Siqi Deng, Wenwu Xing, Takeru Sato, S. Zen, Nozomi Takeuchi
Low‐temperature plasma‐assisted nitrogen fixation is a promising method for organic‐polluted soil/water remediation, that improves N‐fertilizer performance and mitigates ammonia emission. Our study explores a novel approach: plasma bubbles‐assisted ammonia treatment, and investigates the role played by various reactive substances in the oxidation of ammonia. The specific reaction pathways and the contribution of OH radicals in the ammonia oxidation process in O2 plasma treatment are determined. Air emerges as the optimal feed gas owing to a positive feedback loop in the reaction between NO2− and H2O2. Air plasma treatment enriches N in the ammonia solution and minimizes ammonia loss during treatment. This study offers new insights into an advanced plasma‐assisted ammonia treatment method.
{"title":"Experimental and theoretical study on reactive oxygen and nitrogen species generation in plasma bubbles with ammonia solution","authors":"Siqi Deng, Wenwu Xing, Takeru Sato, S. Zen, Nozomi Takeuchi","doi":"10.1002/ppap.202300223","DOIUrl":"https://doi.org/10.1002/ppap.202300223","url":null,"abstract":"Low‐temperature plasma‐assisted nitrogen fixation is a promising method for organic‐polluted soil/water remediation, that improves N‐fertilizer performance and mitigates ammonia emission. Our study explores a novel approach: plasma bubbles‐assisted ammonia treatment, and investigates the role played by various reactive substances in the oxidation of ammonia. The specific reaction pathways and the contribution of OH radicals in the ammonia oxidation process in O2 plasma treatment are determined. Air emerges as the optimal feed gas owing to a positive feedback loop in the reaction between NO2− and H2O2. Air plasma treatment enriches N in the ammonia solution and minimizes ammonia loss during treatment. This study offers new insights into an advanced plasma‐assisted ammonia treatment method.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-02-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139781368","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Silviu Daniel Stoica, Cristina Craciun, Tomy Acsente, Bogdana Mitu, Gheorghe Dinescu
We performed an investigation of tungsten ionic species presence in hydrogen plasmas in contact with a tungsten surface, both in the presence of air impurities and when injected with argon. The study was carried out in a magnetron sputtering system complemented with mass spectrometry diagnostics. Our findings reveal that these plasmas encompass a diverse range of tungsten molecular ionic species in the mass range of 180–250 amu, broadly described as WHxNyOz+ (x = 0–3; y = 0–2; z = 0–3). The validity of these results was further confirmed through dedicated mass spectrometry investigations involving tungsten sputtering discharges in argon–nitrogen and argon–oxygen mixtures.
{"title":"Evidence for molecular tungsten ionic species presence in impurity-seeded hydrogen plasma in contact with W surfaces","authors":"Silviu Daniel Stoica, Cristina Craciun, Tomy Acsente, Bogdana Mitu, Gheorghe Dinescu","doi":"10.1002/ppap.202300227","DOIUrl":"https://doi.org/10.1002/ppap.202300227","url":null,"abstract":"We performed an investigation of tungsten ionic species presence in hydrogen plasmas in contact with a tungsten surface, both in the presence of air impurities and when injected with argon. The study was carried out in a magnetron sputtering system complemented with mass spectrometry diagnostics. Our findings reveal that these plasmas encompass a diverse range of tungsten molecular ionic species in the mass range of 180–250 amu, broadly described as WH<sub><i>x</i></sub>N<sub><i>y</i></sub>O<sub><i>z</i></sub><sup>+</sup> (<i>x</i> = 0–3; <i>y</i> = 0–2; <i>z</i> = 0–3). The validity of these results was further confirmed through dedicated mass spectrometry investigations involving tungsten sputtering discharges in argon–nitrogen and argon–oxygen mixtures.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139760290","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Jie Pan, Bin Li, Liguang Dou, Yuan Gao, Pengchen He, Tao Shao
Outside Front Cover: Plasma catalysis is a crucial and promising approach in greenhouse gas conversion. We investigate the synergistic interaction between plasma and Co-based catalysts in the CO2 hydrogenation to CH3OH system. The research reveals that plasma treatment increases the concentration of surface oxygen vacancies in the H2/Ar-CoO catalyst, facilitating the adsorption and transformation of oxygen-containing groups. Moreover, the addition of H2O also cooperates with the catalyst to achieve the maximum CH3OH yield.
封面外页：等离子体催化是温室气体转化中一种关键且前景广阔的方法。我们研究了等离子体与 Co 基催化剂在 CO2 加氢制 CH3OH 系统中的协同作用。研究发现，等离子体处理增加了 H2/Ar-CoO 催化剂表面氧空位的浓度，促进了含氧基团的吸附和转化。此外，H2O 的加入也与催化剂协同作用，实现了 CH3OH 产率的最大化。
{"title":"Outside Front Cover: Plasma Process. Polym. 2/2024","authors":"Jie Pan, Bin Li, Liguang Dou, Yuan Gao, Pengchen He, Tao Shao","doi":"10.1002/ppap.202370029","DOIUrl":"https://doi.org/10.1002/ppap.202370029","url":null,"abstract":"<b>Outside Front Cover</b>: Plasma catalysis is a crucial and promising approach in greenhouse gas conversion. We investigate the synergistic interaction between plasma and Co-based catalysts in the CO<sub>2</sub> hydrogenation to CH<sub>3</sub>OH system. The research reveals that plasma treatment increases the concentration of surface oxygen vacancies in the H<sub>2</sub>/Ar-CoO catalyst, facilitating the adsorption and transformation of oxygen-containing groups. Moreover, the addition of H<sub>2</sub>O also cooperates with the catalyst to achieve the maximum CH<sub>3</sub>OH yield.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-02-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139760287","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yong Wang, Alexander J. Robson, Stephane Simon, Robert D. Short, James W. Bradley
Nitric oxide (NO)-releasing coatings have promising potential for biomedical applications notably in implant safety and wound dressing by promoting healing and reducing bacterial growth. Yet, the production of NO-films remains difficult through classic approaches. In this study, plasma polymerized NO-coatings are produced using a helium-isopentyl nitrite mixture under two power settings and deposited on aluminum samples. Analyses of the plasma phase by mass spectroscopy reveal the presence of nitrosoxy groups (O–N═O) in monomer and quasi-monomer at low power, and a higher fragmentation rate at high power. Static and no-static samples are made and analyzed by X-ray photoelectron spectroscopy showing the presence of these group for both power conditions, with a better retention on the sample's center for the latest.
一氧化氮（NO）释放涂层在生物医学应用中具有广阔的前景，尤其是在植入物安全和伤口敷料方面，可促进愈合并减少细菌生长。然而，传统方法仍然难以生产出一氧化氮薄膜。在本研究中，使用氦气-亚硝酸异戊酯混合物在两种功率设置下生产出等离子聚合氮氧化物涂层，并沉积在铝样品上。通过质谱对等离子相进行分析，发现低功率时单体和准单体中存在亚硝基（O-N═O），而高功率时碎片率较高。制作了静态和非静态样品，并通过 X 射线光电子能谱进行分析，结果表明这两种功率条件下都存在这些基团，而最新功率条件下这些基团在样品中心的保留更好。
{"title":"Plasma polymerization of isopentyl nitrite at atmospheric pressure: Gas phase analysis and surface chemistry","authors":"Yong Wang, Alexander J. Robson, Stephane Simon, Robert D. Short, James W. Bradley","doi":"10.1002/ppap.202300162","DOIUrl":"https://doi.org/10.1002/ppap.202300162","url":null,"abstract":"Nitric oxide (NO)-releasing coatings have promising potential for biomedical applications notably in implant safety and wound dressing by promoting healing and reducing bacterial growth. Yet, the production of NO-films remains difficult through classic approaches. In this study, plasma polymerized NO-coatings are produced using a helium-isopentyl nitrite mixture under two power settings and deposited on aluminum samples. Analyses of the plasma phase by mass spectroscopy reveal the presence of nitrosoxy groups (O–N═O) in monomer and quasi-monomer at low power, and a higher fragmentation rate at high power. Static and no-static samples are made and analyzed by X-ray photoelectron spectroscopy showing the presence of these group for both power conditions, with a better retention on the sample's center for the latest.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139647669","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Min Chen, Dingxin Liu, Zifeng Wang, Jishen Zhang, Jiao Lin, Pengyu Zhao, Tianhui Li, Hao Zhang, Li Guo, Mingzhe Rong
Cold-chain transport is a crucial cross-regional transmission pathway for severe acute respiratory syndrome coronavirus 2 and other microorganisms. In this study, the mode-combination method is adopted for sterilization in a 1.138 m3 freezer by mixing effluent gases of NOx and O3 mode air discharges. The mixed gas can effectively inactivate Staphylococcus aureus in 10 mm ice within 3 h, which significantly surpasses O3 gas. Moreover, the inactivation effect of the mixed gas can penetrate deep into ice, contrasting with the surface effect of O3 gas. This disparity is linked to the difference in penetration depth of strong oxidizing long-lived reactive species. This study validates the sterilization efficacy of cold atmospheric plasma in practical cold-chain environment, critical for curbing infectious disease transmission.
{"title":"Sterilization effect and mechanism exploration of a mode-combination method on Staphylococcus aureus in thick ice layers in a large sealed freezer","authors":"Min Chen, Dingxin Liu, Zifeng Wang, Jishen Zhang, Jiao Lin, Pengyu Zhao, Tianhui Li, Hao Zhang, Li Guo, Mingzhe Rong","doi":"10.1002/ppap.202300221","DOIUrl":"https://doi.org/10.1002/ppap.202300221","url":null,"abstract":"Cold-chain transport is a crucial cross-regional transmission pathway for severe acute respiratory syndrome coronavirus 2 and other microorganisms. In this study, the mode-combination method is adopted for sterilization in a 1.138 m<sup>3</sup> freezer by mixing effluent gases of NO<sub><i>x</i></sub> and O<sub>3</sub> mode air discharges. The mixed gas can effectively inactivate <i>Staphylococcus aureus</i> in 10 mm ice within 3 h, which significantly surpasses O<sub>3</sub> gas. Moreover, the inactivation effect of the mixed gas can penetrate deep into ice, contrasting with the surface effect of O<sub>3</sub> gas. This disparity is linked to the difference in penetration depth of strong oxidizing long-lived reactive species. This study validates the sterilization efficacy of cold atmospheric plasma in practical cold-chain environment, critical for curbing infectious disease transmission.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139554155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that -like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.
{"title":"Ion chemistry and ionic thin film deposition from HMDS-photochemistry induced by VUV-radiation from an atmospheric plasma","authors":"Tristan Winzer, Jan Benedikt","doi":"10.1002/ppap.202300226","DOIUrl":"https://doi.org/10.1002/ppap.202300226","url":null,"abstract":"Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that <mjx-container aria-label=\"SiO Subscript 2\" ctxtmenu_counter=\"0\" ctxtmenu_oldtabindex=\"1\" jax=\"CHTML\" role=\"application\" sre-explorer- style=\"font-size: 103%; position: relative;\" tabindex=\"0\"><mjx-math aria-hidden=\"true\" location=\"graphic/ppap202300226-math-0001.png\"><mjx-semantics><mjx-mrow><mjx-msub data-semantic-children=\"0,1\" data-semantic- data-semantic-role=\"unknown\" data-semantic-speech=\"SiO Subscript 2\" data-semantic-type=\"subscript\"><mjx-mtext data-semantic-annotation=\"clearspeak:unit\" data-semantic-font=\"normal\" data-semantic- data-semantic-parent=\"2\" data-semantic-role=\"unknown\" data-semantic-type=\"text\"><mjx-c></mjx-c><mjx-c></mjx-c><mjx-c></mjx-c></mjx-mtext><mjx-script style=\"vertical-align: -0.15em;\"><mjx-mn data-semantic-annotation=\"clearspeak:simple\" data-semantic-font=\"normal\" data-semantic- data-semantic-parent=\"2\" data-semantic-role=\"integer\" data-semantic-type=\"number\" size=\"s\"><mjx-c></mjx-c></mjx-mn></mjx-script></mjx-msub></mjx-mrow></mjx-semantics></mjx-math><mjx-assistive-mml aria-hidden=\"true\" display=\"inline\" unselectable=\"on\"><math altimg=\"urn:x-wiley:16128850:media:ppap202300226:ppap202300226-math-0001\" location=\"graphic/ppap202300226-math-0001.png\" xmlns=\"http://www.w3.org/1998/Math/MathML\"><semantics><mrow><msub data-semantic-=\"\" data-semantic-children=\"0,1\" data-semantic-role=\"unknown\" data-semantic-speech=\"SiO Subscript 2\" data-semantic-type=\"subscript\"><mtext data-semantic-=\"\" data-semantic-annotation=\"clearspeak:unit\" data-semantic-font=\"normal\" data-semantic-parent=\"2\" data-semantic-role=\"unknown\" data-semantic-type=\"text\">SiO</mtext><mn data-semantic-=\"\" data-semantic-annotation=\"clearspeak:simple\" data-semantic-font=\"normal\" data-semantic-parent=\"2\" data-semantic-role=\"integer\" data-semantic-type=\"number\">2</mn></msub></mrow>${text{SiO}}_{2}$</annotation></semantics></math></mjx-assistive-mml></mjx-container>-like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139553926","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Alexey N. Ryabinkin, Alexey S. Vishnevskiy, Sergej Naumov, Alexander O. Serov, Konstantin I. Maslakov, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander F. Pal, Tatyana V. Rakhimova, Konstantin A. Vorotilov, Mikhail R. Baklanov
The effect of vacuum ultraviolet (VUV) radiation during ionized physical vapor deposition (IPVD) of tantalum barriers on various porous organosilicate glass low-k SiCOH films is studied using advanced diagnostics and quantum chemical calculations. VUV photons break the Si–C bonds, releasing hydrocarbon radicals from the pore surfaces. These radicals, trapped in pores that are partially sealed by tantalum deposition, can either react with tantalum to form carbide-like compounds, TaCx, or be redeposited in the pores as CHx polymers. This is evidenced by a decrease in CH3 groups that correlates with an increase in TaCx. The formation of TaCx poses a significant challenge in the back end of line (BEOL) technology when reducing the barrier thickness.
{"title":"Challenges in scaling of IPVD deposited Ta barriers on OSG low-k films: Carbonization of Ta by CHx radicals generated through VUV-induced decomposition of carbon-containing groups","authors":"Alexey N. Ryabinkin, Alexey S. Vishnevskiy, Sergej Naumov, Alexander O. Serov, Konstantin I. Maslakov, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander F. Pal, Tatyana V. Rakhimova, Konstantin A. Vorotilov, Mikhail R. Baklanov","doi":"10.1002/ppap.202300206","DOIUrl":"https://doi.org/10.1002/ppap.202300206","url":null,"abstract":"The effect of vacuum ultraviolet (VUV) radiation during ionized physical vapor deposition (IPVD) of tantalum barriers on various porous organosilicate glass low-<i>k</i> SiCOH films is studied using advanced diagnostics and quantum chemical calculations. VUV photons break the Si–C bonds, releasing hydrocarbon radicals from the pore surfaces. These radicals, trapped in pores that are partially sealed by tantalum deposition, can either react with tantalum to form carbide-like compounds, TaC<sub><i>x</i></sub>, or be redeposited in the pores as CH<sub><i>x</i></sub> polymers. This is evidenced by a decrease in CH<sub>3</sub> groups that correlates with an increase in TaC<sub><i>x</i></sub>. The formation of TaC<sub><i>x</i></sub> poses a significant challenge in the back end of line (BEOL) technology when reducing the barrier thickness.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139562426","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This study conducted an activation experiment on tap water using a self-designed dielectric barrier discharge plasma field. Aged pepper seeds and seedlings were chosen as the investigation's subjects to assess plasma-activated water (PAW's) effects on aged seed germination, seedling growth, and their respective qualities. PAW cultivation led to notable improvements in pepper seeds' germination potential and rate, with increases of 18.0% and 28.3%, respectively. Moreover, the vitality index exhibited a remarkable rise of 250.0%. Concurrently, seedlings treated with PAW exhibited significant growth enhancements, with root length, root number, stem length, and leaf area increasing by 138.6%, 69.2%, 47.9%, and 28.4 cm², respectively. Additionally, PAW treatment induces changes in endogenous substances and enzyme activities in seeds and seedlings.
{"title":"Plasma activated-water stimulates aged pepper seeds and promotes seedling growth","authors":"Dingmeng Guo, Hongxia Liu, Xiaoning Zhang, Chenlu Xiong","doi":"10.1002/ppap.202300173","DOIUrl":"https://doi.org/10.1002/ppap.202300173","url":null,"abstract":"This study conducted an activation experiment on tap water using a self-designed dielectric barrier discharge plasma field. Aged pepper seeds and seedlings were chosen as the investigation's subjects to assess plasma-activated water (PAW's) effects on aged seed germination, seedling growth, and their respective qualities. PAW cultivation led to notable improvements in pepper seeds' germination potential and rate, with increases of 18.0% and 28.3%, respectively. Moreover, the vitality index exhibited a remarkable rise of 250.0%. Concurrently, seedlings treated with PAW exhibited significant growth enhancements, with root length, root number, stem length, and leaf area increasing by 138.6%, 69.2%, 47.9%, and 28.4 cm², respectively. Additionally, PAW treatment induces changes in endogenous substances and enzyme activities in seeds and seedlings.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139553879","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Starch is a crucial part of the human dietary regimen. Still, its restricted water solubility, low viscosity, and weak heat stability are unfavorable physicochemical characteristics that restrict its use in food applications. So, in the 21st century, green and novel technologies such as cold plasma technology (CPT) and plasma‐activated water (PAW) have been employed for starch modification to improve the starch's physicochemical, digestibility, functional, structural, and thermal properties. This article provided an in‐depth evaluation of the use of cold plasma intervention in starch systems. Moreover, starch was modified due to cross‐linking, plasma etching, and depolymerization mechanisms mediated by plasma species. We may conclude that CPT and PAW are substitute methods for changing starch characteristics.
{"title":"Effect of cold plasma treatment and plasma‐activated water on physicochemical and structural properties of starch: A green and novel approach for environmental sustainability","authors":"Rakesh Kumar Gupta, P. Guha, P. Srivastav","doi":"10.1002/ppap.202300204","DOIUrl":"https://doi.org/10.1002/ppap.202300204","url":null,"abstract":"Starch is a crucial part of the human dietary regimen. Still, its restricted water solubility, low viscosity, and weak heat stability are unfavorable physicochemical characteristics that restrict its use in food applications. So, in the 21st century, green and novel technologies such as cold plasma technology (CPT) and plasma‐activated water (PAW) have been employed for starch modification to improve the starch's physicochemical, digestibility, functional, structural, and thermal properties. This article provided an in‐depth evaluation of the use of cold plasma intervention in starch systems. Moreover, starch was modified due to cross‐linking, plasma etching, and depolymerization mechanisms mediated by plasma species. We may conclude that CPT and PAW are substitute methods for changing starch characteristics.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139524436","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Jihye Kim, Ho-Won Kang, Yongjae Kim, Minsung Jeon, H. Chae
Plasma atomic layer etching (ALE) processes for SiO2 and Si3N4 and reactive ion etching (RIE) processes for SiO2 with hole patterns were developed using C4F8 and the low global warming potential gases of perfluoroisopropyl vinyl ether (PIPVE) and perfluoropropyl vinyl ether (PPVE). The ALE windows of SiO2 and Si3N4 were in the range of 50.0–57.5 V for all precursors. Etch per cycle of SiO2 was determined to be 5.5 Å/cycle (C4F8), 3.3 Å/cycle (PIPVE), and 5.4 Å/cycle (PPVE), all lower than that of Si3N4. PPVE reduced global warming emissions by 49%, demonstrating better vertical etch profiles in RIE compared to C4F8.
{"title":"Low global warming C5F10O isomers for plasma atomic layer etching and reactive ion etching of SiO2 and Si3N4","authors":"Jihye Kim, Ho-Won Kang, Yongjae Kim, Minsung Jeon, H. Chae","doi":"10.1002/ppap.202300216","DOIUrl":"https://doi.org/10.1002/ppap.202300216","url":null,"abstract":"Plasma atomic layer etching (ALE) processes for SiO2 and Si3N4 and reactive ion etching (RIE) processes for SiO2 with hole patterns were developed using C4F8 and the low global warming potential gases of perfluoroisopropyl vinyl ether (PIPVE) and perfluoropropyl vinyl ether (PPVE). The ALE windows of SiO2 and Si3N4 were in the range of 50.0–57.5 V for all precursors. Etch per cycle of SiO2 was determined to be 5.5 Å/cycle (C4F8), 3.3 Å/cycle (PIPVE), and 5.4 Å/cycle (PPVE), all lower than that of Si3N4. PPVE reduced global warming emissions by 49%, demonstrating better vertical etch profiles in RIE compared to C4F8.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":3.5,"publicationDate":"2024-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139524302","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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