首页 > 最新文献

Chemical Vapor Deposition最新文献

英文 中文
Uniform Coating of Microparticles using CVD Polymerization† 用CVD聚合法制备微粒均匀涂层
Pub Date : 2015-11-23 DOI: 10.1002/cvde.201507197
Yu Liang, Jacob H. Jordahl, Hao Ding, Xiaopei Deng, Joerg Lahann

A modified fluidized bed reactor is developed to homogenously coat micrometer-sized particles with reactive polymer films using CVD. This technique is found to be rapid (∼30 min per batch) and scalable (up to 1 g particles), and can create homogenous coatings on microparticles down to 10 μm in diameter. By tuning critical variables, such as working pressure and the carrier gas flow rate, full coverage of a reactive polymer film can be realized. Janus particles are synthesized and can be visualized via fluorescence microscopy.

研制了一种改进的流化床反应器,利用化学气相沉积技术将反应性聚合物膜均匀地涂在微米级颗粒上。该技术被发现快速(每批约30分钟)和可扩展(高达1g颗粒),并且可以在直径小至10 μm的微粒上创建均匀涂层。通过调整关键变量,如工作压力和载气流量,可以实现反应性聚合物膜的全覆盖。Janus粒子被合成并可以通过荧光显微镜观察。
{"title":"Uniform Coating of Microparticles using CVD Polymerization†","authors":"Yu Liang,&nbsp;Jacob H. Jordahl,&nbsp;Hao Ding,&nbsp;Xiaopei Deng,&nbsp;Joerg Lahann","doi":"10.1002/cvde.201507197","DOIUrl":"10.1002/cvde.201507197","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>A modified fluidized bed reactor is developed to homogenously coat micrometer-sized particles with reactive polymer films using CVD. This technique is found to be rapid (∼30 min per batch) and scalable (up to 1 g particles), and can create homogenous coatings on microparticles down to 10 μm in diameter. By tuning critical variables, such as working pressure and the carrier gas flow rate, full coverage of a reactive polymer film can be realized. Janus particles are synthesized and can be visualized via fluorescence microscopy.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507197","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD† 液滴汽化在液体脉冲CVD设计和运行中的数值模拟
Pub Date : 2015-11-19 DOI: 10.1002/cvde.201507191
Raphaël Boichot, Susan Krumdieck

This article presents an approach for modeling the vaporization of droplets of solvent and precursor mixture under vacuum in the pulsed-pressure (pp) CVD process. The pulsed, direct liquid injection apparatus with ultrasonic atomizer is demonstrated as a controllable and reliable alternative to the bubbler and carrier gas system. The numerical modeling solves mass, heat, and momentum continuity equations on liquid droplets, and is intended to evaluate the relative roles of the physical chemistry properties and reactor parameters in the fast vaporization of droplets. The sensitivity analysis proposed here shows that the vaporization time into the pulsed-liquid CVD system is mainly dependent on the heating available in the flash evaporation zone, then on the thermodynamic properties of the liquid solution.

本文提出了一种模拟脉冲压力(pp) CVD工艺中溶剂和前驱体混合物液滴在真空条件下汽化的方法。采用超声雾化器的脉冲式直接注液装置是起泡器和载气系统的一种可控、可靠的替代方案。数值模拟解决了液滴的质量、热量和动量连续性方程,旨在评估物理化学性质和反应器参数在液滴快速汽化中的相对作用。本文提出的灵敏度分析表明,进入脉冲-液体CVD系统的蒸发时间主要取决于闪蒸区可用的加热,其次取决于液体溶液的热力学性质。
{"title":"Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD†","authors":"Raphaël Boichot,&nbsp;Susan Krumdieck","doi":"10.1002/cvde.201507191","DOIUrl":"10.1002/cvde.201507191","url":null,"abstract":"<div>\u0000 \u0000 \u0000 <section>\u0000 \u0000 <p>This article presents an approach for modeling the vaporization of droplets of solvent and precursor mixture under vacuum in the pulsed-pressure (pp) CVD process. The pulsed, direct liquid injection apparatus with ultrasonic atomizer is demonstrated as a controllable and reliable alternative to the bubbler and carrier gas system. The numerical modeling solves mass, heat, and momentum continuity equations on liquid droplets, and is intended to evaluate the relative roles of the physical chemistry properties and reactor parameters in the fast vaporization of droplets. The sensitivity analysis proposed here shows that the vaporization time into the pulsed-liquid CVD system is mainly dependent on the heating available in the flash evaporation zone, then on the thermodynamic properties of the liquid solution.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507191","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323621","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates† 用三氨基酸钇制备Y2O3薄膜的金属有机气相沉积
Pub Date : 2015-11-19 DOI: 10.1002/cvde.201507189
Sarah Karle, Van-Son Dang, Marina Prenzel, Detlef Rogalla, Hans-Werner Becker, Anjana Devi

Thin films of Y2O3 are deposited on Si(100) and Al2O3 (0001) substrates via metal-organic (MO)CVD for the first time using two closely related yttrium tris-amidinate compounds as precursors in the presence of oxygen in the temperature range 400–700 °C. The structural, morphological, and compositional features of the films are investigated in detail. At deposition temperatures of 500 °C and higher both the precursors yield polycrystalline Y2O3 thin films in the cubic phase. The compositional analysis revealed the formation of nearly stoichiometric Y2O3. The optical band gaps are estimated using UV-Vis spectroscopy. Preliminary electrical measurements are performed in the form of a metal oxide semiconductor (MOS) structure of Al/Y2O3/p-Si/Ag. Leakage currents and dielectric constants are also determined.

在400-700℃的温度范围内,以两种密切相关的三氨基酸钇化合物为前驱体,首次通过金属-有机(MO)CVD在Si(100)和Al2O3(0001)衬底上沉积了Y2O3薄膜。详细研究了薄膜的结构、形态和成分特征。在500℃以上的沉积温度下,这两种前驱体均生成立方相的多晶Y2O3薄膜。成分分析表明形成了接近化学计量的Y2O3。利用紫外可见光谱法估计了光学带隙。初步的电测量以Al/Y2O3/p-Si/Ag的金属氧化物半导体(MOS)结构的形式进行。泄漏电流和介电常数也被确定。
{"title":"Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates†","authors":"Sarah Karle,&nbsp;Van-Son Dang,&nbsp;Marina Prenzel,&nbsp;Detlef Rogalla,&nbsp;Hans-Werner Becker,&nbsp;Anjana Devi","doi":"10.1002/cvde.201507189","DOIUrl":"10.1002/cvde.201507189","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Thin films of Y<sub>2</sub>O<sub>3</sub> are deposited on Si(100) and Al<sub>2</sub>O<sub>3</sub> (0001) substrates via metal-organic (MO)CVD for the first time using two closely related yttrium <i>tris</i>-amidinate compounds as precursors in the presence of oxygen in the temperature range 400–700 °C. The structural, morphological, and compositional features of the films are investigated in detail. At deposition temperatures of 500 °C and higher both the precursors yield polycrystalline Y<sub>2</sub>O<sub>3</sub> thin films in the cubic phase. The compositional analysis revealed the formation of nearly stoichiometric Y<sub>2</sub>O<sub>3</sub>. The optical band gaps are estimated using UV-Vis spectroscopy. Preliminary electrical measurements are performed in the form of a metal oxide semiconductor (MOS) structure of Al/Y<sub>2</sub>O<sub>3</sub>/p-Si/Ag. Leakage currents and dielectric constants are also determined.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507189","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323568","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Possible High Efficiency Platform for Biosensors Based on Optimum Physical Chemistry of Carbon Nanotubes† 基于碳纳米管最佳物理化学的高效生物传感器平台
Pub Date : 2015-11-17 DOI: 10.1002/cvde.201507184
Amin Termeh Yousefi, Hirofumi Tanaka, Samira Bagheri, Nahrizul Adib Kadri, Shoichiro Ikeda, Mohamad Rusop Mahmood, Mikio Miyake

Carbon nanotube (CNT)-based electrochemical biosensors are used to determine the concentration of analytes by measuring mass, heat, or oxygen. CNTs, as an immobilizing platform of biomaterials, play an important role in enhancing the electron transfer mechanism of a biosensor. The large surface area and optimum aspect ratio (length to thickness) of CNTs maximize the amount of immobilized biomaterials on the surface. In this study, various aspect ratios of CNTs are reported, based on the alteration of growth mechanisms using CVD. The growth-dependent and -independent parameters of the CNT arrays are studied as functions of the synthesis method.

基于碳纳米管(CNT)的电化学生物传感器用于通过测量质量,热量或氧气来确定分析物的浓度。碳纳米管作为生物材料的固定化平台,在增强生物传感器的电子传递机制方面发挥着重要作用。CNTs的大表面积和最佳宽高比(长度与厚度)使表面固定化生物材料的数量最大化。在本研究中,基于CVD生长机制的改变,报道了不同的碳纳米管长宽比。研究了碳纳米管阵列的生长相关参数和非生长相关参数对合成方法的影响。
{"title":"Possible High Efficiency Platform for Biosensors Based on Optimum Physical Chemistry of Carbon Nanotubes†","authors":"Amin Termeh Yousefi,&nbsp;Hirofumi Tanaka,&nbsp;Samira Bagheri,&nbsp;Nahrizul Adib Kadri,&nbsp;Shoichiro Ikeda,&nbsp;Mohamad Rusop Mahmood,&nbsp;Mikio Miyake","doi":"10.1002/cvde.201507184","DOIUrl":"10.1002/cvde.201507184","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Carbon nanotube (CNT)-based electrochemical biosensors are used to determine the concentration of analytes by measuring mass, heat, or oxygen. CNTs, as an immobilizing platform of biomaterials, play an important role in enhancing the electron transfer mechanism of a biosensor. The large surface area and optimum aspect ratio (length to thickness) of CNTs maximize the amount of immobilized biomaterials on the surface. In this study, various aspect ratios of CNTs are reported, based on the alteration of growth mechanisms using CVD. The growth-dependent and -independent parameters of the CNT arrays are studied as functions of the synthesis method.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507184","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323322","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
OMCVD Gold Nanoparticles Covalently Attached to Polystyrene for Biosensing Applications† 共价附着于聚苯乙烯的OMCVD金纳米颗粒生物传感应用
Pub Date : 2015-11-17 DOI: 10.1002/cvde.201507177
Sivayini Kandeepan, Joseph A. Paquette, Joe B. Gilroy, Silvia Mittler

Remarkable developments and successes are witnessed in the fabrication and implementation of optical sensors based on localized surface plasmon resonance (LSPR) for the investigation of chemical and biological material quantities. We report on the reproducible fabrication of chemically stable surface immobilized AuNPs grown via organometallic chemical vapor deposition (OMCVD) on a polymer substrate, namely polystyrene (PS). Oxygen plasma-treated and UV ozone-treated PS samples depict enhanced amounts of polar -OH groups allowing for nucleation and growth of AuNPs. The optimum plasma treatment conditions, the largest shifts in the LSPR curves, and the bulk sensitivity of the OMCVD-grown AuNPs are discussed.

基于局部表面等离子体共振(LSPR)的光学传感器的制造和实现取得了显著的进展和成功,用于化学和生物材料数量的研究。我们报道了利用有机金属化学气相沉积(OMCVD)在聚苯乙烯(PS)聚合物衬底上生长的化学稳定的表面固定化AuNPs的可重复性制造。氧等离子体处理和紫外臭氧处理的PS样品显示极性-OH基团的增加,允许AuNPs成核和生长。讨论了最佳等离子体处理条件、LSPR曲线的最大位移以及omcvd培养AuNPs的总体灵敏度。
{"title":"OMCVD Gold Nanoparticles Covalently Attached to Polystyrene for Biosensing Applications†","authors":"Sivayini Kandeepan,&nbsp;Joseph A. Paquette,&nbsp;Joe B. Gilroy,&nbsp;Silvia Mittler","doi":"10.1002/cvde.201507177","DOIUrl":"10.1002/cvde.201507177","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Remarkable developments and successes are witnessed in the fabrication and implementation of optical sensors based on localized surface plasmon resonance (LSPR) for the investigation of chemical and biological material quantities. We report on the reproducible fabrication of chemically stable surface immobilized AuNPs grown via organometallic chemical vapor deposition (OMCVD) on a polymer substrate, namely polystyrene (PS). Oxygen plasma-treated and UV ozone-treated PS samples depict enhanced amounts of polar -OH groups allowing for nucleation and growth of AuNPs. The optimum plasma treatment conditions, the largest shifts in the LSPR curves, and the bulk sensitivity of the OMCVD-grown AuNPs are discussed.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507177","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323505","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties† 使用四甲基二硅氧烷前驱体的远程微波氢等离子体CVD制备碳化硅氧薄膜:生长动力学,结构,表面形貌和性能
Pub Date : 2015-11-17 DOI: 10.1002/cvde.201507185
Aleksander M. Wrobel, Pawel Uznanski, Agnieszka Walkiewicz-Pietrzykowska

Amorphous hydrogenated silicon oxycarbide (a-SiCO:H) thin films are produced by remote microwave hydrogen plasma CVD using 1,1,3,3-tetramethyldisiloxane precursor. The effect of substrate temperature (TS) on the chemical structure and some properties of resulting a-SiCO:H films is reported. The examination performed by infrared spectroscopy revealed that the increase in TS involves the elimination of organic moieties from the film and its transformation from polymer-like to ceramic-like high-crosslink-density material. Due to their small surface roughness, high density, and good optical transparency, the a-SiCO:H films seem to be useful coatings for optical and electronic devices.

以1,1,3,3-四甲基二硅氧烷为前驱体,采用远程微波氢等离子体气相沉积法制备了非晶氢化碳化硅薄膜。报道了衬底温度对制备的a-SiCO:H薄膜的化学结构和某些性能的影响。红外光谱分析表明,TS的增加涉及到薄膜中有机部分的消除以及其从聚合物样向陶瓷样高交联密度材料的转变。由于其表面粗糙度小,密度高,光学透明度好,a-SiCO:H薄膜似乎是光学和电子器件的有用涂层。
{"title":"Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties†","authors":"Aleksander M. Wrobel,&nbsp;Pawel Uznanski,&nbsp;Agnieszka Walkiewicz-Pietrzykowska","doi":"10.1002/cvde.201507185","DOIUrl":"10.1002/cvde.201507185","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Amorphous hydrogenated silicon oxycarbide (a-SiCO:H) thin films are produced by remote microwave hydrogen plasma CVD using 1,1,3,3-tetramethyldisiloxane precursor. The effect of substrate temperature (<i>T</i><b><sub>S</sub></b>) on the chemical structure and some properties of resulting a-SiCO:H films is reported. The examination performed by infrared spectroscopy revealed that the increase in <i>T</i><b><sub>S</sub></b> involves the elimination of organic moieties from the film and its transformation from polymer-like to ceramic-like high-crosslink-density material. Due to their small surface roughness, high density, and good optical transparency, the a-SiCO:H films seem to be useful coatings for optical and electronic devices.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507185","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
PECVD of Hematite Nanoblades and Nanocolumns: Synthesis, Characterization, and Growth Model† 赤铁矿纳米叶片和纳米柱的PECVD:合成,表征和生长模型†
Pub Date : 2015-11-16 DOI: 10.1002/cvde.201507182
Giorgio Carraro, Alberto Gasparotto, Chiara Maccato, Elza Bontempi, Davide Barreca

Fe2O3 nanostructures are fabricated on Si(100) and SiO2 by plasma enhanced (PE)CVD from a FeIII β-diketonate precursor. Depositions are carried out in Ar-O2 plasmas, devoting particular attention to the influence of growth temperature (from 60 to 400 °C) on material chemico-physical properties. Remarkably, high purity, single-phase α-Fe2O3 nanostructures are obtained at temperatures as low as 60 °C. Furthermore, the deposit nano-organization can be tuned from <110>-oriented 2D nanoblade arrays to denser nanocolumns upon increasing the deposition temperature. A possible growth model is proposed to account for the observed structural/morphological features and light absorption properties of the target materials.

以FeIII β-二酮酸前驱体为原料,采用等离子体增强(PE)CVD技术在Si(100)和SiO2上制备了Fe2O3纳米结构。沉积是在Ar-O2等离子体中进行的,特别关注生长温度(从60°C到400°C)对材料化学物理性质的影响。值得注意的是,在低至60℃的温度下,获得了高纯度的单相α-Fe2O3纳米结构。此外,随着沉积温度的升高,沉积的纳米组织可以从定向二维纳米叶片阵列调谐到更致密的纳米柱。提出了一种可能的生长模型来解释所观察到的目标材料的结构/形态特征和光吸收特性。
{"title":"PECVD of Hematite Nanoblades and Nanocolumns: Synthesis, Characterization, and Growth Model†","authors":"Giorgio Carraro,&nbsp;Alberto Gasparotto,&nbsp;Chiara Maccato,&nbsp;Elza Bontempi,&nbsp;Davide Barreca","doi":"10.1002/cvde.201507182","DOIUrl":"10.1002/cvde.201507182","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Fe<sub>2</sub>O<sub>3</sub> nanostructures are fabricated on Si(100) and SiO<sub>2</sub> by plasma enhanced (PE)CVD from a Fe<sup>III</sup> <i>β</i>-diketonate precursor. Depositions are carried out in Ar-O<sub>2</sub> plasmas, devoting particular attention to the influence of growth temperature (from 60 to 400 °C) on material chemico-physical properties. Remarkably, high purity, single-phase <i>α</i>-Fe<sub>2</sub>O<sub>3</sub> nanostructures are obtained at temperatures as low as 60 °C. Furthermore, the deposit nano-organization can be tuned from &lt;110&gt;-oriented 2D nanoblade arrays to denser nanocolumns upon increasing the deposition temperature. A possible growth model is proposed to account for the observed structural/morphological features and light absorption properties of the target materials.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507182","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 13
Quantitative Measurement of Fiber Pull-out by Laser Scanning Confocal Microscopy† 激光扫描共聚焦显微法定量测量光纤拔出度
Pub Date : 2015-11-16 DOI: 10.1002/cvde.201504334
Andreas Pfrang, Thomas Schimmel

Laser scanning confocal microscopy is demonstrated as a new method to quantitatively determine fiber pull-out length. Fracture surfaces of carbon/carbon composites – polyacrylonitrile (PAN)-based carbon fibers infiltrated with pyrolytic carbon – are investigated to measure the three-dimensional surface topography and thereby the distribution of fiber pull-out length of carbon fibers.

激光扫描共聚焦显微镜是一种定量测定光纤拔出长度的新方法。研究了炭/炭复合材料——聚丙烯腈(PAN)基碳纤维的断裂面,并对其进行了三维表面形貌测量,从而得到了碳纤维的纤维拉拔长度分布。
{"title":"Quantitative Measurement of Fiber Pull-out by Laser Scanning Confocal Microscopy†","authors":"Andreas Pfrang,&nbsp;Thomas Schimmel","doi":"10.1002/cvde.201504334","DOIUrl":"10.1002/cvde.201504334","url":null,"abstract":"<p>Laser scanning confocal microscopy is demonstrated as a new method to quantitatively determine fiber pull-out length. Fracture surfaces of carbon/carbon composites – polyacrylonitrile (PAN)-based carbon fibers infiltrated with pyrolytic carbon – are investigated to measure the three-dimensional surface topography and thereby the distribution of fiber pull-out length of carbon fibers.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201504334","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322616","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
CVD Growth of MoS2-based Two-dimensional Materials 二硫化钼基二维材料的CVD生长
Pub Date : 2015-11-13 DOI: 10.1002/cvde.201500060
H. F. Liu, S. L. Wong, D. Z. Chi

The ‘self-limiting’ character of graphene growth on the surface of metals such as Ni and Cu makes CVD the natural choice for growing large-area and continuous graphene films. Beyond graphene, absence of the self-limiting property results in a challenge to achieving large-area, high-quality two-dimensional (2D) crystals by CVD. Recent studies of structural, optical, and electrical properties of MoS2-based atomic layers grown by CVD are reviewed, concluding that thermal vapor deposition will outperform thermal vapor sulfurization in producing the required materials. Whether gaseous sources will replace the now dominant solid sources in direct deposition methods is an open issue. The latest progression in various CVD techniques used in MoS2 growth and their resultant products are discussed and compared.

石墨烯在Ni和Cu等金属表面生长的“自我限制”特性使CVD成为生长大面积连续石墨烯薄膜的自然选择。除了石墨烯之外,由于缺乏自限制特性,因此很难通过CVD获得大面积、高质量的二维(2D)晶体。综述了近年来化学气相沉积法生长mos2基原子层的结构、光学和电学性质的研究,认为热气相沉积法在制备所需材料方面优于热气相硫化法。气体源是否会取代目前在直接沉积方法中占主导地位的固体源是一个悬而未决的问题。讨论和比较了用于二硫化钼生长的各种CVD技术及其产物的最新进展。
{"title":"CVD Growth of MoS2-based Two-dimensional Materials","authors":"H. F. Liu,&nbsp;S. L. Wong,&nbsp;D. Z. Chi","doi":"10.1002/cvde.201500060","DOIUrl":"10.1002/cvde.201500060","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>The ‘<i>self-limiting</i>’ character of graphene growth on the surface of metals such as Ni and Cu makes CVD the natural choice for growing large-area and continuous graphene films. Beyond graphene, absence of the self-limiting property results in a challenge to achieving large-area, high-quality two-dimensional (2D) crystals by CVD. Recent studies of structural, optical, and electrical properties of MoS<sub>2</sub>-based atomic layers grown by CVD are reviewed, concluding that thermal vapor deposition will outperform thermal vapor sulfurization in producing the required materials. Whether gaseous sources will replace the now dominant solid sources in direct deposition methods is an open issue. The latest progression in various CVD techniques used in MoS<sub>2</sub> growth and their resultant products are discussed and compared.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201500060","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322186","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 143
Electric-Field Aerosol-Assisted CVD: Synthesis, Characterization, and Properties of Tin Oxide Microballs Prepared from a Single Source Precursor† 电场气溶胶辅助CVD:单源前驱体制备的氧化锡微球的合成、表征和性能
Pub Date : 2015-11-12 DOI: 10.1002/cvde.201507178
Rabia Naeem, Sohail Ahmed, Kong Mun Lo, Wan Jefrey Basirun, Rosiyah Yahya, Misni Misran, T. A. Nirmal Peiris, Jagdeep S. Sagu, K. G. Upul Wijayantha, Arjun K. Thapa, Gamini U. Sumanasekera, Muhammad Mazhar

Mesoporous nanostructures of tin(IV) oxide microballs are synthesized, using a single source precursor [Sn (OAc)(dmae)]2 (where OAc = Acetato and dmae = dimethylaminoethanolato). The as-prepared microballs are characterized using X-ray diffraction, field emission scanning electron microscopy (FESEM), Fourier transform infrared and UV-vis spectroscopy, X-ray photoelectron spectroscopy and impedance spectroscopy. The focused ion beam (FIB) images of the exterior and interior surfaces of the microballs disclosed the presence of porous structures with mesopore of sizes ranging from 56-66 nm and 8.0 to 160 nm, respectively. The microballs exhibit high BET and Langmuir surface areas of 136 and 191.6 m2 g−1, respectively, and show capacities >600 mAhg−1 over 60 cycles, as compared with unmodified tin oxide-based nanomaterials which show capacity < 500 mAh g−1 after 50 cycles.

采用单源前驱体[Sn (OAc)(dmae)]2(其中OAc =醋酸酯,dmae =二甲氨基乙醇酸)合成了氧化锡(IV)微球的介孔纳米结构。利用x射线衍射、场发射扫描电镜(FESEM)、傅里叶变换红外和紫外-可见光谱、x射线光电子能谱和阻抗谱对制备的微球进行了表征。微球的内表面和外表面的聚焦离子束(FIB)图像显示了多孔结构的存在,介孔尺寸分别为56 ~ 66 nm和8.0 ~ 160 nm。与未改性的氧化锡基纳米材料相比,微球具有较高的BET和Langmuir表面积,分别为136和191.6 m2 g−1,并且在60次循环中显示出600 mAhg−1的容量。500mah g−1,50次循环后。
{"title":"Electric-Field Aerosol-Assisted CVD: Synthesis, Characterization, and Properties of Tin Oxide Microballs Prepared from a Single Source Precursor†","authors":"Rabia Naeem,&nbsp;Sohail Ahmed,&nbsp;Kong Mun Lo,&nbsp;Wan Jefrey Basirun,&nbsp;Rosiyah Yahya,&nbsp;Misni Misran,&nbsp;T. A. Nirmal Peiris,&nbsp;Jagdeep S. Sagu,&nbsp;K. G. Upul Wijayantha,&nbsp;Arjun K. Thapa,&nbsp;Gamini U. Sumanasekera,&nbsp;Muhammad Mazhar","doi":"10.1002/cvde.201507178","DOIUrl":"10.1002/cvde.201507178","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Mesoporous nanostructures of tin(IV) oxide microballs are synthesized, using a single source precursor [Sn (OAc)(dmae)]<sub>2</sub> (where OAc = Acetato and dmae = dimethylaminoethanolato). The as-prepared microballs are characterized using X-ray diffraction, field emission scanning electron microscopy (FESEM), Fourier transform infrared and UV-vis spectroscopy, X-ray photoelectron spectroscopy and impedance spectroscopy. The focused ion beam (FIB) images of the exterior and interior surfaces of the microballs disclosed the presence of porous structures with mesopore of sizes ranging from 56-66 nm and 8.0 to 160 nm, respectively. The microballs exhibit high BET and Langmuir surface areas of 136 and 191.6 m<sup>2</sup> g<sup>−1</sup>, respectively, and show capacities &gt;600 mAhg<sup>−1</sup> over 60 cycles, as compared with unmodified tin oxide-based nanomaterials which show capacity &lt; 500 mAh g<sup>−1</sup> after 50 cycles.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2015-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507178","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
期刊
Chemical Vapor Deposition
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1