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Review on Variable and Programmable Gain Amplifiers and Applications 可变增益和可编程增益放大器及其应用综述
Q4 Engineering Pub Date : 2022-04-30 DOI: 10.29292/jics.v17i1.583
Michel Santana de Deus, Sebastian Yuri Cavalcanti Catunda, Antônio Wallace Antunes Soares, Diomadson Rodrigues Belfort
Variable and programmable gain amplifiers have been a recurrent subject of study over the last 50 years, and, are increasingly used in different applications today. This work presents an overview of these amplifiers as to serve as an up-to-date source of information for studies and designs. Different architectures and techniques are presented and classified for both radio and intermediate frequencies, since there are major differences in the requirements according to bandwidth. Typical applications where VGAs and PGAs are employed are also presented.
在过去的50年里,可变增益和可编程增益放大器一直是一个反复研究的主题,并且在今天越来越多地应用于不同的应用中。这项工作提出了这些放大器的概述,作为研究和设计的最新信息来源。针对无线电和中频提出了不同的体系结构和技术,并对其进行了分类,因为根据带宽的要求存在重大差异。还介绍了VGAs和PGAs的典型应用。
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引用次数: 0
Are CMOS Operational Transconductance Amplifiers Old Fashioned? A Systematic Review CMOS操作跨导放大器过时了吗?系统回顾
Q4 Engineering Pub Date : 2022-04-30 DOI: 10.29292/jics.v17i1.574
Rodrigo Aparecido da Silva Braga, Paulo M. Moreira e Silva, Dean Bicudo Karolak
Operational Transconductance Amplifiers (OTAs) are essential building blocks in analog circuits. Since the early years of integrated circuit science, OTAs have been used in industry and researched in academia. Over the years, a number of techniques and approaches to OTA design have been observed in the literature. With this systematic review, we aim to provide a overview of top  journal papers published from 2017 to 2021 containing OTA design. In our investigation we initially found 128 manuscripts and 24 primary studies of OTA design. A set of 10 different techniques have been found. Furthermore, we also evaluate used technology, inversion level and characterization process. With this study we contribute to highlight recent OTA design innovations.
运算跨导放大器(OTA)是模拟电路中必不可少的组成部分。自集成电路科学的早期以来,OTA一直在工业中使用,并在学术界进行研究。多年来,在文献中观察到了许多OTA设计的技术和方法。通过这篇系统综述,我们旨在概述2017年至2021年发表的包含OTA设计的顶级期刊论文。在我们的调查中,我们最初发现了128份关于OTA设计的手稿和24份初步研究。已经发现了10种不同的技术。此外,我们还评估了所使用的技术、反演水平和表征过程。通过这项研究,我们有助于突出最近OTA的设计创新。
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引用次数: 0
A Low-cost Fault Tolerance Method for ARM and RISC-V Microprocessor-based Systems using Temporal Redundancy and Approximate Computing through Simplified Iterations 基于时间冗余和简化迭代近似计算的ARM和RISC-V微处理器系统低成本容错方法
Q4 Engineering Pub Date : 2022-04-02 DOI: 10.29292/jics.v16i3.539
Alexander Aponte-Moreno, Felipe Restrepo-Calle, C. Pedraza
Approximate Computing techniques have been successfully used to reduce the overhead associated with redundancy in fault-tolerant system designs. This paper presents a fault tolerance method to reduce the execution time overhead of the well-known Time Redundancy technique by means of an improvement proposed for the Approximate Computing software-based technique known as loop perforation. Time Redundancy is a software-based fault tolerance technique that involves executing replicas of a task at different times. We propose to approximate the tasks to be executed using a new approximate computing technique based on loop perforation, i.e., simplified iterations. The novelty of this method is the combined use of the fault tolerance technique, temporal redundancy, jointly with the new proposed Approximate Computing technique, simplified iterations. The proposal is validated through simulation-based fault injection campaigns on several test programs for the ARM and RISC-V microprocessor architectures. Experimental results verified not only the applicability of the proposal in different architectures, but also its effectiveness, showing a good trade-off between reliability, error and overhead. Results showed that using the proposed method, a normalized mean work to failure (MWTF) up to 5.28× was obtained with approximation errors lower than those obtained using the traditional loop perforation technique.
在容错系统设计中,近似计算技术已被成功地用于减少冗余相关的开销。本文提出了一种容错方法,通过对基于近似计算软件的循环穿孔技术的改进,来减少众所周知的时间冗余技术的执行时间开销。时间冗余是一种基于软件的容错技术,它涉及在不同时间执行任务的副本。我们建议使用一种新的基于循环穿孔的近似计算技术来近似要执行的任务,即简化迭代。该方法的新颖之处在于将容错技术、时间冗余技术与新提出的近似计算技术相结合,简化了迭代。在ARM和RISC-V微处理器架构的几个测试程序上,通过基于仿真的故障注入活动验证了该建议。实验结果不仅验证了该方法在不同体系结构中的适用性,而且验证了其有效性,在可靠性、误差和开销之间取得了良好的平衡。结果表明,采用该方法可获得5.28倍的归一化平均失效功(MWTF),且近似误差低于传统环射孔技术。
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引用次数: 0
ANFIS Based Thermal Estimation of Ultradeep Submicron Digital Circuit Design 基于ANFIS的超深亚微米数字电路设计热估计
Q4 Engineering Pub Date : 2022-02-07 DOI: 10.29292/jics.v16i3.507
Ruby Beniwal, Shruti Kalra
In this paper, the use of the Adaptive Neuro Fuzzy Inference System (ANFIS) to model the CMOS inverter is discussed as a tool for developing and simulating CMOS logic circuits at the ultradeep submicron technology node of 22nm. The ANFIS structures are built and trained using MATLAB software. The ANFIS network was trained using data obtained from the analytical model (at 298.15K and 398.15K). For training, two methodologies are used: a hybrid learning method based on back-propagation and least-squares estimation, and back-propagation. The effect of the ANFIS model's structure on the accuracy and performance of the CMOS inverter has also been investigated. Further, simulation through HSPICE using (Predictive Technology Model) PTM nominal parameters has been done to compare with ANFIS (trained using an analytical model) results. The comparison of ANFIS and HSPICE suggests the ANFIS modelling procedure's practicality and correctness. The findings demonstrate that the ANFIS simulation is significantly faster and more comparable than the HSPICE simulation and that it can be easily integrated into software tools for designing and simulating complicated CMOS logic circuits.
本文讨论了使用自适应神经模糊推理系统(ANFIS)对CMOS反相器进行建模,作为在22nm超深亚微米技术节点上开发和模拟CMOS逻辑电路的工具。使用MATLAB软件建立并训练ANFIS结构。ANFIS网络使用从分析模型中获得的数据(298.15K和398.15K)进行训练。对于训练,使用了两种方法:基于反向传播和最小二乘估计的混合学习方法和反向传播。研究了ANFIS模型的结构对CMOS反相器精度和性能的影响。此外,已经使用(预测技术模型)PTM标称参数通过HSPICE进行了仿真,以与ANFIS(使用分析模型训练)结果进行比较。ANFIS和HSPICE的比较表明ANFIS建模过程的实用性和正确性。研究结果表明,ANFIS仿真比HSPICE仿真更快、更具可比性,并且可以很容易地集成到用于设计和模拟复杂CMOS逻辑电路的软件工具中。
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引用次数: 0
Guest Editors' Words 特邀编辑的话
Q4 Engineering Pub Date : 2022-02-03 DOI: 10.29292/jics.v16i3.575
Fernanda Lima Kastensmidt, S. C. Asensi
This Special Issues brings four invited papers that describe the state of the art techniques to improve fault tolerance on complex designs. Integrated circuits operating under radiation can experience undesirable faults that must be evaluated and mitigated. Mitigation can be implemented by redundancy in hardware or in software, and by selecting and protecting the most critical parts of the system.  Radiation effects test and analysis also play an important step in identifying the criticality of the system and helping designers to better apply fault mitigation techniques.
本期特刊带来了四篇受邀论文,介绍了提高复杂设计容错能力的最新技术。在辐射下运行的集成电路可能会出现不良故障,必须对其进行评估并加以缓解。缓解措施可以通过硬件或软件中的冗余以及选择和保护系统的最关键部分来实现。辐射效应测试和分析在识别系统的关键性和帮助设计者更好地应用故障缓解技术方面也发挥着重要作用。
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引用次数: 0
Reliability analysis of gamma- and X-ray TID effects, on a commercial AlGaN/GaN based FET 商用AlGaN/GaN基场效应管γ -和x -射线TID效应的可靠性分析
Q4 Engineering Pub Date : 2021-12-31 DOI: 10.29292/jics.v16i3.566
A. C. Vilas Bôas, Saulo Gabriel Alberton, Nilberto H. Medina, Vitor Ângelo Paulino, Marco Antonio Assis Melo, Roberto Baginski Santos, R. Giacomini, T. Cavalcante, Rafael Galhardo Vaz, E. Junior, L. Seixas, S. Finco, M. Guazzelli
In this work, measurements were taken to investigate the robustness of a GaN HEMT to TID by a 60CO Source. These results will be compared with a previous X-ray based work. The robustness was investigated through IxV curves and characteristic parameters of the irradiated device. The analysis included data acquired both from on- and off- state modes. The work concludes that the device is robust to TID, as it quickly recovered important parameters. Mainly, the on-state mode, which presented a better performance compared to the off-mode. An analogous behavior was seen for X-ray. Finally, the VTH values due to the TID, in this device is independent of the dose rate and the radiation source. 
在这项工作中,采取了测量来研究GaN HEMT对60CO源TID的鲁棒性。这些结果将与之前基于x射线的工作进行比较。通过IxV曲线和辐照装置的特征参数考察其稳健性。分析包括从开状态和关状态模式获得的数据。研究表明,该装置对TID具有鲁棒性,可以快速恢复重要参数。主要是导通模式,它比关断模式表现出更好的性能。x射线也有类似的行为。最后,该装置中由TID引起的VTH值与剂量率和辐射源无关。
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引用次数: 2
A Multi-Stage TIA based on Cascoded-Inverter Structures for Low-power Applications 用于低功率应用的基于级联逆变器结构的多级TIA
Q4 Engineering Pub Date : 2021-12-31 DOI: 10.29292/jics.v16i3.520
Sima Honarmand, M. Pourahmadi, M. Shayesteh, K. Abbasi
This article discusses a multi-stage transimpedance amplifier (TIA), which is based on three stages of a modified inverter structure. The traditional inverter structures’ performances are improved adding two cascoded transistors. This new structure benefits from elimination of the Miller-capacitances in comparison with the traditional inverters, which can provide higher speed and wider frequency bandwidth. Manipulating the trade-offs among bandwidth, gain and power consumption beside using Gm/ID technique, this paper introduces a low-power transimpedance amplifier for high-bit rates in optical communication receiver systems. Moreover, active types of inductors are also used to lesson the occupied area and increase the frequency bandwidth. Transferring poles of the improved circuit to higher frequencies means less required DC current for a fixed bandwidth range, which results in low-power characteristic. 
本文讨论了一种多级跨阻抗放大器(TIA),该放大器基于三级改进的逆变器结构。在传统的反相器结构中,增加了两个级联晶体管,提高了反相器的性能。与传统逆变器相比,这种新结构得益于消除了米勒电容,可以提供更高的速度和更宽的频率带宽。除了使用Gm/ID技术外,本文还处理了带宽、增益和功耗之间的权衡,介绍了一种用于光通信接收机系统中高比特率的低功率跨阻放大器。此外,有源类型的电感器还用于补偿占用面积并增加频率带宽。将改进电路的极点转移到更高的频率意味着在固定带宽范围内所需的直流电流更少,这导致了低功率特性。
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引用次数: 1
A 0.25-V Three-stage State Feedback Bulk-driven OTA for Wide Range Load Applications 用于宽负载应用的0.25-V三级状态反馈体驱动OTA
Q4 Engineering Pub Date : 2021-12-31 DOI: 10.29292/jics.v16i3.498
Sreeteja Reddy Kotha, Karuppanan P, A. K. Gautam, Manmath Suryavanshi
This article employs a nested state feedback compensation technique to a three-stage bulk-driven operational transconductance amplifier (OTA). The projected OTA circuit consists of a bulk-driven PMOS amplifier, gate-driven NMOS amplifier, and common source (CS) amplifier. The entire transistors in the amplifier core are configuredwith self-cascode transistor topology to increase its output impedance. All transistors are designed to operate in a weak inversion in order to dissipate less power. Cross-coupled transistor pair topology in the bulk-driven stage allows to improve the effective transconductance of OTA. The CS amplifier can drive a large load capacitor.  The polarities and transconductance gains of feedback blocks are controlled appropriately to obtain the desired DC gain and bandwidth. The capacitor-less compensation strategy allows the fabrication of the OTA using the minimum area. Conventional bulk-driven miler OTA, Bulk-driven stage improved indirect-feedback OTA (BSIF OTA), Gate-driven stage added bulk-driven OTA (GSIF OTA), and proposed bulk-driven OTA topologies are designed and simulated using cadence spectre tool at 25 mV supply voltage in the 65nm CMOS process. These OTA circuits are analyzed and compared in terms of parameters like DC gain, unity-gain frequency, phase margin, CMRR, power dissipated, slew rate, and input referred noise.
本文将嵌套状态反馈补偿技术应用于三级体驱动运算跨导放大器(OTA)。投影OTA电路由体驱动PMOS放大器、栅极驱动NMOS放大器和共源(CS)放大器组成。放大器核心中的整个晶体管都配置有自级联晶体管拓扑结构,以增加其输出阻抗。所有晶体管都被设计为在弱反转中工作,以便消耗更少的功率。体驱动级中的交叉耦合晶体管对拓扑结构允许提高OTA的有效跨导。CS放大器可以驱动大负载电容器。适当地控制反馈块的极性和跨导增益,以获得期望的DC增益和带宽。无电容补偿策略允许使用最小面积来制造OTA。在65nm CMOS工艺中,使用cadence spectre工具在25mV电源电压下设计并模拟了传统的体驱动miler OTA、体驱动级改进的间接反馈OTA(BSIF OTA)、添加体驱动OTA的栅极驱动级(GSIF OTA)以及所提出的体驱动OTA拓扑。从直流增益、单位增益频率、相位裕度、CMRR、功率耗散、转换速率和输入参考噪声等参数对这些OTA电路进行了分析和比较。
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引用次数: 0
Survey on Reliability Estimation in Digital Circuits 数字电路可靠性估计研究进展
Q4 Engineering Pub Date : 2021-12-31 DOI: 10.29292/jics.v16i3.568
Matheus Ferreira Pontes, Clayton R. Farias, R. Schvittz, P. Butzen, Leomar Da Rosa Jr.
The aggressive technology scaling has significantly affected the circuit reliability. The interaction of environmental radiation with the devices in the integrated circuits (ICs) may be the dominant reliability aspect of advanced ICs. Several techniques have been explored to mitigate the radiation effects and guarantee a satisfactory reliability levels. In this context, estimating circuit radiation reliability is crucial and a challenge that has not yet been overcome. For decades, several different methods have been proposed to provide circuit reliability. Recently, the radiation effects have been more faithfully incorporated in these strategies to provide the circuit susceptibility more accurately. This paper overviews the current trend for estimating the radiation reliability of digital circuits. The survey divides the approaches into two abstraction levels: (i) gate-level that incorporate the layout information and (ii) circuit-level that traditionally explore the logic circuit characteristic to provide the radiation susceptibility of combinational circuits. We also present an open-source tool that incorporates several previously explored methods. Finally, the actual research aspects are discussed, providing the newly emerging topic, such as selective hardening and critical vector identification.
激进的技术缩放已经严重影响了电路的可靠性。环境辐射与集成电路中器件的相互作用可能是先进集成电路可靠性的主要方面。已经探索了几种技术来减轻辐射影响并保证令人满意的可靠性水平。在这种情况下,估计电路辐射可靠性是至关重要的,也是一个尚未克服的挑战。几十年来,人们提出了几种不同的方法来提供电路的可靠性。近年来,辐射效应已被更忠实地纳入这些策略,以提供更准确的电路磁化率。本文综述了目前数字电路辐射可靠性估计的发展趋势。该调查将这些方法分为两个抽象层次:(i)包含布局信息的门级和(ii)传统上探索逻辑电路特性以提供组合电路的辐射敏感性的电路级。我们还提供了一个开源工具,其中包含了以前探索过的几种方法。最后,对目前的研究现状进行了讨论,提出了选择性硬化和关键载体识别等新兴研究课题。
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引用次数: 4
Effects of Thermal Annealing on the Density of States in Low Voltage Operating Range, High Mobility, Hf-In-ZnO/HfO2 TFTs Fabricated at Temperatures below 200 oC 低温退火对低电压高迁移率Hf-In-ZnO/HfO2 tft态密度的影响
Q4 Engineering Pub Date : 2021-12-31 DOI: 10.29292/jics.v16i3.561
I. Hernández, I. Garduño, A. Cerdeira, B. Iñíguez, M. Estrada
In this paper, we report the effects of thermal annealing on Poly(methyl methacrylate) (PMMA) passivated, bottom gate thin film transistors, with amorphous hafnium oxide (HfO2) as gate dielectric and amorphous hafnium-indium-zinc oxide (a-HIZO) as semiconductor, fabricated at temperatures below 200 oC. It is shown that TFTs, with VTH =0.55 V, mFE>250 cm2/Vs, SS=200 mV/dec corresponding to Dit= 1x1012 cm-2eV-1 and Ion/Ioff>107, can be obtained, using a thermal annealing at 200 oC in N2, after the semiconductor layer is deposited. The dielectric constant of the HfO2 layer deposited by RF sputtering was 19.5, allowing devices to work within the operating voltage range of 2 V. An important increase of the field effect mobility is obtained, combining a high-k gate dielectric and a high carrier concentration a-HIZO layer, with a lower density of localized states.
在本文中,我们报道了热退火对聚甲基丙烯酸甲酯(PMMA)钝化的底栅薄膜晶体管的影响,该晶体管以非晶态氧化铪(HfO2)为栅极介质,非晶态氧化铪-铟-锌(a-HIZO)为半导体,在低于200℃的温度下制备。结果表明,沉积半导体层后,在200℃的N2中进行热退火,可以得到VTH =0.55 V, mFE>250 cm2/Vs, SS=200 mV/dec,对应Dit= 1 × 1012 cm-2eV-1和Ion/Ioff>107的tft。射频溅射沉积的HfO2层介电常数为19.5,器件工作电压范围为2v。结合高k栅极介质和高载流子浓度的a- hizo层,局域态密度降低,得到了场效应迁移率的重要提高。
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引用次数: 1
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Journal of Integrated Circuits and Systems
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