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2006 European Microwave Integrated Circuits Conference最新文献

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Fast Settling 9GHz PLL Using 528MHz Reference PLL Clock for MB-OFDM UWB System 基于528MHz参考锁相环时钟的MB-OFDM UWB系统快速定位9GHz锁相环
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282781
Young Jae Lee, S. Hyun, Geum-Young Tak, Hyun-Kyu Yu
A CMOS phase-locked loop (PLL) which synthesizes frequencies between 6.336~8.976GHz in steps of 528MHz and settles in approximately 150ns using the 528MHz reference clock is presented. Frequency hopping between the bands in the each mode is critical point to design the PLL in the multi-band orthogonal frequency division multiplexing (OFDM) because the frequency switching between each band is less than 9.5ns. To achieve the fast loop settling, the integer-N PLL that operates with the high reference frequency to meet the settling requirement is implemented. Two PLLs that operate at the 9GHz and 528MHz are integrated and shows the band hopping lower than 1ns
提出了一种以528MHz为参考时钟,合成频率在6.336~8.976GHz之间的CMOS锁相环(PLL),该锁相环以528MHz为步长,稳定在150ns左右。在多波段正交频分复用(OFDM)中,各频段间的跳频是设计锁相环的关键,因为各频段间的频率切换小于9.5ns。为了实现环路的快速稳定,实现了以高参考频率工作的整n锁相环以满足稳定要求。集成了两个工作在9GHz和528MHz的锁相环,显示跳带低于1ns
{"title":"Fast Settling 9GHz PLL Using 528MHz Reference PLL Clock for MB-OFDM UWB System","authors":"Young Jae Lee, S. Hyun, Geum-Young Tak, Hyun-Kyu Yu","doi":"10.1109/EMICC.2006.282781","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282781","url":null,"abstract":"A CMOS phase-locked loop (PLL) which synthesizes frequencies between 6.336~8.976GHz in steps of 528MHz and settles in approximately 150ns using the 528MHz reference clock is presented. Frequency hopping between the bands in the each mode is critical point to design the PLL in the multi-band orthogonal frequency division multiplexing (OFDM) because the frequency switching between each band is less than 9.5ns. To achieve the fast loop settling, the integer-N PLL that operates with the high reference frequency to meet the settling requirement is implemented. Two PLLs that operate at the 9GHz and 528MHz are integrated and shows the band hopping lower than 1ns","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123883902","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low-Temperature DC and RF Measurement and Modelling of InGaAs-InAlAs Resonant Tunneling Diodes down to 15 K 低至15k的InGaAs-InAlAs谐振隧道二极管的低温直流和射频测量与建模
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282652
A. Matiss, W. Brockerhoff, A. Poloczek, W. Prost, F. Tegude
The influence of temperature on bias dependent small-signal equivalent circuit components of a resonant tunneling diode (RTD) is investigated from 290 K down to 15 K. The RTD model based on bias dependent parasitic elements and the quantum capacitance as well as the quantum conductance is fitted to both, on-wafer DC and RF S-parameter measurements from 45 MHz to 40 GHz over a bias range of 0 V to 0.80 V. For the full temperature range, good agreement between extracted and measured parameters is shown
研究了温度对谐振隧道二极管(RTD)偏置小信号等效电路元件在290 K至15 K范围内的影响。基于偏置相关寄生元件和量子电容以及量子电导的RTD模型适用于在0 V至0.80 V的偏置范围内,在45 MHz至40 GHz的片上直流和射频s参数测量。在整个温度范围内,提取的参数和测量的参数吻合良好
{"title":"Low-Temperature DC and RF Measurement and Modelling of InGaAs-InAlAs Resonant Tunneling Diodes down to 15 K","authors":"A. Matiss, W. Brockerhoff, A. Poloczek, W. Prost, F. Tegude","doi":"10.1109/EMICC.2006.282652","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282652","url":null,"abstract":"The influence of temperature on bias dependent small-signal equivalent circuit components of a resonant tunneling diode (RTD) is investigated from 290 K down to 15 K. The RTD model based on bias dependent parasitic elements and the quantum capacitance as well as the quantum conductance is fitted to both, on-wafer DC and RF S-parameter measurements from 45 MHz to 40 GHz over a bias range of 0 V to 0.80 V. For the full temperature range, good agreement between extracted and measured parameters is shown","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121309857","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Advanced 3D Packaging using Novel Liquid Crystalline Polymer Based Substrates 采用新型液晶聚合物基基片的先进3D封装
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282704
C. Ghiu, S. Dalmia, J. Vickers, L. Carastro, W. Czakon, V. Sundaram, G. White
This paper presents the performance of 3D packaging solutions based on novel multilayered organic substrates. Electrical performance of embedded RF passives over 950 MHz to 3 GHz frequency range and stability from -40degC to 85degC has been demonstrated in an organic laminate substrate. Stand-alone, high Q inductors built on a multilayered liquid crystalline polymer (LCP)-based substrate can withstand a 2A direct current with the temperatures well within the safe range. The power handling capability of surface mounted IPDs is also assessed in this study. Reliability test data demonstrated the multilayer substrate compatibility with 1times and 3times lead free solder reflow. A promising high temperature LCP material enabled a significant improvement in the stability of electrical performance after 3times reflow at 260 degC
本文介绍了基于新型多层有机基板的三维封装解决方案的性能。嵌入式射频无源在950 MHz至3 GHz频率范围内的电气性能和-40°c至85°c的稳定性已在有机层压衬底中得到证明。建立在多层液晶聚合物(LCP)基板上的独立高Q电感器可以承受2A的直流电,温度完全在安全范围内。本研究也评估了表面安装ipd的功率处理能力。可靠性测试数据表明多层衬底兼容1次和3次无铅回流焊。一种很有前途的高温LCP材料在260℃下进行3次再流后,电气性能的稳定性得到了显著改善
{"title":"Advanced 3D Packaging using Novel Liquid Crystalline Polymer Based Substrates","authors":"C. Ghiu, S. Dalmia, J. Vickers, L. Carastro, W. Czakon, V. Sundaram, G. White","doi":"10.1109/EMICC.2006.282704","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282704","url":null,"abstract":"This paper presents the performance of 3D packaging solutions based on novel multilayered organic substrates. Electrical performance of embedded RF passives over 950 MHz to 3 GHz frequency range and stability from -40degC to 85degC has been demonstrated in an organic laminate substrate. Stand-alone, high Q inductors built on a multilayered liquid crystalline polymer (LCP)-based substrate can withstand a 2A direct current with the temperatures well within the safe range. The power handling capability of surface mounted IPDs is also assessed in this study. Reliability test data demonstrated the multilayer substrate compatibility with 1times and 3times lead free solder reflow. A promising high temperature LCP material enabled a significant improvement in the stability of electrical performance after 3times reflow at 260 degC","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123639667","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
GaAs Power pHEMT Characterization for Extracting Nonlinear Parameters of Drain Current by Harmonic Measurement 利用谐波测量提取漏极电流非线性参数的GaAs功率pHEMT表征
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282674
Kuan-Yu Chen, Chien-Chang Huang
This paper presents a simple method to extract nonlinear parameters of GaAs pseudomorphic high electron mobility transistor (pHEMT) for Volterra-Series analysis. With measuring the harmonic powers and phase polarities at various attenuations, the nonlinear parameters could be solved in least-square sense to reduce the measured uncertainties. The extracted data are validated by the two-tone measurements for a wide-range bias sweep
本文提出了一种用于Volterra-Series分析的GaAs伪晶高电子迁移率晶体管(pHEMT)非线性参数提取方法。通过测量不同衰减下的谐波功率和相极性,可以对非线性参数进行最小二乘求解,减小了测量的不确定性。提取的数据通过双色调测量验证了宽范围偏置扫描
{"title":"GaAs Power pHEMT Characterization for Extracting Nonlinear Parameters of Drain Current by Harmonic Measurement","authors":"Kuan-Yu Chen, Chien-Chang Huang","doi":"10.1109/EMICC.2006.282674","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282674","url":null,"abstract":"This paper presents a simple method to extract nonlinear parameters of GaAs pseudomorphic high electron mobility transistor (pHEMT) for Volterra-Series analysis. With measuring the harmonic powers and phase polarities at various attenuations, the nonlinear parameters could be solved in least-square sense to reduce the measured uncertainties. The extracted data are validated by the two-tone measurements for a wide-range bias sweep","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123761131","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A C-Band Oscillator MMIC with High Output Power, Low Harmonics, and Low Phase Noise using Passive Buffer 一种采用无源缓冲器的高输出功率、低谐波和低相位噪声的c波段振荡器MMIC
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282779
Sanghoon Sim, Songcheol Hong
A passive buffer of an oscillator to obtain high output power, low harmonics and low phase noise is presented. A cross-coupled oscillator with the passive buffer is fabricated using InGaP/GaAs HBT technology. The oscillation frequency is 6.96 GHz. The 2nd harmonic suppression is -36.23dBc in the one-side output power 9.43 dBm. The phase noise is -121.33 dBc/Hz at 1MHz offset. The chip size is 0.81 times 0.63 mm2. The performances are compared with those of the previously reported oscillators
提出了一种可实现高输出功率、低谐波和低相位噪声的振荡器无源缓冲器。采用InGaP/GaAs HBT技术制作了无源缓冲器交叉耦合振荡器。振荡频率为6.96 GHz。在单侧输出功率9.43 dBm时,二次谐波抑制为-36.23dBc。在1MHz偏移时相位噪声为-121.33 dBc/Hz。芯片尺寸为0.81 × 0.63 mm2。并将其性能与先前报道的振子进行了比较
{"title":"A C-Band Oscillator MMIC with High Output Power, Low Harmonics, and Low Phase Noise using Passive Buffer","authors":"Sanghoon Sim, Songcheol Hong","doi":"10.1109/EMICC.2006.282779","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282779","url":null,"abstract":"A passive buffer of an oscillator to obtain high output power, low harmonics and low phase noise is presented. A cross-coupled oscillator with the passive buffer is fabricated using InGaP/GaAs HBT technology. The oscillation frequency is 6.96 GHz. The 2nd harmonic suppression is -36.23dBc in the one-side output power 9.43 dBm. The phase noise is -121.33 dBc/Hz at 1MHz offset. The chip size is 0.81 times 0.63 mm2. The performances are compared with those of the previously reported oscillators","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124840316","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
77GHz Low Noise Sub Block MMICs with 120 nm In0.4AlAs/In0.35GaAs Metamorphic HEMTs 采用120nm In0.4AlAs/In0.35GaAs变质HEMTs的77GHz低噪声亚块mmic
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282761
Sungwon Kim, Dong-Hwan Kim, Jin-churl Her, Kyung-Chul Jang, W. Choi, Y. Kwon, K. Seo
77 GHz CPW low noise sub block (LNB) MMICs, which are consisted of a 3 stage LNA and a resistive mixer, have been successfully developed by using 120nm In0.4AlAs/In0.35GaAs metamorphic high electron mobility transistors (MHEMTs). The devices show an extrinsic transconductance gm of 760 mS/mm, a maximum drain current of 750 mA/mm, and a gate drain breakdown voltage of -8.5 V. A cut-off frequency (fT) of 172 GHz and a maximum oscillation frequency (fmax) of over 300 GHz are achieved. The LNA exhibited small signal gain of 19.2 dB and conversion gain of the LNB is measured to be 11 dB at 500 kHz IF
采用120nm In0.4AlAs/In0.35GaAs高电子迁移率晶体管(MHEMTs),成功研制出了由3级LNA和阻性混频器组成的77 GHz CPW低噪声子块(LNB) mmic。器件的外在跨导系数为760 mS/mm,最大漏极电流为750 mA/mm,栅极漏极击穿电压为-8.5 V。截止频率(fT)为172ghz,最大振荡频率(fmax)超过300ghz。LNA显示出19.2 dB的小信号增益,在500 kHz中频下LNB的转换增益为11 dB
{"title":"77GHz Low Noise Sub Block MMICs with 120 nm In0.4AlAs/In0.35GaAs Metamorphic HEMTs","authors":"Sungwon Kim, Dong-Hwan Kim, Jin-churl Her, Kyung-Chul Jang, W. Choi, Y. Kwon, K. Seo","doi":"10.1109/EMICC.2006.282761","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282761","url":null,"abstract":"77 GHz CPW low noise sub block (LNB) MMICs, which are consisted of a 3 stage LNA and a resistive mixer, have been successfully developed by using 120nm In0.4AlAs/In0.35GaAs metamorphic high electron mobility transistors (MHEMTs). The devices show an extrinsic transconductance gm of 760 mS/mm, a maximum drain current of 750 mA/mm, and a gate drain breakdown voltage of -8.5 V. A cut-off frequency (fT) of 172 GHz and a maximum oscillation frequency (fmax) of over 300 GHz are achieved. The LNA exhibited small signal gain of 19.2 dB and conversion gain of the LNB is measured to be 11 dB at 500 kHz IF","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121800361","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Detailed Analysis of IMD of HBT PA Based on VBIC Model 基于VBIC模型的HBT PA IMD详细分析
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282678
J. Aikio, J. Vuolevi, T. Rahkonen
In this paper a recently proposed detailed distortion analysis technique is extended to apply in a rather complex VBIC model that contains multidimensional current and charge models. The technique is implemented on top of normal harmonic balance simulation, and it is based on fitting polynomial models for all nonlinear I-V and Q-V sources of the device, and using these to calculate the various contributions of IM3 distortion. The technique is used to analyze a 2 GHz InGa pHBT power amplifier that shows strong bandwidth dependent signal-induced bias shift
本文将最近提出的详细畸变分析技术推广到一个包含多维电流和电荷模型的相当复杂的VBIC模型中。该技术是在法向谐波平衡仿真的基础上实现的,它基于拟合器件所有非线性I-V和Q-V源的多项式模型,并利用这些模型计算IM3失真的各种贡献。该技术用于分析一个2 GHz InGa pHBT功率放大器,该放大器表现出强烈的带宽依赖性信号诱发偏置偏移
{"title":"Detailed Analysis of IMD of HBT PA Based on VBIC Model","authors":"J. Aikio, J. Vuolevi, T. Rahkonen","doi":"10.1109/EMICC.2006.282678","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282678","url":null,"abstract":"In this paper a recently proposed detailed distortion analysis technique is extended to apply in a rather complex VBIC model that contains multidimensional current and charge models. The technique is implemented on top of normal harmonic balance simulation, and it is based on fitting polynomial models for all nonlinear I-V and Q-V sources of the device, and using these to calculate the various contributions of IM3 distortion. The technique is used to analyze a 2 GHz InGa pHBT power amplifier that shows strong bandwidth dependent signal-induced bias shift","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130632663","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Simplified RF-MEMS Switches Using Implanted Conductors and Thermal Oxide 使用植入导体和热氧化物的简化RF-MEMS开关
Pub Date : 2006-09-01 DOI: 10.1109/EUMC.2006.281477
C. Siegel, V. Ziegler, B. Schonlinner, U. Prechtel, H. Schumacher
This paper presents microwave capacitive RF-MEMS switches based on a novel simplified fabrication process. The devices are fabricated on a silicon substrate using only one metallisation layer. For the capacitive coupling of the switch, an implanted conductive region and thermally grown silicon oxide is used instead of a second metal layer and an additional dielectric layer. In addition, the formerly used bimorph metallisation layer is replaced by a single-metallisation concept, which results in an increased temperature range of operation. The simplified process as well as the switch topology used lead to high performance and highly reliable RF-MEMS switches. RF-measurement results are presented of Ku- and K-band series switches and a Ka-band parallel switch with low insertion losses between -0.2dB and -0.3dB and isolation of e.g. -17dB at 30GHz
本文提出了一种基于简化工艺的微波电容式RF-MEMS开关。该器件仅使用一个金属化层在硅衬底上制造。对于开关的电容耦合,使用植入的导电区域和热生长的氧化硅代替第二金属层和附加的介电层。此外,以前使用的双晶型金属化层被单金属化概念所取代,这导致了操作温度范围的增加。简化的过程以及所使用的开关拓扑导致高性能和高可靠性的RF-MEMS开关。给出了Ku和k波段系列开关和ka波段并联开关的射频测量结果,其插入损耗在-0.2 db和-0.3 db之间,隔离度在30GHz时为- 17db
{"title":"Simplified RF-MEMS Switches Using Implanted Conductors and Thermal Oxide","authors":"C. Siegel, V. Ziegler, B. Schonlinner, U. Prechtel, H. Schumacher","doi":"10.1109/EUMC.2006.281477","DOIUrl":"https://doi.org/10.1109/EUMC.2006.281477","url":null,"abstract":"This paper presents microwave capacitive RF-MEMS switches based on a novel simplified fabrication process. The devices are fabricated on a silicon substrate using only one metallisation layer. For the capacitive coupling of the switch, an implanted conductive region and thermally grown silicon oxide is used instead of a second metal layer and an additional dielectric layer. In addition, the formerly used bimorph metallisation layer is replaced by a single-metallisation concept, which results in an increased temperature range of operation. The simplified process as well as the switch topology used lead to high performance and highly reliable RF-MEMS switches. RF-measurement results are presented of Ku- and K-band series switches and a Ka-band parallel switch with low insertion losses between -0.2dB and -0.3dB and isolation of e.g. -17dB at 30GHz","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122162861","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 18
GaN HEMT Performance - Measurements and Simulations of a 3.6 mm Device from Cree GaN HEMT性能-来自Cree的3.6 mm器件的测量和模拟
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282689
A. Madjar, Z. Turski, Yifei Li
The premise of GaN HEMT devices to offer superior power amplification performance in microwave frequencies lead to an extensive research in this field, and to numerous publications emphasizing individual performance records such as, current & power densities, linearity and break down voltage. The performance of these, primarily experimental devices, is often reported in the terms of their intended applications, offering either the saturated output power, or 3dB compressed output power, or OFDM and CDMA waveform-specific output power, making the comparison among the devices, and a comparison with other technologies such as LDMOS & GaAs rather difficult. The authors are engaged in the design of a wideband (10:1 BW) 50W @ 1dB compression point linear power amplifier operating up to 2GHz. As a step in this process we determine the performance of an actual, 3.6 mm periphery, pre-production GaN HEMT from CREE. The device performance is simulated using CREE model, and it is compared with the measurements we have taken, both reported in this paper. The results obtained exhibit good convergence with the model, and are presented using the more common performance parameters such as power and efficiency at 1dB compression point, and the linearity in terms of IP3
GaN HEMT器件在微波频率下提供卓越的功率放大性能的前提导致了该领域的广泛研究,以及许多强调单个性能记录的出版物,如电流和功率密度,线性度和击穿电压。这些主要是实验设备的性能通常以其预期应用的术语来报道,提供饱和输出功率,或3dB压缩输出功率,或OFDM和CDMA波形特定输出功率,使得设备之间的比较,以及与其他技术(如LDMOS和GaAs)的比较相当困难。作者致力于设计一种工作频率高达2GHz的宽带(10:1 BW) 50W @ 1dB压缩点线性功率放大器。作为这一过程的第一步,我们确定了CREE实际的3.6 mm外围预生产GaN HEMT的性能。采用CREE模型对器件性能进行了模拟,并与我们所做的测量结果进行了比较。得到的结果与模型具有良好的收敛性,并使用了更常用的性能参数,如1dB压缩点的功率和效率,以及以IP3为单位的线性度
{"title":"GaN HEMT Performance - Measurements and Simulations of a 3.6 mm Device from Cree","authors":"A. Madjar, Z. Turski, Yifei Li","doi":"10.1109/EMICC.2006.282689","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282689","url":null,"abstract":"The premise of GaN HEMT devices to offer superior power amplification performance in microwave frequencies lead to an extensive research in this field, and to numerous publications emphasizing individual performance records such as, current & power densities, linearity and break down voltage. The performance of these, primarily experimental devices, is often reported in the terms of their intended applications, offering either the saturated output power, or 3dB compressed output power, or OFDM and CDMA waveform-specific output power, making the comparison among the devices, and a comparison with other technologies such as LDMOS & GaAs rather difficult. The authors are engaged in the design of a wideband (10:1 BW) 50W @ 1dB compression point linear power amplifier operating up to 2GHz. As a step in this process we determine the performance of an actual, 3.6 mm periphery, pre-production GaN HEMT from CREE. The device performance is simulated using CREE model, and it is compared with the measurements we have taken, both reported in this paper. The results obtained exhibit good convergence with the model, and are presented using the more common performance parameters such as power and efficiency at 1dB compression point, and the linearity in terms of IP3","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126547492","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A Low-Loss Microstrip Surface-Mount K-Band Package 低损耗微带表面贴装k波段封装
Pub Date : 2006-09-01 DOI: 10.1109/EMICC.2006.282702
K. Entesari, Gabriel M. Rebeiz
This paper presents a hermetic-compatible surface mount package for microstrip structures designed for K-band applications. The microstrip lines, fabricated on a 250 mum-thick alumina substrate are packaged using a 280 mum-thick silicon cap wafer and gold-gold thermo-compression bonding. A 130 mum cavity is etched in the cap wafer to allow ample space for RF MEMS devices, surface- or bulk-wave acoustic filters, power amplifiers, or multi-chip assemblies. A via-hole transition is used to connect the microstrip line inside the package to the coplanar waveguide (CPW) line on the back side of the alumina wafer. The gold sealing ring is connected to the microstrip ground using via-holes through the alumina wafer to eliminate any parasitic resonance modes and to improve the isolation between the input and output ports. A packaged microstrip line with total dimensions of 2.6 mm has a measured insertion loss and return loss of less than 0.5 dB and 18 dB, respectively, at DC-23 GHz
本文提出了一种用于k波段应用的微带结构的密封兼容表面贴装封装。微带线在250毫米厚的氧化铝衬底上制造,使用280毫米厚的硅帽晶圆和金-金热压缩键合封装。帽晶圆上蚀刻了一个130 μ m的腔,为RF MEMS器件、表面波或体波声滤波器、功率放大器或多芯片组件提供了充足的空间。通过孔过渡将封装内的微带线连接到氧化铝晶圆背面的共面波导(CPW)线。金密封环通过氧化铝晶圆通过过孔连接到微带接地,以消除任何寄生共振模式,并提高输入和输出端口之间的隔离。总尺寸为2.6 mm的封装微带线在DC-23 GHz下的插入损耗和回波损耗分别小于0.5 dB和18 dB
{"title":"A Low-Loss Microstrip Surface-Mount K-Band Package","authors":"K. Entesari, Gabriel M. Rebeiz","doi":"10.1109/EMICC.2006.282702","DOIUrl":"https://doi.org/10.1109/EMICC.2006.282702","url":null,"abstract":"This paper presents a hermetic-compatible surface mount package for microstrip structures designed for K-band applications. The microstrip lines, fabricated on a 250 mum-thick alumina substrate are packaged using a 280 mum-thick silicon cap wafer and gold-gold thermo-compression bonding. A 130 mum cavity is etched in the cap wafer to allow ample space for RF MEMS devices, surface- or bulk-wave acoustic filters, power amplifiers, or multi-chip assemblies. A via-hole transition is used to connect the microstrip line inside the package to the coplanar waveguide (CPW) line on the back side of the alumina wafer. The gold sealing ring is connected to the microstrip ground using via-holes through the alumina wafer to eliminate any parasitic resonance modes and to improve the isolation between the input and output ports. A packaged microstrip line with total dimensions of 2.6 mm has a measured insertion loss and return loss of less than 0.5 dB and 18 dB, respectively, at DC-23 GHz","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127821777","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
期刊
2006 European Microwave Integrated Circuits Conference
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