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2006 15th ieee international symposium on the applications of ferroelectrics最新文献

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High frequency SAW Devices on 36°YX LiTaO3 substrates realized using electron beam lithography 利用电子束光刻技术在36°YX LiTaO3衬底上实现高频SAW器件
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387883
P. Kirsch, M. B. Assouar, O. Elmazria, C. Tiușan, P. Alnot
We report in this paper, the fabrication process of surface acoustic wave (SAW) devices by direct writing using electron beam lithography on very high resistivity materials, and the frequency characterization of the high frequency devices realized using this technologic process. Various experimental parameters relative to lithography system, resist deposition and lift-off process were studied and optimized. We have realized SAW devices on 36degYX LiTa03 substrates by structuring the interdigital transducers (IDTs), using a MMA/PMMA bilayer resist combined with lift-off process. The problem consisting in proximity effects was resolved by electron dose adjusting and non-uniformity exposure of the structure. The IDTs made in aluminum with resolutions down to 400 nm were successfully patterned on LiTaO3 with an adapted technological process. The analysis of the IDTs' periodicity and of the homogeneity of their thickness was carried out using atomic force microscopy and field emission scanning electron microscopy. A very regular thickness and regular lateral resolution was obtained. The frequency characterization performed by network analyzer shows that the realized SAW device operates at 5.1 GHz when the 3rd harmonic of the filter is considered. The different propagation modes, GSAW, PSAW and HVPSAW, relative to the 36degYX LiTaO3, were identified.
本文报道了利用电子束光刻技术在甚高电阻率材料上直接刻写表面声波(SAW)器件的制备工艺,并利用该工艺实现了高频器件的频率表征。研究并优化了光刻系统、抗蚀剂沉积和剥离工艺的各项实验参数。我们已经在36degYX LiTa03衬底上实现了SAW器件,通过使用MMA/PMMA双层电阻结合提升工艺构建了数字间换能器(idt)。通过调整电子剂量和结构的非均匀暴露来解决邻近效应的问题。采用相应的工艺流程,成功地在LiTaO3上实现了分辨率低至400nm的铝基idt的图像化。利用原子力显微镜和场发射扫描电镜对其周期性和厚度均匀性进行了分析。得到了非常规则的厚度和规则的横向分辨率。网络分析仪的频率特性分析表明,考虑滤波器的三次谐波时,所实现的声表面波器件工作在5.1 GHz。确定了相对于36degYX LiTaO3的不同传播模式GSAW、PSAW和HVPSAW。
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引用次数: 0
Dielectric and Ferroelectric Properties of Pb0.8Ba0.2[(In1/2Nb1/2)1-xTix]O3 Ceramics Pb0.8Ba0.2[(In1/2Nb1/2)1-xTix]O3陶瓷的介电和铁电性能
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387835
S. Wongsaenmai, X. Tan, S. Ananta, R. Yimnirun
Ferroelectric ceramics with formula Pb0.8Ba0.2[(In1/2Nb1/2)1- x Ti x ]O3 (PBINT) (x=0.0, 0.05, 0.1, 0.2, 0.3, 0.4 and 0.5) were prepared via the wolframite method. The perovskite phase formation and grain morphology microstructure were examined by X-ray diffraction and scanning electron microscopy. It was found that ceramics with compositions in the range of x=0.0~0.3 showed a pseudo-cubic structure, whereas the ceramic with x=0.5 displayed a tetragonal structure. Significant frequency dispersion in the dielectric properties was observed in all compositions. However, distinct polarization vs. field hysteresis loops were found in the composition series. With increasing Ti content, remanent polarization Pr as well as coercive field Ec increase considerably. The structure analysis and properties measurement indicate that x=0.4 is the morphotropic phase boundary (MPB) composition in this system.
采用黑钨矿法制备了配方为Pb0.8Ba0.2[(In1/2Nb1/2)1- x Ti x]O3 (PBINT) (x=0.0, 0.05, 0.1, 0.2, 0.3, 0.4和0.5)的铁电陶瓷。采用x射线衍射和扫描电镜对钙钛矿相形成和晶粒形貌进行了观察。结果表明,x=0.0~0.3范围内的陶瓷呈拟立方结构,而x=0.5范围内的陶瓷呈四边形结构。在所有成分中均观察到介电性能的显著频率色散。然而,在组成序列中发现了明显的极化-场磁滞回线。随着Ti含量的增加,残余极化Pr和矫顽力场Ec显著增大。结构分析和性能测试表明,x=0.4是该体系的致形相界(MPB)成分。
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引用次数: 0
Importance of a High Shear Coefficient to the Piezoelectric Properties of Domain-Engineered Crystals and Ceramics 高剪切系数对区域工程晶体和陶瓷压电性能的重要性
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387887
M. Davis, M. Budimir, D. Damjanovic, N. Setter
The importance of a high shear coefficient d15 to the piezoelectric properties of domain-engineered perovskite crystals is discussed. The terms "rotator" and "extender" are introduced to differentiate the contrasting behaviors of 4mm BaTiO3 and PbTiO3. In "rotator" ferroelectrics, where d15 is high, polarization rotation is the dominant mechanism of piezoelectric response; in "extender" ferroelectrics d15 is low and the collinear effect dominates. Large shear coefficients can be expected close to ferroelectric-ferroelectric phase transitions; this includes morphotropic phase boundaries. The differing piezoelectric properties of rotator and extender domain-engineered single crystals are discussed.
讨论了高剪切系数d15对畴工程钙钛矿晶体压电性能的重要性。引入了“旋转器”和“扩展器”这两个术语来区分4mm BaTiO3和PbTiO3的不同行为。在d15较高的“旋转体”铁电体中,极化旋转是压电响应的主要机制;在“扩展”铁电体中,d15较低,共线效应占主导地位。较大的剪切系数接近铁电-铁电相变;这包括向形态相界。讨论了旋转和扩展畴工程单晶的不同压电性能。
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引用次数: 0
The Effect of Interfacial Polarization on the Energy Density of Ferroelectric Glass-Ceramics 界面极化对铁电玻璃陶瓷能量密度的影响
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387824
M. Pan, E. Gorzkowski, B. Bender, C. Wu
In the last two years, the US Naval Research Laboratory has been able to synthesize barium strontium titanate (BST)-based glass-ceramics with dielectric breakdown strength as high as 800 kV/cm and dielectric constant up to 1200. Unfortunately, the energy density of the candidate glass-ceramics was only ~1 joule/cc when measured using a discharge measurement circuit. Polarization-electric field measurements revealed wide open hysteresis loops, indicating that most of the electrical energy was not released during discharge. Subsequent experiments showed that the buildup of interfacial polarization was the likely cause in this composite dielectric system. Using the Maxwell-Wagner capacitor model, we were able to quantify the dielectric response of composites based on the permittivities and conductivities of the constituent phases. The response was used to plot polarization-electric field hysteresis for energy density predictions. The results indicated that the aluminosilicate glass phase is the major contributor to the interfacial polarization in this glass-ceramic system.
在过去的两年中,美国海军研究实验室已经能够合成基于钛酸钡锶(BST)的玻璃陶瓷,其介电击穿强度高达800 kV/cm,介电常数高达1200。遗憾的是,当使用放电测量电路测量时,候选玻璃陶瓷的能量密度仅为~1焦耳/cc。极化电场测量显示大开的迟滞回路,表明大部分电能在放电过程中没有释放。随后的实验表明,在这种复合介质体系中,界面极化的形成是可能的原因。利用麦克斯韦-瓦格纳电容模型,我们能够根据组成相的介电常数和电导率来量化复合材料的介电响应。该响应被用于绘制极化电场迟滞以预测能量密度。结果表明,铝硅酸盐玻璃相是该玻璃陶瓷体系中界面极化的主要因素。
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引用次数: 18
Application of Dielectric, Ferroelectric and Piezoelectric Thin Film Devices in Mobile Communication and Medical Systems 介电、铁电和压电薄膜器件在移动通信和医疗系统中的应用
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387821
M. Klee, D. Beelen, W. Keur, R. Kiewitt, B. Kumar, R. Mauczok, K. Reimann, C. Renders, A. Roest, F. Roozeboom, P. Steeneken, M. Tiggelman, F. Vanhelmont, O. Wunnicke, P. Lok, K. Neumann, J. Fraser, G. Schmitz
Dielectric, ferroelectric and piezoelectric thin films are getting more and more attention for next generation mobile communication and medical systems. Thin film technologies based on dielectric, ferroelectric and piezoelectric thin films enable system-in-package (SiP) devices, resulting in optimal integration of various functions in one module with respect to high performance, small size and low cost. Within Philips a passive integration platform for SiP technologies is developed, comprising key functions such as RF filters, micro-electromechanical switches, high-value capacitors as well as passive and active functions integrated in small modules. The piezoelectric thin film technologies do not only play a role for RF filters, but are also a breakthrough technology for a new class of thin film ultrasonic transducers.
介电薄膜、铁电薄膜和压电薄膜在下一代移动通信和医疗系统中越来越受到关注。基于介电、铁电和压电薄膜的薄膜技术使系统级封装(SiP)器件成为可能,从而在一个模块中实现高性能、小尺寸和低成本的各种功能的最佳集成。飞利浦为SiP技术开发了一个无源集成平台,包括射频滤波器、微机电开关、高值电容器以及集成在小模块中的无源和有源功能等关键功能。压电薄膜技术不仅在射频滤波器中发挥作用,而且是一类新型薄膜超声换能器的突破性技术。
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引用次数: 5
Uniaxial Stress Dependence and Scaling Behavior of Dynamic Hysteresis Responses in Soft PZT Ceramics 软PZT陶瓷动态迟滞响应的单轴应力依赖性和标度行为
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387827
R. Yimnirun, S. Wongsaenmai, Y. Laosiritaworn, S. Ananta
The ferroelectric properties under uniaxial compressive pre-stress and scaling behavior of commercial soft PZT ceramics are investigated. The ferroelectric properties under the uniaxial compressive pre-stress of the ceramics are observed at stress up to 24 MPa using a compressometer in conjunction with a modified Sawyer-Tower circuit. The results show that the ferroelectric characteristics, i.e. the area of the ferroelectric hysteresis (P-E) loops, the saturation polarization (Psat), the remanent polarization (Pr), and the loop squareness (Rsq) decrease with increasing compressive pre-stress, while the coercive field (Ec) is virtually unaffected by the applied stress. The stress-induced domain wall motion suppression and non-180deg ferroelectic domain switching processes are responsible for the changes observed. In addition, a significant decrease in those parameters after a full cycle of stress application has been observed and attributed to the stress induced decrease in switchable part of spontaneous polarization at high stress. Finally, the dynamic behavior of the ferroelectric properties is also examined to establish the scaling behavior of the soft PZT ceramics. It has been found that the scaling behavior found for the bulk ceramic differs slightly from the theoretical prediction and that obtained from the experimental investigation on thin-film.
研究了软质PZT陶瓷在单轴预压应力作用下的铁电性能和结垢行为。在应力高达24 MPa时,利用压缩计和改进的索耶塔电路观察了陶瓷在单轴预压应力下的铁电性能。结果表明:随着预压应力的增大,铁电特性,即铁电迟滞环面积、饱和极化(Psat)、剩余极化(Pr)和环方度(Rsq)减小,而矫顽场(Ec)几乎不受外加应力的影响。应力诱导的畴壁运动抑制和非180度铁电畴切换过程是观察到的变化的原因。此外,在一个完整的应力应用周期后,这些参数显着降低,并归因于应力引起的高应力下自发极化可切换部分的减少。最后,研究了软PZT陶瓷的铁电特性的动态行为,以确定其结垢行为。研究发现,块状陶瓷的结垢行为与理论预测和薄膜实验研究结果略有不同。
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引用次数: 8
A Thin-Film BST Varactor Model for Linear and Nonlinear Circuit Simulations for Mobile Communication Systems 用于移动通信系统线性和非线性电路仿真的薄膜BST变容器模型
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387909
M. Schmidt, E. Lourandakis, R. Weigel, A. Leidl, S. Seitz
A simple model of thin film BST varactors for the use in commercial circuit simulators is presented. The model implies the varactor's nonlinear capacitance as well as the frequency and voltage dependency of the losses. For the use of BST based components in mobile communication systems low tuning voltages are required. This leads unfortunately to high nonlinear distortion which is not acceptable. Another severe problem are the moderate to low quality factors and therefore high losses of the ferroelectric capacitors. The presented model allows estimating the losses and the distortion over a wide frequency range at every bias state with harmonic balance and envelope simulations. Further more it is now possible to predict the behavior of a designed circuit but also to deduce the requirements for BST varactors in order to achieve the demanded design goals. The model consists of a parallel circuit of equation based elements which represents the nonlinear capacitance and conductance. A constant series inductance and a constant resistance model the contacts. The required parameters can easily be extracted through measurements. To demonstrate the validity of the presented model a BST based SP2T switch at 1800 MHz was designed. An insertion loss of 1.4 dB at an isolation of 21 dB and a TOI of 35 dBm were achieved. The simulation and measurement results agree very good over a wide frequency range.
提出了一种用于商用电路模拟器的薄膜BST变容器的简单模型。该模型反映了变容器的非线性电容以及损耗与频率和电压的关系。为了在移动通信系统中使用基于BST的组件,需要低调谐电压。不幸的是,这导致了高度的非线性失真,这是不可接受的。另一个严重的问题是铁电电容器的中低质量因素,因此高损耗。所提出的模型可以通过谐波平衡和包络模拟来估计每个偏置状态下宽频率范围内的损耗和失真。此外,现在可以预测设计电路的行为,还可以推断出BST变容器的要求,以实现所需的设计目标。该模型由表示非线性电容和电导的方程单元组成的并联电路组成。一个恒定的串联电感和一个恒定的电阻模型连接着触点。通过测量可以很容易地提取所需的参数。为了验证该模型的有效性,设计了一个基于BST的1800 MHz SP2T交换机。在隔离度为21 dB时,插入损耗为1.4 dB, TOI为35 dBm。在较宽的频率范围内,仿真结果与实测结果吻合良好。
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引用次数: 21
The Domain Structure and Pyroelectric Properties of (111) Preferred Oriented PLT Thin Films Prepared By RF Magnetron Sputtering 射频磁控溅射制备(111)优选取向PLT薄膜的畴结构和热释电性能
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387891
Hong Liu, Xiaogang Gong, Jin-e Liang, Zhihong Wang, Hui-Ching Huang, Yanrong Li, D. Xiao, Jianguo Zhu
The Pb0.9La0.1Ti0.975O3 (PLT10) thin films were grown on Pt/Ti/SiO2/Si(100) substrates by using RF magnetron sputtering. The crystalline and domain properties of PLT 10 thin films were studied by using X-ray diffraction (XRD) and piezoresponse force microscopy (PFM). It was found that the head-to-tail polarization configurations exist constantly in PLT thin films, indicating that the low electrical energy configurations are quite common in PLT thin films. Nanoscale banded 90deg a-a domain patterns as small as 30 to 60 nm in width were clearly visualized in the PLT thin films. The banded domain alternated in adjacent lamellae which are a result of mechanical strains at the surface and the interface between the substrate and the PLT thin films is more stable. The PLT films have relatively large pyroelectric coefficient gamma=2.20times10-8 Cldr(cm2ldrK)-1 and relatively high figures of merit. Hence PLT10 thin films could be applied widely in IR detectors or uncooled focus plane arrays.
采用射频磁控溅射技术在Pt/Ti/SiO2/Si(100)衬底上制备了Pb0.9La0.1Ti0.975O3 (PLT10)薄膜。采用x射线衍射仪(XRD)和压电响应力显微镜(PFM)研究了plt10薄膜的晶体和畴性质。研究发现,PLT薄膜中持续存在着头尾极化构型,表明低电能构型在PLT薄膜中相当普遍。在PLT薄膜上可以清晰地看到宽度为30 ~ 60 nm的纳米级带状90度a畴图案。带状畴在相邻片层中交替存在,这是表面机械应变的结果,衬底与PLT薄膜之间的界面更加稳定。PLT薄膜具有较大的热释电系数gamma=2.20times10-8 Cldr(cm2ldrK)-1和较高的品质值。因此,PLT10薄膜可广泛应用于红外探测器或非冷却聚焦平面阵列。
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引用次数: 1
Effect of Misfit Strain Relaxation on Nonlinear Dielectric Properties of Epitaxial (Ba0.60 Sr0.40) Thin Films on NdGaO3 失配应变弛豫对NdGaO3外延(Ba0.60 Sr0.40)薄膜非线性介电性能的影响
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387836
W. Simon, E. K. Akdoğan, A. Safari
Strain relaxation in (Ba0.60 Sr0.40)TiO3 epitaxial films on <110>-oriented NdGaO3 substrates is investigated in the thickness range, h= 25-1200 nm. The BST films prepared by PLD show that residual strains mostly relax by h~200 nm, and for h>600 nm films are essentially strain free. Two independent dislocation mechanisms operate to relax anisotropic strains along the principal directions. The critical thickness for misfit dislocation formation along [001] and [010] were found to be 11 and 15 nm, respectively. Deviation from linear elasticity for h<200 was observed, and increased as thickness decreased. Films with h<25 nm are monoclinic due to a finite principal shear stress along [110] of the BST cell. The effects of misfit strain relaxation on the nonlinear dielectric response and tunability will be discussed as well. The in plane dielectric response demonstrates a directional dependence that increases with the magnitude of the residual strain.
研究了(Ba0.60 Sr0.40)TiO3外延薄膜在定向nd高岭土衬底上的应变弛豫,厚度范围为25 ~ 1200 nm。PLD制备的BST薄膜的残余应变主要在h~200 nm范围内松弛,而在h>600 nm范围内基本没有应变。两个独立的位错机制使各向异性应变沿主方向松弛。沿[001]和[010]形成错配位错的临界厚度分别为11 nm和15 nm。当h<200时,与线弹性的偏差随着厚度的减小而增大。由于沿BST细胞[110]的主剪应力有限,h<25 nm的薄膜是单斜的。本文还讨论了非拟合应变松弛对非线性介质响应和可调性的影响。平面内介电响应表现出随残余应变的大小而增加的方向依赖性。
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引用次数: 0
Comparison of Ferroelectric and Piezoelectric Properties of Sol-gel Grown and Sputter Deposited Pb(Zr, Ti)O3 Thin Films 溶胶-凝胶生长和溅射沉积Pb(Zr, Ti)O3薄膜的铁电和压电性能比较
Pub Date : 2006-07-01 DOI: 10.1109/ISAF.2006.4387895
R. Mamazza, N. Mark, R. Polcawich, B. Piekarski, P. Muralt, G. Reynolds
A new process for the sputter deposition of Pb(Zr,Ti)O3 (PZT) thin films from a composite target has been demonstrated. PZT thin films deposited by this sputter technique are compared to those deposited by a standard sol-gel method to determine the suitability of the sputter deposition process, with its inherent advantages, for device manufacturing. Half micron PZT films were deposited by both methods onto identical substrates (Si[(100) 4 inch Cz wafer]/SiO2/Ti/TiO2/Pt/TiO2) followed by sputter-deposited Pt top electrodes. PZT thickness non-uniformities of 0.759% and 0.545% (1sigma/x macr) were obtained for the sol-gel and sputtered films, respectively. While the sputtering target and sol-gel solutions were Zr-rich (Zr/Ti=1.08), RBS results revealed the films to be Ti-rich: for sol-gel, Zr/Ti=0.874, and for sputtered, Zr/Ti=0.926. X-ray diffraction indicated preferred orientations nearly exclusive to the [111] direction for the sputtered films. For the sol-gel PZT, the larger [110] and [100] peaks indicated a more randomly textured film. SEM cross-sections showed both types of PZT to be void-free and homogeneous. The remnant polarization (Pr) and coercive field (Ec) values of the sol-gel films were slightly higher than for their sputtered analogue: for sol-gel, Pr = 27.9 muCldrcm-2 and Ec = 70.7 kVldrcm-1, and for sputtered, Pr = 26.5 muCldrcm-2 and Ec = 63.3 kVldrcm-1. The sputtered films exhibited a higher dielectric constant, epsiv33 sputtered = 858 compared to epsiv33 sol-gel = 776. Piezoelectric coefficients, d33, for the sputtered films were found to be 86 pCldrN-1, in the range of those measured for typical sol-gel films (between 70 and 100 pCldrN-1). The advantages and disadvantages of both techniques will be discussed in greater detail.
提出了一种在复合靶上溅射沉积Pb(Zr,Ti)O3 (PZT)薄膜的新工艺。通过将这种溅射技术沉积的PZT薄膜与标准溶胶-凝胶法沉积的PZT薄膜进行比较,以确定溅射沉积工艺的适用性,以及其固有的优势,用于器件制造。用这两种方法在相同的衬底(Si[(100) 4英寸Cz晶片]/SiO2/Ti/TiO2/Pt/TiO2)上沉积半微米PZT薄膜,然后溅射沉积Pt顶部电极。溶胶-凝胶膜和溅射膜的PZT厚度不均匀性分别为0.759%和0.545% (1sigma/x macr)。溅射靶膜和溶胶-凝胶膜均为富钛膜(Zr/Ti=1.08),而溅射膜则为富钛膜:溶胶-凝胶膜的Zr/Ti=0.874,溅射膜的Zr/Ti=0.926。x射线衍射表明溅射膜的优选取向几乎与[111]方向完全不同。对于溶胶-凝胶PZT,较大的[110]和[100]峰表明薄膜的织构更加随机。SEM截面显示两种类型的PZT均为无空洞且均匀的。溶胶-凝胶膜的残余极化(Pr)和矫压场(Ec)值略高于其溅射类似物:溶胶-凝胶膜的Pr = 27.9 muCldrcm-2, Ec = 70.7 kVldrcm-1,溅射膜的Pr = 26.5 muCldrcm-2, Ec = 63.3 kVldrcm-1。溅射膜具有较高的介电常数,epsiv33溅射= 858,而epsiv33溶胶-凝胶= 776。溅射薄膜的压电系数d33为86 pCldrN-1,在典型溶胶-凝胶薄膜的测量范围内(在70到100 pCldrN-1之间)。我们将更详细地讨论这两种技术的优缺点。
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引用次数: 7
期刊
2006 15th ieee international symposium on the applications of ferroelectrics
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