This study presents a comparative evaluation of two nanowell-based biosensor fabrication methods designed to improve sensing performance and device reliability. The conventional process employs electron beam (e-beam) evaporation for metal deposition and aluminum oxide (Al2O3) as the insulating layer, while the modified approach utilizes the sputtering method for metal deposition and hafnium oxide (HfO2) as the insulating layer, respectively. Both fabrication methods were used to construct nanowell impedance biosensors for detecting interleukin-6 (IL-6) at concentrations ranging from 10 nM to 10 fM. Electrochemical impedance spectroscopy (EIS) was performed in a two-electrode configuration using an AC excitation of 10 mV across a frequency range of 1 Hz–5 MHz. The Sputtered/HfO2 biosensors exhibited improved electrical insulation, enhanced step coverage, and reduced device failure due to short or open circuits. These improvements resulted in a higher baseline response, reduced voltage drift, and enhanced sensitivity, achieving a limit of detection (LOD) of 7.8 fM compared to 15.5 fM for the E-beam/Al2O3 sensors. The results demonstrate that optimized fabrication using sputtering and HfO2 significantly enhances biosensor reproducibility and detection performance, supporting its application in scalable, label-free diagnostic platforms.
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