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RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)最新文献

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Radiation-induced loss of rare earth doped silica fibres 稀土掺杂二氧化硅纤维的辐射致损耗
H. Henschel, O. Kohn, H. U. Schmidt, J. Kirchhof, S. Unger
Eighteen single mode fibres doped with different Rare Earth elements are exposed to /sup 60/Co gamma radiation in order to estimate the radiation sensitivity of fibre amplifiers or fibre lasers and to find fibres with extremely high loss increase that are suited for dosimetry of low radiation levels. Induced loss measurements with varying dose rate confirmed the applicability of a simple dose rate transformation method also to Rare Earth doped fibres. Operation of a "distributed" fibre optic radiation sensor is demonstrated at a dose rate of less than 0.1 Gy/d.
将掺入不同稀土元素的18根单模光纤暴露在/sup 60/Co γ辐射下,以估计光纤放大器或光纤激光器的辐射灵敏度,并找到适合于低辐射水平剂量测定的损耗增加极高的光纤。不同剂量率的诱导损耗测量证实了一种简单的剂量率转换方法也适用于稀土掺杂纤维。在小于0.1 Gy/d的剂量率下,演示了“分布式”光纤辐射传感器的操作。
{"title":"Radiation-induced loss of rare earth doped silica fibres","authors":"H. Henschel, O. Kohn, H. U. Schmidt, J. Kirchhof, S. Unger","doi":"10.1109/RADECS.1997.698961","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698961","url":null,"abstract":"Eighteen single mode fibres doped with different Rare Earth elements are exposed to /sup 60/Co gamma radiation in order to estimate the radiation sensitivity of fibre amplifiers or fibre lasers and to find fibres with extremely high loss increase that are suited for dosimetry of low radiation levels. Induced loss measurements with varying dose rate confirmed the applicability of a simple dose rate transformation method also to Rare Earth doped fibres. Operation of a \"distributed\" fibre optic radiation sensor is demonstrated at a dose rate of less than 0.1 Gy/d.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126086317","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 98
Estimation of upset sensitive volume thickness and critical energy using low energy heavy-ion beams 低能重离子束扰动敏感体厚度和临界能的估计
R. Ecoffet, S. Duzellier, J. Barak, J. Levinson, Y. Lifshitz, M. Hass, C. Inguimbert, C. Detcheverry
Low energy, low range ions are used for creating various conditions for energy deposition in structures responsible for SEU effects. Sensitive volume thicknesses found using this method for a set of sub-micronic SRAMs and DRAMs range from 1 to 20 /spl mu/m.
低能、低量程离子被用于创造各种条件,使能量沉积在导致SEU效应的结构中。使用该方法发现一组亚微米sram和dram的敏感体积厚度范围为1至20 /spl mu/m。
{"title":"Estimation of upset sensitive volume thickness and critical energy using low energy heavy-ion beams","authors":"R. Ecoffet, S. Duzellier, J. Barak, J. Levinson, Y. Lifshitz, M. Hass, C. Inguimbert, C. Detcheverry","doi":"10.1109/RADECS.1997.699008","DOIUrl":"https://doi.org/10.1109/RADECS.1997.699008","url":null,"abstract":"Low energy, low range ions are used for creating various conditions for energy deposition in structures responsible for SEU effects. Sensitive volume thicknesses found using this method for a set of sub-micronic SRAMs and DRAMs range from 1 to 20 /spl mu/m.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121781775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Thermal- and radiation-induced interface traps in MOS devices MOS器件中热和辐射诱导的界面陷阱
A. Sogoyan, S.V. Cherepko, V. Pershenkov, V. Rogov, V.N. Ulimov, V. Emelianov
The interface trap build-up mechanisms during post-irradiation thermal annealing and radiation-induced charge neutralisation (RICN) are experimentally investigated. The role of substrate electrons is shown to be significant in post-irradiation interface trap build-up. The RICN is found to be incapable to replace a standard thermal annealing test in terms of conservative low dose rate response estimation.
实验研究了辐照后热退火和辐射诱导电荷中和(RICN)过程中界面陷阱的形成机制。衬底电子的作用在辐照后界面陷阱的建立中是显著的。在保守的低剂量率响应估计方面,发现RICN不能取代标准的热退火试验。
{"title":"Thermal- and radiation-induced interface traps in MOS devices","authors":"A. Sogoyan, S.V. Cherepko, V. Pershenkov, V. Rogov, V.N. Ulimov, V. Emelianov","doi":"10.1109/RADECS.1997.698848","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698848","url":null,"abstract":"The interface trap build-up mechanisms during post-irradiation thermal annealing and radiation-induced charge neutralisation (RICN) are experimentally investigated. The role of substrate electrons is shown to be significant in post-irradiation interface trap build-up. The RICN is found to be incapable to replace a standard thermal annealing test in terms of conservative low dose rate response estimation.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"109 12","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114134218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
A new integrated test structure for on-chip post-irradiation annealing in MOS devices 一种新的MOS器件片上辐照后退火集成测试结构
C. Chabrerie, J. Autran, O. Flament, J. Boudenot
We have developed a prototype test structure (named THERMOS) demonstrating the feasibility and the interest of the on-chip heating in a Silicon-On-Insulator technology. This circuit has been specially designed for the study of post-irradiation effects in a radiation-hardened CMOS technology. Preliminary results are presented here for the on-chip annealing of irradiated n-channel transistors.
我们已经开发了一个原型测试结构(名为THERMOS),展示了在硅绝缘体上芯片加热技术的可行性和兴趣。该电路是专门为研究辐射硬化CMOS技术中的辐照后效应而设计的。本文给出了辐照n沟道晶体管片上退火的初步结果。
{"title":"A new integrated test structure for on-chip post-irradiation annealing in MOS devices","authors":"C. Chabrerie, J. Autran, O. Flament, J. Boudenot","doi":"10.1109/RADECS.1997.698896","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698896","url":null,"abstract":"We have developed a prototype test structure (named THERMOS) demonstrating the feasibility and the interest of the on-chip heating in a Silicon-On-Insulator technology. This circuit has been specially designed for the study of post-irradiation effects in a radiation-hardened CMOS technology. Preliminary results are presented here for the on-chip annealing of irradiated n-channel transistors.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131057156","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Radiation resistance of fiberoptic components and predictive models for optical fiber systems in nuclear environments 核环境下光纤系统的耐辐射性能及预测模型
M. Van Uffelen, P. Jucker, P. Fenaux
The basic components of fiberoptic links, such as light emitting diodes (LED), pin-type photodetectors (PD) and optical fibers are evaluated under (/sup 60/Co) /spl gamma/-ray irradiation, so as to ascertain their qualification for nuclear applications and to develop predictive models for their behavior under well defined environmental conditions, such as those encountered in nuclear power plants. This paper presents some results of irradiation tests, together with a discussion of proposals for optical fibers behavioral models.
在(/sup 60/Co) /spl伽马/射线照射下,对诸如发光二极管(LED)、针脚型光电探测器(PD)和光纤等光纤链的基本部件进行了评价,以确定它们在核应用方面的资格,并为它们在明确规定的环境条件下(例如在核电站中遇到的环境条件下)的行为建立预测模型。本文介绍了辐照试验的一些结果,并讨论了建立光纤行为模型的建议。
{"title":"Radiation resistance of fiberoptic components and predictive models for optical fiber systems in nuclear environments","authors":"M. Van Uffelen, P. Jucker, P. Fenaux","doi":"10.1109/RADECS.1997.698963","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698963","url":null,"abstract":"The basic components of fiberoptic links, such as light emitting diodes (LED), pin-type photodetectors (PD) and optical fibers are evaluated under (/sup 60/Co) /spl gamma/-ray irradiation, so as to ascertain their qualification for nuclear applications and to develop predictive models for their behavior under well defined environmental conditions, such as those encountered in nuclear power plants. This paper presents some results of irradiation tests, together with a discussion of proposals for optical fibers behavioral models.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114246220","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 26
Solid state sensor for locating and imaging sources of gamma and X-radiation 用于定位和成像伽马和x射线源的固态传感器
S. Kronenberg, G. Brucker, E. Bechtel
This paper describes the design and characterization of a directional Solid State Detector (SSD) that generates images of radiation point sources and scatter patterns from irradiated targets, thus accurately identifying their locations. Previous papers demonstrated that other types of directional radiation sensors, such as Ionization chambers, Geiger-Mueller and Scintillation Counters, can be designed to detect and locate arrays of gamma ray and X-ray point sources and broad scatter patterns.
本文描述了一种定向固态探测器(SSD)的设计和特性,该探测器可以从辐照目标中生成辐射点源图像和散射模式,从而准确识别其位置。先前的论文表明,其他类型的定向辐射传感器,如电离室,盖格-穆勒和闪烁计数器,可以被设计用于探测和定位伽马射线和x射线点源阵列和广泛的散射模式。
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引用次数: 4
Total dose hardness of three commercial CMOS microelectronics foundries 三家商用CMOS微电子铸造厂的总剂量硬度
J. V. Osborn, R. Lacoe, D. C. Mayer, G. Yabiku
We have measured the effects of total ionizing dose (TID) on CMOS FETs, ring oscillators and field-oxide transistor test structures fabricated at three different commercial foundries with four different processes. The foundries spanned a range of integration levels and included Hewlett-Packard (HP) 0.5 /spl mu/m and 0.8 /spl mu/m processes, an Orbit 1.2 /spl mu/m process, and an AMI 1.6 /spl mu/m process. We found that the highest tolerance to TID was for the HP 0.5 /spl mu/m process, where the shift in NMOS threshold voltage was less than 40 mV at 300 krad. An examination of the dependence of the threshold voltage shift on gate oxide thickness indicated that oxides of the different commercial processes were of similar quality, and that the improvement in the total dose tolerance of the HP 0.5 /spl mu/m technology is associated with the scaling of the gate oxide. Measurements on field-oxide transistors from the HP 0.5 /spl mu/m process were shown not to invert for signal voltages at 300 krad, maintaining the integrity of the LOCOS isolation. The impact of these results is, discussed in terms of the potential insertion of commercial microelectronics into space systems.
我们测量了总电离剂量(TID)对CMOS场效应管、环形振荡器和场氧化晶体管测试结构的影响,这些测试结构是在三个不同的商业铸造厂用四种不同的工艺制造的。这些代工厂涵盖了一系列集成水平,包括惠普(HP)的0.5 /spl μ m和0.8 /spl μ m工艺,Orbit的1.2 /spl μ m工艺和AMI的1.6 /spl μ m工艺。我们发现对TID的最高耐受性是在HP 0.5 /spl mu/m工艺中,其中NMOS阈值电压在300克拉时的位移小于40 mV。对阈值电压漂移对栅极氧化物厚度依赖性的研究表明,不同商业工艺的氧化物质量相似,HP 0.5 /spl mu/m技术的总剂量耐受性的提高与栅极氧化物的结皮有关。对HP 0.5 /spl mu/m工艺的场氧化晶体管的测量显示,在300 kad的信号电压下不会反转,保持LOCOS隔离的完整性。这些结果的影响,在商业微电子技术的潜在插入空间系统方面进行了讨论。
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引用次数: 68
Energy deposited by high energy neutrons and protons in silicon (comparison between HETC and COSMIC codes) 高能中子和质子在硅中沉积的能量(HETC和COSMIC代码的比较)
C. Vial, J. Palau, J. Gasiot, J. Nadai, M. Calvet, S. Fourtine, D. Roth, O. Bersillon
Comparison between HETC and COSMIC codes shows that COSMIC code, although being a protons-silicon interaction code, can be used to calculate the energy deposited by high energy neutrons in silicon.
HETC码与COSMIC码的比较表明,COSMIC码虽然是质子-硅相互作用码,但可以用来计算高能中子在硅中沉积的能量。
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引用次数: 2
Laser simulation adequacy of dose rate latch-up 激光模拟剂量率闭锁的充分性
P. Skorobogatov, A. Nikiforov, B. A. Ahabaev
2D-numerical joint solution of the optical equations and fundamental system of equations was performed to check the adequacy of laser simulation in application to dose rate latch-up. The influence of shadowing and high intensity effects was analysed. The simulation adequacy was verified comparative simulation to radiation tests.
对光学方程和基本方程组进行了二维数值联合求解,验证了激光模拟在剂量率锁存中的充分性。分析了阴影效应和高强度效应的影响。通过与辐射试验的比较,验证了模拟的充分性。
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引用次数: 1
MESFET destruction model and experimental validation MESFET破坏模型及实验验证
S. Telliez, J. Brasile, N. Samama
This paper presents a new behavioral model of GaAs MESFETs when subjected to power pulses. This basic model appears to fit published experimental results satisfactorily and is shown to be precise enough for a first estimate of the power needed to disturb or destroy the considered components.
本文提出了一种新的GaAs mesfet在功率脉冲作用下的行为模型。这个基本模型似乎与已发表的实验结果令人满意地拟合,并被证明对干扰或破坏所考虑的部件所需的功率的初步估计足够精确。
{"title":"MESFET destruction model and experimental validation","authors":"S. Telliez, J. Brasile, N. Samama","doi":"10.1109/RADECS.1997.698881","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698881","url":null,"abstract":"This paper presents a new behavioral model of GaAs MESFETs when subjected to power pulses. This basic model appears to fit published experimental results satisfactorily and is shown to be precise enough for a first estimate of the power needed to disturb or destroy the considered components.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132212528","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
期刊
RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)
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