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2012 8th International Caribbean Conference on Devices, Circuits and Systems (ICCDCS)最新文献

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Simulation of miller OpAmp analog circuit with FinFET transistors 用FinFET晶体管对miller OpAmp模拟电路进行仿真
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188898
E. Contreras, A. Cerdeira, M. Pavanello
In this paper we present a methodology to use the Symmetric Doped Double-Gate Model implemented in Verilog-A to simulate analog circuits with FinFET Technology. A Miller operational Amplifier was simulated in SPICE simulator and the results were validated comparing them with experimental data published in previous works.
在本文中,我们提出了一种使用Verilog-A实现的对称掺杂双栅模型来模拟具有FinFET技术的模拟电路的方法。在SPICE仿真器中对米勒运算放大器进行了仿真,并与前人的实验数据进行了比较。
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引用次数: 5
Performance and stability of flexible low-voltage organic thin-film transistors based on C10-DNTT 基于C10-DNTT的柔性低压有机薄膜晶体管的性能与稳定性
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188911
U. Zschieschang, H. Klauk, T. Sekitani, T. Someya, M. Kang, K. Takimiya, T. Canzler, A. Werner, J. Blochwitz-Nimoth
Using the recently developed organic semiconductor C10-DNTT and a thin, high-capacitance gate dielectric we have fabricated flexible organic thin-film transistors that combine a field-effect mobility of 4.3 cm2/Vs, an on/off ratio of 108, and a subthreshold swing of 68 mV/decade. To improve the charge exchange between the organic semiconductor layer and the metal source and drain contacts, a thin layer of a non-alkylated organic semiconductor (DNTT) sandwiched between two thin layers of a strong organic dopant (NDP-9) were inserted between the C10-DNTT and the metal contacts. Flexible ring oscillators have a signal propagation delay of 5 μsec per stage at a supply voltage of 3 V.
利用最近开发的有机半导体C10-DNTT和薄的高电容栅极电介质,我们制造了柔性有机薄膜晶体管,其场效应迁移率为4.3 cm2/Vs,开/关比为108,亚阈值摆幅为68 mV/ 10。为了改善有机半导体层与金属源极和漏极触点之间的电荷交换,在C10-DNTT和金属触点之间插入了一层薄的非烷基化有机半导体(DNTT),夹在两层薄的强有机掺杂剂(NDP-9)之间。在电源电压为3v时,柔性环形振荡器的信号传输延迟为每级5 μsec。
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引用次数: 3
Compact unified modeling of multigate MOSFETs based on isomorphic modeling functions 基于同构建模函数的多栅极mosfet紧凑统一建模
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188931
T. Fjeldly, U. Monga, S. Vishvakarma
A compact analytical model is presented for the 3D electrostatics of nanoscale gate-all-around MOSFET with a square and rectangular cross sections perpendicular to the source-drain axis. The model is based on solutions of the 3D Laplace equation (subthreshold) and Poisson's equation (above threshold), where suitable 2D isomorphic modeling functions are utilized to describe the potential distribution in the cross sections. From this, the device capacitances and the drain current can be calculated in the full range of bias voltages. The model compares well with numerical calculations obtained from the ATLAS device simulator. This model can be readily extended to include double gate and trigate MOSFETS and FinFETs.
本文建立了垂直于源漏轴的方形和矩形截面纳米栅极-全能MOSFET的三维静电分析模型。该模型基于三维拉普拉斯方程(亚阈值)和泊松方程(阈值以上)的解,其中使用合适的二维同构建模函数来描述截面上的势分布。由此,可以在整个偏置电压范围内计算器件的电容和漏极电流。该模型与ATLAS设备模拟器的数值计算结果吻合较好。该模型可以很容易地扩展到包括双栅极和三栅极mosfet和finfet。
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引用次数: 2
DDD-based symbolic sensitivity analysis of active filters 基于ddd的有源滤波器符号灵敏度分析
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188913
A. A. Palma-Rodriguez, Esteban Tlelo-Cuautle, S. Rodriguez-Chavez, Sheldon X.-D. Tan
Sensitivity analysis helps circuit designers to determine boundaries to predict the variations that a particular design variable will generate in a target specification, if it differs from what is previously assumed. It is quite important in designing active filters, but the major drawback is the need of generating the symbolic transfer function, from which the normalized sensitivity formula is usually applied. In this paper we show the usefulness of applying determinant decision diagrams (DDDs), to compute sensitivities without generating the symbolic transfer function, previously. Basically, we propose replacing all symbols in the DDD graph by their numerical values, except one, i.e. the variable of interest. Therefore, all sensitivities are computed by applying Cramer's rule and by constructing one DDD for each symbol. We demonstrate the computing time gain compared to generating the fully symbolic transfer function and then applying the normalized sensitivity formula.
灵敏度分析帮助电路设计人员确定边界,以预测特定设计变量在目标规格中产生的变化,如果它与先前假设的不同。它在有源滤波器的设计中是非常重要的,但主要的缺点是需要生成符号传递函数,而归一化灵敏度公式通常是从符号传递函数出发的。在本文中,我们展示了应用行列式决策图(DDDs)来计算灵敏度而不生成符号传递函数的有用性。基本上,我们建议用DDD图中的所有符号替换为它们的数值,除了一个,即感兴趣的变量。因此,所有的灵敏度都是通过应用克拉默规则,并通过为每个符号构造一个DDD来计算的。我们演示了与生成全符号传递函数然后应用归一化灵敏度公式相比的计算时间增益。
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引用次数: 13
Analog performance of asymmetric self-cascode p-channel fully depleted SOI transistors 非对称自级联码p沟道全耗尽SOI晶体管的模拟性能
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188932
M. de Souza, M. Pavanello, D. Flandre
This work presents an analysis of the analog performance of asymmetric threshold voltage self-cascode fully depleted (FD) p-type SOI transistors. The experimental results showed that this structure is able to improve the devices transconductance and output conductance, resulting in increased intrinsic voltage gain and breakdown voltage in comparison to single transistors and the conventional symmetric self-cascode.
本文分析了非对称阈值电压自级联码完全耗尽(FD) p型SOI晶体管的模拟性能。实验结果表明,与单晶体管和传统的对称自级联码相比,该结构能够改善器件的跨导和输出导,从而提高固有电压增益和击穿电压。
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引用次数: 11
A multi-channel LED driver with accurate current control and adjustable LED numbers 一个多通道LED驱动器,具有精确的电流控制和可调的LED数字
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188918
Chu-Hsiang Chia, Pui-Sun Lei, R. Chang, Pei-Wei Ko
This paper presents a multi-channel LED driver with PFM control which channels are independent of the LED numbers. Every channel can have almost the same driving current under different LED numbers. The current error is only 0.054% that is better than the previous design. It is designed by using TSMC 0.35μm 3.3V/5V CMOS technology. The proposed driver with the novel current balance circuit can have 15.6V output voltage and the maximum loading is 150mA.
本文提出了一种具有PFM控制的多通道LED驱动器,该驱动器的通道与LED编号无关。在不同的LED编号下,每个通道的驱动电流几乎相同。目前的误差仅为0.054%,优于之前的设计。采用台积电0.35μm 3.3V/5V CMOS工艺设计。采用新型电流平衡电路的驱动器输出电压为15.6V,最大负载为150mA。
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引用次数: 0
A CMOS analog four-quadrant multiplier for CNN synapses 用于CNN突触的CMOS模拟四象限乘法器
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188904
E. Santana, Raimundo C. S. Freire, Ana Isabela Araújo Cunha
This work presents a new architecture of analog four-quadrant multiplier in CMOS technology based on the behavior of MOSFET in the linear region from weak to strong inversion. The proposed multiplier has voltage and current inputs and a current output, thus being adequate for the implementation of compact synapses in analog Cellular Neural Network (CNN). Simulation results exhibit low power consumption and low distortion.
本文基于MOSFET在从弱到强反转线性区域的行为,提出了CMOS技术中模拟四象限乘法器的新架构。所提出的乘法器具有电压和电流输入以及电流输出,因此足以在模拟细胞神经网络(CNN)中实现紧凑突触。仿真结果显示低功耗和低失真。
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引用次数: 9
Structural studies of cubic GaN films grown by MOCVD MOCVD生长立方氮化镓薄膜的结构研究
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188897
H. Vilchis, V. M. Sanchez-R, A. Escobosa
In this work the characterization of cubic GaN epitaxial films on templates obtained by nitridation of GaAs is reported. N- or p-type materials were obtained in Undoped or Mg-doped films respectively. The use of Mg compounds results in a tendency to incorporate the hexagonal phase in the films, but this effect can be avoided adjusting the experimental parameters. The results show that the materials can be suitable to the realization of optoelectronic devices.
本文报道了在GaAs氮化制备的模板上制备立方氮化镓外延膜的特性。在未掺杂或掺杂mg的薄膜中分别获得N型或p型材料。Mg化合物的使用导致薄膜中出现六方相的倾向,但可以通过调整实验参数来避免这种影响。结果表明,该材料可适用于光电器件的实现。
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引用次数: 0
On-chip protection for automotive integrated circuits robustness 汽车集成电路稳健性片上保护
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188920
J. Salcedo, D. Clarke, J. Hajjar
On-chip protection architecture for automotive ICs (integrated circuits) system-level robustness is introduced. It comprises three-level protection for interface pins with high bidirectional voltage swing. A first protection stage is optimized to sustain the largest portion of the ESD (electrostatic discharge) and EMI (electromagnetic interference)-induced stress. A second-level protection stage is customized to sustain the relatively lower IC-level ESD stress, and the third level protection stage absorbs the initial transient voltage impulse.
介绍了用于汽车集成电路系统级鲁棒性的片上保护结构。它包括对双向高电压摆幅的接口引脚的三级保护。第一级保护经过优化,可以承受ESD(静电放电)和EMI(电磁干扰)引起的应力的最大部分。定制了二级保护级以维持相对较低的ic级ESD应力,第三级保护级吸收初始瞬态电压脉冲。
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引用次数: 7
Analysis and modeling of vertical non-uniform doping in bulk MOSFETs for circuit simulation 块体mosfet中垂直非均匀掺杂的分析与建模
Pub Date : 2012-03-14 DOI: 10.1109/ICCDCS.2012.6188935
S. Khandelwal, Y. Chauhan, M. A. Karim, S. Venugopalan, A. Sachid, A. Niknejad, C. Hu
We present an efficient approach to model the effects of vertical non-uniform doping in bulk MOSFETs. The impact of vertical non-uniform doping on device characteristics is analyzed through systematic TCAD simulations. The qualitative nature of the observed effects is also confirmed by the experimental data available in the literature. A modeling methodology for these effects is developed on BSIM6 model framework. The proposed model is in good agreement with the TCAD simulations.
我们提出了一种有效的方法来模拟垂直非均匀掺杂对大块mosfet的影响。通过系统的TCAD仿真,分析了垂直非均匀掺杂对器件特性的影响。观察到的效果的定性性质也被文献中可用的实验数据所证实。在BSIM6模型框架上开发了一种针对这些影响的建模方法。该模型与TCAD仿真结果吻合较好。
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引用次数: 4
期刊
2012 8th International Caribbean Conference on Devices, Circuits and Systems (ICCDCS)
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