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Modeling the negative capacitance effect in dispersive organic materials using modified Drude theory 用修正的德鲁德理论模拟分散性有机材料的负电容效应
Pub Date : 2019-07-01 DOI: 10.1016/j.ssel.2020.01.005
You-Lin Wu , Jing-Jenn Lin , H.L. Kwok

Frequency- and mobility-dependent admittance have been observed in organic polymer light-emitting diodes. In this paper, we developed a model to describe this dispersive behavior using a modified Drude theory. In this model, a phase angle difference between the applied electric field and the average displacement of the charge carriers is introduced rather than using a complex mobility. This newly proposed model successfully describes the dispersive nature, as well as the negative capacitance effect, at low frequencies in organic polymers. The simulation results of this model also fit the negative capacitance data reported in the literature, provided that a suitable phase angle difference is given.

在有机聚合物发光二极管中已经观察到频率和迁移率相关的导纳。在本文中,我们开发了一个模型来描述这种色散行为使用改进的德鲁德理论。在该模型中,引入了外加电场与载流子平均位移之间的相位角差,而不是使用复杂迁移率。这个新提出的模型成功地描述了有机聚合物在低频时的色散性质以及负电容效应。只要给定合适的相位角差,该模型的仿真结果与文献报道的负电容数据吻合。
{"title":"Modeling the negative capacitance effect in dispersive organic materials using modified Drude theory","authors":"You-Lin Wu ,&nbsp;Jing-Jenn Lin ,&nbsp;H.L. Kwok","doi":"10.1016/j.ssel.2020.01.005","DOIUrl":"10.1016/j.ssel.2020.01.005","url":null,"abstract":"<div><p>Frequency- and mobility-dependent admittance have been observed in organic polymer light-emitting diodes. In this paper, we developed a model to describe this dispersive behavior using a modified Drude theory. In this model, a phase angle difference between the applied electric field and the average displacement of the charge carriers is introduced rather than using a complex mobility. This newly proposed model successfully describes the dispersive nature, as well as the negative capacitance effect, at low frequencies in organic polymers. The simulation results of this model also fit the negative capacitance data reported in the literature, provided that a suitable phase angle difference is given.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 2","pages":"Pages 105-109"},"PeriodicalIF":0.0,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2020.01.005","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73200624","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Performance analysis of GaN-based micro light-emitting diodes by laser lift-off process gan基微发光二极管的激光提升性能分析
Pub Date : 2019-07-01 DOI: 10.1016/j.ssel.2019.06.001
Li Sheng-Hui , Lin Chia-Ping , Fang Yen-Hsiang , Kuo Wei-Hung , Wu Ming-Hsien , Chao Chu-Li , Horng Ray-Hua , Su Guo-Dung J.

In this study, a monochromatic GaN-based micro-light-emitting-diode (µLED) array was fabricated using flip-chip technology. The laser lift-off (LLO) process was employed to decrease the light divergence caused by the differing refractive indexes of sapphire (n = 1.77) and GaN (n = 2.4). The LLO-µLEDs considerably improve light collimation, compared with conventional flip-chip µLEDs containing a sapphire substrate. We highlight, in particular, the importance of the optical characteristics before and after LLO. Collimation of light was discovered to be 12% higher after removal of the sapphire substrate. The results are of high importance for understanding the optical properties of µLED arrays after LLO.

在本研究中,采用倒装芯片技术制备了单色gan基微发光二极管(µLED)阵列。为了减小蓝宝石(n = 1.77)和氮化镓(n = 2.4)的折射率差异引起的光发散,采用了激光提升(LLO)工艺。与含有蓝宝石衬底的传统倒装芯片相比,LLO-µled显著改善了光准直性。我们特别强调LLO前后光学特性的重要性。去掉蓝宝石衬底后,光的准直度提高了12%。这些结果对于理解LLO后µLED阵列的光学特性具有重要意义。
{"title":"Performance analysis of GaN-based micro light-emitting diodes by laser lift-off process","authors":"Li Sheng-Hui ,&nbsp;Lin Chia-Ping ,&nbsp;Fang Yen-Hsiang ,&nbsp;Kuo Wei-Hung ,&nbsp;Wu Ming-Hsien ,&nbsp;Chao Chu-Li ,&nbsp;Horng Ray-Hua ,&nbsp;Su Guo-Dung J.","doi":"10.1016/j.ssel.2019.06.001","DOIUrl":"10.1016/j.ssel.2019.06.001","url":null,"abstract":"<div><p>In this study, a monochromatic GaN-based micro-light-emitting-diode (µLED) array was fabricated using flip-chip technology. The laser lift-off (LLO) process was employed to decrease the light divergence caused by the differing refractive indexes of sapphire (<em>n</em> = 1.77) and GaN (<em>n</em> = 2.4). The LLO-µLEDs considerably improve light collimation, compared with conventional flip-chip µLEDs containing a sapphire substrate. We highlight, in particular, the importance of the optical characteristics before and after LLO. Collimation of light was discovered to be 12% higher after removal of the sapphire substrate. The results are of high importance for understanding the optical properties of µLED arrays after LLO.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 2","pages":"Pages 58-63"},"PeriodicalIF":0.0,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2019.06.001","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87708641","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Analysis and modeling of sequential circuits in QCA nano computing: RAM and SISO register study QCA纳米计算中顺序电路的分析和建模:RAM和SISO寄存器的研究
Pub Date : 2019-07-01 DOI: 10.1016/j.ssel.2019.11.004
Md. Abdullah-Al-Shafi , Rahman Ziaur

Quantum-dot cellular automata (QCA) is a foremost archetype of field-coupled nanoscale devices. It is a non-von-Neumann, minimal energy dissipated model for conventional nano computing by transistor free logic. The field-coupled nanoscale models rely on limited field connections among nanoscale building modules which are organized in forms to complete convenient assessments. A fundamental device in QCA is termed as a cell is created from a structure of coupled dots by a few flexible charges and the charge arrangement initiates a bit, and quantum charge channeling inside a squared cell permits device shifting. QCA operation approves extreme device thicknesses, room temperature implementation, and higher switching speeds. We propose an inventive design of two commonly used sequential circuits, namely random access memory (RAM) and serial-in/serial-out (SISO) register in this study. Noteworthy enhancements in terms of extent, cell intricacy, latency, and cost have been attained in both designs. Thorough performance assessment and analysis are achieved in several aspects to substantiate the designed circuits having an outstanding operation in contrast to existing studies. QCADesigner and QCAPro tools have been utilized to confirm the precise functionality of the outlined architectures.

量子点元胞自动机(QCA)是场耦合纳米级器件的主要原型。这是一个非non- neumann,最小能量耗散模型的传统纳米计算晶体管自由逻辑。场耦合纳米尺度模型依赖于以形式组织的纳米尺度建筑模块之间有限的场连接来完成方便的评估。QCA中的一个基本器件被称为单元,它是由几个柔性电荷耦合点的结构创建的,电荷的排列启动位,并且平方单元内的量子电荷通道允许器件移动。QCA操作允许极限器件厚度、室温实现和更高的切换速度。在本研究中,我们提出了一种创造性的设计两种常用的顺序电路,即随机存取存储器(RAM)和串行输入/串行输出寄存器(SISO)。两种设计在范围、细胞复杂性、延迟和成本方面都取得了显著的改进。在几个方面进行了全面的性能评估和分析,以证实所设计的电路与现有研究相比具有出色的运行性能。qcaddesigner和QCAPro工具已被用来确认所概述的体系结构的精确功能。
{"title":"Analysis and modeling of sequential circuits in QCA nano computing: RAM and SISO register study","authors":"Md. Abdullah-Al-Shafi ,&nbsp;Rahman Ziaur","doi":"10.1016/j.ssel.2019.11.004","DOIUrl":"10.1016/j.ssel.2019.11.004","url":null,"abstract":"<div><p>Quantum-dot cellular automata (QCA) is a foremost archetype of field-coupled nanoscale devices. It is a non-von-Neumann, minimal energy dissipated model for conventional nano computing by transistor free logic. The field-coupled nanoscale models rely on limited field connections among nanoscale building modules which are organized in forms to complete convenient assessments. A fundamental device in QCA is termed as a cell is created from a structure of coupled dots by a few flexible charges and the charge arrangement initiates a bit, and quantum charge channeling inside a squared cell permits device shifting. QCA operation approves extreme device thicknesses, room temperature implementation, and higher switching speeds. We propose an inventive design of two commonly used sequential circuits, namely random access memory (RAM) and serial-in/serial-out (SISO) register in this study. Noteworthy enhancements in terms of extent, cell intricacy, latency, and cost have been attained in both designs. Thorough performance assessment and analysis are achieved in several aspects to substantiate the designed circuits having an outstanding operation in contrast to existing studies. QCADesigner and QCAPro tools have been utilized to confirm the precise functionality of the outlined architectures.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 2","pages":"Pages 73-83"},"PeriodicalIF":0.0,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2019.11.004","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75447858","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Latch-up issue of drain metal connection split in test circuit with 3D TCAD simulation analysis in CMOS application 用三维TCAD仿真分析了测试电路中漏极金属连接劈裂的锁存问题
Pub Date : 2019-01-01 DOI: 10.1016/j.ssel.2019.04.001
Chiang Chun, Chang Ping-Chen, Tang Tien-Hao, Su Kuan-Cheng

In CMOS integrated circuit (IC), parasitic Silicon-Controlled Rectifier (SCR) path is unavoidable and causes the risk of latch up (LU) issue. In this work, we found that the SCR characteristic would be influenced by the difference of drain metal connection so it would affect the result of LU measurement. Two common test circuits were measured and discussed in the paper. Additionally, 3D TCAD simulations are performed to help the analysis. Finally, holding voltage (Vh) is increased from 1.5 V to 2.0 V and holding current (Ih) is increased from 0.25A to 0.75A with higher leakage current (IL), lower trigger voltage (Vt1) in drain-connection circuit. Therefore, drain-disconnection circuit, which is simulated as minimum spacing SCR path between two nearby circuits in IC design, is worse case that makes us judge the LU risk much rigorously.

在CMOS集成电路(IC)中,寄生可控硅(SCR)路径是不可避免的,并且会导致锁存器(LU)问题的风险。在这项工作中,我们发现可控硅特性会受到漏极金属连接方式的不同的影响,从而影响到LU的测量结果。本文对两种常见的测试电路进行了测试和讨论。此外,还进行了三维TCAD仿真以帮助分析。最后,保持电压(Vh)从1.5 V增加到2.0 V,保持电流(Ih)从0.25A增加到0.75A,漏极连接电路的漏电流(IL)更高,触发电压(Vt1)更低。因此,在集成电路设计中,将漏极断开电路模拟为相邻两个电路之间的最小间距可阻通路是一种较差的情况,这使得我们对电路风险的判断更加严格。
{"title":"Latch-up issue of drain metal connection split in test circuit with 3D TCAD simulation analysis in CMOS application","authors":"Chiang Chun,&nbsp;Chang Ping-Chen,&nbsp;Tang Tien-Hao,&nbsp;Su Kuan-Cheng","doi":"10.1016/j.ssel.2019.04.001","DOIUrl":"10.1016/j.ssel.2019.04.001","url":null,"abstract":"<div><p>In CMOS integrated circuit (IC), parasitic Silicon-Controlled Rectifier (SCR) path is unavoidable and causes the risk of latch up (LU) issue. In this work, we found that the SCR characteristic would be influenced by the difference of drain metal connection so it would affect the result of LU measurement. Two common test circuits were measured and discussed in the paper. Additionally, 3D TCAD simulations are performed to help the analysis. Finally, holding voltage (Vh) is increased from 1.5 V to 2.0 V and holding current (Ih) is increased from 0.25A to 0.75A with higher leakage current (IL), lower trigger voltage (Vt1) in drain-connection circuit. Therefore, drain-disconnection circuit, which is simulated as minimum spacing SCR path between two nearby circuits in IC design, is worse case that makes us judge the LU risk much rigorously.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 1","pages":"Pages 25-29"},"PeriodicalIF":0.0,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2019.04.001","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82148014","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A constant Q-factor notch filter using voltage difference transconductance amplifier 采用压差跨导放大器的恒q因子陷波滤波器
Pub Date : 2019-01-01 DOI: 10.1016/j.ssel.2019.05.001
K. Roja , K.M. Santhoshini , M. Sarada , Avireni Srinivasulu

This paper demonstrates a novel design of Notch filter circuit availing Voltage Difference Transconductance Amplifier (VDTA) active element. The proposed circuit utilizes two VDTA blocks, two capacitors without the use of resistor and operates in voltage-mode. The devised Notch filter circuit uses 150 µA biasing current and operates with ±0.9 V supply voltage. The transconductance value of this element is electronically controllable/tunable with the bias currents. The proposed filter operates at low voltage and is widely used in optical communication systems, biomedical applications and audio applications. The circuit is implemented in the Cadence Virtuoso tool of the gpdk 180 nm CMOS process.

介绍了一种利用电压差跨导放大器(VDTA)有源元件设计的新型陷波滤波电路。所提出的电路利用两个VDTA模块,两个不使用电阻的电容器,并在电压模式下工作。设计的陷波滤波电路采用150µA偏置电流,工作电压为±0.9 V。该元件的跨导值是电子可控/可调的偏置电流。所提出的滤波器工作在低电压下,广泛用于光通信系统、生物医学应用和音频应用。电路是在gpdk 180 nm CMOS工艺的Cadence Virtuoso工具中实现的。
{"title":"A constant Q-factor notch filter using voltage difference transconductance amplifier","authors":"K. Roja ,&nbsp;K.M. Santhoshini ,&nbsp;M. Sarada ,&nbsp;Avireni Srinivasulu","doi":"10.1016/j.ssel.2019.05.001","DOIUrl":"10.1016/j.ssel.2019.05.001","url":null,"abstract":"<div><p>This paper demonstrates a novel design of Notch filter circuit availing Voltage Difference Transconductance Amplifier (VDTA) active element. The proposed circuit utilizes two VDTA blocks, two capacitors without the use of resistor and operates in voltage-mode. The devised Notch filter circuit uses 150 µA biasing current and operates with ±0.9 V supply voltage. The transconductance value of this element is electronically controllable/tunable with the bias currents. The proposed filter operates at low voltage and is widely used in optical communication systems, biomedical applications and audio applications. The circuit is implemented in the Cadence Virtuoso tool of the gpdk 180 nm CMOS process.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 1","pages":"Pages 38-43"},"PeriodicalIF":0.0,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2019.05.001","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74883953","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
An integrator circuit using voltage difference transconductance amplifier 一种采用压差跨导放大器的积分器电路
Pub Date : 2019-01-01 DOI: 10.1016/j.ssel.2018.08.001
K. Malathi Santhoshini , Sarada Musala , Srinivasulu Avireni

This paper illustrates a novel design of voltage-mode Integrator using the active element, namely Voltage Difference Transconductance Amplifier (VDTA). The proposed circuit avails one VDTA element and a single capacitor. This provides more beneficial for the fabrication of ICs in VLSI design. The designed circuit works with ±0.9 V supply voltage, uses a bias current of order 150 µA and also its amplitude is electronically tunable with the bias current. The proposed circuit is designed in a gpdk 180 nm CMOS process using a Cadence Virtuoso tool and also has the power dissipation of order 270 µW. The simulation results are verified experimentally with the commercially available ICs LM13700.

本文介绍了一种利用有源元件——电压差跨导放大器(VDTA)的电压型积分器的新设计。所提出的电路利用一个VDTA元件和一个电容器。这为超大规模集成电路设计中集成电路的制作提供了更有利的条件。所设计的电路工作在±0.9 V的电源电压下,使用150 μ a的偏置电流,并且其幅度可以随偏置电流进行电子调谐。该电路使用Cadence Virtuoso工具在gpdk 180 nm CMOS工艺中设计,功耗为270 μ W。仿真结果与市售集成电路LM13700进行了实验验证。
{"title":"An integrator circuit using voltage difference transconductance amplifier","authors":"K. Malathi Santhoshini ,&nbsp;Sarada Musala ,&nbsp;Srinivasulu Avireni","doi":"10.1016/j.ssel.2018.08.001","DOIUrl":"10.1016/j.ssel.2018.08.001","url":null,"abstract":"<div><p>This paper illustrates a novel design of voltage-mode Integrator using the active element, namely Voltage Difference Transconductance Amplifier (VDTA). The proposed circuit avails one VDTA element and a single capacitor. This provides more beneficial for the fabrication of ICs in VLSI design. The designed circuit works with ±0.9 V supply voltage, uses a bias current of order 150 µA and also its amplitude is electronically tunable with the bias current. The proposed circuit is designed in a gpdk 180 nm CMOS process using a Cadence Virtuoso tool and also has the power dissipation of order 270 µW. The simulation results are verified experimentally with the commercially available ICs LM13700.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 1","pages":"Pages 10-14"},"PeriodicalIF":0.0,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2018.08.001","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76942469","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Influence of electron quantum confinement on the strength of carbon nanotube bundles 电子量子约束对碳纳米管束强度的影响
Pub Date : 2019-01-01 DOI: 10.1016/j.ssel.2018.09.001
Lucian D. Filip , Valeriu Filip

Radial confinement and specific boundary conditions lead to inhomogeneous spatial distributions for conduction electrons in metallic carbon nanotubes.Such uneven spread of negative charge on the surface of a carbon nanotube can induce Coulomb-type interactions between parallel tubes, contributing to the relative friction. Thus, the axial conduction electron density on a single idealized carbon nanotube closed at both ends was obtained in the framework of the two-dimensional quasi-free electron approximation. A Coulomb potential energy between two parallel nanotubes was calculated as a function of the longitudinal offset between them. The study provides a simple method for estimating the friction force related to Coulomb inter-tube interactions appearing during a parallel sliding motion, with implications in the stretching resistance of various carbon nanotube bundles and in designing various nano-electromechanical devices.

径向约束和特定的边界条件导致金属碳纳米管中传导电子的空间分布不均匀。这种负电荷在碳纳米管表面的不均匀分布会引起平行管之间的库仑型相互作用,从而导致相对摩擦。因此,在二维准自由电子近似的框架下,得到了单个理想化碳纳米管两端闭合的轴向传导电子密度。计算了两个平行纳米管之间的库仑势能,并将其作为纵向偏移量的函数。该研究提供了一种简单的方法来估计在平行滑动运动中出现的与库仑管间相互作用相关的摩擦力,对各种碳纳米管束的拉伸阻力和设计各种纳米机电器件具有指导意义。
{"title":"Influence of electron quantum confinement on the strength of carbon nanotube bundles","authors":"Lucian D. Filip ,&nbsp;Valeriu Filip","doi":"10.1016/j.ssel.2018.09.001","DOIUrl":"10.1016/j.ssel.2018.09.001","url":null,"abstract":"<div><p>Radial confinement and specific boundary conditions lead to inhomogeneous spatial distributions for conduction electrons in metallic carbon nanotubes.Such uneven spread of negative charge on the surface of a carbon nanotube can induce Coulomb-type interactions between parallel tubes, contributing to the relative friction. Thus, the axial conduction electron density on a single idealized carbon nanotube closed at both ends was obtained in the framework of the two-dimensional quasi-free electron approximation. A Coulomb potential energy between two parallel nanotubes was calculated as a function of the longitudinal offset between them. The study provides a simple method for estimating the friction force related to Coulomb inter-tube interactions appearing during a parallel sliding motion, with implications in the stretching resistance of various carbon nanotube bundles and in designing various nano-electromechanical devices.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 1","pages":"Pages 1-9"},"PeriodicalIF":0.0,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2018.09.001","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86633794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Current collapse scaling in GaN/AlGaN/SiC high electron mobility transistors GaN/AlGaN/SiC高电子迁移率晶体管的电流坍缩缩放
Pub Date : 2019-01-01 DOI: 10.1016/j.ssel.2019.04.002
D.S. Rawal, Amit, Sunil Sharma, Sonalee Kapoor, Robert Laishram, Seema Vinayak

This study reports the scaling of current collapse in GaN/AlGaN HEMTs with respect to the un-passivated gate drain distance on the gate edge. The source drain current reduction increased from 4 mA to 28 mA, when un-passivated gap increased from 200 nm to 600 nm respectively mainly due to virtual gate formation at gate edge as a result of applied large reverse bias between the gate/drain electrodes. The length of virtual gate is a function of un-passivated gap that modifies the lateral electric field between gate-drain region and results in variable current reduction due to variation in available traps with gap. The simulated E-field distribution is found to vary strongly with the un-passivated gap up to 200 nm and weakly thereafter. The HEMT knee voltage shifted from 0.5 V to 1.2 V when gap is increased from 200 nm to 600 nm respectively due to electric field distribution modification and hence electron trapping in the un-passivated gap resulting in increased device on-resistance (Ron). The current collapse finally resulted in reduction of device saturated RF power to 1.2 W/mm at 2.2 GHz for HEMT with an un-passivated gap of 600 nm.

本研究报告了GaN/AlGaN hemt中电流崩溃与栅极边缘未钝化栅极漏极距离的比例关系。当未钝化间隙分别从200 nm增加到600 nm时,源极漏极电流减小量从4 mA增加到28 mA,这主要是由于栅极/漏极之间施加了较大的反向偏压,在栅极边缘形成了虚拟栅极。虚拟栅极的长度是一个未钝化间隙的函数,它改变了栅极-漏极区域之间的侧向电场,并由于可用陷阱的变化而导致可变电流减小。模拟的电场分布在200 nm以内随未钝化间隙变化较大,此后变化较小。当间隙从200 nm增加到600 nm时,由于电场分布的改变和未钝化间隙中的电子捕获导致器件导通电阻增加,HEMT膝盖电压分别从0.5 V移动到1.2 V (Ron)。电流崩溃最终导致器件饱和RF功率降低到1.2 W/mm,在2.2 GHz下,HEMT的未钝化间隙为600 nm。
{"title":"Current collapse scaling in GaN/AlGaN/SiC high electron mobility transistors","authors":"D.S. Rawal,&nbsp;Amit,&nbsp;Sunil Sharma,&nbsp;Sonalee Kapoor,&nbsp;Robert Laishram,&nbsp;Seema Vinayak","doi":"10.1016/j.ssel.2019.04.002","DOIUrl":"10.1016/j.ssel.2019.04.002","url":null,"abstract":"<div><p>This study reports the scaling of current collapse in GaN/AlGaN HEMTs with respect to the un-passivated gate drain distance on the gate edge. The source drain current reduction increased from 4 mA to 28 mA, when un-passivated gap increased from 200 nm to 600 nm respectively mainly due to virtual gate formation at gate edge as a result of applied large reverse bias between the gate/drain electrodes. The length of virtual gate is a function of un-passivated gap that modifies the lateral electric field between gate-drain region and results in variable current reduction due to variation in available traps with gap. The simulated E-field distribution is found to vary strongly with the un-passivated gap up to 200 nm and weakly thereafter. The HEMT knee voltage shifted from 0.5 V to 1.2 V when gap is increased from 200 nm to 600 nm respectively due to electric field distribution modification and hence electron trapping in the un-passivated gap resulting in increased device on-resistance (R<sub>on</sub>). The current collapse finally resulted in reduction of device saturated RF power to 1.2 W/mm at 2.2 GHz for HEMT with an un-passivated gap of 600 nm.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 1","pages":"Pages 30-37"},"PeriodicalIF":0.0,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2019.04.002","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81523340","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Design methodology of double nulling resistors nested-Miller compensation of multistage amplifier 多级放大器双零化电阻嵌套米勒补偿设计方法
Pub Date : 2019-01-01 DOI: 10.1016/j.ssel.2018.06.001
Wing-Shan Tam, Chi-Wah Kok

This paper presents a methodology to design large capacitive drive amplifier with high gain feed-forward transconductance stage using double nulling resistors nested-Miller compensation. The high gain-bandwidth and large phase margin of the amplifier can be obtained without stringent passive compensation components matching requirement, which enhances the design robustness towards process, voltage and temperature variations. The proposed amplifier circuit topology is simple and can be applied to implement amplifier with rail-to-rail input and output. A design example of three-stage rail-to-rail class-AB amplifier fabricated with 0.35-µ m 1P4M CMOS technology is presented. The performance of the fabricated amplifier is measured which shows the amplifier is suitable for high output drive applications.

本文提出了一种采用双零化电阻嵌套米勒补偿的方法来设计具有高增益前馈跨导级的大容性驱动放大器。该放大器无需严格的无源补偿元件匹配要求即可获得高增益带宽和大相位裕度,增强了设计对工艺、电压和温度变化的鲁棒性。所提出的放大器电路拓扑结构简单,可用于实现轨对轨输入输出放大器。介绍了一种采用0.35µm 1P4M CMOS技术制作的三级轨对轨ab类放大器的设计实例。测试了该放大器的性能,结果表明该放大器适用于高输出驱动应用。
{"title":"Design methodology of double nulling resistors nested-Miller compensation of multistage amplifier","authors":"Wing-Shan Tam,&nbsp;Chi-Wah Kok","doi":"10.1016/j.ssel.2018.06.001","DOIUrl":"10.1016/j.ssel.2018.06.001","url":null,"abstract":"<div><p>This paper presents a methodology to design large capacitive drive amplifier with high gain feed-forward transconductance stage using double nulling resistors nested-Miller compensation. The high gain-bandwidth and large phase margin of the amplifier can be obtained without stringent passive compensation components matching requirement, which enhances the design robustness towards process, voltage and temperature variations. The proposed amplifier circuit topology is simple and can be applied to implement amplifier with rail-to-rail input and output. A design example of three-stage rail-to-rail class-AB amplifier fabricated with 0.35-µ m 1P4M CMOS technology is presented. The performance of the fabricated amplifier is measured which shows the amplifier is suitable for high output drive applications.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"1 1","pages":"Pages 15-24"},"PeriodicalIF":0.0,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2018.06.001","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88818416","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
期刊
Solid State Electronics Letters
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