首页 > 最新文献

26th International Conference on Indium Phosphide and Related Materials (IPRM)最新文献

英文 中文
Low-threshold-current operation of lateral current injection membrane distributed-feedback laser bonded on Si 硅基键合横向电流注入膜分布反馈激光器的低阈值电流工作
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880584
Y. Atsuji, K. Doi, Jieun Lee, Y. Atsumi, T. Hiratani, D. Inoue, T. Amemiya, N. Nishiyama, S. Arai
Toward realization of an ultralow-power-consumption semiconductor light source for on-chip optical interconnection, we have been investigating the lateral current injection (LCI) membrane distributed feedback (DFB) laser. This time, we realized membrane DFB laser with 158 nm core thickness and demonstrated room-temperature continuous-wave (CW) operation with a threshold current of 390 μA for the cavity length of 360 μm and the stripe width of 0.2 μm, which is lowest value ever reported in a DFB lasers on a Si substrate.
为了实现用于片上光互连的超低功耗半导体光源,我们一直在研究横向电流注入(LCI)膜分布反馈(DFB)激光器。本文实现了芯厚为158 nm的薄膜DFB激光器,并在腔长为360 μm、条纹宽度为0.2 μm的条件下,实现了390 μA的室温连续波工作,这是迄今为止在硅衬底上制备DFB激光器的最小值。
{"title":"Low-threshold-current operation of lateral current injection membrane distributed-feedback laser bonded on Si","authors":"Y. Atsuji, K. Doi, Jieun Lee, Y. Atsumi, T. Hiratani, D. Inoue, T. Amemiya, N. Nishiyama, S. Arai","doi":"10.1109/ICIPRM.2014.6880584","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880584","url":null,"abstract":"Toward realization of an ultralow-power-consumption semiconductor light source for on-chip optical interconnection, we have been investigating the lateral current injection (LCI) membrane distributed feedback (DFB) laser. This time, we realized membrane DFB laser with 158 nm core thickness and demonstrated room-temperature continuous-wave (CW) operation with a threshold current of 390 μA for the cavity length of 360 μm and the stripe width of 0.2 μm, which is lowest value ever reported in a DFB lasers on a Si substrate.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115693373","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Single balanced down-conversion mixer utilizing indium arsenide nanowire MOSFETs 利用砷化铟纳米线mosfet的单平衡下转换混频器
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880569
M. Berg, Karl‐Magnus Persson, E. Lind, H. Sjoland, L. Wernersson
We have fabricated single balanced downconversion mixer circuits using InAs nanowire MOSFETs as both active and passive devices. This is achieved by a combination of electron beam lithography and UV-lithography with a line width of 12 μm. The circuits exhibit a low frequency voltage conversion gain of 6 dB, a -3 dB cutoff frequency of 2 GHz and a power consumption of 3.8 mW, while operating at a supply voltage of 1.5 V. The circuits retain circuit functionality even for a supply voltage of 1 V.
我们使用InAs纳米线mosfet作为有源和无源器件制造了单平衡下变频混频器电路。这是通过电子束光刻和紫外光刻的结合实现的,线宽为12 μm。该电路的低频电压转换增益为6 dB, -3 dB截止频率为2 GHz,功耗为3.8 mW,工作电压为1.5 V。即使电源电压为1v,电路也能保持电路功能。
{"title":"Single balanced down-conversion mixer utilizing indium arsenide nanowire MOSFETs","authors":"M. Berg, Karl‐Magnus Persson, E. Lind, H. Sjoland, L. Wernersson","doi":"10.1109/ICIPRM.2014.6880569","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880569","url":null,"abstract":"We have fabricated single balanced downconversion mixer circuits using InAs nanowire MOSFETs as both active and passive devices. This is achieved by a combination of electron beam lithography and UV-lithography with a line width of 12 μm. The circuits exhibit a low frequency voltage conversion gain of 6 dB, a -3 dB cutoff frequency of 2 GHz and a power consumption of 3.8 mW, while operating at a supply voltage of 1.5 V. The circuits retain circuit functionality even for a supply voltage of 1 V.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129874865","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrical transport across the heterointerface of InP membranes bonded oxide-free on Si 在硅上无氧化物键合的InP膜的异质界面上的电传输
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880572
K. Pantzas, A. Itawi, L. Couraud, J. Esnault, E. Le Bourhis, G. Patriarche, G. Beaudoin, I. Sagnes, J. Streque, A. Talneau
A n-InP/n-Si isotype heterojunction is fabricated using direct oxide-free bonding, to study electrical transport in this hybrid material system. The band alignment is first evaluated numerically and a theoretical I(V) curve is discussed. The diode is then fabricated and the experimental I(V) curve is compared against theory.
采用直接无氧化键合的方法制备了n-InP/n-Si异质结,并对其电输运进行了研究。首先对波段对准进行了数值计算,并讨论了理论I(V)曲线。然后制作了二极管,并将实验I(V)曲线与理论进行了比较。
{"title":"Electrical transport across the heterointerface of InP membranes bonded oxide-free on Si","authors":"K. Pantzas, A. Itawi, L. Couraud, J. Esnault, E. Le Bourhis, G. Patriarche, G. Beaudoin, I. Sagnes, J. Streque, A. Talneau","doi":"10.1109/ICIPRM.2014.6880572","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880572","url":null,"abstract":"A n-InP/n-Si isotype heterojunction is fabricated using direct oxide-free bonding, to study electrical transport in this hybrid material system. The band alignment is first evaluated numerically and a theoretical I(V) curve is discussed. The diode is then fabricated and the experimental I(V) curve is compared against theory.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129946311","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
All-optical switching in a vertical microcavity-integrated monolayer graphene device 垂直微腔集成单层石墨烯器件中的全光开关
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880587
L. Fang, A. Madouri, A. Cavanna, I. Sagnes, D. Chouteau, X. Lafosse, G. Beaudoin, J. Oudar
We demonstrate that the nonlinear optical response of graphene is resonantly enhanced by incorporating monolayer graphene into a Fabry-Pérot microcavity. The modulation depth of the microcavity-integrated monolayer graphene device is increased to 12% which is much higher than the value of about 2% in other works, while retaining an ultrafast recovery time of ~0.7 ps. This suggests possible application in ultrafast all-optical signal processing.
我们证明,通过将单层石墨烯掺入法布里-帕姆罗微腔中,石墨烯的非线性光学响应得到了共振增强。微腔集成单层石墨烯器件的调制深度增加到12%,远高于其他研究中约2%的值,同时保持了约0.7 ps的超快恢复时间,这表明在超快全光信号处理中有可能应用。
{"title":"All-optical switching in a vertical microcavity-integrated monolayer graphene device","authors":"L. Fang, A. Madouri, A. Cavanna, I. Sagnes, D. Chouteau, X. Lafosse, G. Beaudoin, J. Oudar","doi":"10.1109/ICIPRM.2014.6880587","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880587","url":null,"abstract":"We demonstrate that the nonlinear optical response of graphene is resonantly enhanced by incorporating monolayer graphene into a Fabry-Pérot microcavity. The modulation depth of the microcavity-integrated monolayer graphene device is increased to 12% which is much higher than the value of about 2% in other works, while retaining an ultrafast recovery time of ~0.7 ps. This suggests possible application in ultrafast all-optical signal processing.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"66 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125374483","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
56Gbaud DP-QPSK receiver module with a monolithic integrated PBS and 90° hybrid InP chip 56Gbaud DP-QPSK接收模块,采用单片集成PBS和90°混合InP芯片
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880580
Ruiyong Zhang, P. Runge, Gan Zhou, R. Klotzer, D. Pech, H. Bach, D. Pérez-Galacho, Alejandro Ortega-Murnox, R. Halir, Í. Molina-Fernández
A 56Gbaud dual polarization quadrature phase shift keying (DP-QPSK) receiver module is presented including an InP receiver chip. The chip consists of monolithically integrated polarization beam splitters (PBS), 90° hybrids and balanced photodiodes.
提出了一种56Gbaud双极化正交相移键控(DP-QPSK)接收模块,其中包括一个InP接收芯片。该芯片由单片集成偏振分束器(PBS)、90°杂化和平衡光电二极管组成。
{"title":"56Gbaud DP-QPSK receiver module with a monolithic integrated PBS and 90° hybrid InP chip","authors":"Ruiyong Zhang, P. Runge, Gan Zhou, R. Klotzer, D. Pech, H. Bach, D. Pérez-Galacho, Alejandro Ortega-Murnox, R. Halir, Í. Molina-Fernández","doi":"10.1109/ICIPRM.2014.6880580","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880580","url":null,"abstract":"A 56Gbaud dual polarization quadrature phase shift keying (DP-QPSK) receiver module is presented including an InP receiver chip. The chip consists of monolithically integrated polarization beam splitters (PBS), 90° hybrids and balanced photodiodes.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"134 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131426686","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Tunable laser and modulator for pluggable coherent transcerivers 用于可插拔相干收发器的可调谐激光器和调制器
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880560
K. Uesaka, H. Shoji
We developed a tunable TDA-CSG-DR laser and an InP-based DP-IQ modulator intended for pluggable coherent transceiver applications. The fabricated TDA-CSG-DR laser achieves narrow linewidth of less than 300 kHz and high fiber output power of more than +17 dBm; the developed InP-based DP-IQ modulator co-packaged with four linear driver ICs satisfies the power dissipation of less than 3.2W. These results are promising for the realization of high-density pluggable coherent transceiver for metropolitan area networks.
我们开发了可调谐TDA-CSG-DR激光器和基于inp的DP-IQ调制器,用于可插拔相干收发器应用。制备的TDA-CSG-DR激光器实现了小于300 kHz的窄线宽和大于+17 dBm的高光纤输出功率;开发的基于inp的DP-IQ调制器与4个线性驱动ic共封装,功耗小于3.2W。这些结果为城域网高密度可插拔相干收发器的实现提供了理论依据。
{"title":"Tunable laser and modulator for pluggable coherent transcerivers","authors":"K. Uesaka, H. Shoji","doi":"10.1109/ICIPRM.2014.6880560","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880560","url":null,"abstract":"We developed a tunable TDA-CSG-DR laser and an InP-based DP-IQ modulator intended for pluggable coherent transceiver applications. The fabricated TDA-CSG-DR laser achieves narrow linewidth of less than 300 kHz and high fiber output power of more than +17 dBm; the developed InP-based DP-IQ modulator co-packaged with four linear driver ICs satisfies the power dissipation of less than 3.2W. These results are promising for the realization of high-density pluggable coherent transceiver for metropolitan area networks.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133474133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
High quality quantum-well intermixing for InP-based membrane photonic integration on Si 硅基inp膜光子集成的高质量量子阱混合
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880550
Jieun Lee, K. Doi, T. Hiratani, D. Inoue, T. Amemiya, N. Nishiyama, S. Arai
To realize membrane photonic integrated circuits, a novel quantum-well-intermixing (QWI) process using dual SiO2 films (O2-sputtered layer for enhancement of QWI and plasma-deposited layer for surface protection) was investigated. By optimization of the protection layer thickness, a large bandgap wavelength shift difference of 95 nm (57 meV) as well as good photoluminescence (PL) properties (no degradations in the PL spectral width and the intensity) was obtained. Moreover, the transient region length was estimated to be less than 3 μm which is the resolution limit of our PL measurement setup.
为了实现薄膜光子集成电路,研究了一种新型的量子阱混合(QWI)工艺,该工艺采用双SiO2薄膜(o2溅射层用于增强QWI,等离子沉积层用于表面保护)。通过对保护层厚度的优化,获得了95 nm (57 meV)的大带隙波长位移差和良好的光致发光(PL)性能(PL光谱宽度和强度没有下降)。此外,估计瞬态区域长度小于3 μm,这是我们的PL测量装置的分辨率极限。
{"title":"High quality quantum-well intermixing for InP-based membrane photonic integration on Si","authors":"Jieun Lee, K. Doi, T. Hiratani, D. Inoue, T. Amemiya, N. Nishiyama, S. Arai","doi":"10.1109/ICIPRM.2014.6880550","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880550","url":null,"abstract":"To realize membrane photonic integrated circuits, a novel quantum-well-intermixing (QWI) process using dual SiO2 films (O2-sputtered layer for enhancement of QWI and plasma-deposited layer for surface protection) was investigated. By optimization of the protection layer thickness, a large bandgap wavelength shift difference of 95 nm (57 meV) as well as good photoluminescence (PL) properties (no degradations in the PL spectral width and the intensity) was obtained. Moreover, the transient region length was estimated to be less than 3 μm which is the resolution limit of our PL measurement setup.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131554775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microfocus HRXRD analysis of inp based photonic integrated circuits inp基光子集成电路的微聚焦HRXRD分析
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880534
J. Decobert, C. Jany, H. Guerault
This work reports recent improvements in structural characterization by high resolution x-ray diffraction (HRXRD) performed on multiple quantum well (MQW) heterostructures grown on InP substrates. A new diffractometer, providing a sub-millimeter x-ray spot and allowing accurate lateral positioning on the sample, was tested. We compared two set of samples: (i) one is the as-grown material deposited on the complete wafer; (ii) the other one is the same set of samples after different technological processes, leading therefore to very small volume of material localized at specific places on cleaved wafers or chips. We show that with this new tool, useful structural information is still accessible after processes and can lead to further device improvement.
本文报道了利用高分辨率x射线衍射(HRXRD)对生长在InP衬底上的多量子阱(MQW)异质结构进行结构表征的最新进展。测试了一种新的衍射仪,提供亚毫米x射线点,并允许对样品进行精确的横向定位。我们比较了两组样品:(i)一组是沉积在完整晶圆上的生长材料;(ii)另一种是经过不同工艺处理的同一组样品,因此导致在被切割的晶圆或芯片上特定位置的材料体积非常小。我们表明,有了这个新工具,有用的结构信息在加工后仍然可以访问,并可以导致进一步的设备改进。
{"title":"Microfocus HRXRD analysis of inp based photonic integrated circuits","authors":"J. Decobert, C. Jany, H. Guerault","doi":"10.1109/ICIPRM.2014.6880534","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880534","url":null,"abstract":"This work reports recent improvements in structural characterization by high resolution x-ray diffraction (HRXRD) performed on multiple quantum well (MQW) heterostructures grown on InP substrates. A new diffractometer, providing a sub-millimeter x-ray spot and allowing accurate lateral positioning on the sample, was tested. We compared two set of samples: (i) one is the as-grown material deposited on the complete wafer; (ii) the other one is the same set of samples after different technological processes, leading therefore to very small volume of material localized at specific places on cleaved wafers or chips. We show that with this new tool, useful structural information is still accessible after processes and can lead to further device improvement.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114557178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of III-V nanowires based micosources vertically coupled to a Si waveguide for optical interconnects 基于III-V纳米线的微源与硅波导垂直耦合的光互连设计
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880585
Zhen Lin, M. Gendry, J. Harmand, X. Letartre
We design a III-V nanowires based photonic cavity on top of SOI waveguide for light generation in the near infrared (~1.3μm) in a silicon photonic circuit. 3D electromagnetic simulations (FDTD) are performed to design a periodic array of III-V photonic NWs vertically grown on Si. High quality factor resonances and efficient coupling between these micro-resonators and the SOI waveguide is targeted. The geometrical parameters of this architecture (number of NWs, diameter and spacing) are optimised by simulations. This original architecture opens the way to the monolithic integration of low power and small footprint microsources for silicon photonics.
我们在SOI波导上设计了一个基于III-V纳米线的光子腔,用于在硅光子电路中近红外(~1.3μm)产生光。利用三维电磁模拟(FDTD)设计了垂直生长在硅上的III-V光子NWs周期性阵列。这些微谐振器与SOI波导之间的高质量因数谐振和高效耦合是目标。通过仿真优化了该结构的几何参数(NWs的数量、直径和间距)。这种原始架构为硅光子学的低功耗和小足迹微源的单片集成开辟了道路。
{"title":"Design of III-V nanowires based micosources vertically coupled to a Si waveguide for optical interconnects","authors":"Zhen Lin, M. Gendry, J. Harmand, X. Letartre","doi":"10.1109/ICIPRM.2014.6880585","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880585","url":null,"abstract":"We design a III-V nanowires based photonic cavity on top of SOI waveguide for light generation in the near infrared (~1.3μm) in a silicon photonic circuit. 3D electromagnetic simulations (FDTD) are performed to design a periodic array of III-V photonic NWs vertically grown on Si. High quality factor resonances and efficient coupling between these micro-resonators and the SOI waveguide is targeted. The geometrical parameters of this architecture (number of NWs, diameter and spacing) are optimised by simulations. This original architecture opens the way to the monolithic integration of low power and small footprint microsources for silicon photonics.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122935374","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
RF characterization of vertical InAs nanowire MOSFETs with ft and fmax above 140 GHz 140 GHz以上的垂直InAs纳米线mosfet的射频特性
Pub Date : 2014-05-11 DOI: 10.1109/ICIPRM.2014.6880568
Sofia Johansson, E. Memišević, L. Wernersson, E. Lind
We present RF characterization of vertical gate-all-around InAs nanowire MOSFETs integrated on Si substrates with peak ft= 142 GHz and fmax= 155 GHz, representing the record for vertical nanowire transistors. The devices has an Lg ≈ 150 nm with a gm=700 mS/mm for a nanowire diameter of 38 nm and an EOT = 1.4 nm. The high values of ft is achieved through electron beam lithography patterning of the gate and drain contact which substantially decreases the parasitic capacitances through reduction of the overlay capacitance, which is in good agreement with TCAD modeling.
我们展示了集成在Si衬底上的垂直栅极全方位InAs纳米线mosfet的射频特性,峰值ft= 142 GHz, fmax= 155 GHz,代表了垂直纳米线晶体管的记录。当纳米线直径为38 nm时,器件的Lg≈150 nm, gm=700 mS/mm, EOT = 1.4 nm。高ft值是通过电子束光刻栅极和漏极接触的图图化实现的,通过减少覆盖电容大大降低了寄生电容,这与TCAD建模很好地吻合。
{"title":"RF characterization of vertical InAs nanowire MOSFETs with ft and fmax above 140 GHz","authors":"Sofia Johansson, E. Memišević, L. Wernersson, E. Lind","doi":"10.1109/ICIPRM.2014.6880568","DOIUrl":"https://doi.org/10.1109/ICIPRM.2014.6880568","url":null,"abstract":"We present RF characterization of vertical gate-all-around InAs nanowire MOSFETs integrated on Si substrates with peak ft= 142 GHz and fmax= 155 GHz, representing the record for vertical nanowire transistors. The devices has an Lg ≈ 150 nm with a gm=700 mS/mm for a nanowire diameter of 38 nm and an EOT = 1.4 nm. The high values of ft is achieved through electron beam lithography patterning of the gate and drain contact which substantially decreases the parasitic capacitances through reduction of the overlay capacitance, which is in good agreement with TCAD modeling.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125100624","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
期刊
26th International Conference on Indium Phosphide and Related Materials (IPRM)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1