","doi":"10.1016/j.chip.2024.100088","DOIUrl":"10.1016/j.chip.2024.100088","url":null,"abstract":"<div><p>Two-dimensional metal chalcogenides have garnered significant attention as promising candidates for novel neuromorphic synaptic devices due to their exceptional structural and optoelectronic properties. However, achieving large-scale integration and practical applications of synaptic chips has proven to be challenging due to significant hurdles in materials preparation and the absence of effective nanofabrication techniques. In a recent breakthrough, we introduced a revolutionary allopatric defect-modulated Fe<sub>7</sub>S<sub>8</sub>@MoS<sub>2</sub> synaptic heterostructure, which demonstrated remarkable optoelectronic synaptic response capabilities. Building upon this achievement, our current study takes a step further by presenting a sulfurization-seeding synergetic growth strategy, enabling the large-scale and arrayed preparation of Fe<sub>7</sub>S<sub>8</sub>@MoS<sub>2</sub> heterostructures. Moreover, a three-dimensional vertical integration technique was developed for the fabrication of arrayed optoelectronic synaptic chips. Notably, we have successfully simulated the visual persistence function of the human eye with the adoption of the arrayed chip. Our synaptic devices exhibit a remarkable ability to replicate the preprocessing functions of the human visual system, resulting in significantly improved noise reduction and image recognition efficiency. This study might mark an important milestone in advancing the field of optoelectronic synaptic devices, which significantly prompts the development of mature integrated visual perception chips.</p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 2","pages":"Article 100088"},"PeriodicalIF":0.0,"publicationDate":"2024-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000066/pdfft?md5=3c43e3097235258d0932a5944fcc9d1f&pid=1-s2.0-S2709472324000066-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140406791","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-06-01DOI: 10.1016/j.chip.2024.100094
Zhenyun Tang , Zhe Wang , Zhigang Song , Wanhua Zheng
Tunneling-based staticrandom-accessmemory (SRAM) devices havebeen developed to fulfill the demands of high density and low power,andthe performance of SRAMshas also been greatly promoted.However, for a long time, there has not been a silicon based tunneling device with both high peak valley current ratio (PVCR) and practicality, which remains a gap to be filled.Based on the existing work, the current manuscript proposed the concept of a new silicon-based tunneling device, i.e., the silicon cross-coupled gated tunneling diode (Si XTD), which is quite simple in structure and almost completely compatible with mainstream technology. Withtechnology computer aided design (TCAD)simulations, it has been validated that this type of devicenot only exhibitssignificantnegative-differential-resistance(NDR) behavior with PVCRs up to 106, but also possessesreasonable process margins. Moreover, SPICE simulationshowedthe great potential of such devices to achieveultralow-powertunneling-based SRAMs with standby power down to 10−12W.
{"title":"Silicon cross-coupled gated tunneling diodes","authors":"Zhenyun Tang , Zhe Wang , Zhigang Song , Wanhua Zheng","doi":"10.1016/j.chip.2024.100094","DOIUrl":"10.1016/j.chip.2024.100094","url":null,"abstract":"<div><p><strong>Tunneling-based static</strong> <strong>random-access</strong> <strong>memory (SRAM) devices ha</strong><strong>ve</strong> <strong>been developed to fulfill the demands of high density and low power,</strong> <strong>and</strong> <strong>the performance of SRAMs</strong> <strong>has also been greatly promoted</strong><strong>.</strong> <strong>However, for a long time, there has not been a silicon based tunneling device with both high peak valley current ratio (PVCR) and practicality, which remains a gap to be filled</strong><strong>.</strong> <strong>Based on the existing work, the current manuscript proposed the concept of a new silicon-based tunneling device, i.e., the silicon cross-coupled gated tunneling diode (Si XTD), which is quite simple in structure and almost completely compatible with mainstream technology</strong><strong>. With</strong> <strong>t</strong>echnology computer aided design (<strong>TCAD</strong><strong>)</strong> <strong>simulations, it has been validated that this type of device</strong> <strong>not only exhibit</strong><strong>s</strong> <strong>significant</strong> <strong>negative-differential-resistance</strong> <strong>(NDR) behavior with PVCRs up to 10</strong><sup><strong>6</strong></sup><strong>, but also possess</strong><strong>es</strong> <strong>reasonable process margins. Moreover, SPICE simulation</strong> <strong>showed</strong> <strong>the great potential of such devices to achieve</strong> <strong>ultralow-power</strong> <strong>tunneling-based SRAMs with standby power down to 10</strong><sup><strong>−12</strong></sup> <strong>W.</strong></p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 2","pages":"Article 100094"},"PeriodicalIF":0.0,"publicationDate":"2024-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000121/pdfft?md5=ea45c5d42cfca2586f9abf13cbf43f07&pid=1-s2.0-S2709472324000121-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140782378","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-06-01DOI: 10.1016/j.chip.2024.100093
Huihui Peng, Lin Gan, Xin Guo
Inspired by the structure and principles of the human brain, spike neural networks (SNNs) appear as the latest generation of artificial neural networks, attracting significant and universal attention due to their remarkable low-energy transmission by pulse and powerful capability for large-scale parallel computation. Current research on artificial neural networks gradually change from software simulation into hardware implementation. However, such a process is fraught with challenges. In particular, memristors are highly anticipated hardware candidates owing to their fast-programming speed, low power consumption, and compatibility with the complementary metal–oxide semiconductor (CMOS) technology. In this review, we start from the basic principles of SNNs, and then introduced memristor-based technologies for hardware implementation of SNNs, and further discuss the feasibility of integrating customized algorithm optimization to promote efficient and energy-saving SNN hardware systems. Finally, based on the existing memristor technology, we summarize the current problems and challenges in this field.
{"title":"Memristor-based spiking neural networks: cooperative development of neural network architecture/algorithms and memristors","authors":"Huihui Peng, Lin Gan, Xin Guo","doi":"10.1016/j.chip.2024.100093","DOIUrl":"10.1016/j.chip.2024.100093","url":null,"abstract":"<div><p>Inspired by the structure and principles of the human brain, spike neural networks (SNNs) appear as the latest generation of artificial neural networks, attracting significant and universal attention due to their remarkable low-energy transmission by pulse and powerful capability for large-scale parallel computation. Current research on artificial neural networks gradually change from software simulation into hardware implementation. However, such a process is fraught with challenges. In particular, memristors are highly anticipated hardware candidates owing to their fast-programming speed, low power consumption, and compatibility with the complementary metal–oxide semiconductor (CMOS) technology. In this review, we start from the basic principles of SNNs, and then introduced memristor-based technologies for hardware implementation of SNNs, and further discuss the feasibility of integrating customized algorithm optimization to promote efficient and energy-saving SNN hardware systems. Finally, based on the existing memristor technology, we summarize the current problems and challenges in this field.</p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 2","pages":"Article 100093"},"PeriodicalIF":0.0,"publicationDate":"2024-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S270947232400011X/pdfft?md5=45bccc10058e80fbaed47545c5fd2f62&pid=1-s2.0-S270947232400011X-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140767491","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-27DOI: 10.1016/j.chip.2024.100097
Silicon technology offers the enticing opportunity for monolithic integration of quantum and classical electronic circuits. However, the power consumption levels of classical electronics may compromise the local chip temperature and hence affect the fidelity of qubit operations. In the current work, a quantum-dot-based thermometer embedded in an industry-standard silicon field-effect transistor (FET) was adopted to assess the local temperature increase produced by an active FET placed in close proximity. The impact of both static and dynamic operation regimes was thoroughly investigated. When the FET was operated statically, a power budget of 45 nW at 100-nm separation was found, whereas at 216 μm, the power budget was raised to 150 μW. Negligible temperature increase for the switch frequencies tested up to 10 MHz was observed when operating dynamically. The current work introduced a method to accurately map out the available power budget at a distance from a solid-state quantum processor, and indicated the possible conditions under which cryoelectronics circuits may allow the operation of hybrid quantum–classical systems.
{"title":"Measurement of cryoelectronics heating using a local quantum dot thermometer in silicon","authors":"","doi":"10.1016/j.chip.2024.100097","DOIUrl":"10.1016/j.chip.2024.100097","url":null,"abstract":"<div><p>Silicon technology offers the enticing opportunity for monolithic integration of quantum and classical electronic circuits. However, the power consumption levels of classical electronics may compromise the local chip temperature and hence affect the fidelity of qubit operations. In the current work, a quantum-dot-based thermometer embedded in an industry-standard silicon field-effect transistor (FET) was adopted to assess the local temperature increase produced by an active FET placed in close proximity. The impact of both static and dynamic operation regimes was thoroughly investigated. When the FET was operated statically, a power budget of 45 nW at 100-nm separation was found, whereas at 216 μm, the power budget was raised to 150 μW. Negligible temperature increase for the switch frequencies tested up to 10 MHz was observed when operating dynamically. The current work introduced a method to accurately map out the available power budget at a distance from a solid-state quantum processor, and indicated the possible conditions under which cryoelectronics circuits may allow the operation of hybrid quantum–classical systems.</p></div>","PeriodicalId":100244,"journal":{"name":"Chip","volume":"3 3","pages":"Article 100097"},"PeriodicalIF":0.0,"publicationDate":"2024-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2709472324000157/pdfft?md5=08ee00550d4fd08f99bd72e49daa1de1&pid=1-s2.0-S2709472324000157-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141508190","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}