A translatory MOEMS actuator with extraordinary large stroke — especially developed for fast optical path length modulation in miniaturized FTIR-spectrometers — is presented for the first time. A precise translational out-of-plane oscillation at 500 Hz with large stroke of up to 1 mm is realized by means of a new suspension design of the comparative large mirror plate with 19.6 mm² aperture using four pantographs. The MOEMS device is driven electrostatically resonant and is manufactured in a CMOS compatible SOI process. Up to ± 500 Hz amplitude has been measured in vacuum of 50 Pa and 90 V driving voltage.
{"title":"Translatory MEMS actuator with extraordinary large stroke for optical path length modulation","authors":"T. Sandner, T. Grasshoff, H. Schenk","doi":"10.1117/12.879069","DOIUrl":"https://doi.org/10.1117/12.879069","url":null,"abstract":"A translatory MOEMS actuator with extraordinary large stroke — especially developed for fast optical path length modulation in miniaturized FTIR-spectrometers — is presented for the first time. A precise translational out-of-plane oscillation at 500 Hz with large stroke of up to 1 mm is realized by means of a new suspension design of the comparative large mirror plate with 19.6 mm² aperture using four pantographs. The MOEMS device is driven electrostatically resonant and is manufactured in a CMOS compatible SOI process. Up to ± 500 Hz amplitude has been measured in vacuum of 50 Pa and 90 V driving voltage.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128562601","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672200
D. Dao, S. Amaya, S. Sugiyama
This paper presents a novel fabrication of a monolithic PMMA torsional mirror utilizing hot embossing, surface-activated direct bonding, and the elliptical vibration cutting. The robustness and capability of the method are demonstrated through the fabrication of sophisticated PMMA freestanding micro structures. An efficient technique using reinforcement material to protect the PMMA microstructures during release process was proposed. Monolithic PMMA torsional mirror actuated by vertical comb actuator has been fabricated and tested successfully. Since the Young's modulus is 50 times lower than that of Si, the driving voltage of the PMMA actuator should be 7 times lower than that of silicon counterpart.
{"title":"Polymer-MEMS torsion mirror with large rotation angle and low driving voltage","authors":"D. Dao, S. Amaya, S. Sugiyama","doi":"10.1109/OMEMS.2010.5672200","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672200","url":null,"abstract":"This paper presents a novel fabrication of a monolithic PMMA torsional mirror utilizing hot embossing, surface-activated direct bonding, and the elliptical vibration cutting. The robustness and capability of the method are demonstrated through the fabrication of sophisticated PMMA freestanding micro structures. An efficient technique using reinforcement material to protect the PMMA microstructures during release process was proposed. Monolithic PMMA torsional mirror actuated by vertical comb actuator has been fabricated and tested successfully. Since the Young's modulus is 50 times lower than that of Si, the driving voltage of the PMMA actuator should be 7 times lower than that of silicon counterpart.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124431320","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672139
Yu‐Sheng Lin, J. Yeh
A method for the reduction of defect density in GaN epilayer using nanoscale patterned sapphire substrates (NPSS) was proposed. The sapphire substrates were patterned by natural lithography and inductively coupled plasma reactive ion etching (ICP-RIE). The undoped GaN films were grown on NPSS through metal organic chemical vapor deposition. The pits density was analyzed by atomic force microscope (AFM) and threading dislocation distribution was observed by scanning electron microscopy (SEM). The optical characteristics were measured from X-ray diffractometry and photoluminescence spectroscopy. These results indicate NPSS can improve crystalline quality by effectively reducing threading dislocations.
{"title":"Improvement of GaN crystalline quality on nanoscale patterned sapphire substrates","authors":"Yu‐Sheng Lin, J. Yeh","doi":"10.1109/OMEMS.2010.5672139","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672139","url":null,"abstract":"A method for the reduction of defect density in GaN epilayer using nanoscale patterned sapphire substrates (NPSS) was proposed. The sapphire substrates were patterned by natural lithography and inductively coupled plasma reactive ion etching (ICP-RIE). The undoped GaN films were grown on NPSS through metal organic chemical vapor deposition. The pits density was analyzed by atomic force microscope (AFM) and threading dislocation distribution was observed by scanning electron microscopy (SEM). The optical characteristics were measured from X-ray diffractometry and photoluminescence spectroscopy. These results indicate NPSS can improve crystalline quality by effectively reducing threading dislocations.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130158649","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672194
H. Kubo, S. Kumagai, M. Sasaki
Photolithography on the sample with vertical side walls is studied. In the angled exposure for patterning side walls or bottoms, the exposure is basically over-dose due to the thinner thickness making the reflection serious for obtaining the defect-free pattern. In addition to the liquid immersion method, the absorbent liquid is introduced. Arbitrary pattern over the trench with aspect ratio of 0.74 is obtained with the better quality than that obtained using the water and the polarization control.
{"title":"Absorbent liquid immersion angled exposure for 3D photolithography","authors":"H. Kubo, S. Kumagai, M. Sasaki","doi":"10.1109/OMEMS.2010.5672194","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672194","url":null,"abstract":"Photolithography on the sample with vertical side walls is studied. In the angled exposure for patterning side walls or bottoms, the exposure is basically over-dose due to the thinner thickness making the reflection serious for obtaining the defect-free pattern. In addition to the liquid immersion method, the absorbent liquid is introduced. Arbitrary pattern over the trench with aspect ratio of 0.74 is obtained with the better quality than that obtained using the water and the polarization control.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"73 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130120706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672140
Jae-Young Joo, Do-Kyun Woo, S. Park, Sun-Kyu Lee
The Ultra Slim Optical Pointing Device (USOPD) is a slim optical mouse as an input device for the application of wireless portable personnel communication device like a smart phone. In this paper, we have fabricated optical components of GaN LED based USOPD. The USOPD consist of illumination optical components and imaging lens. LED beam shaping lens consisting of both aspheric lens and Fresnel facet successfully machined by Diamond Turning Machine (DTM). Additional V-shaped groove with refractive-reflective surfaces (VGRRS) for beam path banding was fabricated by bulk micromachining of silicon and the shadow effect in thermal evaporation. Fabrications of imaging lens, arrayed multilevel Fresnel lenses, were fabricated on electron beam lithography, FAB etching. The proposed optical components are extreme compactness as well as high optical efficiency, thereby applicable to the ultra slim optical system like USOPD.
{"title":"Fabrication of LED based Ultra Slim Optical Pointing Device","authors":"Jae-Young Joo, Do-Kyun Woo, S. Park, Sun-Kyu Lee","doi":"10.1109/OMEMS.2010.5672140","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672140","url":null,"abstract":"The Ultra Slim Optical Pointing Device (USOPD) is a slim optical mouse as an input device for the application of wireless portable personnel communication device like a smart phone. In this paper, we have fabricated optical components of GaN LED based USOPD. The USOPD consist of illumination optical components and imaging lens. LED beam shaping lens consisting of both aspheric lens and Fresnel facet successfully machined by Diamond Turning Machine (DTM). Additional V-shaped groove with refractive-reflective surfaces (VGRRS) for beam path banding was fabricated by bulk micromachining of silicon and the shadow effect in thermal evaporation. Fabrications of imaging lens, arrayed multilevel Fresnel lenses, were fabricated on electron beam lithography, FAB etching. The proposed optical components are extreme compactness as well as high optical efficiency, thereby applicable to the ultra slim optical system like USOPD.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134126753","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672125
Bo Li, F. Hsiao, Chengkuo Lee
Two photonic crystal rings of hexagonal lattice are lying transversely and longitudinally in silicon micro-cantilever at the junction of the microcantilever and the substrate. This unique dual nano-ring (DNR) resonator demonstrates channel drop filter characteristics. When DNR is used as sensing element of a microcantilever sensor, the wavelength shift of resonant peak measured at the backward drop terminal is a function of applied force at the microcantilever tip. The derived Q-factor is about 3000, and the minimum detectable force can be as small as 37nN for longitudinal case and 16.7nN for transverse case.
{"title":"Configuration analysis of sensing element for micro-cantilever sensor using dual nano-ring resonator","authors":"Bo Li, F. Hsiao, Chengkuo Lee","doi":"10.1109/OMEMS.2010.5672125","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672125","url":null,"abstract":"Two photonic crystal rings of hexagonal lattice are lying transversely and longitudinally in silicon micro-cantilever at the junction of the microcantilever and the substrate. This unique dual nano-ring (DNR) resonator demonstrates channel drop filter characteristics. When DNR is used as sensing element of a microcantilever sensor, the wavelength shift of resonant peak measured at the backward drop terminal is a function of applied force at the microcantilever tip. The derived Q-factor is about 3000, and the minimum detectable force can be as small as 37nN for longitudinal case and 16.7nN for transverse case.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132718823","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672119
F. Zamkotsian, M. Canonica, K. Tangen, P. Lanzoni, E. Grassi, R. Barette, C. Fabron, S. Waldis, W. Noell, N. D. de Rooij, L. Marchand, L. Duvet
Next-generation infrared astronomical instrumentation for ground-based and space telescopes requires MOEMS-based programmable slit masks for multi-object spectroscopy. We made a full space evaluation of Texas Instruments DMD chips, including tests at cold temperature and in vacuum, life tests, radiations, and vibrations and shocks. These results do not reveal any show-stopper concerning its ability to meet environmental space requirements. In parallel, a 100×200µm2 micro-mirror array was successfully designed for cryogenic temperature, fabricated and tested at 92K. Large micromirror arrays of 20'000 micromirrors have also been fabricated. These tests demonstrate the full ability of this type of components for space instrumentation.
{"title":"Micromirror arrays designed and tested for space instrumentation","authors":"F. Zamkotsian, M. Canonica, K. Tangen, P. Lanzoni, E. Grassi, R. Barette, C. Fabron, S. Waldis, W. Noell, N. D. de Rooij, L. Marchand, L. Duvet","doi":"10.1109/OMEMS.2010.5672119","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672119","url":null,"abstract":"Next-generation infrared astronomical instrumentation for ground-based and space telescopes requires MOEMS-based programmable slit masks for multi-object spectroscopy. We made a full space evaluation of Texas Instruments DMD chips, including tests at cold temperature and in vacuum, life tests, radiations, and vibrations and shocks. These results do not reveal any show-stopper concerning its ability to meet environmental space requirements. In parallel, a 100×200µm2 micro-mirror array was successfully designed for cryogenic temperature, fabricated and tested at 92K. Large micromirror arrays of 20'000 micromirrors have also been fabricated. These tests demonstrate the full ability of this type of components for space instrumentation.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133482333","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672154
K. Koh, Takeshi Kobayashi, Chengkuo Lee
A gold coated silicon mirror (5mm × 5mm) actuated by 1×10 piezoelectric Pb(Zr, Ti)O3 (PZT) array actuator integrated on a cantilever beam has been demonstrated for variable optical attenuator (VOA) application. Torsional attenuation based on the difference in the dc biasing voltage applied to the 1×10 PZT array actuator was investigated. The dynamic attenuation range of 40dB at 1.8V DC bias is observed in the attenuation curve.
{"title":"Torsional mirror driven by a cantilever beam integrated with 1×10 individually biased PZT array actuator for VOA application","authors":"K. Koh, Takeshi Kobayashi, Chengkuo Lee","doi":"10.1109/OMEMS.2010.5672154","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672154","url":null,"abstract":"A gold coated silicon mirror (5mm × 5mm) actuated by 1×10 piezoelectric Pb(Zr, Ti)O3 (PZT) array actuator integrated on a cantilever beam has been demonstrated for variable optical attenuator (VOA) application. Torsional attenuation based on the difference in the dc biasing voltage applied to the 1×10 PZT array actuator was investigated. The dynamic attenuation range of 40dB at 1.8V DC bias is observed in the attenuation curve.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114268994","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672143
C. Liao, Yao-Tsu Yang, Sheng-Wen Huang, Ming-Chang M. Lee, Pi-Yao Lin, Chao-Min Chou, J. Shieh
We presented the design and fabrication of fiber-mode-matched three-dimension (3D) tapered couplers for efficient coupling light from fibers to photonic integrated circuits (PICs). The 3D adiabatic taper was made by SU8 and the structure was designed by beam propagation method (BPM). Measuring waveguide transmission with this 3D taper, we observed that the coupling efficiency was improved by 12 dB. The misalignment tolerance can be around 5 μm.
{"title":"Design and fabrication of large fiber-mode-matched three-dimensional adiabatic tapered couplers for integrated optics","authors":"C. Liao, Yao-Tsu Yang, Sheng-Wen Huang, Ming-Chang M. Lee, Pi-Yao Lin, Chao-Min Chou, J. Shieh","doi":"10.1109/OMEMS.2010.5672143","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672143","url":null,"abstract":"We presented the design and fabrication of fiber-mode-matched three-dimension (3D) tapered couplers for efficient coupling light from fibers to photonic integrated circuits (PICs). The 3D adiabatic taper was made by SU8 and the structure was designed by beam propagation method (BPM). Measuring waveguide transmission with this 3D taper, we observed that the coupling efficiency was improved by 12 dB. The misalignment tolerance can be around 5 μm.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124934832","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2010-12-17DOI: 10.1109/OMEMS.2010.5672178
W. Shi, R. Vafaei, M. Torres, N. Jaeger, L. Chrostowski
We demonstrate the design and performance of a silicon-on-insulator ring-resonator reflector with a low-loss, low-crosstalk waveguide crossing. The device is simulated using the transfer-matrix method and a 2D finite-difference mode solver. It functions as a reflective-type notch filter and can be used for optical communications or thermal, biochemical, or other sensors. An extinction ratio of over 25 dB is observed experimentally.
{"title":"Ring-resonator reflector with a waveguide crossing","authors":"W. Shi, R. Vafaei, M. Torres, N. Jaeger, L. Chrostowski","doi":"10.1109/OMEMS.2010.5672178","DOIUrl":"https://doi.org/10.1109/OMEMS.2010.5672178","url":null,"abstract":"We demonstrate the design and performance of a silicon-on-insulator ring-resonator reflector with a low-loss, low-crosstalk waveguide crossing. The device is simulated using the transfer-matrix method and a 2D finite-difference mode solver. It functions as a reflective-type notch filter and can be used for optical communications or thermal, biochemical, or other sensors. An extinction ratio of over 25 dB is observed experimentally.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117055478","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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